CN121285611A - 保存稳定性优异的研磨用组合物及其制造方法 - Google Patents

保存稳定性优异的研磨用组合物及其制造方法

Info

Publication number
CN121285611A
CN121285611A CN202480038208.4A CN202480038208A CN121285611A CN 121285611 A CN121285611 A CN 121285611A CN 202480038208 A CN202480038208 A CN 202480038208A CN 121285611 A CN121285611 A CN 121285611A
Authority
CN
China
Prior art keywords
silica
dispersion
silica particle
exchange resin
mass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202480038208.4A
Other languages
English (en)
Chinese (zh)
Inventor
石岛响
海老原结女
三井滋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Chemical Corp
Original Assignee
Nissan Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PCT/JP2023/035232 external-priority patent/WO2025069272A1/ja
Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Publication of CN121285611A publication Critical patent/CN121285611A/zh
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
CN202480038208.4A 2023-09-27 2024-09-27 保存稳定性优异的研磨用组合物及其制造方法 Pending CN121285611A (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JPPCT/JP2023/035232 2023-09-27
PCT/JP2023/035232 WO2025069272A1 (ja) 2023-09-27 2023-09-27 保存安定性に優れた研磨用組成物及びその製造方法
PCT/JP2024/019443 WO2025069562A1 (ja) 2023-09-27 2024-05-27 保存安定性に優れた研磨用組成物及びその製造方法
JPPCT/JP2024/019443 2024-05-27
PCT/JP2024/034606 WO2025070705A1 (ja) 2023-09-27 2024-09-27 保存安定性に優れた研磨用組成物及びその製造方法

Publications (1)

Publication Number Publication Date
CN121285611A true CN121285611A (zh) 2026-01-06

Family

ID=95201693

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202480038208.4A Pending CN121285611A (zh) 2023-09-27 2024-09-27 保存稳定性优异的研磨用组合物及其制造方法

Country Status (5)

Country Link
US (1) US20260117105A1 (https=)
JP (1) JP7799249B2 (https=)
KR (1) KR20250111242A (https=)
CN (1) CN121285611A (https=)
WO (1) WO2025070705A1 (https=)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6506913B2 (ja) 2014-03-31 2019-04-24 ニッタ・ハース株式会社 研磨用組成物及び研磨方法
JP6589622B2 (ja) * 2015-12-22 2019-10-16 日立化成株式会社 研磨液、研磨方法、半導体基板及び電子機器
WO2018012174A1 (ja) * 2016-07-15 2018-01-18 株式会社フジミインコーポレーテッド 研磨用組成物、研磨用組成物の製造方法および研磨方法
JP7061966B2 (ja) 2016-12-22 2022-05-02 ニッタ・デュポン株式会社 研磨用組成物
KR102508180B1 (ko) * 2016-12-28 2023-03-09 니타 듀퐁 가부시키가이샤 연마용 조성물 및 연마 방법
KR102107089B1 (ko) * 2018-11-01 2020-05-06 닛산 가가쿠 가부시키가이샤 수친화성이 높은 연마입자를 이용한 연마용 조성물
JPWO2020262628A1 (https=) * 2019-06-27 2020-12-30
KR20240130728A (ko) * 2021-12-23 2024-08-29 후소카가쿠코교 가부시키가이샤 콜로이달실리카 및 그 제조 방법

Also Published As

Publication number Publication date
JPWO2025070705A1 (https=) 2025-04-03
US20260117105A1 (en) 2026-04-30
KR20250111242A (ko) 2025-07-22
JP7799249B2 (ja) 2026-01-15
WO2025070705A1 (ja) 2025-04-03
TW202523816A (zh) 2025-06-16

Similar Documents

Publication Publication Date Title
JP6520711B2 (ja) スラリー、研磨液セット、研磨液及び基体の研磨方法
US12227674B2 (en) Polishing composition comprising polishing particles having high water affinity
EP2260013B1 (en) Ceria material and method of forming same
TW201606064A (zh) 膠態氧化矽化學機械拋光濃縮物
CN114026195A (zh) 含有碱性物质的使用了亲水性高的研磨粒子的研磨用组合物
JP6428625B2 (ja) スラリー、研磨液セット、研磨液、及び、基体の研磨方法
TWI804488B (zh) 研磨劑、研磨劑用儲存液及研磨方法
JP2018012752A (ja) 研磨剤、研磨剤用貯蔵液及び研磨方法
JP7799249B2 (ja) 保存安定性に優れた研磨用組成物及びその製造方法
TWI920750B (zh) 研磨用組成物及其製造方法
WO2025069562A1 (ja) 保存安定性に優れた研磨用組成物及びその製造方法
JP7487507B2 (ja) 研磨剤及び研磨方法
TWI692510B (zh) 用於拋光記憶體硬碟以展現減少之表面刮痕之組合物及方法
WO2025244080A1 (ja) シリカ粒子と塩基性アルミニウム塩水溶液とを含む分散液、及び研磨用組成物
JP7491397B2 (ja) 研磨液及び研磨方法
TW202605088A (zh) 含矽石粒子與鹼性鋁鹽水溶液之分散液，及研磨用組成物

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination