CN114437108B - 一种含n螺环有机化合物及其在有机发光器件和面板中的应用 - Google Patents
一种含n螺环有机化合物及其在有机发光器件和面板中的应用 Download PDFInfo
- Publication number
- CN114437108B CN114437108B CN202210108321.8A CN202210108321A CN114437108B CN 114437108 B CN114437108 B CN 114437108B CN 202210108321 A CN202210108321 A CN 202210108321A CN 114437108 B CN114437108 B CN 114437108B
- Authority
- CN
- China
- Prior art keywords
- triazinyl
- organic compound
- compound according
- heteroaryl
- aryl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- -1 spiro organic compound Chemical class 0.000 title claims abstract description 117
- 125000001072 heteroaryl group Chemical group 0.000 claims description 23
- 125000004529 1,2,3-triazinyl group Chemical group N1=NN=C(C=C1)* 0.000 claims description 22
- 125000003363 1,3,5-triazinyl group Chemical group N1=C(N=CN=C1)* 0.000 claims description 22
- 125000003118 aryl group Chemical group 0.000 claims description 22
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 claims description 22
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 claims description 22
- 125000002183 isoquinolinyl group Chemical group C1(=NC=CC2=CC=CC=C12)* 0.000 claims description 22
- 125000001624 naphthyl group Chemical group 0.000 claims description 22
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 22
- 125000003373 pyrazinyl group Chemical group 0.000 claims description 22
- 125000002098 pyridazinyl group Chemical group 0.000 claims description 22
- 125000004076 pyridyl group Chemical group 0.000 claims description 22
- 125000000714 pyrimidinyl group Chemical group 0.000 claims description 22
- 125000001567 quinoxalinyl group Chemical group N1=C(C=NC2=CC=CC=C12)* 0.000 claims description 22
- 125000002294 quinazolinyl group Chemical group N1=C(N=CC2=CC=CC=C12)* 0.000 claims description 16
- 125000001424 substituent group Chemical group 0.000 claims description 13
- 125000004988 dibenzothienyl group Chemical group C1(=CC=CC=2SC3=C(C21)C=CC=C3)* 0.000 claims description 12
- 125000005509 dibenzothiophenyl group Chemical group 0.000 claims description 10
- 239000010409 thin film Substances 0.000 claims description 10
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 claims description 8
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 6
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 claims description 6
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 6
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 6
- JWVCLYRUEFBMGU-UHFFFAOYSA-N quinazoline Chemical compound N1=CN=CC2=CC=CC=C21 JWVCLYRUEFBMGU-UHFFFAOYSA-N 0.000 claims description 5
- 125000004191 (C1-C6) alkoxy group Chemical group 0.000 claims description 4
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 4
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 claims description 4
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 4
- 229910052736 halogen Inorganic materials 0.000 claims description 4
- 150000002367 halogens Chemical class 0.000 claims description 4
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 4
- 125000005561 phenanthryl group Chemical group 0.000 claims description 4
- 125000001725 pyrenyl group Chemical group 0.000 claims description 4
- 125000003107 substituted aryl group Chemical group 0.000 claims description 4
- 150000002894 organic compounds Chemical class 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 229910052717 sulfur Inorganic materials 0.000 claims description 3
- 125000002950 monocyclic group Chemical group 0.000 claims 2
- 125000005264 aryl amine group Chemical group 0.000 claims 1
- 150000003246 quinazolines Chemical class 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 40
- 239000010410 layer Substances 0.000 description 55
- 150000001875 compounds Chemical class 0.000 description 35
- 239000000376 reactant Substances 0.000 description 33
- 238000012360 testing method Methods 0.000 description 20
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 18
- 230000015572 biosynthetic process Effects 0.000 description 15
- 238000003786 synthesis reaction Methods 0.000 description 15
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 14
- 238000000921 elemental analysis Methods 0.000 description 14
- 238000001840 matrix-assisted laser desorption--ionisation time-of-flight mass spectrometry Methods 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 230000005525 hole transport Effects 0.000 description 11
- 238000002347 injection Methods 0.000 description 11
- 239000007924 injection Substances 0.000 description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 9
- 238000001704 evaporation Methods 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 238000001914 filtration Methods 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 7
- 238000005406 washing Methods 0.000 description 7
- 238000001816 cooling Methods 0.000 description 6
- 239000011259 mixed solution Substances 0.000 description 6
- 238000010992 reflux Methods 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 239000012065 filter cake Substances 0.000 description 5
- 239000012074 organic phase Substances 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- DKHNGUNXLDCATP-UHFFFAOYSA-N dipyrazino[2,3-f:2',3'-h]quinoxaline-2,3,6,7,10,11-hexacarbonitrile Chemical compound C12=NC(C#N)=C(C#N)N=C2C2=NC(C#N)=C(C#N)N=C2C2=C1N=C(C#N)C(C#N)=N2 DKHNGUNXLDCATP-UHFFFAOYSA-N 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000007935 neutral effect Effects 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- 239000000741 silica gel Substances 0.000 description 4
- 229910002027 silica gel Inorganic materials 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- ZOKIJILZFXPFTO-UHFFFAOYSA-N 4-methyl-n-[4-[1-[4-(4-methyl-n-(4-methylphenyl)anilino)phenyl]cyclohexyl]phenyl]-n-(4-methylphenyl)aniline Chemical compound C1=CC(C)=CC=C1N(C=1C=CC(=CC=1)C1(CCCCC1)C=1C=CC(=CC=1)N(C=1C=CC(C)=CC=1)C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 ZOKIJILZFXPFTO-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- CUJRVFIICFDLGR-UHFFFAOYSA-N acetylacetonate Chemical compound CC(=O)[CH-]C(C)=O CUJRVFIICFDLGR-UHFFFAOYSA-N 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000004440 column chromatography Methods 0.000 description 3
- 239000012043 crude product Substances 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 125000003003 spiro group Chemical group 0.000 description 3
- QENGPZGAWFQWCZ-UHFFFAOYSA-N 3-Methylthiophene Chemical compound CC=1C=CSC=1 QENGPZGAWFQWCZ-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000010405 anode material Substances 0.000 description 2
- 239000008346 aqueous phase Substances 0.000 description 2
- 239000010406 cathode material Substances 0.000 description 2
- 230000003111 delayed effect Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- SJCKRGFTWFGHGZ-UHFFFAOYSA-N magnesium silver Chemical compound [Mg].[Ag] SJCKRGFTWFGHGZ-UHFFFAOYSA-N 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- 238000006862 quantum yield reaction Methods 0.000 description 2
- 238000010791 quenching Methods 0.000 description 2
- 230000000171 quenching effect Effects 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 229910016036 BaF 2 Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000007385 chemical modification Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004770 highest occupied molecular orbital Methods 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 238000004768 lowest unoccupied molecular orbital Methods 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D513/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00
- C07D513/22—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00 in which the condensed system contains four or more hetero rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D498/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and oxygen atoms as the only ring hetero atoms
- C07D498/22—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and oxygen atoms as the only ring hetero atoms in which the condensed system contains four or more hetero rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D498/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and oxygen atoms as the only ring hetero atoms
- C07D498/12—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and oxygen atoms as the only ring hetero atoms in which the condensed system contains three hetero rings
- C07D498/20—Spiro-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D513/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00
- C07D513/12—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00 in which the condensed system contains three hetero rings
- C07D513/20—Spiro-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/06—Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/631—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine
- H10K85/636—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine comprising heteroaromatic hydrocarbons as substituents on the nitrogen atom
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/654—Aromatic compounds comprising a hetero atom comprising only nitrogen as heteroatom
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
- H10K85/6572—Polycyclic condensed heteroaromatic hydrocarbons comprising only nitrogen in the heteroaromatic polycondensed ring system, e.g. phenanthroline or carbazole
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
- H10K85/6574—Polycyclic condensed heteroaromatic hydrocarbons comprising only oxygen in the heteroaromatic polycondensed ring system, e.g. cumarine dyes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/10—Non-macromolecular compounds
- C09K2211/1003—Carbocyclic compounds
- C09K2211/1011—Condensed systems
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/10—Non-macromolecular compounds
- C09K2211/1018—Heterocyclic compounds
- C09K2211/1025—Heterocyclic compounds characterised by ligands
- C09K2211/1029—Heterocyclic compounds characterised by ligands containing one nitrogen atom as the heteroatom
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/10—Non-macromolecular compounds
- C09K2211/1018—Heterocyclic compounds
- C09K2211/1025—Heterocyclic compounds characterised by ligands
- C09K2211/1044—Heterocyclic compounds characterised by ligands containing two nitrogen atoms as heteroatoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/10—Non-macromolecular compounds
- C09K2211/1018—Heterocyclic compounds
- C09K2211/1025—Heterocyclic compounds characterised by ligands
- C09K2211/1059—Heterocyclic compounds characterised by ligands containing three nitrogen atoms as heteroatoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/10—Non-macromolecular compounds
- C09K2211/1018—Heterocyclic compounds
- C09K2211/1025—Heterocyclic compounds characterised by ligands
- C09K2211/1059—Heterocyclic compounds characterised by ligands containing three nitrogen atoms as heteroatoms
- C09K2211/1062—Heterocyclic compounds characterised by ligands containing three nitrogen atoms as heteroatoms with oxygen
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/10—Non-macromolecular compounds
- C09K2211/1018—Heterocyclic compounds
- C09K2211/1025—Heterocyclic compounds characterised by ligands
- C09K2211/1059—Heterocyclic compounds characterised by ligands containing three nitrogen atoms as heteroatoms
- C09K2211/1066—Heterocyclic compounds characterised by ligands containing three nitrogen atoms as heteroatoms with sulfur
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/10—Non-macromolecular compounds
- C09K2211/1018—Heterocyclic compounds
- C09K2211/1025—Heterocyclic compounds characterised by ligands
- C09K2211/1088—Heterocyclic compounds characterised by ligands containing oxygen as the only heteroatom
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2101/00—Properties of the organic materials covered by group H10K85/00
- H10K2101/10—Triplet emission
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2101/00—Properties of the organic materials covered by group H10K85/00
- H10K2101/20—Delayed fluorescence emission
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/14—Carrier transporting layers
- H10K50/15—Hole transporting layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/14—Carrier transporting layers
- H10K50/16—Electron transporting layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/81—Anodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/82—Cathodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
- H10K85/6576—Polycyclic condensed heteroaromatic hydrocarbons comprising only sulfur in the heteroaromatic polycondensed ring system, e.g. benzothiophene
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
本发明提供了一种含N螺环有机化合物,具有式Ⅰ或式Ⅱ所示结构。本发明开发了一系列新的、性能优良的TADF材料,用于量产品使用,可以明显提升OLED器件效率、寿命,降低驱动电压。
Description
技术领域
本发明涉及有机电致发光材料技术领域,尤其涉及一种含N螺环有机化合物及其在有机发光器件和面板中的应用。
背景技术
根据发光机制,可用于OLED发光层材料主要有以下4种:
荧光材料、磷光材料、三线态-三线态湮灭(TTA)材料和热活化延迟荧光(TADF)材料。
其中,荧光材料及TTA材料理论最大内量子产率低,磷光材料成本高,与之相比,TADF材料优势明显,其理论最大内量子产率可达100%,且主要为有机化合物,不需要稀有金属元素,生产成本低,可通过多种方法进行化学修饰,结构多样,但目前已发现的TADF材料较少,需要开发理论最大内量子产率高的低成本TADF材料,来进一步提升OLED显示器件的综合性能。
发明内容
有鉴于此,本发明要解决的技术问题在于提供一种含N螺环有机化合物及其在有机发光器件和面板中的应用,制备的含N螺环有机化合物可以明显提升OLED器件的效率、寿命,降低驱动电压。
本发明提供了一种含N螺环有机化合物,具有式Ⅰ或式Ⅱ所示结构:
其中,X、Y独立的选自O或者S;
R1选自取代或非取代的芳基或杂芳基;
R2~R3独立的选自H、取代或非取代的芳基或杂芳基,且R2、R3不同时为H。
本发明提供了一种有机发光器件,所述有机发光器件包括阳极、阴极,以及位于所述阳极和阴极之间的有机薄膜层,所述有机薄膜层包括发光层,所述发光层中含有至少一种上述含N螺环有机化合物。
本发明提供了一种显示面板,包括上述有机发光器件。
与现有技术相比,本发明提供了一种含N螺环有机化合物,具有式Ⅰ或式Ⅱ所示结构。本发明开发了一系列新的、性能优良的TADF材料,用于量产品使用,可以明显提升OLED器件效率、寿命,降低驱动电压。
附图说明
图1为本发明制备的有机发光器件结构示意图。
具体实施方式
本发明提供了一种含N螺环有机化合物,具有式Ⅰ或式Ⅱ所示结构:
其中,X、Y独立的选自O或者S;
R1选自取代或非取代的芳基或杂芳基;
R2~R3独立的选自H、取代或非取代的芳基或杂芳基,且R2、R3不同时为H。
可选的,所述取代的芳基或杂芳基的取代基选自卤素,氰基,C1~C6的烷基,C1~C6的烷氧基,取代或非取代的芳基、杂芳基、芳胺基中的一种或多种。
进一步可选的,所述取代的芳基或杂芳基的取代基选自F,Cl,Br,氰基,甲基,乙基,正丙基,异丙基,正丁基,异丁基,叔丁基,甲氧基,乙氧基,正丙氧基,或者取代或非取代的苯基、萘基、吡啶基、吡嗪基、嘧啶基、哒嗪基、1,2,3-三嗪基,1,3,5-三嗪基、1,3,4-三嗪基、咔唑基、芴基、二苯并呋喃基、二苯并噻吩基、苯胺基、N,N-二苯基氨基、喹啉基、异喹啉基、喹喔啉基、喹唑啉基中的一种或多种。
可选的,所述取代的苯基、萘基、吡啶基、吡嗪基、嘧啶基、哒嗪基、1,2,3-三嗪基,1,3,5-三嗪基、1,3,4-三嗪基、咔唑基、芴基、二苯并呋喃基、二苯并噻吩基、苯胺基、N,N-二苯基氨基、喹啉基、异喹啉基、喹喔啉基、喹唑啉基的取代基选自苯基、萘基、吡啶基、吡嗪基、嘧啶基、哒嗪基、1,2,3-三嗪基,1,3,5-三嗪基、1,3,4-三嗪基、咔唑基、芴基、二苯并呋喃基、二苯并噻吩基、苯胺基、N,N-二苯基氨基、喹啉基、异喹啉基、喹喔啉基、喹唑啉中的一种或多种。
可选的,所述R1选自取代或非取代的单环芳基、单环杂芳基、稠环芳基、稠环杂芳基,或者由取代或非取代的单环芳基、单环杂芳基、稠环芳基、稠环杂芳基中的任意一种或多种通过单键或N原子连接形成的基团。
可选的,所述单环芳基为苯基;
所述单环杂芳基选自吡啶基、吡嗪基、嘧啶基、哒嗪基、1,2,3-三嗪基,1,3,5-三嗪基或1,3,4-三嗪基;
所述稠环芳基选自萘基、蒽基、菲基、芘基或芴基;
所述稠环杂芳基选自咔唑基、二苯并呋喃基、二苯并噻吩基、喹啉基、异喹啉基、喹喔啉基或喹唑啉基。
可选的,所述多种为2种、3种或4种。
可选的,所述R1选自含有第一取代基的或非取代的苯基、萘基、吡啶基、吡嗪基、嘧啶基、哒嗪基、1,2,3-三嗪基,1,3,5-三嗪基、1,3,4-三嗪基、咔唑基、芴基、二苯并呋喃基、二苯并噻吩基、喹啉基、异喹啉基、喹喔啉基或喹唑啉基;
所述第一取代基选自F,Cl,Br,氰基,甲基,乙基,正丙基,异丙基,正丁基,异丁基,叔丁基,甲氧基,乙氧基,正丙氧基,或者含有第二取代基的或非取代的苯基、萘基、吡啶基、吡嗪基、嘧啶基、哒嗪基、1,2,3-三嗪基,1,3,5-三嗪基、1,3,4-三嗪基、咔唑基、芴基、二苯并呋喃基、二苯并噻吩基、苯胺基、N,N-二苯基氨基、喹啉基、异喹啉基、喹喔啉基、喹唑啉基中的一种或多种;
所述第二取代基选自苯基、萘基、吡啶基、吡嗪基、嘧啶基、哒嗪基、1,2,3-三嗪基,1,3,5-三嗪基、1,3,4-三嗪基、咔唑基、芴基、二苯并呋喃基、二苯并噻吩基、苯胺基、N,N-二苯基氨基、喹啉基、异喹啉基、喹喔啉基、喹唑啉中的一种或多种。
可选的,所述R1选自以下任一结构:
#表示连接位置。
可选的,所述R2~R3独立的选自H、取代或非取代的单环芳基、单环杂芳基、稠环芳基、稠环杂芳基,或者由取代或非取代的单环芳基、单环杂芳基、稠环芳基、稠环杂芳基中的任意一种或多种通过单键或N原子连接形成的基团,且R2、R3不同时为H。
可选的,所述单环芳基为苯基;
所述单环杂芳基选自吡啶基、吡嗪基、嘧啶基、哒嗪基、1,2,3-三嗪基,1,3,5-三嗪基或1,3,4-三嗪基;
所述稠环芳基选自萘基、蒽基、菲基、芘基或芴基;
所述稠环杂芳基选自咔唑基、二苯并呋喃基、二苯并噻吩基、喹啉基、异喹啉基、喹喔啉基或喹唑啉基。
可选的,所述多种为2种、3种或4种。
可选的,所述R2、R3独立的选自H、含有第一取代基的或非取代的苯基、萘基、吡啶基、吡嗪基、嘧啶基、哒嗪基、1,2,3-三嗪基,1,3,5-三嗪基、1,3,4-三嗪基、咔唑基、芴基、二苯并呋喃基、二苯并噻吩基、喹啉基、异喹啉基、喹喔啉基或喹唑啉基;
所述第一取代基选自F,Cl,Br,氰基,甲基,乙基,正丙基,异丙基,正丁基,异丁基,叔丁基,甲氧基,乙氧基,正丙氧基,或者含有第二取代基的或非取代的苯基、萘基、吡啶基、吡嗪基、嘧啶基、哒嗪基、1,2,3-三嗪基,1,3,5-三嗪基、1,3,4-三嗪基、咔唑基、芴基、二苯并呋喃基、二苯并噻吩基、苯胺基、N,N-二苯基氨基、喹啉基、异喹啉基、喹喔啉基、喹唑啉基中的一种或多种;
所述第二取代基选自卤素、氰基、C1~C6的烷基、C1~C6的烷氧基、苯基、萘基、吡啶基、吡嗪基、嘧啶基、哒嗪基、1,2,3-三嗪基,1,3,5-三嗪基、1,3,4-三嗪基、咔唑基、芴基、二苯并呋喃基、二苯并噻吩基、苯胺基、N,N-二苯基氨基、喹啉基、异喹啉基、喹喔啉基、喹唑啉中的一种或多种;
且R2、R3不同时为H。
可选的,所述R2、R3中的任意一个或两个选自以下任一结构:
#表示连接位置。
可选的,所述R3为H。
可选的,所述含N螺环有机化合物具有以下任一结构:
可选的,所述含N螺环有机化合物具有以下任一结构:
本发明提供了上述含N螺环有机化合物的制备方法,式Ⅰ所示化合物按照以下路线合成:
式Ⅱ所示化合物按照以下路线合成:
制备得到中间体A或中间体B后,再进行相应的取代反应即可制备得到式Ⅰ或式Ⅱ所示含N螺环有机化合物。
本发明提供的上述含N螺环有机化合物具有热活化延迟荧光(TADF)性质,可应用于发光层材料。
本发明提供了一种有机发光器件,所述有机发光器件包括阳极、阴极,以及位于所述阳极和阴极之间的有机薄膜层,所述有机薄膜层包括发光层,所述发光层中含有至少一种上述含N螺环有机化合物。
可选的,所述有机发光器件包括阳极、阴极,以及位于所述阳极和阴极之间的有机薄膜层,所述有机薄膜层包括磷光发光层,所述磷光发光层中含有至少一种上述含N螺环有机化合物。
本发明提供了一种显示面板,包括上述有机发光器件。
本发明提供的有机发光器件可以为本领域技术人员熟知的有机发光器件,本发明可选的,所述有机发光器件包括基板、ITO阳极、第一空穴传输层、第二空穴传输层、电子阻挡层、发光层、第一电子传输层、第二电子传输层、阴极(镁银电极,镁银质量比为1:9)和盖帽层(CPL)。
本发明可选的,所述有机发光器件的阳极材料可选自金属-铜、金、银、铁、铬、镍、锰、钯、铂等及它们的合金;如金属氧化物-氧化铟、氧化锌、氧化铟锡(ITO)、氧化铟锌(IZO)等;如导电性聚合物-聚苯胺、聚吡咯、聚(3-甲基噻吩)等,除以上有助于空穴注入材料及其组合,还包括已知的适合做阳极的材料。
本发明可选的,所述有机发光器件的阴极材料可选自金属-铝、镁、银、铟、锡、钛等及它们的合金;如多层金属材料-LiF/Al、LiO2/Al、BaF2/Al等;除以上有助于电子注入的材料及其组合,还包括已知的适合做阴极的材料。
本发明可选的,所述有机光电装置,如有机发光器件中的有机薄膜层至少有一层发光层(EML),还可以包含其他功能层,包括空穴注入层(HIL)、空穴传输层(HTL)、电子阻挡层(EBL)、空穴阻挡层(HBL)、电子传输层(ETL)、电子注入层(EIL)。
本发明可选的,所述有机发光器件按照以下方法制备:
在透明或不透明的光滑的基板上形成阳极,在阳极上形成有机薄层,在有机薄层上形成阴极。
本发明可选的,形成有机薄层可采用如蒸镀、溅射、旋涂、浸渍、离子镀等已知的成膜方法。
本发明提供了一种显示装置,包括上述显示面板。
在本发明中,有机发光器件(OLED器件)可以用在显示装置中,其中有机发光显示装置可以是手机显示屏、电脑显示屏、电视显示屏、智能手表显示屏、智能汽车显示面板、VR或AR头盔显示屏、各种智能设备的显示屏等。
下面将结合本发明实施例的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。
中间体A的制备:
1)中间体A-2的合成:在250mL三口烧瓶中加入10mmol中间体A-1,12mmol反应物a,10mmol碳酸钾,160mL DMSO,升温到120℃下搅拌反应10小时,降至室温,加入到3倍体积水中搅拌析出固体,过滤,滤饼水洗至中性加入二氯甲烷完全溶解,水洗至中性,用无水Na2SO4进行干燥后浓缩,过硅胶柱得到中间体A-2,收率86%;
2)中间体A-3的合成:在250mL三口烧瓶中加入20mmol中间体A-2,140mL四氢呋喃(THF),35mL水,然后加入0.1mol氢氧化钾,常温搅拌反应8小时,待原料反应完全,加入盐酸调节PH至酸性,静置分层,分出有机相,水洗至中性,水相用二氯甲烷萃取一下,合并有机相,干燥后悬干溶剂所得固体加入到100mL二氯亚砜中,回流反应3小时,蒸除溶剂,加入140mL四氢呋喃,充氮气,加入0.12mol AlCl3,0.1mol碳酸钾,0.06mol三乙胺,升温至80℃搅拌反应8小时,将反应液倒入冰水中。静置分液,有机相水洗至中性,水相用二氯甲烷萃取,合并有机相,再用无水Na2SO4干燥后过柱的到中间体A-3,收率58%;
3)中间体A的合成:在250mL三口烧瓶中充入氮气,加入0.07mol Mg,一粒碘,少量THF,滴加少量反应物b的THF溶液,待引发反应后继续缓慢滴加含反应物b 0.05mol的THF溶液120mL,回流反应至Mg屑消失后,降温,加入0.03mol中间体A-3,回流反应8小时后降至室温,加入2N盐酸溶液淬灭反应,减压蒸馏去除溶剂。所得固体中加入120mL醋酸,加热回流反应2小时,降至室温,加入到等体积水中析出固体,过滤。滤饼水洗至中性干燥后溶于120mLTHF溶液中,缓慢加入等体积的甲醇,搅拌析出产品中间体A,收率70%。
中间体B的制备
中间体B的合成方法与中间体A的合成方法相似,区别在于将步骤1)中的反应物a替换为等摩尔量的反应物aa。
实施例1
在250mL圆底烧瓶中,将10mmol反应物H5-1、12mmol反应物c-H5和80mmol Na2CO3分别加入到甲苯/EtOH(无水乙醇)/H2O(75/25/50,mL)溶剂中,形成混合溶液,然后将0.48mmol催化剂Pd(PPh3)4加入到上述混合溶液中,在氮气气氛下进行回流反应20小时得到的中间体,冷却到室温,加入水中,然后通过硅藻土垫过滤,同时用二氯甲烷萃取,然后用水洗涤,并采用无水MgSO4干燥,过滤和蒸发后,用硅胶柱层析纯化粗产物得到产物H5。
MALDI-TOF:m/z:计算值:C61H36N6OS:900.27,实测值:900.45。
化合物元素分析结果:计算值:C61H36N6OS(%):C,81.31;H,4.03;N,9.33;O,1.78;S,3.56;测试值:C,81.29;H,4.04;N,9.34;O,1.78;S,3.55。
实施例2
在250mL圆底烧瓶中,将10mmol反应物H48-1、12mmol反应物c-H48和80mmolNa2CO3分别加入到甲苯/EtOH(无水乙醇)/H2O(75/25/50,mL)溶剂中,形成混合溶液,然后将0.48mmol催化剂Pd(PPh3)4加入到上述混合溶液中,在氮气气氛下进行回流反应20小时得到的中间体冷却到室温,加入水中,然后通过硅藻土垫过滤,同时用二氯甲烷萃取,然后用水洗涤,并采用无水MgSO4干燥,过滤和蒸发后,用硅胶柱层析纯化粗产物得到产物H48。
MALDI-TOF:m/z:计算值:C62H37N7OS:927.28,实测值:927.45。
化合物元素分析结果:计算值:C62H37N7OS(%):C,80.24;H,4.02;N,10.56;O,1.72;S,3.46;测试值:C,80.25;H,4.01;N,10.57;O,1.72;S,3.45。
实施例3
在250mL圆底烧瓶中,将10mmol反应物H68-1、12mmol反应物c-H68和80mmol Na2CO3分别加入到甲苯/EtOH(无水乙醇)/H2O(75/25/50,mL)溶剂中,形成混合溶液,然后将0.48mmol催化剂Pd(PPh3)4加入到上述混合溶液中,在氮气气氛下进行回流反应20小时得到的中间体冷却到室温,加入水中,然后通过硅藻土垫过滤,同时用二氯甲烷萃取,然后用水洗涤,并采用无水MgSO4干燥,过滤和蒸发后,用硅胶柱层析纯化粗产物得到产物H68。
MALDI-TOF:m/z:计算值:C62H40N6OS:916.30,实测值:916.42。
化合物元素分析结果:计算值:C62H40N6OS(%):C,81.20;H,4.40;N,9.16;O,1.74;S,3.50;测试值:C,81.22;H,4.39;N,9.15;O,1.74;S,3.51。
实施例4
化合物H74的合成方法与H5的合成方法相似,区别在于,将反应物c-H5和H5-1分别替换为等摩尔量的反应物c-H74和H74-1。
MALDI-TOF:m/z:计算值:C49H29N5O2:719.23,实测值:719.38。
化合物元素分析结果:计算值:C49H29N5O2(%):C,81.76;H,4.06;N,9.73;O,4.45;测试值:C,81.74;H,4.07;N,9.74;O,4.44。
实施例5
化合物H87的合成方法与H5的合成方法相似,区别在于,将反应物c-H5和H5-1分别替换为等摩尔量的反应物c-H87和H87-1。
MALDI-TOF:m/z:计算值:C50H30N6OS:762.22,实测值:762.43。
化合物元素分析结果:计算值:C50H30N6OS(%):C,78.72;H,3.96;N,11.02;O,2.10;S,4.20;测试值:C,78.74;H,3.95;N,11.03;O,2.10;S,4.19。
实施例6
化合物H110的合成方法与H5的合成方法相似,区别在于,将反应物c-H5和H5-1分别替换为等摩尔量的反应物c-H110和H110-1。
MALDI-TOF:m/z:计算值:C64H42N6OS:942.31,实测值:942.54。
化合物元素分析结果:计算值:C64H42N6OS(%):C,81.50;H,4.49;N,8.91;O,1.70;S,3.40;测试值:C,81.51;H,4.48;N,8.92;O,1.70;S,3.39。
实施例7
化合物H126的合成方法与H5的合成方法相似,区别在于,将反应物c-H5和H5-1分别替换为等摩尔量的反应物c-H126和H126-1。
MALDI-TOF:m/z:计算值:C62H38N6O2:898.31,实测值:898.45。
化合物元素分析结果:计算值:C62H38N6O2(%):C,82.83;H,4.26;N,9.35;O,3.56;测试值:C,82.81;H,4.27;N,9.36;O,3.55。
实施例8
化合物H132的合成方法与H5的合成方法相似,区别在于,将反应物c-H5和H5-1分别替换为等摩尔量的反应物c-H132和H132-1。
MALDI-TOF:m/z:计算值:C54H32N6OS:812.24,实测值:812.42。
化合物元素分析结果:计算值:C54H32N6OS(%):C,79.78;H,3.97;N,10.34;O,1.97;S,3.94;测试值:C,79.76;H,3.98;N,10.35;O,1.97;S,3.93。
实施例9
化合物L01的合成方法与H5的合成方法相似,区别在于,将反应物c-H5和H5-1分别替换为等摩尔量的反应物c-L01和L01-1。
MALDI-TOF:m/z:计算值:C49H29N5O:703.24,实测值:703.29。
化合物元素分析结果:计算值:C49H29N5O(%):C,83.62;H,4.15;N,9.95;O,2.27;测试值:C,83.64;H,4.14;N,9.96;O,2.26。
实施例10
化合物L02的合成方法与H5的合成方法相似,区别在于,将反应物c-H5和H5-1分别替换为等摩尔量的反应物c-L02和L02-1。
MALDI-TOF:m/z:计算值:C56H34N6S:822.26,实测值:822.32。
化合物元素分析结果:计算值:C56H34N6S(%):C,81.73;H,4.16;N,10.21;S,3.90;测试值:C,81.71;H,4.17;N,10.21;S,3.91。
实施例11
化合物L03的合成方法与H5的合成方法相似,区别在于,将反应物c-H5和H5-1分别替换为等摩尔量的反应物c-L03和L03-1。
MALDI-TOF:m/z:计算值:C56H34N6O:806.28,实测值:806.36。
化合物元素分析结果:计算值:C56H34N6O(%):C,83.36;H,4.25;N,10.42;O,1.98;测试值:C,83.34;H,4.26;N,10.41;O,1.99。
实施例12
化合物L44的合成方法与H5的合成方法相似,区别在于,将反应物c-H5和H5-1分别替换为等摩尔量的反应物c-L44和L44-1。
MALDI-TOF:m/z:计算值:C67H39N7O:957.32,实测值:957.40。
化合物元素分析结果:计算值:C67H39N7O(%):C,83.99;H,4.10;N,10.23;O,1.67;测试值:C,83.98;H,4.11;N,10.22;O,1.68。
实施例13
化合物L55的合成方法与H5的合成方法相似,区别在于,将反应物c-H5和H5-1分别替换为等摩尔量的反应物c-L55和L55-1。
MALDI-TOF:m/z:计算值:C53H31N7O:781.26,实测值:781.35。
化合物元素分析结果:计算值:C53H31N7O(%):C,81.42;H,4.00;N,12.54;O,2.05;测试值:C,81.41;H,4.01;N,12.54;O,2.04。
实施例14
化合物L72的合成方法与H5的合成方法相似,区别在于,将反应物c-H5和H5-1分别替换为等摩尔量的反应物c-L72和L72-1。
MALDI-TOF:m/z:计算值:C55H31N5OS:809.22,实测值:809.41。
化合物元素分析结果:计算值:C55H31N5OS(%):C,81.56;H,3.86;N,8.65;O,1.98;S,3.96;测试值:C,81.55;H,3.87;N,8.64;O,1.98;S,3.96。
器件实施例1
本实施例提供一种有机发光器件,器件结构为:
ITO(10nm)/HAT-CN(10nm)/NPB(40nm)/TAPC(10nm)/化合物H5:Ir(MDQ)2(acac)(20nm)/TPBi(30nm)/LiF(2nm)/Al(100nm)。
在上述器件结构中,ITO作为阳极材料;HAT-CN用作空穴注入层材料,NPB和TAPC分别用作第一、第二空穴传输层材料;发光层由客体材料(Ir(MDQ)2(acac))以一定比例掺杂到主体材料(化合物H5)中;TPBi作为电子传输层材料;LiF作为电子注入层材料;Al作为阴极材料。
具体制备步骤如下:
1)将玻璃基板1切成50mm×50mm×0.7mm的大小,分别在丙酮、异丙醇和去离子水中超声清洁30分钟,然后将其在UV臭氧下清洁30分钟来进行清洁。将通过磁控溅射所得的厚度为10nm的氧化铟锡(ITO)阳极2的玻璃基板安装到真空沉积设备上;
2)在ITO阳极层2上,通过真空蒸镀方式蒸镀空穴注入层材料HAT-CN作为空穴注入层3,厚度为10nm;
3)在空穴注入层3上真空蒸镀空穴传输层材料NPB作为第一空穴传输层4,厚度为40nm;
4)在第一空穴传输层4上真空蒸镀空穴传输型材料TAPC作为第二空穴传输层5,厚度为10nm;
5)第二空穴传输层5上真空蒸镀一层发光层6,厚度为20nm;其中,本发明的化合物H5作为主体材料,Ir(MDQ)2(acac)作为掺杂材料(客体材料),掺杂比例为3%(质量比);
6)在发光层6上真空蒸镀电子传输型材料TPBi作为电子传输层7,厚度为30nm;
7)电子传输层7上真空蒸镀电子传输材料LiF作为电子注入层8,厚度为2nm;
8)电子传输层8上真空蒸镀铝(Al)电极作为阴极9,厚度为100nm。OLED器件的制备过程中使用的化合物的结构如下:
器件实施例2~14
将器件实施例1中步骤(5)中的有机化合物H5分别替换为等量的化合物H48、H68、H74、H87、H110、H126、H132、L01、L02、L03、L44、L55或L72,其他制备步骤同应用例1。
器件对比例
与器件实施例1的区别仅在于,将步骤(4)中的主体材料用等量的对比化合物CBP替换;其它原料及制备步骤均相同。
OLED器件的性能评价:
用Keithley 2365A数字纳伏表测试OLED器件在不同电压下的电流,然后用电流除以发光面积得到OLED器件在不同电压下的电流密度;用Konicaminolta CS-2000分光辐射亮度计测试OLED器件在不同电压下的亮度和辐射能流密度;根据OLED器件在不同电压下的电流密度和亮度,得到在相同电流密度下(10mA/cm2)的启亮电压和电流效率(CE,Cd/A),VON为亮度1Cd/m2下的启亮电压;通过测量OLED器件的亮度达到初始亮度的95%时的时间而获得寿命LT95(在50mA/cm2测试条件下);以器件对比例(REF)的启亮电压Von、电流效率CE和寿命LT95的测试数据为100%计,器件实施例1-14的Von、CE和LT95分别为各自的测试数据与器件对比例的测试数据的比值,即为与器件对比例相比的相对值;具体数据如表1所示。
表1 OLED器件性能检测结果
由表1可知,与常规主体材料CBP相比,基于本发明主体材料制备的有机发光器件在驱动电压、发光效率和寿命方面表现出出色的特性。特别地,在效率方面显示出了较好的性能,并且本发明主体材料具有明显的TADF特性。这主要得益于本发明材料特殊的稠环及螺环骨架,使分子的HOMO能级和LUMO能级重叠较小,螺环结构还可以使化合物获得较高的热稳定性和玻璃化转变温度Tg。同时含螺环结构的化合物还具有合适的空间扭曲性,可以降低分子作用力,减小分子间堆叠,从而有利于降低浓度猝灭。具有同时传输空穴和电子的双极性特征,这样的化合物有利于发光层中的电荷传输平衡,可拓宽激子复合区域,提高器件效率。
以上实施例的说明只是用于帮助理解本发明的方法及其核心思想。应当指出,对于本技术领域的普通技术人员来说,在不脱离本发明原理的前提下,还可以对本发明进行若干改进和修饰,这些改进和修饰也落入本发明权利要求的保护范围内。
Claims (20)
2.根据权利要求1所述的含N螺环有机化合物,其特征在于,所述取代的芳基或杂芳基的取代基选自卤素,氰基,C1~C6的烷基,C1~C6的烷氧基,取代或非取代的芳基、杂芳基、芳胺基中的一种或多种。
3.根据权利要求2所述的含N螺环有机化合物,其特征在于,所述取代的芳基或杂芳基的取代基选自F,Cl,Br,氰基,甲基,乙基,正丙基,异丙基,正丁基,异丁基,叔丁基,甲氧基,乙氧基,正丙氧基,或者取代或非取代的苯基、萘基、吡啶基、吡嗪基、嘧啶基、哒嗪基、1,2,3-三嗪基,1,3,5-三嗪基、1,3,4-三嗪基、咔唑基、芴基、二苯并呋喃基、二苯并噻吩基、苯胺基、N,N-二苯基氨基、喹啉基、异喹啉基、喹喔啉基、喹唑啉基中的一种或多种。
4.根据权利要求3所述的含N螺环有机化合物,其特征在于,所述取代的苯基、萘基、吡啶基、吡嗪基、嘧啶基、哒嗪基、1,2,3-三嗪基,1,3,5-三嗪基、1,3,4-三嗪基、咔唑基、芴基、二苯并呋喃基、二苯并噻吩基、苯胺基、N,N-二苯基氨基、喹啉基、异喹啉基、喹喔啉基、喹唑啉基的取代基选自苯基、萘基、吡啶基、吡嗪基、嘧啶基、哒嗪基、1,2,3-三嗪基,1,3,5-三嗪基、1,3,4-三嗪基、咔唑基、芴基、二苯并呋喃基、二苯并噻吩基、苯胺基、N,N-二苯基氨基、喹啉基、异喹啉基、喹喔啉基、喹唑啉中的一种或多种。
5.根据权利要求1所述的含N螺环有机化合物,其特征在于,所述R1选自取代或非取代的单环芳基、单环杂芳基、稠环芳基、稠环杂芳基,或者由取代或非取代的单环芳基、单环杂芳基、稠环芳基、稠环杂芳基中的任意一种或多种通过单键或N原子连接形成的基团。
6.根据权利要求5所述的含N螺环有机化合物,其特征在于,所述单环芳基为苯基;
所述单环杂芳基选自吡啶基、吡嗪基、嘧啶基、哒嗪基、1,2,3-三嗪基,1,3,5-三嗪基或1,3,4-三嗪基;
所述稠环芳基选自萘基、蒽基、菲基、芘基或芴基;
所述稠环杂芳基选自咔唑基、二苯并呋喃基、二苯并噻吩基、喹啉基、异喹啉基、喹喔啉基或喹唑啉基。
7.根据权利要求5所述的含N螺环有机化合物,其特征在于,所述多种为2种、3种或4种。
8.根据权利要求1所述的含N螺环有机化合物,其特征在于,所述R1选自含有第一取代基的或非取代的苯基、萘基、吡啶基、吡嗪基、嘧啶基、哒嗪基、1,2,3-三嗪基,1,3,5-三嗪基、1,3,4-三嗪基、咔唑基、芴基、二苯并呋喃基、二苯并噻吩基、喹啉基、异喹啉基、喹喔啉基或喹唑啉基;
所述第一取代基选自F,Cl,Br,氰基,甲基,乙基,正丙基,异丙基,正丁基,异丁基,叔丁基,甲氧基,乙氧基,正丙氧基,或者含有第二取代基的或非取代的苯基、萘基、吡啶基、吡嗪基、嘧啶基、哒嗪基、1,2,3-三嗪基,1,3,5-三嗪基、1,3,4-三嗪基、咔唑基、芴基、二苯并呋喃基、二苯并噻吩基、苯胺基、N,N-二苯基氨基、喹啉基、异喹啉基、喹喔啉基、喹唑啉基中的一种或多种;
所述第二取代基选自苯基、萘基、吡啶基、吡嗪基、嘧啶基、哒嗪基、1,2,3-三嗪基,1,3,5-三嗪基、1,3,4-三嗪基、咔唑基、芴基、二苯并呋喃基、二苯并噻吩基、苯胺基、N,N-二苯基氨基、喹啉基、异喹啉基、喹喔啉基、喹唑啉中的一种或多种。
10.根据权利要求1所述的含N螺环有机化合物,其特征在于,所述R2~R3独立的选自H、取代或非取代的单环芳基、单环杂芳基、稠环芳基、稠环杂芳基,或者由取代或非取代的单环芳基、单环杂芳基、稠环芳基、稠环杂芳基中的任意一种或多种通过单键或N原子连接形成的基团,且R2、R3不同时为H。
11.根据权利要求10所述的含N螺环有机化合物,其特征在于,所述单环芳基为苯基;
所述单环杂芳基选自吡啶基、吡嗪基、嘧啶基、哒嗪基、1,2,3-三嗪基,1,3,5-三嗪基或1,3,4-三嗪基;
所述稠环芳基选自萘基、蒽基、菲基、芘基或芴基;
所述稠环杂芳基选自咔唑基、二苯并呋喃基、二苯并噻吩基、喹啉基、异喹啉基、喹喔啉基或喹唑啉基。
12.根据权利要求10所述的含N螺环有机化合物,其特征在于,所述多种为2种、3种或4种。
13.根据权利要求1所述的含N螺环有机化合物,其特征在于,所述R2、R3独立的选自H、含有第一取代基的或非取代的苯基、萘基、吡啶基、吡嗪基、嘧啶基、哒嗪基、1,2,3-三嗪基,1,3,5-三嗪基、1,3,4-三嗪基、咔唑基、芴基、二苯并呋喃基、二苯并噻吩基、喹啉基、异喹啉基、喹喔啉基或喹唑啉基;
所述第一取代基选自F,Cl,Br,氰基,甲基,乙基,正丙基,异丙基,正丁基,异丁基,叔丁基,甲氧基,乙氧基,正丙氧基,或者含有第二取代基的或非取代的苯基、萘基、吡啶基、吡嗪基、嘧啶基、哒嗪基、1,2,3-三嗪基,1,3,5-三嗪基、1,3,4-三嗪基、咔唑基、芴基、二苯并呋喃基、二苯并噻吩基、苯胺基、N,N-二苯基氨基、喹啉基、异喹啉基、喹喔啉基、喹唑啉基中的一种或多种;
所述第二取代基选自卤素、氰基、C1~C6的烷基、C1~C6的烷氧基、苯基、萘基、吡啶基、吡嗪基、嘧啶基、哒嗪基、1,2,3-三嗪基,1,3,5-三嗪基、1,3,4-三嗪基、咔唑基、芴基、二苯并呋喃基、二苯并噻吩基、苯胺基、N,N-二苯基氨基、喹啉基、异喹啉基、喹喔啉基、喹唑啉中的一种或多种;
且R2、R3不同时为H。
15.根据权利要求1所述的含N螺环有机化合物,其特征在于,所述R3为H。
18.一种有机发光器件,所述有机发光器件包括阳极、阴极,以及位于所述阳极和阴极之间的有机薄膜层,所述有机薄膜层包括发光层,所述发光层中含有至少一种如权利要求1-17任一项所述的含N螺环有机化合物。
19.根据权利要求18所述的有机发光器件,其特征在于,所述有机发光器件包括阳极、阴极,以及位于所述阳极和阴极之间的有机薄膜层,所述有机薄膜层包括磷光发光层,所述磷光发光层中含有至少一种如权利要求1-17任一项所述的含N螺环有机化合物。
20.一种显示面板,包括权利要求18~19任一项所述的有机发光器件。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202210108321.8A CN114437108B (zh) | 2022-01-28 | 2022-01-28 | 一种含n螺环有机化合物及其在有机发光器件和面板中的应用 |
US17/804,324 US20220298175A1 (en) | 2022-01-28 | 2022-05-27 | Nitrogen-containing spiral organic compound and application thereof in organic light-emitting device and panel |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202210108321.8A CN114437108B (zh) | 2022-01-28 | 2022-01-28 | 一种含n螺环有机化合物及其在有机发光器件和面板中的应用 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN114437108A CN114437108A (zh) | 2022-05-06 |
CN114437108B true CN114437108B (zh) | 2023-06-30 |
Family
ID=81371875
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202210108321.8A Active CN114437108B (zh) | 2022-01-28 | 2022-01-28 | 一种含n螺环有机化合物及其在有机发光器件和面板中的应用 |
Country Status (2)
Country | Link |
---|---|
US (1) | US20220298175A1 (zh) |
CN (1) | CN114437108B (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114773355B (zh) * | 2022-05-20 | 2024-01-05 | 武汉天马微电子有限公司 | 一种含n有机化合物及其电致发光的应用 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102028242B1 (ko) * | 2015-11-17 | 2019-10-04 | 주식회사 엘지화학 | 화합물 및 이를 포함하는 유기 전자 소자 |
KR102003375B1 (ko) * | 2015-11-23 | 2019-07-24 | 주식회사 엘지화학 | 축합고리 화합물 및 이를 이용한 유기 발광 소자 |
CN109824681A (zh) * | 2017-11-23 | 2019-05-31 | 江苏三月光电科技有限公司 | 一种螺芴衍生物类有机化合物及其在有机电致发光器件上的应用 |
CN108409680A (zh) * | 2018-05-05 | 2018-08-17 | 长春海谱润斯科技有限公司 | 一种螺芴并含氮杂环类有机电致发光材料及其有机发光器件 |
CN113845505B (zh) * | 2021-10-20 | 2023-04-28 | 上海钥熠电子科技有限公司 | 螺芴衍生物类胺化合物和包含其的有机电致发光器件 |
CN113801117B (zh) * | 2021-10-27 | 2023-10-17 | 武汉天马微电子有限公司 | 一种有机化合物及其电致发光的应用 |
-
2022
- 2022-01-28 CN CN202210108321.8A patent/CN114437108B/zh active Active
- 2022-05-27 US US17/804,324 patent/US20220298175A1/en active Pending
Also Published As
Publication number | Publication date |
---|---|
US20220298175A1 (en) | 2022-09-22 |
CN114437108A (zh) | 2022-05-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN109415625B (zh) | 化合物及其组成物、有机光电装置及显示装置 | |
CN107619410B (zh) | 化合物及包含其的有机电子元件 | |
KR102123015B1 (ko) | 신규한 화합물 및 이를 이용한 유기 발광 소자 | |
CN109336834A (zh) | 一种芳胺衍生物及其有机电致发光器件 | |
KR102665294B1 (ko) | 신규한 화합물 및 이를 이용한 유기발광 소자 | |
CN111892607B (zh) | 一种n杂联苯类有机化合物及其应用 | |
KR101561338B1 (ko) | 유기 화합물 및 이를 포함하는 유기 전계 발광 소자 | |
CN113816979B (zh) | 一种有机化合物及其电致发光的应用 | |
CN112334472A (zh) | 新型化合物及包含其的有机发光器件 | |
CN114437108B (zh) | 一种含n螺环有机化合物及其在有机发光器件和面板中的应用 | |
CN114456172A (zh) | 含氮化合物及包含其的电子元件和电子装置 | |
KR101634853B1 (ko) | 유기 화합물 및 이를 포함하는 유기 전계 발광 소자 | |
KR101577112B1 (ko) | 유기 화합물 및 이를 포함하는 유기 전계 발광 소자 | |
KR102288990B1 (ko) | 신규한 화합물 및 이를 이용한 유기발광 소자 | |
CN114105996B (zh) | 一种有机化合物及其电致发光的应用 | |
CN113801117B (zh) | 一种有机化合物及其电致发光的应用 | |
KR101390616B1 (ko) | 신규 화합물 및 이를 포함하는 유기 전계 발광 소자 | |
KR102342249B1 (ko) | 신규한 화합물 및 이를 이용한 유기 발광 소자 | |
KR20140023283A (ko) | 치환된 오르토 터페닐 구조를 가지는 화합물 및 유기 일렉트로루미네선스 소자 | |
KR102092266B1 (ko) | 신규한 화합물 및 이를 이용한 유기발광 소자 | |
CN114163447B (zh) | 一种有机化合物及其电致发光的应用 | |
CN111377904A (zh) | 有机电致发光材料及器件 | |
CN114805390B (zh) | 一种有机化合物及其电致发光的应用 | |
CN115010734B (zh) | 化合物、显示面板及显示装置 | |
CN114773355B (zh) | 一种含n有机化合物及其电致发光的应用 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |