200405504 玖、發明說明： 【發明所屬之技術領域】 本發明係關於利用紫外線在帶狀基板形成圖案之曝光 裝置，特別係關於用來移送作為曝光作業對象物之帶狀基 板’在曝光作業前將各種尺寸之對象物配置於正確位置的 一種曝光裝置之移送式基板載台。 【先前技術】 曝光裝置一般係使用於製造PDP、S/M(Shad〇W Mask)、 PCB、C/F(Col〇r Filter)、LCD、半導體等之製程，利用遮 罩、照明系統、調整用載台、及放射紫外線之水銀燈等在 帶狀基板形成圖案。 圖1係表示一般之曝光裝置的前視圖。 一般，曝光裝置，如圖1所示，係由光學系統1〇及移 送式基板載台所構成，該光學系統，係包含放射紫外線之 水銀燈12、及使水銀燈12所放射之紫外線以一方向前進 之聚光鏡14，該水銀燈12所放射之紫外線通過光罩照射 2帶狀基板40藉此來形成圖案；該移送式基板載台，移送 帶狀基板40使該帶狀基板4〇曝露於該光學系統1〇所照射 之紫外線’使該帶狀基板40在配置於正確位置之狀態下曝 露於紫外線來形成高精度之圖案。 在此4移送式基板載台，係包含：底座丄；移送裝 置20’ ^置於該底座！ ’用來使該帶狀基板4()沿該底座上 面移動；及排列裝置30，將帶妝 71了策狀基板40配置於正確位置 ’使該移送裝置2 0所移動之鹛处甘1 , 所秒助怎w狀基板40曝露於該光學系 200405504 統10所照射之紫外線而形成高精度之圖案。 忒移送裝置20，係包含：一對導滾子24，設置於該底 座1之入口側與出口側，使從第1捲盤22(捲繞該帶狀基 板40)所供應之帶狀基板在該底座丨上面沿水平方向供應 ，2對支撐滾子26，設置於丨對該導滾子24之間，且設置 於帶狀基板40之上面與下面使該帶狀基板4Q之曝露於紫 外線之部位配置成平行；及第2捲盤28，使通過該導滾子 24與該支撐滾子26之帶狀基板40捲繞而驅動。 該排列裝置30 ,係包含：排列銷部32，設置於2對支 °子之間，藉由设置為能上升或下降接觸該帶狀基板 4〇之下面，在曝光作業前將該帶狀基板4〇配置於正確位 置：使高精度之圖案形成；及空壓缸36，使設置於缸臂％ 上端之該排列銷部32能朝垂直方向移動。 在此，该空壓缸36，係連結油壓產生器36a，該油壓 產生器36a藉由將壓縮空氣供應至氣缸罩上側與 红臂34上升或下降。 以 圖2係表示在一般之曝光裝置形成圖案之帶狀基板的 俯視圖’圖3a係表示習知技術之曝光裝置之排列裝置的側 視圖’圖3b係表示習知技術之曝光裝置之排列裝置的作用 圖’圖4a係表示f知技術之曝光裝置之固^銷的俯視圖， 圖4b係表示習知技術之曝光裝置之固定銷的前視圖。 該帶狀基板40,如圖2至圖4b所示，其兩側端部形 成多個連續之& 42,當被該移送裝置20定位於該支撐滾 子26之間時，藉由該排列銷部32上升且插入該等孔u : 200405504 配置於正確位置。 在此，該排列銷部32,係包含：本體32a，固定於該 油壓缸36之缸臂34上端；多支銷32b’從該本體32& ^ 面向上側突出；及多個真空孔32c，形成於該本體32a之 一側且連結於真空產生器38,用以當該帶狀基板4〇之配 置完成後吸附該帶狀基板40。 依如上述之構成，該排列銷部32係藉由該油壓缸％ 上升且插人於帶狀基板之孔42來進行排列動作，驅動該真 空產生器38來吸附該帶狀基板4〇。 、 又，該排列銷部32當藉由該油壓缸36下降，帶狀基 板40則從該銷32b之限制解除，藉由該移送裝置2〇能二 動0 然而 自知技術之曝光裝置之移送式基板載台，因以 本身形狀不能改變之該排列銷部32來進行帶狀基板Μ之 排列，故每當更換為新製品之型， ^ I生式時必須更換該排列銷部 32、该導滾子24、及支撐滾子 ^ ^ .. 寻化費長時間於轉換 為新製品之型式，結果有生產能六 另王座此力降低之問題點。 【發明内容】 本發明有馨於上述習知技術之問題點而發明者 的在於提供一種曝光裝置之 /、 子、^、奋1 、式基板載台，其能使導滾 支撐滾子及排列機構之位置改 式基板載么之Μ、止处τ , 糟此方式改善移送 帶肤其把更換零件即可移送各種大小之 f狀基板，且排列於正確位置，# 刑々& — 文紙4即痛更換為新製品之 型式所需之時間與成本。 π表π口之 200405504 為達成上述目的，本發明之曝光裝置之移送式基板載 台’係包含：底座；移送機構，設置成能按照投入底座上 面之帶狀基板之大小於帶狀基板之寬度方向移動，以將帶 狀基板之兩側端部邊限制於上下方向邊移動；排列機構， 與移送機構連動，將帶狀基板之兩側面限制於寬度方向， 而使帶狀基板移動至正確位置；及真空板，設置於底座上 面’以將被移送機構及排列機構移至作業位置之帶狀基板 加以固定。 【實施方式】 以下參閱圖式詳細說明本發明之曝光裝置之移送式基 板載台的一實施例。 圖5a係表示本發明之曝光裝置之移送式基板載台的俯 視圖’圖5b係表示本發明之曝光裝置之移送式基板載台的 前視圖。 本發明之曝光裝置之移送式基板載台，如圖及圖 5b所示，係具有：底座5〇 ;移送裝置6〇，移動沿該底座 5 0上面所投入之帶狀基板g 〇，特別，若要移動不同大小之 帶狀基板90，則感測這情形且能沿帶狀基板9〇之寬度方 向移動之方式移動各種大小之帶狀基板90;及排列裝置70 ，以與該移送裝置60連動之方式限制該帶狀基板9〇之兩 側面’使該帶狀基板9 〇移動至正確位置。 再者，在該底座50上面設置透過形成於表面之吸附板 81吸進空氣之真空板80，用來在該移送裝置6〇及排列裝 置70將該帶狀基板90供應至正確位置時將該帶狀基板9〇 200405504 固定。 圖6係表示本發明之曝光裝置之移送裝置的側視圖。 如圖6所示，移送裝置6〇，係包含：驅動部61，成對 配置於該底座50之後方側，以將沿上面移動之帶狀基板 90兩側端邊限制邊移送；及被動部67，成對配置於該底座 50之前方側，其嚙合於該帶狀基板9〇之兩側端，並隨該 驅動部61所移送之帶狀基板9 〇旋轉。 該驅動部61，係包含：設置成分別嚙合於該帶狀基板 90之上面及下面且沿該帶狀基板9〇之移動方向能旋轉的 上驅動滚子62a及下驅動滾子62b、設置於該下驅動滾子 62b之旋轉軸的從動輪63、透過確動皮帶64與該從動輪 63連動之驅動輪65、及使插設於該驅動輪65中心部之旋 轉軸66a產生旋轉力之馬達66。 在此，因在該上驅動滾子62a及下驅動滾子62b之外 周面形成互相對應之齒輪齒，故驅動該下驅動滾子62b時 该上驅動滾子62a邊喃合邊旋轉。 又’该驅動輪6 5因以面向該馬達6 6之旋轉軸6 6 a之 方式成對形成，故各驅動輪65沿該底座50之寬度方向能 形成長，即使該從動輪63及驅動滾子62沿底座50之前後 方向移動，該確動皮帶64亦能沿驅動輪65之外周面滑動 而同時將驅動輪65之旋轉力傳給從動輪63。 並且，該被動部67，其分別嚙合於該帶狀基板go之 上面及下面之上被動滾子68a及下被動滾子68b，隨該驅 動部61所移送之帶狀基板90而旋轉。 200405504 即，該帶狀基板90,雖嚙合於位在該底座5〇後方側 之驅動部61而從前往後移動，然而位在該驅動部61前方 側之被動部67嚙合於該帶狀基板90且與該帶狀基板9〇之 移動一起受驅動，故該驅動部61之旋轉時，在該驅動部 61與被動部67之間經常有張力作用，能使該帶狀基板 以下垂之方式前進。 圖7係表不本發明之曝光裝置之排列裴置的側視圖。 該排列裝置70，係具有：一對移動載台75，以相對之 方式配置於該底座50上側，用以使該驅動滾子62及從動 _ 輪63間之距離可改變，藉此將該驅動部61所移送之帶狀 基板90暴露於紫外線之前配置於正確位置；驅動機構，設 置於該移動載台75之一侧，用以按照所供應之該帶狀基板 90之寬度來調節該移動載台75彼此之間隔；及控制部（未 圖示），當該帶狀基板90供應至底座5〇時感測帶狀基板 90之寬度而傳送驅動訊號至該驅動機構；且按照所感測之 帶狀基板9 0之寬度來調整該移動載台7 5之間隔。 該驅動機構’係具有：設置於該底座5〇之一側之排列 _ 用馬達77 ;與該排列用馬達77連結，形成有以中央為中 心兩側朝相反方向前進之螺旋的之驅動軸78 ;及分別結合 於該驅動軸78之兩側，固定於該移動載台75之一側一對 滾珠軸承79 ;且當該排列用馬達77以一方向驅動時，該 移動載台75彼此之間隔變狹窄，當該排列用馬達77以另 一方向驅動時，該移動載台75彼此之間隔變寬。 該排列裝置70，係包含：多個導桿71，設置成能在該 11200405504 (ii) Description of the invention: [Technical field to which the invention belongs] The present invention relates to an exposure device that uses ultraviolet rays to form a pattern on a strip substrate, and particularly relates to a strip substrate used to transfer an object to be exposed as an object of the exposure operation. A transfer-type substrate stage of an exposure device in which objects of various sizes are arranged at correct positions. [Prior technology] The exposure device is generally used in the manufacturing process of PDP, S / M (Shadow Mask), PCB, C / F (Color Filter), LCD, semiconductor, etc., using a mask, lighting system, adjustment A pattern is formed on the strip substrate using a stage, a mercury lamp that emits ultraviolet rays, and the like. FIG. 1 is a front view showing a general exposure apparatus. Generally, as shown in FIG. 1, the exposure device is composed of an optical system 10 and a transfer substrate stage. The optical system includes a mercury lamp 12 that emits ultraviolet rays, and an ultraviolet lamp emitted by the mercury lamp 12 to advance in one direction. Condensing lens 14, the ultraviolet light emitted by the mercury lamp 12 is irradiated through a mask 2 to form a strip substrate 40, thereby forming a pattern; the transfer substrate stage, the strip substrate 40 is transferred to expose the strip substrate 40 to the optical system 1 〇The irradiated ultraviolet ray 'exposes the belt-shaped substrate 40 to ultraviolet rays in a state where it is arranged at a correct position to form a highly accurate pattern. Here, the 4 transfer type substrate stage includes: a base 丄; a transfer device 20 ′ ^ placed on the base! 'Used to move the strip-shaped substrate 4 () along the upper surface of the base; and the arranging device 30, which arranges the tape-shaped substrate 40 and the policy-shaped substrate 40 at the correct position', and makes the transfer device 20 move the place 1 to 1, In this way, the w-shaped substrate 40 is exposed to ultraviolet rays irradiated by the optical system 200405504 to form a highly accurate pattern.忒 The transfer device 20 includes a pair of guide rollers 24 provided on the inlet side and the outlet side of the base 1 so that the strip substrate supplied from the first reel 22 (the strip substrate 40 is wound) The base is provided on the upper surface in the horizontal direction, and two pairs of support rollers 26 are disposed between the guide rollers 24, and are disposed above and below the strip substrate 40 to expose the strip substrate 4Q to ultraviolet rays. The parts are arranged in parallel; and the second reel 28 is driven by winding the belt-shaped substrate 40 passing through the guide roller 24 and the support roller 26. The arranging device 30 includes: an arranging pin portion 32, which is arranged between two pairs of branches. The arranging pin portion 32 can be raised or lowered to contact the strip substrate 40, and the strip substrate is exposed before the exposure operation. 40. Arrangement at the correct position: forming a pattern with high accuracy; and an air-cylinder 36 so that the alignment pin portion 32 provided at the upper end of the cylinder arm% can move in the vertical direction. Here, the air pressure cylinder 36 is connected to an oil pressure generator 36a. The oil pressure generator 36a raises or lowers the supply of compressed air to the upper side of the cylinder head and the red arm 34. Fig. 2 is a plan view showing a strip-shaped substrate formed with a general exposure device. Fig. 3a is a side view showing an arrangement device of a conventional exposure device. Fig. 3b is a view showing an arrangement device of a conventional exposure device. Figure 4a is a top view showing the fixing pin of the exposure device of the known technology, and FIG. 4b is a front view showing the fixing pin of the exposure device of the conventional technology. As shown in FIG. 2 to FIG. 4 b, the strip-shaped substrate 40 has a plurality of continuous amps on both end portions. When the belt-shaped substrate 40 is positioned between the support rollers 26 by the transfer device 20, the arrangement The pin portion 32 rises and is inserted into the hole u: 200405504 is arranged at the correct position. Here, the array pin portion 32 includes a body 32a fixed to the upper end of the cylinder arm 34 of the hydraulic cylinder 36, a plurality of pins 32b 'protruding from the body 32 & ^ face upward, and a plurality of vacuum holes 32c, It is formed on one side of the body 32a and is connected to the vacuum generator 38, and is used to adsorb the strip substrate 40 after the configuration of the strip substrate 40 is completed. According to the structure described above, the alignment pin portion 32 is arranged to perform an alignment operation by the hydraulic cylinder% rising and inserted into the hole 42 of the strip substrate, and drives the vacuum generator 38 to adsorb the strip substrate 40. When the array pin portion 32 is lowered by the hydraulic cylinder 36, the band substrate 40 is released from the restriction of the pin 32b, and the transfer device 20 can move two times. However, the exposure device of the known technology For the transfer type substrate stage, the strip-shaped substrate M is arranged with the arrangement pin portion 32 whose shape cannot be changed. Therefore, the arrangement pin portion 32 must be replaced whenever it is replaced with a new product type. The guide roller 24 and the support roller ^ ^ .. The search for the chemical takes a long time to convert to a new product type, and as a result, there is a problem that the productivity can be reduced by six other thrones. [Summary of the Invention] The present invention has the problems of the above-mentioned conventional technology and the inventor is to provide an exposure device of the type, the substrate, the substrate, and the substrate, which can enable the guide roller to support the rollers and the arrangement The position of the mechanism is changed to the substrate M and the stop τ. In this way, the transfer belt is improved. The replacement parts can be transferred to f-shaped substrates of various sizes and arranged in the correct position. # 々々 & — Paper 4 The time and cost required to replace the pain with a new product. 200405504 of π table π mouth In order to achieve the above-mentioned purpose, the transfer substrate stage of the exposure device of the present invention includes: a base; a transfer mechanism, which is set to the width of the strip substrate according to the size of the strip substrate placed on the base. Directional movement to restrict the two sides of the strip substrate to the up and down direction movement; the arrangement mechanism, in conjunction with the transfer mechanism, restricts both sides of the strip substrate to the width direction, so that the strip substrate moves to the correct position ; And a vacuum plate, which is provided on the base 'to fix the belt-shaped substrate moved by the transfer mechanism and the aligning mechanism to the operating position. [Embodiment] An embodiment of the transfer type substrate carrier of the exposure apparatus of the present invention will be described in detail below with reference to the drawings. Fig. 5a is a plan view showing a transfer type substrate stage of the exposure apparatus of the present invention 'Fig. 5b is a front view showing a transfer type substrate stage of the exposure apparatus of the present invention. As shown in FIG. 5B, the transfer type substrate stage of the exposure device of the present invention includes: a base 50; a transfer device 60, which moves a strip-shaped substrate g 0 that is put along the base 50, and particularly, If the strip-shaped substrates 90 of different sizes are to be moved, the situation is sensed and the strip-shaped substrates 90 of various sizes can be moved in a manner of moving in the width direction of the strip-shaped substrates 90; and the arranging device 70 to be connected with the transfer device 60 The interlocking method restricts both sides of the strip-shaped substrate 90 to move the strip-shaped substrate 90 to the correct position. Furthermore, a vacuum plate 80 for sucking in air through the adsorption plate 81 formed on the surface is provided on the base 50, and is used to supply the strip substrate 90 to the correct position when the transfer device 60 and the alignment device 70 supply the strip substrate 90 to the correct position. The strip substrate 9200405504 is fixed. Fig. 6 is a side view showing a transfer device of the exposure device of the present invention. As shown in FIG. 6, the transfer device 60 includes: a driving portion 61 disposed in pairs on the rear side of the base 50 to transfer the edges of both sides of the strip-shaped substrate 90 moving along the upper side in a restricted manner; and a passive portion 67. They are arranged in pairs on the front side of the base 50, and are engaged with both side ends of the strip-shaped substrate 90, and rotate with the strip-shaped substrate 90 transferred by the driving portion 61. The driving section 61 includes an upper driving roller 62a and a lower driving roller 62b which are provided to be engaged with the upper and lower surfaces of the belt-shaped substrate 90 and rotate in the moving direction of the belt-shaped substrate 90, respectively. The driven