CN114137646B - 多光谱滤光器 - Google Patents
多光谱滤光器 Download PDFInfo
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- CN114137646B CN114137646B CN202111322234.4A CN202111322234A CN114137646B CN 114137646 B CN114137646 B CN 114137646B CN 202111322234 A CN202111322234 A CN 202111322234A CN 114137646 B CN114137646 B CN 114137646B
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- 239000000463 material Substances 0.000 claims abstract description 92
- 230000003287 optical effect Effects 0.000 claims abstract description 80
- 125000006850 spacer group Chemical group 0.000 claims abstract description 61
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 100
- 239000000377 silicon dioxide Substances 0.000 claims description 50
- 235000012239 silicon dioxide Nutrition 0.000 claims description 47
- 239000000758 substrate Substances 0.000 abstract description 26
- 229910052990 silicon hydride Inorganic materials 0.000 description 50
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 34
- 238000002834 transmittance Methods 0.000 description 22
- 230000003595 spectral effect Effects 0.000 description 21
- 238000010586 diagram Methods 0.000 description 16
- 230000004044 response Effects 0.000 description 13
- OBOYOXRQUWVUFU-UHFFFAOYSA-N [O-2].[Ti+4].[Nb+5] Chemical compound [O-2].[Ti+4].[Nb+5] OBOYOXRQUWVUFU-UHFFFAOYSA-N 0.000 description 7
- 230000008859 change Effects 0.000 description 7
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 7
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 7
- 230000005540 biological transmission Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 230000009467 reduction Effects 0.000 description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- PFNQVRZLDWYSCW-UHFFFAOYSA-N (fluoren-9-ylideneamino) n-naphthalen-1-ylcarbamate Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1=NOC(=O)NC1=CC=CC2=CC=CC=C12 PFNQVRZLDWYSCW-UHFFFAOYSA-N 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- RJSRQTFBFAJJIL-UHFFFAOYSA-N niobium titanium Chemical compound [Ti].[Nb] RJSRQTFBFAJJIL-UHFFFAOYSA-N 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 2
- 229910001275 Niobium-titanium Inorganic materials 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 2
- 239000005083 Zinc sulfide Substances 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(iv) oxide Chemical compound O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 2
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 2
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 2
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229910052984 zinc sulfide Inorganic materials 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 150000003346 selenoethers Chemical class 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/284—Interference filters of etalon type comprising a resonant cavity other than a thin solid film, e.g. gas, air, solid plates
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
- G02B5/286—Interference filters comprising deposited thin solid films having four or fewer layers, e.g. for achieving a colour effect
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/805—Coatings
- H10F39/8053—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/207—Filters comprising semiconducting materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
- G02B5/288—Interference filters comprising deposited thin solid films comprising at least one thin film resonant cavity, e.g. in bandpass filters
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/806—Optical elements or arrangements associated with the image sensors
- H10F39/8067—Reflectors
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optical Filters (AREA)
- Spectrometry And Color Measurement (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Separation By Low-Temperature Treatments (AREA)
- Filtration Of Liquid (AREA)
- Control Of Motors That Do Not Use Commutators (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111322234.4A CN114137646B (zh) | 2017-05-22 | 2018-05-22 | 多光谱滤光器 |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/601,753 US10782460B2 (en) | 2017-05-22 | 2017-05-22 | Multispectral filter |
| US15/601,753 | 2017-05-22 | ||
| CN201810494349.3A CN109061786B (zh) | 2017-05-22 | 2018-05-22 | 多光谱滤光器 |
| CN202111322234.4A CN114137646B (zh) | 2017-05-22 | 2018-05-22 | 多光谱滤光器 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810494349.3A Division CN109061786B (zh) | 2017-05-22 | 2018-05-22 | 多光谱滤光器 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN114137646A CN114137646A (zh) | 2022-03-04 |
| CN114137646B true CN114137646B (zh) | 2024-12-03 |
Family
ID=62116741
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111322234.4A Active CN114137646B (zh) | 2017-05-22 | 2018-05-22 | 多光谱滤光器 |
| CN201810494349.3A Active CN109061786B (zh) | 2017-05-22 | 2018-05-22 | 多光谱滤光器 |
| CN202411684690.7A Pending CN119291832A (zh) | 2017-05-22 | 2018-05-22 | 多光谱滤光器 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810494349.3A Active CN109061786B (zh) | 2017-05-22 | 2018-05-22 | 多光谱滤光器 |
| CN202411684690.7A Pending CN119291832A (zh) | 2017-05-22 | 2018-05-22 | 多光谱滤光器 |
Country Status (7)
| Country | Link |
|---|---|
| US (3) | US10782460B2 (enExample) |
| EP (2) | EP3407104B1 (enExample) |
| JP (1) | JP7059098B2 (enExample) |
| KR (2) | KR102299519B1 (enExample) |
| CN (3) | CN114137646B (enExample) |
| HK (1) | HK1256258A1 (enExample) |
| TW (3) | TWI864865B (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10725336B2 (en) * | 2016-05-20 | 2020-07-28 | Sharp Kabushiki Kaisha | Liquid crystal display panel and liquid crystal display device |
| US10782460B2 (en) | 2017-05-22 | 2020-09-22 | Viavi Solutions Inc. | Multispectral filter |
| US11143803B2 (en) * | 2018-07-30 | 2021-10-12 | Viavi Solutions Inc. | Multispectral filter |
| US11137331B2 (en) | 2018-08-21 | 2021-10-05 | Viavi Solutions Inc. | Multispectral sensor based alert condition detector |
| US11650361B2 (en) * | 2018-12-27 | 2023-05-16 | Viavi Solutions Inc. | Optical filter |
| US11314004B2 (en) * | 2019-04-08 | 2022-04-26 | Visera Technologies Company Limited | Optical filters and methods for forming the same |
| CN110082849A (zh) * | 2019-06-05 | 2019-08-02 | 信阳舜宇光学有限公司 | 近红外窄带滤光片及制作方法 |
| US11789188B2 (en) * | 2019-07-19 | 2023-10-17 | Viavi Solutions Inc. | Optical filter |
| KR20210014491A (ko) * | 2019-07-30 | 2021-02-09 | 삼성전자주식회사 | 광 필터 및 이를 포함하는 분광기 |
| TWI706169B (zh) * | 2019-08-15 | 2020-10-01 | 晶瑞光電股份有限公司 | 紅外帶通濾波結構及應用該結構之紅外帶通濾波器 |
| CN110989049A (zh) * | 2019-10-12 | 2020-04-10 | 信利光电股份有限公司 | 一种红外光高透过率的薄膜及其制备方法和应用 |
| EP4154314A1 (en) * | 2020-05-18 | 2023-03-29 | University of Rochester | Multispectral imaging cmos sensor |
| CN114500894A (zh) | 2020-10-27 | 2022-05-13 | 三星电子株式会社 | 光谱滤波器、包括光谱滤波器的图像传感器和电子设备 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2000063728A1 (en) * | 1999-04-20 | 2000-10-26 | Ciena Corporation | Dual transmission band interference filter |
| CN1516821A (zh) * | 2001-06-18 | 2004-07-28 | 伊吉斯半导体公司 | 折射率可调的薄膜干涉涂层 |
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| US5926317A (en) * | 1996-11-06 | 1999-07-20 | Jds Fitel Inc. | Multilayer thin film dielectric bandpass filter |
| US6301042B1 (en) | 1998-01-15 | 2001-10-09 | Ciena Corporation | Fabry-perot optical filter with chirped dielectric mirrors |
| GB9901858D0 (en) * | 1999-01-29 | 1999-03-17 | Secr Defence | Optical filters |
| TW528891B (en) * | 2000-12-21 | 2003-04-21 | Ind Tech Res Inst | Polarization-independent ultra-narrow bandpass filter |
| TW520447B (en) * | 2001-05-23 | 2003-02-11 | Univ Tsinghua | Interference filter |
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| CN108333661B (zh) * | 2018-03-13 | 2024-01-02 | 湖北五方光电股份有限公司 | 基于硼掺杂氢化硅的低角度偏移滤光片及其制备方法 |
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2017
- 2017-05-22 US US15/601,753 patent/US10782460B2/en active Active
-
2018
- 2018-04-27 JP JP2018087610A patent/JP7059098B2/ja active Active
- 2018-05-01 TW TW112125273A patent/TWI864865B/zh active
- 2018-05-01 TW TW110135642A patent/TWI809511B/zh active
- 2018-05-01 TW TW107114782A patent/TWI744528B/zh active
- 2018-05-04 EP EP18170865.2A patent/EP3407104B1/en active Active
- 2018-05-04 EP EP25178335.3A patent/EP4582840A3/en active Pending
- 2018-05-21 KR KR1020180057691A patent/KR102299519B1/ko active Active
- 2018-05-22 CN CN202111322234.4A patent/CN114137646B/zh active Active
- 2018-05-22 CN CN201810494349.3A patent/CN109061786B/zh active Active
- 2018-05-22 CN CN202411684690.7A patent/CN119291832A/zh active Pending
- 2018-11-29 HK HK18115315.6A patent/HK1256258A1/en unknown
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2020
- 2020-08-27 US US16/948,003 patent/US11880054B2/en active Active
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2021
- 2021-09-01 KR KR1020210116358A patent/KR102602452B1/ko active Active
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2023
- 2023-12-11 US US18/534,780 patent/US20240103210A1/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000063728A1 (en) * | 1999-04-20 | 2000-10-26 | Ciena Corporation | Dual transmission band interference filter |
| CN1516821A (zh) * | 2001-06-18 | 2004-07-28 | 伊吉斯半导体公司 | 折射率可调的薄膜干涉涂层 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202204941A (zh) | 2022-02-01 |
| US20200393602A1 (en) | 2020-12-17 |
| EP3407104A1 (en) | 2018-11-28 |
| KR102299519B1 (ko) | 2021-09-07 |
| US20180335557A1 (en) | 2018-11-22 |
| CN109061786A (zh) | 2018-12-21 |
| JP2018200464A (ja) | 2018-12-20 |
| CN119291832A (zh) | 2025-01-10 |
| EP3407104B1 (en) | 2025-07-02 |
| KR20210111222A (ko) | 2021-09-10 |
| KR20180127931A (ko) | 2018-11-30 |
| TW201901195A (zh) | 2019-01-01 |
| EP4582840A2 (en) | 2025-07-09 |
| TWI809511B (zh) | 2023-07-21 |
| CA3002993A1 (en) | 2018-11-22 |
| US11880054B2 (en) | 2024-01-23 |
| EP3407104C0 (en) | 2025-07-02 |
| JP7059098B2 (ja) | 2022-04-25 |
| US10782460B2 (en) | 2020-09-22 |
| CN109061786B (zh) | 2021-11-26 |
| HK1256258A1 (en) | 2019-09-20 |
| TW202343039A (zh) | 2023-11-01 |
| EP4582840A3 (en) | 2025-09-03 |
| KR102602452B1 (ko) | 2023-11-15 |
| CN114137646A (zh) | 2022-03-04 |
| US20240103210A1 (en) | 2024-03-28 |
| TWI864865B (zh) | 2024-12-01 |
| TWI744528B (zh) | 2021-11-01 |
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