CN1266988C - 发生随机性流光放电等离子体的工业装置及其应用 - Google Patents
发生随机性流光放电等离子体的工业装置及其应用 Download PDFInfo
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- CN1266988C CN1266988C CNB02153179XA CN02153179A CN1266988C CN 1266988 C CN1266988 C CN 1266988C CN B02153179X A CNB02153179X A CN B02153179XA CN 02153179 A CN02153179 A CN 02153179A CN 1266988 C CN1266988 C CN 1266988C
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/48—Generating plasma using an arc
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/47—Generating plasma using corona discharges
- H05H1/475—Filamentary electrodes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0894—Processes carried out in the presence of a plasma
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2245/00—Applications of plasma devices
- H05H2245/10—Treatment of gases
- H05H2245/15—Ambient air; Ozonisers
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- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Toxicology (AREA)
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Treating Waste Gases (AREA)
- Plasma Technology (AREA)
Abstract
Description
空气流量 | 10000m3/h |
反应器 | 一段卧式线-板型湿式反应器 |
等离子体放电能量密度 | ≤0.3Wh/m3 |
等离子体放电功率 | ≤3kW |
直流高压电源 | 20-30kV,1kW |
高频交流电源 | 30kV,2kW,50kHz,方形波(如图7) |
LR匹配网 | 采用电容耦合,三组LR缓冲电路和一个耦合电容(如图2) |
反应器中气液比 | ≥2500 |
水循环量 | ≤4m3/h |
处理时间 | 1秒 |
气体流速 | 2m/s |
NOx排放浓度 | ≤0.5ppm |
碳氢化合物及硫化物排放浓度 | ≤1ppm |
烟尘排放浓度 | ≤5mg/m3 |
空气流量 | 10000m3/h |
反应器 | 二段线-筒型立式湿式反应器 |
等离子体放电能量密度 | ≤2Wh/m3 |
等离子体放电功率 | ≤20kW |
直流高压电源 | 20-30kV,8kW |
高频交流电源 | 30kV,12kW,50kHz,正弦波(如图5) |
LR匹配网 | 采用直接耦合,二组LR缓冲电路和一个隔离变压器(如图3) |
反应器中气液比 | ≥2500 |
水循环量 | ≤4m3/h |
等离子体处理时间 | 2秒 |
气体流速 | 2m/s |
VOC净化效率 | ≥90%(以25ppmC8H8为例) |
气体流量 | 5000m3/h(养鸡场等) |
反应器 | 单段线-筒型立式湿式反应器 |
等离子体放电能量密度 | ≤0.5Wh/m3 |
等离子体放电功率 | ≤2.5kW |
直流高压电源 | 20-30kV,1.0kW |
高频交流电源 | 30kV,1.5kW,30kHz,三角形波(如图6) |
LR匹配网 | 采用二极管耦合,一组LR缓冲电路和一个二极管 |
处理时间 | 1秒 |
反应器中气液比 | ≥2500 |
气体流速 | 2m/s |
水循环量 | ≤1m3/h由上下两端喷入反应器 |
气体流量 | 40000Nm3/h |
气体组分 | CO2:8%;O2:12%;H2O:20%;N2:平衡 |
气体温度 | 160-190℃ |
HCl | 300-500ppm |
NOx | 100-200ppm |
SO2 | 100-250ppm |
二恶茵 | >5ng---TEQ/Nm3 |
汞 | 0.07-0.1mg/Nm3 |
灰尘 | 10-50mg/Nm3 |
碳氢化合物 | 1000ppm |
等离子体放电功率 | ≤200kW直流+脉冲(如图8) |
等离子体放电能量密度 | ≤5Wh/Nm3 |
处理时间 | 2秒 |
气体流速 | 2m/s |
水处理量 | 50吨/小时 |
等离子体放电功率 | 2.5kW |
直流高压电源 | 20kV,1.0kW |
高频高压交流电源 | 30kV,1.5kW,30kHz,方形波 |
反应器 | 线-筒型,立式 |
干空气流量 | 1000m3/h |
臭氧浓度 | 1000ppm |
臭氧产额 | 71g/kWh |
等离子体放电功率 | 30kW |
直流电源 | 20kV,15kW |
高频高压交流电源 | 20-30kV,15kW,30kHz,正弦波 |
反应器 | 线-筒型,立式,干式 |
污泥或土壤处理量 | 40吨/天,含水20% |
等离子体放电功率 | 5kW |
直流高压电源 | 20kV,2.5kW |
高频高压交流电源 | 20-30kV,2.5kW,30kHz,脉冲 |
反应器 | 线-筒型,立式 |
Claims (12)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB02153179XA CN1266988C (zh) | 2002-11-26 | 2002-11-26 | 发生随机性流光放电等离子体的工业装置及其应用 |
PCT/CN2003/000189 WO2004049769A1 (fr) | 2002-11-26 | 2003-03-17 | Unite commerciale de generation de decharge plasma continue aleatoire et son utilisation |
CA2506787A CA2506787C (en) | 2002-11-26 | 2003-03-17 | Industrial equipment for environmental protection by random streamer discharge plasmas and its applications |
AU2003227161A AU2003227161A1 (en) | 2002-11-26 | 2003-03-17 | A commercial unit for generating random streamer discharge plasma and its use |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB02153179XA CN1266988C (zh) | 2002-11-26 | 2002-11-26 | 发生随机性流光放电等离子体的工业装置及其应用 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1502402A CN1502402A (zh) | 2004-06-09 |
CN1266988C true CN1266988C (zh) | 2006-07-26 |
Family
ID=32331918
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB02153179XA Expired - Lifetime CN1266988C (zh) | 2002-11-26 | 2002-11-26 | 发生随机性流光放电等离子体的工业装置及其应用 |
Country Status (4)
Country | Link |
---|---|
CN (1) | CN1266988C (zh) |
AU (1) | AU2003227161A1 (zh) |
CA (1) | CA2506787C (zh) |
WO (1) | WO2004049769A1 (zh) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1316857C (zh) * | 2004-09-08 | 2007-05-16 | 大连理工大学 | 介质阻挡放电诱导半导体光催化处理有机废水方法及设备 |
DE102005028024A1 (de) * | 2005-06-16 | 2006-12-28 | Siemens Ag | Verfahren und Vorrichtung zur Erzeugung großflächiger Atmosphärendruck-Plasmen |
EP2326151A1 (fr) * | 2009-11-24 | 2011-05-25 | AGC Glass Europe | Procédé et dispositif de polarisation d'une électrode DBD |
CN101716451B (zh) * | 2009-12-29 | 2012-12-19 | 北京航空航天大学 | 放电等离子体与吸收相结合脱除烟气中多种污染物的方法 |
CN102969886A (zh) * | 2012-11-25 | 2013-03-13 | 沈阳一特电工有限公司 | 等离子体制粉弧源 |
CN104437040B (zh) * | 2014-12-16 | 2017-01-04 | 江苏国苏检测有限公司 | 基于介质阻挡放电反应器的氮氧化物脱除装置及其脱除方法 |
US11629860B2 (en) | 2018-07-17 | 2023-04-18 | Transient Plasma Systems, Inc. | Method and system for treating emissions using a transient pulsed plasma |
WO2020018327A1 (en) | 2018-07-17 | 2020-01-23 | Transient Plasma Systems, Inc. | Method and system for treating cooking smoke emissions using a transient pulsed plasma |
US11696388B2 (en) | 2019-05-07 | 2023-07-04 | Transient Plasma Systems, Inc. | Pulsed non-thermal atmospheric pressure plasma processing system |
CN110124480A (zh) * | 2019-05-13 | 2019-08-16 | 山西晋浙环保科技有限公司 | 一种基于燃煤电厂的流光放电等离子电除尘改造方法 |
EP4302403A1 (en) | 2021-03-03 | 2024-01-10 | Transient Plasma Systems, Inc. | Apparatus and methods of detecting transient discharge modes and/or closed loop control of pulsed systems employing same |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3095259B2 (ja) * | 1991-07-16 | 2000-10-03 | 彰 水野 | Noの酸化除去方法 |
AU729396B2 (en) * | 1996-04-04 | 2001-02-01 | Mitsubishi Heavy Industries, Ltd. | Apparatus and method for treating exhaust gas and pulse generator used therefor |
JP2000126542A (ja) * | 1998-10-22 | 2000-05-09 | Mitsubishi Heavy Ind Ltd | プラズマ排ガス処理設備及びガス反応促進設備 |
CN2405398Y (zh) * | 2000-01-26 | 2000-11-08 | 朱益民 | 正高压直流流光放电等离子体源装置 |
-
2002
- 2002-11-26 CN CNB02153179XA patent/CN1266988C/zh not_active Expired - Lifetime
-
2003
- 2003-03-17 WO PCT/CN2003/000189 patent/WO2004049769A1/zh not_active Application Discontinuation
- 2003-03-17 CA CA2506787A patent/CA2506787C/en not_active Expired - Lifetime
- 2003-03-17 AU AU2003227161A patent/AU2003227161A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
CA2506787C (en) | 2012-02-21 |
AU2003227161A1 (en) | 2004-06-18 |
CN1502402A (zh) | 2004-06-09 |
CA2506787A1 (en) | 2004-06-10 |
WO2004049769A1 (fr) | 2004-06-10 |
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