CN114072538B - 前驱体供应柜 - Google Patents
前驱体供应柜 Download PDFInfo
- Publication number
- CN114072538B CN114072538B CN202080045932.1A CN202080045932A CN114072538B CN 114072538 B CN114072538 B CN 114072538B CN 202080045932 A CN202080045932 A CN 202080045932A CN 114072538 B CN114072538 B CN 114072538B
- Authority
- CN
- China
- Prior art keywords
- cabinet
- precursor supply
- precursor
- gas
- space
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000002243 precursor Substances 0.000 title claims abstract description 487
- 238000013022 venting Methods 0.000 claims abstract description 98
- 238000010438 heat treatment Methods 0.000 claims description 53
- 238000009423 ventilation Methods 0.000 claims description 40
- 230000001105 regulatory effect Effects 0.000 claims description 10
- 238000004891 communication Methods 0.000 claims description 5
- 239000007789 gas Substances 0.000 description 149
- 238000000231 atomic layer deposition Methods 0.000 description 9
- 238000007789 sealing Methods 0.000 description 9
- 239000007788 liquid Substances 0.000 description 6
- 238000005273 aeration Methods 0.000 description 4
- 238000000429 assembly Methods 0.000 description 3
- 230000000712 assembly Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000005485 electric heating Methods 0.000 description 1
- 231100001261 hazardous Toxicity 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F7/00—Ventilation
- F24F7/007—Ventilation with forced flow
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45561—Gas plumbing upstream of the reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C13/00—Details of vessels or of the filling or discharging of vessels
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F7/00—Ventilation
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F7/00—Ventilation
- F24F7/04—Ventilation with ducting systems, e.g. by double walls; with natural circulation
- F24F7/06—Ventilation with ducting systems, e.g. by double walls; with natural circulation with forced air circulation, e.g. by fan positioning of a ventilator in or against a conduit
- F24F7/08—Ventilation with ducting systems, e.g. by double walls; with natural circulation with forced air circulation, e.g. by fan positioning of a ventilator in or against a conduit with separate ducts for supplied and exhausted air with provisions for reversal of the input and output systems
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C13/00—Details of vessels or of the filling or discharging of vessels
- F17C13/08—Mounting arrangements for vessels
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
- F17C2205/01—Mounting arrangements
- F17C2205/0103—Exterior arrangements
- F17C2205/0111—Boxes
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2270/00—Applications
- F17C2270/05—Applications for industrial use
- F17C2270/0518—Semiconductors
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F7/00—Ventilation
- F24F2007/001—Ventilation with exhausting air ducts
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F7/00—Ventilation
- F24F2007/0025—Ventilation using vent ports in a wall
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Combustion & Propulsion (AREA)
- Chemical Vapour Deposition (AREA)
- Furnace Details (AREA)
Abstract
Description
Claims (15)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI20195337 | 2019-04-25 | ||
FI20195337A FI129502B (en) | 2019-04-25 | 2019-04-25 | Feedstock supply cabinet |
PCT/FI2020/050268 WO2020216995A1 (en) | 2019-04-25 | 2020-04-24 | Precursor supply cabinet |
Publications (2)
Publication Number | Publication Date |
---|---|
CN114072538A CN114072538A (zh) | 2022-02-18 |
CN114072538B true CN114072538B (zh) | 2023-08-22 |
Family
ID=72941547
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202080045932.1A Active CN114072538B (zh) | 2019-04-25 | 2020-04-24 | 前驱体供应柜 |
Country Status (5)
Country | Link |
---|---|
US (1) | US11549702B2 (zh) |
EP (1) | EP3959352B1 (zh) |
CN (1) | CN114072538B (zh) |
FI (1) | FI129502B (zh) |
WO (1) | WO2020216995A1 (zh) |
Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2000079019A1 (en) * | 1999-06-24 | 2000-12-28 | Prasad Narhar Gadgil | Apparatus for atomic layer chemical vapor deposition |
GB0520448D0 (en) * | 2002-09-11 | 2005-11-16 | Planar Systems Inc | Precursor material delivery system for atomic layer deposition |
KR20110001762A (ko) * | 2009-06-30 | 2011-01-06 | 건국대학교 산학협력단 | 원자층 증착장치 및 이를 이용한 원자층 증착방법 |
CN102312221A (zh) * | 2011-09-06 | 2012-01-11 | 中国科学院长春光学精密机械与物理研究所 | 一种采用均匀进气系统的原子层沉积装置 |
CN103298974A (zh) * | 2011-01-26 | 2013-09-11 | Beneq有限公司 | 装置、方法以及反应腔室 |
CN103459663A (zh) * | 2011-01-31 | 2013-12-18 | 荷兰应用自然科学研究组织Tno | 用于原子层沉积的设备 |
CN106715752A (zh) * | 2014-09-19 | 2017-05-24 | 凸版印刷株式会社 | 成膜装置以及成膜方法 |
FI20165205A (fi) * | 2016-03-11 | 2017-09-12 | Beneq Oy | Laite ja menetelmä |
WO2018002449A1 (en) * | 2016-06-30 | 2018-01-04 | Beneq Oy | Method of coating a substrate and an apparatus |
JP2018115392A (ja) * | 2018-03-01 | 2018-07-26 | ピコサン オーワイPicosun Oy | Aldコーティングによるガスコンテナ内部の保護 |
CN108715998A (zh) * | 2018-06-14 | 2018-10-30 | 华中科技大学 | 一种用于大批量微纳米颗粒包裹的原子层沉积装置 |
CN109518164A (zh) * | 2018-12-20 | 2019-03-26 | 北京北方华创微电子装备有限公司 | 原子层沉积设备及方法 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
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US4625627A (en) * | 1985-05-20 | 1986-12-02 | Matheson Gas Products, Inc. | Ventilated cabinet for containing gas supply vessels |
US5151395A (en) | 1987-03-24 | 1992-09-29 | Novapure Corporation | Bulk gas sorption and apparatus, gas containment/treatment system comprising same, and sorbent composition therefor |
US6076359A (en) | 1996-11-25 | 2000-06-20 | American Air Liquide Inc. | System and method for controlled delivery of liquified gases |
JP4359965B2 (ja) | 1999-07-27 | 2009-11-11 | 東京エレクトロン株式会社 | 成膜装置 |
US6820570B2 (en) * | 2001-08-15 | 2004-11-23 | Nobel Biocare Services Ag | Atomic layer deposition reactor |
US6877551B2 (en) * | 2002-07-11 | 2005-04-12 | Avaya Technology Corp. | Systems and methods for weatherproof cabinets with variably cooled compartments |
US6916374B2 (en) * | 2002-10-08 | 2005-07-12 | Micron Technology, Inc. | Atomic layer deposition methods and atomic layer deposition tools |
US20050145181A1 (en) * | 2003-12-31 | 2005-07-07 | Dickinson Colin J. | Method and apparatus for high speed atomic layer deposition |
US8986456B2 (en) * | 2006-10-10 | 2015-03-24 | Asm America, Inc. | Precursor delivery system |
US20080241387A1 (en) * | 2007-03-29 | 2008-10-02 | Asm International N.V. | Atomic layer deposition reactor |
US9205969B2 (en) * | 2007-12-11 | 2015-12-08 | Tokitae Llc | Temperature-stabilized storage systems |
US20090214777A1 (en) * | 2008-02-22 | 2009-08-27 | Demetrius Sarigiannis | Multiple ampoule delivery systems |
CN102791359B (zh) * | 2010-01-14 | 2015-11-25 | 诚实公司 | 通风气体管理系统和方法 |
WO2011160004A1 (en) * | 2010-06-18 | 2011-12-22 | Cambridge Nanotech Inc. | Method and apparatus for precursor delivery |
US20140319984A1 (en) * | 2013-04-24 | 2014-10-30 | John N. Younts | Cabinet ventilation system |
US20170167022A1 (en) * | 2015-12-11 | 2017-06-15 | Lg Chem, Ltd. | Apparatus for high speed atomic layer deposition and deposition method using the same |
JP6441244B2 (ja) | 2016-02-02 | 2018-12-19 | 株式会社Kokusai Electric | 基板処理装置 |
KR102517907B1 (ko) * | 2016-12-12 | 2023-04-03 | 어플라이드 머티어리얼스, 인코포레이티드 | 전구체 제어 시스템 및 프로세스 |
KR102344996B1 (ko) * | 2017-08-18 | 2021-12-30 | 삼성전자주식회사 | 전구체 공급 유닛, 기판 처리 장치 및 그를 이용한 반도체 소자의 제조방법 |
US10788239B2 (en) * | 2019-01-25 | 2020-09-29 | MTU Onsite Energy Corporation | Generator set louver system |
-
2019
- 2019-04-25 FI FI20195337A patent/FI129502B/en active IP Right Grant
-
2020
- 2020-04-24 US US17/605,602 patent/US11549702B2/en active Active
- 2020-04-24 EP EP20795274.8A patent/EP3959352B1/en active Active
- 2020-04-24 CN CN202080045932.1A patent/CN114072538B/zh active Active
- 2020-04-24 WO PCT/FI2020/050268 patent/WO2020216995A1/en unknown
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000079019A1 (en) * | 1999-06-24 | 2000-12-28 | Prasad Narhar Gadgil | Apparatus for atomic layer chemical vapor deposition |
GB0520448D0 (en) * | 2002-09-11 | 2005-11-16 | Planar Systems Inc | Precursor material delivery system for atomic layer deposition |
KR20110001762A (ko) * | 2009-06-30 | 2011-01-06 | 건국대학교 산학협력단 | 원자층 증착장치 및 이를 이용한 원자층 증착방법 |
CN103298974A (zh) * | 2011-01-26 | 2013-09-11 | Beneq有限公司 | 装置、方法以及反应腔室 |
CN103459663A (zh) * | 2011-01-31 | 2013-12-18 | 荷兰应用自然科学研究组织Tno | 用于原子层沉积的设备 |
CN102312221A (zh) * | 2011-09-06 | 2012-01-11 | 中国科学院长春光学精密机械与物理研究所 | 一种采用均匀进气系统的原子层沉积装置 |
CN106715752A (zh) * | 2014-09-19 | 2017-05-24 | 凸版印刷株式会社 | 成膜装置以及成膜方法 |
FI20165205A (fi) * | 2016-03-11 | 2017-09-12 | Beneq Oy | Laite ja menetelmä |
WO2018002449A1 (en) * | 2016-06-30 | 2018-01-04 | Beneq Oy | Method of coating a substrate and an apparatus |
JP2018115392A (ja) * | 2018-03-01 | 2018-07-26 | ピコサン オーワイPicosun Oy | Aldコーティングによるガスコンテナ内部の保護 |
CN108715998A (zh) * | 2018-06-14 | 2018-10-30 | 华中科技大学 | 一种用于大批量微纳米颗粒包裹的原子层沉积装置 |
CN109518164A (zh) * | 2018-12-20 | 2019-03-26 | 北京北方华创微电子装备有限公司 | 原子层沉积设备及方法 |
Also Published As
Publication number | Publication date |
---|---|
EP3959352A1 (en) | 2022-03-02 |
WO2020216995A1 (en) | 2020-10-29 |
US20220146051A1 (en) | 2022-05-12 |
US11549702B2 (en) | 2023-01-10 |
FI20195337A1 (en) | 2020-10-26 |
CN114072538A (zh) | 2022-02-18 |
EP3959352A4 (en) | 2022-06-08 |
EP3959352B1 (en) | 2023-02-15 |
FI129502B (en) | 2022-03-31 |
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Address after: Espoo, Finland Applicant after: BENEQ Group Ltd. Address before: Espoo, Finland Applicant before: BENEQ OY |
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Effective date of registration: 20220909 Address after: Espoo, Finland Applicant after: BENEQ OY Address before: Espoo, Finland Applicant before: BENEQ Group Ltd. |
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Effective date of registration: 20230427 Address after: Room 205-5-7, 2nd Floor, East Office Building, No. 45 Beijing Road, Qianwan Bonded Port Area, Qingdao, Shandong Province, China (Shandong) Pilot Free Trade Zone (A) Applicant after: QINGDAO SIFANG SRI INTELLIGENT TECHNOLOGY Co.,Ltd. Address before: Espoo, Finland Applicant before: BENEQ OY |
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