Classifications

• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/70—Microphotolithographic exposure; Apparatus therefor
  • G03F7/70058—Mask illumination systems
  • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B5/00—Optical elements other than lenses
  • G02B5/08—Mirrors
  • G02B5/0891—Ultraviolet [UV] mirrors
• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
  • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
  • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
  • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
  • G02B17/0663—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/70—Microphotolithographic exposure; Apparatus therefor
  • G03F7/70216—Mask projection systems
  • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B13/00—Optical objectives specially designed for the purposes specified below
  • G02B13/08—Anamorphotic objectives

Definitions

• the patent application relates to an imaging optical unit comprising a plu rality of mirrors for imaging the object field into an image field, the mirrors of said imaging optical unit being able to be measured by means of the test- ing optical unit. Further, the invention relates to an optical system compris ing such an imaging optical unit, an illumination system comprising such an optical system, a projection exposure apparatus comprising such an il lumination system, a method for producing a microstructured or nanostruc- tured component, and a microstructured or nanostructured component pro- quizd by any such method.
• Imaging optical units or projection optical units of the type set forth at the outset are known from DE 102019219209 Al, DE 102019208 961 Al, WO 2009/010213 Al, US 2016/0085061 Al, DE 102012202675 Al, DE 102009011 328 Al, US 8,027,022 B2 and US 6,577,443 B2.
• An illumina tion optical unit for a projection exposure apparatus is known from DE 10 2009 045 096 Al.
• dimensional ratios of the imaging optical unit with a ratio that is as large as possible between the object/image offset and the meridional transverse dimension on the one hand and between the working distance and the meridional transverse di- mension on the other hand lead to imaging optical units that ensure that a wafer holder does not collide with optical components of an illumination optical unit upstream of the imaging optical unit (condition of a relatively large object/image offset), ensure that enough installation space is available adjacent to the object plane for an object holder, which is optionally de- signed for replacing an object (relatively large working distance), and that a possible vacuum container, in which an entire optical unit of the projec tion exposure apparatus is housed, need not be made with undesirably large dimensions (relatively small meridional transverse dimension)
• the imaging optical unit according to Claim 1 fulfils these three criteria in a manageable form on account of the given dimensional ratios.
• anamorphic imaging optical unit according to Claim 5 A corresponding anamorphic optical unit is known from US 9,366,968.
• An imaging optical unit according to Claim 6 provides for high-quality structure imaging
• An imaging optical unit according to Claim 7 facilitates good imaging cor- rection over a given image field size.
• Imaging optical unit according to Claims 8 and 9 have proven their worth in practice. There can be more than four GI mirrors, these may total six or eight for example. There can be more than three NI mirrors, these may total four for example.
• a semiconductor component for example a memory chip, can be produced.
• FIG. 1 schematically shows a projection exposure apparatus for
• Fig. 2 shows, in a meridional section, an embodiment of an imaging optical unit which can be used as a projection lens in the pro- jection exposure apparatus according to Figure 1, wherein an imaging beam path for chief rays and for an upper coma ray and a lower coma ray of three selected field points is depict ed;
• Fig. 3 shows, in an illustration similar to Figure 2, a further embod iment of an imaging optical unit which is usable as a projec tion optical unit in the projection exposure apparatus in Fig ure 1; and
• Fig. 4 shows, in an illustration similar to Figure 2, a further embod iment of an imaging optical unit which is usable as a projec tion optical unit in the projection exposure apparatus in Fig ure 1.
• a microlithographic projection exposure apparatus 1 comprises a light source 2 for illumination light or imaging light 3.
• the light source 2 is an EUV light source, which produces light in a wavelength range of, for ex ample, between 5 nm and 30 nm, in particular between 5 nm and 15 nm.
• the light source 2 can be a light source with a wavelength of 13.5 nm or a light source with a wavelength of 6.9 nm.
• Other EUV wave lengths are also possible.
