CN116964425A - 波前像差导出方法、机器学习模型的生成方法、透镜光学系统的制造方法、波前像差导出装置及波前像差导出程序 - Google Patents
波前像差导出方法、机器学习模型的生成方法、透镜光学系统的制造方法、波前像差导出装置及波前像差导出程序 Download PDFInfo
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- CN116964425A CN116964425A CN202180095463.9A CN202180095463A CN116964425A CN 116964425 A CN116964425 A CN 116964425A CN 202180095463 A CN202180095463 A CN 202180095463A CN 116964425 A CN116964425 A CN 116964425A
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- wavefront aberration
- machine learning
- learning model
- resolution performance
- optical system
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
- G06N20/00—Machine learning
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Software Systems (AREA)
- Theoretical Computer Science (AREA)
- Evolutionary Computation (AREA)
- Medical Informatics (AREA)
- Data Mining & Analysis (AREA)
- Computing Systems (AREA)
- General Engineering & Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Mathematical Physics (AREA)
- Artificial Intelligence (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021061084 | 2021-03-31 | ||
| JP2021-061084 | 2021-03-31 | ||
| PCT/JP2021/047044 WO2022209056A1 (ja) | 2021-03-31 | 2021-12-20 | 波面収差導出方法、機械学習モデルの生成方法、レンズ光学系の製造方法、波面収差導出装置、及び波面収差導出プログラム |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116964425A true CN116964425A (zh) | 2023-10-27 |
Family
ID=83455792
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202180095463.9A Pending CN116964425A (zh) | 2021-03-31 | 2021-12-20 | 波前像差导出方法、机器学习模型的生成方法、透镜光学系统的制造方法、波前像差导出装置及波前像差导出程序 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP7576158B2 (https=) |
| CN (1) | CN116964425A (https=) |
| WO (1) | WO2022209056A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR3134179B1 (fr) * | 2022-04-01 | 2025-07-18 | Fogale Nanotech | Procédé et système de caractérisation d’un objectif optique pour la correction d’aberrations optiques introduites par ledit objectif optique dans une image. |
| CN118075590B (zh) * | 2024-03-22 | 2024-11-29 | 四川大学 | 一种基于多虚拟透镜的消色差扩景深成像系统及成像方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004132858A (ja) * | 2002-10-11 | 2004-04-30 | Canon Inc | 光学系の光学性能を測定する装置及び方法 |
| US20160135678A1 (en) * | 2013-06-10 | 2016-05-19 | Essilor International (Compagnie Generale D'optique) | Method For Determining Wave-Front Aberration Data Of A To-Be-Tested Optical System |
| US20200116589A1 (en) * | 2018-10-11 | 2020-04-16 | Canon Kabushiki Kaisha | Aberration estimating method, aberration estimating apparatus, and storage medium |
| CN112313581A (zh) * | 2018-06-25 | 2021-02-02 | Asml荷兰有限公司 | 基于性能匹配的调谐扫描器的波前优化 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3342423B2 (ja) * | 1998-10-09 | 2002-11-11 | ホーヤ株式会社 | 眼光学系のシミュレーション装置 |
| JP2003075295A (ja) * | 2001-09-03 | 2003-03-12 | Seiko Epson Corp | レンズの評価方法およびレンズ評価装置 |
| JP2007033168A (ja) * | 2005-07-26 | 2007-02-08 | Tochigi Nikon Corp | レンズ検査方法およびレンズ検査装置 |
| JP2012185089A (ja) * | 2011-03-07 | 2012-09-27 | Nikon Corp | 計測方法、及び計測装置 |
| JP5759232B2 (ja) * | 2011-04-04 | 2015-08-05 | キヤノン株式会社 | 測定装置 |
| JP2019191121A (ja) * | 2018-04-27 | 2019-10-31 | キヤノン株式会社 | 計測方法、調整方法及び光学系の製造方法 |
| JP7059406B2 (ja) * | 2019-01-31 | 2022-04-25 | 富士フイルム株式会社 | 光学部材の位置調整支援装置、光学部材の位置調整支援方法、光学部材の位置調整支援プログラム、レンズ装置の製造方法 |
| JP2021060353A (ja) * | 2019-10-09 | 2021-04-15 | キヤノン株式会社 | 光学系の内部誤差の推定方法および計測装置 |
| JP2021196230A (ja) * | 2020-06-11 | 2021-12-27 | キヤノン株式会社 | 光学特性取得方法 |
-
2021
- 2021-12-20 JP JP2023510246A patent/JP7576158B2/ja active Active
- 2021-12-20 WO PCT/JP2021/047044 patent/WO2022209056A1/ja not_active Ceased
- 2021-12-20 CN CN202180095463.9A patent/CN116964425A/zh active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004132858A (ja) * | 2002-10-11 | 2004-04-30 | Canon Inc | 光学系の光学性能を測定する装置及び方法 |
| US20160135678A1 (en) * | 2013-06-10 | 2016-05-19 | Essilor International (Compagnie Generale D'optique) | Method For Determining Wave-Front Aberration Data Of A To-Be-Tested Optical System |
| CN112313581A (zh) * | 2018-06-25 | 2021-02-02 | Asml荷兰有限公司 | 基于性能匹配的调谐扫描器的波前优化 |
| US20200116589A1 (en) * | 2018-10-11 | 2020-04-16 | Canon Kabushiki Kaisha | Aberration estimating method, aberration estimating apparatus, and storage medium |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2022209056A1 (ja) | 2022-10-06 |
| JPWO2022209056A1 (https=) | 2022-10-06 |
| JP7576158B2 (ja) | 2024-10-30 |
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