CN116323527A - 氟-2-丁烯的保存方法 - Google Patents

氟-2-丁烯的保存方法 Download PDF

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Publication number
CN116323527A
CN116323527A CN202180069510.2A CN202180069510A CN116323527A CN 116323527 A CN116323527 A CN 116323527A CN 202180069510 A CN202180069510 A CN 202180069510A CN 116323527 A CN116323527 A CN 116323527A
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CN
China
Prior art keywords
butene
fluoro
gas
chf
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202180069510.2A
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English (en)
Chinese (zh)
Inventor
铃木淳
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Resonac Corp
Original Assignee
Resonac Corp
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Filing date
Publication date
Application filed by Resonac Corp filed Critical Resonac Corp
Publication of CN116323527A publication Critical patent/CN116323527A/zh
Pending legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D85/00—Containers, packaging elements or packages, specially adapted for particular articles or materials
    • B65D85/70—Containers, packaging elements or packages, specially adapted for particular articles or materials for materials not otherwise provided for
    • B65D85/84—Containers, packaging elements or packages, specially adapted for particular articles or materials for materials not otherwise provided for for corrosive chemicals
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C17/00—Preparation of halogenated hydrocarbons
    • C07C17/38—Separation; Purification; Stabilisation; Use of additives
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C21/00—Acyclic unsaturated compounds containing halogen atoms
    • C07C21/02—Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds
    • C07C21/18—Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds containing fluorine

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
CN202180069510.2A 2020-10-15 2021-10-08 氟-2-丁烯的保存方法 Pending CN116323527A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020173921 2020-10-15
JP2020-173921 2020-10-15
PCT/JP2021/037428 WO2022080274A1 (ja) 2020-10-15 2021-10-08 フルオロ－２－ブテンの保管方法

Publications (1)

Publication Number Publication Date
CN116323527A true CN116323527A (zh) 2023-06-23

Family

ID=81208189

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202180069510.2A Pending CN116323527A (zh) 2020-10-15 2021-10-08 氟-2-丁烯的保存方法

Country Status (8)

Country Link
US (1) US20230303469A1 (https=)
EP (1) EP4230608A4 (https=)
JP (2) JPWO2022080274A1 (https=)
KR (1) KR102924126B1 (https=)
CN (1) CN116323527A (https=)
IL (1) IL302121A (https=)
TW (1) TWI798873B (https=)
WO (1) WO2022080274A1 (https=)

Citations (8)

* Cited by examiner, † Cited by third party
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WO1997002226A1 (en) * 1995-06-30 1997-01-23 E.I. Du Pont De Nemours And Company Process for the preparation of fluoroolefins
US20070265478A1 (en) * 2006-05-09 2007-11-15 Ulsan Chemical Co., Ltd. Dry-etching gas for semiconductor process and preparation method thereof
CN102884030A (zh) * 2010-03-26 2013-01-16 霍尼韦尔国际公司 制备六氟-2-丁烯的方法
US20170110336A1 (en) * 2016-12-31 2017-04-20 L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges CLuadeq Methods for minimizing sidewall damage during low k etch processes
JP2017092357A (ja) * 2015-11-16 2017-05-25 セントラル硝子株式会社 ドライエッチングガスおよびドライエッチング方法
CN107533969A (zh) * 2015-04-06 2018-01-02 中央硝子株式会社 干法蚀刻气体以及干法蚀刻方法
CN107848918A (zh) * 2015-08-07 2018-03-27 科慕埃弗西有限公司 使z‑1,1,1,4,4,4‑六氟‑2‑丁烯催化异构化为e‑1,1,1,4,4,4‑六氟‑2‑丁烯
WO2020170980A1 (ja) * 2019-02-21 2020-08-27 ダイキン工業株式会社 ハロゲン化ブテン化合物の製造方法

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JPH034972A (ja) 1989-05-31 1991-01-10 Shinko Pantec Co Ltd フッ素樹脂被覆法
JPH04341574A (ja) * 1991-05-18 1992-11-27 Nippon Paint Co Ltd 金属表面のリン酸亜鉛処理方法
KR100633870B1 (ko) * 2001-06-29 2006-10-13 쇼와 덴코 가부시키가이샤 고순도 불소 가스, 그의 제조 방법 및 용도
JP4666874B2 (ja) * 2002-07-02 2011-04-06 昭和電工株式会社 ペンタフルオロエタンの精製方法および製造方法並びにその用途
KR101347986B1 (ko) * 2005-11-30 2014-01-07 제온 코포레이션 불포화 불소화 탄소화합물의 정제 방법, 플루오로카본막의막형성 방법 및 반도체 장치의 제조 방법
JP2008081477A (ja) * 2006-09-29 2008-04-10 Nippon Zeon Co Ltd 含酸素フッ素化合物の容器充填物、含酸素フッ素化合物の保存方法、およびプラズマエッチング方法
WO2009041560A1 (ja) * 2007-09-28 2009-04-02 Zeon Corporation プラズマエッチング方法
JP5266902B2 (ja) * 2008-06-20 2013-08-21 日本ゼオン株式会社 含フッ素オレフィン化合物の製造方法
JP5607354B2 (ja) * 2009-12-28 2014-10-15 ユニオン昭和株式会社 高純度含フッ素化合物の製造方法及びその方法で得られた高純度含フッ素化合物
JP2012131731A (ja) * 2010-12-21 2012-07-12 Nippon Zeon Co Ltd フッ素化アルケンの製造法
EP2842928A4 (en) 2012-04-27 2017-11-08 Asahi Glass Company, Limited Method for preservation of tetrafluoropropene and container for preservation of tetrafluoropropene
CN104885203B (zh) * 2012-10-30 2017-08-01 乔治洛德方法研究和开发液化空气有限公司 用于高纵横比氧化物蚀刻的氟碳分子
CA2902979A1 (en) * 2013-03-06 2014-09-12 Honeywell International Inc. Storage stable foamable compositions containing 1,1,1,4,4,4-hexafluoro-2-butene
TWI658509B (zh) * 2014-06-18 2019-05-01 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude 用於ｔｓｖ／ｍｅｍｓ／功率元件蝕刻的化學物質
JP5915808B1 (ja) * 2014-12-24 2016-05-11 ダイキン工業株式会社 反応に用いた触媒の取り出し方法
CN108911947B (zh) * 2018-06-15 2021-11-02 中国民航大学 一种1,1,1,2,4,4,4-七氟-2-丁烯的制备方法

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997002226A1 (en) * 1995-06-30 1997-01-23 E.I. Du Pont De Nemours And Company Process for the preparation of fluoroolefins
US20070265478A1 (en) * 2006-05-09 2007-11-15 Ulsan Chemical Co., Ltd. Dry-etching gas for semiconductor process and preparation method thereof
CN102884030A (zh) * 2010-03-26 2013-01-16 霍尼韦尔国际公司 制备六氟-2-丁烯的方法
CN107533969A (zh) * 2015-04-06 2018-01-02 中央硝子株式会社 干法蚀刻气体以及干法蚀刻方法
CN107848918A (zh) * 2015-08-07 2018-03-27 科慕埃弗西有限公司 使z‑1,1,1,4,4,4‑六氟‑2‑丁烯催化异构化为e‑1,1,1,4,4,4‑六氟‑2‑丁烯
JP2017092357A (ja) * 2015-11-16 2017-05-25 セントラル硝子株式会社 ドライエッチングガスおよびドライエッチング方法
US20170110336A1 (en) * 2016-12-31 2017-04-20 L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges CLuadeq Methods for minimizing sidewall damage during low k etch processes
WO2020170980A1 (ja) * 2019-02-21 2020-08-27 ダイキン工業株式会社 ハロゲン化ブテン化合物の製造方法

Also Published As

Publication number Publication date
KR20230066089A (ko) 2023-05-12
US20230303469A1 (en) 2023-09-28
EP4230608A1 (en) 2023-08-23
JP2026063371A (ja) 2026-04-10
EP4230608A4 (en) 2024-11-27
TW202233549A (zh) 2022-09-01
JPWO2022080274A1 (https=) 2022-04-21
KR102924126B1 (ko) 2026-02-06
TWI798873B (zh) 2023-04-11
IL302121A (en) 2023-06-01
WO2022080274A1 (ja) 2022-04-21

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