• the illumination light 3 guided in the projection exposure apparatus 1 could even have any desired wavelength, for example visible wavelengths or else other wavelengths which may find use in microlithography (e.g. DUV, deep ultraviolet) and for which suitable laser light sources and/or LED light sources are available (e.g. 365 nm,
• a beam path of the illumina tion light 3 is depicted very schematically in Figure 1.
• An illumination optical unit 6 is used to guide the illumination light 3 from the light source 2 to an object field 4 in an object plane 5.
• the object field 4 is imaged into an image field 8 in an image plane 9 with a given, possibly anamorphic reduction scale.
• a Cartesian xyz-coordinate system is indicated in the drawing, from which system the respective positional relationship of the components illustrated in the fig ures is evident.
• the x-direction runs perpendicular to the plane of the drawing into the latter.
• the y-direction runs towards the left, and the z-direction runs upward.
• the object field 4 and the image field 8 are rectangular.
• the object field 4 and the image field 8 it is also possible for the object field 4 and the image field 8 to have a bent or curved embodiment, that is to say, in particular, a partial ring shape.
• the object field 4 and the image field 8 have an x/y-aspect ratio of greater than 1. Therefore, the object field 4 has a longer object field dimension in the x- direction and a shorter object field dimension in the y-direction.
• the projection optical unit 7 according to Figure 2 has an anamorphic em bodiment.
• the projection optical unit 7 In the yz-plane, i.e. in the meridional plane of the section ac cording to Figure 2, the projection optical unit 7 has a reduction scale
• the object field 4 is imaged onto the image field with a reduction by a factor of 8.
• of the projection optical unit 7 is 4 in the sagittal plane xz, which is perpendicular to the meridional plane.
• the object field 4 In this xz-plane, the object field 4 is imaged with a reduction by a factor of 4 into the image field 8 between the object plane 5 and the image plane 9.
• the image field 8 has an x-extent of e.g. 26 mm and a y-extent of e.g.
• the image plane 9 is arranged parallel to the object plane 5. What is imaged in this case is a portion of a reflection mask 10, also referred to as reticle, coinciding with the object field 4.
• the reticle 10 is carried by a reti cle holder 10a.
• the reticle holder 10a is displaced by a reticle displacement drive 10b.
• the imaging by way of the projection optical unit 7 is implemented on the surface of a substrate 11 in the form of a wafer, which is carried by a sub strate holder 12.
• the substrate holder 12 is displaced by a wafer or sub strate displacement drive 12a.
• Figure 1 schematically depicts, between the reticle 10 and the projection optical unit 7, a beam 13 of the illumination light 3 that enters into said projection optical unit and, between the projection optical unit 7 and the substrate 11, a beam 14 of the illumination light 3 that emerges from the projection optical unit 7.
• An image field-side numerical aperture (NA) of the projection optical unit 7 is not reproduced to scale in Figure 1.
• the projection exposure apparatus 1 is of the scanner type. Both the reticle 10 and the substrate 11 are scanned in the y-direction during the operation of the projection exposure apparatus 1.
• Figure 2 shows the optical design of a first embodiment of the projection optical unit 7.
• Figure 2 depicts the beam path of, in each case, three indi- vidual rays 29 emanating from three object field points which are spaced apart from one another in the y-direction in Figure 2.
• What is depicted are chief rays 30, i.e. individual rays 29 which pass through the centre of a pu pil in a pupil plane of the projection optical unit 7, and, in each case, an upper coma ray and a lower coma ray, i.e. rays that pass through the upper and lower edge of the pupil, respectively, of these two object field points.
• the chief rays 30 include an angle CRAO of 5.05° with a normal on the object plane 5.
• the projection optical unit 7 has an image-side numerical aperture of 0.75.
• the projection optical unit 7 has a total of eight mir rors, which, proceeding from the object field 4, are numbered Ml to M8 in the sequence of the beam path of the individual rays 29.
• the imaging opti cal unit 7 can also have a different number of mirrors, for example four mirrors, six mirrors, nine mirrors, ten mirrors, eleven mirrors or even more mirrors.
• Figure 2 depicts the calculated reflection surfaces of the mirrors Ml to M8. Optionally only a portion of these calculated reflection surfaces is used. Only this actually used region of the reflection surfaces is actually present in the real mirrors Ml to M8. These used reflection surfaces are carried by mirror bodies in a manner known per se.
• the mirrors Ml, M4, M7 and M8 are configured as mirrors for normal incidence (NI mirrors), that is to say as mirrors onto which the imaging light 3 impinges with an angle of incidence that is smaller than 45°.
• NI mirrors normal incidence
• the projection optical unit 7 according to Figure 2 has four mirrors Ml, M4, M7 and M8 for normal incidence.
• the mirrors M2, M3, M5 and M6 are mirrors for grazing incidence of the illumination light 3 (GI mirrors), that is to say mirrors onto which the illu mination light 3 impinges with angles of incidence that are greater than 60°.
• a typical angle of incidence of the individual rays 29 of the imaging light 3 on the mirrors M2, M3, M5 and M6 for grazing incidence lies in the region of 80°.
• the projection optical unit 7 according to Figure 2 has exactly four mirrors M2, M3, M5 and M6 for grazing incidence.
• the mirrors M2, M3 on the one hand and M5, M6 on the other hand are designed as pairs of successive mirrors and reflect the imaging light 3 in such a way that the angles of reflection of the individual rays 29 at the re spective mirrors of the pairs M2, M3 on the one hand and M5, M6 and the other hand summate, that is to say amplify in terms of the deflection effect.
• the mirrors Ml to M8 carry a coating optimizing the reflectivity of the mirrors Ml to M8 for the imaging light 3. This can be a ruthenium coating, a molybdenum coating or a molybdenum coating with an uppermost layer of ruthenium.
• a coating with e.g. one ply of molybdenum or rutheni um.
• These highly reflecting layers in particular of the mirrors Ml, M4, M7 and M8 for normal incidence, can be configured as multi-ply layers, where in successive layers can be manufactured from different materials. Alter- nating material layers can also be used.
• a typical multi-ply layer can have fifty bilayers, respectively made of a layer of molybdenum and a layer of silicon.
• a multi-ply layer may be provided with an additional capping lay er, for example made of ruthenium.
• a system transmission can be calculated as follows: A mirror reflectivity is determined at each mirror surface on the basis of the angle of incidence of a guide ray, i.e. a chief ray of a central object field point, and combined by multiplication to form the system transmission.
• GI mirror ground incidence mirror
• NI mirrors normal incidence mirrors
• DE 101 55 711 A Further information concerning reflection at a GI mirror (grazing incidence mirror) can be found in WO 2012/126867 A. Further information concern ing the reflectivity of NI mirrors (normal incidence mirrors) can be found in DE 101 55 711 A.
• the mirror M8 that is to say the ultimate mirror upstream of the image field 8 in the imaging beam path, has a passage opening 30a for the passage of the imaging light 3 which is reflected from the antepenultimate mirror M6 toward the penultimate mirror M7.
• the mirror M8 is used in a reflec- tive manner around the passage opening 30a. All other mirrors Ml to M7 do not have a passage opening and are used in a reflective manner in a re gion connected in a gap-free manner.
• a stop AS is disposed in the imaging beam path between the mirrors M6 and M7, said stop having both the function of an aperture stop and the function of an obscuration stop.
• the stop AS firstly specifies the im age-side numerical aperture of the projection optical unit 7 and secondly specifies the size of an inner pupil obscuration.
• the stop AS can be designed as a split stop, as known from US 10,527,832.
• the projection optical unit 7 is approximately telecentric on the object side. If the imaging beam path is only taken into account in relation to the indi- vidual rays that pass through the object field 4, the entrance pupil is located 4052.44 mm downstream of the object field 5 in the xz-plane and 41876.50 mm downstream of the object field 4 in the yz-plane.
• a pupil plane is present in the beam path of the imaging light 3 between the mirrors Ml and M2.
• a first intermediate image plane is present in the beam path between the mirrors M2 and M3.
• a further intermediate image plane is present in the beam path between the mirrors M5 and M6.
• the number of intermediate image planes differs from the number of intermediate images in the meridional plane according to Figure 2 from the number of intermediate images in a plane perpendicular thereto.
• Such projection optical units with different numbers of intermediate images in mutually perpendicular planes are known from WO 2016/166080 A1 and DE 102015 226 531 A1 as a matter of principle.
• the stop AS is located in the beam path between the mirrors M7 and M8, in the region of a further pupil plane of the projection optical unit 7.
• the mirrors Ml to M8 are embodied as free-form surfaces which cannot be described by a rotationally symmetric function.
• Other embodiments of the projection optical unit 7, in which at least one of the mirrors Ml to M8 is embodied as a rotationally symmetric asphere, are also possible. It is also possible for all mirrors Ml to M8 to be embodied as such aspheres.
• a free-form surface can be described by the following free-form surface equation (Equation 1):
• Ci, C2, C3... denote the coefficients of the free-form surface series expansion in powers of x and y.
• Equation (1) describes a biconical free-form surface.
• free-form surface can be produced from a rotation- ally symmetric reference surface.
• Such free-form surfaces for reflection surfaces of the mirrors of projection optical units of microlithographic pro- jection exposure apparatuses are known from US 2007-0058269 Al.
• free-form surfaces can also be described with the aid of two- dimensional spline surfaces. Examples for this are Bezier curves or non- uniform rational basis splines (NURBS).
• NURBS non- uniform rational basis splines
• two- dimensional spline surfaces can be described by a grid of points in an xy- plane and associated z-values, or by these points and gradients associated therewith.
• the com plete surface is obtained by interpolation between the grid points using e.g. polynomials or functions which have specific properties in respect of the continuity and the differentiability thereof. Examples for this are analytical functions.
• Negative values of radius mean curves which are concave toward the incident illumination light 3 in the section of the respective surface with the considered plane (xz, yz), which is spanned by a surface normal at the vertex point with the respective direction of curva ture (x, y).
• the two radii Radiusx, Radiusy may explicitly have different signs.
• the refractive powers Powerx (P x ), Powery (P y ) at the vertices are defined as:
• AOI denotes an angle of incidence of the guide ray with respect to the surface normal.
• the second table specifies the absolute value along which the respective mirror, proceeding from a reference surface, was decentred (D y ) in the y- direction, displaced (D z ) in the z-direction and tilted (a x , a y, a z ).
• a displacement is carried out along the y-direction and in the z-direction in mm, and tilting is carried out about the x-axis, about the y-axis and about the z-axis.
• the angle of rotation is specified in degrees. Decentring is carried out first, followed by tilting.
• the reference surface during decentring is in each case the first surface of the specified optical design data. Decentring in the y-direction and in the z- direction is also specified for the object field 4 (reticle). In addition to val ues assigned to the individual mirrors Ml to M8, this table also tabulates the object plane (reticle) as a first surface, the image plane (wafer) as an ultimate surface and a stop surface (denoted “stop”) as an arrangement plane for an aperture or obscuration stop.
• the third table (Tables 3a to 3c) specifies the free-form surface coefficients Cn, respectively assigned to the polynomials x k , y 1 , for the mirrors Ml to M8. Coefficients C n not tabulated in the table each have the value of 0.
• the fourth table specifies a boundary of the stop AS as a polygonal line in local coordinates xy. As described above, the stop is decentred and tilted.
• the coordinates are specified in two columns.
• the first column (consisting of an x- and a y-coordinate) contains the coordinates of the cor ners 1 to M/2 of the polygon, and the second column contains the coordi- nates of the comers N/2+1 to N.
• Each row therefore contains four numbers, specifically 3 ⁇ 4, y,, C,+N/I, yi+N/2.
• the mirrors Ml, M3, M4, M5 and M8 have negative values for the radius, i.e. are, in principle, concave mirrors.
