CN1224238A - 粘合片材 - Google Patents

粘合片材 Download PDF

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CN1224238A
CN1224238A CN99100322A CN99100322A CN1224238A CN 1224238 A CN1224238 A CN 1224238A CN 99100322 A CN99100322 A CN 99100322A CN 99100322 A CN99100322 A CN 99100322A CN 1224238 A CN1224238 A CN 1224238A
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松本正利
小池贡
丸桥仁
峰浦芳久
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Lintec Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01ELECTRIC ELEMENTS
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Abstract

本发明涉及一种用于半导体晶片加工的粘合片材,所述粘合片材由剥离衬、粘合剂层和基膜组成,它们按上述顺序叠层,该粘合片材具有大的长度,并被折叠成之字形,且每一段的长度相同,使各段都精确地相互叠加在一起。

Description

粘合片材
本发明涉及一种粘合片材,该片材具有基膜,该基膜上按顺序叠层有粘合剂层和剥离衬。更具体而言,本发明涉及一种长条状的粘合片材,该片材被折叠成之字形,且每一段的长度相同,使各段都精确地相互叠加在一起。
在制造半导体的过程中,目前在抛光晶片底侧的阶段需要使用粘合片材来保护半导体晶片的电路形成侧;而在切割晶片阶段,目前使用粘合片材将半导体晶片固定在用于切割晶片的环形框架上。在使用粘合片材用于保护目的的前一种情况,从粘合片材上切取一些与半导体晶片相同形状的片。在使用粘合片材用于切割晶片的后一种情况,则从粘合片材上切取圆形片,该片的直径包括环形框架的直径以及粘贴边缘。
对于切取用于保护或切割晶片的粘合片材,已知有两种方法:一种方法是预切法,其中事先将基膜打孔,该基膜上有被剥离衬保护的粘合剂层,这样,形成一系列具有所希望形状的基膜片,然后通过粘合剂层层压在剥离衬上;另一种方法是分批切割法,其中制备一卷长的粘合片材,并不切去任何不需要的部分,然后在使用时用刀具切去不需要的部分,而留下需要的部分。分批切割法需要送入粘合片材使其有足够的长度用于切割操作。因为相应于该送入长度的部分是无用的,所以每个硅片需要的粘合片材面积变大。因此,分批切割法在生产率方面较差。
根据预切法,在制造半导体过程中所使用的粘合片材具有树脂基膜,该基膜通过粘合剂层层压在长条状的剥离衬上,通过如冲模刀具由基膜侧切入至剥离衬表面中,然后将不需要部分的基膜与粘合剂层一起从剥离衬上除去,仅留下在剥离衬上需要部分的基膜及其覆盖的粘合剂层(以下称“粘合膜”)。
在储存如此制成的长条状粘合片材时,片材被适当地切成短条状粘合片材,然后将这些条相互叠放在一起。另一中储存方法是,将制得的长条状粘合片材缠绕成卷状。在制造半导体的实际使用时,例如切割晶片阶段时,将经预切的粘合膜从剥离衬上剥离开,然后贴在半导体片等上。
但是,如果作为最终产品的粘合片材是卷状的粘合片材,且其仅具有在剥离衬上的预切粘合膜,则会经常发生以下问题:(ⅰ)缠绕的粘合片材每一圈滑开形成竹笋状,(ⅱ)由于缠绕压力,粘合剂从粘合膜中被挤出至芯附近;和/或(ⅲ)粘合膜表面随着缠绕直径的增加而变得粗糙,这是因为粘合膜不能叠加,而是相互重叠,并带有相互外形的印迹,由此导致切割时晶片的倾斜或损坏。在此情况下有可能制造出次品。
如果因此使缠绕压力降低,则很难在运输或者使用时使粘合片材保持卷状,这样,对缠绕压力的控制是非常麻烦的。另一方面,如果将从滑开的卷状粘合片材上剥离下来的粘合膜施加在基底上,则会经常发生在将粘合膜剥离时在基底上留下一些粘合剂的情况。此等留在基底上的外来物质被称为粘合剂沉积物。粘合剂沉积物的产生对粘合片材是致命性的缺陷,特别是在将粘合片材用于制造半导体时。
如果以卷状储存经预切的粘合片材,其缺陷是在片材卷的两侧在切除粘合膜时所形成的间隙中堆积灰尘。如果经预切的粘合片材的储存和运输状态是将其切成相同的片,使每一片都具有一个粘合膜,然后将这些片相互叠放在一起,则也会产生上述相同的问题。除灰尘的问题外,相互叠放的片材片具有难以自动地将它们送至半导体晶片的缺陷。
因此,在粘合片材中预切至粘合膜的深度后,就使粘合片材出厂,但不从其上除去粘合膜的不需要部分,然后放置在使用者处置处。但是,在此情况下,已切开的粘合剂层的需要和不需要部分重新在缠绕压力下随时间而相互粘结在一起。因此,在使用时从粘合片材上容易并精确地仅剥离粘合膜的需要部分是不可能的。
所以,实际上在需要部分和不需要部分的边界还要将粘合膜切去适当的宽度。即使在此情况下将粘合片材缠绕成卷状或者切成相等的片并叠放,缠绕或者叠加压力不会集中在粘合片材的特定部分上;其结果是,粘合片材的需要部分既不会受到损坏也不会发生变形,而且防止了粘合剂层被挤出。在此情况下,必须将粘合膜的需要部分从剥离衬剥离开。
另外,以卷或者叠加状态储存的粘合片材不会粘结灰尘,这是因为在侧部没有间隙。
