CN114993997A - Device and method for carrying out nondestructive testing on structural depth of micro-nano optical element - Google Patents

Device and method for carrying out nondestructive testing on structural depth of micro-nano optical element Download PDF

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CN114993997A
CN114993997A CN202210538503.9A CN202210538503A CN114993997A CN 114993997 A CN114993997 A CN 114993997A CN 202210538503 A CN202210538503 A CN 202210538503A CN 114993997 A CN114993997 A CN 114993997A
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light
micro
optical element
nano optical
transmittance
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龚燕妮
许红
常乐
曾进能
董煜辉
杨壮
张勤东
王强
苏天宁
姜云龙
张春先
沙红方
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North Night Vision Technology Co Ltd
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/59—Transmissivity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/22—Measuring arrangements characterised by the use of optical techniques for measuring depth
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
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Abstract

The invention discloses a device and a method for carrying out nondestructive testing on the structural depth of a micro-nano optical element, and the device comprises a testing box body and a box cover for sealing the testing box body, wherein a light source, a monochromator, a beam splitter, a tested micro-nano optical element, an integrating sphere, a reflector and a photomultiplier are arranged in the testing box body, and a computer arranged outside the testing box body is connected with the output end of the photomultiplier. The method obtains the 0-order diffraction peak intensity I according to the Fraunhofer diffraction intensity distribution formula and the diffraction grating formula 0peak Relation with transmissivity T of micro-nano optical element
Figure DDA0003647392650000011
And (4) taking the relation T between the transmittance T and the structural depth h as 80-0.07h, and taking the measured transmittance value into a formula to calculate the structural depth h of the micro-nano optical element. The structure calculated by transmittanceThe characteristic size has the characteristics of high testing efficiency and no damage to the sample.

