KR100696549B1 - 마스크 프레임 조립체 - Google Patents
마스크 프레임 조립체 Download PDFInfo
- Publication number
- KR100696549B1 KR100696549B1 KR1020050120917A KR20050120917A KR100696549B1 KR 100696549 B1 KR100696549 B1 KR 100696549B1 KR 1020050120917 A KR1020050120917 A KR 1020050120917A KR 20050120917 A KR20050120917 A KR 20050120917A KR 100696549 B1 KR100696549 B1 KR 100696549B1
- Authority
- KR
- South Korea
- Prior art keywords
- frame
- mask
- frame assembly
- assembly
- thin film
- Prior art date
Links
Images
Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
Claims (4)
- 프레임과;상기 프레임에 접합되어 연결된 마스크를 포함하며,상기 프레임은 그 내부가 중공 구조로 된, 박막 증착용 마스크 프레임 조립체.
- 제1항에 있어서,상기 프레임은 그 내부에 중공부가 형성되어 관형상을 이루는 것을 특징으로 하는, 박막 증착용 마스크 프레임 조립체.
- 제2항에 있어서,상기 프레임은 그 수직 단면이 □ 형으로된 중공의 관상 구조인 것을 특징으로 하는, 박막 증착용 마스크 프레임 조립체.
- 제3항에 있어서,상기 프레임은 스테인레스 스틸 또는 니켈 합금으로 된 것을 특징으로 하는, 박막 증착용 마스크 프레임 조립체.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050120917A KR100696549B1 (ko) | 2005-12-09 | 2005-12-09 | 마스크 프레임 조립체 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050120917A KR100696549B1 (ko) | 2005-12-09 | 2005-12-09 | 마스크 프레임 조립체 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR100696549B1 true KR100696549B1 (ko) | 2007-03-19 |
Family
ID=41623669
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020050120917A KR100696549B1 (ko) | 2005-12-09 | 2005-12-09 | 마스크 프레임 조립체 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100696549B1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111778475A (zh) * | 2019-04-04 | 2020-10-16 | 陕西坤同半导体科技有限公司 | 掩膜板 |
-
2005
- 2005-12-09 KR KR1020050120917A patent/KR100696549B1/ko active IP Right Grant
Non-Patent Citations (2)
Title |
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한국공개특허 제2001-89131호 * |
한국공개특허 제2003-93959호 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111778475A (zh) * | 2019-04-04 | 2020-10-16 | 陕西坤同半导体科技有限公司 | 掩膜板 |
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