但是,此等类型的粘合片材经常发生以下现象:在其制造过程中,在除去需要部分和不需要部分之边界上的粘合膜时,粘合膜部分脱层,甚至于仅有部分留在剥离衬上。这种现象使得难以连续生产该类型的粘合片材。另外,必须处置作为废物的不需要部分。
近些年来,降低废物量的趋势得到加强,以符合ISO 14001,因此,在以卷状使粘合片材出厂时,卷筒芯的回收和再利用则开始成为必须的。这又增加了新的生产成本。
为提供具有高生产率的长条状粘合片材,而且该片材可降低使用者的废物处置强度,而且无压力使粘合剂层渗出,本发明的发明者进行了深入的研究,其结果是发现使用以下长条状粘合片材可得到良好的效果,所述片材不是缠绕成卷状,而是被折叠成之字形,且每一段的长度相同,使各段都精确地相互叠加在一起,由此完成本发明。
因此,本发明的目的是提供一种具有优异性质并确保高工作效率的粘合片材。
本发明的上述目的是通过以下用于半导体晶片加工的粘合片材而实现的,所述粘合片材由剥离衬、粘合剂层和基膜组成,它们按上述顺序叠层,该粘合片材具有大的长度,并被折叠成之字形,且每一段的长度相同,使各段都精确地相互叠加在一起。
附图简要说明:
图1是显示本发明粘合片材之一部分的截面图,其中,粘合膜的不需要部分被除去,而粘合膜的需要部分保留在剥离衬上。
图2是显示根据本发明之粘合片材的示意图。
这些图中的数字分别代表以下部件:
1、剥离层
2、粘合剂层
3、基膜
4、粘合膜(由基膜和粘合剂层组成的层压物)
本发明中所用的基膜可适当地从通常用作粘合片材之基膜的树脂膜中选择,其包括聚乙烯(PE)膜、聚氯乙烯(PVC)膜、聚对苯二甲酸乙二醇酯(PET)膜、乙烯-(甲基)丙烯酸共聚物膜、聚氨酯膜等。
本发明中所用的粘合剂可从已知的粘合剂中适当地选择。在制造半导体的过程中使用粘合片材时,粘合剂必须不含有易于污染半导体的离子性物质。因此,特别希望的是从丙烯酸粘合剂、硅氧烷粘合剂或橡胶粘合剂中选择粘合剂。
本发明中也可使用在紫外光、电子束等照射下固化的粘合剂组合物(所谓的照射固化粘合剂组合物)。通常的可照射固化的粘合剂组合物包括具有相对较低分子量、特别是重均分子量为10000或更低的可照射聚合的化合物,这样,在将其上具有此等粘合剂形成的粘合剂层的粘合片材缠绕成卷状时,该粘合剂易于被挤出。另一方面,如果根据本发明将粘合片材折叠成之字形,则可防止该粘合剂被挤出。因此,本发明在使用可照射固化的粘合剂组合物时具有明显的优势。
本发明中所用的剥离衬可从已知的物质中适当地选择。如果在制造半导体的过程中使用粘合片材,而所述半导体易于被灰尘损坏,则希望剥离衬是用脱模剂处理过的树脂膜。此等树脂膜的合适例子包括聚丙烯膜和聚对苯二甲酸乙二醇酯膜。
根据本发明的粘合片材可容易地通过以下方法制得:在基膜表面涂敷粘合剂层,将粘合剂层放置在剥离衬之经脱模剂涂敷的表面上,然后以已知的方法例如在相同间隔处打孔,将其折叠成之字形,且每一段的长度相同,使各段都精确地相互叠加在一起。另外,也可将粘合剂涂敷在剥离衬之经脱模剂涂敷的表面上成层状,然后将基膜放置在粘合剂层上。基膜的合适厚度是50-300μm,粘合剂层的厚度为10-50μm,而剥离衬的厚度为25-50μm。
本发明对剥离衬上的粘合膜的形状没有具体的限制,但预先切割粘合膜,使得如图1所示,仅其具有所希望形状的需要部分保留在剥离衬上,或者至少需要区域和不需要区域之间的边界部分被从粘合膜中切除,使得粘合膜的需要区域易于从剥离衬上剥离下来。
另外,剥离衬可在两侧以规则间隔打孔,以在使用时易于送料。
本发明的粘合片材可按折叠成之字形的状态提供给使用者,并因而与成卷状供料相反,不需要芯;其结果是,与常规将卷筒芯作为废物弃置的情况相比,本发明的粘合片材没有增加回收和再利用卷筒芯的新成本,而且能够大大降低废物。
因为将根据本发明的粘合片材折叠成之字形,储存期间其上施加的压力总是均匀的,而且即使当该粘合片材是预切状态下的,叠加放置的粘合膜不会偏离叠加位置;其结果是,所得的粘合膜具有良好的性质。例如,在将本发明的粘合膜粘贴在晶片上后,在底侧抛光晶片或者切割晶片时,粘合膜不会留下粘合剂。因此,本发明的粘合片材特别适于用作制造半导体过程中所用的粘合片材。
以下将参考实施例更为具体地描述本发明,但应理解的是,该实施例并不是用于限制本发明的范围。实施例
如下制备可紫外固化的粘合剂:在100重量份由97重量份丙烯酸丁酯和3重量份丙烯酸组成的共聚物中加入100重量份重均分子量为约9000的尿烷丙烯酸酯和4重量份作为光聚合引发剂的二苯酮。
将如此制得的丙烯酸粘合剂在宽度为220mm、厚度为38μm的长聚酯片材(剥离衬)的剥离表面上涂敷成25μm厚的层(粘合剂层2),而所述聚酯片材已用硅氧烷脱模剂进行过处理。在所述粘合剂层上层压厚度为80μm的软聚氯乙烯膜(基膜3)。然后在基膜和粘合剂层的层压物(粘合膜4)中形成直径为208mm的环形切口,并使其均匀,接着从剥离衬上除去粘合膜中不需要的部分(见图1)。
而且,在已除去不需要部分的粘合膜的剥离衬上打孔,然后如图2所示,在打孔处将该片材折叠成之字形,其中每一段是相同的,由此制成根据本发明的粘合片材。在此,打孔的位置应使仍保留在剥离衬上的环形粘合膜(需要部分)精确地相互叠加在一起。
将粘合片材折叠成一百折,在此状态下储存2个月进行观察,证实粘合片材不仅在基膜表面上没有弓形印迹,而且粘合剂也没有被从粘合膜中挤出。将如此储存的粘合膜粘贴在半导体晶片上,然后将所得晶片用于其加工处理中。在此,粘合膜的适用性是良好的。用紫外光照射使粘合剂固化后,将粘合膜从晶片上剥离下来,在晶片上没有粘合剂污染物存留。

Claims (3)

1、一种用于半导体晶片加工的粘合片材,所述粘合片材由剥离衬、粘合剂层和基膜组成,它们按上述顺序叠层,该粘合片材具有大的长度,并被折叠成之字形,且每一段的长度相同,使各段都精确地相互叠加在一起。
2、如权利要求1所述的粘合片材,其中,所述基膜和叠层在基膜下的粘合剂层成形为所需要的形状。
3、如权利要求1或2所述的粘合片材,其中,所述粘合剂是可照射固化的粘合剂组合物。
CNB991003225A 1998-01-21 1999-01-20 粘合片材 Expired - Fee Related CN1214457C (zh)

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JP23948/98 1998-01-21
JP23948/1998 1998-01-21
JP02394898A JP3903447B2 (ja) 1998-01-21 1998-01-21 粘着シート

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CN1224238A true CN1224238A (zh) 1999-07-28
CN1214457C CN1214457C (zh) 2005-08-10

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AT (1) ATE272101T1 (zh)
DE (1) DE69918872T2 (zh)
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CN111655470A (zh) * 2018-01-24 2020-09-11 琳得科株式会社 长条层叠片及其卷料

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KR20020061737A (ko) * 2001-01-17 2002-07-25 삼성전자 주식회사 반도체 제조장치 및 반도체 제조장치의 웨이퍼 가공방법
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Publication number Priority date Publication date Assignee Title
CN100426451C (zh) * 2004-01-23 2008-10-15 株式会社东芝 剥离装置和剥离方法
CN111655470A (zh) * 2018-01-24 2020-09-11 琳得科株式会社 长条层叠片及其卷料

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EP0932196B1 (en) 2004-07-28
EP0932196A2 (en) 1999-07-28
JPH11209703A (ja) 1999-08-03
CN1214457C (zh) 2005-08-10
EP0932196A3 (en) 2000-05-17
KR100570549B1 (ko) 2006-04-12
ATE272101T1 (de) 2004-08-15
DE69918872D1 (de) 2004-09-02
TW402771B (en) 2000-08-21
KR19990068024A (ko) 1999-08-25
US6235366B1 (en) 2001-05-22
JP3903447B2 (ja) 2007-04-11
DE69918872T2 (de) 2005-01-20
SG101919A1 (en) 2004-02-27

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