• the mirrors M2, M6 and M7 have positive values for the radius, i.e. they are, in principle, convex mirrors.
• the mirrors Ml to M8 of the projection optical unit according to Figure 2 have no R x , R y radius values with in each case different signs. None of the mirrors Ml to M8 therefore has a saddle shape as a matter of principle.
• a boundary of a stop surface of the stop emerges from intersection points on the stop surface of all rays of the illu mination light 3 which, on the image side, propagate at the field centre point in the direction of the stop surface with a complete image-side tele- centric aperture.
• the bound ary is an inner boundary.
• the stop AS can he in a plane or else have a three-dimensional embodi ment.
• the extent of the stop AS can be smaller in the scan direction (y) than in the cross-scan direction (x).
• the projection optical unit 7 has an object/image offset a between a separa tion plane 3 la and a centre of the image field 8.
• a centre of the object field 4 is located in the separation plane 31a.
• the separation plane 31a runs par- allel to the xz-plane.
• the separation plane 3 la is perpendicular to the yz- meridional plane of the imaging optical unit 7.
• the object/image offset a is 1650 mm in the case of the projection optical unit 7.
• the used reflection surface of the mirror M4 is the nearest neighbour to the object plane 5.
• the used reflection surface of the mirror M4 therefore de fines a working distance b between this used reflection surface of the mir ror M4 and the object plane 5.
• a reflection portion of the mirror M4 which is the nearest neighbour to the object plane 5 is considered within the scope of the definition of the working distance b.
• the working distance b is 275 mm in the case of the projection optical unit 7.
• a meridional transverse dimension c is defined between the separation plane 31a and a reflection portion of one of the mirrors, once again of the mirror M4 in this case, which is furthest away from said separation plane.
• the meridional transverse dimension c is 2154 mm in the case of the pro jection optical unit 7.
• a dimensional ratio a/c is 0.76 in the case of the projection optical unit 7.
• a dimensional ratio b/c is 0.128 in the case of the projection optical unit 7.
• the projection optical unit 7 is designed for a wavelength of the illumina tion light 3 of 13.5 nrn.
• the mean wavefront aberration RMS (scanned wavefront deviation) is a measure for the imaging quality of the projection optical unit 7.
• the projection optical unit 7 is at least approximately telecentric on the image side.
• Figure 3 shows a further embodiment of a projection optical unit or imag ing optical unit 31, which can be used in the projection exposure apparatus 1 instead of the projection optical unit 7.
• Components and functions corre- sponding to those which have already been explained above with reference to Figures 1 and 2 have the same reference signs and will not be discussed in detail again.
• the projection optical unit 31 has an image-side numerical aperture of 0.75.
• the projection optical unit 31 has a total of eleven mirrors Ml to Ml 1.
• the mirrors Ml, M10 and Mil are embodied as mirrors for normal incidence.
• the mirrors M2 to M9 are embodied as mirrors for grazing incidence of the illumination light 3.
• the projection optical unit 31 has exactly eight mirrors for grazing incidence.
• the mirrors M2 to M8 that is to say seven of the eight GI mirrors of the projection optical unit 31, reflect the imaging light 3 in such a way that the angles of reflection of the individual rays 29 at the respective mirrors M2 to M8 add up, i.e. lead to an amplification of the deflection effect thereof.
• the subsequent GI mirror M9 is a so-called counter mirror and reflects the imaging light 3 such that this yields a deflection effect directed against the deflection effect of the mirrors M2 to M8, that is to say this has a subtrac- tive effect on the deflection effect of the GI mirrors M2 to M8.
• the projection optical unit 31 has the fol- lowing sequence of deflecting effects for the mirrors Ml to Ml 1 : RLLLLLLLROL:
• the projection optical unit 31 is approximately telecentric on the object side. If the imaging beam path is only taken into account in relation to the individual rays that pass through the object field 4, the entrance pupil is located 4014.30 mm downstream of the object field 5 in the xz-plane and 5750.64 mm downstream of the object field 4 in the yz-plane.
• the projection optical unit 31 has a pupil plane in the beam path between the mirrors Ml and M2.
• An intermediate image plane is located in the re gion of a reflection on the mirror M5.
• a further pupil plane is located be tween the mirrors M5 and M6 in the imaging light beam path.
• a further intermediate image plane is located between the mirrors M6 and M7.
• the number of intermediate image planes differs from the number of interme- diate images in the meridional plane according to Figure 3 from the num ber of intermediate images in a plane perpendicular thereto.
• Such projec tion optical units with different numbers of intermediate images in mutual ly perpendicular planes are known from WO 2016/166080 Al and DE 10 2015 226531 Al as a matter of principle.
• the optical design data for the projection optical unit 31 emerge from fol lowing Tables 1 to 5, which, in turn, correspond in terms of the basic struc ture to Tables 1 to 5 relating to the embodiment according to Figure 2. Radii of the surfaces
• the mirrors Ml, M4, M5, M6, M7 and Mil have negative values for the radius, i.e. they are, in principle, concave mirrors.
• the mirror M10 has positive radius values, that is to say in principle is a convex mirror.
• the mirrors M2, M3, M8 and M9 have Rx, R y radius values with differing signs in each case, i.e. are saddle-shaped as a matter of principle.
• the projection optical unit 31 has an object/image offset a of 3468 mm.
• the working distance b is present between the object plane 5 and the re flection portion of the mirror M5, closest thereto, in the case of the projec- tion optical unit 31 and is 277 mm.
• the meridional transverse dimension c is present between the separation plane 31a and the reflection portion of the mirror Mil, furthest therefrom, in the case of the projection optical unit 31 and is 4112 mm.
• the ratio a/c is 0.84 in the case of the projection optical unit 31.
• the ratio b/c is 0.067 in the case of the projection optical unit 31.
• Figure 4 shows a further embodiment of a projection optical unit or imag ing optical unit 32, which can be used in the projection exposure apparatus 1 instead of the projection optical unit 7.
• the projection optical unit 32 has an image-side numerical aperture of 0.75.
• the projection optical unit 32 has a total of nine mir rors Ml to M9.
• the mirrors Ml, M8 and M9 are embodied as mirrors for normal incidence (NI mirrors).
• the mirrors M2 to M7 are each embodied as mirrors for grazing incidence (GI mirrors).
• the projection optical unit 32 therefore comprises three NI mirrors and six GI mirrors.
• the NI mirrors M2 to M7 reflect the imaging light 3 in such a way that the angles of reflection of the individual rays 29 at the respective mirrors M2 to M7 add up, i.e., lead to an amplification of the deflection effect thereof
• the projection optical unit 32 has no counter GI image.
• the projection optical unit 32 is approximately telecentric on the object side. If the imaging beam path is only taken into account in relation to the individual rays that pass through the object field 4, the entrance pupil is located 4161.14 mm downstream of the object field 5 in the xz-plane and - 8870.82 mm upstream of the object field 4 in the yz-plane.
• a pupil plane is located in the imaging beam path between the mirrors Ml and M2.
• a first intermediate image plane is located in the beam path between the mirrors M2 and M3.
• a fur- ther pupil plane is located between the mirrors M3 and M4.
• a further in termediate image plane is located in the region of a reflection on the mirror M5.
• the number of intermediate image planes differs from the number of intermediate images in the meridional plane according to Figure 4 from the number of intermediate images in a plane perpendicular thereto.
• Such pro- jection optical units with different numbers of intermediate images in mu tually perpendicular planes are known from WO 2016/166080 A1 and DE 10 2015 226531 A1 as a matter of principle.
• the projection optical unit 32 in terms of its basic struc ture, corresponds to the projection optical unit 31.
• the optical design data for the projection optical unit 32 according to Figure 4 emerge from following Tables 1 to 5, which correspond to Tables 1 to 5 relating to the embodiment according to Figures 2 and 3. Radii of the surfaces

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