CN114557136A - 用于辐射源的设备 - Google Patents

用于辐射源的设备 Download PDF

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Publication number
CN114557136A
CN114557136A CN202080072810.1A CN202080072810A CN114557136A CN 114557136 A CN114557136 A CN 114557136A CN 202080072810 A CN202080072810 A CN 202080072810A CN 114557136 A CN114557136 A CN 114557136A
Authority
CN
China
Prior art keywords
radiation source
tin
containment device
ceramic material
collar
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202080072810.1A
Other languages
English (en)
Chinese (zh)
Inventor
M·里彭
P·P·A·A·布罗姆
R·德鲁伊特
M·V·格里克-吉伦
G·梅利索尔戈斯
T·J·斯考特
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Holding NV
Original Assignee
ASML Holding NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Holding NV filed Critical ASML Holding NV
Publication of CN114557136A publication Critical patent/CN114557136A/zh
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
CN202080072810.1A 2019-10-16 2020-09-18 用于辐射源的设备 Pending CN114557136A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP19203471.8 2019-10-16
EP19203471 2019-10-16
PCT/EP2020/076092 WO2021073833A1 (en) 2019-10-16 2020-09-18 Apparatus for use in a radiation source

Publications (1)

Publication Number Publication Date
CN114557136A true CN114557136A (zh) 2022-05-27

Family

ID=68290185

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202080072810.1A Pending CN114557136A (zh) 2019-10-16 2020-09-18 用于辐射源的设备

Country Status (4)

Country Link
KR (1) KR20220078612A (ko)
CN (1) CN114557136A (ko)
TW (1) TW202130224A (ko)
WO (1) WO2021073833A1 (ko)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
US6714624B2 (en) * 2001-09-18 2004-03-30 Euv Llc Discharge source with gas curtain for protecting optics from particles
US7449703B2 (en) * 2005-02-25 2008-11-11 Cymer, Inc. Method and apparatus for EUV plasma source target delivery target material handling
JP5559562B2 (ja) * 2009-02-12 2014-07-23 ギガフォトン株式会社 極端紫外光光源装置
US8748853B2 (en) * 2011-03-24 2014-06-10 Gigaphoton Inc. Chamber apparatus
US10143074B2 (en) * 2013-08-01 2018-11-27 Gigaphoton Inc. Filter and target supply apparatus
WO2017042915A1 (ja) * 2015-09-09 2017-03-16 ギガフォトン株式会社 ターゲット収容装置
WO2019158492A1 (en) * 2018-02-13 2019-08-22 Asml Netherlands B.V. Cleaning a structure surface in an euv chamber

Also Published As

Publication number Publication date
KR20220078612A (ko) 2022-06-10
TW202130224A (zh) 2021-08-01
WO2021073833A1 (en) 2021-04-22

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