CN115004353A - 陶瓷构造体的制造方法 - Google Patents
陶瓷构造体的制造方法 Download PDFInfo
- Publication number
- CN115004353A CN115004353A CN202180011161.9A CN202180011161A CN115004353A CN 115004353 A CN115004353 A CN 115004353A CN 202180011161 A CN202180011161 A CN 202180011161A CN 115004353 A CN115004353 A CN 115004353A
- Authority
- CN
- China
- Prior art keywords
- molded body
- support member
- ceramic structure
- manufacturing
- contact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000919 ceramic Substances 0.000 title claims abstract description 57
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 28
- 238000000034 method Methods 0.000 title claims abstract description 21
- 238000005238 degreasing Methods 0.000 claims abstract description 48
- 229910052751 metal Inorganic materials 0.000 claims abstract description 4
- 239000002184 metal Substances 0.000 claims abstract description 4
- 238000010304 firing Methods 0.000 claims description 24
- 230000002093 peripheral effect Effects 0.000 claims description 5
- 239000002994 raw material Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 abstract description 4
- 238000012986 modification Methods 0.000 description 26
- 230000004048 modification Effects 0.000 description 26
- 239000004065 semiconductor Substances 0.000 description 11
- 238000000465 moulding Methods 0.000 description 7
- 239000002609 medium Substances 0.000 description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 5
- 239000000843 powder Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 2
- 235000019646 color tone Nutrition 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052878 cordierite Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/63—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B using additives specially adapted for forming the products, e.g.. binder binders
- C04B35/638—Removal thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
- H01L21/6833—Details of electrostatic chucks
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Structural Engineering (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020014571 | 2020-01-31 | ||
JP2020-014571 | 2020-01-31 | ||
PCT/JP2021/000309 WO2021153180A1 (ja) | 2020-01-31 | 2021-01-07 | セラミック構造体の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN115004353A true CN115004353A (zh) | 2022-09-02 |
Family
ID=77079337
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202180011161.9A Pending CN115004353A (zh) | 2020-01-31 | 2021-01-07 | 陶瓷构造体的制造方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP7447154B2 (ko) |
KR (1) | KR20220120656A (ko) |
CN (1) | CN115004353A (ko) |
WO (1) | WO2021153180A1 (ko) |
Citations (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1156706A (zh) * | 1995-11-08 | 1997-08-13 | 松下电器产业株式会社 | 陶瓷压型体的脱脂方法和脱脂装置 |
JP2001110879A (ja) * | 1999-06-09 | 2001-04-20 | Ibiden Co Ltd | 半導体製造・検査装置用セラミック基板 |
JP2004018325A (ja) * | 2002-06-18 | 2004-01-22 | Ngk Insulators Ltd | 焼結体の製造方法、焼結体、焼結用部材、セラミック多層基板の製造方法およびセラミック多層基板 |
EP1407842A2 (en) * | 2002-09-30 | 2004-04-14 | Dowa Mining Co., Ltd. | Mold and method for manufacturing metal-ceramic composite member |
JP2005340441A (ja) * | 2004-05-26 | 2005-12-08 | Kyocera Corp | ウェハ支持部材 |
JP2007232352A (ja) * | 2005-12-27 | 2007-09-13 | Ibiden Co Ltd | 脱脂用治具、セラミック成形体の脱脂方法、及び、ハニカム構造体の製造方法 |
JP2009090623A (ja) * | 2007-10-12 | 2009-04-30 | Tokuyama Corp | セラミック成形体の保持具 |
CN101960245A (zh) * | 2008-03-05 | 2011-01-26 | 日本碍子株式会社 | 陶瓷烧成用窑工具板 |
US20110121493A1 (en) * | 2009-11-25 | 2011-05-26 | Ibiden Co., Ltd. | Method for manufacturing ceramic fired body and method for manufacturing honeycomb structured body |
