CN114200785B - Position triggering system and method for maskless laser direct-write lithography - Google Patents

Position triggering system and method for maskless laser direct-write lithography Download PDF

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Publication number
CN114200785B
CN114200785B CN202111600359.9A CN202111600359A CN114200785B CN 114200785 B CN114200785 B CN 114200785B CN 202111600359 A CN202111600359 A CN 202111600359A CN 114200785 B CN114200785 B CN 114200785B
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trigger
triggering
direct
actual
exposure
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CN114200785A (en
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霍大云
茆荣超
杨琳韵
汪留芳
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Xifan Semiconductor Wuxi Co ltd
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Xifan Semiconductor Wuxi Co ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The invention relates to a position triggering system and a position triggering method for maskless laser direct-writing lithography. The device comprises a motion trail sampling device, a position triggering device and an upper computer; the upper computer transmits the acquired equidistant triggered position trigger error compensation table and the direct-writing photoetching working parameters corresponding to the current direct-writing photoetching pattern into the position trigger device, the position trigger device determines the actual trigger position according to the direct-writing photoetching working parameters and the position trigger error compensation table, and when the current position of the motion platform is determined to be matched with the actual trigger position determined by the position trigger device according to the received Y-direction actual motion track, the position trigger device sends an exposure trigger signal to the connected DMD digital micromirror, so that the DMD digital micromirror performs required exposure according to the received exposure trigger signal. The invention can effectively realize equidistant position triggering, eliminate Y-direction dislocation during equidistant triggering, improve the quality of exposure images, and is safe and reliable.

Description

Position triggering system and method for maskless laser direct-write lithography
Technical Field
The invention relates to a position triggering system and a method, in particular to a position triggering system and a method for maskless laser direct-writing lithography.
Background
The maskless laser direct-writing lithography technology specifically refers to that a digital mask of a spatial light modulator is used for replacing a physical mask of traditional lithography, and the maskless laser direct-writing lithography technology is used for saving the manufacturing cost of a mask; meanwhile, the digital mask can be changed rapidly by directly modifying the design pattern in software, so that the flexibility of photoetching is enhanced.
The maskless laser direct writing lithography principle is that the turning of the DMD digital micromirror is synchronized with the motion of the motion stage, so that the exposure pattern is transferred to the photosensitive dry film on the motion stage. In particular lithography, how to ensure the accuracy of the synchronous motion will directly relate to the quality of the exposure. In theory, if the motion platform moves at a uniform speed, the DMD digital micromirror can be triggered at equal time, but in practice, it is difficult to ensure the absolute uniform speed of the motion platform, so that the DMD digital micromirror can be triggered at equal intervals to control the exposure quality.
The accuracy of the exposure image can be basically ensured by equidistant triggering, but due to the existence of position errors caused by factors such as installation errors of a moving platform, working environment and the like, when the position errors exist, the dislocation of the exposure image in the Y direction can occur, and how to eliminate the dislocation in the Y direction during equidistant triggering is a technical problem which needs to be solved urgently at present.
Disclosure of Invention
The invention aims to overcome the defects in the prior art and provides a position triggering system and a method for maskless laser direct-writing lithography, which can effectively realize equidistant position triggering, eliminate Y-direction dislocation during equidistant triggering, improve the quality of exposure images, and have wide application range, safety and reliability.
According to the technical scheme provided by the invention, the position triggering system for maskless laser direct-writing lithography comprises a motion track sampling device, a position triggering device and an upper computer, wherein the position triggering device is connected with the motion track sampling device in an adapting way;
the upper computer transmits the position trigger error compensation table triggered equidistantly and the direct-writing photoetching working parameters corresponding to the current direct-writing photoetching pattern to the position trigger device, acquires the actual motion trail of the motion platform in the Y direction in real time through the motion trail sampling device, and transmits the acquired Y-direction actual motion trail to the position trigger device;
The position triggering device determines an actual triggering position according to the direct-writing photoetching working parameters and the position triggering error compensation table, and when the current position of the motion platform is determined to be matched with the actual triggering position determined by the position triggering device according to the received Y-direction actual motion track, the position triggering device sends an exposure triggering signal to the connected DMD digital micro-mirror so that the DMD digital micro-mirror performs required exposure according to the received exposure triggering signal.
The direct-writing photoetching working parameters acquired by the upper computer comprise trigger starting points, trigger intervals and/or total position trigger compensation times.
The motion trail sampling device comprises a grating ruler.
The position triggering device comprises a differential/single-ended circuit, a ZYNQ minimum system, a photoelectric isolation circuit and a single-ended/differential circuit which are connected in sequence, wherein the differential/single-ended circuit can be connected with the motion trail sampling device in an adaptive manner, the single-ended/differential circuit is connected with the DMD digital micro-mirror in an adaptive manner, and the ZYNQ minimum system is connected with the upper computer in an adaptive manner;
the ZYNQ minimum system receives a position trigger error compensation table triggered equidistantly and transmitted by an upper computer, and the position trigger error compensation table corresponds to the current direct-writing lithography working parameters of the direct-writing lithography graph; the differential/single-ended circuit can be added with the motion trail sampling device to acquire the actual motion trail of the motion platform in the Y direction and transmit the actual motion trail to the ZYNQ minimum system;
The ZYNQ minimum system determines an actual trigger position according to the direct-writing photoetching working parameters and the position trigger error compensation table, when the current position of the motion platform is determined to be matched with the determined actual trigger position according to the received Y-direction actual motion track, the ZYNQ minimum system generates an exposure trigger signal, and the ZYNQ minimum system loads the generated exposure trigger signal to a DMD digital micromirror connected with the single-end/differential circuit through the photoelectric isolation circuit and the single-end/differential circuit.
The ZYNQ minimum system comprises an ARM processor and an FPGA processor, wherein the ARM processor is used for being connected with an upper computer in an adapting mode, the FPGA processor is connected with the ARM processor in an adapting mode, the ARM processor is communicated with the upper computer through a TCP, and the upper computer transmits a position trigger error compensation table for acquiring equidistant triggers and direct-writing photoetching working parameters corresponding to the current direct-writing photoetching graph to the ARM processor;
the ARM processor sends the position trigger error compensation table triggered equidistantly and the direct-writing photoetching working parameters into the FPGA processor to be stored by the BRAM of the FPGA processor;
Configuring an FPGA processor to at least form a coding module, a compensation module and a triggering module; determining and recording the current position of the motion platform according to the actual motion track of the motion platform in the Y direction through an encoding module, and generating an encoding pulse signal;
The compensation module compensates the coded pulse signal in real time according to the position trigger compensation value of the position trigger compensation table so as to generate a compensation pulse signal; the trigger module generates an exposure trigger signal according to the compensation pulse module generated by the compensation module, and sends the exposure trigger signal to the DMD digital micromirror.
The ARM processor is connected with the FPGA processor through an AXI_LITE bus, and the ARM processor is connected with the upper computer in an adaptive manner through the gigabit network module.
The position triggering device is adaptively connected with one or more DMD digital micromirrors.
A position triggering method for maskless laser direct writing lithography provides a motion track sampling device, a position triggering device which is connected with the motion track sampling device in an adapting way, and an upper computer which is connected with the position triggering device in an adapting way;
the upper computer transmits the position trigger error compensation table triggered equidistantly and the direct-writing photoetching working parameters corresponding to the current direct-writing photoetching pattern to the position trigger device, acquires the actual motion trail of the motion platform in the Y direction in real time through the motion trail sampling device, and transmits the acquired Y-direction actual motion trail to the position trigger device;
The position triggering device determines an actual triggering position according to the direct-writing photoetching working parameters and the position triggering error compensation table, and when the current position of the motion platform is determined to be matched with the actual triggering position determined by the position triggering device according to the received Y-direction actual motion track, the position triggering device sends an exposure triggering signal to the connected DMD digital micro-mirror so that the DMD digital micro-mirror performs required exposure according to the received exposure triggering signal.
When the position trigger error compensation table triggered equidistantly is obtained, the direct-writing lithography working parameters obtained by the upper computer comprise trigger starting points, trigger intervals and/or total position trigger compensation times.
The position triggering device comprises a differential/single-ended circuit, a ZYNQ minimum system, a photoelectric isolation circuit and a single-ended/differential circuit which are connected in sequence, wherein the differential/single-ended circuit can be connected with the motion trail sampling device in an adaptive manner, the single-ended/differential circuit is connected with the DMD digital micro-mirror in an adaptive manner, and the ZYNQ minimum system is connected with the upper computer in an adaptive manner;
The ZYNQ minimum system receives a position trigger error compensation table triggered equidistantly and transmitted by an upper computer, and the position trigger error compensation table corresponds to the current direct-writing lithography working parameters of the direct-writing lithography graph; the differential/single-ended circuit (6) can be added with a motion track sampling device to acquire the actual motion track of the motion platform in the Y direction and transmit the actual motion track to the ZYNQ minimum system;
The ZYNQ minimum system determines an actual trigger position according to the direct-writing photoetching working parameters and the position trigger error compensation table, when the current position of the motion platform is determined to be matched with the determined actual trigger position according to the received Y-direction actual motion track, the ZYNQ minimum system generates an exposure trigger signal, and the ZYNQ minimum system loads the generated exposure trigger signal to a DMD digital micromirror connected with the single-end/differential circuit through the photoelectric isolation circuit and the single-end/differential circuit.
