CN1226740A - Plasma processing apparatus - Google Patents
Plasma processing apparatus Download PDFInfo
- Publication number
- CN1226740A CN1226740A CN98126553A CN98126553A CN1226740A CN 1226740 A CN1226740 A CN 1226740A CN 98126553 A CN98126553 A CN 98126553A CN 98126553 A CN98126553 A CN 98126553A CN 1226740 A CN1226740 A CN 1226740A
- Authority
- CN
- China
- Prior art keywords
- plasma
- semiconductor wafer
- parallel
- extension member
- plasma processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32715—Workpiece holder
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Drying Of Semiconductors (AREA)
- Plasma Technology (AREA)
- ing And Chemical Polishing (AREA)
Abstract
Description
Claims (7)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP357542/97 | 1997-12-25 | ||
JP9357542A JPH11186238A (en) | 1997-12-25 | 1997-12-25 | Plasma processor |
JP357542/1997 | 1997-12-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1226740A true CN1226740A (en) | 1999-08-25 |
CN1154161C CN1154161C (en) | 2004-06-16 |
Family
ID=18454669
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB981265537A Expired - Fee Related CN1154161C (en) | 1997-12-25 | 1998-12-25 | Plasma processing apparatus |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPH11186238A (en) |
KR (1) | KR100309524B1 (en) |
CN (1) | CN1154161C (en) |
TW (1) | TW442867B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100405557C (en) * | 2002-07-05 | 2008-07-23 | 东京毅力科创株式会社 | Plasma treatment device |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04196319A (en) * | 1990-11-28 | 1992-07-16 | Toshiba Corp | Discharge treatment device |
JP3210207B2 (en) * | 1994-04-20 | 2001-09-17 | 東京エレクトロン株式会社 | Plasma processing equipment |
-
1997
- 1997-12-25 JP JP9357542A patent/JPH11186238A/en active Pending
-
1998
- 1998-12-19 TW TW087121261A patent/TW442867B/en not_active IP Right Cessation
- 1998-12-23 KR KR1019980057465A patent/KR100309524B1/en not_active IP Right Cessation
- 1998-12-25 CN CNB981265537A patent/CN1154161C/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100405557C (en) * | 2002-07-05 | 2008-07-23 | 东京毅力科创株式会社 | Plasma treatment device |
Also Published As
Publication number | Publication date |
---|---|
KR100309524B1 (en) | 2002-04-24 |
CN1154161C (en) | 2004-06-16 |
JPH11186238A (en) | 1999-07-09 |
KR19990063352A (en) | 1999-07-26 |
TW442867B (en) | 2001-06-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C06 | Publication | ||
PB01 | Publication | ||
ASS | Succession or assignment of patent right |
Owner name: NEC ELECTRONICS TAIWAN LTD. Free format text: FORMER OWNER: NIPPON ELECTRIC CO., LTD. Effective date: 20030410 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20030410 Address after: Kanagawa, Japan Applicant after: NEC Corp. Address before: Tokyo, Japan Applicant before: NEC Corp. |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
REG | Reference to a national code |
Ref country code: HK Ref legal event code: GR Ref document number: 1040810 Country of ref document: HK |
|
C19 | Lapse of patent right due to non-payment of the annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |