CN115803479A - 在衬底上电沉积深色铬层的方法和至少一侧完全覆盖有深色铬层的衬底 - Google Patents
在衬底上电沉积深色铬层的方法和至少一侧完全覆盖有深色铬层的衬底 Download PDFInfo
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- CN115803479A CN115803479A CN202180048786.2A CN202180048786A CN115803479A CN 115803479 A CN115803479 A CN 115803479A CN 202180048786 A CN202180048786 A CN 202180048786A CN 115803479 A CN115803479 A CN 115803479A
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- 238000012360 testing method Methods 0.000 description 1
- ULSZVNJBVJWEJE-UHFFFAOYSA-N thiazolidine-2-carboxylic acid Chemical compound OC(=O)C1NCCS1 ULSZVNJBVJWEJE-UHFFFAOYSA-N 0.000 description 1
- BRNULMACUQOKMR-UHFFFAOYSA-N thiomorpholine Chemical compound C1CSCCN1 BRNULMACUQOKMR-UHFFFAOYSA-N 0.000 description 1
- 150000004886 thiomorpholines Chemical class 0.000 description 1
- 229910001428 transition metal ion Inorganic materials 0.000 description 1
- BSVBQGMMJUBVOD-UHFFFAOYSA-N trisodium borate Chemical group [Na+].[Na+].[Na+].[O-]B([O-])[O-] BSVBQGMMJUBVOD-UHFFFAOYSA-N 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/08—Rinsing
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/08—Deposition of black chromium, e.g. hexavalent chromium, CrVI
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
- C25D5/50—After-treatment of electroplated surfaces by heat-treatment
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
- Laminated Bodies (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP20213575 | 2020-12-11 | ||
| EP20213572 | 2020-12-11 | ||
| EP20213572.9 | 2020-12-11 | ||
| EP20213575.2 | 2020-12-11 | ||
| PCT/EP2021/085213 WO2022123019A1 (fr) | 2020-12-11 | 2021-12-10 | Procédé de dépôt électrolytique d'une couche de chrome sombre sur un substrat et substrat ayant au moins un côté entièrement recouvert d'une couche de chrome sombre |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN115803479A true CN115803479A (zh) | 2023-03-14 |
Family
ID=79165022
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202180048786.2A Pending CN115803479A (zh) | 2020-12-11 | 2021-12-10 | 在衬底上电沉积深色铬层的方法和至少一侧完全覆盖有深色铬层的衬底 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US20230193496A1 (fr) |
| EP (2) | EP4259854A1 (fr) |
| JP (3) | JP7467758B2 (fr) |
| CN (1) | CN115803479A (fr) |
| TW (1) | TW202231930A (fr) |
| WO (2) | WO2022123019A1 (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117488300A (zh) * | 2024-01-02 | 2024-02-02 | 仪征亚新科双环活塞环有限公司 | 一种具有硬质镀层的活塞环及其制备方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8273235B2 (en) * | 2010-11-05 | 2012-09-25 | Roshan V Chapaneri | Dark colored chromium based electrodeposits |
| US9689081B2 (en) * | 2011-05-03 | 2017-06-27 | Atotech Deutschland Gmbh | Electroplating bath and method for producing dark chromium layers |
| US10167564B2 (en) * | 2013-01-10 | 2019-01-01 | Coventya, Inc. | Apparatus and methods of maintaining trivalent chromium bath plating efficiency |
| EP3299497A1 (fr) * | 2016-09-27 | 2018-03-28 | ATOTECH Deutschland GmbH | Procédé de traitement d'une surface de chromium |
| JP6927061B2 (ja) * | 2018-01-19 | 2021-08-25 | 豊田合成株式会社 | めっき構造体の製造方法 |
| JP6973242B2 (ja) * | 2018-03-30 | 2021-11-24 | 豊田合成株式会社 | 電気めっき浴、めっき製品の製造方法、及びめっき製品 |
| JP7030739B2 (ja) * | 2019-03-28 | 2022-03-07 | 豊田合成株式会社 | 黒色めっき樹脂部品及びその製造方法 |
| US11198944B2 (en) | 2018-09-26 | 2021-12-14 | Toyoda Gosei Co., Ltd. | Black plated resin part and method for producing the same |
-
2021
- 2021-12-10 TW TW110146220A patent/TW202231930A/zh unknown
- 2021-12-10 JP JP2023501840A patent/JP7467758B2/ja active Active
- 2021-12-10 JP JP2023535571A patent/JP2023553966A/ja active Pending
- 2021-12-10 US US18/000,221 patent/US20230193496A1/en active Pending
- 2021-12-10 WO PCT/EP2021/085213 patent/WO2022123019A1/fr unknown
- 2021-12-10 EP EP21834798.7A patent/EP4259854A1/fr active Pending
- 2021-12-10 EP EP21834800.1A patent/EP4259855A1/fr active Pending
- 2021-12-10 WO PCT/EP2021/085219 patent/WO2022123023A1/fr active Application Filing
- 2021-12-10 CN CN202180048786.2A patent/CN115803479A/zh active Pending
- 2021-12-10 US US18/256,691 patent/US20240011178A1/en active Pending
-
2023
- 2023-02-20 JP JP2023000502U patent/JP3242417U/ja active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117488300A (zh) * | 2024-01-02 | 2024-02-02 | 仪征亚新科双环活塞环有限公司 | 一种具有硬质镀层的活塞环及其制备方法 |
| CN117488300B (zh) * | 2024-01-02 | 2024-03-29 | 仪征亚新科双环活塞环有限公司 | 一种具有硬质镀层的活塞环及其制备方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3242417U (ja) | 2023-06-15 |
| WO2022123023A1 (fr) | 2022-06-16 |
| US20240011178A1 (en) | 2024-01-11 |
| TW202231930A (zh) | 2022-08-16 |
| US20230193496A1 (en) | 2023-06-22 |
| EP4259854A1 (fr) | 2023-10-18 |
| JP2023553966A (ja) | 2023-12-26 |
| JP7467758B2 (ja) | 2024-04-15 |
| EP4259855A1 (fr) | 2023-10-18 |
| JP2023531317A (ja) | 2023-07-21 |
| WO2022123019A1 (fr) | 2022-06-16 |
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