CN116504696A - A kind of PECVD transfer device and transfer method - Google Patents
A kind of PECVD transfer device and transfer method Download PDFInfo
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- CN116504696A CN116504696A CN202310776794.XA CN202310776794A CN116504696A CN 116504696 A CN116504696 A CN 116504696A CN 202310776794 A CN202310776794 A CN 202310776794A CN 116504696 A CN116504696 A CN 116504696A
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
- H10P72/32—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations between different workstations
- H10P72/3202—Mechanical details, e.g. rollers or belts
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
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- H—ELECTRICITY
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- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/121—The active layers comprising only Group IV materials
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Abstract
本发明公开了一种PECVD转运装置及转运方法,包括底座和设置在底座上的一号架,还包括并列设置在一号架上的一号输送线和二号输送线、设置在一号架上与一号输送线对应的一号变截距机构以及与二号输送线对应的二号变截距机构、设置在底座上与一号输送线对应的一号载具滑台机构以及与二号输送线对应的二号载具滑台机构,所述底座上还设置有二号架,所述一号载具滑台和二号载具滑台均位于二号架下方,所述二号架上设置有机械臂,所述一号输送线和二号输送线关于机械臂对称,所述机械臂用于将硅片在一号变截距机构和一号载具滑台机构之间切换以及在二号变截距机构和二号载具滑台机构之间切换。优点:占地更小、效率更高。
The invention discloses a PECVD transfer device and a transfer method, comprising a base and a No. The No. 1 variable intercept mechanism corresponding to the No. 1 conveying line, the No. 2 variable intercept mechanism corresponding to the No. 2 conveying line, the No. 1 carrier slide mechanism corresponding to the No. The No. 2 carrier slide mechanism corresponding to the No. 2 conveyor line is also provided with a No. 2 frame on the base. The No. 1 carrier slide table and the No. 2 carrier slide table are both located under the No. 2 frame. The rack is equipped with a mechanical arm, and the No. 1 conveying line and No. 2 conveying line are symmetrical about the robotic arm, and the robotic arm is used to switch the silicon wafer between the No. 1 variable intercept mechanism and the No. 1 carrier slide mechanism. And switch between the No. 2 variable intercept mechanism and the No. 2 carrier slide mechanism. Advantages: smaller footprint and higher efficiency.
Description
技术领域technical field
本发明涉及太阳能电池技术领域,具体为一种PECVD转运装置及转运方法。The invention relates to the technical field of solar cells, in particular to a PECVD transfer device and a transfer method.
背景技术Background technique
太阳能电池硅片在制造过程中需要进行一系列加工工序,包括清洗、镀膜等,在各个工序中,需要对硅片在石墨舟和输送线之间转移。现有的转移装置多采用双输送线设置,其中每条输送线对应一条石墨舟移动机构,在这种设置中,机械臂是设置在两条石墨舟移动机构之间,机械臂的路径受限,且整个转运装置占地较大,使得转运效率低以及占地大。During the manufacturing process of silicon wafers for solar cells, a series of processing procedures are required, including cleaning, coating, etc. In each process, silicon wafers need to be transferred between graphite boats and conveying lines. Most of the existing transfer devices are set up with double conveying lines, where each conveying line corresponds to a graphite boat moving mechanism. In this setting, the mechanical arm is set between the two graphite boat moving mechanisms, and the path of the mechanical arm is limited. , and the entire transfer device occupies a large area, which makes the transfer efficiency low and occupies a large area.
鉴于此,有必要提供一种PECVD转运装置及转运方法。In view of this, it is necessary to provide a PECVD transfer device and a transfer method.
发明内容Contents of the invention
本发明提供的一种PECVD转运装置及转运方法,有效的解决了现有转运装置占地大以及转运效率低的问题。The PECVD transfer device and transfer method provided by the present invention effectively solve the problems that the existing transfer device occupies a large area and has low transfer efficiency.