Description

Device and method for carrying out nondestructive testing on structural depth of micro-nano optical element
Technical Field
The invention relates to the technical field of micro-nano structure detection, in particular to a device and a method for carrying out nondestructive detection on the structure depth of a micro-nano optical element.
Background
The micro-nano structure refers to a structure, characteristic size and the like of which reach a micron or nanometer level, and common micro-nano structures comprise a sub-wavelength grating structure and a moth eye structure. With the wide application of micro-nano structures, people have higher and higher requirements on the spectral performance of the micro-nano structures. When light passes through media with different refractive indexes in the transmission process, Fresnel loss occurs, so that the utilization rate of the light is reduced, and how to increase the transmittance and inhibit the reflectivity so as to improve the light absorption becomes a research hotspot. Compared with the traditional method of adopting an anti-reflection coating, the method for directly processing the micro-nano structure on the optical surface has the advantages of stability, durability and more flexible coordination capability, and can realize the anti-reflection function in a wide spectral range. At present, micro-nano structures are widely applied to the fields of photoelectrons, lasers, solar energy, aerospace and the like.
For the manufactured micro-nano structure, relevant detection is required, including structure parameters and performance. As the characteristic dimension parameter of the micro-nano structure is basically in submicron level (less than or equal to 500nm), the micro-nano structure can not be detected by a conventional optical microscope, and other feasible detection means, such as a laser confocal microscope, an atomic force microscope and the like, have the problems of higher equipment requirement configuration, high test cost, lower test efficiency and the like.
Disclosure of Invention
In order to overcome the defects of the prior art, the invention provides a method for carrying out nondestructive testing on the structural depth of a micro-nano optical element, and the method has the characteristics of high cost performance, higher testing efficiency and low sample damage.
The technical scheme adopted by the invention is as follows:
the utility model provides a device to receiving optical element's depth of structure and carrying out nondestructive test is received to receiving a little, includes test box and the case lid that is used for this test box of closing cap set up light source, monochromator, spectroscope, the little optical element that receives, integrating sphere, speculum and photomultiplier in the test box, the computer that sets up outside the test box is connected with photomultiplier's output.
Along the light path direction, a light source is installed on one side in the test box body, a monochromator and a light splitter are installed on the same optical axis, a reflector is installed right in front of the upper portion of the light splitter, a reflector is installed right below the reflector at an angle of 90 degrees, a photomultiplier is installed behind the reflector along the extension line of the optical axis of the monochromator, the output end of the photomultiplier is connected with a computer outside the test box body, an integrating sphere is installed right in front of the lower portion of the light splitter, and a photomultiplier is installed behind the emergent end of the integrating sphere. The test does not require darkroom conditions.
Preferably, the light source is a halogen lamp, and the wavelength of the halogen lamp is 360-2000 nm.
A nondestructive detection method for the structural depth of a micro-nano optical element comprises the following steps:
the first step is as follows: preheating equipment, namely turning on a power supply of a measurement system and a computer to preheat for about 2-3 minutes;
the second step is that: the optical path inspection, opening the light source and the operation software to check whether the optical path of the system is normal, and displaying the completion of the inspection by the computer; opening a cover plate of the test system, checking whether the reference light path is normal, and then closing the protective cover;
the third step: setting a spectral range, namely setting the spectral range of 400 nm-850 nm to be tested according to the micro-nano element;
the fourth step: calibrating equipment, opening operating software, starting transmission light collection, carrying out spectral transmittance empty measurement once, and enabling the transmittance to return to zero by 100%;
the fifth step: cleaning a tested piece, wiping the surface and the back of the micro-nano optical element to be tested by alcohol, and cleaning to be tested;
and a sixth step: loading a tested piece, opening a test box cover plate of a measurement system, loading a micro-nano optical element to be tested, and closing the cover plate;
the seventh step: measuring a transmittance curve, collecting transmitted light and measuring the transmittance of a spectral range, continuously separating monochromatic light from light emitted by a light source through a monochromator, separating the monochromatic light into two beams of light through a beam splitter, wherein one beam of light is reference light, the other beam of light is measuring light, the measuring light irradiates a micro-nano optical element, the light is converted through a reflector, the reference light and the transmitted light of the micro-nano optical element are alternately received by a high-sensitivity photomultiplier, the collected transmitted light and reference light signals are converted into electric signals, the electric signals are output to a computer, and the transmittance curve of the micro-nano optical element is obtained through software processing;
eighth step: calculating the structure of the micro-nano optical element according to a Fraunhofer diffraction intensity distribution formula:
Figure BDA0003647392630000031
in the formula: i (fx) is diffraction intensity; fx is sin theta/lambda, theta is a diffraction angle, and lambda is an incident wavelength; l is the total width of the structure; m is a positive integer and a negative integer which are obtained by taking the diffraction order value; h is the structural depth; c is the light transmittance; a is a structural period;
and diffraction grating formula:
mλ＝A(sinα±sinθ)
in the formula: m is a diffraction order and is a positive integer and a negative integer; λ is the incident wavelength; a is a structural period; alpha is an incident angle; theta is a diffraction angle;
the 0-order diffraction peak intensity I is obtained 0peak The relation with the transmittance T of the micro-nano optical element is as follows:
Figure BDA0003647392630000032
in the formula: h is the structural depth; λ is the incident wavelength;
the relation between the transmittance T and the structural depth h is as follows: and (5) taking the measured transmittance value into a formula, and calculating to obtain the structure depth h of the micro-nano optical element, wherein T is 80-0.07 h.
Further, the structure depth h is within the range of 400nm to 600 nm.
The beneficial effects of the invention are as follows:
the method is based on optical theory analysis, the structural feature size is calculated through the transmittance, the surface does not need to be focused, the measured depth data is reliable, and the method has the characteristics of high cost performance, high testing efficiency and low sample damage.
Drawings
FIG. 1: the structural schematic diagram of the micro-nano optical element to be measured.
FIG. 2: the nondestructive testing device is schematically shown in the composition structure.
FIG. 3: a flow chart of a non-destructive inspection method of the present invention.
FIG. 4: the method provided by the invention is used for measuring the actually measured transmittance curve chart of the micro-nano optical element.
FIG. 5: and (3) a curve graph of the transmittance of the micro-nano optical element and the structural depth.
In the figure: 1-micro-nano structure, 2-light source; 3-a monochromator; 4-a beam splitter; 5-measured micro-nano optical element; 6-integrating sphere; 7-a mirror; 8-a photomultiplier tube; 9-testing the box body; 10-a box cover; 11-computer.
Detailed Description
Referring to fig. 1, the micro-nano optical element is formed by manufacturing a layer of micro-nano structure on a transparent material, and plays a role in modulating incident light. Feature sizes are on the submicron scale.
Example 1
Referring to fig. 2, the device for performing nondestructive testing on the structural depth of a micro-nano optical element comprises a testing box body 9 and a box cover 10 used for sealing the testing box body, wherein a light source 2, a monochromator 3, a light splitter 4, a measured micro-nano optical element 5, an integrating sphere 6, a reflector 7 and a photomultiplier 8 are arranged in the testing box body 9, and a computer 11 arranged outside the testing box body 9 is connected with the output end of the photomultiplier 8.
A light source 2 is arranged on one side in a test box 9, a monochromator 3 and a spectroscope 4 are arranged on the same optical axis behind the light source along the advancing direction of an optical path, a reflector 7 is arranged right in front of the upper part of the spectroscope 4, a reflector 7 is arranged right below the reflector 7 at an angle of 90 degrees, a photomultiplier 8 is arranged behind the reflector 7 along the extension line of the optical axis of the monochromator 3, the output end of the photomultiplier 8 is connected with a computer 11 outside the test box 9, an integrating sphere 6 is arranged right in front of the lower part of the spectroscope 4, a measured micro-nano optical element 5 is positioned between the spectroscope 4 and the integrating sphere 6, and the photomultiplier 8 is arranged behind the emergent end of the integrating sphere 6.
Referring to fig. 2, the light source is a halogen lamp fixed by a bracket, and the wavelength is 360-2000 nm;
referring to fig. 2, the monochromator, the beam splitter, the reflector, the integrating sphere, the photomultiplier tube and the computer all conform to the national or industrial standard of photoelectric instruments and electronic components.
Referring to fig. 2, according to the requirement of an integrating sphere, it is required to ensure that transmitted light information can be collected by a photomultiplier tube, and the positions of the integrating sphere and the photomultiplier tube need to be assembled and corrected.
Example 2
Referring to fig. 3, a method for performing nondestructive testing on the structural depth of a micro-nano optical element by using the apparatus in embodiment 1 includes the following steps:
the first step is as follows: preheating equipment, namely firstly turning on a power supply of a measurement system and a computer to preheat for about 2-3 minutes;
the second step is that: system light path inspection, namely opening a light source and operating software to check whether the system light path is normal or not, and displaying that the inspection is finished by a computer;
the third step: checking the reference light path, opening a cover plate of the test system, checking whether the reference light path is normal or not, and then closing the protective cover;
the fourth step: setting a spectral range, namely setting the spectral range 400 nm-850 nm of the micro-nano element to be tested;
the fifth step: calibrating equipment, starting operating software, starting transmission light collection, performing spectral transmittance empty test once, and enabling the transmittance test to return to zero by 100%;
and a sixth step: cleaning a tested piece, wiping the surface and the back of the micro-nano optical element to be tested by alcohol, and cleaning to be tested;
the seventh step: loading a tested piece, opening a test box cover plate of a measurement system, loading a micro-nano optical element to be tested, and closing the cover plate;
eighth step: the transmittance curve was measured. Collecting transmitted light and determining the transmittance of a spectral range, continuously separating monochromatic light from light emitted by a light source through a monochromator, dividing the light into two beams of light through a beam splitter, wherein one beam of light is reference light, the other beam of light is measurement light, the measurement light irradiates a micro-nano optical element, the light is converted through a reflector, a high-sensitivity photomultiplier tube alternately receives the reference light and the transmitted light of the micro-nano optical element, the collected transmitted light and reference light signals are converted into electric signals, the electric signals are output to a computer, and a transmittance curve of the micro-nano optical element is obtained through software processing;
the ninth step: and calculating the structure of the micro-nano optical element. According to the Fraunhofer diffraction intensity distribution formula
Figure BDA0003647392630000051
And a diffraction grating formula m lambda is A (sin alpha +/-sin theta), when the 0-order diffraction peak value intensity is in positive correlation with the transmittance of the micro-nano optical element, the formula is calculated from the 0-order diffraction peak value
Figure BDA0003647392630000061
It can be seen that the peak intensity is strongThe degree is determined by the structure depth and the incident wavelength, so that the transmittance is reduced along with the increase of the depth of the micro-nano structure on the premise that the incident wavelength is fixed. Within the range of 400 nm-600 nm, the transmittance T and the structure depth h are in linear negative correlation. And substituting the measured transmittance value into a T-h relational expression to calculate the structural depth h of the micro-nano optical element.
The data processing software of the invention is designed by self.
Referring to fig. 1 and 4, as can be seen from the transmittance curves of fig. 4, the transmittance curves of different micro-nano optical element samples have different heights because of the difference of the depths of the micro-nano structures of the 2 samples, and under the condition of the same incident wavelength, according to the calculation formula of the diffraction peak value of 0 th order
Figure BDA0003647392630000062
It can be seen that the deeper the depth of the micro-nano structure, the lower the transmittance of the wave band. When the incident wavelength is 440nm, the transmittance T and the structure depth h are related as follows: t is 80-0.07 h.
Example 3
Referring to fig. 4 and 5, an example of calculating the structure depth of the micro-nano optical element is as follows:
from fig. 4, the transmittance of sample 1 and the transmittance of sample 2 at 420nm were 47.7% and 38.3%, respectively.
In FIG. 5, it can be seen that the depth of structure for the transmittance of 47.7% is 460nm and the depth of structure for the transmittance of 38.3% is 595 nm. That is, the depth of texture h of sample 1 was 460nm, and the depth of texture h of sample 2 was 595 nm.
The invention utilizes the actually measured transmittance curve to calculate the structural depth of the micro-nano optical element, and the structural depth is better consistent with the actual situation, so the measuring method and the measured depth data are reliable.

Claims (6)

1. The utility model provides a device to receiving the nondestructive test of optical element's depth of structure a little, includes test box (9) and case lid (10) that are used for this test box of closing cap, its characterized in that:
a light source (2), a monochromator (3), a light splitter (4), a measured micro-nano optical element (5), an integrating sphere (6), a reflector (7) and a photomultiplier (8) are arranged in the test box body (9), and a computer (11) connected with the output end of the photomultiplier (8) is arranged outside the test box body (9);
the light source (2) is arranged on one side in a test box body (9), a monochromator (3) and a light splitter (4) are arranged on the rear portion of the light source along the advancing direction of a light path, a reflector (7) is arranged in front of the upper portion of the light splitter (4), the reflector (7) is arranged under the reflector (7) in an angle of 90 degrees, a photomultiplier (8) is arranged behind the reflector (7) along the extension line of the light axis of the monochromator (3), the output end of the photomultiplier (8) is connected with a computer (11) outside the test box body (9), an integrating sphere (6) is arranged in front of the lower portion of the light splitter (4), a measured micro-nano optical element (5) is located between the light splitter (4) and the integrating sphere (6), and the photomultiplier (8) is arranged behind the emergent end of the integrating sphere (6).
2. The device for the nondestructive detection of the structural depth of the micro-nano optical element according to claim 1, wherein the light source (2) adopts a halogen lamp, and the wavelength of the halogen lamp is 360-2000 nm.
3. The method for the nondestructive detection of the structural depth of the micro-nano optical element of the device for the nondestructive detection of the structural depth of the micro-nano optical element according to claim 1 or 2 is characterized by comprising the following steps:
step one, preheating equipment: firstly, turning on a power supply of a measurement system and a computer to preheat for about 2-3 minutes;
step two, optical path inspection: turning on a light source and operating software to check whether a system light path is normal or not, and displaying the check completion by a computer; opening a cover plate of the test system, checking whether the reference light path is normal, and then closing the protective cover;
thirdly, setting a spectral range: setting a spectral range to be tested according to the use of the micro-nano element;
fourthly, equipment calibration: opening the operation software, starting transmission light collection, carrying out spectral transmittance empty test once, and enabling the transmittance test to return to zero by 100%;
fifthly, cleaning the tested piece: wiping the surface and the back of the micro-nano optical element to be detected with alcohol, and cleaning the micro-nano optical element to be detected;
sixthly, loading the tested piece: opening a test box cover plate of the measurement system, loading a micro-nano optical element to be measured, and closing the cover plate;
seventhly, measuring a transmittance curve: collecting transmitted light and determining the transmittance of a spectral range, continuously separating monochromatic light from light emitted by a light source through a monochromator, dividing the light into two beams of light through a beam splitter, wherein one beam of light is reference light, the other beam of light is measurement light, the measurement light irradiates a micro-nano optical element, the light is converted through a reflector, a high-sensitivity photomultiplier tube alternately receives the reference light and the transmitted light of the micro-nano optical element, the collected transmitted light and reference light signals are converted into electric signals, the electric signals are output to a computer, and a transmittance curve of the micro-nano optical element is obtained through software processing;
and eighthly, calculating the structural depth of the micro-nano optical element:
according to the Fraunhofer diffraction intensity distribution formula
Figure FDA0003647392620000021
In the formula: (fx) is diffraction intensity, fx is sin theta/lambda, theta is a diffraction angle, lambda is an incident wavelength, L is the total width of the structure, m is a positive integer and a negative integer of the diffraction order value, h is the structure depth, c is light transmittance, and A is the structure period;
and diffraction grating formula:
mλ＝A(sinα±sinθ)
in the formula: m is a diffraction order, the value is a positive integer and a negative integer, lambda is an incident wavelength, A is a structural period, alpha is an incident angle, and theta is a diffraction angle;
the 0-order diffraction peak intensity I is obtained 0peak The relation with the transmittance T of the micro-nano optical element is as follows:
Figure FDA0003647392620000022
in the formula: h is the structural depth, and λ is the incident wavelength;
the relation between the transmittance T and the structural depth h is as follows:
T＝80-0.07h
and (4) bringing the measured transmittance T value into a formula, and calculating to obtain the structural depth h of the micro-nano optical element.
4. A method according to claim 3, characterized in that in the third step:
the spectral range is 400 nm-850 nm.
5. A method according to claim 3, characterized in that in the fourth step:
the spectral transmittance empty test is carried out once, and the transmittance test of the sample returns to zero by 100 percent.
6. The method according to any one of claims 3-5, wherein:
the structural depth h is within the range of 400 nm-600 nm.
CN202210538503.9A 2022-05-17 2022-05-17 Device and method for carrying out nondestructive testing on structural depth of micro-nano optical element Pending CN114993997A (en)

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