wheel 63 of the rotating shaft of the lower driving roller 62b, the driven wheel 65 interlocking with the driven wheel 63 through the actuating belt 64, and a motor for generating a rotating force on the rotating shaft 66a inserted in the central portion of the driving wheel 65 66. Here, since gear teeth corresponding to each other are formed on the outer peripheral surfaces of the upper driving roller 62a and the lower driving roller 62b, the upper driving roller 62a rotates while being driven when the lower driving roller 62b is driven. Also, because the driving wheels 65 are formed in pairs so as to face the rotating shaft 6 6 a of the motor 66, the driving wheels 65 can be formed along the width direction of the base 50, even though the driven wheels 63 and the driving rollers The sub 62 moves in the front-back direction of the base 50, and the confirming belt 64 can also slide along the outer peripheral surface of the driving wheel 65 while transmitting the rotational force of the driving wheel 65 to the driven wheel 63. The passive portion 67 is engaged with the upper passive roller 68a and the lower passive roller 68b on the upper and lower surfaces of the belt-shaped substrate go, respectively, and rotates with the belt-shaped substrate 90 transferred by the driving portion 61. 200405504 That is, although the belt-shaped substrate 90 is engaged with the driving portion 61 located at the rear side of the base 50 and moves from back to front, the passive portion 67 located at the front side of the driving portion 61 is engaged with the belt-shaped substrate 90 And it is driven together with the movement of the strip substrate 90. Therefore, when the drive portion 61 rotates, there is always a tension between the drive portion 61 and the passive portion 67, which can advance the strip substrate in a drooping manner. . FIG. 7 is a side view showing the arrangement of the exposure apparatus of the present invention. The arranging device 70 has a pair of moving stages 75 arranged on the upper side of the base 50 in a relative manner, so that the distance between the driving roller 62 and the driven wheel 63 can be changed, and thereby the The strip-shaped substrate 90 transferred by the driving section 61 is arranged at a correct position before being exposed to ultraviolet rays; the driving mechanism is provided on one side of the moving stage 75 to adjust the movement according to the width of the strip-shaped substrate 90 supplied The distance between the stages 75; and a control unit (not shown), when the strip substrate 90 is supplied to the base 50, it senses the width of the strip substrate 90 and transmits a driving signal to the driving mechanism; and according to the sensed The width of the strip-shaped substrate 90 adjusts the interval of the moving stage 75. The driving mechanism is provided with an array motor 77 arranged on one side of the base 50, and a driving shaft 78 connected to the array motor 77 and formed with spirals that advance in opposite directions on both sides of the center And a pair of ball bearings 79 that are respectively coupled to both sides of the driving shaft 78 and fixed to one side of the moving stage 75; and when the array motor 77 is driven in one direction, the moving stages 75 are spaced from each other When the alignment motor 77 is driven in the other direction, the distance between the moving stages 75 becomes wider. The arranging device 70 includes: a plurality of guide rods 71 arranged to be
ZVUHUJJUH 底座50之寬度方向移動， 度方向限制；及導板72，讯板9〇兩侧面於寬 開既定叹置於該導桿71之前端並以分 歧^ 式配置於該帶狀基板9G之上面及下面，以 遮斷被料桿71限制之該帶狀基板⑽的上下振動。 r f :,方面’在该底座5°上面沿該底座50之寬度方向 口又 夕列軌條5 2，在該銘勤被么7 e 條52-叙… 下端形成沿著該軌 ί 2/動之多個軌條導件76,使得該排歹㈣馬達77運轉 時，该移動載台75能容易在該底座50上侧移動。 並且，該排列裝置70進一步包含導滾子73,其設置 於該底座50之人口側及出口側，支撐該帶狀基板9〇之下 側防止下垂，使該帶狀基板90水平供應。 將如上述所構成之本發明之曝光裝置之移送式基板載 台的動作，說明如下。 ί 首先，施加電源，該馬達66則驅動，帶動該驅動輪 65、從動輪63及驅動滾子62，將帶狀基板9〇供應至一對 忒驅動滾子62之間，由該控制部（未圖示）感測所供應之帶 狀基板90寬度，將控制訊號傳至該排列用馬達77。 然後’當該排列用馬達7 7按照輸入之訊號來驅動時， 形成有相反方向之螺旋的驅動軸78旋轉同時使該滾珠軸承 79移動，藉此調節移動載台75彼此之距離。 如上述，當移動載台75彼此之距離調節時，該帶狀基 板90將因設置於該移動載台75之導桿71而移動至正確位 置，該帶狀基板90移動至正確位置後，透過真空板80之 吸附孔81將空氣吸進而使該帶狀基板90固定於作業位置 200405504 以上之詳細說明中，雖參閱圖式說明本發明之曝光裝 置之移迗式基板載台，但是本發明不限定於本說明書所揭 不之貝施例與圖式，在其技術思想之範圍内能由熟習該項 技術者作包含材質之各種變形。 如上所構成之本發明之曝光裝置之移送式基板載台， 其設有驅動滾子（移送帶狀基板）及導桿（將帶狀基板供應至 正確位置）之一對移動載台，以間隔能調節之方式設置於馨 底座之前方側與後方側，藉此能按照從底座之一側所供應 之帶狀基板之寬度來調節移動載台之間隔，能將各種大小 之帶狀基板移動且配置於正確位置，結果，即使製品型式 改變亦不必更換移送裝置及排列裝置即可實現高生產力之 曝光作業。 【圖式簡單說明】 (一）圖式部分 圖1 ’係表示一般曝光裝置之主要部分的前視圖。 鲁 圖2 ’係藉由一般之曝光裝置所製作之基板的俯視圖。 圖3a ’係表示習知技術之曝光裝置之排列裝置的側視 圖。 圖3b ’係表示習知技術之曝光裝置之排列裝置的動作 圖。 圖4a ’係表示習知技術之曝光裝置之固定銷部的俯視 圖0ZVUHUJJUH base 50 is moved in the width direction and restricted in the degree direction; and the guide plate 72 and the signal board 90 are placed on the front end of the guide rod 71 at a wide opening, and are arranged on the strip-shaped substrate 9G in a divergent manner. And below, the vertical vibration of the band-shaped substrate ⑽ restricted by the material rod 71 is blocked. rf :, the aspect 'is above the base 5 ° along the width direction of the base 50 along the width of the rail 5 2 rails, at the Ming Qin Bei 7 e Article 52-Syria ... the lower end is formed along the rail 2 / move The plurality of rail guides 76 enable the moving stage 75 to be easily moved on the upper side of the base 50 when the row motor 77 is running. In addition, the alignment device 70 further includes guide rollers 73 provided on the population side and the exit side of the base 50, supporting the lower side of the strip substrate 90 to prevent sagging, and horizontally supplying the strip substrate 90. The operation of the transfer type substrate stage of the exposure apparatus of the present invention configured as described above will be described below. First, the power is applied, and the motor 66 is driven to drive the driving wheel 65, the driven wheel 63, and the driving roller 62, and the belt-shaped substrate 90 is supplied between a pair of 忒 driving rollers 62, and the control unit ( (Not shown) senses the width of the supplied strip substrate 90, and transmits a control signal to the alignment motor 77. Then, when the array motors 7 and 7 are driven in accordance with the input signals, the driving shaft 78 having a spiral formed in the opposite direction rotates while moving the ball bearing 79, thereby adjusting the distance between the moving stages 75. As described above, when the distances between the moving stages 75 are adjusted, the strip substrate 90 is moved to the correct position due to the