本发明所采用的技术方案是:The technical scheme adopted in the present invention is:
一种PECVD转运装置,包括底座和设置在底座上的一号架,还包括并列设置在一号架上的一号输送线和二号输送线、设置在一号架上与一号输送线对应的一号变截距机构以及与二号输送线对应的二号变截距机构、设置在底座上与一号输送线对应的一号载具滑台机构以及与二号输送线对应的二号载具滑台机构,所述底座上还设置有二号架,所述一号载具滑台和二号载具滑台均位于二号架下方,所述二号架上设置有机械臂,所述一号输送线和二号输送线关于机械臂对称,所述机械臂用于将硅片在一号变截距机构和一号载具滑台机构之间切换以及在二号变截距机构和二号载具滑台机构之间切换。A PECVD transfer device, including a base and a No. 1 rack arranged on the base, and also includes a No. 1 conveying line and a No. 2 conveying line arranged side by side on the No. 1 rack, which are arranged on the No. 1 rack corresponding to the No. 1 transfer line The No. 1 variable-intercept mechanism and the No. 2 variable-intercept mechanism corresponding to the No. 2 conveyor line, the No. 1 carrier slide mechanism corresponding to the No. The carrier slide mechanism, the base is also provided with a No. 2 frame, the No. 1 carrier slide and the No. 2 carrier slide are located under the No. 2 frame, and the No. 2 frame is provided with a mechanical arm. The No. 1 conveyor line and the No. 2 conveyor line are symmetrical about the mechanical arm, and the mechanical arm is used to switch the silicon wafer between the No. 1 variable intercept mechanism and the No. 1 carrier slide mechanism, and the No. Switch between the mechanism and the No. 2 carrier slide mechanism.
进一步的是:所述一号变截距机构和二号变截距机构相同,所述一号输送线和二号输送线结构相同,所述一号输送线包括并列设置的一号线A和一号线B,所述一号变截距机构包括对称设置的变截距组件A和变截距组件B,所述变截距组件A包括沿Z方向设置在一号架上的一号直线模组、设置在一号直线模组输出端的一号板、设置在一号板上的一号直线导轨、滑动设置在一号导轨两端且相互对称的夹板、设置在夹板相对一侧的托举柱、固定设置在一号板上用于驱动两个夹板相对运动或相背运动的驱动件。Further, the No. 1 variable intercept mechanism is the same as the No. 2 variable intercept mechanism, the No. 1 conveying line and the No. 2 conveying line have the same structure, and the No. 1 conveying line includes the No. 1 line A and No. 1 line A arranged side by side. No. 1 line B, the No. 1 variable intercept mechanism includes symmetrically arranged variable intercept components A and variable intercept components B, and the variable intercept component A includes No. 1 straight line arranged on the No. 1 frame along the Z direction module, the No.1 plate set at the output end of the No.1 linear module, the No.1 linear guide rail set on the No.1 plate, the splints slidingly set at both ends of the No.1 guide rail and symmetrical to each other, and the support set on the opposite side of the splint The lifting column is fixedly arranged on the No. 1 plate and is used to drive the two splints to move relative to each other or move away from each other.
进一步的是:所述一号载具滑台机构包括沿X方向设置在底座上的二号直线导轨、滑动设置在二号直线导轨上的滑板、固定设置在底座上用于驱动滑板沿二号直线导轨滑动的二号丝杆、沿Y方向固定设置在滑板上的三号直线导轨、滑动设置在三号直线导轨上的载板、设置在载板上的浮动组件、设置在浮动组件上的石墨舟、设置在滑板上用于对浮动组件上进行夹紧的前后夹紧组件和左右夹紧组件。Further, the No. 1 carrier slide mechanism includes a No. 2 linear guide rail arranged on the base along the X direction, a slider slidingly arranged on the No. 2 linear guide rail, and a slider fixed on the base for driving the No. 2 linear guide rail The No. 2 screw rod that slides on the linear guide rail, the No. 3 linear guide rail that is fixed on the slide plate along the Y direction, the carrier plate that slides on the No. 3 linear guide rail, the floating component that is set on the carrier plate, and the The graphite boat, the front and rear clamping components and the left and right clamping components arranged on the slide plate for clamping the floating component.
进一步的是:所述前后夹紧组件包括位于滑板前端的前推移件以及位于滑板后端的后推移件,所述后推移件包括设置在滑板上的一号立座、沿Z方向设置在立座上的四号直线导轨、滑动设置在四号直线导轨上的升降板、固定设置在一号立座上用于驱动升降板沿四号直线导轨升降的一号气缸、沿X方向设置在升降板上的二号气缸、固定设置在二号气缸输出端的一号连接块以及沿Z向设置在一号连接块上的若干一号滚轴,所述前推移件包括设置在滑板上的二号立座、固定设置在二号立座上的三号气缸、设置在三号气缸输出端的二号连接块以及设置在二号连接块上的若干二号滚轴。Further, the front and rear clamping assembly includes a front pusher located at the front end of the skateboard and a rear pusher located at the rear end of the skateboard, and the rear pusher includes a No. The No. 4 linear guide rail on the top, the lifting plate slidingly set on the No. 4 linear guide rail, the No. 1 cylinder fixed on the No. 1 stand for driving the lifting plate to go up and down along the No. 4 linear guide rail, and the No. 1 cylinder set on the lifting plate along the X direction The No. 2 cylinder on the No. 2 cylinder, the No. 1 connection block fixedly arranged on the output end of the No. 2 cylinder, and a number of No. 1 rollers arranged on the No. 1 connection block along the Z direction. Seat, the No. 3 air cylinder that is fixedly arranged on the No. 2 stand, the No. 2 connection block that is arranged on the output end of the No. 3 air cylinder, and some No. 2 rollers that are arranged on the No. 2 connection block.
进一步的是:所述左右夹紧组件包括位于滑板一侧的定位件以及位于滑板另一侧的夹推件,所述夹推件包括设置在滑板上的五号立座、沿Y方向设置在五号立座上的五号直线导轨、滑动设置在五号直线导轨上的推移架以及固定设置在五号立座上用于驱动推移架沿五号直线导轨移动的五号气缸。Further, the left and right clamping components include a positioning piece on one side of the slide plate and a clamping push piece on the other side of the slide plate, and the clamping push piece includes a No. The No. 5 linear guide rail on the No. 5 stand, the push frame that is slidably arranged on the No. 5 linear guide rail, and the No. 5 cylinder that is fixedly arranged on the No. 5 stand for driving the push frame to move along the No. 5 linear guide rail.
一种PECVD转运方法,包括PECVD转运装置,一号载具滑台机构将硅片输送至与机械臂对接的位置,二号载具滑台机构将硅片输送至与机械臂对接的位置,随后机械臂将一号载具滑台机构中的硅片转移至一号变截距机构上,将二号载具滑台机构中的硅片转移至二号变截距机构上,随后一号输送线接收一号变截距机构中的硅片,二号输送线接收二号变截距机构中的硅片;或者,一号载具滑台机构移动至便于接收机械臂中硅片的位置,二号载具滑台机构移动至便于接收机械臂中的硅片的位置,同时,一号变截距机构接收一号输送线中的硅片,二号变截距机构接收二号输送线中的硅片,随后机械臂将一号变截距机构中的硅片转移至一号载具滑台机构,机械臂将二号变截距机构中的硅片转移至二号载具滑台机构。A PECVD transfer method, including a PECVD transfer device, the No. 1 carrier slide mechanism transports the silicon wafer to the position docked with the mechanical arm, and the No. 2 carrier slide mechanism transports the silicon wafer to the position docked with the mechanical arm, and then The robotic arm transfers the silicon wafers in the No. 1 carrier slide mechanism to the No. 1 variable-intercept mechanism, and transfers the silicon wafers in the No. 2 carrier slide mechanism to the No. 2 variable-intercept mechanism, and then No. 1 conveys The No. 1 conveyor line receives the silicon wafers from the No. 1 variable-intercept mechanism, and the No. 2 conveyor line receives the silicon wafers from the No. 2 variable-intercept mechanism; or, the No. 1 carrier slide mechanism moves to a position convenient for receiving the silicon wafers in the mechanical arm. The No. 2 carrier slide mechanism moves to a position convenient for receiving the silicon wafers in the robotic arm. At the same time, the No. 1 variable-intercept mechanism receives the silicon wafers in the No. 1 conveyor line, and the No. 2 variable-intercept mechanism receives the silicon wafers in the No. 2 conveyor line. Then the robotic arm transfers the silicon wafer in the No. 1 variable intercept mechanism to the No. 1 carrier slide mechanism, and the robotic arm transfers the silicon wafer in the No. 2 variable intercept mechanism to the No. 2 carrier slide mechanism .
发明的有益效果:将机械臂设置在二号架上,缩短了一号载具滑台和二号载具滑台的间距,使得占地更小,同时提高了机械臂的高度,缩短了机械臂转移硅片的路径,能够有效的提高工作效率。Beneficial effects of the invention: the mechanical arm is set on the No. 2 frame, the distance between the No. 1 carrier slide table and the No. 2 carrier slide table is shortened, so that the occupied area is smaller, the height of the mechanical arm is increased, and the mechanical arm is shortened The arm transfers the path of silicon wafers, which can effectively improve work efficiency.
