CN117441122A - 成像光学单元 - Google Patents

成像光学单元 Download PDF

Info

Publication number
CN117441122A
CN117441122A CN202280040900.1A CN202280040900A CN117441122A CN 117441122 A CN117441122 A CN 117441122A CN 202280040900 A CN202280040900 A CN 202280040900A CN 117441122 A CN117441122 A CN 117441122A
Authority
CN
China
Prior art keywords
optical unit
mirrors
plane
image
imaging optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202280040900.1A
Other languages
English (en)
Chinese (zh)
Inventor
H-J·罗斯塔尔斯基
H·蒙兹
C·门克
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of CN117441122A publication Critical patent/CN117441122A/zh
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0663—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/08—Anamorphotic objectives

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN202280040900.1A 2021-06-08 2022-06-03 成像光学单元 Pending CN117441122A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102021205774.8A DE102021205774A1 (de) 2021-06-08 2021-06-08 Abbildende Optik
DE102021205774.8 2021-06-08
PCT/EP2022/065226 WO2022258529A1 (en) 2021-06-08 2022-06-03 Imaging optical unit

Publications (1)

Publication Number Publication Date
CN117441122A true CN117441122A (zh) 2024-01-23

Family

ID=82117637

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202280040900.1A Pending CN117441122A (zh) 2021-06-08 2022-06-03 成像光学单元

Country Status (8)

Country Link
US (1) US12596307B2 (enExample)
EP (1) EP4352563A1 (enExample)
JP (1) JP2024522609A (enExample)
KR (1) KR20240017167A (enExample)
CN (1) CN117441122A (enExample)
DE (1) DE102021205774A1 (enExample)
TW (1) TW202307520A (enExample)
WO (1) WO2022258529A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102023201790A1 (de) 2023-02-28 2024-08-29 Carl Zeiss Smt Gmbh Verfahren zur interferometrischen Bestimmung der Oberflächenform eines Prüflings
DE102024203605A1 (de) * 2024-04-18 2025-10-23 Carl Zeiss Smt Gmbh Abbildende Optik für die Projektionslithographie

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6577443B2 (en) 1998-05-30 2003-06-10 Carl-Zeiss Stiftung Reduction objective for extreme ultraviolet lithography
DE10155711B4 (de) 2001-11-09 2006-02-23 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Im EUV-Spektralbereich reflektierender Spiegel
JP2009508150A (ja) 2005-09-13 2009-02-26 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影光学系、ある機器を製造するための方法、光学面を設計する方法
DE102007033967A1 (de) 2007-07-19 2009-01-29 Carl Zeiss Smt Ag Projektionsobjektiv
DE102008033341A1 (de) 2007-07-24 2009-01-29 Carl Zeiss Smt Ag Projektionsobjektiv
DE102009011328A1 (de) 2009-03-05 2010-08-19 Carl Zeiss Smt Ag Abbildende Optik
DE102009045096A1 (de) 2009-09-29 2010-10-07 Carl Zeiss Smt Ag Beleuchtungssystem mit einer Spiegelanordnung aus zwei Spiegeln
DE102010040811A1 (de) 2010-09-15 2012-03-15 Carl Zeiss Smt Gmbh Abbildende Optik
DE102011075579A1 (de) 2011-05-10 2012-11-15 Carl Zeiss Smt Gmbh Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Spiegel
DE102012202675A1 (de) 2012-02-22 2013-01-31 Carl Zeiss Smt Gmbh Abbildende Optik sowie Projektionsbelichtungsanlage für die Projektionslithografie mit einer derartigen abbildenden Optik
WO2014019617A1 (en) 2012-08-01 2014-02-06 Carl Zeiss Smt Gmbh Imaging optical unit for a projection exposure apparatus
DE102014208770A1 (de) 2013-07-29 2015-01-29 Carl Zeiss Smt Gmbh Projektionsoptik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen Projektionsoptik
DE102015226531A1 (de) 2015-04-14 2016-10-20 Carl Zeiss Smt Gmbh Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik
WO2016188934A1 (de) 2015-05-28 2016-12-01 Carl Zeiss Smt Gmbh Abbildende optik zur abbildung eines objektfeldes in ein bildfeld sowie projektionsbelichtungsanlage mit einer derartigen abbildenden optik
DE102015221984A1 (de) * 2015-11-09 2017-05-11 Carl Zeiss Smt Gmbh Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik
DE102016212578A1 (de) * 2016-07-11 2018-01-11 Carl Zeiss Smt Gmbh Projektionsoptik für die EUV-Projektionslithographie
DE102019208961A1 (de) * 2019-06-19 2020-12-24 Carl Zeiss Smt Gmbh Projektionsoptik und Projektionsbelichtungsanlage mit einer solchen Projektionsoptik
DE102019219209A1 (de) 2019-12-10 2020-01-23 Carl Zeiss Smt Gmbh Oberflächenprofil-Messeinrichtung zur Vermessung der Spiegel einer abbildenden Optik
DE102022206110A1 (de) * 2022-06-20 2023-12-21 Carl Zeiss Smt Gmbh Abbildende EUV-Optik zur Abbildung eines Objektfeldes in ein Bildfeld

Also Published As

Publication number Publication date
JP2024522609A (ja) 2024-06-21
US12596307B2 (en) 2026-04-07
KR20240017167A (ko) 2024-02-06
TW202307520A (zh) 2023-02-16
US20240094637A1 (en) 2024-03-21
WO2022258529A1 (en) 2022-12-15
DE102021205774A1 (de) 2022-12-08
EP4352563A1 (en) 2024-04-17

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