CN115142023B - Film forming apparatus and method for manufacturing electronic device - Google Patents
Film forming apparatus and method for manufacturing electronic device Download PDFInfo
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- CN115142023B CN115142023B CN202210327314.7A CN202210327314A CN115142023B CN 115142023 B CN115142023 B CN 115142023B CN 202210327314 A CN202210327314 A CN 202210327314A CN 115142023 B CN115142023 B CN 115142023B
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- cover member
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- moving
- source unit
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- 238000000034 method Methods 0.000 title claims abstract description 11
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 10
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 46
- 239000000314 lubricant Substances 0.000 claims abstract description 23
- 239000000758 substrate Substances 0.000 claims description 20
- 230000008602 contraction Effects 0.000 claims 6
- 239000010408 film Substances 0.000 description 91
- 230000007246 mechanism Effects 0.000 description 64
- 239000010410 layer Substances 0.000 description 47
- 238000010586 diagram Methods 0.000 description 19
- 230000005525 hole transport Effects 0.000 description 9
- 238000005096 rolling process Methods 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000011368 organic material Substances 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 239000004519 grease Substances 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 230000005389 magnetism Effects 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 230000000087 stabilizing effect Effects 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 210000002445 nipple Anatomy 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Bearings For Parts Moving Linearly (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention provides a film forming apparatus capable of suppressing the enlargement of the apparatus and the scattering of lubricant, and a method for manufacturing an electronic device. The device is provided with: a guide rail (10) to which a lubricant is attached; a film forming source unit having at least a film forming source and moving in a moving direction along the guide rail (10) while abutting against the guide rail (10); and a cover member (61) attached to the film formation source unit and covering a part of the guide rail (10), wherein the length of the cover member (61) in the moving direction is a 1 st length when the film formation source unit is positioned at the end of the moving range, and the length of the cover member (61) in the moving direction is a 2 nd length longer than the 1 st length when the film formation source unit is moved.
Description
Technical Field
The present invention relates to a film forming apparatus for forming a thin film on a substrate by a film forming source, and a method for manufacturing an electronic device.
Background
In the film forming apparatus, the film forming source is configured to be movable. In order to make the film forming source movable, the film forming apparatus includes a rail and a film forming source unit that moves along the rail on the rail. The film forming source unit includes at least a film forming source. The lubricant is supplied to the region where the rail is in contact with the film formation source unit through the inside of the film formation source unit. In the film forming apparatus, when the lubricant is scattered, the film forming on the substrate is adversely affected, and therefore, the film forming source unit is provided with a cover member to prevent the lubricant from scattering. In order to more reliably suppress scattering of the lubricant, it is preferable to lengthen the length of the cover member in the moving direction of the film formation source unit. However, if the cover member is made longer in size, there is a disadvantage in that installation space for the rail or the like becomes large and the entire apparatus becomes large.
Prior art literature
Patent literature
Patent document 1: japanese patent laid-open publication No. 2019-26931
Disclosure of Invention
Problems to be solved by the invention
The invention aims to provide a film forming device capable of inhibiting the enlargement of the device and the scattering of lubricant and a manufacturing method of an electronic device.
Means for solving the problems
The present invention adopts the following means to solve the above problems.
That is, the film forming apparatus of the present invention includes:
a rail to which a lubricant is attached;
a film forming source unit having at least a film forming source and moving in a moving direction along the rail while abutting the rail; and
a cover member attached to the film formation source unit and covering a part of the track,
when the film forming source unit is positioned at the end of the movement range, the length of the cover member in the movement direction becomes the 1 st length,
when the film formation source unit moves, the length of the cover member in the moving direction becomes a 2 nd length longer than the 1 st length.
According to the present invention, the cover member has the 2 nd length longer than the 1 st length during the movement of the film formation source unit, and scattering of the lubricant can be more reliably suppressed. In addition, when the film formation source unit is positioned at the end of the movement range, the cover member has the 1 st length shorter than the 2 nd length, and the device can be prevented from being enlarged.
ADVANTAGEOUS EFFECTS OF INVENTION
As described above, according to the present invention, the lubricant scattering can be suppressed while suppressing the increase in size of the device.
Drawings
FIG. 1 is a schematic configuration diagram of a film forming apparatus according to an embodiment of the present invention.
Fig. 2 is a main configuration diagram of a film forming apparatus according to an embodiment of the present invention.
Fig. 3 is a schematic configuration diagram of a moving mechanism according to an embodiment of the present invention.
Fig. 4 is a schematic cross-sectional view of a movement mechanism of an embodiment of the present invention.
Fig. 5 is a diagram showing a part of the structure of the moving mechanism according to embodiment 1 of the present invention.
Fig. 6 is a schematic explanatory diagram of the hood unit of embodiment 1 of the present invention.
Fig. 7 is a schematic explanatory diagram of the hood unit of embodiment 2 of the present invention.
Fig. 8 is a diagram showing a part of the structure of a moving mechanism according to embodiment 3 of the present invention.
Fig. 9 is a schematic explanatory diagram of the hood unit of embodiment 3 of the present invention.
Fig. 10 is a schematic explanatory diagram of the hood unit of embodiment 4 of the present invention.
Fig. 11 is an explanatory diagram of the organic EL display device.
Description of the reference numerals
A chamber 1; 10 guide rails; 310 guide rail 1; 410 guide rail 2; 20 moving bodies; 50 a supply member; 350 1 st feeding member; 450 a 2 nd feeding member; 60. 60A, 60B, 60C, 60D cover units; 360 1 st cover unit; 460 a 2 nd cover unit; 61a cover member; 70 a stop; 100 film forming sources; 300 1 st movement mechanism; 400, 2 nd movement mechanism.
Detailed Description
The manner in which the present invention can be practiced is illustratively described in detail below based on embodiments with reference to the accompanying drawings. However, the dimensions, materials, shapes, relative arrangements, and the like of the constituent members described in the embodiment are not limited to those specifically described, and the scope of the present invention is not limited thereto.
(embodiment)
A film forming apparatus according to an embodiment of the present invention will be described with reference to fig. 1 to 4. Fig. 1 is a schematic configuration diagram of a film forming apparatus according to an embodiment of the present invention, and schematically illustrates a main configuration provided in the apparatus. Fig. 2 is a main configuration diagram of a film forming apparatus according to an embodiment of the present invention, schematically showing a mechanism for moving a film forming source in a plan view. Fig. 3 is a schematic configuration diagram of a moving mechanism according to an embodiment of the present invention, in which (a) shows a top view of a part of the moving mechanism and (b) shows a side view of a part of the moving mechanism. Fig. 4 is a schematic cross-sectional view of the movement mechanism according to the embodiment of the present invention, and in fig. 3 (b), the internal structure is shown in a cross-sectional view for easy understanding.
< integral Structure of film Forming apparatus >
The film forming apparatus of the present embodiment includes a chamber 1 in which a vacuum environment is formed, a film forming source 100 provided in the chamber 1, and a 1 st movement mechanism 300 and a 2 nd movement mechanism 400 for moving the film forming source 100. The chamber 1 is an airtight container, and the inside thereof is maintained in a vacuum state (or a reduced pressure state) by an exhaust pump (not shown). The 1 st movement mechanism 300 as the 1 st movement member is provided for moving the film forming source 100 in the 1 st direction. More specifically, the film forming source 100 is configured to linearly reciprocate in the 1 st direction by the 1 st moving mechanism 300. The 2 nd movement mechanism 400 as the 2 nd movement member is provided to move the film formation source 100 in the 2 nd direction intersecting (more specifically, orthogonal to) the 1 st direction. More specifically, the film forming source 100 is configured to linearly reciprocate in the 2 nd direction by the 2 nd moving mechanism 400. The 2 nd moving mechanism 400 is configured to be movable in the 1 st direction by the 1 st moving mechanism 300.
The film formation source 100 is fixed to the 2 nd movement mechanism 400. An atmospheric box is provided to the film forming source 100. The inside of the atmosphere box is configured to communicate with the outside of the chamber 1 through the inside of the 1 st atmosphere arm 210 and the 2 nd atmosphere arm 220. With this configuration, the electric wire and the cooling pipe can be connected to the film forming source 100. The 1 st atmosphere arm 210 and the 2 nd atmosphere arm 220 are configured to operate following the movement of the film formation source 100. More specifically, the 1 st arm 210 is configured such that one end thereof is rotatable with respect to the bottom plate of the chamber 1. In the 2 nd arm 220, one end is rotatably supported by the other end of the 1 st arm 210, and the other end is rotatably supported by an atmosphere box provided in the film formation source 100.
In the film forming apparatus of the present embodiment, film formation can be performed in each of the region on the arrow a side (referred to as the 1 st region) and the region on the arrow B side (referred to as the 2 nd region) in fig. 2. When the film formation is performed in the 1 st region, the film formation source 100 is operated while the film formation source 100 is moved by the 2 nd moving mechanism 400 in a state in which the film formation source 100 is moved to the 1 st region by the 1 st moving mechanism 300, so that the film formation can be performed on the substrate P placed in the 1 st region through the mask M. When the film formation is performed in the 2 nd region, the film formation source 100 is operated while the film formation source 100 is moved by the 2 nd moving mechanism 400 in a state in which the film formation source 100 is moved to the 2 nd region by the 1 st moving mechanism 300, so that the film formation can be performed on the substrate P placed in the 2 nd region through the mask M.
Further, as the film forming apparatus of the present embodiment, a vacuum vapor deposition apparatus and a sputtering apparatus can be used. In the case where the film forming apparatus is a vacuum vapor deposition apparatus, the film forming source 100 is constituted by a vapor deposition source or the like. In addition, when the film forming apparatus is a sputtering apparatus, the film forming source 100 is constituted by a target or the like.
< moving mechanism >
The 1 st movement mechanism 300 and the 2 nd movement mechanism 400 are described in more detail. Since the basic structure and operation mechanism of the 1 st movement mechanism 300 and the 2 nd movement mechanism 400 are the same, the basic structure and the like of the movement mechanism will be described with reference to fig. 3 and 4.
The moving mechanism includes a device called a linear motion guide device or the like, and includes a guide rail 10 extending in a straight line and a moving body 20 moving along the guide rail 10 while abutting against one side of the guide rail 10. The movable body 20 is also sometimes referred to as a guide block. The linear motion guide device is a known technique, and in this embodiment, an LM guide (registered trademark) is used. Inside the moving body 20, a plurality of rolling elements 21 (iron balls or the like) are configured to circulate in an endless circulation path. The plurality of rolling elements 21 are configured to move while rolling in the grooves 11 for rolling elements provided in the guide rail 10. In order to reduce sliding wear of the rolling elements 21, the grooves 11, and the like, passages 22 for supplying lubricant are provided in the moving body 20 so that the lubricant (grease) can be supplied thereto. Of course, other techniques may be used.
In the moving mechanism, a supply member 50 for supplying lubricant to the passage 22 provided in the moving body 20 is fixed to an end portion of the moving body 20 in the moving direction. The supply member 50 is provided with a passage 51 for supplying lubricant. A grease nipple, not shown, is provided at the inlet of the passage 51, and a lubricant is supplied from this portion. Thereby, the lubricant adheres to the groove 11 of the rail 10. In addition, in the moving mechanism, in order to suppress scattering of the lubricant supplied into the groove 11 provided in the guide rail 10, a cover unit 60 having a cover member 61 covering a part of the guide rail 10 is provided. The cover unit 60 is fixed to the supply member 50 on the opposite side of the movable body 20 from the supply member 50.
With the moving mechanism configured as described above, the fixing member 80 fixed to the moving body 20 can be moved along the guide rail 10 together with the movement of the moving body 20. In the film forming apparatus of the present embodiment, the cover member 61 is configured to change between a long state (state of the 2 nd length or state of the 4 th length) during which the film forming source 100 moves together with the movable body 20 in the film forming step or the like, and a short state (state of the 1 st length or state of the 3 rd length) in which the length of the movable body 20 in the moving direction is shorter than the long state when the movable body 20 is positioned at the end of the guide rail 10. That is, the cover member 61 is long when the film forming source 100 and the like are located at the end of the movement range together with the moving body 20, and the cover member 61 is short when it is moved.
< 1 st moving mechanism >
The 1 st moving mechanism 300 includes a pair of 1 st guide rails 310 provided parallel to each other. The pair of 1 st rails 310 are equivalent to "rail 10" in the basic structure described above. The 1 st guide rails 310 are provided with 21 st moving bodies (not shown) that move along the 1 st guide rails 310. These 1 st moving bodies are equivalent to the "moving body 20" in the above basic structure. The 1 st feeding member 350 is fixed to each 1 st moving body. These 1 st feeding members 350 are equivalent to the "feeding member 50" in the basic structure described above. Further, the 1 st cover unit 360 is fixed to each 1 st supply member 350. These 1 st cap units 360 are equivalent to the "cap unit 60" in the basic structure described above. Further, stoppers 370 defining a movement range of the film forming source unit having the film forming source 100 are provided at both ends of the 1 st guide 310.
A pair of 2 nd rails (2 nd rail) 410 constituting the 2 nd moving mechanism 400 is fixed to the plurality of 1 st moving bodies. Specifically, one end of the 2 nd rail 410 is fixed to the 1 st movable body provided on one of the pair of 1 st rails 310, and the other end is fixed to the 1 st movable body provided on the other of the pair of 1 st rails 310. The same applies to the other 2 nd rail 410. The pair of 2 nd guide rails 410 are coupled by the pair of coupling members 330. At least one of the pair of coupling members 330 is provided with a gear 340 rotated by a driving source (motor, etc.), not shown. The gear is configured to mesh with a rack formed on a side surface of the 1 st rail 310. With the above configuration, the gear 340 is rotated by the drive source, and the entire 2 nd moving mechanism 400 can be linearly reciprocated in the 1 st direction together with the plurality of 1 st moving bodies. In view of the 1 st movement mechanism 300 configured as described above, it can be said that the "film formation source unit" has the film formation source 100, the 2 nd movement mechanism 400, the 1 st movement body, and the 1 st supply member 350.
< 2 nd movement mechanism >
The 2 nd moving mechanism 400 includes a pair of 2 nd guide rails 410 provided parallel to each other. The pair of 2 nd rails 410 are each equivalent to "rail 10" in the basic structure described above. Further, 2 nd moving bodies (not shown) moving along the respective 2 nd guide rails 410 are provided on each of the pair of 2 nd guide rails 410. These 2 nd moving bodies are equivalent to the "moving body 20" in the above basic structure. The 2 nd feeding member 450 is fixed to each of the 2 nd moving bodies. These 2 nd feeding members 450 are equivalent to the "feeding member 50" in the basic structure described above. Further, the 2 nd cover unit 460 is fixed to each of the 2 nd supply members 450. These 2 nd cap units 460 are equivalent to the "cap unit 60" in the basic structure described above. Further, stoppers 470 defining a movement range of the film forming source unit having the film forming source 100 are provided at both ends of the 2 nd rail 410, respectively.
The film forming source 100 is fixed to the plurality of 2 nd moving bodies. The film forming source 100 includes a rotation shaft 441 and gears 442 provided at both ends of the rotation shaft 441. These gears 442 are configured to mesh with racks formed on the upper surface of the 2 nd rail 410. With the above configuration, the gear 442 is rotated together with the rotation shaft 441 by a driving source, not shown, and the film forming source 100 can be linearly reciprocated in the 2 nd direction together with the plurality of 2 nd moving bodies. In view of the 2 nd moving mechanism 400 configured as described above, it can be said that the "film forming source unit" includes the film forming source 100, the 2 nd moving body, and the 2 nd supply member 450.
As described above, the film formation source 100 is directly fixed to the 2 nd movable body, and is indirectly fixed to the 1 st movable body. In addition, the 1 st movement mechanism 300 and the 2 nd movement mechanism 400 are shown as a mechanism for moving a moving body, and a so-called rack and pinion mechanism is used. However, these moving mechanisms are not limited to the rack-and-pinion mechanism, and various known techniques such as a ball screw mechanism can be employed as a mechanism for moving the moving body.
< advantage of the film Forming apparatus of the embodiment >
According to the film forming apparatus of the present embodiment, the cover member 61 is maintained in a long state during the movement of the film forming source 100, and therefore scattering of the lubricant can be suppressed. In addition, when the moving body 20 (1 st moving body, 2 nd moving body) is located at the end (end of the movement range) of the rail 10 (1 st rail 310, 2 nd rail 410), the cover member 61 is in a short state, and therefore, the device can be prevented from being enlarged.
Next, a more specific embodiment of the cover unit 60 (the 1 st cover unit 360, the 2 nd cover unit 460) is described.
Example 1
In fig. 5 and 6, a hood unit of embodiment 1 of the present invention is shown. Fig. 5 is a diagram showing a part of the structure of the moving mechanism according to embodiment 1 of the present invention. Fig. 6 is a schematic explanatory diagram of the hood unit of embodiment 1 of the present invention. Fig. 5 corresponds to a view of the hood unit 60A and the like from the left side in fig. 6. Fig. 6 shows a view of each member in a cut-away view, and the cross section of the cover unit 60A in fig. 6 corresponds to the CC cross section in fig. 5. The same reference numerals are given to the same components as those of the above-described embodiment, and the description thereof will be omitted appropriately.
The cover unit 60A of the present embodiment includes a cover member 61. The cover member 61 has a 1 st side wall portion 63 at one end and a 2 nd side wall portion 64 at the other end. The cover member 61 is constituted by a telescopic cover as a telescopic part that can be telescopic, and is constituted by a metallic corrugated member (bellows). As shown in fig. 5, the cover member 61 of the present embodiment is constituted by a member having a circular arc shape when viewed from the front, but various shapes such as a polygonal shape can be adopted. The cover member 61 is configured to cover the entire width direction of the upper surface of the rail 10 and a part of both side surfaces of the rail 10. Further, the cover member 61 of the present embodiment has the following elasticity: in a state where no external force acts, the length (length in the moving direction of the movable body 20) is kept constant, and the movable body stretches and contracts by the application of the external force, and returns to the original state when the external force disappears.
In addition, in the cover unit 60A of the present embodiment, a guide mechanism 62 for stabilizing the shape of the cover member 61 when the cover member 61 expands and contracts is provided. In the guide mechanism 62 of the present embodiment, a linear motion guide device is employed. That is, the guide mechanism 62 includes: a guide rail 62a having one end portion fixed to the 1 st side wall portion 63; a moving body 62b that moves along the guide rail 62a on the guide rail 62 a; and a connecting member 62c having one end fixed to the movable body 62b and the other end fixed to the 2 nd side wall portion 64. However, the guide mechanism is not limited to the linear motion guide device, and various structures can be adopted.
According to the cover unit 60A configured as described above, the 2 nd side wall portion 64 of the cover member 61 is pressed against the stopper 70 provided at the end portion of the guide rail 10 and contracted, thereby changing from the long state (see fig. 6 (a)) to the short state (see fig. 6 (b)). When the cover member 61 is away from the stopper 70, the cover member 61 is changed from the short state to the long state by the elastic force of the cover member 61 itself.
Example 2
In fig. 7, a hood unit of embodiment 2 of the present invention is shown. Fig. 7 is a schematic explanatory diagram of the hood unit of embodiment 2 of the present invention. Fig. 7 shows a view of each member in a cutaway view. The same reference numerals are given to the same components as those of the above-described embodiments and examples, and the description thereof is omitted as appropriate.
The cover unit 60B of the present embodiment includes a cover member 61. The cover member 61 has a 1 st side wall portion 63 at one end and a 2 nd side wall portion 64 at the other end. The cover member 61 is made of a stretchable cover, which is a stretchable portion that can be stretched, and is made of a metal and corrugated, but the material is not limited as long as it can be stored and has no influence in the vacuum apparatus. The same as in example 1 applies to the cover member that can take various shapes and that is configured to cover the entire width direction of the upper surface of the rail 10 and a part of both side surfaces of the rail 10. The cover member 61 of the present embodiment is characterized by having a mechanism for maintaining a constant length (length in the moving direction of the moving body 20), unlike the case of embodiment 1.
In addition, in the cover unit 60B of the present embodiment, a guide mechanism 62 for stabilizing the shape of the cover member 61 when the cover member 61 expands and contracts is also provided. The guide mechanism 62 includes: a guide pin 62d having one end fixed to the 1 st side wall 63 and the other end provided with a stopper 62d1; a cylindrical housing 62e; a spring member 62g as an elastic member disposed in the housing 62e; and a bearing 62f of the guide pin 62 d. The spring member 62g is provided with one end in contact with the stopper 62d1 of the guide pin 62d and the other end in contact with the 2 nd side wall portion 64. The spring member 62g plays a role of maintaining the cover member 61 in a long state.
According to the cover unit 60B configured as described above, when the cover member 61 is pressed against the stopper 70 provided at the end portion of the guide rail 10, the spring member 62g contracts, and the cover member 61 changes from the long state (see fig. 7 (a)) to the short state (see fig. 7 (B)). Then, as the cover member 61 moves in a direction away from the stopper 70, the spring member 62g returns to its original state by the elastic force, so that the cover member 61 is biased in the extending direction, and the cover member 61 changes from the short state to the long state.
Example 3
In fig. 8 and 9, a hood unit of embodiment 3 of the present invention is shown. Fig. 8 is a diagram showing a part of the structure of a moving mechanism according to embodiment 3 of the present invention. Fig. 9 is a schematic explanatory diagram of the hood unit of embodiment 3 of the present invention. Fig. 8 corresponds to a view of the hood unit 60C and the like from the left side in fig. 9. Fig. 9 shows a view of each member in a cut-away view, and the cross section of the cover unit 60C in fig. 9 corresponds to the DD cross section in fig. 8. The same reference numerals are given to the same components as those of the above-described embodiments and examples, and the description thereof is omitted as appropriate.
The cover unit 60C of the present embodiment includes a 1 st cover member 61a and a 2 nd cover member 61b each made of metal or the like. In the present embodiment, the 1 st cover member 61a and the 2 nd cover member 61b constitute a cover member. Each of the 1 st cover member 61a and the 2 nd cover member 61b includes a circular arc-shaped portion when viewed from the front and a side wall portion provided at one end of the circular arc-shaped portion. The 2 nd cover member 61b is provided slidably with respect to the 1 st cover member 61a within a predetermined range in a direction parallel to the moving direction of the moving body 20. Further, as for the 1 st cover member 61a and the 2 nd cover member 61b, various shapes can be adopted as long as they are configured to be slidable within a certain range. The 1 st cover member 61a and the 2 nd cover member 61b are configured to cover the entire width direction of the upper surface of the rail 10 and a part of both side surfaces of the rail 10. Further, the 1 st cover part 61a is fixed to the supply member 50.
In the cover unit 60C of the present embodiment, a guide mechanism 62 for stabilizing the state at the time of movement of the 1 st cover member 61a and the 2 nd cover member 61b is provided. The structure of the guide mechanism 62 is the same as that of embodiment 1. In the cover unit 60C of the present embodiment, permanent magnets M1 and M2 as magnetic force generating members are provided on the facing surfaces of the 2 nd cover member 61b and the stopper 70 provided on the guide rail 10, respectively. The permanent magnets M1 and M2 are disposed so that different magnetic poles face each other, and are magnetically attracted to each other. In addition, as for the permanent magnets M1, M2, electromagnets may be used.
According to the cap unit 60C configured as described above, when the 2 nd cap member 61b constituting the cap member is pressed against the stopper 70, the 1 st cap member 61a slides toward the stopper 70 with respect to the 2 nd cap member 61b. Thereby, the cover member changes from the long state (see fig. 9 (a)) to the short state (see fig. 9 (b)). When the 1 st cover member 61a moves in a direction away from the stopper 70, the 2 nd cover member 61b does not move due to magnetic attraction until a certain range (see fig. 9 (c)), and when the 1 st cover member reaches a certain range, the 2 nd cover member 61b moves together with the 1 st cover member 61 a. By such an operation, the cover member changes from the short state to the long state.
In addition, when the cover member moves in a direction approaching the stopper 70, in order to maintain the long state described above, a spring member 61c as an elastic member is preferably provided to prevent the 1 st cover part 61a and the 2 nd cover part 61b from sliding. The spring member 61c is a compression spring. By providing the spring member 61c, the state in which the 1 st cover member 61a is separated from the 2 nd cover member 61b can be maintained. However, the spring member 61c may not be provided in the case where sliding of the 1 st cover member 61a and the 2 nd cover member 61b during movement can be suppressed by only frictional resistance therebetween. In addition, a stopper is preferably provided to prevent the 2 nd cap member 61b from coming off the 1 st cap member 61a when the cap member is moved in a direction away from the stopper 70. The position where the stopper is provided is not particularly limited, and for example, in the guide mechanism 62, the stopper may be provided on the guide rail 62a so as to prevent the movable body 62b from being separated from the guide rail 62 a.
Example 4
In fig. 10, a hood unit of embodiment 4 of the present invention is shown. Fig. 10 is a schematic explanatory diagram of the hood unit of embodiment 4 of the present invention. Fig. 10 shows a view of each member in a cutaway view. The same reference numerals are given to the same components as those of the above-described embodiments and examples, and the description thereof is omitted as appropriate.
The cover unit 60D of the present embodiment includes a 1 st cover member 61s, a 2 nd cover member 61t, and a 3 rd cover member 61u each made of metal or the like. In the present embodiment, the 1 st cover member 61s, the 2 nd cover member 61t, and the 3 rd cover member 61u constitute a cover member. Each of these cover members is formed of a member having a circular arc shape when viewed from the front. Further, these cover members are provided so as to be slidable with respect to each other. Specifically, the 1 st cover member 61s and the 2 nd cover member 61t are provided so as to be slidable with respect to each other in a direction parallel to the moving direction of the moving body 20, and similarly, the 2 nd cover member 61t and the 3 rd cover member 61u are provided so as to be slidable with respect to each other in a direction parallel to the moving direction of the moving body 20. Further, as long as these cover members are configured to be slidable with respect to each other, various shapes can be adopted. Further, these cover members are configured to cover the entire width direction of the upper surface of the rail 10 and a part of both side surfaces of the rail 10. Further, the 1 st cover part 61s is fixed to the supply member 50.
In the cover unit 60D of the present embodiment, a magnetic force generating member is provided at each end of the cover members that slide with respect to each other so as to magnetically repel each other. More specifically, the 1 st cover member 61s, the 2 nd cover member 61t, and the 3 rd cover member 61u are provided with permanent magnets M3, M4, and M5 at one end, respectively. The permanent magnet M3 provided in the 1 st cover member 61s and the permanent magnet M4 provided in the 2 nd cover member 61t are disposed so that the same magnetic poles face each other. The permanent magnet M4 provided in the 2 nd cover member 61t and the permanent magnet M5 provided in the 3 rd cover member 61u are disposed so that the same magnetic poles face each other. In addition, as for the permanent magnets M3, M4, M5, electromagnets may be used.
According to the cover unit 60D configured as described above, when the 3 rd cover member 61u in the cover member is pressed against the stopper 70 provided at the end portion of the guide rail 10, the cover members slide against each other so that the respective end portions approach each other against the repulsive force of magnetism. That is, the 1 st cover member 61s and the 2 nd cover member 61t slide between each other so that one end portion of the 1 st cover member 61s and one end portion of the 2 nd cover member 61t approach each other. Further, the second cover member 61t and the third cover member 61u slide between each other so that one end of the second cover member 61t and one end of the third cover member 61u approach each other. Thereby, the cover member changes from the long state (see fig. 10 (a)) to the short state (see fig. 10 (b)).
Further, when the cap member is sequentially moved away from the stopper 70 from the 1 st cap member 61s farthest from the stopper 70, the cap member gradually changes from the short state to the long state (see fig. 10 c). That is, as the 1 st cover member 61s moves away from the stopper 70, the repulsive force of the magnetism of the permanent magnets M3 and M4 gradually decreases. Thereafter, when the repulsive force and the frictional resistance between the 1 st cover member 61s and the 2 nd cover member 61t are balanced, the 2 nd cover member 61t also moves together with the 1 st cover member 61 s. Then, as the 2 nd cover member 61t gradually gets away from the stopper 70, the repulsive force of the magnetism of the permanent magnets M4 and M5 gradually decreases. Thereafter, when the repulsive force and the frictional resistance between the 2 nd and 3 rd cover members 61t and 61u are balanced, the 3 rd cover member 61u also moves together with the 2 nd cover member 61 t.
Further, when the cover member moves toward the stopper 70, the cover member can be maintained in a long state by maintaining a state in which the repulsive force between the adjacent permanent magnets and the frictional force of each cover member are balanced. In the present embodiment, the case where the cover member is constituted by 3 cover members is shown, but the number of cover members is not limited.
The cover units 60, 60A, 60B, 60C, and 60D are grease scattering prevention covers, and therefore the cover interior is contaminated. Can be detached for cleaning dirt. For example, the wall portions of the respective cover units may be fastened to the supply member 50 by screws, so that the cover units can be attached to and detached from the supply member.
< method for manufacturing electronic device >
Next, an example of a method for manufacturing an electronic device using the film forming apparatus of the present embodiment will be described. Hereinafter, a structure of an organic EL display device is shown as an example of an electronic device, and a method of manufacturing the organic EL display device is exemplified.
First, an organic EL display device to be manufactured will be described. Fig. 11 (a) shows an overall view of the organic EL display device 90, and fig. 11 (b) shows a cross-sectional structure of 1 pixel.
As shown in fig. 11 (a), a plurality of pixels 92 each including a plurality of light emitting elements are arranged in a matrix in a display region 91 of the organic EL display device 90. As will be described later in detail, the light-emitting elements each have a structure including an organic layer sandwiched between a pair of electrodes. The pixel here means the smallest unit that can display a desired color in the display area 91. In the case of the organic EL display device of the present embodiment, the pixel 92 is constituted by a combination of the 1 st light-emitting element 92R, the 2 nd light-emitting element 92G, and the 3 rd light-emitting element 92B which show mutually different light emission. The pixel 92 is often constituted by a combination of a red light emitting element, a green light emitting element, and a blue light emitting element, but may be a combination of a yellow light emitting element, a cyan light emitting element, and a white light emitting element, and is not particularly limited as long as it is at least 1 color or more.
Fig. 11 (B) is a partially cross-sectional view of line a-B of fig. 11 (a). The pixel 92 is composed of a plurality of light-emitting elements, each of which has a 1 st electrode (anode) 94, a hole-transporting layer 95, one of light-emitting layers 96R, 96G, 96B, an electron-transporting layer 97, and a 2 nd electrode (cathode) 98 on a substrate 93. Among these, the hole transport layer 95, the light emitting layers 96R, 96G, 96B, and the electron transport layer 97 correspond to organic layers. In this embodiment, the light-emitting layer 96R is an organic EL layer that emits red, the light-emitting layer 96G is an organic EL layer that emits green, and the light-emitting layer 96B is an organic EL layer that emits blue. The light-emitting layers 96R, 96G, and 96B are formed in patterns corresponding to light-emitting elements (also sometimes referred to as organic EL elements) that emit red, green, and blue, respectively.
The 1 st electrode 94 is formed separately for each light-emitting element. The hole transport layer 95, the electron transport layer 97, and the 2 nd electrode 98 may be formed in common among the plurality of light emitting elements 92R, 92G, and 92B, or may be formed for each light emitting element. In addition, in order to prevent the 1 st electrode 94 and the 2 nd electrode 98 from being short-circuited by foreign matter, an insulating layer 99 is provided between the 1 st electrodes 94. Further, since the organic EL layer is degraded by moisture and oxygen, a protective layer 98X for protecting the organic EL element from moisture and oxygen is provided.
In fig. 11 (b), the hole transport layer 95 and the electron transport layer 97 are shown as one layer, but may be formed of a plurality of layers including a hole blocking layer and an electron blocking layer according to the structure of the organic EL display element. In addition, a hole injection layer having an energy band structure can be formed between the 1 st electrode 94 and the hole transport layer 95, and injection of holes from the 1 st electrode 94 to the hole transport layer 95 can be performed smoothly. Similarly, an electron injection layer may be formed between the 2 nd electrode 98 and the electron transport layer 97.
An example of a method for manufacturing the organic EL display device is specifically described below.
First, a substrate 93 on which a circuit (not shown) for driving the organic EL display device and a 1 st electrode 94 are formed is prepared.
An insulating layer 99 is formed by spin-coating an acrylic resin on the substrate 93 on which the 1 st electrode 94 is formed, and patterning the acrylic resin by photolithography so that an opening is formed in a portion where the 1 st electrode 94 is formed. The opening corresponds to a light emitting region where the light emitting element actually emits light.
The substrate 93 patterned with the insulating layer 99 is fed to the 1 st organic material film forming apparatus, and the substrate is held by the substrate support table and the electrostatic chuck, and the hole transport layer 95 is formed as a common layer on the 1 st electrode 94 in the display region. The hole transport layer 95 is formed by vacuum evaporation. In practice, the hole transport layer 95 is formed to be larger in size than the display region 91, and thus a high-definition mask is not required.
Next, the substrate 93 formed to the hole transport layer 95 is fed to the 2 nd organic material film forming apparatus, and held by the substrate support table and the electrostatic chuck. Alignment of the substrate and the mask is performed, and the substrate is placed on the mask, whereby a red-emitting light-emitting layer 96R is formed at a portion of the substrate 93 where the red-emitting element is arranged.
In the same manner as the formation of the light-emitting layer 96R, the light-emitting layer 96G emitting green is formed by the 3 rd organic material film forming device, and the light-emitting layer 96B emitting blue is formed by the 4 th organic material film forming device. After the formation of the light-emitting layers 96R, 96G, 96B is completed, the electron transport layer 97 is formed by the 5 th film forming apparatus over the entire display region 91. The electron transport layer 97 is formed as a common layer in the 3-color light emitting layers 96R, 96G, 96B.
The 2 nd electrode 98 is formed by moving the substrate formed on the electron transport layer 97 by a metallic vapor deposition material film forming device.
Thereafter, the substrate is moved to a plasma CVD apparatus to form a protective layer 98X, and the organic EL display device 90 is completed.
When the substrate 93 on which the insulating layer 99 is patterned is fed to the film forming apparatus and the protective layer 98X is exposed to an environment containing moisture and oxygen until the film formation is completed, there is a possibility that the light-emitting layer made of the organic EL material may be degraded by the moisture and oxygen. Therefore, in this embodiment, the transfer of the substrate between the film forming apparatuses is performed in a vacuum atmosphere or an inert gas atmosphere.
Claims (11)
1. A film forming apparatus, comprising:
a rail to which a lubricant is attached;
a film forming source unit having at least a film forming source and moving in a moving direction along the rail while abutting the rail; and
a cover member attached to the film formation source unit and covering a part of the track,
the cover member has a telescopic portion that is telescopic,
the rail has a stopper that defines a movement range of the film formation source unit,
when the cover member is pressed against the stopper, the expansion and contraction portion contracts, so that when the film formation source unit is located at an end of the movement range, the length of the cover member in the movement direction changes from a 2 nd length longer than a 1 st length to the 1 st length, and when the cover member is away from the stopper, the expansion and contraction portion expands due to the elastic force of the expansion and contraction portion, so that the length of the cover member in the movement direction changes from the 1 st length to the 2 nd length, so that when the film formation source unit moves, the length of the cover member in the movement direction changes to the 2 nd length.
2. A film forming apparatus, comprising:
a rail to which a lubricant is attached;
a film forming source unit having at least a film forming source and moving in a moving direction along the rail while abutting the rail; and
a cover member attached to the film formation source unit and covering a part of the track,
the cover member has an elastic member for urging the stretchable and contractible portion in the stretching direction,
the rail has a stopper that defines a movement range of the film formation source unit,
the expansion and contraction portion is contracted when the cover member is pressed against the stopper, so that the length of the cover member in the moving direction is changed from the 2 nd length longer than the 1 st length to the 1 st length when the film forming source unit is positioned at the end of the moving range,
when the cover member is away from the stopper, the expansion and contraction portion expands due to the elastic force of the elastic member, so that the length of the cover member in the moving direction changes from the 1 st length to the 2 nd length, and when the film formation source unit moves, the length of the cover member in the moving direction becomes the 2 nd length.
3. A film forming apparatus, comprising:
a rail to which a lubricant is attached;
a film forming source unit having at least a film forming source and moving in a moving direction along the rail while abutting the rail;
a cover member attached to the film formation source unit and covering a part of the track; and
a magnetic force generating member for generating a magnetic force,
the cover member has a 1 st cover part and a 2 nd cover part provided slidably with respect to the 1 st cover part,
the rail has a stopper that defines a movement range of the film formation source unit,
the magnetic force generating means is arranged to magnetically attract the facing surfaces of the 2 nd cover member and the stopper to each other,
when the cap member is pressed against the stopper, the 1 st cap part slides with respect to the 2 nd cap part toward the stopper, so that the length of the cap member in the moving direction changes from a 2 nd length longer than a 1 st length to the 1 st length, so that the length of the cap member in the moving direction becomes the 1 st length when the film forming source unit is located at an end of the moving range,
when the 1 st cover member moves in a direction away from the stopper, the 2 nd cover member does not move due to the magnetic attraction until a certain range, the 1 st cover member slides with respect to the 2 nd cover member, and when the certain range is reached, the 2 nd cover member moves together with the 1 st cover member, so that when the film forming source unit moves, the length of the cover member in the moving direction becomes the 2 nd length.
4. The film forming apparatus according to any one of claim 1 to 3, wherein,
the device further comprises:
a 1 st moving member for moving the film formation source unit and the rail in a 1 st direction; and
and a 2 nd moving means for moving the film formation source unit along the track in a 2 nd direction intersecting the 1 st direction.
5. The film forming apparatus according to any one of claim 1 to 3, wherein,
further comprising a 1 st moving means for moving the film formation source unit in a 1 st direction along the track,
the film forming source unit has a 2 nd moving member for moving the film forming source in a 2 nd direction intersecting the 1 st direction.
6. The film forming apparatus according to any one of claim 1 to 3, wherein,
further comprising a 1 st moving means for moving the film formation source unit in a 1 st direction along the track,
the film forming source unit includes:
track 2;
a film forming source that moves along the 2 nd track in a 2 nd direction intersecting the 1 st direction while abutting the 2 nd track;
a 2 nd moving means for moving the film formation source along the 2 nd track in a 2 nd direction intersecting the 1 st direction; and
a 2 nd cover member covering a portion of the 2 nd track,
when the film forming source is positioned at the end of the movement range, the length of the 2 nd cover member in the 2 nd direction is 3 rd length,
when the film forming source moves, the length of the 2 nd cover member in the 2 nd direction becomes a 4 th length longer than the 3 rd length.
7. The film forming apparatus according to claim 1 or 2, wherein,
comprises a magnetic force generating member attached to the stopper,
when the cover member is away from the stopper, the expansion and contraction portion is elongated by the magnetic force of the magnetic force generating member.
8. The film forming apparatus according to claim 1 or 2, wherein,
the telescoping portion includes a bellows.
9. The film forming apparatus according to any one of claim 1 to 3, wherein,
the lubricant supplying device is provided with a supplying member for supplying the lubricant.
10. The film forming apparatus according to any one of claim 1 to 3, wherein,
the cover member is detachable from the film formation source unit.
11. A method for manufacturing an electronic device, characterized in that,
a film forming step of forming a film on a substrate using the film forming apparatus according to any one of claims 1 to 10.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021-060069 | 2021-03-31 | ||
| JP2021060069A JP7309773B2 (en) | 2021-03-31 | 2021-03-31 | Film forming apparatus and electronic device manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN115142023A CN115142023A (en) | 2022-10-04 |
| CN115142023B true CN115142023B (en) | 2023-10-27 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210327314.7A Active CN115142023B (en) | 2021-03-31 | 2022-03-30 | Film forming apparatus and method for manufacturing electronic device |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP7309773B2 (en) |
| KR (1) | KR20220136248A (en) |
| CN (1) | CN115142023B (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07293560A (en) * | 1994-04-27 | 1995-11-07 | Nippon Seiko Kk | Intermediate cover for linear guide device |
| JPH09264323A (en) * | 1996-03-26 | 1997-10-07 | Nippon Seiko Kk | Dustproof device of direct acting guide bearing |
| CN1452438A (en) * | 2002-04-15 | 2003-10-29 | 株式会社半导体能源研究所 | Method and apparatus for mfg. luminant device |
| JP2016179532A (en) * | 2015-03-24 | 2016-10-13 | 住友重機械工業株式会社 | Slide cover |
| CN109306453A (en) * | 2017-07-27 | 2019-02-05 | 佳能特机株式会社 | Display manufacturing apparatus and the manufacturing method of display device for using it |
| CN111621762A (en) * | 2019-02-27 | 2020-09-04 | 佳能特机株式会社 | Film forming apparatus, film forming method, and electronic device manufacturing method |
-
2021
- 2021-03-31 JP JP2021060069A patent/JP7309773B2/en active Active
-
2022
- 2022-03-30 KR KR1020220039625A patent/KR20220136248A/en not_active Application Discontinuation
- 2022-03-30 CN CN202210327314.7A patent/CN115142023B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07293560A (en) * | 1994-04-27 | 1995-11-07 | Nippon Seiko Kk | Intermediate cover for linear guide device |
| JPH09264323A (en) * | 1996-03-26 | 1997-10-07 | Nippon Seiko Kk | Dustproof device of direct acting guide bearing |
| CN1452438A (en) * | 2002-04-15 | 2003-10-29 | 株式会社半导体能源研究所 | Method and apparatus for mfg. luminant device |
| JP2016179532A (en) * | 2015-03-24 | 2016-10-13 | 住友重機械工業株式会社 | Slide cover |
| CN109306453A (en) * | 2017-07-27 | 2019-02-05 | 佳能特机株式会社 | Display manufacturing apparatus and the manufacturing method of display device for using it |
| CN111621762A (en) * | 2019-02-27 | 2020-09-04 | 佳能特机株式会社 | Film forming apparatus, film forming method, and electronic device manufacturing method |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20220136248A (en) | 2022-10-07 |
| CN115142023A (en) | 2022-10-04 |
| JP7309773B2 (en) | 2023-07-18 |
| JP2022156402A (en) | 2022-10-14 |
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