JPWO2025070705A1 - - Google Patents

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Publication number
JPWO2025070705A1
JPWO2025070705A1 JP2025520178A JP2025520178A JPWO2025070705A1 JP WO2025070705 A1 JPWO2025070705 A1 JP WO2025070705A1 JP 2025520178 A JP2025520178 A JP 2025520178A JP 2025520178 A JP2025520178 A JP 2025520178A JP WO2025070705 A1 JPWO2025070705 A1 JP WO2025070705A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2025520178A
Other languages
Japanese (ja)
Other versions
JP7799249B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PCT/JP2023/035232 external-priority patent/WO2025069272A1/ja
Application filed filed Critical
Publication of JPWO2025070705A1 publication Critical patent/JPWO2025070705A1/ja
Application granted granted Critical
Publication of JP7799249B2 publication Critical patent/JP7799249B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
JP2025520178A 2023-09-27 2024-09-27 保存安定性に優れた研磨用組成物及びその製造方法 Active JP7799249B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JPPCT/JP2023/035232 2023-09-27
PCT/JP2023/035232 WO2025069272A1 (ja) 2023-09-27 2023-09-27 保存安定性に優れた研磨用組成物及びその製造方法
PCT/JP2024/019443 WO2025069562A1 (ja) 2023-09-27 2024-05-27 保存安定性に優れた研磨用組成物及びその製造方法
JPPCT/JP2024/019443 2024-05-27
PCT/JP2024/034606 WO2025070705A1 (ja) 2023-09-27 2024-09-27 保存安定性に優れた研磨用組成物及びその製造方法

Publications (2)

Publication Number Publication Date
JPWO2025070705A1 true JPWO2025070705A1 (https=) 2025-04-03
JP7799249B2 JP7799249B2 (ja) 2026-01-15

Family

ID=95201693

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2025520178A Active JP7799249B2 (ja) 2023-09-27 2024-09-27 保存安定性に優れた研磨用組成物及びその製造方法

Country Status (5)

Country Link
US (1) US20260117105A1 (https=)
JP (1) JP7799249B2 (https=)
KR (1) KR20250111242A (https=)
CN (1) CN121285611A (https=)
WO (1) WO2025070705A1 (https=)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017117894A (ja) * 2015-12-22 2017-06-29 日立化成株式会社 研磨液、研磨方法、半導体基板及び電子機器
WO2018012174A1 (ja) * 2016-07-15 2018-01-18 株式会社フジミインコーポレーテッド 研磨用組成物、研磨用組成物の製造方法および研磨方法
WO2018116890A1 (ja) * 2016-12-22 2018-06-28 ニッタ・ハース株式会社 研磨用組成物
WO2018124229A1 (ja) * 2016-12-28 2018-07-05 ニッタ・ハース株式会社 研磨用組成物及び研磨方法
WO2020091000A1 (ja) * 2018-11-01 2020-05-07 日産化学株式会社 水親和性の高い研磨粒子を用いた研磨用組成物
WO2020262628A1 (ja) * 2019-06-27 2020-12-30 日産化学株式会社 塩基性物質を含有する水親和性の高い研磨粒子を用いた研磨用組成物
WO2023119549A1 (ja) * 2021-12-23 2023-06-29 扶桑化学工業株式会社 コロイダルシリカ及びその製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6506913B2 (ja) 2014-03-31 2019-04-24 ニッタ・ハース株式会社 研磨用組成物及び研磨方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017117894A (ja) * 2015-12-22 2017-06-29 日立化成株式会社 研磨液、研磨方法、半導体基板及び電子機器
WO2018012174A1 (ja) * 2016-07-15 2018-01-18 株式会社フジミインコーポレーテッド 研磨用組成物、研磨用組成物の製造方法および研磨方法
WO2018116890A1 (ja) * 2016-12-22 2018-06-28 ニッタ・ハース株式会社 研磨用組成物
WO2018124229A1 (ja) * 2016-12-28 2018-07-05 ニッタ・ハース株式会社 研磨用組成物及び研磨方法
WO2020091000A1 (ja) * 2018-11-01 2020-05-07 日産化学株式会社 水親和性の高い研磨粒子を用いた研磨用組成物
WO2020262628A1 (ja) * 2019-06-27 2020-12-30 日産化学株式会社 塩基性物質を含有する水親和性の高い研磨粒子を用いた研磨用組成物
WO2023119549A1 (ja) * 2021-12-23 2023-06-29 扶桑化学工業株式会社 コロイダルシリカ及びその製造方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
MACKAY, R. ET AL., COLLOIDS AND SURFACES A: PHYSICOCHEM. ENG. ASPECTS, vol. 250, JPN6022007637, 2004, pages 343 - 348, ISSN: 0005643626 *

Also Published As

Publication number Publication date
US20260117105A1 (en) 2026-04-30
CN121285611A (zh) 2026-01-06
KR20250111242A (ko) 2025-07-22
JP7799249B2 (ja) 2026-01-15
WO2025070705A1 (ja) 2025-04-03
TW202523816A (zh) 2025-06-16

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