CN117361899A - Super-transparent steel double-silver low-emissivity coated glass and preparation method thereof - Google Patents
Super-transparent steel double-silver low-emissivity coated glass and preparation method thereof Download PDFInfo
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- 239000011521 glass Substances 0.000 title claims abstract description 42
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 30
- 239000004332 silver Substances 0.000 title claims abstract description 30
- 229910000831 Steel Inorganic materials 0.000 title claims abstract description 12
- 239000010959 steel Substances 0.000 title claims abstract description 12
- 238000002360 preparation method Methods 0.000 title abstract description 7
- 239000010410 layer Substances 0.000 claims abstract description 184
- 238000000576 coating method Methods 0.000 claims abstract description 45
- 239000011248 coating agent Substances 0.000 claims abstract description 43
- 239000010936 titanium Substances 0.000 claims abstract description 30
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 20
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 20
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical group [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 18
- 239000000758 substrate Substances 0.000 claims abstract description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 8
- JYMITAMFTJDTAE-UHFFFAOYSA-N aluminum zinc oxygen(2-) Chemical group [O-2].[Al+3].[Zn+2] JYMITAMFTJDTAE-UHFFFAOYSA-N 0.000 claims abstract description 8
- KYKLWYKWCAYAJY-UHFFFAOYSA-N oxotin;zinc Chemical group [Zn].[Sn]=O KYKLWYKWCAYAJY-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052814 silicon oxide Inorganic materials 0.000 claims abstract description 8
- 239000011247 coating layer Substances 0.000 claims abstract description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 82
- 238000000034 method Methods 0.000 claims description 44
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 42
- 230000008569 process Effects 0.000 claims description 42
- 238000004544 sputter deposition Methods 0.000 claims description 42
- 229910052786 argon Inorganic materials 0.000 claims description 41
- 239000007789 gas Substances 0.000 claims description 40
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 18
- 239000001301 oxygen Substances 0.000 claims description 18
- 229910052760 oxygen Inorganic materials 0.000 claims description 18
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 12
- 229910000611 Zinc aluminium Inorganic materials 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 8
- HXFVOUUOTHJFPX-UHFFFAOYSA-N alumane;zinc Chemical compound [AlH3].[Zn] HXFVOUUOTHJFPX-UHFFFAOYSA-N 0.000 claims description 6
- 230000005540 biological transmission Effects 0.000 claims description 6
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- GZCWPZJOEIAXRU-UHFFFAOYSA-N tin zinc Chemical compound [Zn].[Sn] GZCWPZJOEIAXRU-UHFFFAOYSA-N 0.000 claims description 6
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 5
- 238000007747 plating Methods 0.000 claims description 5
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 5
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 5
- 229910004205 SiNX Inorganic materials 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- 238000002834 transmittance Methods 0.000 abstract description 9
- 230000008901 benefit Effects 0.000 abstract description 3
- 238000005452 bending Methods 0.000 description 3
- 238000005496 tempering Methods 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 2
- OLFCLHDBKGQITG-UHFFFAOYSA-N chromium(3+) nickel(2+) oxygen(2-) Chemical compound [Ni+2].[O-2].[Cr+3] OLFCLHDBKGQITG-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000037452 priming Effects 0.000 description 2
- 238000007792 addition Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3639—Multilayers containing at least two functional metal layers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Laminated Bodies (AREA)
Abstract
The invention provides ultra-transparent steel double-silver low-emissivity coated glass and a preparation method thereof, belonging to the technical field of glass finish deep processing; the glass substrate comprises a glass substrate layer and a coating layer, wherein thirteen coating layers are sequentially compounded from the glass substrate layer outwards, the first layer is a silicon oxide layer, and the thickness of the coating is 10-20 nanometers; the second layer is a zinc tin oxide layer, and the thickness of the coating is 15 to 35 nanometers; the third layer is a zinc aluminum oxide layer, and the thickness of the coating is 1 to 10 nanometers; the fourth layer is a silver layer, and the thickness of the coating is 8-10 nanometers; the fifth layer is a metallic titanium layer, and the thickness of the coating is 1 to 3 nanometers; the sixth layer is an AZO layer, and the thickness of the coating is 5 to 10 nanometers; the seventh layer is a zinc tin oxide layer, and the thickness of the coating is 5 to 10 nanometers; the eighth layer is a zinc aluminum oxide layer, and the thickness of the coating is 10 to 30 nanometers; the ninth layer is a silver layer, and the thickness of the coating is 10 to 15 nanometers. The glass has the advantages of high transmittance, high market welcome of the transmitted color and the like.
