CN115142023B - 成膜装置及电子器件的制造方法 - Google Patents
成膜装置及电子器件的制造方法 Download PDFInfo
- Publication number
- CN115142023B CN115142023B CN202210327314.7A CN202210327314A CN115142023B CN 115142023 B CN115142023 B CN 115142023B CN 202210327314 A CN202210327314 A CN 202210327314A CN 115142023 B CN115142023 B CN 115142023B
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- CN
- China
- Prior art keywords
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- film forming
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- moving
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- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000000034 method Methods 0.000 title claims abstract description 11
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 10
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 46
- 239000000314 lubricant Substances 0.000 claims abstract description 23
- 239000000758 substrate Substances 0.000 claims description 20
- 230000008602 contraction Effects 0.000 claims 6
- 239000010408 film Substances 0.000 description 91
- 230000007246 mechanism Effects 0.000 description 64
- 239000010410 layer Substances 0.000 description 47
- 238000010586 diagram Methods 0.000 description 19
- 230000005525 hole transport Effects 0.000 description 9
- 238000005096 rolling process Methods 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000011368 organic material Substances 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 239000004519 grease Substances 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 230000005389 magnetism Effects 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 230000000087 stabilizing effect Effects 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 210000002445 nipple Anatomy 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Bearings For Parts Moving Linearly (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021060069A JP7309773B2 (ja) | 2021-03-31 | 2021-03-31 | 成膜装置及び電子デバイスの製造方法 |
| JP2021-060069 | 2021-03-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN115142023A CN115142023A (zh) | 2022-10-04 |
| CN115142023B true CN115142023B (zh) | 2023-10-27 |
Family
ID=83406317
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210327314.7A Active CN115142023B (zh) | 2021-03-31 | 2022-03-30 | 成膜装置及电子器件的制造方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP7309773B2 (ja) |
| KR (1) | KR20220136248A (ja) |
| CN (1) | CN115142023B (ja) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07293560A (ja) * | 1994-04-27 | 1995-11-07 | Nippon Seiko Kk | リニアガイド装置の中間カバー |
| JPH09264323A (ja) * | 1996-03-26 | 1997-10-07 | Nippon Seiko Kk | 直動案内軸受の防塵装置 |
| CN1452438A (zh) * | 2002-04-15 | 2003-10-29 | 株式会社半导体能源研究所 | 发光器件制造方法及制造发光器件的设备 |
| JP2016179532A (ja) * | 2015-03-24 | 2016-10-13 | 住友重機械工業株式会社 | スライドカバー |
| CN109306453A (zh) * | 2017-07-27 | 2019-02-05 | 佳能特机株式会社 | 显示器制造装置和使用其的显示器制造方法 |
| CN111621762A (zh) * | 2019-02-27 | 2020-09-04 | 佳能特机株式会社 | 成膜装置、成膜方法以及电子器件制造方法 |
-
2021
- 2021-03-31 JP JP2021060069A patent/JP7309773B2/ja active Active
-
2022
- 2022-03-30 CN CN202210327314.7A patent/CN115142023B/zh active Active
- 2022-03-30 KR KR1020220039625A patent/KR20220136248A/ko not_active Application Discontinuation
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07293560A (ja) * | 1994-04-27 | 1995-11-07 | Nippon Seiko Kk | リニアガイド装置の中間カバー |
| JPH09264323A (ja) * | 1996-03-26 | 1997-10-07 | Nippon Seiko Kk | 直動案内軸受の防塵装置 |
| CN1452438A (zh) * | 2002-04-15 | 2003-10-29 | 株式会社半导体能源研究所 | 发光器件制造方法及制造发光器件的设备 |
| JP2016179532A (ja) * | 2015-03-24 | 2016-10-13 | 住友重機械工業株式会社 | スライドカバー |
| CN109306453A (zh) * | 2017-07-27 | 2019-02-05 | 佳能特机株式会社 | 显示器制造装置和使用其的显示器制造方法 |
| CN111621762A (zh) * | 2019-02-27 | 2020-09-04 | 佳能特机株式会社 | 成膜装置、成膜方法以及电子器件制造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP7309773B2 (ja) | 2023-07-18 |
| JP2022156402A (ja) | 2022-10-14 |
| CN115142023A (zh) | 2022-10-04 |
| KR20220136248A (ko) | 2022-10-07 |
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| GR01 | Patent grant | ||
| GR01 | Patent grant |