CN1271621C - 制造光盘母盘的方法 - Google Patents
制造光盘母盘的方法 Download PDFInfo
- Publication number
- CN1271621C CN1271621C CN02812814.1A CN02812814A CN1271621C CN 1271621 C CN1271621 C CN 1271621C CN 02812814 A CN02812814 A CN 02812814A CN 1271621 C CN1271621 C CN 1271621C
- Authority
- CN
- China
- Prior art keywords
- stamper
- substrate
- manufacturing
- prototype
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims abstract description 74
- 230000003287 optical effect Effects 0.000 title claims abstract description 13
- 239000011159 matrix material Substances 0.000 title abstract 2
- 239000000463 material Substances 0.000 claims abstract description 98
- 239000000758 substrate Substances 0.000 claims abstract description 69
- 229920005989 resin Polymers 0.000 claims abstract description 67
- 239000011347 resin Substances 0.000 claims abstract description 67
- 238000004519 manufacturing process Methods 0.000 claims abstract description 39
- 238000000151 deposition Methods 0.000 claims abstract description 35
- 238000005530 etching Methods 0.000 claims description 35
- 230000008021 deposition Effects 0.000 claims description 34
- 238000000576 coating method Methods 0.000 claims description 23
- 239000011248 coating agent Substances 0.000 claims description 22
- 229910052751 metal Inorganic materials 0.000 claims description 22
- 239000002184 metal Substances 0.000 claims description 22
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 20
- 238000005868 electrolysis reaction Methods 0.000 claims description 14
- 238000006243 chemical reaction Methods 0.000 claims description 13
- 238000000926 separation method Methods 0.000 claims description 13
- 238000003825 pressing Methods 0.000 claims description 12
- 239000007769 metal material Substances 0.000 claims description 11
- 229910052759 nickel Inorganic materials 0.000 claims description 10
- 230000008569 process Effects 0.000 claims description 7
- 239000013049 sediment Substances 0.000 claims description 7
- 229910045601 alloy Inorganic materials 0.000 claims description 6
- 239000000956 alloy Substances 0.000 claims description 6
- 238000005498 polishing Methods 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 5
- 238000000137 annealing Methods 0.000 claims description 4
- 239000004020 conductor Substances 0.000 claims description 4
- 239000011888 foil Substances 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- 238000007747 plating Methods 0.000 claims description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 2
- 239000004642 Polyimide Substances 0.000 claims description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 2
- 235000019994 cava Nutrition 0.000 claims description 2
- 238000004821 distillation Methods 0.000 claims description 2
- 238000000227 grinding Methods 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 239000011733 molybdenum Substances 0.000 claims description 2
- 229920003986 novolac Polymers 0.000 claims description 2
- 229920000728 polyester Polymers 0.000 claims description 2
- 229920001721 polyimide Polymers 0.000 claims description 2
- 238000004062 sedimentation Methods 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- 238000005260 corrosion Methods 0.000 claims 1
- 230000007797 corrosion Effects 0.000 claims 1
- 238000012797 qualification Methods 0.000 claims 1
- 230000000191 radiation effect Effects 0.000 claims 1
- 239000002243 precursor Substances 0.000 abstract 2
- 239000010410 layer Substances 0.000 description 51
- 230000004048 modification Effects 0.000 description 9
- 238000012986 modification Methods 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000003792 electrolyte Substances 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
- G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
- G11B7/263—Preparing and using a stamper, e.g. pressing or injection molding substrates
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Glass Compositions (AREA)
- Laminated Bodies (AREA)
Abstract
Description
Claims (26)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0108423A FR2826494B1 (fr) | 2001-06-26 | 2001-06-26 | Procede de fabrication d'une matrice de disques optiques |
FR0108423 | 2001-06-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1520592A CN1520592A (zh) | 2004-08-11 |
CN1271621C true CN1271621C (zh) | 2006-08-23 |
Family
ID=8864789
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN02812814.1A Expired - Fee Related CN1271621C (zh) | 2001-06-26 | 2002-06-17 | 制造光盘母盘的方法 |
Country Status (9)
Country | Link |
---|---|
US (1) | US7118681B2 (zh) |
EP (1) | EP1399921B1 (zh) |
JP (1) | JP4091911B2 (zh) |
CN (1) | CN1271621C (zh) |
AT (1) | ATE421752T1 (zh) |
CA (1) | CA2451260A1 (zh) |
DE (1) | DE60230985D1 (zh) |
FR (1) | FR2826494B1 (zh) |
WO (1) | WO2003001521A2 (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4872423B2 (ja) * | 2006-04-11 | 2012-02-08 | ソニー株式会社 | 光ディスク原盤製造方法、光ディスク製造方法、光ディスク原盤製造装置 |
CN105214618B (zh) * | 2015-09-25 | 2017-06-23 | 天津大学 | 槲皮素‑海藻酸钙纳米凝胶体系及其制备方法和应用 |
CN112397097B (zh) * | 2020-11-30 | 2021-10-15 | 北京中科开迪软件有限公司 | 一种用于光盘生产的光盘压模设备及其使用方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2716563B1 (fr) * | 1994-02-21 | 1996-06-07 | Digipress Sa | Substrat préformaté, substrat préformaté comportant des informations à dupliquer, leurs procédés de fabrication et procédé de fabrication d'un disque maître et/ou d'un disque optique. |
US6030556A (en) * | 1997-07-08 | 2000-02-29 | Imation Corp. | Optical disc stampers and methods/systems for manufacturing the same |
NL1007216C2 (nl) * | 1997-10-07 | 1999-04-08 | Od & Me Bv | Werkwijze voor het vervaardigen van een stamper voor het voortbrengen van optische schijven, aldus verkregen stamper en optische schijf verkregen onder toepassing van een dergelijke stamper. |
JPH11259910A (ja) * | 1998-03-13 | 1999-09-24 | Toshiba Corp | 光ディスクおよびその原盤製造方法 |
TW525159B (en) * | 1998-05-14 | 2003-03-21 | Matsushita Electric Ind Co Ltd | Formation method for metallic stamper and metallic stamper and, manufacture method for optical disk substrate with the use of the stamper and optical disk fabricated by the manufacture method |
-
2001
- 2001-06-26 FR FR0108423A patent/FR2826494B1/fr not_active Expired - Fee Related
-
2002
- 2002-06-17 JP JP2003507818A patent/JP4091911B2/ja not_active Expired - Fee Related
- 2002-06-17 CA CA002451260A patent/CA2451260A1/fr not_active Abandoned
- 2002-06-17 CN CN02812814.1A patent/CN1271621C/zh not_active Expired - Fee Related
- 2002-06-17 EP EP02751255A patent/EP1399921B1/fr not_active Expired - Lifetime
- 2002-06-17 DE DE60230985T patent/DE60230985D1/de not_active Expired - Lifetime
- 2002-06-17 WO PCT/FR2002/002084 patent/WO2003001521A2/fr active Application Filing
- 2002-06-17 AT AT02751255T patent/ATE421752T1/de not_active IP Right Cessation
-
2003
- 2003-12-24 US US10/746,354 patent/US7118681B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US20040149678A1 (en) | 2004-08-05 |
EP1399921A2 (fr) | 2004-03-24 |
FR2826494A1 (fr) | 2002-12-27 |
WO2003001521A3 (fr) | 2003-04-03 |
FR2826494B1 (fr) | 2003-10-10 |
ATE421752T1 (de) | 2009-02-15 |
WO2003001521A2 (fr) | 2003-01-03 |
DE60230985D1 (de) | 2009-03-12 |
JP4091911B2 (ja) | 2008-05-28 |
EP1399921B1 (fr) | 2009-01-21 |
US7118681B2 (en) | 2006-10-10 |
CN1520592A (zh) | 2004-08-11 |
CA2451260A1 (fr) | 2003-01-03 |
JP2004532498A (ja) | 2004-10-21 |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: GUCICO TECHNOLOGY CO.,LTD. Free format text: FORMER OWNER: FRAN OIS - GEZAWEIAI PIOT Effective date: 20070608 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20070608 Address after: Caen, France Patentee after: Kotchka technology company Address before: French alangsong Patentee before: Francois Xavier, Piot |
|
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20060823 Termination date: 20130617 |