CN109520625A - A kind of Wavefront sensor - Google Patents
A kind of Wavefront sensor Download PDFInfo
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- CN109520625A CN109520625A CN201910019845.8A CN201910019845A CN109520625A CN 109520625 A CN109520625 A CN 109520625A CN 201910019845 A CN201910019845 A CN 201910019845A CN 109520625 A CN109520625 A CN 109520625A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
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Abstract
The invention discloses a kind of Wavefront sensors, it include: the first polarizing film being sequentially placed, half wave plate, calcite crystal, quarter-wave plate, the second polarizing film and array photodetectors, and the optical surface of above-mentioned device is vertical with direction of beam propagation.The sensor structure is simple, and required optical element is few, in conjunction with the crystal growth and cutting technique of current maturation, the potentiality with mass production.Meanwhile the Wavefront sensor based on the weak measurement of two-dimentional quantum eliminates the limitation of wavefront division sampling element lens array, has reached Pixel-level wave front restoration precision, therefore can be realized the wave front restoration of superelevation spatial frequency.Importantly, breaking the mindset for promoting wave front restoration precision all the time, the super resolution algorithm for pursuing the arrangement of high density sub-aperture and complexity is no longer needed to, is had a very important significance in wavefront sensing art.
Description
Technical field
The present invention relates to optical information measurement and quantum Technology of Precision Measurement field more particularly to a kind of wavefront sensings
Device.
Background technique
Wavefront sensing technique is a contemporary optics measuring technique, passes through sampling, the modulation to far field beams intensity distribution
With detection, realizes that the reconstruct of Wave-front phase is restored, be widely used in wavefront correction, astronomical observation, medical imaging, laser technology
Equal fields.Typical Wavefront sensor includes shearing interferometer, curvature wavefront sensor and Hartmann wave front sensor.These are passed
Sensor has different characteristics and performance, suitable for different applications.The wherein Hartmann wave front sensor efficiency of light energy utilization
It is high, anti-noise ability is strong, it is succinct efficiently, can real-time measurement, have become common one of Wavefront sensor.
Typical Hartmann wave front sensor may refer to Chinese patent application prospectus (application number
98112210.8, publication number CN1245904) disclosed in a kind of optical wave-front sensor, it is by lens array by incident wavefront
Before being divided into multiple wavelets for regarding oblique incidence as, and an array photodetection is placed on the focal plane of lens array
Device, array photodetector generally use ccd detector or cmos detector, by detecting the offset of each focus,
The tilt quantity for measuring each sub-aperture wavefront reconstructs wavefront to be measured by restoring to the fitting before each wavelet.
However there are the inherent technological difficulties of following two points for Hartmann's wavefront sensing technique: (1) measurement accuracy and dynamic
Contradiction between state range.High-precision wavefront sensing needs are sufficiently sampled, which needs intensive sub-aperture to divide,
This will lead to sub-aperture area and becomes smaller, so that Wavefront sensor dynamic range becomes smaller.Therefore, it is past to promote wavefront measurement precision
Past is to sacrifice dynamic range as cost.(2) limitation of the spatial resolution of Hartmann wave front sensor.Hartmann sensor
Measurement accuracy relies primarily on sub-aperture density, but sub-aperture number can not infinitely increase, and each sub-aperture needs certain picture after all
Usually it is imaged.Therefore, from conventional detection analysis of strategies, Hartmann wave front sensor is difficult to reach the spatial resolution of Pixel-level.
Promoted Hartmann wave front sensor measurement accuracy have become a research hotspot, at present scheme often through increase device,
Algorithm complexity improves wave front restoration precision as far as possible, but can not break through this and basic limit.
Summary of the invention
The object of the present invention is to provide a kind of Wavefront sensors, get rid of the sub-aperture density limitation of lens array, make wave
Pixel-level level has been arrived in preceding measurement accuracy promotion.
The purpose of the present invention is what is be achieved through the following technical solutions:
A kind of Wavefront sensor, comprising: the first polarizing film, half wave plate, the calcite crystal, four points being sequentially placed
One of wave plate, the second polarizing film and array photodetectors be sequentially placed, and the optical surface of above-mentioned device and beam propagation side
To vertical.
As seen from the above technical solution provided by the invention, sensor structure is simple, and required optical element is few, in conjunction with
Current mature crystal growth and cutting technique, the potentiality with mass production.Meanwhile the wave based on the weak measurement of two-dimentional quantum
Front sensor eliminates the limitation of wavefront division sampling element lens array, has reached Pixel-level wave front restoration precision, therefore energy
Enough realize the wave front restoration of superelevation spatial frequency.Importantly, the thinking for breaking promotion wave front restoration precision all the time is fixed
Formula no longer needs to the super resolution algorithm for pursuing the arrangement of high density sub-aperture and complexity, has in wavefront sensing art particularly significant
Meaning.
Detailed description of the invention
In order to illustrate the technical solution of the embodiments of the present invention more clearly, required use in being described below to embodiment
Attached drawing be briefly described, it should be apparent that, drawings in the following description are only some embodiments of the invention, for this
For the those of ordinary skill in field, without creative efforts, it can also be obtained according to these attached drawings other
Attached drawing.
Fig. 1 is a kind of composed structure schematic diagram of Wavefront sensor provided in an embodiment of the present invention；
Fig. 2 is the laser beam wavefront schematic diagram that system needs to measure；
The aberration order schematic diagram that Fig. 3 needs the laser beam wavefront measured to include by system；
Fig. 4 is the wavefront schematic diagram restored using the Wavefront sensor based on the weak measurement of two-dimentional quantum；
Fig. 5 is the wavefront and wavefront residual error schematic diagram to be measured restored using the present invention.
Specific embodiment
With reference to the attached drawing in the embodiment of the present invention, technical solution in the embodiment of the present invention carries out clear, complete
Ground description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.Based on this
The embodiment of invention, every other implementation obtained by those of ordinary skill in the art without making creative efforts
Example, belongs to protection scope of the present invention.
The embodiment of the present invention provides a kind of Wavefront sensor, as shown in Figure 1, it specifically includes that 1, two point of the first polarizing film
One of wave plate 2, calcite crystal 3, quarter-wave plate 4, the second polarizing film 5 and array photodetectors 6, above-mentioned optical device
It is sequentially connected, and optical surface is vertical with direction of beam propagation.
Simultaneously:
First polarizing film optical axis is in the horizontal direction；
The half wave plate optical axis and vertical direction angle are 22.5 °；
The calcite crystal optical axis is located in perpendicular or is located in horizontal plane, and with direction of beam propagation angle
It is 42 °；
The quarter-wave plate optical axis and vertical direction angle are 45 °；
Second polarizing film optical axis is in the horizontal direction；
The array photodetectors are CCD camera, CMOS camera or ICCD camera.
As Fig. 2 indicates that the laser beam wavefront of parked, Fig. 3 indicate aberration possessed by laser beam wavefront shown in Fig. 2
Zernike coefficient.
To measure the laser beam wavefront that Fig. 2 is provided, laser beam wavefront is preselected using the Wavefront sensor
It selects, weak measurement and rear selection, the slope information of testing laser Beam Wave-Front is obtained, in conjunction with Hartmann's wavefront control algorithm reflex
Former laser beam wavefront.Detailed introduction is done below for preselected, weak measurement and rear selection three phases.
1, preselected
Carried out using the first polarizing film and half wave plate preselected: incident laser by optical axis in the horizontal direction the
Horizontal linear polarization light is modulated to after a piece of polarizing film | H >, the half for being 22.5 ° using optical axis and vertical direction angle
Wave plate, incident laser become linearly polarized lightIncident laser initial state preparation is completed, is indicated are as follows: | ψ >=
|ψ>path| D >, wherein | ψ >pathIt is expressed as testing laser space complex amplitude, | V > expression polarizes vertically.
2, weak measurement
Weak measurement is carried out using calcite crystal, is divided into following two processes:
First process: it is located at the calcite crystal for being 42 ° with direction of beam propagation angle in horizontal plane, laser light by optical axis
Son interacts with crystal, and photon state develops are as follows:
Wherein,Indicate measurement pointer,Indicating photon momentum, g indicates stiffness of coupling,Indicate Pu Lang
Gram constant, i indicate that imaginary number unit, t indicate the time of developing, and symbol ≡ expression is equal to,Indicate linear polarization.
Second process: rotation calcite crystal make its optical axis be located at perpendicular it is interior and with direction of beam propagation angle
42 °, laser photon is made to interact with crystal.
In the embodiment of the present invention, weak measurement can be carried out using the calcite crystal of specific cutting angle, it is micro- to get rid of
Limitation of the lens array to wave front restoration resolution ratio reduces dependence and demand to high-precision lenses array.
3, rear selection.
It is selected after being carried out using quarter-wave plate, the second polarizing film and array photodetectors:
First process corresponding to weak measurement: base is projected to right-handed rotation respectivelyAnd left-handed rotation
Project baseIt projects, the optical axis and vertical direction angle for respectively corresponding quarter-wave plate are -45 °
With+45 °, to receive light beam light distribution in array photodetectorsWithThus light intensity and the direction y laser are calculated
Beam Wave-Front slope kyRelationship:Wherein, ζ indicates the stiffness of coupling of calcite crystal；
Second process corresponding to weak measurement: identical principle is used, light beam is received in array photodetectors
Light distributionWithThus light intensity and the direction x laser beam wavefront slope k are calculatedxRelationship:
Entire measuring phases can use following steps to describe:
Step 1: it is brilliant that testing laser Beam Wave-Front successively passes through first polarizing film, half wave plate, calcite
Body (it is 42 ° that optical axis, which is located in horizontal plane with direction of beam propagation angle), (optical axis and vertical direction angle are quarter-wave plate
+ 45 °), second polarizing film in array photodetectors detect light beam light distribution
Step 2: on the basis of step 1, rotating the quarter-wave plate around optical propagation direction makes its optical axis and vertical
Angular separation is -45 °, and array photodetectors detect light beam light distribution
Step 3: on the basis of step 2, rotating the calcite crystal around optical propagation direction is located at its optical axis vertically
It is 42 ° in plane and with direction of beam propagation angle, array photodetectors detect light beam light distribution
Step 4: on the basis of step 3, rotating the quarter-wave plate around optical propagation direction makes its optical axis and vertical
Angular separation is+45 °, and array photodetectors detect light beam light distribution
Step 5: the light beam light distribution detected using array photodetectors measured by step 1-4 calculates wave to be measured
Preceding slope distribution are as follows:
Step 6: being distributed using wavefront slope obtained in step 5, in conjunction with traditional Hartmann's wavefront control algorithm, such as area
Domain method, type method reconstruct wavefront to be measured.
Fig. 4 is the laser beam wavefront restored using above-mentioned Wavefront sensor, and Fig. 5 indicates to restore wavefront and wavefront to be measured is residual
Difference.It can be seen that restore wavefront with it is almost completely the same before output wave, difference is very small, illustrates on provided by the present invention
It states Wavefront sensor and effectively detects wavefront error, realize wave front restoration, in addition, the wavefront slope sampled is Pixel-level, because
This wave front restoration can achieve Pixel-level spatial resolution.
Above-mentioned Wavefront sensor recovery provided in an embodiment of the present invention mainly has the advantages that this relative to traditional scheme
The wavefront sensor device structure for inventing offer is simple, and required optical element is few, crystal growth and cutting in conjunction with current maturation
Technique, the potentiality with mass production.Meanwhile step needed for measuring is simple and has continued to use traditional Hartmann's wave front restoration
Algorithm has the characteristics that the used time is short, high-efficient.In addition, the Wavefront sensor based on the weak measurement of two-dimentional quantum eliminates wavefront point
The limitation of tapping sample element lens array has reached Pixel-level wave front restoration precision, therefore can be realized superelevation spatial frequency
Wave front restoration.The present invention breaks the mindset for promoting wave front restoration precision all the time, no longer needs to pursue high density sub-aperture
The super resolution algorithm of arrangement and complexity, has a very important significance in wavefront sensing art.
The foregoing is only a preferred embodiment of the present invention, but scope of protection of the present invention is not limited thereto,
Within the technical scope of the present disclosure, any changes or substitutions that can be easily thought of by anyone skilled in the art,
It should be covered by the protection scope of the present invention.Therefore, protection scope of the present invention should be with the protection model of claims
Subject to enclosing.
Claims (5)
1. a kind of Wavefront sensor characterized by comprising the first polarizing film, the half wave plate, calcite being sequentially placed
Crystal, quarter-wave plate, the second polarizing film and array photodetectors are sequentially placed, and the optical surface and light of above-mentioned device
The beam direction of propagation is vertical.
2. a kind of Wavefront sensor according to claim 1, which is characterized in that
First polarizing film optical axis is in the horizontal direction；
The half wave plate optical axis and vertical direction angle are 22.5 °；
The calcite crystal optical axis is located in perpendicular or is located in horizontal plane, and is with direction of beam propagation angle
42°
The quarter-wave plate optical axis and vertical direction angle are 45 °；
Second polarizing film optical axis is in the horizontal direction；
The array photodetectors are CCD camera, CMOS camera or ICCD camera.
3. a kind of Wavefront sensor according to claim 1, which is characterized in that using the Wavefront sensor to laser light
Shu Boqian carries out preselected, weak measurement and rear selection, the slope information of testing laser Beam Wave-Front is obtained, in conjunction with Hartmann's wave
Preceding restoration algorithm restores laser beam wavefront.
4. a kind of Wavefront sensor according to claim 3, which is characterized in that the step of restoring laser beam wavefront is wrapped
It includes:
Step 1: testing laser Beam Wave-Front successively carries out preselected, warp with half wave plate by first polarizing film
It crosses optical axis to be located at the calcite crystal for being 42 ° with direction of beam propagation angle in horizontal plane and carries out weak measurement, by optical axis and erect
The quarter-wave plate, second polarizing film and array photodetectors that straight angular separation is+45 ° select after carrying out, and detect
Light beam light distribution
Step 2: on the basis of step 1, rotating the quarter-wave plate around optical propagation direction makes its optical axis and vertical direction
Angle is -45 °, and array photodetectors detect light beam light distribution
Step 3: on the basis of step 2, rotating the calcite crystal around optical propagation direction makes its optical axis be located at perpendicular
Interior and be 42 ° with direction of beam propagation angle, array photodetectors detect light beam light distribution
Step 4: on the basis of step 3, rotating the quarter-wave plate around optical propagation direction makes its optical axis and vertical direction
Angle is+45 °, and array photodetectors detect light beam light distribution
Step 5: calculating the slope distribution of wavefront to be measured are as follows:
Wherein, ζ indicates the stiffness of coupling of calcite crystal；
Step 6: being distributed using wavefront slope obtained in step 5, restore laser beam in conjunction with Hartmann's wavefront control algorithm
Wavefront.
5. a kind of Wavefront sensor according to claim 3 or 4, which is characterized in that
Preselected using the first polarizing film and the progress of half wave plate: incident laser passes through first of optical axis along the vertical direction
Horizontal linear polarization light is modulated to after polarizing film | H >, the half wave for being 22.5 ° using optical axis and vertical direction angle
Piece, incident laser become linearly polarized lightIncident laser initial state preparation is completed, is indicated are as follows: | Ψ >=| ψ
>path| D >, wherein | ψ >pathIt is expressed as testing laser space complex amplitude, | V > expression polarizes vertically；
Weak measurement is carried out using calcite crystal, is divided into following two processes:
First process: it is located at the calcite crystal for being 42 ° with direction of beam propagation angle in horizontal plane, laser photon by optical axis
It interacts with crystal, photon state develops are as follows:
Wherein,Indicate measurement pointer,Indicating photon momentum, g indicates stiffness of coupling,Indicate linear polarization；
Second process: rotation calcite crystal make its optical axis be located at perpendicular it is interior and with 42 ° of direction of beam propagation angle,
Laser photon is set to interact with crystal；
It is selected after being carried out using quarter-wave plate, the second polarizing film and array photodetectors:
First process corresponding to weak measurement: base is projected to right-handed rotation respectivelyIt is projected with left-handed rotation
BaseProject, respectively correspond the optical axis of quarter-wave plate and vertical direction angle be -45 ° and+
45 °, to receive light beam light distribution in array photodetectorsWithThus light intensity and the direction y laser light are calculated
Beam wavefront slope kyRelationship:Wherein, ζ indicates the stiffness of coupling of calcite crystal；
Second process corresponding to weak measurement: identical principle is used, light beam light intensity is received in array photodetectors
DistributionWithThus light intensity and the direction x laser beam wavefront slope k are calculatedxRelationship:
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112484865A (en) * | 2020-11-20 | 2021-03-12 | 中国科学院光电技术研究所 | Real-time polarization modulation Hartmann-shack wavefront detection device |
| CN112484864A (en) * | 2020-11-20 | 2021-03-12 | 中国科学院光电技术研究所 | Polarization modulation Hartmann-shack wavefront detection device |
| CN114323310A (en) * | 2021-12-28 | 2022-04-12 | 中国科学院光电技术研究所 | High-resolution Hartmann wavefront sensor |
| CN115510342A (en) * | 2022-11-23 | 2022-12-23 | 沐曦集成电路(上海)有限公司 | Method, apparatus, medium, and device for maintaining out-of-order data using multi-level pointers |
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| US7006234B1 (en) * | 2002-01-09 | 2006-02-28 | Interphase Technologies, Inc. | Common-path point-diffraction phase-shifting interferometer incorporating a birefringent polymer membrane |
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| CN209310928U (en) * | 2019-01-09 | 2019-08-27 | 中国科学技术大学 | A kind of Wavefront sensor |
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|---|---|---|---|---|
| US7006234B1 (en) * | 2002-01-09 | 2006-02-28 | Interphase Technologies, Inc. | Common-path point-diffraction phase-shifting interferometer incorporating a birefringent polymer membrane |
| CN104819780A (en) * | 2015-02-12 | 2015-08-05 | 四川大学 | Non-common-optical-path loop radial shear polarization phase shift interferometer |
| CN209310928U (en) * | 2019-01-09 | 2019-08-27 | 中国科学技术大学 | A kind of Wavefront sensor |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112484865A (en) * | 2020-11-20 | 2021-03-12 | 中国科学院光电技术研究所 | Real-time polarization modulation Hartmann-shack wavefront detection device |
| CN112484864A (en) * | 2020-11-20 | 2021-03-12 | 中国科学院光电技术研究所 | Polarization modulation Hartmann-shack wavefront detection device |
| CN112484865B (en) * | 2020-11-20 | 2022-06-28 | 中国科学院光电技术研究所 | Real-time polarization modulation Hartmann-shack wavefront detection device |
| CN112484864B (en) * | 2020-11-20 | 2022-07-19 | 中国科学院光电技术研究所 | Polarization modulation Hartmann-shack wavefront detection device |
| CN114323310A (en) * | 2021-12-28 | 2022-04-12 | 中国科学院光电技术研究所 | High-resolution Hartmann wavefront sensor |
| CN114323310B (en) * | 2021-12-28 | 2023-05-26 | 中国科学院光电技术研究所 | High-resolution Hartmann wavefront sensor |
| CN115510342A (en) * | 2022-11-23 | 2022-12-23 | 沐曦集成电路(上海)有限公司 | Method, apparatus, medium, and device for maintaining out-of-order data using multi-level pointers |
| CN115510342B (en) * | 2022-11-23 | 2023-03-28 | 沐曦集成电路(上海)有限公司 | Method, apparatus, medium, and device for maintaining out-of-order data using multi-level pointers |
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