CN114323310B - High-resolution Hartmann wavefront sensor - Google Patents
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Abstract
The invention discloses a high-resolution Hartmann wavefront sensor, wherein the pixel number of an image sensor corresponding to a single sub-aperture is set to be 4 pixels in total of a 2 multiplied by 2 array, and the sub-aperture sampling spatial resolution of the Hartmann wavefront sensor finally reaches a double-pixel level through the optimal design of a micro-lens focal length, and the measurement precision is maintained. The invention solves the key problems of low pixel utilization rate and image data redundancy of the image sensor in the technical scheme of the traditional Hartmann wavefront sensor, improves the pixel utilization rate to nearly one hundred percent, improves the spatial resolution of the Hartmann wavefront sensor to a near pixel level, reduces the pixel demand and the image data of the Hartmann wavefront sensor by more than one order of magnitude under the same spatial resolution, provides a feasible technical scheme for developing the ultra-high spatial resolution Hartmann wavefront sensor, and can also be used for developing the ultra-high speed Hartmann wavefront sensor with extremely few pixel demands.
Description
Technical Field
The invention belongs to the technical field of optical engineering, relates to a device for detecting wave front distortion of a light beam, and particularly relates to a Hartmann wave front sensor with high resolution.
Background
The Hartmann wavefront sensor is a widely applied light beam wavefront distortion measuring device, and has the advantages of simple structure, high speed, high precision, good environmental adaptability and the like, and is continuously and successfully applied in the fields of self-adaptive optics, optical detection, flow field measurement and the like.
Typical Hartmann wavefront sensor structure can be referred to an optical wavefront sensor disclosed in the specification of China patent application publication (application No. 98112210.8, publication No. CN 1245904), and the implementation mode mainly adopts a wavefront dividing sampling array element such as a microlens array to divide the wavefront into sub-apertures, and uses a processing method similar to mathematical calculus in wavefront measurement, and only the magnitude of oblique aberration in each sub-aperture needs to be measured to restore the wavefront aberration of the whole aperture by using a specific restoration algorithm. While the oblique aberration component in the sub-aperture is determined according to the centroid offset of the far-field light spot obtained by focusing the light wave through the micro-lens, the Hartmann wavefront sensor generally uses an array type image sensor (such as CCD or CMOS camera) to detect the light spot array formed on the focal plane of the micro-lens array.
According to the detection principle, the detection spatial resolution of the Hartmann wavefront sensor is limited by the division density of the microlens array, and a certain area of pixels are required to be defined for each sub-light spot on the image sensor as sub-apertures. The spatial resolution of the Hartmann wavefront sensor is limited to near-pixel levels, and the image sensor needs to have a certain pixel resolution for imaging of the entire array of sub-spots. Therefore, the Hartmann wavefront sensor has a high pixel resolution requirement for the image sensor, but has a low utilization rate, and mass high-resolution image data severely limits the actual measurement speed when the wavefront is detected at an ultra-high speed.
Aiming at the problems of spatial resolution and pixel utilization rate of a Hartmann wavefront sensor, in 1996 Ragazzoni firstly proposes a rectangular Pyramid (Pyramid) wavefront sensing technology concept (Ragazzoni R.Pupil plan wavefront sensing with an oscillating prism [ J ]. J.Mod.Opt.,1996, 43:289-293). The sensor takes the rectangular pyramid as a two-dimensional beam splitter prism, realizes pupil partition and imaging of incident light beams by matching with the lens group, divides four-quadrant areas on the detector to respectively detect wavefront slopes of different pupil apertures, further completes wavefront detection, and has the advantages of large dynamic range of wavefront measurement, high sensitivity, flexible sampling partition mode and the like. In theory, each wavefront slope sampling point of the rectangular pyramid sensor only needs four pixels, so that high-resolution wavefront detection can be realized. However, the rectangular pyramid wavefront sensor still has the problems of beam focusing position control, high-precision processing requirements of edges and vertex angles of the rectangular pyramid, solving a fitting model and the like at present, and therefore the wide application of the rectangular pyramid wavefront sensor is limited.
Along with the continuous extension of application fields, the requirements for the high-performance wavefront sensor are increasingly strong, and the novel wavefront sensor technology with high spatial resolution, high pixel utilization rate, light energy utilization rate and high-speed detection potential has better application prospect.
Disclosure of Invention
The invention aims to solve the technical problems that: the defects of the existing Hartmann wavefront sensor in resolution and pixel utilization rate are overcome, the spatial resolution of the Hartmann wavefront sensor is improved to 2 pixel size levels through the design of specific sub-apertures and pixels corresponding to each other and the selection of the focal length of the micro-lens array, and the pixel utilization rate almost reaches one hundred percent.
The technical scheme adopted for solving the technical problems is as follows: a high resolution Hartmann wave front sensor is composed of micro lens array and array image sensor, where the micro lens array is covered over the photosensitive chip of the array image sensor, the incident light beam to be measured is divided into sub-aperture array, i.e. fine light beam array, and focused, the photosensitive chip of the array image sensor is placed under the micro lens array, the distance between them is the focal length of the micro lens array for detecting the intensity distribution information of the light beam to be measured which is divided and focused by the micro lens array, each sub-aperture is only 2×2 and arranged for 4 image sensor pixels, the center distance between adjacent sub-apertures is 2 times of the size of single pixel, and the focal length f range of the micro lens array is L p 2 /λ≤f≤4L p 2 λ, where L p And for the width dimension of the pixel, lambda is the wavelength of the detection beam, and the centroid data of the focused light spot of the beamlets corresponding to the current sub-aperture can be obtained according to the light intensity signal value of the pixels which are arranged in the 2 multiplied by 2 and correspond to each sub-aperture:
wherein I is 1 、I 2 、I 3 、I 4 And respectively representing the gray values of the pixels at the upper left, the upper right, the lower left and the lower right in the pixels of the 2X 2 array image sensor, calculating the centroid data of the light spots in each sub-aperture according to the centroid calculation formula, and finally reconstructing the wavefront distortion information of the whole light beam to be detected by utilizing a Hartmann wavefront sensor wavefront restoration algorithm based on the centroid data of the light spots of all the effective sub-apertures.
Further, the array type image sensor has photosensitive pixels arranged in a two-dimensional array, and may be a CCD sensor camera, a CMOS sensor camera, a PDA detector, or the like.
Further, the 2×2 arrangement may be a single physical pixel of the image sensor, or may be a single numerical pixel in the output image of the image sensor after the pixel merging function, where the size of the single numerical pixel is an integer multiple of the size of the single physical pixel of the sensor.
Further, the effective sub-aperture refers to a sub-aperture where the corresponding centroid data of the light spot participates in the wavefront restoration calculation, and may be a sub-aperture completely covered by the incident light beam or a sub-aperture partially covered by the incident light beam.
Compared with the prior art, the invention has the following advantages: according to the method, only 2×2 total 4 pixels are needed for detecting each sub-aperture, and more sub-aperture array numbers can be segmented under the same pixel resolution of the image sensor compared with the prior art, so that higher wavefront sampling resolution can be realized; secondly, the single sub-aperture only needs 4 pixels, and under the same sub-aperture array number, the pixel number of the image sensor needed for realizing wavefront detection can be reduced by at least one order of magnitude compared with the prior art, and the compression of the image pixel number is important for realizing real-time high-speed wavefront measurement; finally, through a specific focal length design, 4 pixels corresponding to each sub-aperture have effective light intensity information, so that the image sensor pixels used for wave front detection have light intensity data theoretically, and the pixel utilization rate can reach hundred percent, and is improved by at least more than 2 times compared with the prior art. Therefore, the invention can realize the wave-front detection with extremely high resolution and the pixel utilization rate of the image sensor in theory, has the technical potential of extremely high-speed wave-front detection, and has important application value in high-performance wave-front detection scenes. The invention takes every 2X 2 pixels on the image sensor as the position sensor, changes the image sensor into a large-scale position sensor array, and the application mode is also an innovation for the image sensor.
Drawings
FIG. 1 is a schematic block diagram of a high resolution Hartmann wavefront sensor of the present invention;
FIG. 2 is a diagram showing a sub-aperture division design of a high resolution Hartmann wavefront sensor according to an embodiment of the present invention;
FIG. 3 is a diagram of a randomly generated distorted wavefront distribution according to a first embodiment of the present invention;
FIG. 4 is a schematic illustration of a light spot image on a high resolution Hartmann wavefront sensor parallel cursor timing image sensor according to an embodiment of the present invention;
FIG. 5 is a view of an image of a light spot on an image sensor of a high resolution Hartmann wavefront sensor with a distorted wavefront-containing light beam incident thereon in accordance with a first embodiment of the present invention;
fig. 6 is a schematic diagram of a recovered wavefront 23-order aberration mode coefficient (white columnar data) and an aberration mode coefficient (black columnar data) of an input wavefront measured by a high-resolution hartmann wavefront sensor according to an embodiment of the present invention;
FIG. 7 is a schematic diagram of a high resolution Hartmann wavefront sensor recovery wavefront according to an embodiment of the present invention;
fig. 8 is a schematic diagram of an error wavefront between a restored wavefront and an input wavefront of a wavefront sensor according to an embodiment of the present invention.
Detailed Description
The invention is further described below with reference to the drawings and examples.
FIG. 1 is a high resolution Hartmann wavefront sensor according to the present inventionThe sensor principle structure diagram is that the sub-apertures of the micro-lens array of the light beam to be detected are respectively focused on the photosensitive chip of the image sensor after being divided to form a light spot array, and each micro-lens or sub-aperture corresponds to 2 multiplied by 2 pixel areas on the photosensitive chip of the image sensor. Fig. 2 shows a sub-aperture division diagram of a high-resolution hartmann wavefront sensor according to an embodiment of the present invention, in which the wavelength λ of an input light beam to be measured is 635nm, the pupil is circular, and the wavefront sensor employs 12×12 aperture division (grid lines in the figure). For the convenience of calculation, selecting a sub-aperture which is completely covered by a light beam and is filled with light energy as an effective sub-aperture, wherein the effective sub-aperture is represented by a solid line grid in the figure; the sub-apertures of the dotted grid part are set as invalid sub-apertures and do not participate in the wave front restoration calculation. The upper right-hand corner plot of FIG. 2 shows an illustration of each sub-aperture corresponding to a 2X 2 pixel of the image sensor, the image sensor pixel size L p The size of each microlens and sub-aperture is 28 μm x 28 μm, which is 14 μm, and 2 times the size of a single physical pixel, and the focal length f of the microlens array is L p 2 /λ≤f≤4L p 2 The value of 1.5L in the required range of lambda p 2 Lambda, about 926 μm. At a 12×12 sub-aperture division, the pixel resolution required for complete sampling of the spot array image information is 28×28, and it can be seen that the wavefront sensor of the first embodiment requires little image sensor pixel resources.
To test the aberration measurement capability of a high resolution Hartmann wavefront sensor of an embodiment, the input beam wavefront distortion is composed of the first 23 th order Zernike aberration modes, the coefficients of the 23 th order Zernike aberration modes are randomly generated, the distribution satisfies a Kerr Mo Genuo f turbulence model, the generated random wavefront is shown in FIG. 3, the PV value is 2.8874 λ, and the RMS value is 0.4861 λ. The light spot image on the parallel cursor timing image sensor of the high-resolution Hartmann wavefront sensor is shown in fig. 4, the light spot array image is quite different from the light spot array image of the conventional Hartmann wavefront sensor, no independent sub-light spot image exists, each pixel in the pupil area has data, and the high pixel utilization rate of the high-resolution Hartmann wavefront sensor is shown. In the calibration state, the initial x-direction centroid position of the light spot in each sub-aperturex cali 、y cali Can be obtained by the following formula:
wherein,,
respectively representing the gray values of pixels at the upper left, the upper right, the lower left and the lower right in the pixels of the image sensor which are arranged in the 2 multiplied by 2 mode under the calibration state.