The invention has the advantages that: the upper computer transmits the position trigger error compensation table triggered equidistantly and the direct-writing photoetching working parameters corresponding to the current direct-writing photoetching pattern to the position trigger device, acquires the actual motion trail of the motion platform in the Y direction in real time through the motion trail sampling device, and transmits the acquired Y-direction actual motion trail to the position trigger device;
The position triggering device determines the actual triggering position according to the direct-writing photoetching working parameters and the position triggering error compensation table, and when the current position of the moving platform is determined to be matched with the actual triggering position determined by the position triggering device according to the received actual movement track in the Y direction, the position triggering device sends an exposure triggering signal to the connected DMD digital micro-mirror, so that the DMD digital micro-mirror performs required exposure according to the received exposure triggering signal, equidistant position triggering can be effectively realized, dislocation in the Y direction during equidistant triggering is eliminated, the quality of an exposure image is improved, the application range is wide, and the method is safe and reliable.
Drawings
Fig. 1 is a system block diagram of the present invention.
Fig. 2 is a circuit block diagram of the position trigger apparatus of the present invention.
FIG. 3 is a flow chart of the present invention.
Reference numerals illustrate: the system comprises a 1-upper computer, a 2-position triggering device, a 3-motion track sampling device, a 4-DMD digital micromirror, a 5-ZYNQ minimum system, a 6-differential/single-ended circuit, a 7-gigabit network module, an 8-photoelectric isolation circuit and a 9-single-ended/differential circuit.
Detailed Description
The invention will be further described with reference to the following specific drawings and examples.
As shown in fig. 1: in order to effectively realize equidistant position triggering, eliminate Y-direction dislocation during equidistant triggering and improve the quality of exposure images, the invention comprises a motion trail sampling device 3, a position triggering device 2 which is connected with the motion trail sampling device 3 in an adapting way, and an upper computer 1 which is connected with the position triggering device 2 in an adapting way;
The upper computer 1 transmits the position trigger error compensation table triggered equidistantly and the direct-writing photoetching working parameters corresponding to the current direct-writing photoetching pattern to the position trigger device 2, acquires the actual motion trail of the motion platform in the Y direction in real time through the motion trail sampling device 3, and transmits the acquired Y-direction actual motion trail to the position trigger device 2;
The position triggering device 2 determines an actual triggering position according to the direct-writing photoetching working parameters and the position triggering error compensation table, and when the current position of the moving platform is determined to be matched with the actual triggering position determined by the position triggering device 2 according to the received actual movement track in the Y direction, the position triggering device 2 sends an exposure triggering signal to the connected DMD digital micro-mirror 4 so that the DMD digital micro-mirror 4 performs required exposure according to the received exposure triggering signal.
Specifically, the motion track sampling device 3 can sample the actual motion track of the motion platform in the Y direction, and the actual motion track of the motion platform in the Y direction is related to a specific direct-writing lithography process, is in accordance with the existing technology, and is well known to those skilled in the art, and will not be described herein. The motion track sampling device 3 comprises a grating ruler, and when the motion track sampling device 3 adopts the grating ruler, the process of acquiring the actual motion track of the motion platform in the Y direction through the reading head of the grating ruler is consistent with the prior art, and is well known to the person skilled in the art, and the details are not repeated here; of course, in the implementation, the motion sampling device 3 may also adopt other implementation forms, and may be specifically selected according to requirements. The upper computer 1 may be generally in the form of a computer or the like, and may be specifically selected as needed.
In the implementation, for a determined maskless laser direct-write lithography, according to the specific situation of the direct-write lithography pattern, the direct-write lithography working parameters corresponding to the current direct-write lithography pattern can be obtained, and in the implementation, the direct-write lithography working parameters comprise trigger starting points, trigger spacing and/or total position trigger compensation times. The total number of compensation triggers can be specifically determined for the direct-write lithography pattern, the trigger interval, etc., which are well known to those skilled in the art, and will not be described herein.
