CN116661254B - Mask deformation control device and method - Google Patents

Mask deformation control device and method Download PDF

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Publication number
CN116661254B
CN116661254B CN202310477896.1A CN202310477896A CN116661254B CN 116661254 B CN116661254 B CN 116661254B CN 202310477896 A CN202310477896 A CN 202310477896A CN 116661254 B CN116661254 B CN 116661254B
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China
Prior art keywords
mask
adsorption
assembly
finger
deformation
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CN202310477896.1A
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Chinese (zh)
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CN116661254A (en
Inventor
邓国君
刘卉
李晓峰
周天林
郭嘉梁
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Ji Hua Laboratory
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Ji Hua Laboratory
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

The invention discloses a mask deformation control device which comprises a mask table, an adjusting component, a deformation detection component and a transportation component, wherein the adjusting component is arranged on the mask table and comprises a sliding table slidably arranged on the mask table, a first translation mechanism arranged on the mask table, a finger base rotationally connected with the sliding table and a pressure sensor arranged on the finger base, the first translation mechanism is connected with the sliding table, the finger base is slidably connected with an adsorption sliding block, a capacitance sensor is arranged in the adsorption sliding block, a spring piece is arranged between the finger base and the sliding table, the deformation detection component and the transportation component are arranged above the mask table, and the transportation component is provided with an adsorption finger. The mask deformation control device provided by the invention realizes the function of controlling the deformation of the mask, and enables the mask to be adjusted to a relatively flat state. In addition, the invention also discloses a control method adopting the mask deformation control device.

Description

Mask deformation control device and method
Technical Field
The invention relates to the field of lithography machines and exposure machines, in particular to a mask deformation control device and a mask deformation control method.
Background
The exposure machine and the photoetching machine are both equipment for transferring patterns on a mask plate to a silicon wafer or a glass substrate, and the mask plate is supported by a mask table so that the mask plate is exposed on the exposure machine.
In order to avoid shielding patterns on the mask, supporting and adsorbing components are usually arranged around the mask table to fix the mask. Because the mask plate is made of a sheet-shaped material, the mask plate is easy to deform due to gravity on the mask table, so that the exposure precision and quality are affected.
It can be seen that there is a need for improvements and improvements in the art.
Disclosure of Invention
In view of the above-mentioned shortcomings of the prior art, the present invention aims to provide a mask deformation control device and a method thereof, which aim to realize the function of controlling the deformation of a mask, so as to adjust the mask to a relatively flat state.
In order to achieve the above purpose, the invention adopts the following technical scheme:
the utility model provides a mask version deformation control device, includes mask table, adjusting part, deformation detection subassembly and transportation subassembly, and a plurality of adjusting part set up respectively in the corresponding both sides of mask table, adjusting part is including locating the slip table on the mask table, install first translation mechanism on the mask table, rotate the finger base of being connected with the slip table and install the pressure sensor on the finger base, the output and the slip table of first translation mechanism are connected, sliding connection has the absorption slider on the finger base, is equipped with capacitive sensor in the absorption slider, be equipped with the shell fragment between finger base and the slip table, deformation detection subassembly and transportation subassembly are all located mask table top, and transportation subassembly is located between deformation detection subassembly and the mask table, and transportation subassembly's output is equipped with a plurality of absorption fingers, absorption slider and the external negative pressure mechanism of absorption finger.
The finger base is provided with a step part, a horizontal installation part connected with the bottom of the step part and a vertical installation part connected with the top of the step part, the adsorption sliding block can be horizontally and slidably arranged on the horizontal installation part, and the pressure sensor is installed on the vertical installation part.
The finger base is provided with a horizontal installation part, the adsorption sliding block can be horizontally and slidably arranged on the horizontal installation part, and the pressure sensor is arranged on the horizontal installation part.
The number of the adjusting components is more than three.
The output end of the first translation mechanism is provided with a connector, a rotating pin is connected to the connector, and the sliding table and the finger base are respectively connected with the rotating pin in a rotating mode.
The first translation mechanism comprises a guide rail arranged on the mask table, a support arranged on the mask table and an electric push rod arranged on the support, wherein the sliding table is in sliding connection with the guide rail, and an extension rod of the electric push rod is connected with the connector.
The deformation detection assembly comprises a mounting plate, a distance measuring sensor and an image sensor, wherein the distance measuring sensors are arranged on the lower surface of the mounting plate and used for detecting the distance between the mask and the lower surface of the mounting plate, and the image sensor is arranged on the lower surface of the mounting plate and used for detecting the position of the mask table.
The transportation assembly comprises a second translation mechanism, a movable table and a lifting mechanism, wherein the movable table is arranged at the output end of the second translation mechanism, the lifting mechanism is arranged at the bottom of the movable table, and a plurality of adsorption fingers are hinged with the output end of the lifting mechanism.
A mask deformation control method adopts the mask deformation control device, and comprises the following steps:
s1, adsorbing fingers adsorb and fix a mask under the action of a negative pressure mechanism, conveying the mask onto an adsorption slide block under the drive of a conveying assembly, and adsorbing and fixing the mask by the adsorption slide block under the action of the negative pressure mechanism after a capacitance sensor on the adsorption slide block detects the mask;
s2, the first translation mechanism drives the sliding table to translate a distance towards the mask plate, the pressure sensor detects extrusion force applied by the mask plate, and the adsorption finger moves upwards a distance under the drive of the conveying assembly, so that the middle part of the mask plate protrudes upwards;
s3, releasing the mask by adsorbing the finger, and driving the adsorbing finger to reset by the conveying assembly;
s4, detecting the mask plate by the deformation detection assembly, and controlling the horizontal movement direction and the movement distance of the sliding table by the first translation mechanism according to the detection data of the deformation detection assembly and the detection data of the pressure sensor so as to enable each adjustment assembly to adjust the mask plate to be in a relatively flat state.
A mask deformation control method adopts the mask deformation control device, and comprises the following steps:
s1, adsorbing fingers adsorb and fix a mask under the action of a negative pressure mechanism, conveying the mask onto an adsorption slide block under the drive of a conveying assembly, and adsorbing and fixing the mask by the adsorption slide block under the action of the negative pressure mechanism after a capacitance sensor on the adsorption slide block detects the mask;
s2, releasing the mask plate by the adsorption finger, and driving the adsorption finger to reset by the conveying assembly, wherein the mask plate is downwards sunken due to dead weight;
s3, detecting the pressure applied by the adsorption sliding block by the pressure sensor;
s4, detecting the mask plate by the deformation detection assembly, and controlling the horizontal movement direction and the movement distance of the sliding table by the first translation mechanism according to the detection data of the deformation detection assembly and the detection data of the pressure sensor so as to enable each adjustment assembly to adjust the mask plate to be in a relatively flat state.
The beneficial effects are that:
according to the mask deformation control device provided by the invention, the mask is adsorbed and fixed by adsorbing the finger and is transported to the mask table under the drive of the transport assembly, after the adsorption sliding block on the adjusting assembly adsorbs and fixes the mask, the first translation mechanism drives the sliding table to horizontally move so as to enable the finger base to squeeze or stretch the mask, and then the first translation mechanism on the adjusting assembly can control the horizontal movement direction and the movement distance of the sliding table according to the detection data of the deformation detection assembly and the pressure sensor so as to enable the finger base to squeeze or outwards stretch the mask table, thereby realizing control of the deformation of the mask and further adjusting the mask to a flat state.
According to the mask deformation control method provided by the invention, the mask deformation is controlled by adopting the mask deformation control device, so that the mask is adjusted to be in a flat state.
Drawings
Fig. 1 is a front view of a mask deformation control device provided by the invention.
Fig. 2 is a cross-sectional view of a first embodiment of a finger pad in a mask deformation control device according to the present invention.
Fig. 3 is a cross-sectional view of a second embodiment of a finger pad in a mask deformation control device according to the present invention.
Fig. 4 is a schematic installation diagram of 3 adjusting components in the mask deformation control device provided by the invention.
Fig. 5 is a schematic installation diagram of 4 adjusting components in the mask deformation control device provided by the invention.
Fig. 6 is a schematic diagram of a first embodiment of a mask deformation control method according to the present invention in a state that a transportation assembly is used to place a mask.
Fig. 7 is a schematic diagram of a second embodiment of the mask deformation control method provided by the invention in a state that a transportation assembly is used for placing a mask.