CN102741998A (zh) * | 2010-01-29 | 2012-10-17 | 住友大阪水泥股份有限公司 | 静电卡盘装置 |
JP2013226497A (ja) * | 2012-04-25 | 2013-11-07 | Panasonic Corp | マイクロ流体デバイス |
US20140355169A1 (en) * | 2013-05-31 | 2014-12-04 | Sumitomo Osaka Cement Co., Ltd. | Electrostatic chuck device |
JP2016088831A (ja) * | 2014-10-29 | 2016-05-23 | 住友金属鉱山株式会社 | 円筒形セラミックス焼結体およびその製造方法 |
CN107958837A (zh) * | 2016-10-14 | 2018-04-24 | 日本碍子株式会社 | 半导体制造装置用部件及其制法 |
CN108987229A (zh) * | 2017-05-30 | 2018-12-11 | 朗姆研究公司 | 高温衬底基座模块及其组件 |
TW201922676A (zh) * | 2017-11-02 | 2019-06-16 | 日商日本碍子股份有限公司 | 半導體製造裝置用構件、其製法及成形模具 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001089248A (ja) * | 1999-09-22 | 2001-04-03 | Ngk Spark Plug Co Ltd | セラミック基板の製造方法及びそれに使用する冶具 |
JP2004214690A (ja) * | 2000-02-07 | 2004-07-29 | Ibiden Co Ltd | 半導体製造・検査装置用セラミック基板 |
JP4646461B2 (ja) * | 2001-08-10 | 2011-03-09 | 京セラ株式会社 | 電極内蔵セラミック部材及びその製造方法 |
JP2003128470A (ja) * | 2001-10-23 | 2003-05-08 | Mitsubishi Materials Corp | セラミックス基板の製造方法及び多孔質セラミックス板 |
JP2008120653A (ja) | 2006-11-15 | 2008-05-29 | Denso Corp | セラミックハニカム成形体の焼成用載置台 |
JP6215668B2 (ja) * | 2012-11-30 | 2017-10-18 | 京セラ株式会社 | セラミック焼結体、これを用いた流路部材ならびに半導体検査装置および半導体製造装置 |
US10068783B2 (en) | 2013-08-26 | 2018-09-04 | Kyocera Corporation | Sample holder |
JP2016038194A (ja) * | 2014-08-12 | 2016-03-22 | 東北セラミック株式会社 | 脱脂・焼成用セッター |
JP6410758B1 (ja) * | 2016-05-24 | 2018-10-24 | 三井金属鉱業株式会社 | セラミックス格子体 |
-
2021
- 2021-01-07 JP JP2021574579A patent/JP7447154B2/ja active Active
- 2021-01-07 CN CN202180011161.9A patent/CN115004353A/zh active Pending
- 2021-01-07 WO PCT/JP2021/000309 patent/WO2021153180A1/ja active Application Filing
- 2021-01-07 KR KR1020227025957A patent/KR20220120656A/ko unknown
Patent Citations (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1156706A (zh) * | 1995-11-08 | 1997-08-13 | 松下电器产业株式会社 | 陶瓷压型体的脱脂方法和脱脂装置 |
JP2001110879A (ja) * | 1999-06-09 | 2001-04-20 | Ibiden Co Ltd | 半導体製造・検査装置用セラミック基板 |
JP2004018325A (ja) * | 2002-06-18 | 2004-01-22 | Ngk Insulators Ltd | 焼結体の製造方法、焼結体、焼結用部材、セラミック多層基板の製造方法およびセラミック多層基板 |
EP1407842A2 (en) * | 2002-09-30 | 2004-04-14 | Dowa Mining Co., Ltd. | Mold and method for manufacturing metal-ceramic composite member |
JP2005340441A (ja) * | 2004-05-26 | 2005-12-08 | Kyocera Corp | ウェハ支持部材 |
JP2007232352A (ja) * | 2005-12-27 | 2007-09-13 | Ibiden Co Ltd | 脱脂用治具、セラミック成形体の脱脂方法、及び、ハニカム構造体の製造方法 |
JP2009090623A (ja) * | 2007-10-12 | 2009-04-30 | Tokuyama Corp | セラミック成形体の保持具 |
CN101960245A (zh) * | 2008-03-05 | 2011-01-26 | 日本碍子株式会社 | 陶瓷烧成用窑工具板 |
US20110121493A1 (en) * | 2009-11-25 | 2011-05-26 | Ibiden Co., Ltd. | Method for manufacturing ceramic fired body and method for manufacturing honeycomb structured body |
CN102741998A (zh) * | 2010-01-29 | 2012-10-17 | 住友大阪水泥股份有限公司 | 静电卡盘装置 |
JP2013226497A (ja) * | 2012-04-25 | 2013-11-07 | Panasonic Corp | マイクロ流体デバイス |
US20140355169A1 (en) * | 2013-05-31 | 2014-12-04 | Sumitomo Osaka Cement Co., Ltd. | Electrostatic chuck device |
JP2016088831A (ja) * | 2014-10-29 | 2016-05-23 | 住友金属鉱山株式会社 | 円筒形セラミックス焼結体およびその製造方法 |
CN107958837A (zh) * | 2016-10-14 | 2018-04-24 | 日本碍子株式会社 | 半导体制造装置用部件及其制法 |
CN108987229A (zh) * | 2017-05-30 | 2018-12-11 | 朗姆研究公司 | 高温衬底基座模块及其组件 |
TW201922676A (zh) * | 2017-11-02 | 2019-06-16 | 日商日本碍子股份有限公司 | 半導體製造裝置用構件、其製法及成形模具 |
Also Published As
Publication number | Publication date |
---|---|
WO2021153180A1 (ja) | 2021-08-05 |
JPWO2021153180A1 (ko) | 2021-08-05 |
JP7447154B2 (ja) | 2024-03-11 |
KR20220120656A (ko) | 2022-08-30 |
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Legal Events
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PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination |