CN114420794A - 一种改善el黑边的方法 - Google Patents

一种改善el黑边的方法 Download PDF

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CN114420794A
CN114420794A CN202210125165.6A CN202210125165A CN114420794A CN 114420794 A CN114420794 A CN 114420794A CN 202210125165 A CN202210125165 A CN 202210125165A CN 114420794 A CN114420794 A CN 114420794A
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王琳琳
曾玉婷
张鹏
常青
莫建宏
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Jiangxi Zhonghong Jingneng Technology Co ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1804Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
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    • H01L31/022408Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • H01L31/022433Particular geometry of the grid contacts
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
    • H01L31/068Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
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    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells

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Abstract

本发明属于单晶硅电池技术领域,具体涉及一种改善EL黑边的方法,选择性发射极SE技术在绘图时,对两侧边缘的三根细栅线进行双线雕刻。目前选择性发射极(SE)技术在绘图时,细栅线均采用单线进行雕刻,本发明设计的新图形是通过把边缘三根细栅线进行双线雕刻,在不影响产能的情况下,可以有效降低EL黑边的问题,减少不良品的产生,提升良率。本发明设计方案在现有激光掺杂设备上均是可完全兼容,不会增加成本,并且在工业化生产过程中稳定性好,不会影响正常生产。

Description

一种改善EL黑边的方法
技术领域
本发明属于单晶硅电池技术领域,具体涉及一种改善EL黑边的方法。
背景技术
随着晶硅电池科学与技术的发展,PERC电池已经逐渐成为市场主流,在未来几年的发展中PERC电池及PERC叠加新技术电池会逐渐成熟,走向工业化生产。PERC叠加选择性发射极(SE)技术是一种有效的提升电池效率的技术路径,这种电池结构,金属化区域浓扩散区结深大,烧结过程中金属等杂质不易进入耗尽区形成深能级,反向漏电小,并联电阻高;光照区域掺杂浓度低,可以减少电池发射极和表面的少子复合,少子寿命高,短波响应好,短路电流高;轻掺杂和重掺杂形成高低结,对发射极形成的少子形成势垒,将少子推向PN结(类似铝背场的作用),选择性发射极可以增加光生载流子,降低暗电流,提高开路电压。
发明内容
本发明目的在于克服现有技术的不足,提供一种改善EL黑边的方法。
为达到上述目的,本发明采用的技术方案如下:
一种改善EL黑边的方法,步骤包括:在选择性发射极(SE)技术在绘图时,对两侧边缘的三根细栅线进行双线雕刻。
较佳地,双线雕刻的两根细栅线之间的凹坑的宽度为0.1~0.5mm,深度为50~350nm。
优选地,两边缘侧的凹坑与硅片侧边缘的距离为2~8mm。
与现有技术相比,本发明的优点和积极效果如下:
本发明设计的新图形是将SE图形的边缘区域进行双线雕刻,将边缘细栅线进行双线雕刻,此种方法可以有效的将SE区域加宽,更有利于丝网印刷时浆料的接触,增大接触面积,提高接触电阻,使其边缘区域更亮,大大降低EL边缘发黑的问题。
附图说明
图1选择性发射极(SE)技术在绘图时,边缘细栅线的常规图形设计方案;
图2选择性发射极(SE)技术在绘图时,边缘细栅线的新图形设计方案。
具体实施方式
为了使本发明的目的、技术方案及优点更加清楚明白,以下则结合实施例,对本发明进行进一步详细说明。本发明的附加方面和优点将在下面的描述中部分给出,部分将从下面的描述中变得明显,或通过本发明的实践了解到。应当理解,以下描述仅仅用以解释本发明,并不用于限定本发明。
本发明一种改善EL黑边的方法对激光SE结构制作中的边缘细栅线进行了优化设计,减少了EL黑边的问题,与如图1所示的常规图形设计方案相比较,本发明边缘细栅线的新图形设计方案如图2所示;
目前选择性发射极(SE)技术在绘图时,细栅线均采用单线进行雕刻,本发明设计的新图形是通过把边缘三根细栅线进行双线雕刻,在不影响产能的情况下,可以有效降低EL黑边的问题,减少不良品的产生,提升良率。本发明设计方案在现有激光掺杂设备上均是可完全兼容,不会增加成本,并且在工业化生产过程中稳定性好,不会影响正常生产。
上述实施例仅是本发明的较优实施方式,凡是依据本发明的技术实质对以上实施例所做的任何简单修饰、修改及替代变化,均属于本发明技术方案的范围内。

Claims (3)

1.一种改善EL黑边的方法,其特征在于,选择性发射极SE技术在绘图时,对两侧边缘的三根细栅线进行双线雕刻。
2.根据权利要求1所述的一种改善EL黑边的方法,其特征在于,双线雕刻的两根细栅线之间的凹坑的宽度为0.1~0.5mm,深度为50~350nm。
3.根据权利要求2所述的一种改善EL黑边的方法,其特征在于,两边缘侧的凹坑与硅片侧边缘的距离为2~8mm。
CN202210125165.6A 2022-02-10 2022-02-10 一种改善el黑边的方法 Pending CN114420794A (zh)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102222729A (zh) * 2011-05-31 2011-10-19 浙江晶科能源有限公司 一种改善太阳电池前电极电镀质量的方法
CN107093636A (zh) * 2017-03-03 2017-08-25 广东爱康太阳能科技有限公司 P型perc双面太阳能电池及其制备方法、组件和系统
JP2019071446A (ja) * 2014-05-27 2019-05-09 サンパワー コーポレイション こけら葺き状太陽電池モジュール
CN111668339A (zh) * 2020-04-23 2020-09-15 天津爱旭太阳能科技有限公司 一种太阳能电池正面电极对位印刷方法及制备方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102222729A (zh) * 2011-05-31 2011-10-19 浙江晶科能源有限公司 一种改善太阳电池前电极电镀质量的方法
JP2019071446A (ja) * 2014-05-27 2019-05-09 サンパワー コーポレイション こけら葺き状太陽電池モジュール
CN107093636A (zh) * 2017-03-03 2017-08-25 广东爱康太阳能科技有限公司 P型perc双面太阳能电池及其制备方法、组件和系统
CN111668339A (zh) * 2020-04-23 2020-09-15 天津爱旭太阳能科技有限公司 一种太阳能电池正面电极对位印刷方法及制备方法

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