CN1306241C - 利用侧面安装的干涉仪获取位置信息的系统和方法 - Google Patents

利用侧面安装的干涉仪获取位置信息的系统和方法 Download PDF

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Publication number
CN1306241C
CN1306241C CNB2004100115232A CN200410011523A CN1306241C CN 1306241 C CN1306241 C CN 1306241C CN B2004100115232 A CNB2004100115232 A CN B2004100115232A CN 200410011523 A CN200410011523 A CN 200410011523A CN 1306241 C CN1306241 C CN 1306241C
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CN
China
Prior art keywords
reflective surface
axis
wafer stage
light
movable device
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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CNB2004100115232A
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English (en)
Chinese (zh)
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CN1657865A (zh
Inventor
威廉·克莱·施卢赫特尔
路易斯·F·米勒
道格拉斯·P·伍尔韦尔托
杰弗里·A·扬
艾伦·B·雷
戴维·C·楚
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Agilent Technologies Inc
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Agilent Technologies Inc
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Publication of CN1657865A publication Critical patent/CN1657865A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
CNB2004100115232A 2004-02-20 2004-12-31 利用侧面安装的干涉仪获取位置信息的系统和方法 Expired - Fee Related CN1306241C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/783,199 US7130056B2 (en) 2004-02-20 2004-02-20 System and method of using a side-mounted interferometer to acquire position information
US10/783,199 2004-02-20

Publications (2)

Publication Number Publication Date
CN1657865A CN1657865A (zh) 2005-08-24
CN1306241C true CN1306241C (zh) 2007-03-21

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CNB2004100115232A Expired - Fee Related CN1306241C (zh) 2004-02-20 2004-12-31 利用侧面安装的干涉仪获取位置信息的系统和方法

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US (1) US7130056B2 (enExample)
JP (1) JP4880232B2 (enExample)
CN (1) CN1306241C (enExample)
DE (1) DE102004059400A1 (enExample)
NL (1) NL1028349C2 (enExample)

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US7101053B2 (en) * 2004-01-15 2006-09-05 Associated Universities, Inc. Multidirectional retroreflectors
US7362447B2 (en) * 2004-02-20 2008-04-22 Agilent Technologies, Inc. Low walk-off interferometer
US7158236B2 (en) * 2004-05-21 2007-01-02 Agilent Technologies, Inc. Heterodyne laser interferometer for measuring wafer stage translation
US8693006B2 (en) * 2005-06-28 2014-04-08 Nikon Corporation Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
US7355719B2 (en) * 2005-08-16 2008-04-08 Agilent Technologies, Inc. Interferometer for measuring perpendicular translations
EP2037487A4 (en) * 2006-06-09 2014-07-02 Nikon Corp APPARATUS WITH MOBILE BODY, APPARATUS AND METHOD FOR EXPOSURE, AND METHOD FOR MANUFACTURING DEVICES
JPWO2008136404A1 (ja) * 2007-04-27 2010-07-29 株式会社ニコン 光学部材、干渉計システム、ステージ装置、露光装置、及びデバイス製造方法
JP2010122183A (ja) * 2008-11-21 2010-06-03 Sanyo Electric Co Ltd 物体検出装置および情報取得装置
CN102109769B (zh) * 2009-12-29 2012-10-03 上海微电子装备有限公司 工件台干涉仪和掩模台干涉仪的联调装置及联调方法
DE102013224381A1 (de) * 2012-12-20 2014-06-26 Dr. Johannes Heidenhain Gmbh Optische Positionsmesseinrichtung
CN103499280B (zh) * 2013-10-11 2015-04-22 哈尔滨工业大学 回位补偿式三光轴线位移激光干涉仪校准方法与装置
CN103528508B (zh) * 2013-10-11 2015-03-11 哈尔滨工业大学 形貌补偿式双光轴角位移激光干涉仪校准方法与装置
CN103528500B (zh) * 2013-10-11 2015-02-11 哈尔滨工业大学 基于四标准光轴的线位移激光干涉仪校准方法与装置
CN103499277B (zh) * 2013-10-11 2015-02-11 哈尔滨工业大学 基于四标准光轴的角位移激光干涉仪校准方法与装置
CN103528507B (zh) * 2013-10-11 2015-02-11 哈尔滨工业大学 回位补偿式四光轴角位移激光干涉仪校准方法与装置
CN103528525B (zh) * 2013-10-11 2015-02-11 哈尔滨工业大学 三光轴补偿及气浴式线位移激光干涉仪校准方法与装置
CN103528501B (zh) * 2013-10-11 2015-03-11 哈尔滨工业大学 基于四标准光轴气浴的线位移激光干涉仪校准方法与装置
CN103499278B (zh) * 2013-10-11 2015-03-11 哈尔滨工业大学 形貌补偿式四光轴线位移激光干涉仪校准方法与装置
CN103499284B (zh) * 2013-10-11 2015-03-11 哈尔滨工业大学 双光轴回位及气浴式线位移激光干涉仪校准方法与装置
CN103499290B (zh) * 2013-10-11 2015-03-11 哈尔滨工业大学 双光轴回位及气浴式角位移激光干涉仪校准方法与装置
CN103528499B (zh) * 2013-10-11 2015-03-11 哈尔滨工业大学 形貌补偿式双光轴线位移激光干涉仪校准方法与装置
CN103499289B (zh) * 2013-10-11 2015-03-11 哈尔滨工业大学 形貌补偿式四光轴角位移激光干涉仪校准方法与装置
CN103499285B (zh) * 2013-10-11 2015-02-11 哈尔滨工业大学 双光轴补偿及气浴式线位移激光干涉仪校准方法与装置
CN103528504B (zh) * 2013-10-11 2015-03-11 哈尔滨工业大学 回位补偿式四光轴线位移激光干涉仪校准方法与装置
CN103499288B (zh) * 2013-10-11 2015-03-11 哈尔滨工业大学 基于三标准光轴气浴的线位移激光干涉仪校准方法与装置
CN103528509B (zh) * 2013-10-11 2015-02-11 哈尔滨工业大学 基于双标准光轴气浴的角位移激光干涉仪校准方法与装置
CN103528502B (zh) * 2013-10-11 2015-03-11 哈尔滨工业大学 回位补偿式双光轴角位移激光干涉仪校准方法与装置
CN103528506B (zh) * 2013-10-11 2015-03-11 哈尔滨工业大学 四光轴回位及气浴式角位移激光干涉仪校准方法与装置
CN103499287B (zh) * 2013-10-11 2015-03-11 哈尔滨工业大学 基于双标准光轴气浴的线位移激光干涉仪校准方法与装置
CN103528505B (zh) * 2013-10-11 2015-02-11 哈尔滨工业大学 四光轴补偿及气浴式线位移激光干涉仪校准方法与装置
CN103528510B (zh) * 2013-10-11 2015-02-11 哈尔滨工业大学 四光轴补偿及气浴式角位移激光干涉仪校准方法与装置
CN103528526B (zh) * 2013-10-11 2015-03-11 哈尔滨工业大学 形貌补偿式三光轴线位移激光干涉仪校准方法与装置
CN103499286B (zh) * 2013-10-11 2015-03-11 哈尔滨工业大学 回位补偿式双光轴线位移激光干涉仪校准方法与装置
CN103499292B (zh) * 2013-10-11 2015-03-11 哈尔滨工业大学 基于双标准光轴的角位移激光干涉仪校准方法与装置
CN103499281B (zh) * 2013-10-11 2015-03-11 哈尔滨工业大学 四光轴回位及气浴式线位移激光干涉仪校准方法与装置
CN103528503B (zh) * 2013-10-11 2015-03-11 哈尔滨工业大学 双光轴补偿及气浴式角位移激光干涉仪校准方法与装置
CN103499291B (zh) * 2013-10-11 2015-02-11 哈尔滨工业大学 基于四标准光轴气浴的角位移激光干涉仪校准方法与装置
CN103499282B (zh) * 2013-10-11 2015-03-11 哈尔滨工业大学 三光轴回位及气浴式线位移激光干涉仪校准方法与装置
WO2016190921A1 (en) 2015-02-05 2016-12-01 Associated Universities, Inc. Fiber optic based laser range finder
US10126411B2 (en) 2015-03-13 2018-11-13 Continental Advanced Lidar Solutions Us, Llc. Beam steering LADAR sensor
CN106886143B (zh) * 2017-04-28 2019-08-09 电子科技大学 基于相位全息相关性的全息扫描空间距离提取方法
IL273651B2 (en) * 2017-10-04 2024-06-01 Asml Netherlands Bv Interferometric positioning device
US10697893B2 (en) * 2018-03-09 2020-06-30 The Boeing Company Specular variable angle absolute reflectance method and reflectometer
CN113490886A (zh) 2019-02-28 2021-10-08 Asml荷兰有限公司 平台系统和光刻装置
US11327013B2 (en) 2020-05-15 2022-05-10 The Boeing Company Specular variable angle absolute reflectance method and reflectometer

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Also Published As

Publication number Publication date
CN1657865A (zh) 2005-08-24
JP2005233966A (ja) 2005-09-02
NL1028349A1 (nl) 2005-08-23
JP4880232B2 (ja) 2012-02-22
US7130056B2 (en) 2006-10-31
US20050185193A1 (en) 2005-08-25
NL1028349C2 (nl) 2006-11-27
DE102004059400A1 (de) 2005-09-15

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