The invention only relates to a novel method for realizing high resolution on the wavefront slope, and has no special requirement on the mathematical process of reconstructing the wavefront after acquiring the wavefront slope information, so that the invention can be suitable for various Hartmann wavefront sensor wavefront reconstruction algorithms. The Hartmann wavefront sensor in the embodiment adopts a mode method to restore wavefront, and according to the sub-aperture segmentation arrangement and a set 23-order Zernike aberration mode, a restoration matrix of aberration mode coefficients can be calculated according to spot centroid offset or slope data in sub-apertures, which can be generated in advance as system configuration.
In the first embodiment, under the input of the light beam containing the wave front distortion to be measured, the light spot image on the image sensor of the high-resolution Hartmann wave front sensor is shown in fig. 5, and obvious pixel information change exists in comparison with calibration. Through the facula image, the centroid position x in the x and y directions of each sub-aperture under the input of the wave front distortion light beam to be detected is contained c 、y c The centroid calculation formula can be obtained as follows:
wherein I is 1 、I 2 、I 3 、I 4 Representing the upper left, upper right, lower left and lower right pixel gray values, respectively, in a 2 x 2 arrangement image sensor pixel. X of the spot in each sub-aperture c 、y c Initial position x corresponding to calibration cali 、y cali And subtracting to obtain the centroid shift or wavefront slope data of the light spots in each sub-aperture under the input of the wavefront distortion to be measured. Finally, based on the light spot centroid offset data in all the effective sub-apertures, the Zernike aberration mode coefficient components of the input wavefront distortion can be calculated by utilizing a Hartmann wavefront sensor mode restoration algorithm and a restoration matrix, as shown in fig. 6. The 23-order aberration mode coefficient (white columnar data) measured by the wavefront sensor in fig. 6 is well matched with the aberration mode coefficient (black columnar data) constituting the input wavefront, which indicates that the high-resolution hartmann wavefront sensor in the first embodiment accurately measures the input aberration component. The wavefront distortion information of the whole light beam to be measured is further reconstructed by using the restored aberration mode coefficients, as shown in fig. 7. The magnitude, distribution of the recovered wavefront in fig. 7 is highly consistent with the input wavefront, with the PV and RMS values matching up to 99% and 98%. The error wavefront between the recovered wavefront and the input wavefront is shown in fig. 8, and the PV value and the RMS value of the error wavefront are only 0.08λ and 0.0122 λ respectively, which again prove that the wavefront sensor accurately recovers the distribution of the distortion of the input wavefront. An embodiment shows that the proposed high-resolution Hartmann wavefront sensor can accurately recover wavefront distortion under the condition that each sub-aperture only corresponds to 2×2 total 4 pixels, the sub-aperture size is 2 times of the physical pixel size, and the spatial resolution of the Hartmann wavefront sensor is improved to the double-pixel level.
While the invention has been described with respect to specific embodiments thereof, it will be appreciated that the invention is not limited thereto, but rather encompasses modifications and substitutions within the scope of the present invention as will be appreciated by those skilled in the art.
Claims (4)
1. A high resolution hartmann wavefront sensor, characterized by: the array type image sensor comprises a microlens array and an array type image sensor, wherein the microlens array is covered above a photosensitive chip of the array type image sensor, an incident light beam to be detected is divided into a sub-aperture array, namely a beamlet array, and is focused, the photosensitive chip of the array type image sensor is arranged below the microlens array, and the interval between the microlens array and the array type image sensor is equal to the interval between the micro-aperture array and the array type image sensorThe focal length of the mirror array is used for detecting the intensity distribution information of the light beams to be detected which are subjected to the split focusing of the micro lens array, each sub-aperture only corresponds to 2×2 arranged total of 4 image sensor pixels, the center distance of the pixel area corresponding to the adjacent sub-apertures is 2 times of the single pixel size, and the focal length f range of the micro lens array is L p 2 /λ≤f≤4L p 2 λ, where L p And for the width dimension of the pixel, lambda is the wavelength of the detection light beam, and the centroid data of the focused light spot of the beamlets corresponding to the current sub-aperture can be obtained according to the light intensity signal value of the pixels which are arranged in the 2 multiplied by 2 and correspond to each sub-aperture:
wherein I is 1 、I 2 、I 3 、I 4 And respectively representing the gray values of the pixels at the upper left, the upper right, the lower left and the lower right in the pixels of the 2X 2 array image sensor, calculating the centroid data of the light spots in each sub-aperture according to the centroid calculation formula, and finally reconstructing the wavefront distortion information of the whole light beam to be detected by using a conventional Hartmann wavefront sensor wavefront restoration algorithm based on the centroid data of the light spots of all the effective sub-apertures.
2. A high resolution hartmann wavefront sensor as recited in claim 1 wherein: the array type image sensor is provided with photosensitive pixels which are arranged in a two-dimensional array and can be a CCD sensor camera, a CMOS sensor camera and a PDA detector.
3. A high resolution hartmann wavefront sensor as recited in claim 1 wherein: the 2×2 arrangement includes 4 image sensor pixels, which may be single physical pixels of the image sensor or single numerical pixels in the output image of the image sensor after the pixel merging function, where the size of the single numerical pixels is an integer multiple of the size of the single physical pixels of the sensor.
4. A high resolution hartmann wavefront sensor as recited in claim 1 wherein: the effective sub-aperture refers to a sub-aperture in which corresponding spot centroid data participates in wavefront restoration calculation, and can be a sub-aperture completely covered by an incident beam or a sub-aperture partially covered by the incident beam.
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| CN115031856A (en) * | 2022-06-08 | 2022-09-09 | 中国科学院光电技术研究所 | Sub-light spot screening-based wavefront restoration method for shack-Hartmann wavefront sensor |
Citations (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5563709A (en) * | 1994-09-13 | 1996-10-08 | Integrated Process Equipment Corp. | Apparatus for measuring, thinning and flattening silicon structures |
| EP0840502A2 (en) * | 1996-11-04 | 1998-05-06 | Eastman Kodak Company | Compact digital camera with segmented fields of view |
| EP0893915A2 (en) * | 1997-06-25 | 1999-01-27 | Eastman Kodak Company | Compact image sensor with display integrally attached |
| CN1385675A (en) * | 2001-05-16 | 2002-12-18 | 中国科学院光电技术研究所 | Wavefront sensor |
| CN1428597A (en) * | 2001-12-27 | 2003-07-09 | 中国科学院光电技术研究所 | Annular eccentric Hartmann shack wavefront sensor |
| CN101206763A (en) * | 2007-11-16 | 2008-06-25 | 中国科学院光电技术研究所 | Multi-frame self-adaptive optical image high-resolution restoration method by using wavefront data |
| CN101639382A (en) * | 2009-08-25 | 2010-02-03 | 中国科学院光电技术研究所 | Method for absolutely calibrating Hartmann-shack sensor by using spherical wavefront |
| CN101949768A (en) * | 2010-08-20 | 2011-01-19 | 中国科学院光电技术研究所 | Point source target related Hartmann-shack wavefront slope processor and manufacturing method |
| CN102169020A (en) * | 2010-12-08 | 2011-08-31 | 中国科学院光电技术研究所 | Assembly line device for Hartmann wavefront sensor centroid operation |
| CN103278247A (en) * | 2013-05-06 | 2013-09-04 | 中国科学院光电技术研究所 | Background noise characteristic estimation method for point source Hartmann wavefront detector |
| WO2014118325A1 (en) * | 2013-02-01 | 2014-08-07 | Carl Zeiss Meditec Ag | Systems and methods for sub-aperture based aberration measurement and correction in interferometric imaging |
| CN106546326A (en) * | 2016-09-28 | 2017-03-29 | 中国科学院长春光学精密机械与物理研究所 | The wavefront sensing methods of multinomial pattern in Hartman wavefront detector sub-aperture |
| CN109520625A (en) * | 2019-01-09 | 2019-03-26 | 中国科学技术大学 | A kind of Wavefront sensor |
| CN110487425A (en) * | 2019-08-26 | 2019-11-22 | 中国人民解放军国防科技大学 | A kind of wavefront sensing methods and its device based on defocus type light-field camera |
| CN210893429U (en) * | 2019-08-26 | 2020-06-30 | 中国人民解放军国防科技大学 | Defocusing type light field camera wavefront sensor |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040263779A1 (en) * | 2003-06-12 | 2004-12-30 | Visx, Inc. | Hartmann-Shack wavefront measurement |
| US7274442B2 (en) * | 2005-05-16 | 2007-09-25 | The Boeing Company | Closed-loop wavefront sensor using field programmable gate array |
| US20120215456A1 (en) * | 2011-02-23 | 2012-08-23 | CytoRay | System and method for cellular optical wavefront sensing |
| US11054637B2 (en) * | 2015-07-02 | 2021-07-06 | Mission Support and Test Services, LLC | RGB wavefront sensor for turbulence mitigation |
-
2021
- 2021-12-28 CN CN202111630802.7A patent/CN114323310B/en active Active
Patent Citations (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5563709A (en) * | 1994-09-13 | 1996-10-08 | Integrated Process Equipment Corp. | Apparatus for measuring, thinning and flattening silicon structures |
| EP0840502A2 (en) * | 1996-11-04 | 1998-05-06 | Eastman Kodak Company | Compact digital camera with segmented fields of view |
| EP0893915A2 (en) * | 1997-06-25 | 1999-01-27 | Eastman Kodak Company | Compact image sensor with display integrally attached |
| CN1385675A (en) * | 2001-05-16 | 2002-12-18 | 中国科学院光电技术研究所 | Wavefront sensor |
| CN1428597A (en) * | 2001-12-27 | 2003-07-09 | 中国科学院光电技术研究所 | Annular eccentric Hartmann shack wavefront sensor |
| CN101206763A (en) * | 2007-11-16 | 2008-06-25 | 中国科学院光电技术研究所 | Multi-frame self-adaptive optical image high-resolution restoration method by using wavefront data |
| CN101639382A (en) * | 2009-08-25 | 2010-02-03 | 中国科学院光电技术研究所 | Method for absolutely calibrating Hartmann-shack sensor by using spherical wavefront |
| CN101949768A (en) * | 2010-08-20 | 2011-01-19 | 中国科学院光电技术研究所 | Point source target related Hartmann-shack wavefront slope processor and manufacturing method |
| CN102169020A (en) * | 2010-12-08 | 2011-08-31 | 中国科学院光电技术研究所 | Assembly line device for Hartmann wavefront sensor centroid operation |
| WO2014118325A1 (en) * | 2013-02-01 | 2014-08-07 | Carl Zeiss Meditec Ag | Systems and methods for sub-aperture based aberration measurement and correction in interferometric imaging |
| CN103278247A (en) * | 2013-05-06 | 2013-09-04 | 中国科学院光电技术研究所 | Background noise characteristic estimation method for point source Hartmann wavefront detector |
| CN106546326A (en) * | 2016-09-28 | 2017-03-29 | 中国科学院长春光学精密机械与物理研究所 | The wavefront sensing methods of multinomial pattern in Hartman wavefront detector sub-aperture |
| CN109520625A (en) * | 2019-01-09 | 2019-03-26 | 中国科学技术大学 | A kind of Wavefront sensor |
| CN110487425A (en) * | 2019-08-26 | 2019-11-22 | 中国人民解放军国防科技大学 | A kind of wavefront sensing methods and its device based on defocus type light-field camera |
| CN210893429U (en) * | 2019-08-26 | 2020-06-30 | 中国人民解放军国防科技大学 | Defocusing type light field camera wavefront sensor |
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