CN115142010B - Oled金属掩模及其制造方法 - Google Patents

Oled金属掩模及其制造方法 Download PDF

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Publication number
CN115142010B
CN115142010B CN202210581868.XA CN202210581868A CN115142010B CN 115142010 B CN115142010 B CN 115142010B CN 202210581868 A CN202210581868 A CN 202210581868A CN 115142010 B CN115142010 B CN 115142010B
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China
Prior art keywords
mask
line
rear side
oled
vapor deposition
Prior art date
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English (en)
Chinese (zh)
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CN115142010A (zh
Inventor
金振禹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jiangsu Jingrunhong Measurement And Control Technology Co ltd
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Jiangsu Jingrunhong Measurement And Control Technology Co ltd
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Publication of CN115142010A publication Critical patent/CN115142010A/zh
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
CN202210581868.XA 2022-02-20 2022-05-26 Oled金属掩模及其制造方法 Active CN115142010B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2022-0021816 2022-02-20
KR20220021816 2022-02-20

Publications (2)

Publication Number Publication Date
CN115142010A CN115142010A (zh) 2022-10-04
CN115142010B true CN115142010B (zh) 2023-09-01

Family

ID=83405963

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202210581868.XA Active CN115142010B (zh) 2022-02-20 2022-05-26 Oled金属掩模及其制造方法

Country Status (2)

Country Link
KR (1) KR20230125131A (ko)
CN (1) CN115142010B (ko)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150096590A (ko) * 2014-02-14 2015-08-25 삼성디스플레이 주식회사 마스크 프레임 조립체 및 그 제조방법
CN107541699A (zh) * 2016-06-24 2018-01-05 Ap系统股份有限公司 用于使用电镀来制造精细金属掩模的方法
KR102208779B1 (ko) * 2020-07-21 2021-01-28 풍원정밀(주) 인장 시간 단축 및 인장 품질 향상 효과를 갖는 oled용 메탈 마스크 및 이의 인장 방법
KR102228839B1 (ko) * 2020-07-20 2021-03-17 풍원정밀(주) 공정 수율 향상을 위해 트림 라인의 돌출부를 제거한 oled 증착용 메탈 마스크

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101984112B1 (ko) 2019-03-18 2019-05-31 (주)세우인코퍼레이션 투 스텝 에칭 방식에 의한 갭 마스크 제조방법
KR102188656B1 (ko) 2020-07-15 2020-12-08 (주)세우인코퍼레이션 인장력 분산 구조를 갖는 립 마스크
KR102186447B1 (ko) 2020-08-14 2020-12-07 (주)세우인코퍼레이션 오픈 마스크 조립체의 제조 방법
KR102230000B1 (ko) 2020-08-24 2021-03-22 (주)세우인코퍼레이션 Oled 마스크 제조 장치 및 방법
KR102269904B1 (ko) 2021-02-25 2021-06-28 (주)세우인코퍼레이션 Oled 증착용 대면적 오픈 메탈 마스크의 제조 방법

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150096590A (ko) * 2014-02-14 2015-08-25 삼성디스플레이 주식회사 마스크 프레임 조립체 및 그 제조방법
CN107541699A (zh) * 2016-06-24 2018-01-05 Ap系统股份有限公司 用于使用电镀来制造精细金属掩模的方法
KR102228839B1 (ko) * 2020-07-20 2021-03-17 풍원정밀(주) 공정 수율 향상을 위해 트림 라인의 돌출부를 제거한 oled 증착용 메탈 마스크
KR102208779B1 (ko) * 2020-07-21 2021-01-28 풍원정밀(주) 인장 시간 단축 및 인장 품질 향상 효과를 갖는 oled용 메탈 마스크 및 이의 인장 방법

Also Published As

Publication number Publication date
CN115142010A (zh) 2022-10-04
KR20230125131A (ko) 2023-08-29

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