CN1238203C - 平版印刷版 - Google Patents
平版印刷版 Download PDFInfo
- Publication number
- CN1238203C CN1238203C CN 01115736 CN01115736A CN1238203C CN 1238203 C CN1238203 C CN 1238203C CN 01115736 CN01115736 CN 01115736 CN 01115736 A CN01115736 A CN 01115736A CN 1238203 C CN1238203 C CN 1238203C
- Authority
- CN
- China
- Prior art keywords
- plate
- style
- lithographic
- processing
- aluminium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000007639 printing Methods 0.000 title claims abstract description 52
- 229910052782 aluminium Inorganic materials 0.000 claims description 87
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 87
- 238000012545 processing Methods 0.000 claims description 67
- 239000004411 aluminium Substances 0.000 claims description 63
- 238000005260 corrosion Methods 0.000 claims description 42
- 230000007797 corrosion Effects 0.000 claims description 42
- 239000003518 caustics Substances 0.000 claims description 41
- 238000009749 continuous casting Methods 0.000 claims description 39
- 238000003490 calendering Methods 0.000 claims description 29
- 238000005097 cold rolling Methods 0.000 claims description 22
- 238000005098 hot rolling Methods 0.000 claims description 10
- 238000000034 method Methods 0.000 description 60
- 238000005266 casting Methods 0.000 description 30
- 239000011347 resin Substances 0.000 description 21
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- -1 poly hydroxyl compound Chemical class 0.000 description 20
- 238000005868 electrolysis reaction Methods 0.000 description 15
- 238000005096 rolling process Methods 0.000 description 15
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- 239000003513 alkali Substances 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 11
- HEMHJVSKTPXQMS-UHFFFAOYSA-M sodium hydroxide Inorganic materials [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 11
- 239000007864 aqueous solution Substances 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 10
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- 150000000181 1,2-naphthoquinones Chemical class 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 8
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- 239000000463 material Substances 0.000 description 6
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- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
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- 229920000178 Acrylic resin Polymers 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical group [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 241000233855 Orchidaceae Species 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 150000001241 acetals Chemical class 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
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- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000005242 forging Methods 0.000 description 2
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
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- 238000003384 imaging method Methods 0.000 description 2
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- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
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- HBGPNLPABVUVKZ-POTXQNELSA-N (1r,3as,4s,5ar,5br,7r,7ar,11ar,11br,13as,13br)-4,7-dihydroxy-3a,5a,5b,8,8,11a-hexamethyl-1-prop-1-en-2-yl-2,3,4,5,6,7,7a,10,11,11b,12,13,13a,13b-tetradecahydro-1h-cyclopenta[a]chrysen-9-one Chemical compound C([C@@]12C)CC(=O)C(C)(C)[C@@H]1[C@H](O)C[C@]([C@]1(C)C[C@@H]3O)(C)[C@@H]2CC[C@H]1[C@@H]1[C@]3(C)CC[C@H]1C(=C)C HBGPNLPABVUVKZ-POTXQNELSA-N 0.000 description 1
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- SYRBOMODLUADBZ-RNIAWFEPSA-N 1-[(E)-[(E)-(2-hydroxynaphthalen-1-yl)methylidenehydrazinylidene]methyl]naphthalen-2-ol Chemical compound N(\N=C\C1=C(C=CC2=CC=CC=C12)O)=C/C1=C(C=CC2=CC=CC=C12)O SYRBOMODLUADBZ-RNIAWFEPSA-N 0.000 description 1
- PFRGGOIBYLYVKM-UHFFFAOYSA-N 15alpha-hydroxylup-20(29)-en-3-one Natural products CC(=C)C1CCC2(C)CC(O)C3(C)C(CCC4C5(C)CCC(=O)C(C)(C)C5CCC34C)C12 PFRGGOIBYLYVKM-UHFFFAOYSA-N 0.000 description 1
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- WFKAJVHLWXSISD-UHFFFAOYSA-N isobutyramide Chemical compound CC(C)C(N)=O WFKAJVHLWXSISD-UHFFFAOYSA-N 0.000 description 1
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- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
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Images
Landscapes
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Abstract
Description
铝压沿板的铸造方法 | 平版印刷版用作里面的面 | 里面的表面处理 | 里面式样的视认性 | |
实施例1 | 双辊连续铸造 | 铸造下面 | 碱腐蚀+脱除污物 | 良好 |
实施例2 | 双辊连续铸造 | 铸造上面 | 碱腐蚀+脱除污物 | 稍差良好 |
实施例3 | 双带连续铸造 | 铸造下面 | 碱腐蚀+脱除污物 | 良好 |
实施例4 | 双辊连续铸造 | 铸造上面 | 碱腐蚀+脱除污物 | 良好 |
比较例1 | 双辊连续铸造 | 铸造下面 | 无 | 不好 |
比较例2 | 双辊连续铸造 | 铸造上面 | 无 | 不好 |
比较例3 | DC铸造 | - | 碱腐蚀+脱除污物 | 不好 |
比较例4 | DC铸造 | - | 无 | 不好 |
Claims (3)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000270137 | 2000-09-06 | ||
JP2000270137A JP4201469B2 (ja) | 2000-09-06 | 2000-09-06 | 平版印刷版用支持体の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1341517A CN1341517A (zh) | 2002-03-27 |
CN1238203C true CN1238203C (zh) | 2006-01-25 |
Family
ID=18756630
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN 01115736 Expired - Lifetime CN1238203C (zh) | 2000-09-06 | 2001-05-31 | 平版印刷版 |
Country Status (2)
Country | Link |
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JP (1) | JP4201469B2 (zh) |
CN (1) | CN1238203C (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7442491B2 (en) | 2005-03-17 | 2008-10-28 | Fujifilm Corporation | Aluminum alloy blank for lithographic printing plate and support for lithographic printing plate |
JP4616128B2 (ja) * | 2005-08-31 | 2011-01-19 | 富士フイルム株式会社 | 平版印刷版用支持体 |
CN102517547B (zh) * | 2011-12-26 | 2013-06-19 | 湖南省岩田新材料科技有限公司 | 连续铝卷板表面真空气相沉积法镀覆铝膜或铝锡合金膜的方法 |
-
2000
- 2000-09-06 JP JP2000270137A patent/JP4201469B2/ja not_active Expired - Lifetime
-
2001
- 2001-05-31 CN CN 01115736 patent/CN1238203C/zh not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CN1341517A (zh) | 2002-03-27 |
JP4201469B2 (ja) | 2008-12-24 |
JP2002079770A (ja) | 2002-03-19 |
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