CN120917899A - 半导体装置 - Google Patents

半导体装置

Info

Publication number
CN120917899A
CN120917899A CN202380096942.1A CN202380096942A CN120917899A CN 120917899 A CN120917899 A CN 120917899A CN 202380096942 A CN202380096942 A CN 202380096942A CN 120917899 A CN120917899 A CN 120917899A
Authority
CN
China
Prior art keywords
transistor
power line
power supply
tvdd
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202380096942.1A
Other languages
English (en)
Chinese (zh)
Inventor
武野纮宜
王文桢
冈本淳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Socionext Inc
Original Assignee
Socionext Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Socionext Inc filed Critical Socionext Inc
Publication of CN120917899A publication Critical patent/CN120917899A/zh
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/90Masterslice integrated circuits
    • H10D84/903Masterslice integrated circuits comprising field effect technology
    • H10D84/907CMOS gate arrays
    • H10D84/968Macro-architecture
    • H10D84/974Layout specifications, i.e. inner core regions
    • H10D84/981Power supply lines
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01Manufacture or treatment
    • H10D84/02Manufacture or treatment characterised by using material-based technologies
    • H10D84/03Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
    • H10D84/038Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/90Masterslice integrated circuits
    • H10D84/903Masterslice integrated circuits comprising field effect technology
    • H10D84/907CMOS gate arrays
    • H10D84/909Microarchitecture
    • H10D84/959Connectability characteristics, i.e. diffusion and polysilicon geometries
    • H10D84/961Substrate and well contacts
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D89/00Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
    • H10D89/10Integrated device layouts

Landscapes

  • Semiconductor Integrated Circuits (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
CN202380096942.1A 2023-04-12 2023-04-12 半导体装置 Pending CN120917899A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2023/014837 WO2024214205A1 (ja) 2023-04-12 2023-04-12 半導体装置

Publications (1)

Publication Number Publication Date
CN120917899A true CN120917899A (zh) 2025-11-07

Family

ID=93058957

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202380096942.1A Pending CN120917899A (zh) 2023-04-12 2023-04-12 半导体装置

Country Status (4)

Country Link
US (1) US20260033000A1 (https=)
JP (1) JPWO2024214205A1 (https=)
CN (1) CN120917899A (https=)
WO (1) WO2024214205A1 (https=)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11102910A (ja) * 1997-09-29 1999-04-13 Hitachi Ltd 半導体集積回路
WO2020065916A1 (ja) * 2018-09-28 2020-04-02 株式会社ソシオネクスト 半導体装置
KR102742350B1 (ko) * 2018-11-21 2024-12-16 소니 세미컨덕터 솔루션즈 가부시키가이샤 고체 촬상 소자
US10950546B1 (en) * 2019-09-17 2021-03-16 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor device including back side power supply circuit
JP7306470B2 (ja) * 2019-10-25 2023-07-11 株式会社ソシオネクスト 半導体装置
CN114762113B (zh) * 2019-12-05 2024-11-01 株式会社索思未来 半导体装置

Also Published As

Publication number Publication date
US20260033000A1 (en) 2026-01-29
WO2024214205A1 (ja) 2024-10-17
JPWO2024214205A1 (https=) 2024-10-17

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