CN114200785A - Position triggering system and method for maskless laser direct-writing photoetching - Google Patents

Position triggering system and method for maskless laser direct-writing photoetching Download PDF

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Publication number
CN114200785A
CN114200785A CN202111600359.9A CN202111600359A CN114200785A CN 114200785 A CN114200785 A CN 114200785A CN 202111600359 A CN202111600359 A CN 202111600359A CN 114200785 A CN114200785 A CN 114200785A
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trigger
direct
actual
motion track
position trigger
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CN114200785B (en
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霍大云
茆荣超
杨琳韵
汪留芳
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Xifan Semiconductor Wuxi Co ltd
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Xifan Semiconductor Wuxi Co ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

The invention relates to a position triggering system and a method for maskless laser direct-writing photoetching. The device comprises a motion trail sampling device, a position triggering device and an upper computer; the upper computer transmits the position trigger error compensation table which is triggered equidistantly and the direct-write photoetching working parameters corresponding to the current direct-write photoetching pattern into the position trigger device, the position trigger device determines the actual trigger position according to the direct-write photoetching working parameters and the position trigger error compensation table, and when the current position of the motion platform is determined to be matched with the actual trigger position determined by the position trigger device according to the received actual motion track in the Y direction, the position trigger device sends an exposure trigger signal to the connected DMD digital micromirror, so that the DMD digital micromirror can carry out required exposure according to the received exposure trigger signal. The invention can effectively realize equidistant position triggering, eliminate the dislocation in the Y direction during equidistant triggering, improve the quality of an exposure image, and is safe and reliable.

Description

Position triggering system and method for maskless laser direct-writing photoetching
Technical Field
The present invention relates to a position triggering system and method, and more particularly, to a position triggering system and method for maskless laser direct writing lithography.
Background
The maskless laser direct writing photoetching technology is characterized in that a digital mask of a spatial light modulator is used for replacing a physical mask of traditional photoetching, and the maskless laser direct writing photoetching technology can save the manufacturing cost of a mask; meanwhile, the digital mask can be changed rapidly by directly modifying the design pattern in software, so that the flexibility of photoetching is enhanced.
The principle of maskless laser direct writing photoetching is that the turnover of a DMD digital micromirror and the motion of a motion platform are synchronous, so that an exposure pattern is transferred to a photosensitive dry film on the motion platform. In particular, how to ensure the precision of synchronous motion during lithography is directly related to the quality of exposure. Theoretically, if the motion platform moves at a constant speed, the DMD digital micromirror can be triggered isochronously, but actually, the absolute constant speed of the motion platform is hard to guarantee, so that the exposure quality can be controlled better by triggering the DMD digital micromirror at equal intervals.
The accuracy of an exposure image can be basically ensured by equidistant triggering, but due to the fact that factors such as installation errors of a moving platform and working environment can cause position errors, when the position errors exist, dislocation of the exposure image in the Y direction can occur, and how to eliminate the dislocation in the Y direction during the equidistant triggering is a technical problem which needs to be solved urgently at present.
Disclosure of Invention
The invention aims to overcome the defects in the prior art, and provides a position triggering system and a position triggering method for maskless laser direct writing lithography, which can effectively realize equidistant position triggering, eliminate the dislocation in the Y direction during equidistant triggering, improve the quality of an exposed image, and have wide application range, safety and reliability.
According to the technical scheme provided by the invention, the position trigger system for maskless laser direct writing lithography comprises a motion track sampling device, a position trigger device which is in adaptive connection with the motion track sampling device and an upper computer which is in adaptive connection with the position trigger device;
the upper computer transmits the position trigger error compensation table which is triggered equidistantly and the direct-writing photoetching working parameters corresponding to the current direct-writing photoetching pattern into the position trigger device, acquires the actual motion track of the motion platform in the Y direction in real time through the motion track sampling device, and sends the acquired actual motion track in the Y direction into the position trigger device;
and when the current position of the motion platform is determined to be matched with the actual trigger position determined by the position trigger device according to the received actual motion track in the Y direction, the position trigger device sends an exposure trigger signal to the connected DMD digital micromirror so that the DMD digital micromirror carries out required exposure according to the received exposure trigger signal.
The direct-write photoetching working parameters acquired by the upper computer comprise trigger starting points, trigger intervals and/or total number of position trigger compensation times.
The motion trail sampling device comprises a grating ruler.
The position trigger device comprises a differential/single-ended circuit, a ZYNQ minimum system, a photoelectric isolation circuit and a single-ended/differential circuit which are sequentially connected, wherein the position trigger device can be in adaptive connection with the motion track sampling device through the differential/single-ended circuit and is in adaptive connection with the DMD digital micromirror through the single-ended/differential circuit, and the ZYNQ minimum system is in adaptive connection with an upper computer;
the ZYNQ minimum system receives a position trigger error compensation table which is transmitted by an upper computer and is triggered equidistantly and direct-write photoetching working parameters corresponding to the current direct-write photoetching pattern; the differential/single-ended circuit can be added with a motion track sampling device to acquire the actual motion track of the motion platform in the Y direction and transmit the actual motion track to a ZYNQ minimum system;
the ZYNQ minimum system determines an actual trigger position according to the direct-write photoetching working parameters and the position trigger error compensation table, generates an exposure trigger signal when determining that the current position of the motion platform is matched with the determined actual trigger position according to the received actual motion track in the Y direction, and loads the generated exposure trigger signal to a DMD digital micromirror connected with a single-ended/differential circuit through a photoelectric isolation circuit and a single-ended/differential circuit.
The ZYNQ minimum system comprises an ARM processor and an FPGA processor, wherein the ARM processor is in adaptive connection with an upper computer, the FPGA processor is in adaptive connection with the ARM processor, the ARM processor is in communication with the upper computer through a TCP, and the upper computer transmits a position trigger error compensation table which is triggered equidistantly and direct-write photoetching working parameters corresponding to a current direct-write photoetching pattern into the ARM processor;
the ARM processor sends the position trigger error compensation table and the direct-writing photoetching working parameters which are triggered equidistantly into the FPGA processor to be stored by a BRAM of the FPGA processor;
configuring an FPGA processor to at least form a coding module, a compensation module and a trigger module; determining and recording the current position of the motion platform according to the actual motion track of the motion platform in the Y direction through a coding module, and generating a coding pulse signal;
the compensation module compensates the coded pulse signal in real time according to the position trigger compensation value of the position trigger compensation table so as to generate a compensation pulse signal; the trigger module generates an exposure trigger signal according to the compensation pulse module generated by the compensation module and sends the exposure trigger signal to the DMD digital micromirror.
The ARM processor is connected with the FPGA processor through an AXI _ LITE bus, and the ARM processor is in adaptive connection with the upper computer through a gigabit network module.
The position trigger device is connected with one or more DMD digital micro-mirrors in a matching way.
A position triggering method for maskless laser direct writing lithography is provided with a motion trail sampling device, a position triggering device which is in adaptive connection with the motion trail sampling device and an upper computer which is in adaptive connection with the position triggering device;
the upper computer transmits the position trigger error compensation table which is triggered equidistantly and the direct-writing photoetching working parameters corresponding to the current direct-writing photoetching pattern into the position trigger device, acquires the actual motion track of the motion platform in the Y direction in real time through the motion track sampling device, and sends the acquired actual motion track in the Y direction into the position trigger device;
and when the current position of the motion platform is determined to be matched with the actual trigger position determined by the position trigger device according to the received actual motion track in the Y direction, the position trigger device sends an exposure trigger signal to the connected DMD digital micromirror so that the DMD digital micromirror carries out required exposure according to the received exposure trigger signal.
When the position trigger error compensation table triggered equidistantly is obtained, the direct-write photoetching working parameters obtained by the upper computer comprise a trigger starting point, a trigger interval and/or the total number of position trigger compensation times.
The position trigger device comprises a differential/single-ended circuit, a ZYNQ minimum system, a photoelectric isolation circuit and a single-ended/differential circuit which are sequentially connected, wherein the position trigger device can be in adaptive connection with the motion track sampling device through the differential/single-ended circuit and is in adaptive connection with the DMD digital micromirror through the single-ended/differential circuit, and the ZYNQ minimum system is in adaptive connection with an upper computer;
the ZYNQ minimum system receives a position trigger error compensation table which is transmitted by an upper computer and is triggered equidistantly and direct-write photoetching working parameters corresponding to the current direct-write photoetching pattern; the differential/single-ended circuit (6) can be added with a motion track sampling device to obtain the actual motion track of the motion platform in the Y direction and transmit the actual motion track to the ZYNQ minimum system;
the ZYNQ minimum system determines an actual trigger position according to the direct-write photoetching working parameters and the position trigger error compensation table, generates an exposure trigger signal when determining that the current position of the motion platform is matched with the determined actual trigger position according to the received actual motion track in the Y direction, and loads the generated exposure trigger signal to a DMD digital micromirror connected with a single-ended/differential circuit through a photoelectric isolation circuit and a single-ended/differential circuit.
The invention has the advantages that: the upper computer transmits the position trigger error compensation table which is triggered equidistantly and the direct-writing photoetching working parameters corresponding to the current direct-writing photoetching pattern into the position trigger device, acquires the actual motion track of the motion platform in the Y direction in real time through the motion track sampling device, and sends the acquired actual motion track in the Y direction into the position trigger device;
the position trigger device determines an actual trigger position according to the working parameters of direct writing lithography and the position trigger error compensation table, and when determining that the current position of the motion platform is matched with the actual trigger position determined by the position trigger device according to the actual motion track in the received Y direction, the position trigger device sends an exposure trigger signal to the connected DMD digital micromirror, so that the DMD digital micromirror can carry out required exposure according to the received exposure trigger signal, equidistant position triggering can be effectively realized, Y-direction dislocation during equidistant triggering is eliminated, the quality of an exposed image is improved, the application range is wide, and the method is safe and reliable.
Drawings
FIG. 1 is a block diagram of the system of the present invention.
FIG. 2 is a circuit block diagram of the position trigger device of the present invention.
FIG. 3 is a schematic flow chart of the present invention.
Description of reference numerals: the device comprises a 1-upper computer, a 2-position trigger device, a 3-motion track sampling device, a 4-DMD digital micromirror, a 5-ZYNQ minimum system, a 6-differential/single-ended circuit, a 7-gigabit network module, an 8-photoelectric isolation circuit and a 9-single-ended/differential circuit.
Detailed Description
The invention is further illustrated by the following specific figures and examples.
As shown in fig. 1: in order to effectively realize equidistant position triggering, eliminate dislocation in the Y direction during equidistant triggering and improve the quality of an exposed image, the invention comprises a motion track sampling device 3, a position triggering device 2 which is in adaptive connection with the motion track sampling device 3 and an upper computer 1 which is in adaptive connection with the position triggering device 2;
the upper computer 1 transmits the position trigger error compensation table which is triggered equidistantly and the direct-write photoetching working parameters corresponding to the current direct-write photoetching pattern into the position trigger device 2, acquires the actual motion track of the motion platform in the Y direction in real time through the motion track sampling device 3, and transmits the acquired actual motion track in the Y direction into the position trigger device 2;
the position trigger device 2 determines an actual trigger position according to the working parameters of the direct writing lithography and the position trigger error compensation table, and when the current position of the motion platform is determined to be matched with the actual trigger position determined by the position trigger device 2 according to the received actual motion track in the Y direction, the position trigger device 2 sends an exposure trigger signal to the connected DMD digital micromirror 4, so that the DMD digital micromirror 4 carries out required exposure according to the received exposure trigger signal.
Specifically, the motion trajectory sampling device 3 can sample the actual motion trajectory of the motion platform in the Y direction, and the actual motion trajectory of the motion platform in the Y direction is related to a specific direct-writing lithography process, and is specifically consistent with the prior art, which is well known to those skilled in the art and is not described herein again. The motion track sampling device 3 comprises a grating ruler, and when the motion track sampling device 3 adopts the grating ruler, the process of acquiring the actual motion track of the motion platform in the Y direction through a reading head of the grating ruler is consistent with the prior art, which is well known by persons skilled in the art and is not described again here; of course, in specific implementation, the motion sampling apparatus 3 may also adopt other implementation forms, and may be specifically selected according to needs. The upper computer 1 can generally adopt a computer or the like, and can be selected according to the requirement.
In specific implementation, for a certain maskless laser direct-writing lithography, according to the specific situation of a direct-writing lithography pattern, a direct-writing lithography working parameter corresponding to the current direct-writing lithography pattern can be obtained, and in specific implementation, the direct-writing lithography working parameter comprises a trigger starting point, a trigger interval and/or the total number of position trigger compensation times. The total number of times of compensation trigger compensation can be specifically determined for the direct-write lithography pattern, the trigger interval, and the like, which is well known in the art and will not be described herein again.
In order to compensate for the position error during equidistant triggering and improve the accuracy of maskless laser direct writing lithography, a position triggering error compensation table triggered at equal distances needs to be obtained. During specific implementation, for the current motion platform, a circle with a fixed distance is exposed on a photosensitive dry film and the like of the motion platform by using calibrated equipment, and the specific exposure mode and process are consistent with those of the prior art and are not repeated here. Specifically, the center of a first circle to be exposed is a trigger starting point, and corresponding circles are exposed sequentially behind the center of the trigger starting point according to trigger distances; in the exposed circles, the distance between the centers of adjacent circles is equal to the trigger distance in the working parameters of the direct-write lithography. The number of the exposure circles is consistent with the total number of the position trigger compensation times determined according to the current direct-write photoetching pattern, namely consistent with the total number of the trigger exposure of the actual direct-write photoetching. After the circle with the fixed interval consistent with the trigger interval is exposed, the interval error of each circle center is confirmed, and the process and the mode of the specific interval error can be selected as required, which is not described in detail herein. In specific implementation, according to the acquired distance error of each circle center, the position trigger error compensation value of the trigger position corresponding to the trigger distance after the trigger starting point can be obtained, and the position trigger error compensation table can be obtained by integrating all the position trigger error compensation values. Of course, the equidistant triggered position trigger error compensation table may also be obtained in other manners, which may be specifically selected according to the needs and will not be described herein again.
In the embodiment of the invention, after the upper computer 1 acquires the position trigger error compensation table triggered equidistantly and the direct-write photoetching working parameters corresponding to the current direct-write photoetching pattern, the position trigger error compensation table triggered equidistantly and the direct-write photoetching working parameters corresponding to the current direct-write photoetching pattern need to be transmitted into the position trigger device 2, so that the position trigger device 2 can trigger the DMD digital micromirror 4 equidistantly.
In specific implementation, after receiving the direct-write lithography working parameters and the position trigger error compensation table, the position trigger device 2 may determine actual trigger positions when all the positions are triggered. After the actual motion track of the motion platform in the Y direction is obtained by the motion track sampling device 3, the position trigger device 2 determines the current position of the motion platform according to the actual motion track of the motion platform in the Y direction. The position trigger device 2 can compare the current position of the motion platform with the actual trigger position, and when it is determined that the current position of the motion platform matches the actual trigger position determined by the position trigger device 2 according to the received actual motion trajectory in the Y direction, the position trigger device 2 sends an exposure trigger signal to the connected DMD digital micromirror 4, so that the DMD digital micromirror 4 performs the required exposure according to the received exposure trigger signal. After the DMD digital micromirror 4 receives the exposure trigger signal, the specific working process is the same as the prior art, which is well known to those skilled in the art and will not be described herein again.
As shown in fig. 2, the position trigger device 2 includes a differential/single-ended circuit 6, a ZYNQ minimum system 5, a photoelectric isolation circuit 8 and a single-ended/differential circuit 9, which are connected in sequence, wherein the differential/single-ended circuit 6 is adapted to the motion trajectory sampling device 3, the single-ended/differential circuit 9 is adapted to the DMD digital micromirror 4, and the ZYNQ minimum system 5 is adapted to the upper computer 1;
the ZYNQ minimum system 5 receives a position trigger error compensation table which is triggered equidistantly and transmitted by the upper computer 1 and direct-write photoetching working parameters corresponding to the current direct-write photoetching pattern; the differential/single-ended circuit 6 can be added with the motion track sampling devices 3 to obtain the actual motion track of the motion platform in the Y direction and transmit the actual motion track to the ZYNQ minimum system 5;
the ZYNQ minimum system 5 determines an actual trigger position according to the direct-write photoetching working parameters and the position trigger error compensation table, when the current position of the motion platform is determined to be matched with the determined actual trigger position according to the received actual motion track in the Y direction, the ZYNQ minimum system 5 generates an exposure trigger signal, and the ZYNQ minimum system 5 loads the generated exposure trigger signal to the DMD digital micromirror 4 connected with the single-ended/differential circuit 9 through the photoelectric isolation circuit 8 and the single-ended/differential circuit 9.
In the embodiment of the present invention, the differential/single-ended circuit 6, the optoelectronic isolation circuit 8, and the single-ended/differential circuit 9 may all adopt the existing commonly used form, for example, the differential/single-ended circuit 6 may adopt a chip with a model of AM26C32, the optoelectronic isolation circuit 8 may adopt a TLP291 high-speed optocoupler chip, and the single-ended/differential circuit 9 may adopt a chip with a model of AM26C31, and of course, the differential/single-ended circuit 6, the optoelectronic isolation circuit 8, and the single-ended/differential circuit 9 may also adopt other required forms, which may be specifically selected as needed and will not be described herein again. The anti-interference capability can be effectively improved through the differential/single-ended circuit 6, the photoelectric isolation circuit 8 and the single-ended/differential circuit 9, and the exposure trigger signal can be transmitted to the DMD digital micromirror 4 without distortion.
In specific implementation, the ZYNQ minimum system 5 is an extensible processing platform pushed out by Xilinx, and the specific function of the position trigger device 2 is realized through the ZYNQ minimum system 5, specifically, the ZYNQ minimum system 5 comprises an ARM processor in adaptive connection with the upper computer 1 and an FPGA processor in adaptive connection with the ARM processor, wherein the ARM processor is in communication with the upper computer 1 through TCP, and the upper computer 1 transmits the position trigger error compensation table which is obtained by equidistant triggering and the direct-writing lithography working parameters corresponding to the current direct-writing lithography pattern into the ARM processor;
the ARM processor sends the position trigger error compensation table and the direct-writing photoetching working parameters which are triggered equidistantly into the FPGA processor to be stored by a BRAM of the FPGA processor;
configuring an FPGA processor to at least form a coding module, a compensation module and a trigger module; determining and recording the current position of the motion platform according to the actual motion track of the motion platform in the Y direction through a coding module, and generating a coding pulse signal;
the compensation module compensates the coded pulse signal in real time according to the position trigger compensation value of the position trigger compensation table so as to generate a compensation pulse signal; the trigger module generates an exposure trigger signal according to the compensation pulse module generated by the compensation module, and sends the exposure trigger signal to the DMD digital micromirror 4.
In the embodiment of the invention, the ZYNQ minimum system 5 comprises an ARM processor and an FPGA processor, wherein the ARM processor can be in adaptive connection with the upper computer 1, and at least a coding module, a compensation module and a trigger module can be formed by configuring the FPGA processor.
During specific implementation, the ARM processor is connected with the FPGA processor through an AXI _ LITE bus, and the ARM processor is in adaptive connection with the upper computer 1 through a gigabit network module 7. When the ARM processor is connected with the FPGA processor through the AXI _ LITE bus and the PFGA processor is configured, an AXI communication module is formed, namely the AXI communication module is responsible for communication between the ARM processor and the FPGA processor. Generally, in an FPGA processor, data in a command class is latched by a register, and data in a parameter class is exchanged by a BRAM.
In specific implementation, the position trigger device 2 is in adaptive connection with one or more DMD digital micromirrors 4, the number of the DMD digital micromirrors 4 connected to the position trigger device 2 may be selected as required, and a manner of implementing direct writing lithography of a multi-path lithography pattern by using multiple paths of DMD digital micromirrors 4 is consistent with the prior art, which is well known to those skilled in the art and is not described herein again. When connected with the multiplex DMD digital micromirror 4, a separate position trigger error compensation can be performed for each exposure trigger signal.
In the embodiment of the invention, after the ARM processor is communicated with the upper computer 1 through the gigabit network module 4, the upper computer 1 sends the direct-write photoetching working parameters required by the exposure and the position trigger error compensation table of each path to the ARM processor, and the ARM processor analyzes and transmits the position trigger error compensation table to the BRAM of the FPGA processor. The specific analysis mode and process of the ARM processor for the position trigger error compensation table can be selected according to actual needs, so that the FPGA processor can read the analyzed error compensation table conveniently, and the method is well known to those skilled in the art and is not described herein again.
When the movement track sampling device 3 adopts the grating ruler, the coding module mainly filters and codes the ABZ signals fed back by the reading head of the grating ruler, the purpose is to record the positions represented by the ABZ signals and generate coding pulse signals, the coding module can adopt the technical means commonly used in the technical field to generate coding pulse signals related to the positions, and the coding module can be specifically selected according to actual needs, and is not repeated here.
The compensation module is mainly used for compensating the coding pulse signal of the coding module in real time according to the position trigger error compensation table and generating a compensated compensation pulse signal;
the trigger module generates an exposure trigger signal from the compensation pulse signal processed by the compensation module and sends the exposure trigger signal to the DMD digital micromirror 4.
In summary, the position triggering method for maskless laser direct writing lithography according to the present invention is obtained by providing a motion trajectory sampling device 3, a position triggering device 2 adapted to be connected to the motion trajectory sampling device 3, and an upper computer 1 adapted to be connected to the position triggering device 2;
the upper computer 1 transmits the position trigger error compensation table which is triggered equidistantly and the direct-write photoetching working parameters corresponding to the current direct-write photoetching pattern into the position trigger device 2, acquires the actual motion track of the motion platform in the Y direction in real time through the motion track sampling device 3, and transmits the acquired actual motion track in the Y direction into the position trigger device 2;
the position trigger device 2 determines an actual trigger position according to the working parameters of the direct writing lithography and the position trigger error compensation table, and when the current position of the motion platform is determined to be matched with the actual trigger position determined by the position trigger device 2 according to the received actual motion track in the Y direction, the position trigger device 2 sends an exposure trigger signal to the connected DMD digital micromirror 4, so that the DMD digital micromirror 4 carries out required exposure according to the received exposure trigger signal.
In the embodiment of the present invention, the specific situations of the upper computer 1, the position trigger module 2, and the motion trajectory sampling device 3 may refer to the above descriptions, and are not described herein again. As shown in fig. 3, a flowchart for performing equidistant position triggering is shown, where in fig. 3, the mapping table obtained by measurement is the table for obtaining the position triggering error compensation, when exposure is started, the motion platform needs to be driven to move to a triggering start point, and the triggering start point may be specifically selected and determined as needed, which is well known to those skilled in the art and will not be described herein again.
The following is a detailed description of a specific location-triggered example. Specifically, the trigger starting point is set to 20000cnt, the trigger interval is set to 20000, and according to the trigger starting point and the trigger interval, the specific positions required to be compensated are obtained as follows: 20000, 40000, 60000, and so on, the total number of the position trigger compensations can be determined according to the digital mask pattern and the trigger spacing, which is well known to those skilled in the art. In specific implementation, when the positions of 20000, 40000, 60000, etc. are specifically compensated, the corresponding position trigger error compensation value in the position trigger error compensation table may be a positive value or a negative value, and is determined when the position trigger error compensation table is obtained specifically according to actual calibration, which is not described herein again. If the position trigger compensation value is +2 at the 40000 position, the position trigger module 2 will send an exposure trigger signal to the DMD digital micromirror 4 at the 40000+2 position; if the position trigger compensation value is-5 at position 60000, the position trigger module 2 will send an exposure trigger signal to the DMD digital micromirror 4 at position 60000-5. When the equidistant triggering is adopted, each triggering position has a corresponding position triggering error compensation value, so that the compensation of the subsequent position triggering can be specifically determined according to the position triggering error compensation value in the position triggering error compensation table, and the detailed description is omitted here.
In a specific implementation, the end condition of the position trigger may be specifically determined according to the total number of the position trigger compensation or the digital mask pattern during exposure, and if the total number of the position trigger is adopted as the end condition, the number of the position trigger is accumulated after the compensation of the position trigger error compensation value is performed each time until the number of the position trigger reaches the total number of the position trigger.

Claims (10)

1. A position trigger system for maskless laser direct write lithography, characterized by: the device comprises a motion trail sampling device (3), a position trigger device (2) in adaptive connection with the motion trail sampling device (3) and an upper computer (1) in adaptive connection with the position trigger device (2);
the upper computer (1) transmits a position trigger error compensation table which is triggered equidistantly and direct-write photoetching working parameters corresponding to a current direct-write photoetching pattern into the position trigger device (2), obtains an actual motion track of the motion platform in the Y direction in real time through the motion track sampling device (3), and sends the obtained actual motion track in the Y direction into the position trigger device (2);
the position trigger device (2) determines an actual trigger position according to the working parameters of the direct-write lithography and the position trigger error compensation table, and when the current position of the motion platform is determined to be matched with the actual trigger position determined by the position trigger device (2) according to the actual motion track in the received Y direction, the position trigger device (2) sends an exposure trigger signal to the connected DMD digital micromirror (4), so that the DMD digital micromirror (4) performs required exposure according to the received exposure trigger signal.
2. The position trigger system for maskless laser direct write lithography according to claim 1, wherein: the direct-write photoetching working parameters acquired by the upper computer (1) comprise trigger starting points, trigger intervals and/or total number of position trigger compensation times.
3. The position trigger system for maskless laser direct write lithography according to claim 1 or 2, characterized by: the motion trail sampling device (3) comprises a grating ruler.
4. The position trigger system for maskless laser direct write lithography according to claim 1 or 2, characterized by: the position trigger device (2) comprises a differential/single-ended circuit (6), a ZYNQ minimum system (5), a photoelectric isolation circuit (8) and a single-ended/differential circuit (9) which are sequentially connected, wherein the position trigger device can be in adaptive connection with the motion track sampling device (3) through the differential/single-ended circuit (6), is in adaptive connection with the DMD digital micromirror (4) through the single-ended/differential circuit (9), and the ZYNQ minimum system (5) is in adaptive connection with the upper computer (1);
the ZYNQ minimum system (5) receives a position trigger error compensation table which is transmitted by the upper computer (1) and is triggered equidistantly and direct-write photoetching working parameters corresponding to the current direct-write photoetching pattern; the differential/single-ended circuit (6) can be added with the motion track sampling device (3) to acquire the actual motion track of the motion platform in the Y direction and transmit the actual motion track to the ZYNQ minimum system (5);
the ZYNQ minimum system (5) determines an actual trigger position according to the working parameters of direct-write lithography and a position trigger error compensation table, when the current position of the motion platform is determined to be matched with the determined actual trigger position according to the received actual motion track in the Y direction, the ZYNQ minimum system (5) generates an exposure trigger signal, and the ZYNQ minimum system (5) loads the generated exposure trigger signal to a DMD digital micromirror (4) connected with a single-ended/differential circuit (9) through a photoelectric isolation circuit (8) and the single-ended/differential circuit (9).
5. The position trigger system for maskless laser direct write lithography according to claim 4, wherein: the ZYNQ minimum system (5) comprises an ARM processor and an FPGA processor, wherein the ARM processor is in adaptive connection with the upper computer (1), the FPGA processor is in adaptive connection with the ARM processor, the ARM processor is in communication with the upper computer (1) through TCP, and the upper computer (1) transmits a position trigger error compensation table which is triggered equidistantly and direct-write photoetching working parameters corresponding to a current direct-write photoetching pattern into the ARM processor;
the ARM processor sends the position trigger error compensation table and the direct-writing photoetching working parameters which are triggered equidistantly into the FPGA processor to be stored by a BRAM of the FPGA processor;
configuring an FPGA processor to at least form a coding module, a compensation module and a trigger module; determining and recording the current position of the motion platform according to the actual motion track of the motion platform in the Y direction through a coding module, and generating a coding pulse signal;
the compensation module compensates the coded pulse signal in real time according to the position trigger compensation value of the position trigger compensation table so as to generate a compensation pulse signal; the trigger module generates an exposure trigger signal according to the compensation pulse module generated by the compensation module and sends the exposure trigger signal to the DMD digital micromirror (4).
6. The position trigger system for maskless laser direct write lithography according to claim 5, further comprising: the ARM processor is connected with the FPGA processor through an AXI _ LITE bus, and is in adaptive connection with the upper computer (1) through a gigabit network module (7).
7. The position trigger system for maskless laser direct write lithography according to claim 1 or 2, characterized by: the position trigger device (2) is in adaptive connection with one or more DMD digital micromirrors (4).
8. A position triggering method for maskless laser direct writing lithography is characterized by comprising the steps of providing a motion track sampling device (3), a position triggering device (2) in adaptive connection with the motion track sampling device (3) and an upper computer (1) in adaptive connection with the position triggering device (2);
the upper computer (1) transmits a position trigger error compensation table which is triggered equidistantly and direct-write photoetching working parameters corresponding to a current direct-write photoetching pattern into the position trigger device (2), obtains an actual motion track of the motion platform in the Y direction in real time through the motion track sampling device (3), and sends the obtained actual motion track in the Y direction into the position trigger device (2);
the position trigger device (2) determines an actual trigger position according to the working parameters of the direct-write lithography and the position trigger error compensation table, and when the current position of the motion platform is determined to be matched with the actual trigger position determined by the position trigger device (2) according to the actual motion track in the received Y direction, the position trigger device (2) sends an exposure trigger signal to the connected DMD digital micromirror (4), so that the DMD digital micromirror (4) performs required exposure according to the received exposure trigger signal.
9. The position triggering method for maskless laser direct write lithography according to claim 8, characterized in that, when obtaining the position triggering error compensation table triggered equidistantly, the upper computer (1) obtains the direct write lithography working parameters including a triggering start point, a triggering interval and/or a total number of position triggering compensation times.
10. The position trigger method for maskless laser direct write lithography according to claim 8, characterized in that the position trigger device (2) comprises a differential/single-ended circuit (6), a ZYNQ minimum system (5), a photoelectric isolation circuit (8) and a single-ended/differential circuit (9) which are connected in sequence, wherein the position trigger device can be adaptively connected with the motion trajectory sampling device (3) through the differential/single-ended circuit (6), and is adaptively connected with the DMD digital micromirror (4) through the single-ended/differential circuit (9), and the ZYNQ minimum system (5) is adaptively connected with the upper computer (1);
the ZYNQ minimum system (5) receives a position trigger error compensation table which is transmitted by the upper computer (1) and is triggered equidistantly and direct-write photoetching working parameters corresponding to the current direct-write photoetching pattern; the differential/single-ended circuit (6) can be added with the motion track sampling device (3) to acquire the actual motion track of the motion platform in the Y direction and transmit the actual motion track to the ZYNQ minimum system (5);
the ZYNQ minimum system (5) determines an actual trigger position according to the working parameters of direct-write lithography and a position trigger error compensation table, when the current position of the motion platform is determined to be matched with the determined actual trigger position according to the received actual motion track in the Y direction, the ZYNQ minimum system (5) generates an exposure trigger signal, and the ZYNQ minimum system (5) loads the generated exposure trigger signal to a DMD digital micromirror (4) connected with a single-ended/differential circuit (9) through a photoelectric isolation circuit (8) and the single-ended/differential circuit (9).
CN202111600359.9A 2021-12-24 2021-12-24 Position triggering system and method for maskless laser direct-write lithography Active CN114200785B (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5691541A (en) * 1996-05-14 1997-11-25 The Regents Of The University Of California Maskless, reticle-free, lithography
CN103472685A (en) * 2013-09-13 2013-12-25 苏州微影光电科技有限公司 Synchronizer, scanning type laser imaging system and synchronizing method
CN104932207A (en) * 2015-05-23 2015-09-23 合肥芯硕半导体有限公司 Position synchronization method for direct-writing photoetching equipment

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5691541A (en) * 1996-05-14 1997-11-25 The Regents Of The University Of California Maskless, reticle-free, lithography
CN103472685A (en) * 2013-09-13 2013-12-25 苏州微影光电科技有限公司 Synchronizer, scanning type laser imaging system and synchronizing method
CN104932207A (en) * 2015-05-23 2015-09-23 合肥芯硕半导体有限公司 Position synchronization method for direct-writing photoetching equipment

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