guide rod 71 provided on the movement stage 75. After the strip substrate 90 is moved to the correct position, it passes through The suction hole 81 of the vacuum plate 80 sucks air and fixes the strip-shaped substrate 90 to the working position 200405504. In the detailed description above, although referring to the drawings to explain the portable substrate stage of the exposure device of the present invention, the present invention does not Limited to the examples and drawings disclosed in this specification, within the scope of their technical ideas, various modifications including materials can be made by those skilled in the art. The transfer type substrate stage of the exposure apparatus of the present invention configured as described above is provided with one pair of moving stages, one of the driving roller (transferring the strip substrate) and the guide (supplying the strip substrate to the correct position), at intervals. It can be adjusted on the front side and the rear side of the base, so that the interval between the moving stages can be adjusted according to the width of the strip substrate supplied from one side of the base, and the strip substrates of various sizes can be moved and Arranged at the correct position, as a result, even if the product type is changed, high-productivity exposure can be realized without changing the conveying device and the aligning device. [Brief description of the drawings] (I) Schematic part Fig. 1 'is a front view showing a main part of a general exposure device. Figure 2 'is a top view of a substrate produced by a general exposure apparatus. Fig. 3a 'is a side view showing an arrangement device of an exposure device of the prior art. Fig. 3b 'is a view showing the operation of the aligning device of the exposure device of the conventional technique. Fig. 4a 'is a plan view showing a fixed pin portion of an exposure device of the conventional technology. Fig. 0
13 200405504 圖4b，係表示習知技術之曝光裝置之固定銷部的前視 圖。 圖5a，係表示本發明之曝光裝置之移送式基板載台的 俯視圖。 圖5b，係表示本發明之曝光裝置之移送式基板載台的 前視圖。 圖6,係表示本發明之曝光裝置之移送裝置的前視圖。 圖7，係表示本發明之曝光裝置之排列裝置的俯視圖。 (二 )元件代表符號 50 底座 52 軌條 60 移送裝置 61 驅動部 62 驅動滾子 63 從動輪 64 確動皮帶 65 驅動輪 66a 旋轉軸 66 馬達 67 被動部 68 被動滾子 70 排列裝置 71 導桿 72 導板13 200405504 Fig. 4b is a front view showing the fixing pin portion of the exposure device of the conventional technology. Fig. 5a is a plan view showing a transfer type substrate stage of the exposure apparatus of the present invention. Fig. 5b is a front view showing a transfer type substrate stage of the exposure apparatus of the present invention. Fig. 6 is a front view showing a transfer device of the exposure device of the present invention. FIG. 7 is a plan view showing an arrangement of an exposure apparatus according to the present invention. (II) Symbols for components 50 Base 52 Rail 60 Transfer device 61 Drive unit 62 Drive roller 63 Driven wheel 64 Assurance belt 65 Drive wheel 66a Rotary shaft 66 Motor 67 Passive part 68 Passive roller 70 Alignment device 71 Guide rod 72 Guides
14 200405504 73 導滾子 75 移動載台 76 軌條導件 77 排列用馬達 78 驅動軸 79 滾珠軸承 80 真空板 81 吸附孔 90 帶狀基板14 200405504 73 Guide roller 75 Mobile stage 76 Rail guide 77 Motor for alignment 78 Drive shaft 79 Ball bearing 80 Vacuum plate 81 Suction hole 90 Band substrate