附图说明Description of drawings
图1为本申请的实施例所提供的PECVD转运装置的整体示意图。FIG. 1 is an overall schematic diagram of a PECVD transport device provided by an embodiment of the present application.
图2为本申请的实施例所提供的PECVD转运装置的一号变截距机构的示意图。FIG. 2 is a schematic diagram of the No. 1 variable intercept mechanism of the PECVD transfer device provided by the embodiment of the present application.
图3为本申请的实施例所提供的PECVD转运装置的一号载具滑台机构的示意图。FIG. 3 is a schematic diagram of the No. 1 carrier slide mechanism of the PECVD transfer device provided by the embodiment of the present application.
图4为本申请的实施例所提供的PECVD转运装置的后推移件的示意图。Fig. 4 is a schematic diagram of a rear pusher of a PECVD transfer device provided by an embodiment of the present application.
图5为本申请的实施例所提供的PECVD转运装置的夹推件的示意图。FIG. 5 is a schematic diagram of a clamping and pushing member of a PECVD transfer device provided by an embodiment of the present application.
图6为本申请的实施例所提供的PECVD转运装置的前推移件的示意图。Fig. 6 is a schematic diagram of the forward moving member of the PECVD transfer device provided by the embodiment of the present application.
图中标记为:1、底座;2、一号架;3、一号输送线;4、二号输送线;5、一号变截距机构;6、二号变截距机构;7、一号载具滑台机构;8、二号载具滑台机构;9、二号架;10、机械臂;31、一号线A;32、一号线B;51、变截距组件A;52、变截距组件B;511、一号直线模组;512、一号板;513、一号直线导轨;514、夹板;515、托举柱;516、驱动件;72、滑板;73、二号丝杆;74、三号直线导轨;75、载板;76、浮动组件;77、石墨舟;781、前推移件;782、后推移件;7821、一号立座;7822、四号直线导轨;7823、升降板;7824、一号气缸;7825、二号气缸;7826、一号连接块;7827、一号滚轴;7811、二号立座;7812、三号气缸;7813、二号连接块;7814、二号滚轴;791、定位件;792、夹推件;7921、五号立座;7922、五号直线导轨;7923、推移架;7924、五号气缸;001、硅片。The marks in the figure are: 1. Base; 2. No. 1 frame; 3. No. 1 conveying line; 4. No. 2 conveying line; No. 1 carrier slide mechanism; 8. No. 2 carrier slide mechanism; 9. No. 2 frame; 10. Mechanical arm; 31. No. 1 line A; 32. No. 1 line B; 51. Variable intercept component A; 52. Variable intercept component B; 511. No. 1 linear module; 512. No. 1 plate; 513. No. 1 linear guide rail; 514. Splint; 515. Lifting column; No. 2 screw; 74. No. 3 linear guide; 75. Carrier plate; 76. Floating assembly; 77. Graphite boat; Linear guide rail; 7823, lifting plate; 7824, No. 1 cylinder; 7825, No. 2 cylinder; 7826, No. 1 connecting block; 7827, No. 1 roller; 7811, No. 2 stand; 7812, No. 3 cylinder; 7813, No. No. connection block; 7814, No. 2 roller; 791, positioning piece; 792, clip push piece; 7921, No. 5 stand; 7922, No. 5 linear guide; piece.
具体实施方式Detailed ways
为使本发明的上述目的、特征和优点能够更加明显易懂,下面结合附图对本发明的具体实施方式做详细的说明。In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings.
如图1所示,本申请的实施例所提供的一种PECVD转运装置,包括底座1和设置在底座1上的一号架2,还包括并列设置在一号架2上的一号输送线3和二号输送线4、设置在一号架2上与一号输送线3对应的一号变截距机构5以及与二号输送线4对应的二号变截距机构6、设置在底座1上与一号输送线3对应的一号载具滑台机构7以及与二号输送线4对应的二号载具滑台机构8,所述底座1上还设置有二号架9,所述一号载具滑台和二号载具滑台均位于二号架9下方,所述二号架9上设置有机械臂10,所述一号输送线3和二号输送线4关于机械臂10对称,所述机械臂10用于将硅片001在一号变截距机构5和一号载具滑台机构7之间切换以及在二号变截距机构6和二号载具滑台机构8之间切换。As shown in Figure 1, a PECVD transfer device provided by the embodiment of the present application includes a base 1 and a No. 3 and No. 2 conveying line 4, No. 1 variable intercept mechanism 5 corresponding to No. 1 conveying line 3 arranged on No. 1 frame 2 and No. 2 variable intercept mechanism 6 corresponding to No. 2 conveying line 4, arranged on the base No. 1 carrier slide mechanism 7 corresponding to No. 1 conveying line 3 on 1 and No. 2 carrier slide mechanism 8 corresponding to No. 2 conveying line 4. The base 1 is also provided with No. 2 frame 9, so The No. 1 carrier slide table and the No. 2 carrier slide table are all located below the No. 2 frame 9, and the No. 2 frame 9 is provided with a mechanical arm 10. The No. 1 conveyor line 3 and the No. 2 conveyor line 4 are about mechanical The arm 10 is symmetrical, and the mechanical arm 10 is used to switch the silicon wafer 001 between the No. 1 variable intercept mechanism 5 and the No. 1 carrier slide mechanism 7 and between the No. 2 variable intercept mechanism 6 and No. Switch between 8 sets of institutions.
实际使用时,一号载具滑台机构7和二号载具滑台机构8在X方向移动后,机械臂10将硅片001在一号载具滑台机构7和一号变截距机构5之间进行转移以及将硅片001在二号载具滑台机构8和二号变截距机构6之间进行转移。In actual use, after the No. 1 carrier slide mechanism 7 and the No. 2 carrier slide mechanism 8 move in the X direction, the mechanical arm 10 moves the silicon wafer 001 between the No. 1 carrier slide mechanism 7 and the No. 1 variable intercept mechanism. 5 and transfer the silicon wafer 001 between the No. 2 carrier slide mechanism 8 and the No. 2 variable intercept mechanism 6 .
上述设计中,将机械臂10设置在二号架9上,缩短了一号载具滑台7和二号载具滑台8的间距,使得占地更小,同时提高了机械臂10的高度,缩短了机械臂10转移硅片001的路径,能够有效的提高工作效率。In the above design, the mechanical arm 10 is arranged on the No. 2 frame 9, and the distance between the No. 1 carrier slide 7 and the No. 2 carrier slide 8 is shortened, so that the occupied area is smaller, and the height of the mechanical arm 10 is increased at the same time. , which shortens the path for the robot arm 10 to transfer the silicon wafer 001, and can effectively improve work efficiency.
具体地:如图1和图2所示,所述一号变截距机构5和二号变截距机构6相同,所述一号输送线3和二号输送线4结构相同,所述一号输送线3包括并列设置的一号线A31和一号线B32,所述一号变截距机构5包括对称设置的变截距组件A51和变截距组件B52,所述变截距组件A51包括沿Z方向设置在一号架2上的一号直线模组511、设置在一号直线模组511输出端的一号板512、设置在一号板512上的一号直线导轨513、滑动设置在一号导轨两端且相互对称的夹板514、设置在夹板514相对一侧的托举柱515、固定设置在一号板512上用于驱动两个夹板514相对运动或相背运动的驱动件516。Specifically: as shown in Figure 1 and Figure 2, the No. 1 variable intercept mechanism 5 and the No. 2 variable intercept mechanism 6 are the same, the No. 1 conveyor line 3 and the No. 2 conveyor line 4 have the same structure, and the No. The No. 1 conveying line 3 includes the No. 1 line A31 and the No. 1 line B32 arranged side by side, and the No. 1 variable intercept mechanism 5 includes a symmetrically arranged variable intercept assembly A51 and a variable intercept assembly B52, and the variable intercept assembly A51 It includes the No. 1 linear module 511 arranged on the No. 1 frame 2 along the Z direction, the No. 1 plate 512 arranged at the output end of the No. 1 linear module 511, the No. 1 linear guide rail 513 arranged on the No. 1 plate 512, and the sliding setting The two symmetrical splints 514 at both ends of the No. 1 guide rail, the lifting column 515 arranged on the opposite side of the splint 514, and the driving member fixedly arranged on the No. 1 plate 512 for driving the two splints 514 to move relative to each other or move away from each other 516.
实际使用时,通过一号变截距机构5向一号输送线3提供硅片001或接收一号输送线3中的硅片001,通过二号变截距机构6向二号输送线4提供硅片001或接收二号输送线4中的硅片001。一号变截距机构5和二号变截距机构6的工作原理相同,一号变截距机构5的工作原理为:通过一号直线模组511驱动一号板512升降,通过驱动件516驱动两个夹板514相对或相背运动,使得对应的托举柱515便于放置硅片001,在对硅片001的转移过程中通过一号直线模组511驱动一号板512的升降,使得一号板512升降从而使得待转移的硅片001与对应的托举柱515对应。In actual use, provide the silicon wafer 001 to the No. 1 conveying line 3 through the No. 1 variable intercept mechanism 5 or receive the silicon wafer 001 in the No. 1 conveying line 3, and provide the silicon wafer 001 to the No. 2 conveying line 4 through the No. 2 variable intercept mechanism 6 Silicon wafer 001 or receive the silicon wafer 001 in the No. 2 conveying line 4. The working principle of No. 1 variable intercept mechanism 5 and No. 2 variable intercept mechanism 6 is the same. The working principle of No. 1 variable intercept mechanism 5 is as follows: No. 1 plate 512 is driven up and down by No. Drive the two splints 514 to move relative or opposite to each other, so that the corresponding lifting column 515 is convenient for placing the silicon wafer 001. During the transfer process of the silicon wafer 001, the No. 1 plate 512 is driven up and down by the No. 1 linear module 511, so that a The number plate 512 is raised and lowered so that the silicon wafer 001 to be transferred corresponds to the corresponding lifting column 515 .
上述设计中,一号变截距机构5和二号变截距机构6的结构设计以及具体实施方式能够有效的对硅片001进行对中以及转移。In the above design, the structural design and specific implementation of the No. 1 variable intercept mechanism 5 and the No. 2 variable intercept mechanism 6 can effectively center and transfer the silicon wafer 001 .
具体地:如图3所示,所述一号载具滑台机构7包括沿X方向设置在底座1上的二号直线导轨、滑动设置在二号直线导轨上的滑板72、固定设置在底座1上用于驱动滑板72沿二号直线导轨滑动的二号丝杆73、沿Y方向固定设置在滑板72上的三号直线导轨74、滑动设置在三号直线导轨74上的载板75、设置在载板75上的浮动组件76、设置在浮动组件76上的石墨舟77、设置在滑板72上用于对浮动组件76上进行夹紧的前后夹紧组件和左右夹紧组件。Specifically: as shown in Figure 3, the No. 1 carrier slide mechanism 7 includes a No. 2 linear guide rail arranged on the base 1 along the X direction, a slide plate 72 slidably arranged on the No. 2 linear guide rail, and a sliding plate 72 fixedly arranged on the base. 1 is used to drive the No. 2 screw 73 for sliding the slide plate 72 along the No. 2 linear guide rail, the No. 3 linear guide rail 74 fixedly arranged on the slide plate 72 along the Y direction, the carrier plate 75 slidingly arranged on the No. 3 linear guide rail 74, The floating assembly 76 arranged on the carrier plate 75 , the graphite boat 77 arranged on the floating assembly 76 , the front and rear clamping assemblies and the left and right clamping assemblies arranged on the slide plate 72 for clamping the floating assembly 76 .
实际使用时,石墨舟77放置在滑板72上,前后夹紧组件对石墨舟77前后夹紧,左右夹紧组件用于对石墨舟77左右进行夹紧,二号丝杆73驱动滑板72沿二号直线导轨移动,使得滑板72沿X方向移动,从而使得石墨舟77移动至便于转移硅片001或接收硅片001的位置。During actual use, the graphite boat 77 is placed on the slide plate 72, the front and rear clamping components clamp the graphite boat 77 front and back, the left and right clamping components are used to clamp the graphite boat 77 left and right, and the second screw mandrel 73 drives the slide plate 72 along the two sides. No. 1 linear guide rail moves, so that the slide plate 72 moves along the X direction, so that the graphite boat 77 moves to a position convenient for transferring the silicon wafer 001 or receiving the silicon wafer 001.
上述设计中,一号载具滑台机构7的结构设计能够有效的石墨舟77进行定位以及保证石墨舟77准确的移动至合适的位置便于接收硅片001或转移硅片001。In the above design, the structural design of the No. 1 carrier slide mechanism 7 can effectively position the graphite boat 77 and ensure that the graphite boat 77 is accurately moved to a suitable position for receiving or transferring the silicon wafer 001 .
具体地:如图3、图4和图6所示,所述前后夹紧组件包括位于滑板72前端的前推移件781以及位于滑板72后端的后推移件782,所述后推移件782包括设置在滑板72上的一号立座7821、沿Z方向设置在立座上的四号直线导轨7822、滑动设置在四号直线导轨7822上的升降板7823、固定设置在一号立座7821上用于驱动升降板7823沿四号直线导轨7822升降的一号气缸7824、沿X方向设置在升降板7823上的二号气缸7825、固定设置在二号气缸7825输出端的一号连接块7826以及沿Z向设置在一号连接块7826上的若干一号滚轴7827,所述前推移件781包括设置在滑板72上的二号立座7811、固定设置在二号立座7811上的三号气缸7812、设置在三号气缸7812输出端的二号连接块7813以及设置在二号连接块7813上的若干二号滚轴7814。Specifically: as shown in Fig. 3, Fig. 4 and Fig. 6, the front and rear clamping assembly includes a front pusher 781 positioned at the front end of the slide plate 72 and a rear pusher 782 positioned at the rear end of the slide plate 72, and the rear pusher 782 includes a set The No. 1 stand 7821 on the slide plate 72, the No. 4 linear guide rail 7822 arranged on the stand along the Z direction, the lifting plate 7823 slidingly arranged on the No. 4 linear guide rail 7822, and the No. 1 stand 7821 fixedly arranged on the The No. 1 cylinder 7824 that drives the lifting plate 7823 to lift along the No. 4 linear guide rail 7822, the No. 2 cylinder 7825 that is arranged on the lifting plate 7823 along the X direction, the No. 1 connecting block 7826 that is fixedly installed on the output end of the No. 2 cylinder 7825, and the No. To the No. 1 rollers 7827 arranged on the No. 1 connecting block 7826, the front push piece 781 includes No. 2 stand 7811 arranged on the slide 72, and No. 3 air cylinder 7812 fixedly arranged on the No. 2 stand 7811 , No. 2 connecting block 7813 arranged on the output end of No. 3 cylinder 7812 and a number of No. 2 rollers 7814 arranged on the No. 2 connecting block 7813.
实际使用时,前推移件781和后推移件782分别对石墨舟77的前侧和后侧作用,后推移件782的动作为:一号气缸7824驱动升降板7823升降至便于一号滚轴7827与石墨舟77接触的位置,随后二号气缸7825驱动一号连接块7826向石墨舟77一侧运动,使得一号滚轴7827与石墨舟77相抵。前推移件781的动作为:三号气缸7812驱动二号连接块7813向石墨舟77前侧移动,使得二号滚轴7814与石墨舟77接触。In actual use, the front pusher 781 and the rear pusher 782 act on the front and rear sides of the graphite boat 77 respectively. The action of the rear pusher 782 is: the No. 1 cylinder 7824 drives the lifting plate 7823 to lift to facilitate the No. 1 roller 7827. At the position in contact with the graphite boat 77, the No. 2 cylinder 7825 drives the No. 1 connecting block 7826 to move to the side of the graphite boat 77, so that the No. 1 roller 7827 is offset against the graphite boat 77. The action of the forward pusher 781 is: the No. 3 cylinder 7812 drives the No. 2 connecting block 7813 to move to the front side of the graphite boat 77, so that the No. 2 roller 7814 is in contact with the graphite boat 77.
上述设计中,前推移件781和后推移件782的结构设计,能够便于对石墨舟77进行前后夹紧,同时一号滚轴7827和二号滚轴7814的结构设计便于在对石墨舟77前后进行夹紧过程中左右夹紧组件能够对石墨舟77的左右位置进行调节。In the above design, the structural design of the front pusher 781 and the rear pusher 782 can facilitate front and rear clamping of the graphite boat 77, while the structural design of the first roller 7827 and the second roller 7814 is convenient for the graphite boat 77 before and after. During the clamping process, the left and right clamping components can adjust the left and right positions of the graphite boat 77 .
具体地:如图3和图5所示,所述左右夹紧组件包括位于滑板72一侧的定位件791以及位于滑板72另一侧的夹推件792,所述夹推件792包括设置在滑板72上的五号立座7921、沿Y方向设置在五号立座7921上的五号直线导轨7922、滑动设置在五号直线导轨7922上的推移架7923以及固定设置在五号立座7921上用于驱动推移架7923沿五号直线导轨7922移动的五号气缸7924。Specifically: as shown in FIG. 3 and FIG. 5 , the left and right clamping assemblies include a positioning member 791 located on one side of the slide plate 72 and a clamping push piece 792 located on the other side of the slide plate 72, and the clamping push piece 792 includes a The No. 5 stand 7921 on the slide plate 72, the No. 5 linear guide rail 7922 arranged on the No. 5 stand 7921 along the Y direction, the push frame 7923 slidingly arranged on the No. 5 linear guide rail 7922, and the No. 5 stand 7921 fixedly arranged The No. 5 air cylinder 7924 that is used to drive the push frame 7923 to move along the No. 5 linear guide rail 7922.
实际使用时,夹推件792动作:通过五号气缸7924驱动推移架7923沿五号直线导轨7922向定位件791一侧运动,使得石墨舟77的两侧分别与推移架7923和定位件791相抵。In actual use, the pusher 792 moves: the No. 5 cylinder 7924 drives the pushing frame 7923 to move along the No. 5 linear guide rail 7922 to the side of the positioning part 791, so that the two sides of the graphite boat 77 are respectively offset against the pushing frame 7923 and the positioning part 791 .
上述设计中,左右夹紧组件的结构设计便于对石墨舟77进行左右夹紧。In the above design, the structural design of the left and right clamping components facilitates the left and right clamping of the graphite boat 77 .
一种PECVD转运方法,包括PECVD转运装置,一号载具滑台机构7将硅片001输送至与机械臂10对接的位置,二号载具滑台机构8将硅片001输送至与机械臂10对接的位置,随后机械臂10将一号载具滑台机构7中的硅片001转移至一号变截距机构5上,将二号载具滑台机构8中的硅片001转移至二号变截距机构6上,随后一号输送线3接收一号变截距机构5中的硅片001,二号输送线4接收二号变截距机构6中的硅片001。或者,一号载具滑台机构7移动至便于接收机械臂10中硅片001的位置,二号载具滑台机构8移动至便于接收机械臂10中的硅片001的位置,同时,一号变截距机构5接收一号输送线3中的硅片001,二号变截距机构6接收二号输送线4中的硅片001,随后机械臂10将一号变截距机构5中的硅片001转移至一号载具滑台机构7,机械臂10将二号变截距机构6中的硅片001转移至二号载具滑台机构8。A PECVD transfer method, including a PECVD transfer device, the No. 1 carrier slide mechanism 7 transports the silicon wafer 001 to the position docked with the mechanical arm 10, and the No. 2 carrier slide mechanism 8 transports the silicon wafer 001 to the position where it is connected to the mechanical arm 10, then the mechanical arm 10 transfers the silicon wafer 001 in the No. 1 carrier slide mechanism 7 to the No. 1 variable intercept mechanism 5, and transfers the silicon wafer 001 in the No. 2 carrier slide mechanism 8 to the On the No. 2 variable intercept mechanism 6 , the No. 1 conveying line 3 receives the silicon wafer 001 in the No. 1 variable intercept mechanism 5 , and the No. 2 conveying line 4 receives the silicon wafer 001 in the No. 2 variable intercept mechanism 6 . Or, the No. 1 carrier slide mechanism 7 moves to the position that is convenient to receive the silicon wafer 001 in the mechanical arm 10, and the No. 2 carrier slide mechanism 8 moves to the position that is convenient to receive the silicon wafer 001 in the mechanical arm 10. At the same time, a The number variable intercept mechanism 5 receives the silicon wafer 001 in the No. 1 conveying line 3, the No. 2 variable intercept mechanism 6 receives the silicon wafer 001 in the No. The silicon wafer 001 in the No. 1 carrier slide mechanism 7 is transferred to the No. 1 carrier slide mechanism 7, and the mechanical arm 10 transfers the silicon wafer 001 in the No. 2 variable intercept mechanism 6 to the No. 2 carrier slide mechanism 8.
进一步详细说明,所应理解的是,以上所述仅为本发明的具体实施例而已,并不用于限制本发明,凡在本发明的精神和原则之内,所做的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。In further detail, it should be understood that the above descriptions are only specific embodiments of the present invention, and are not intended to limit the present invention. Any modifications, equivalent replacements, Improvements and the like should all be included within the protection scope of the present invention.
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| CN117026213A (en) * | 2023-09-12 | 2023-11-10 | 弘瞬新能源材料科技(浙江)有限公司 | A quick clamping tool for graphite boat and boat sheet processing |
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