CN116075700A - 红外线传感器件和用于该器件的电阻可变膜 - Google Patents

红外线传感器件和用于该器件的电阻可变膜 Download PDF

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Publication number
CN116075700A
CN116075700A CN202180027792.XA CN202180027792A CN116075700A CN 116075700 A CN116075700 A CN 116075700A CN 202180027792 A CN202180027792 A CN 202180027792A CN 116075700 A CN116075700 A CN 116075700A
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China
Prior art keywords
resistance
resistance variable
infrared
irradiation
infrared rays
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Pending
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CN202180027792.XA
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English (en)
Chinese (zh)
Inventor
坂本雅典
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Opptmass Co ltd
Kyoto University NUC
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Opptmass Co ltd
Kyoto University NUC
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Publication of CN116075700A publication Critical patent/CN116075700A/zh
Pending legal-status Critical Current

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F30/00Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
    • H10F30/20Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
    • H10F30/21Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/10Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
    • G01J5/20Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using resistors, thermistors or semiconductors sensitive to radiation, e.g. photoconductive devices
    • G01J5/22Electrical features thereof
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02Constructional details
    • G01J5/04Casings
    • G01J5/046Materials; Selection of thermal materials
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/10Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
    • G01J5/20Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using resistors, thermistors or semiconductors sensitive to radiation, e.g. photoconductive devices
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/58Radiation pyrometry, e.g. infrared or optical thermometry using absorption; using extinction effect
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F30/00Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
    • H10F30/10Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices being sensitive to infrared radiation, visible or ultraviolet radiation, and having no potential barriers, e.g. photoresistors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/40Optical elements or arrangements
    • H10F77/413Optical elements or arrangements directly associated or integrated with the devices, e.g. back reflectors

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
CN202180027792.XA 2020-04-13 2021-04-13 红外线传感器件和用于该器件的电阻可变膜 Pending CN116075700A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020071711 2020-04-13
JP2020-071711 2020-04-13
PCT/JP2021/015365 WO2021210593A1 (ja) 2020-04-13 2021-04-13 赤外線センシングデバイス及びそれに用いる抵抗可変膜

Publications (1)

Publication Number Publication Date
CN116075700A true CN116075700A (zh) 2023-05-05

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CN202180027792.XA Pending CN116075700A (zh) 2020-04-13 2021-04-13 红外线传感器件和用于该器件的电阻可变膜

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Country Link
US (1) US12276550B2 (https=)
EP (1) EP4137789A4 (https=)
JP (1) JP7837020B2 (https=)
CN (1) CN116075700A (https=)
WO (1) WO2021210593A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119805828A (zh) * 2025-03-17 2025-04-11 中国人民解放军国防科技大学 一种光电耦合型lspr变红外发射率器件及其制备方法与应用

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US20100067016A1 (en) * 2007-12-27 2010-03-18 Rohm Co., Ltd. Plasmon resonance detector
CN104697644A (zh) * 2013-12-04 2015-06-10 索尼公司 红外线检测器、红外线检测方法和电子设备
US20200006582A1 (en) * 2016-12-02 2020-01-02 Kyoto University Electronic device having photoelectric conversion function

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JP2773730B2 (ja) * 1996-03-07 1998-07-09 日本電気株式会社 光伝導型赤外線検出素子
JPH1062239A (ja) 1996-08-21 1998-03-06 Mitsubishi Materials Corp 赤外線検出素子
JP4075222B2 (ja) 1999-06-28 2008-04-16 株式会社豊田中央研究所 抵抗変化型赤外線検出器
JP2001183230A (ja) 1999-12-24 2001-07-06 Kokusai Kiban Zairyo Kenkyusho:Kk 光放射エネルギー強度測定装置
EP2072976A4 (en) * 2006-10-11 2013-08-14 Panasonic Corp ELECTRONIC EQUIPMENT
JP2008139072A (ja) 2006-11-30 2008-06-19 Nec Corp 赤外線検知器及びその温度制御方法
JP2012164980A (ja) 2011-01-21 2012-08-30 Sumitomo Metal Mining Co Ltd 光電変換装置とその製造方法
EP2581721B1 (en) * 2011-10-10 2019-05-08 Samsung Electronics Co., Ltd Infrared thermal detector and method of manufacturing the same
KR101922119B1 (ko) * 2011-12-22 2019-02-14 삼성전자주식회사 적외선 검출기 및 이를 사용하는 적외선 검출 방법
KR102040149B1 (ko) * 2013-02-01 2019-11-04 삼성전자주식회사 적외선 검출기
JP6299559B2 (ja) 2014-10-30 2018-03-28 住友金属鉱山株式会社 熱線遮蔽粒子、熱線遮蔽粒子分散液、熱線遮蔽粒子分散体、熱線遮蔽粒子分散体合わせ透明基材、赤外線吸収透明基材、熱線遮蔽粒子の製造方法
FR3039531A1 (https=) 2015-07-28 2017-02-03 Nexdot
KR102227688B1 (ko) * 2016-04-01 2021-03-15 스미토모 긴조쿠 고잔 가부시키가이샤 적외선 흡수 재료, 적외선 흡수 재료 분산액, 적외선 흡수 재료 분산체, 적외선 흡수 재료 분산체를 구비한 투명 기재 및 적외선 흡수 투명 기재
JP7204667B2 (ja) * 2017-04-20 2023-01-16 トリナミクス ゲゼルシャフト ミット ベシュレンクテル ハフツング 光検出器
JP6918591B2 (ja) 2017-06-16 2021-08-11 株式会社豊田中央研究所 電磁波検出器およびその製造方法
JP7232978B2 (ja) * 2017-12-11 2023-03-06 パナソニックIpマネジメント株式会社 赤外線センサおよび赤外線センサのボロメータ赤外線受光部を冷却する方法
TWI679782B (zh) * 2017-12-19 2019-12-11 財團法人工業技術研究院 感測裝置及其製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100067016A1 (en) * 2007-12-27 2010-03-18 Rohm Co., Ltd. Plasmon resonance detector
CN104697644A (zh) * 2013-12-04 2015-06-10 索尼公司 红外线检测器、红外线检测方法和电子设备
US20200006582A1 (en) * 2016-12-02 2020-01-02 Kyoto University Electronic device having photoelectric conversion function

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119805828A (zh) * 2025-03-17 2025-04-11 中国人民解放军国防科技大学 一种光电耦合型lspr变红外发射率器件及其制备方法与应用
CN119805828B (zh) * 2025-03-17 2025-07-15 中国人民解放军国防科技大学 一种光电耦合型lspr变红外发射率器件及其制备方法与应用

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JP7837020B2 (ja) 2026-03-30
US12276550B2 (en) 2025-04-15
JPWO2021210593A1 (https=) 2021-10-21
EP4137789A1 (en) 2023-02-22
US20230184592A1 (en) 2023-06-15
WO2021210593A1 (ja) 2021-10-21
EP4137789A4 (en) 2023-10-11

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