CN115857279A - 保持装置、曝光装置以及物品制造方法 - Google Patents
保持装置、曝光装置以及物品制造方法 Download PDFInfo
- Publication number
- CN115857279A CN115857279A CN202211024317.XA CN202211024317A CN115857279A CN 115857279 A CN115857279 A CN 115857279A CN 202211024317 A CN202211024317 A CN 202211024317A CN 115857279 A CN115857279 A CN 115857279A
- Authority
- CN
- China
- Prior art keywords
- holding
- optical element
- holding device
- base
- holding portion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021-155516 | 2021-09-24 | ||
JP2021155516A JP7328292B2 (ja) | 2021-09-24 | 2021-09-24 | 保持装置、露光装置、及び物品の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN115857279A true CN115857279A (zh) | 2023-03-28 |
Family
ID=85660616
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202211024317.XA Pending CN115857279A (zh) | 2021-09-24 | 2022-08-25 | 保持装置、曝光装置以及物品制造方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP7328292B2 (ja) |
KR (1) | KR20230043714A (ja) |
CN (1) | CN115857279A (ja) |
TW (1) | TW202314397A (ja) |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102009058762A1 (de) | 2009-12-14 | 2011-06-16 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Ablenkeinrichtung für eine Projektionsvorrichtung, Projektionsvorrichtung zum Projizieren eines Bildes und Verfahren zum Ansteuern einer Ablenkeinrichtung für eine Projektionsvorrichtung |
DE102012212503B4 (de) | 2012-07-17 | 2014-11-20 | Carl Zeiss Smt Gmbh | Lithographieanlage und verfahren |
JP2018005189A (ja) | 2016-07-08 | 2018-01-11 | キヤノン株式会社 | 保持装置、光学装置、および移動体 |
JP2018066958A (ja) | 2016-10-21 | 2018-04-26 | キヤノン株式会社 | 光学装置、投影光学系、露光装置及び物品の製造方法 |
DE102017207763A1 (de) | 2017-05-09 | 2018-04-19 | Carl Zeiss Smt Gmbh | Gelenkanordnung für ein optisches Element, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage |
CN110703407B (zh) | 2019-10-17 | 2020-10-30 | 中国科学院长春光学精密机械与物理研究所 | 高精度拼接反射镜支撑驱动结构 |
-
2021
- 2021-09-24 JP JP2021155516A patent/JP7328292B2/ja active Active
-
2022
- 2022-08-05 TW TW111129493A patent/TW202314397A/zh unknown
- 2022-08-25 CN CN202211024317.XA patent/CN115857279A/zh active Pending
- 2022-09-08 KR KR1020220114195A patent/KR20230043714A/ko active Search and Examination
Also Published As
Publication number | Publication date |
---|---|
JP2023046745A (ja) | 2023-04-05 |
KR20230043714A (ko) | 2023-03-31 |
JP7328292B2 (ja) | 2023-08-16 |
TW202314397A (zh) | 2023-04-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5525559B2 (ja) | リソグラフィ装置 | |
JP6549242B2 (ja) | リソグラフィ装置およびデバイス製造方法 | |
US8780329B2 (en) | Exposure apparatus, structure, method for setting up apparatus, and device manufacturing method having filling member formed by hardening liquid to support setting leg | |
KR20120007086A (ko) | 리소그래피 장치, 투영 조립체 및 능동 감쇠 | |
JP2009130354A (ja) | 構造物と能動減衰システムとの組合せ、およびリソグラフィ装置 | |
JP6316973B2 (ja) | ステージ位置決めシステムおよびリソグラフィ装置 | |
KR20120099333A (ko) | 투영 광학계, 노광 장치 및 그 조립 방법 | |
TW200412476A (en) | Lithographic apparatus and device manufacturing method | |
JP5350139B2 (ja) | 露光装置、及びデバイスの製造方法 | |
CN115857279A (zh) | 保持装置、曝光装置以及物品制造方法 | |
US8009273B2 (en) | Exposure apparatus and device manufacturing method | |
JP6697568B2 (ja) | 振動絶縁装置、リソグラフィ装置、およびデバイス製造方法 | |
JP3337951B2 (ja) | 投影露光装置および方法 | |
JP2009206203A (ja) | 露光装置およびデバイス製造方法 | |
US20110065051A1 (en) | Supporting device, optical apparatus, exposure apparatus, and device manufacturing method | |
JP2016106272A (ja) | リソグラフィ装置及びデバイス製造方法 | |
JP2021124611A (ja) | 振動制御装置、露光装置、および物品製造方法 | |
JP4174262B2 (ja) | 光学要素の支持構造、光学系、光学系の調整方法、露光装置、露光方法、半導体デバイス製造方法 | |
JP2008252149A (ja) | 組立体、リソグラフィ装置及びデバイス製造方法 | |
JP2002267907A (ja) | 光学要素支持方法、光学系の調整方法、露光装置の調整方法、光学要素支持装置、光学系および露光装置 | |
JP2022130036A (ja) | 露光装置、露光方法及び物品の製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination |