CN114335392B - 一种oled柔性显示用减反射膜的制备工艺 - Google Patents
一种oled柔性显示用减反射膜的制备工艺 Download PDFInfo
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- CN114335392B CN114335392B CN202111674622.9A CN202111674622A CN114335392B CN 114335392 B CN114335392 B CN 114335392B CN 202111674622 A CN202111674622 A CN 202111674622A CN 114335392 B CN114335392 B CN 114335392B
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- 238000002360 preparation method Methods 0.000 title claims abstract description 26
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 95
- 229910000449 hafnium oxide Inorganic materials 0.000 claims abstract description 86
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims abstract description 86
- 239000000758 substrate Substances 0.000 claims abstract description 86
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract description 79
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims abstract description 70
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims abstract description 70
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 46
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 46
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 60
- 238000000151 deposition Methods 0.000 claims description 52
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 48
- 238000000034 method Methods 0.000 claims description 43
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 36
- 239000001301 oxygen Substances 0.000 claims description 36
- 229910052760 oxygen Inorganic materials 0.000 claims description 36
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 32
- 239000011248 coating agent Substances 0.000 claims description 30
- 238000000576 coating method Methods 0.000 claims description 30
- 238000010438 heat treatment Methods 0.000 claims description 30
- 229910052757 nitrogen Inorganic materials 0.000 claims description 28
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- 238000001035 drying Methods 0.000 claims description 26
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 24
- 229910052786 argon Inorganic materials 0.000 claims description 24
- 238000006243 chemical reaction Methods 0.000 claims description 24
- 230000008021 deposition Effects 0.000 claims description 24
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 claims description 24
- 239000007788 liquid Substances 0.000 claims description 23
- 239000000203 mixture Substances 0.000 claims description 23
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- 238000007493 shaping process Methods 0.000 claims description 22
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 20
- 229910052710 silicon Inorganic materials 0.000 claims description 20
- 239000010703 silicon Substances 0.000 claims description 20
- 239000011521 glass Substances 0.000 claims description 19
- 238000007747 plating Methods 0.000 claims description 19
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 18
- 238000005086 pumping Methods 0.000 claims description 17
- 238000000137 annealing Methods 0.000 claims description 16
- 238000005516 engineering process Methods 0.000 claims description 16
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 16
- 238000002791 soaking Methods 0.000 claims description 16
- 238000003756 stirring Methods 0.000 claims description 16
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 15
- 238000004140 cleaning Methods 0.000 claims description 15
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical class O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 15
- 230000003667 anti-reflective effect Effects 0.000 claims description 14
- 238000001125 extrusion Methods 0.000 claims description 12
- 238000005469 granulation Methods 0.000 claims description 12
- 230000003179 granulation Effects 0.000 claims description 12
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 claims description 11
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 10
- 229920002545 silicone oil Polymers 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 10
- 239000013077 target material Substances 0.000 claims description 10
- 239000007822 coupling agent Substances 0.000 claims description 9
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 8
- 235000011114 ammonium hydroxide Nutrition 0.000 claims description 8
- 239000008367 deionised water Substances 0.000 claims description 8
- 229910021641 deionized water Inorganic materials 0.000 claims description 8
- 239000007789 gas Substances 0.000 claims description 8
- 238000004544 sputter deposition Methods 0.000 claims description 8
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 8
- 229910052721 tungsten Inorganic materials 0.000 claims description 8
- 239000010937 tungsten Substances 0.000 claims description 8
- 238000005303 weighing Methods 0.000 claims description 8
- 238000002844 melting Methods 0.000 claims description 7
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- 238000007598 dipping method Methods 0.000 claims description 6
- 238000001914 filtration Methods 0.000 claims description 6
- 238000002156 mixing Methods 0.000 claims description 6
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 claims description 5
- 238000002715 modification method Methods 0.000 claims description 5
- 238000005245 sintering Methods 0.000 claims description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 4
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 4
- 235000019441 ethanol Nutrition 0.000 claims description 4
- 239000003960 organic solvent Substances 0.000 claims description 4
- 238000005406 washing Methods 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 3
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 claims description 2
- 239000011362 coarse particle Substances 0.000 claims description 2
- MABAWBWRUSBLKQ-UHFFFAOYSA-N ethenyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)C=C MABAWBWRUSBLKQ-UHFFFAOYSA-N 0.000 claims description 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
- 238000002834 transmittance Methods 0.000 abstract description 12
- 239000010408 film Substances 0.000 description 379
- 230000000052 comparative effect Effects 0.000 description 14
- 238000001816 cooling Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 3
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- 238000002310 reflectometry Methods 0.000 description 3
- 238000007514 turning Methods 0.000 description 3
- 235000005811 Viola adunca Nutrition 0.000 description 2
- 240000009038 Viola odorata Species 0.000 description 2
- 235000013487 Viola odorata Nutrition 0.000 description 2
- 235000002254 Viola papilionacea Nutrition 0.000 description 2
- 244000172533 Viola sororia Species 0.000 description 2
- 230000001427 coherent effect Effects 0.000 description 2
- 239000007888 film coating Substances 0.000 description 2
- 238000009501 film coating Methods 0.000 description 2
- 239000012788 optical film Substances 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 229920006304 triacetate fiber Polymers 0.000 description 1
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
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CN115555235B (zh) * | 2022-10-28 | 2023-07-18 | 西南科技大学 | 一种二氧化硅增透膜的制备方法 |
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JP4521957B2 (ja) * | 2000-09-28 | 2010-08-11 | 大日本印刷株式会社 | ハードコート層を有するフィルム、反射防止フィルム、およびそれらの製造方法 |
JP2004255635A (ja) * | 2003-02-25 | 2004-09-16 | Dainippon Printing Co Ltd | 透明積層フィルム、反射防止フィルム及びそれを用いた偏光板、液晶表示装置 |
JP2005003707A (ja) * | 2003-06-09 | 2005-01-06 | Asahi Glass Co Ltd | 反射防止体およびこれを用いたディスプレイ装置 |
JP2008191564A (ja) * | 2007-02-07 | 2008-08-21 | Victor Co Of Japan Ltd | 光学部品 |
CN101508191B (zh) * | 2009-03-30 | 2012-06-27 | 天津美泰真空技术有限公司 | 在聚碳酸酯/聚甲基丙烯酸甲酯复合板上的减反射膜及制备方法 |
JP2012116151A (ja) * | 2010-12-03 | 2012-06-21 | Sony Corp | バリアフィルム及びその製造方法 |
KR101992899B1 (ko) * | 2012-12-17 | 2019-06-25 | 엘지디스플레이 주식회사 | 터치 패널 내장형 유기 발광 다이오드 표시 장치 및 이의 제조 방법 |
CN103066161B (zh) * | 2013-01-17 | 2015-02-04 | 云南师范大学 | 一种太阳电池复合减反射膜的制备工艺 |
CN105659114B (zh) * | 2014-01-06 | 2017-07-14 | 华为终端有限公司 | 一种保护片、保护片的制作方法及电子设备 |
WO2015107968A1 (ja) * | 2014-01-15 | 2015-07-23 | コニカミノルタ株式会社 | 透明導電体の製造方法及び透明導電体 |
WO2017154276A1 (ja) * | 2016-03-08 | 2017-09-14 | 住友理工株式会社 | 光透過性積層体および光透過性積層体の製造方法 |
CN108627889B (zh) * | 2018-04-11 | 2021-01-15 | 上海欧菲尔光电技术有限公司 | 一种锗基底宽光谱红外增透光学窗口 |
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Effective date of registration: 20240311 Address after: 445000 selenium Valley Road, songshuping village, liujiaoting sub district office, Enshi City, Enshi Tujia and Miao Autonomous Prefecture, Hubei Province Patentee after: Huaxin Technology (Enshi) Co.,Ltd. Country or region after: China Address before: 621010, No. 59, Qinglong Avenue, Fucheng District, Sichuan, Mianyang Patentee before: Southwest University of Science and Technology Country or region before: China |
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Denomination of invention: Preparation process of an anti reflective film for OLED flexible displays Granted publication date: 20230616 Pledgee: Agricultural Bank of China Enshi Branch Pledgor: Huaxin Technology (Enshi) Co.,Ltd. Registration number: Y2024980021248 |