CN1158289A - 制造半导体晶片的方法 - Google Patents
制造半导体晶片的方法 Download PDFInfo
- Publication number
- CN1158289A CN1158289A CN96120864A CN96120864A CN1158289A CN 1158289 A CN1158289 A CN 1158289A CN 96120864 A CN96120864 A CN 96120864A CN 96120864 A CN96120864 A CN 96120864A CN 1158289 A CN1158289 A CN 1158289A
- Authority
- CN
- China
- Prior art keywords
- abrasion
- cutting
- auxiliary body
- semiconductor wafer
- face
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
- B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
- B28D5/028—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels with a ring blade having an inside cutting edge
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B47/00—Drives or gearings; Equipment therefor
- B24B47/22—Equipment for exact control of the position of the grinding tool or work at the start of the grinding operation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/02—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
- B24B49/03—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent according to the final size of the previously ground workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D1/00—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor
- B28D1/003—Multipurpose machines; Equipment therefor
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Mining & Mineral Resources (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
Abstract
Description
Claims (3)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19607695.1 | 1996-02-29 | ||
DE19607695A DE19607695A1 (de) | 1996-02-29 | 1996-02-29 | Verfahren zur Herstellung von Halbleiterscheiben |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1158289A true CN1158289A (zh) | 1997-09-03 |
CN1078518C CN1078518C (zh) | 2002-01-30 |
Family
ID=7786797
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN96120864A Expired - Fee Related CN1078518C (zh) | 1996-02-29 | 1996-11-29 | 制造半导体晶片的方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US5975990A (zh) |
EP (1) | EP0791444B1 (zh) |
JP (1) | JP2849908B2 (zh) |
KR (1) | KR100235542B1 (zh) |
CN (1) | CN1078518C (zh) |
DE (2) | DE19607695A1 (zh) |
MY (1) | MY112675A (zh) |
TW (1) | TW330167B (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100546793C (zh) * | 2001-06-13 | 2009-10-07 | 弗赖贝格化合物原料有限公司 | 用于确定晶面相对于晶体表面定向的设备和方法 |
CN108789888A (zh) * | 2018-07-23 | 2018-11-13 | 中国工程物理研究院激光聚变研究中心 | 用于x射线显微成像的曲面晶体制备方法 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19607695A1 (de) * | 1996-02-29 | 1997-09-04 | Wacker Siltronic Halbleitermat | Verfahren zur Herstellung von Halbleiterscheiben |
CN1310739C (zh) * | 2002-09-06 | 2007-04-18 | 大连淡宁实业发展有限公司 | 钒酸钇单晶片的批量加工工艺 |
US7131891B2 (en) * | 2003-04-28 | 2006-11-07 | Micron Technology, Inc. | Systems and methods for mechanical and/or chemical-mechanical polishing of microfeature workpieces |
CN106475864B (zh) * | 2016-12-20 | 2018-11-06 | 台山市兰宝磨具有限公司 | 一种磨具端面加工方法和装置 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4138304A (en) * | 1977-11-03 | 1979-02-06 | General Electric Company | Wafer sawing technique |
US4227348A (en) * | 1978-12-26 | 1980-10-14 | Rca Corporation | Method of slicing a wafer |
JPS57168854A (en) * | 1981-04-05 | 1982-10-18 | Tokyo Seimitsu Co Ltd | Slicing device |
DE3640645A1 (de) * | 1986-11-28 | 1988-06-09 | Wacker Chemitronic | Verfahren zum zersaegen von kristallstaeben oder -bloecken vermittels innenlochsaege in duenne scheiben |
DE3737540C1 (de) * | 1987-11-05 | 1989-06-22 | Mueller Georg Nuernberg | Verfahren und Maschine zum Herstellen von Ronden mit zumindest einer planen Oberflaeche |
US5025593A (en) * | 1988-01-18 | 1991-06-25 | Mazda Motor Corporation | Slicing machine and control method thereof |
DE3906091A1 (de) * | 1989-02-27 | 1990-08-30 | Wacker Chemitronic | Verfahren zum zersaegen von stabfoermigen werkstuecken in scheiben mittels innenlochsaege, sowie innenlochsaegen zu seiner durchfuehrung |
JPH0767692B2 (ja) * | 1989-09-07 | 1995-07-26 | 株式会社東京精密 | スライシングマシンの切断方法 |
US5189843A (en) * | 1990-08-30 | 1993-03-02 | Silicon Technology Corporation | Wafer slicing and grinding machine and a method of slicing and grinding wafers |
JPH05318460A (ja) * | 1992-05-25 | 1993-12-03 | Tokyo Seimitsu Co Ltd | 半導体ウエハのスライシング方法 |
DE19607695A1 (de) * | 1996-02-29 | 1997-09-04 | Wacker Siltronic Halbleitermat | Verfahren zur Herstellung von Halbleiterscheiben |
-
1996
- 1996-02-29 DE DE19607695A patent/DE19607695A1/de not_active Withdrawn
- 1996-10-30 MY MYPI96004514A patent/MY112675A/en unknown
- 1996-11-29 CN CN96120864A patent/CN1078518C/zh not_active Expired - Fee Related
- 1996-12-02 JP JP8321787A patent/JP2849908B2/ja not_active Expired - Fee Related
- 1996-12-02 US US08/759,023 patent/US5975990A/en not_active Expired - Fee Related
-
1997
- 1997-02-14 TW TW086101767A patent/TW330167B/zh not_active IP Right Cessation
- 1997-02-19 KR KR1019970004968A patent/KR100235542B1/ko not_active IP Right Cessation
- 1997-02-27 EP EP97103164A patent/EP0791444B1/de not_active Expired - Lifetime
- 1997-02-27 DE DE59700009T patent/DE59700009D1/de not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100546793C (zh) * | 2001-06-13 | 2009-10-07 | 弗赖贝格化合物原料有限公司 | 用于确定晶面相对于晶体表面定向的设备和方法 |
CN100569475C (zh) * | 2001-06-13 | 2009-12-16 | 弗赖贝格化合物原料有限公司 | 用于在切割机内切割单晶体的方法和设备 |
CN108789888A (zh) * | 2018-07-23 | 2018-11-13 | 中国工程物理研究院激光聚变研究中心 | 用于x射线显微成像的曲面晶体制备方法 |
Also Published As
Publication number | Publication date |
---|---|
CN1078518C (zh) | 2002-01-30 |
EP0791444A1 (de) | 1997-08-27 |
DE19607695A1 (de) | 1997-09-04 |
MY112675A (en) | 2001-07-31 |
JPH09246217A (ja) | 1997-09-19 |
KR970063392A (ko) | 1997-09-12 |
DE59700009D1 (de) | 1998-09-17 |
EP0791444B1 (de) | 1998-08-12 |
US5975990A (en) | 1999-11-02 |
KR100235542B1 (ko) | 1999-12-15 |
TW330167B (en) | 1998-04-21 |
JP2849908B2 (ja) | 1999-01-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6676491B2 (en) | Semiconductor wafer dividing method | |
CN105215852B (zh) | 一种砂轮磨损及g比率的测量装置与方法 | |
US7869896B2 (en) | Tangential grinding resistance measuring method and apparatus, and applications thereof to grinding condition decision and wheel life judgment | |
JP2805370B2 (ja) | 内周刃式ソーを用いてロッド状のワークピースを薄板にスライス切断する方法 | |
CN1078518C (zh) | 制造半导体晶片的方法 | |
EP0417644B1 (en) | Method of slicing cylindrical material into wafers | |
JPH09174383A (ja) | 回転工具の異常検出方法および装置 | |
US5025594A (en) | Method and apparatus for controlling grinding processes | |
JP5219569B2 (ja) | ウェーハ研削装置における加工良否判定方法およびウェーハ研削装置 | |
US6057170A (en) | Method of measuring waviness in silicon wafers | |
Young et al. | Online dressing of profile grinding wheels | |
CN110405627A (zh) | 一种基于声发射监测的金刚石刀具圆弧波纹度控制方法 | |
de Oliveira et al. | Development of an optical scanner to study wear on the working surface of grinding wheels | |
JPH04275872A (ja) | 研削の際生ずる熱による工作物の熱的過負荷を回避する方法及び装置 | |
JPH06151586A (ja) | ダイシング方法および装置 | |
Maksoud et al. | In-process detection of grinding wheel truing and dressing conditions using a flapper nozzle arrangement | |
JP3305732B2 (ja) | 平面研削盤の制御方法 | |
SU1196735A1 (ru) | Способ измерени состо ни рабочей поверхности абразивного инструмента | |
JPH1177491A (ja) | 工具を用いる加工装置 | |
JPH09239639A (ja) | Aeを用いた延性モード加工装置 | |
CN108036753A (zh) | 一种机床精度检测工具及其使用方法 | |
CN114523409B (zh) | 一种装夹定心方法及硅棒加工设备 | |
CN118254044B (zh) | 一种测高磨刀装置、划片机及测高磨刀装置使用方法 | |
CN111015370B (zh) | 基于热力耦合的磨削监控方法 | |
SU1155377A1 (ru) | Способ контрол точности станков |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: WACKER SILICON ELECTRONICS AG Free format text: FORMER NAME OR ADDRESS: WACKER SILICON ELECTRONIC SEMICONDUCTOR MATERIAL AG |
|
CP01 | Change in the name or title of a patent holder |
Patentee after: Wacker Silicon Electron GmbH Patentee before: Wacker Siltronic Gesellschaft fuer Halbleitermaterialien MbH |
|
C56 | Change in the name or address of the patentee |
Owner name: WACKER SILTRONIC HALBLEITERMAT Free format text: FORMER NAME OR ADDRESS: WACKER SILICON ELECTRONICS AG |
|
CP03 | Change of name, title or address |
Address after: Munich, Federal Republic of Germany Patentee after: Siltronic AG Address before: He's the Federal Republic of Germany Patentee before: Wacker Silicon Electron GmbH |
|
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20020130 Termination date: 20101129 |