Description of main reference numerals: 1. a mask table; 2. a deformation detection assembly; 21. a mounting plate; 22. a ranging sensor; 23. an image sensor; 3. a transport assembly; 31. a second translation mechanism; 32. a movable table; 33. a lifting mechanism; 4. a sliding table; 5. a first translation mechanism; 51. a guide rail; 52. a support; 53. an electric push rod; 6. a finger base; 61. a step portion; 62. a horizontal mounting portion; 63. a vertical mounting portion; 7. adsorbing a sliding block; 71. a capacitive sensor; 8. a pressure sensor; 9. a spring plate; 10. adsorbing fingers; 20. masking plate; 30. a joint; 301. and (5) rotating the pin.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
In the present invention, the terms "upper", "lower", "left", "right", "top", "bottom", "middle", "vertical", "horizontal", and the like indicate an azimuth or a positional relationship based on that shown in the drawings. These terms are only used to better describe the present invention and its embodiments and are not intended to limit the scope of the indicated devices, elements or components to the particular orientations or to configure and operate in the particular orientations.
Also, some of the terms described above may be used to indicate other meanings in addition to orientation or positional relationships, for example, the term "upper" may also be used to indicate some sort of attachment or connection in some cases. The specific meaning of these terms in the present invention will be understood by those of ordinary skill in the art according to the specific circumstances.
Furthermore, the terms "first," "second," and the like, are used primarily to distinguish between different devices, elements, or components (the particular species and configurations may be the same or different), and are not used to indicate or imply the relative importance and number of devices, elements, or components indicated.
The technical scheme of the invention will be further described with reference to the examples and the accompanying drawings.
Examples
Referring to fig. 1, 2 and 3, the invention provides a mask deformation control device, which comprises a mask table 1, an adjusting component, a deformation detection component 2 and a transportation component 3, wherein a plurality of adjusting components are respectively arranged on two corresponding sides of the mask table 1, the adjusting component comprises a sliding table 4 slidably arranged on the mask table 1, a first translation mechanism 5 arranged on the mask table 1, a finger base 6 rotationally connected with the sliding table 4 and a pressure sensor 8 arranged on the finger base 6, the output end of the first translation mechanism 5 is connected with the sliding table 4, the finger base 6 is slidably connected with an adsorption sliding block 7, a capacitance sensor 71 is arranged in the adsorption sliding block 7, a spring piece 9 is arranged between the finger base 6 and the sliding table 4, the deformation detection component 2 and the transportation component 3 are respectively arranged above the mask table 1, the transportation component 3 is arranged between the deformation detection component 2 and the mask table 1, the output end of the transportation component 3 is provided with a plurality of adsorption fingers 10, and the adsorption sliding block 7 and the adsorption fingers 10 are externally connected with a negative pressure mechanism.
Wherein the negative pressure mechanism is not shown in the drawings.
In the first embodiment of the finger pad, referring to fig. 2, the finger pad 6 is provided with a step portion 61, a horizontal mounting portion 62 connected to the bottom of the step portion 61, and a vertical mounting portion 63 connected to the top of the step portion 61, and the suction slider 7 is horizontally slidably provided on the horizontal mounting portion 62, and the pressure sensor 8 is mounted on the vertical mounting portion 63.
When the mask plate 20 is adsorbed by the adsorption finger 10 under the action of the negative pressure mechanism, the mask plate 20 is conveyed to the adsorption slide block 7 under the drive of the conveying assembly 3, after the capacitive sensor 71 on the adsorption slide block 7 detects the mask plate 20, the adsorption slide block 7 adsorbs and fixes the mask plate 20 under the action of the negative pressure mechanism, then the sliding table 4 translates towards the mask plate 20 under the drive of the first translation mechanism 5 so as to enable the finger base 6 to squeeze the mask plate 20, at the moment, the side edge of the mask plate 20 applies extrusion force to the pressure sensor 8, the pressure sensor 8 detects extrusion force data, and meanwhile, the conveying assembly 3 drives the adsorption finger 10 to move upwards for a small distance so that the mask plate 20 slightly protrudes upwards, and the finger base 6 can rotate along with the angle change between the position adsorbed by the mask plate 20 and the horizontal plane due to the rotary connection between the finger base 6 and the sliding table 4 so as to enable the adsorption slide block 7 to adsorb and fix the mask plate 20 better; then the finger 10 is absorbed to release the mask plate 20, and the mask plate is reset under the drive of the conveying assembly 3; the deformation detection assembly 2 detects the mask 20, and the first translation mechanism 5 controls the horizontal movement direction and the movement distance of the sliding table 4 according to the detection data of the pressure sensor 8 and the detection data of the deformation detection assembly 2. By extruding the mask 20, the mask 20 is adjusted to be in a relatively flat state.
In the second embodiment of the finger base, referring to fig. 3, a horizontal mounting portion 62 is provided on the finger base 6, the suction slider 7 is horizontally slidably provided on the horizontal mounting portion 62, and the pressure sensor 8 is mounted on the horizontal mounting portion 62.
When the mask plate 20 is adsorbed by the adsorption finger 10 under the action of the negative pressure mechanism, the mask plate 20 is conveyed to the adsorption slide block 7 under the drive of the conveying assembly 3, after the capacitive sensor 71 on the adsorption slide block 7 detects the mask plate 20, the mask plate 20 is adsorbed and fixed by the adsorption slide block 7 under the action of the negative pressure mechanism, then the mask plate 20 is released by the adsorption finger 10, and is reset under the drive of the conveying assembly 3, the mask plate 20 is recessed downwards due to dead weight, and the finger base 6 is rotationally connected with the sliding table 4, so that the finger base 6 can rotate along with the angle change between the position adsorbed by the mask plate 20 and the horizontal plane, and the adsorption slide block 7 can better adsorb and fix the mask plate 20; at this time, the adsorption slider 7 applies a pressing force to the pressure sensor 8, and the pressure sensor 8 detects data of the pressure; the deformation detection assembly 2 detects the mask 20, and the first translation mechanism 5 controls the horizontal movement direction and the movement distance of the sliding table 4 according to the detection data of the pressure sensor 8 and the detection data of the deformation detection assembly 2. By stretching the mask 20, the mask 20 is adjusted to be in a relatively flat state.
The output end of the first translation mechanism 5 is provided with a joint 30, a rotating pin 301 is connected to the joint 30, and the sliding table 4 and the finger base 6 are respectively connected with the rotating pin 301 in a rotating mode. In the deformation adjustment process of the mask 20, the first translation mechanism 5 drives the sliding table 4 to horizontally slide through the connector 30, the finger base 6 rotates around the axis of the rotating pin 301, the flexibility of the rotation of the finger base 6 is improved through the arrangement of the rotating pin 301, the adsorption sliding block 7 is better contacted with the mask 20, and the adsorption stability is further guaranteed. And be equipped with shell fragment 9 between finger base 6 and the slip table 4, shell fragment 9 can restrict the rotation scope of finger base 6, avoid mask 20 to place behind absorption slider 7, and finger base 6 and slip table 4 take place to collide with.
One end of the elastic sheet 9 is fixed on the sliding table 4, and the other end abuts against the lower surface of the finger base 6.
The capacitive sensor 71 is used to detect whether the reticle 20 falls onto the suction slider 7. The capacitance sensor 71 may be replaced by another sensor to detect whether the mask 20 falls onto the suction slider 7, such as a pressure sensor provided at the bottom of the suction slider 7, and the pressure sensor is slidably connected to the horizontal mounting portion 62.
In order to realize the functions of supporting and deformation adjustment by matching a plurality of adjusting components, the number of the adjusting components is more than three. Specifically, as shown in fig. 4, three adjusting assemblies may be provided, one adjusting assembly is located at the left side of the mask stage 1, and the other two adjusting assemblies are located at two ends of the right side of the mask stage 1; as shown in fig. 5, the number of the adjusting components can be four, and the four adjusting components are symmetrically distributed on the left side and the right side of the mask table 1; the adjusting components can be distributed on the left and right sides of the mask table 1 in an equidistant or unequal arrangement mode.
Further, a sliding rail is disposed on the horizontal mounting portion 62, and the adsorption slider 7 is slidably connected with the sliding rail, so that the adsorption slider 7 can slide for a short stroke relative to the finger base 6, that is, a contact state between the pressure sensor 8 and the side edge of the mask 20 is changed, so that the pressure sensor 8 can conveniently detect the extrusion force applied by the side edge of the mask 20.
In order to realize the horizontal movement of the sliding table 4 driven by the first translation mechanism 5, referring to fig. 2, the first translation mechanism 5 includes a guide rail 51 installed on the mask table 1, a support 52 installed on the mask table 1, and an electric push rod 53 installed on the support 52, where the sliding table 4 is slidably connected with the guide rail 51, and an extension rod of the electric push rod 53 is connected with the joint 30. The extension or retraction of the electric push rod 53 drives the joint 30 to move so that the slide table 4 moves horizontally along the guide rail 51.
In order to detect the deformation condition of the mask 20, referring to fig. 1, the deformation detection assembly 2 includes a mounting plate 21, a ranging sensor 22 and an image sensor 23, where a plurality of ranging sensors 22 are disposed on the lower surface of the mounting plate 21 and used for detecting the distance between the mask 20, in this embodiment, preferably, a plurality of ranging sensors 22 are disposed on the lower surface of the mounting plate 21 in a matrix arrangement manner, and the ranging sensors 22 located at different positions measure the distance between the mask 20 to obtain the data of the deformation condition of the mask 20. The image sensor 23 is arranged on the lower surface of the mounting plate 21 and is used for detecting the position of the mask table 1, specifically, the mounting plate 21 and the mask table 1 are both provided with a mark, a light source is arranged below the mark of the mask table 1, the image sensor 23 is arranged above the mark of the mounting plate 21, the mark of the mask table 1 is displayed under the action of the light source, and when the image sensor 23 detects that the two marks are overlapped, the mask table 1 reaches a designated position, so that the mask table 1 is aligned, and after the mask plate 20 is placed on the adjusting assembly, the distance sensors 22 can detect distance data between the mask plate 20.
Referring to fig. 1, the transporting assembly 3 includes a second translation mechanism 31, a movable table 32, and a lifting mechanism 33, the movable table 32 is mounted at an output end of the second translation mechanism 31, the lifting mechanism 33 is mounted at a bottom of the movable table 32, and a plurality of adsorbing fingers 10 are mounted at an output end of the lifting mechanism 33. The movable table 32 moves horizontally under the drive of the second translation mechanism 31, and the adsorbing finger 10 moves up and down under the drive of the lifting mechanism 33, so that the mask 20 adsorbed and fixed by the adsorbing finger 10 is carried to a plurality of adjusting components of the mask table 1.
Further, the adsorbing finger 10 is hinged to the output end of the lifting mechanism 33, so that the adsorbing finger 10 can rotate around the hinge center, so as to ensure that the adsorbing finger 10 can better adsorb and fix the mask 20.
Further, the second translation mechanism 31 may be a linear motor, the second translation mechanism 31 drives the movable table 32 to move horizontally, and the second translation mechanism 31 may be a ball screw transmission mechanism, a synchronous belt transmission mechanism, or the like, which can realize the horizontal movement of the movable table 32. The lifting mechanism 33 may be an electric push rod, the end of the extending rod of the electric push rod is fixed with a suction cup seat, a plurality of adsorbing fingers 10 are hinged with the suction cup seat, the extending rod of the electric push rod extends or retracts to drive the adsorbing fingers 10 to do lifting motion, and in addition, the lifting mechanism 33 may be a mechanism such as a double-rod driving cylinder, which can achieve lifting motion of the adsorbing fingers 10.
The invention provides a mask deformation control method, which adopts the mask deformation control device.
In a first embodiment, the method comprises the steps of:
s1, an image sensor 23 on a deformation detection assembly 2 detects whether the position of a mask table 1 is correct, an adsorption finger 10 adsorbs and fixes a mask 20 under the action of a negative pressure mechanism, the mask 20 is conveyed onto an adsorption slide block 7 under the cooperation of a second translation mechanism 31 and a lifting mechanism 33, and after a capacitance sensor 71 on the adsorption slide block 7 detects the mask 20, the adsorption slide block 7 adsorbs and fixes the mask 20 under the action of the negative pressure mechanism.
S2, referring to FIG. 6, the first translation mechanism 5 drives the sliding table 4 to translate a distance towards the mask 20, the pressure sensor 8 detects the extrusion force applied by the mask 20, and at the same time, the adsorbing finger 10 is lifted a distance under the driving of the lifting mechanism 33, so that the middle part of the mask 20 is raised upwards.
S3, the adsorbing finger 10 releases the mask 20, and the transporting assembly 3 drives the adsorbing finger 10 to reset.
S4, each ranging sensor 22 of the deformation detection assembly 2 detects the distance between the sensor and the mask plate 20, and the first translation mechanism 5 controls the horizontal movement direction and the movement distance of the sliding table 4 according to the detection data of the ranging sensor 22 and the detection data of the pressure sensor 8, so that each adjustment assembly adjusts the mask plate 20 to a relatively flat state.
Each adjusting component controls the horizontal moving direction and the moving distance of the sliding table 4 according to the detection data of the pressure sensor 8 and the ranging sensor 22, so that the finger base 6 can adjust the mask 20 to a relatively flat state by extruding the mask 20.
In a second embodiment, the method comprises the steps of:
s1, an image sensor 23 on a deformation detection assembly 2 detects whether the position of a mask table 1 is correct, an adsorption finger 10 adsorbs and fixes a mask 20 under the action of a negative pressure mechanism, the mask 20 is conveyed onto an adsorption slide block 7 under the cooperation of a second translation mechanism 31 and a lifting mechanism 33, and after a capacitance sensor 71 on the adsorption slide block 7 detects the mask 20, the adsorption slide block 7 adsorbs and fixes the mask 20 under the action of the negative pressure mechanism.
S2, referring to FIG. 7, the adsorbing finger 10 releases the mask plate 20, and the transporting assembly 3 drives the adsorbing finger 10 to reset, so that the mask plate 20 is recessed downwards due to self weight.
And S3, the pressure sensor 8 detects the pressure applied by the adsorption sliding block 7.
S4, each ranging sensor 22 of the deformation detection assembly 2 detects the distance between the sensor and the mask plate 20, and the first translation mechanism 5 controls the horizontal movement direction and the movement distance of the sliding table 4 according to the detection data of the ranging sensor 22 and the detection data of the pressure sensor 8, so that each adjustment assembly adjusts the mask plate 20 to a relatively flat state.
Each adjusting component controls the horizontal moving direction and the moving distance of the sliding table 4 according to the detection data of the pressure sensor 8 and the distance measuring sensor 22, so that the finger base 6 can adjust the mask 20 to a relatively flat state by stretching the mask 20.
It will be understood that equivalents and modifications will occur to those skilled in the art based on the present invention and its spirit, and all such modifications and substitutions are intended to be included within the scope of the present invention.

Claims (8)

1. The mask deformation control device is characterized by comprising a mask table, an adjusting assembly, a deformation detection assembly and a transportation assembly, wherein the adjusting assemblies are respectively arranged on two corresponding sides of the mask table, each adjusting assembly comprises a sliding table slidably arranged on the mask table, a first translation mechanism arranged on the mask table, a finger base rotationally connected with the sliding table and a pressure sensor arranged on the finger base, the output end of the first translation mechanism is connected with the sliding table, the finger base is slidably connected with an adsorption sliding block, a capacitance sensor is arranged in the adsorption sliding block, a spring piece is arranged between the finger base and the sliding table, the deformation detection assembly and the transportation assembly are respectively arranged above the mask table, the transportation assembly is arranged between the deformation detection assembly and the mask table, the output end of the transportation assembly is provided with a plurality of adsorption fingers, and the adsorption sliding block and the adsorption fingers are externally connected with a negative pressure mechanism; the output end of the first translation mechanism is provided with a joint, a rotating pin is connected to the joint, and the sliding table and the finger base are respectively connected with the rotating pin in a rotating way; the first translation mechanism comprises a guide rail arranged on the mask table, a support arranged on the mask table and an electric push rod arranged on the support, wherein the sliding table is in sliding connection with the guide rail, and an extension rod of the electric push rod is connected with the connector.
2. The mask deformation control device according to claim 1, wherein the finger base is provided with a step portion, a horizontal mounting portion connected to the bottom of the step portion, and a vertical mounting portion connected to the top of the step portion, the suction slider is horizontally slidably disposed on the horizontal mounting portion, and the pressure sensor is mounted on the vertical mounting portion.
3. The mask deformation control device according to claim 1, wherein the finger base is provided with a horizontal mounting portion, the suction slider is horizontally slidably disposed on the horizontal mounting portion, and the pressure sensor is mounted on the horizontal mounting portion.
4. A reticle deformation control device according to claim 2 or 3 wherein the number of adjustment assemblies is more than three.
5. A mask deformation control device according to claim 2 or 3, wherein the deformation detection assembly comprises a mounting plate, a distance measuring sensor and an image sensor, wherein the plurality of distance measuring sensors are arranged on the lower surface of the mounting plate and used for detecting the distance between the mask and the image sensor is arranged on the lower surface of the mounting plate and used for detecting the position of the mask table.
6. A mask deformation control device according to claim 2 or 3, wherein the transportation assembly comprises a second translation mechanism, a movable table and a lifting mechanism, the movable table is mounted at the output end of the second translation mechanism, the lifting mechanism is mounted at the bottom of the movable table, and a plurality of adsorbing fingers are hinged with the output end of the lifting mechanism.
7. A mask deformation control method, characterized in that the mask deformation control device according to claim 2 is adopted, comprising the following steps:
s1, adsorbing fingers adsorb and fix a mask under the action of a negative pressure mechanism, conveying the mask onto an adsorption slide block under the drive of a conveying assembly, and adsorbing and fixing the mask by the adsorption slide block under the action of the negative pressure mechanism after a capacitance sensor on the adsorption slide block detects the mask;
s2, the first translation mechanism drives the sliding table to translate a distance towards the mask plate, the pressure sensor detects extrusion force applied by the mask plate, and the adsorption finger moves upwards a distance under the drive of the conveying assembly, so that the middle part of the mask plate protrudes upwards;
s3, releasing the mask by adsorbing the finger, and driving the adsorbing finger to reset by the conveying assembly;
s4, detecting the mask plate by the deformation detection assembly, and controlling the horizontal movement direction and the movement distance of the sliding table by the first translation mechanism according to the detection data of the deformation detection assembly and the detection data of the pressure sensor so as to enable each adjustment assembly to adjust the mask plate to be in a relatively flat state.
8. A mask deformation control method, characterized in that the mask deformation control device according to claim 3 is adopted, comprising the following steps:
s1, adsorbing fingers adsorb and fix a mask under the action of a negative pressure mechanism, conveying the mask onto an adsorption slide block under the drive of a conveying assembly, and adsorbing and fixing the mask by the adsorption slide block under the action of the negative pressure mechanism after a capacitance sensor on the adsorption slide block detects the mask;
s2, releasing the mask plate by the adsorption finger, and driving the adsorption finger to reset by the conveying assembly, wherein the mask plate is downwards sunken due to dead weight;
s3, detecting the pressure applied by the adsorption sliding block by the pressure sensor;
s4, detecting the mask plate by the deformation detection assembly, and controlling the horizontal movement direction and the movement distance of the sliding table by the first translation mechanism according to the detection data of the deformation detection assembly and the detection data of the pressure sensor so as to enable each adjustment assembly to adjust the mask plate to be in a relatively flat state.
CN202310477896.1A 2023-04-27 2023-04-27 Mask deformation control device and method Active CN116661254B (en)

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6258492B1 (en) * 1998-08-26 2001-07-10 Canon Kabushiki Kaisha X-ray mask structure and method of making the same
JP2005322671A (en) * 2004-05-06 2005-11-17 Renesas Technology Corp Reticle stage
JP2007184328A (en) * 2006-01-04 2007-07-19 Nsk Ltd Exposure apparatus
CN104635429A (en) * 2013-11-14 2015-05-20 上海微电子装备有限公司 Mask gravity-compensated device used for lithography equipment
CN104635427A (en) * 2013-11-14 2015-05-20 上海微电子装备有限公司 Mask shaping apparatus used for lithography equipment and mask shaping method
CN208673039U (en) * 2018-08-21 2019-03-29 咸阳彩虹光电科技有限公司 Light shield curvature correction device and exposure machine

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6258492B1 (en) * 1998-08-26 2001-07-10 Canon Kabushiki Kaisha X-ray mask structure and method of making the same
JP2005322671A (en) * 2004-05-06 2005-11-17 Renesas Technology Corp Reticle stage
JP2007184328A (en) * 2006-01-04 2007-07-19 Nsk Ltd Exposure apparatus
CN104635429A (en) * 2013-11-14 2015-05-20 上海微电子装备有限公司 Mask gravity-compensated device used for lithography equipment
CN104635427A (en) * 2013-11-14 2015-05-20 上海微电子装备有限公司 Mask shaping apparatus used for lithography equipment and mask shaping method
CN208673039U (en) * 2018-08-21 2019-03-29 咸阳彩虹光电科技有限公司 Light shield curvature correction device and exposure machine

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