In order to compensate the position error during equidistant triggering and improve the accuracy of maskless laser direct-writing lithography, a position trigger error compensation table triggered equidistantly needs to be acquired. In the specific implementation, for the current motion platform, a circle with a fixed distance is exposed on a photosensitive dry film and the like arranged on the motion platform by using calibrated equipment, and the specific exposure mode and the specific exposure process are consistent with the existing one, so that the detailed description is omitted. Specifically, the circle center of the first circle is used as a trigger starting point, and corresponding circles are sequentially exposed after the circle center of the trigger starting point according to the trigger interval; in the exposed circles, the circle center distance of the adjacent circles is equal to the trigger distance in the direct-writing photoetching working parameters. The number of the exposure circles is consistent with the total number of the position trigger compensation determined according to the current direct-writing photoetching pattern, namely the total number of the trigger exposure of the actual direct-writing photoetching. After exposing the circles with fixed pitches consistent with the trigger pitches, the pitch error of each circle center is confirmed, and the specific pitch error process and mode can be selected according to the needs, so that the details are not repeated here. In the specific implementation, according to the distance error of each circle center, the position trigger error compensation value of the trigger position corresponding to the distance between the trigger points after the trigger start point is obtained, and the position trigger error compensation table is obtained after all the position trigger error compensation values are integrated. Of course, other manners may be adopted to obtain the position trigger error compensation table triggered equidistantly, and the position trigger error compensation table may be specifically selected according to needs, which will not be described herein.
In the embodiment of the present invention, after the upper computer 1 acquires the equidistant triggered position trigger error compensation table and the direct-write lithography working parameter corresponding to the current direct-write lithography pattern, the equidistant triggered position trigger error compensation table and the direct-write lithography working parameter corresponding to the current direct-write lithography pattern need to be transmitted to the position trigger device 2, so that the position trigger device 2 performs the required equidistant triggering on the DMD digital micromirror 4.
In the implementation, after receiving the direct-writing lithography working parameters and the position trigger error compensation table, the position trigger device 2 can determine the actual trigger positions when all the positions are triggered. After the actual motion trail of the motion platform in the Y direction is obtained by the motion trail sampling device 3, the position triggering device 2 determines the current position of the motion platform according to the actual motion trail of the motion platform in the Y direction. The position triggering device 2 can compare the current position of the moving platform with the actual triggering position, and when the current position of the moving platform is determined to be matched with the actual triggering position determined by the position triggering device 2 according to the received Y-direction actual movement track, the position triggering device 2 sends an exposure triggering signal to the connected DMD digital micro-mirror 4 so that the DMD digital micro-mirror 4 performs the required exposure according to the received exposure triggering signal. The specific working process of the DMD digital micromirror 4 after receiving the exposure trigger signal is consistent with the prior art, and is well known in the art, and will not be described herein.
As shown in fig. 2, the position triggering device 2 includes a differential/single-ended circuit 6, a ZYNQ minimum system 5, a photoelectric isolation circuit 8 and a single-ended/differential circuit 9, which are sequentially connected, wherein the differential/single-ended circuit 6 can be connected with the motion track sampling device 3 in an adaptive manner, and the single-ended/differential circuit 9 is connected with the DMD digital micromirror 4 in an adaptive manner, and the ZYNQ minimum system 5 is connected with the upper computer 1 in an adaptive manner;
The ZYNQ minimum system 5 receives the equidistant triggered position trigger error compensation table transmitted by the upper computer 1 and the direct-writing lithography working parameters corresponding to the current direct-writing lithography pattern; the differential/single-ended circuit 6 can be added with the motion trail sampling device 3 to acquire the actual motion trail of the motion platform in the Y direction and transmit the actual motion trail to the ZYNQ minimum system 5;
The ZYNQ minimum system 5 determines an actual trigger position according to the direct-writing photoetching working parameters and the position trigger error compensation table, when the current position of the moving platform is determined to be matched with the determined actual trigger position according to the received actual motion track in the Y direction, the ZYNQ minimum system 5 generates an exposure trigger signal, and the ZYNQ minimum system 5 loads the generated exposure trigger signal to the DMD digital micromirror 4 connected with the single-ended/differential circuit 9 through the photoelectric isolation circuit 8 and the single-ended/differential circuit 9.
In the embodiment of the present invention, the differential/single-ended circuit 6, the photo-isolation circuit 8 and the single-ended/differential circuit 9 may all take the conventional common forms, for example, the differential/single-ended circuit 6 may take the form of a chip with the model number of AM26C32, the photo-isolation circuit 8 may take the form of a high-speed optocoupler chip with the model number of TLP291, the single-ended/differential circuit 9 may take the form of a chip with the model number of AM26C31, and of course, the differential/single-ended circuit 6, the photo-isolation circuit 8 and the single-ended/differential circuit 9 may take other forms as needed, which may be specifically selected according to the need, and will not be repeated here. The anti-interference capability can be effectively improved through the differential/single-ended circuit 6, the photoelectric isolation circuit 8 and the single-ended/differential circuit 9, so that the exposure trigger signal can be transmitted to the DMD digital micro-mirror 4 completely without distortion.
In specific implementation, the ZYNQ minimum system 5 is an extensible processing platform pushed out by Xilinx, and specific functions of the position triggering device 2 are realized through the ZYNQ minimum system 5, specifically, the ZYNQ minimum system 5 comprises an ARM processor used for being adaptively connected with the upper computer 1 and an FPGA processor adaptively connected with the ARM processor, wherein the ARM processor is communicated with the upper computer 1 through a TCP, and the upper computer 1 transmits a position triggering error compensation table triggered by an acquired equidistance and a direct-writing lithography working parameter corresponding to a current direct-writing lithography figure to the ARM processor;
the ARM processor sends the position trigger error compensation table triggered equidistantly and the direct-writing photoetching working parameters into the FPGA processor to be stored by the BRAM of the FPGA processor;
Configuring an FPGA processor to at least form a coding module, a compensation module and a triggering module; determining and recording the current position of the motion platform according to the actual motion track of the motion platform in the Y direction through an encoding module, and generating an encoding pulse signal;
The compensation module compensates the coded pulse signal in real time according to the position trigger compensation value of the position trigger compensation table so as to generate a compensation pulse signal; the trigger module generates an exposure trigger signal according to the compensation pulse module generated by the compensation module, and sends the exposure trigger signal to the DMD digital micromirror 4.
In the embodiment of the present invention, the ZYNQ minimum system 5 includes an ARM processor and an FPGA processor, where the ARM processor can be adaptively connected with the upper computer 1, and at least an encoding module, a compensation module and a triggering module can be formed by configuring the FPGA processor.
In specific implementation, the ARM processor is connected with the FPGA processor through an AXI_LITE bus, and the ARM processor is connected with the upper computer 1 in an adaptive manner through the gigabit network module 7. When the ARM processor is connected with the FPGA processor through the AXI_LITE bus, an AXI communication module is formed when the PFGA processor is configured, namely the AXI communication module is responsible for communication between the ARM processor and the FPGA processor, and the ARM processor and the FPGA processor are mainly data of parameters and commands, so that the communication between the ARM processor and the FPGA processor is not influenced through the AXI_LITE bus. Generally, in an FPGA processor, data of a command class is latched by a register, and data of a parameter class is interacted by using a BRAM.
In the implementation, the position trigger device 2 is adaptively connected with one or more DMD digital micromirrors 4, the number of DMD digital micromirrors 4 connected with the position trigger device 2 can be selected according to needs, and the manner of implementing direct-writing lithography of multiple paths of lithography patterns by utilizing multiple paths of DMD digital micromirrors 4 is consistent with the existing manner, which is well known to those skilled in the art, and is not repeated herein. When connected with the multi-path DMD digital micromirror 4, individual position trigger error compensation can be performed for each path of exposure trigger signal.
In the embodiment of the invention, after the ARM processor communicates with the upper computer 1 through the gigabit network module 4, the upper computer 1 sends the direct-writing lithography working parameters required by the exposure and the position trigger error compensation table of each path to the ARM processor, and the ARM processor analyzes the position trigger error compensation table and transmits the analyzed position trigger error compensation table to the BRAM of the FPGA processor. The specific parsing mode and process of the position trigger error compensation table by the ARM processor can be selected according to actual needs, so that the ARM processor can conveniently read the position trigger error compensation table after parsing, and the ARM processor is well known to the person skilled in the art and is not described in detail herein.
When the motion trail sampling device 3 adopts the grating scale, the coding module mainly filters and codes the ABZ signals fed back by the reading head of the grating scale, the purpose is to record the positions represented by the ABZ signals and generate coding pulse signals, the coding module can generate the coding pulse signals related to the positions by adopting the technical means commonly used in the technical field, and the coding pulse signals can be specifically selected according to actual needs and are not repeated here.
The compensation module is used for compensating the coded pulse signals of the coding module in real time mainly according to the position triggering error compensation table and generating compensated pulse signals;
the triggering module is used for generating an exposure triggering signal from the compensation pulse signal processed by the compensation module and sending the exposure triggering signal to the DMD digital micromirror 4.
In summary, the position triggering method for maskless laser direct-writing lithography of the present invention is obtained, and a motion track sampling device 3, a position triggering device 2 adaptively connected with the motion track sampling device 3, and an upper computer 1 adaptively connected with the position triggering device 2 are provided;
The upper computer 1 transmits the position trigger error compensation table triggered equidistantly and the direct-writing photoetching working parameters corresponding to the current direct-writing photoetching pattern to the position trigger device 2, acquires the actual motion trail of the motion platform in the Y direction in real time through the motion trail sampling device 3, and transmits the acquired Y-direction actual motion trail to the position trigger device 2;
The position triggering device 2 determines an actual triggering position according to the direct-writing photoetching working parameters and the position triggering error compensation table, and when the current position of the moving platform is determined to be matched with the actual triggering position determined by the position triggering device 2 according to the received actual movement track in the Y direction, the position triggering device 2 sends an exposure triggering signal to the connected DMD digital micro-mirror 4 so that the DMD digital micro-mirror 4 performs required exposure according to the received exposure triggering signal.
In the embodiment of the present invention, the specific situations of the upper computer 1, the position triggering module 2 and the motion trail sampling device 3 may refer to the above description, and will not be repeated here. As shown in fig. 3, in order to perform equidistant position triggering, in fig. 3, the mapping table obtained by measurement is the position triggering error compensation table, and when exposure is started, the motion platform needs to be driven to move to the triggering start point, and the triggering start point can be specifically determined selectively according to the need, which is well known to those skilled in the art and is not described herein.
The following is a specific description of an example of a specific location trigger. Specifically, the trigger starting point is set to 20000cnt, the trigger interval is set to 20000, and according to the trigger starting point and the trigger interval, specific positions to be subjected to position compensation can be obtained as follows: 20000, 40000, 60000, and so on, the total number of specific position trigger offsets may be determined according to the digital mask pattern and the trigger spacing, as is well known to those skilled in the art. In the specific implementation, when the position is specifically compensated at 20000, 40000, 60000, the corresponding position trigger error compensation value in the position trigger error compensation table may be a positive value or a negative value, and specifically, the position trigger error compensation table is determined when the position trigger error compensation table is obtained according to the actual calibration, which is not described herein. If the position trigger compensation value is +2 at 40000, the position trigger module 2 will send an exposure trigger signal to the DMD digital micromirror 4 at 40000+2; if the position trigger compensation value is-5 at 60000, the position trigger module 2 sends an exposure trigger signal to the DMD digital micromirror 4 at 60000-5. When equidistant triggering is adopted, since each triggering position has a corresponding position triggering error compensation value, the compensation of the subsequent position triggering can be specifically determined according to the position triggering error compensation value in the position triggering error compensation table, and the detailed description is omitted here.
In the implementation, the ending condition of the position trigger can be specifically determined according to the total position trigger compensation times or the digital mask pattern during exposure, if the total position trigger times are adopted as the ending condition, after the position trigger error compensation value compensation is carried out each time, the position trigger times are accumulated until the position trigger times reach the total position trigger times.

Claims (3)

1. A position triggering system for maskless laser direct-write lithography, characterized by: the device comprises a motion trail sampling device (3), a position triggering device (2) which is connected with the motion trail sampling device (3) in an adapting way, and an upper computer (1) which is connected with the position triggering device (2) in an adapting way;
The upper computer (1) transmits the position trigger error compensation table triggered equidistantly and the direct-writing photoetching working parameters corresponding to the current direct-writing photoetching pattern to the position trigger device (2), acquires the actual motion trail of the motion platform in the Y direction in real time through the motion trail sampling device (3), and transmits the acquired Y-direction actual motion trail to the position trigger device (2);
The position triggering device (2) determines an actual triggering position according to the direct-writing photoetching working parameters and the position triggering error compensation table, and when the current position of the moving platform is determined to be matched with the actual triggering position determined by the position triggering device (2) according to the received actual movement track in the Y direction, the position triggering device (2) sends an exposure triggering signal to the connected DMD digital micro-mirror (4) so that the DMD digital micro-mirror (4) performs required exposure according to the received exposure triggering signal;
the direct-writing photoetching working parameters acquired by the upper computer (1) comprise trigger starting points, trigger intervals and/or position trigger compensation total times;
For the current motion platform, exposing circles with fixed intervals on the photosensitive dry film arranged on the motion platform by using calibrated equipment, taking the circle center of the first circle exposed as a trigger starting point, and exposing corresponding circles after the circle center of the trigger starting point according to the trigger interval; in the exposed circles, the circle center distance of the adjacent circles is equal to the trigger interval in the direct-writing photoetching working parameters; after exposing a circle with fixed spacing consistent with the triggering spacing, confirming the spacing error of each circle center, obtaining a position triggering error compensation value of a triggering position corresponding to the interval triggering spacing after triggering a starting point according to the acquired spacing error of each circle center, and obtaining a position triggering error compensation table after integrating all the position triggering error compensation values;
The position triggering device (2) comprises a differential/single-ended circuit (6), a ZYNQ minimum system (5), a photoelectric isolation circuit (8) and a single-ended/differential circuit (9) which are sequentially connected, wherein the differential/single-ended circuit (6) can be connected with the motion track sampling device (3) in an adaptive manner, the single-ended/differential circuit (9) is connected with the DMD digital micromirror (4) in an adaptive manner, and the ZYNQ minimum system (5) is connected with the upper computer (1) in an adaptive manner;
The ZYNQ minimum system (5) receives a position trigger error compensation table triggered equidistantly and transmitted by the upper computer (1) and a direct-writing lithography working parameter corresponding to the current direct-writing lithography pattern; the differential/single-ended circuit (6) can transmit the actual motion track of the motion platform in the Y direction acquired by the motion track sampling device (3) to the ZYNQ minimum system (5);
The ZYNQ minimum system (5) determines an actual trigger position according to the direct-writing photoetching working parameters and a position trigger error compensation table, when the current position of the moving platform is determined to be matched with the determined actual trigger position according to the received actual motion track in the Y direction, the ZYNQ minimum system (5) generates an exposure trigger signal, and the ZYNQ minimum system (5) loads the generated exposure trigger signal to a DMD digital micromirror (4) connected with the single-ended/differential circuit (9) through a photoelectric isolation circuit (8) and the single-ended/differential circuit (9);
The ZYNQ minimum system (5) comprises an ARM processor and an FPGA processor, wherein the ARM processor is connected with the upper computer (1) in an adapting mode, the FPGA processor is connected with the ARM processor in an adapting mode, the ARM processor is communicated with the upper computer (1) through a TCP, and the upper computer (1) transmits a position trigger error compensation table for acquiring equidistant trigger and a direct-writing photoetching working parameter corresponding to a current direct-writing photoetching pattern to the ARM processor;
the ARM processor sends the position trigger error compensation table triggered equidistantly and the direct-writing photoetching working parameters into the FPGA processor to be stored by the BRAM of the FPGA processor;
Configuring an FPGA processor to at least form a coding module, a compensation module and a triggering module; determining and recording the current position of the motion platform according to the actual motion track of the motion platform in the Y direction through an encoding module, and generating an encoding pulse signal;
The compensation module compensates the coded pulse signal in real time according to the position trigger compensation value of the position trigger compensation table so as to generate a compensation pulse signal; the trigger module generates an exposure trigger signal according to the compensation pulse module generated by the compensation module and sends the exposure trigger signal to the DMD digital micromirror (4);
The motion trail sampling device (3) comprises a grating ruler;
The ARM processor is connected with the FPGA processor through an AXI_LITE bus, and the ARM processor is connected with the upper computer (1) in an adaptive manner through the gigabit network module (7).
2. The position triggering system for maskless laser direct write lithography of claim 1, characterized by: the position triggering device (2) is connected with one or more DMD digital micromirrors (4) in a matching way.
3. A position triggering method for maskless laser direct-writing lithography is characterized by providing a motion track sampling device (3), a position triggering device (2) which is connected with the motion track sampling device (3) in an adapting way, and an upper computer (1) which is connected with the position triggering device (2) in an adapting way;
The upper computer (1) transmits the position trigger error compensation table triggered equidistantly and the direct-writing photoetching working parameters corresponding to the current direct-writing photoetching pattern to the position trigger device (2), acquires the actual motion trail of the motion platform in the Y direction in real time through the motion trail sampling device (3), and transmits the acquired Y-direction actual motion trail to the position trigger device (2);
The position triggering device (2) determines an actual triggering position according to the direct-writing photoetching working parameters and the position triggering error compensation table, and when the current position of the moving platform is determined to be matched with the actual triggering position determined by the position triggering device (2) according to the received actual movement track in the Y direction, the position triggering device (2) sends an exposure triggering signal to the connected DMD digital micro-mirror (4) so that the DMD digital micro-mirror (4) performs required exposure according to the received exposure triggering signal;
when a position trigger error compensation table triggered equidistantly is obtained, the direct-writing photoetching working parameters obtained by the upper computer (1) comprise trigger starting points, trigger intervals and/or total position trigger compensation times;
For the current motion platform, exposing circles with fixed intervals on the photosensitive dry film arranged on the motion platform by using calibrated equipment, taking the circle center of the first circle exposed as a trigger starting point, and exposing corresponding circles after the circle center of the trigger starting point according to the trigger interval; in the exposed circles, the circle center distance of the adjacent circles is equal to the trigger interval in the direct-writing photoetching working parameters; after exposing a circle with fixed spacing consistent with the triggering spacing, confirming the spacing error of each circle center, obtaining a position triggering error compensation value of a triggering position corresponding to the interval triggering spacing after triggering a starting point according to the acquired spacing error of each circle center, and obtaining a position triggering error compensation table after integrating all the position triggering error compensation values;
The position triggering device (2) comprises a differential/single-ended circuit (6), a ZYNQ minimum system (5), a photoelectric isolation circuit (8) and a single-ended/differential circuit (9) which are sequentially connected, wherein the differential/single-ended circuit (6) can be connected with the motion track sampling device (3) in an adaptive manner, the single-ended/differential circuit (9) is connected with the DMD digital micromirror (4) in an adaptive manner, and the ZYNQ minimum system (5) is connected with the upper computer (1) in an adaptive manner;
The ZYNQ minimum system (5) receives a position trigger error compensation table triggered equidistantly and transmitted by the upper computer (1) and a direct-writing lithography working parameter corresponding to the current direct-writing lithography pattern; the differential/single-ended circuit (6) can transmit the actual motion track of the motion platform in the Y direction acquired by the motion track sampling device (3) to the ZYNQ minimum system (5);
The ZYNQ minimum system (5) determines an actual trigger position according to the direct-writing photoetching working parameters and a position trigger error compensation table, when the current position of the moving platform is determined to be matched with the determined actual trigger position according to the received actual motion track in the Y direction, the ZYNQ minimum system (5) generates an exposure trigger signal, and the ZYNQ minimum system (5) loads the generated exposure trigger signal to a DMD digital micromirror (4) connected with the single-ended/differential circuit (9) through a photoelectric isolation circuit (8) and the single-ended/differential circuit (9);
The ZYNQ minimum system (5) comprises an ARM processor and an FPGA processor, wherein the ARM processor is connected with the upper computer (1) in an adapting mode, the FPGA processor is connected with the ARM processor in an adapting mode, the ARM processor is communicated with the upper computer (1) through a TCP, and the upper computer (1) transmits a position trigger error compensation table for acquiring equidistant trigger and a direct-writing photoetching working parameter corresponding to a current direct-writing photoetching pattern to the ARM processor;
the ARM processor sends the position trigger error compensation table triggered equidistantly and the direct-writing photoetching working parameters into the FPGA processor to be stored by the BRAM of the FPGA processor;
Configuring an FPGA processor to at least form a coding module, a compensation module and a triggering module; determining and recording the current position of the motion platform according to the actual motion track of the motion platform in the Y direction through an encoding module, and generating an encoding pulse signal;
The compensation module compensates the coded pulse signal in real time according to the position trigger compensation value of the position trigger compensation table so as to generate a compensation pulse signal; the trigger module generates an exposure trigger signal according to the compensation pulse module generated by the compensation module and sends the exposure trigger signal to the DMD digital micromirror (4);
The motion trail sampling device (3) comprises a grating ruler;
The ARM processor is connected with the FPGA processor through an AXI_LITE bus, and the ARM processor is connected with the upper computer (1) in an adaptive manner through the gigabit network module (7).
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Citations (2)

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CN103472685A (en) * 2013-09-13 2013-12-25 苏州微影光电科技有限公司 Synchronizer, scanning type laser imaging system and synchronizing method
CN104932207A (en) * 2015-05-23 2015-09-23 合肥芯硕半导体有限公司 Position synchronization method for direct-writing photoetching equipment

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5691541A (en) * 1996-05-14 1997-11-25 The Regents Of The University Of California Maskless, reticle-free, lithography

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103472685A (en) * 2013-09-13 2013-12-25 苏州微影光电科技有限公司 Synchronizer, scanning type laser imaging system and synchronizing method
CN104932207A (en) * 2015-05-23 2015-09-23 合肥芯硕半导体有限公司 Position synchronization method for direct-writing photoetching equipment

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