Description
Technical Field
The invention belongs to the technical field of glass finish deep processing, and relates to ultra-transparent steel double-silver low-emissivity coated glass and a preparation method thereof.
Background
The prior curtain wall glass deep processing mode is tempering before coating, along with the increasingly strong market competition, the process mode is to be changed from a tempering coating process to a coating process before tempering, the conversion of the process can improve benefits, the problem that flat bending matching is required in the market is solved, flat bending matching projects are increasingly used for glass curtain walls, the traditional method is only used for specially adjusting and using heat reflection and single silver color to match flat tempered products, time and effort are consumed, the effect of market feedback information is not ideal, if the original traditional glass deep processing process mode is subverted, new profit growth points are brought, and customer service experience and market competitiveness are improved. Therefore, the overall production efficiency of the company can be greatly improved, the maximization of the production capacity of company equipment is brought into play, and the production cost of the company is reduced, so that the color system of the high-transparency glass product of the building curtain wall is enriched.
In the prior art, there are a lot of steel double-silver coated glass products, but most of them have the following disadvantages:
1) The high-permeability steel series products in the market have common transmittance, and have green permeation color and poor market satisfaction.
2) The texture of the film layer is unclear and the transmittance is low.
3) The high-transmittance glass has poorer flat-bending color matching degree.
Disclosure of Invention
The invention aims to solve the problems in the prior art, provides ultra-transparent steel double-silver low-emissivity coated glass and a preparation method thereof, and aims to enable the coated glass to have ultra-high transmittance through a film layer structure and the transmission color to be neutral.
The aim of the invention can be achieved by the following technical scheme: the ultra-transparent steel double-silver low-emissivity coated glass is characterized by comprising a glass substrate layer and a coated layer, wherein thirteen coated layers are sequentially compounded from the glass substrate layer outwards, the first layer is a silicon oxide layer, and the thickness of the coated layer is 10-20 nanometers; the second layer is a zinc tin oxide layer, and the thickness of the coating is 15 to 35 nanometers; the third layer is a zinc aluminum oxide layer, and the thickness of the coating is 1 to 10 nanometers; the fourth layer is a silver layer, and the thickness of the coating is 8-10 nanometers; the fifth layer is a metallic titanium layer, and the thickness of the coating is 1 to 3 nanometers; the sixth layer is an AZO layer, and the thickness of the coating is 5 to 10 nanometers; the seventh layer is a zinc tin oxide layer, and the thickness of the coating is 5 to 10 nanometers; the eighth layer is a zinc aluminum oxide layer, and the thickness of the coating is 10 to 30 nanometers; the ninth layer is a silver layer, and the thickness of the plating film is 10 to 15 nanometers; the tenth layer is a metallic titanium layer, and the thickness of the coating film is 1 to 3 nanometers; the eleventh layer is an AZO layer, and the thickness of the coating is 5 to 10 nanometers; the twelfth layer is a silicon nitride layer, and the thickness of the coating is 10 to 20 nanometers; the tenth layer is a titanium oxide layer with a thickness of 10 to 20 nanometers.
In the ultra-transparent steel double-silver low-emissivity coated glass, the preparation method comprises the following steps:
1) A magnetron sputtering coating layer;
A. magnetron sputtering a first layer:
target number: 1 to 2 alternating current rotary targets; the target is configured as silicon (Si); process gas ratio: argon and oxygen in a ratio of 2:3, a step of; sputtering air pressure is 3-5 x 10 -3 mbar；
B. Magnetron sputtering a second layer:
target number: 2-4 alternating current rotary targets; the target is configured as zinc tin (ZnSn); process gas ratio: argon and oxygen in a ratio of 1:1.8; sputtering air pressure is 3-5 x 10 -3 mbar；
C. Magnetron sputtering third layer:
target number: 2-4 alternating current rotary targets; the target is configured as zinc aluminum (ZnAl); process gas ratio: argon and oxygen in a ratio of 1:1.8; sputtering gasThe pressure is 3 to 5 multiplied by 10 -3 mbar；
D. Magnetron sputtering a fourth layer:
target number: 1 direct current planar target; the target is configured as silver (Ag); process gas ratio: pure argon; sputtering air pressure is 2-3 x 10 -3 mbar；
E. Magnetron sputtering fifth layer:
target number: 1 alternating current rotary target; the target is configured of titanium (Ti); process gas ratio: pure argon; sputtering air pressure is 3-5 x 10 -3 mbar；
F. Magnetron sputtering a sixth layer:
target number: 1 to 2 alternating current rotary targets; the target is configured as AZO; process gas ratio: pure argon; sputtering air pressure is 2-3 x 10 -3 mbar；
G. Magnetron sputtering a seventh layer:
target number: 2-4 alternating current rotary targets; the target is configured as zinc tin (ZnSn); process gas ratio: argon and oxygen in a ratio of 1:1.8; sputtering air pressure is 3-5 x 10 -3 mbar；
H. Magnetron sputtering eighth layer:
target number: 2-4 direct current planar targets; the target is configured as zinc aluminum (ZnAl); process gas ratio: argon and oxygen in a ratio of 1:1.8; sputtering air pressure is 3-5 x 10 -3 mbar；
I. Magnetron sputtering a ninth layer:
target number: 1 direct current planar target; the target is configured as silver (Ag); process gas ratio: pure argon; sputtering air pressure is 2-3 x 10 -3 mbar；；
J. Magnetron sputtering tenth layer:
target number: 1 alternating current rotary target; the target is configured of titanium (Ti); process gas ratio: pure argon; sputtering air pressure is 3-5 x 10 -3 mbar；
K. Magnetron sputtering eleventh layer:
target number: 1 to 2 alternating current rotary targets; the target is configured as AZO; process gas ratio: pure argon; sputtering air pressure is 2-3 x 10 -3 mbar；
L, magnetron sputtering twelfth layer:
target number: 1 to 2 alternating current rotary targets; the target is configured as silicon nitride (SiNx); process gas ratio: argon and nitrogen in a ratio of 1.28: 1, a step of; sputtering air pressure is 3-5 x 10 -3 mbar；
M, magnetron sputtering thirteenth layer:
target number: 1 alternating current rotary target; the target is configured of titanium (Ti); process gas ratio: argon and oxygen, the ratio of argon to nitrogen is 50:3, a step of; sputtering air pressure is 3-5 x 10 -3 mbar；
2) The total film thickness is controlled between 100 and 300nm, and the transmission running speed of a common sputtering chamber is controlled between 4.0 and 5.0m/min.
The invention has the advantages that:
1. the super-transparent glass adopts the titanium layer to replace the original nickel-chromium oxide layer as the barrier layer of the silver layer, so that the bad property of green color transmission is avoided, and the titanium layer is combined with the AZO layer, so that the transmittance of the product is greatly improved.
2. The product can be tempered, so that the product can be tempered after coating, namely, large plate coating production is realized, and the production efficiency of enterprises is improved.
3. In the film design of the product, the silicon oxide is adopted for priming, and is similar to the glass substrate in material quality, so that a laying pad can be formed for other film layers on the silicon oxide, and the uneven part of the surface of the glass substrate can be completely smoothed, so that the whole film layer is smoother and denser.
Drawings
Fig. 1 is a schematic diagram of the layered structure of the coated glass.
In the figure, G, glass substrate layer; 1. a first layer; 2. a second layer; 3. a third layer; 4. a fourth layer; 5. a fifth layer; 6. a sixth layer; 7. a seventh layer; 8. an eighth layer; 9. a ninth layer; 10. a tenth layer; 11. an eleventh layer; 12. a twelfth layer; 13. and a tenth layer.
Detailed Description
The following are specific embodiments of the present invention and the technical solutions of the present invention will be further described with reference to the accompanying drawings, but the present invention is not limited to these embodiments.
As shown in FIG. 1, the ultra-transparent steel double-silver low-emissivity coated glass comprises a glass substrate layer and a coating layer, wherein thirteen coating layers are sequentially compounded from the glass substrate layer outwards, the first layer 1 is a silicon oxide layer, and the thickness of the coating is 10-20 nanometers; the second layer 2 is a zinc tin oxide layer, and the thickness of a coating film is 15-35 nanometers; the third layer 3 is a zinc aluminum oxide layer, and the thickness of a coating film is 1 to 10 nanometers; the fourth layer 4 is a silver layer, and the thickness of a coating film is 8-10 nanometers; the fifth layer 5 is a metallic titanium layer, and the thickness of a coating film is 1 to 3 nanometers; the sixth layer 6 is an AZO layer, and the thickness of the coating is 5 to 10 nanometers; the seventh layer 7 is a zinc tin oxide layer, and the thickness of the coating is 5 to 10 nanometers; the eighth layer 8 is a zinc aluminum oxide layer, and the thickness of the coating is 10 to 30 nanometers; the ninth layer 9 is a silver layer, and the thickness of a coating film is 10 to 15 nanometers; the tenth layer 10 is a metallic titanium layer, and the thickness of the coating film is 1 to 3 nanometers; the eleventh layer 11 is an AZO layer, and the thickness of the coating is 5 to 10 nanometers; the twelfth layer 12 is a silicon nitride layer, and the thickness of the coating film is 10 to 20 nanometers; the thirteenth layer 13 is a titanium oxide layer having a thickness of 10 to 20 nm.
The super-transparent glass adopts the titanium layer to replace the original nickel-chromium oxide layer as the barrier layer of the silver layer, so that the bad property of green color transmission is avoided, the refractive index of Ti is more than 2.0, the reflection of the silver layer can be reduced, and the transmittance of the product is greatly improved by combining with the AZO layer. In the film design of the product, the silicon oxide is adopted for priming, and is similar to the glass substrate in material quality, so that a laying pad can be formed for other film layers on the silicon oxide, the uneven part of the surface of the glass substrate can be completely smoothed, and meanwhile, the adhesive force between the film layer and the substrate is improved, so that the whole film layer is smoother and denser. The ultra-transparent glass adopts titanium oxide as an outer protective layer, so that the surface strength and durability of the coated product are enhanced, the off-site processing capacity of the product is improved, and the permeability of the product is enhanced again. In the film layer of the coated glass, the titanium-containing coated layer is used for three times to enhance the transmittance, and the transmittance of a 6mm single sheet can reach 80% -85%, so that the coated glass becomes the ultra-transparent coated glass, and meanwhile, the film system is resistant to high temperature.
In the ultra-transparent steel double-silver low-emissivity coated glass, the preparation method comprises the following steps:
1) A magnetron sputtering coating layer;
A. magnetron sputtering first layer 1:
target number: 1 to 2 alternating current rotary targets; the target is configured as silicon (Si); process gas ratio: argon and oxygen in a ratio of 2:3, a step of; sputtering air pressure is 3-5 x 10 -3 mbar；
B. Magnetron sputtering second layer 2:
target number: 2-4 alternating current rotary targets; the target is configured as zinc tin (ZnSn); process gas ratio: argon and oxygen in a ratio of 1:1.8; sputtering air pressure is 3-5 x 10 -3 mbar；
C. Magnetron sputtering third layer 3:
target number: 2-4 alternating current rotary targets; the target is configured as zinc aluminum (ZnAl); process gas ratio: argon and oxygen in a ratio of 1:1.8; sputtering air pressure is 3-5 x 10 -3 mbar；
D. Magnetron sputtering fourth layer 4:
target number: 1 direct current planar target; the target is configured as silver (Ag); process gas ratio: pure argon; sputtering air pressure is 2-3 x 10 -3 mbar；
E. Magnetron sputtering fifth layer 5:
target number: 1 alternating current rotary target; the target is configured of titanium (Ti); process gas ratio: pure argon; sputtering air pressure is 3-5 x 10 -3 mbar；
F. Magnetron sputtering sixth layer 6:
target number: 1 to 2 alternating current rotary targets; the target is configured as AZO; process gas ratio: pure argon; sputtering air pressure is 2-3 x 10 -3 mbar；
G. Magnetron sputtering seventh layer 7:
target number: 2-4 alternating current rotary targets; the target is configured as zinc tin (ZnSn); process gas ratio: argon and oxygen in a ratio of 1:1.8; sputtering air pressure is 3-5 x 10 -3 mbar；
H. Magnetron sputtering eighth layer 8:
target number: 2-4 direct current planar targets; the target is configured as zinc aluminum (ZnAl); process gas ratio: argon and oxygen in a ratio of 1:1.8; sputtering air pressure is 3-5 x 10 -3 mbar；
I. Magnetron sputtering ninth layer 9:
target number: 1 direct current planar target; the target is configured as silver (Ag); process gas ratio: pure argon; sputtering air pressure is 2-3 x 10 -3 mbar；；
J. Magnetron sputtering tenth layer 10:
target number: 1 alternating current rotary target; the target is configured of titanium (Ti); process gas ratio: pure argon; sputtering air pressure is 3-5 x 10 -3 mbar；
K. Magnetron sputtering eleventh layer 11:
target number: 1 to 2 alternating current rotary targets; the target is configured as AZO; process gas ratio: pure argon; sputtering air pressure is 2-3 x 10 -3 mbar；
L, magnetron sputtering twelfth layer 12:
target number: 1 to 2 alternating current rotary targets; the target is configured as silicon nitride (SiNx); process gas ratio: argon and nitrogen in a ratio of 1.28: 1, a step of; sputtering air pressure is 3-5 x 10 -3 mbar；
M, magnetron sputtering thirteenth layer 13:
target number: 1 alternating current rotary target; the target is configured of titanium (Ti); process gas ratio: argon and oxygen, the ratio of argon to nitrogen is 50:3, a step of; sputtering air pressure is 3-5 x 10 -3 mbar；
2) The total film thickness is controlled between 100 and 300nm, and the transmission running speed of a common sputtering chamber is controlled between 4.0 and 5.0m/min.
The product can be tempered, so that the product can be tempered after coating, namely, large plate coating production is realized, and the production efficiency of enterprises is improved.
The specific embodiments described herein are offered by way of example only to illustrate the spirit of the invention. Those skilled in the art may make various modifications or additions to the described embodiments or substitutions thereof without departing from the spirit of the invention or exceeding the scope of the invention as defined in the accompanying claims.
Claims (2)
1. The ultra-transparent steel double-silver low-emissivity coated glass is characterized by comprising a glass substrate layer and a coated layer, wherein thirteen coated layers are sequentially compounded from the glass substrate layer outwards, the first layer (1) is a silicon oxide layer, and the thickness of the coated layer is 10-20 nanometers; the second layer (2) is a zinc tin oxide layer, and the thickness of a coating film is 15-35 nanometers; the third layer (3) is a zinc aluminum oxide layer, and the thickness of the coating is 1 to 10 nanometers; the fourth layer (4) is a silver layer, and the thickness of the plating film is 8 to 10 nanometers; the fifth layer (5) is a metallic titanium layer, and the thickness of the coating is 1 to 3 nanometers; the sixth layer (6) is an AZO layer, and the thickness of the coating is 5 to 10 nanometers; the seventh layer (7) is a zinc tin oxide layer, and the thickness of the plating film is 5 to 10 nanometers; the eighth layer (8) is a zinc aluminum oxide layer, and the thickness of the plating film is 10 to 30 nanometers; the ninth layer (9) is a silver layer, and the thickness of the plating film is 10 to 15 nanometers; the tenth layer (10) is a metallic titanium layer, and the thickness of the coating film is 1 to 3 nanometers; the eleventh layer (11) is an AZO layer, and the thickness of the coating is 5 to 10 nanometers; the twelfth layer (12) is a titanium oxide layer, and the thickness of the coating film is 10 to 20 nanometers; the thirteenth layer (13) is a titanium oxide layer having a thickness of 10 to 20 nm.
2. A method of making the ultra-transparent duplex-silver low emissivity coated glass of claim 1, comprising the steps of:
1) A magnetron sputtering coating layer;
A. magnetron sputtering of the first layer (1):
target number: 1 to 2 alternating current rotary targets; the target is configured as silicon (Si); process gas ratio: argon and oxygen in a ratio of 2:3, a step of; sputtering air pressure is 3-5 x 10 -3 mbar；
B. Magnetron sputtering of the second layer (2):
target number: 2-4 alternating current rotary targets; the target is configured as zinc tin (ZnSn); process gas ratio: argon and oxygen in a ratio of 1:1.8; sputtering gas pressureIs 3 to 5 multiplied by 10 -3 mbar；
C. Magnetron sputtering third layer (3):
target number: 2-4 alternating current rotary targets; the target is configured as zinc aluminum (ZnAl); process gas ratio: argon and oxygen in a ratio of 1:1.8; sputtering air pressure is 3-5 x 10 -3 mbar；
D. Magnetron sputtering fourth layer (4):
target number: 1 direct current planar target; the target is configured as silver (Ag); process gas ratio: pure argon; sputtering air pressure is 2-3 x 10 -3 mbar；
E. Magnetron sputtering fifth layer (5):
target number: 1 alternating current rotary target; the target is configured of titanium (Ti); process gas ratio: pure argon; sputtering air pressure is 3-5 x 10 -3 mbar；
F. Magnetron sputtering sixth layer (6):
target number: 1 to 2 alternating current rotary targets; the target is configured as AZO; process gas ratio: pure argon; sputtering air pressure is 2-3 x 10 -3 mbar；
G. Magnetron sputtering seventh layer (7):
target number: 2-4 alternating current rotary targets; the target is configured as zinc tin (ZnSn); process gas ratio: argon and oxygen in a ratio of 1:1.8; sputtering air pressure is 3-5 x 10 -3 mbar；
H. Magnetron sputtering eighth layer (8):
target number: 2-4 direct current planar targets; the target is configured as zinc aluminum (ZnAl); process gas ratio: argon and oxygen in a ratio of 1:1.8; sputtering air pressure is 3-5 x 10 -3 mbar；
I. Magnetron sputtering ninth layer (9):
target number: 1 direct current planar target; the target is configured as silver (Ag); process gas ratio: pure argon; sputtering air pressure is 2-3 x 10 -3 mbar；；
J. Magnetron sputtering tenth layer (10):
target number: 1 alternating current rotary target; the target is configured of titanium (Ti); process gas ratio: pure argonThe method comprises the steps of carrying out a first treatment on the surface of the Sputtering air pressure is 3-5 x 10 -3 mbar；
K. Magnetron sputtering eleventh layer (11):
target number: 1 to 2 alternating current rotary targets; the target is configured as AZO; process gas ratio: pure argon; sputtering air pressure is 2-3 x 10 -3 mbar；
L, magnetron sputtering twelfth layer (12):
target number: 1 to 2 alternating current rotary targets; the target is configured as silicon nitride (SiNx); process gas ratio: argon and nitrogen in a ratio of 1.28: 1, a step of; sputtering air pressure is 3-5 x 10 -3 mbar；
M, magnetron sputtering thirteenth layer (13):
target number: 1 alternating current rotary target; the target is configured of titanium (Ti); process gas ratio: argon and oxygen, the ratio of argon to nitrogen is 50:3, a step of; sputtering air pressure is 3-5 x 10 -3 mbar；
2) The total film thickness is controlled between 100 and 300nm, and the transmission running speed of a common sputtering chamber is controlled between 4.0 and 5.0m/min.
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