CN114002917B - 曝光设备和用于制造制品的方法 - Google Patents

曝光设备和用于制造制品的方法

Info

Publication number
CN114002917B
CN114002917B CN202110841387.3A CN202110841387A CN114002917B CN 114002917 B CN114002917 B CN 114002917B CN 202110841387 A CN202110841387 A CN 202110841387A CN 114002917 B CN114002917 B CN 114002917B
Authority
CN
China
Prior art keywords
substrate
thrust
exposure
time
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202110841387.3A
Other languages
English (en)
Chinese (zh)
Other versions
CN114002917A (zh
Inventor
早川崇志
江本圭司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN114002917A publication Critical patent/CN114002917A/zh
Application granted granted Critical
Publication of CN114002917B publication Critical patent/CN114002917B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
CN202110841387.3A 2020-07-28 2021-07-26 曝光设备和用于制造制品的方法 Active CN114002917B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020-127585 2020-07-28
JP2020127585A JP7532131B2 (ja) 2020-07-28 2020-07-28 露光装置、及び物品の製造方法

Publications (2)

Publication Number Publication Date
CN114002917A CN114002917A (zh) 2022-02-01
CN114002917B true CN114002917B (zh) 2026-03-03

Family

ID=76958758

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202110841387.3A Active CN114002917B (zh) 2020-07-28 2021-07-26 曝光设备和用于制造制品的方法

Country Status (6)

Country Link
US (1) US12326666B2 (https=)
EP (1) EP3945368B1 (https=)
JP (1) JP7532131B2 (https=)
KR (1) KR102890198B1 (https=)
CN (1) CN114002917B (https=)
TW (1) TWI854138B (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7504168B2 (ja) * 2022-08-10 2024-06-21 キヤノン株式会社 露光装置、露光方法及び物品の製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3977086B2 (ja) * 2002-01-18 2007-09-19 キヤノン株式会社 ステージシステム
JP3679776B2 (ja) 2002-04-22 2005-08-03 キヤノン株式会社 駆動装置、露光装置及びデバイス製造方法
JP2004072076A (ja) 2002-06-10 2004-03-04 Nikon Corp 露光装置及びステージ装置、並びにデバイス製造方法
US7253576B2 (en) * 2004-04-05 2007-08-07 Nikon Corporation E/I core actuator commutation formula and control method
US8140288B2 (en) * 2007-04-18 2012-03-20 Nikon Corporation On-machine methods for identifying and compensating force-ripple and side-forces produced by actuators on a multiple-axis stage
NL2004847A (en) * 2009-06-30 2011-01-04 Asml Holding Nv Method for controlling the position of a movable object, a control system for controlling a positioning device, and a lithographic apparatus.
JP5406861B2 (ja) * 2011-01-01 2014-02-05 キヤノン株式会社 露光装置及びデバイス製造方法
NL2016688A (en) * 2015-07-09 2017-01-17 Asml Netherlands Bv Movable support and lithographic apparatus
WO2019096536A1 (en) * 2017-11-15 2019-05-23 Asml Netherlands B.V. Positioning system and method for positioning a stage with respect to a frame
JP7005344B2 (ja) * 2017-12-28 2022-01-21 キヤノン株式会社 制御方法、制御装置、リソグラフィ装置、および物品の製造方法

Also Published As

Publication number Publication date
TWI854138B (zh) 2024-09-01
US20220035260A1 (en) 2022-02-03
CN114002917A (zh) 2022-02-01
JP7532131B2 (ja) 2024-08-13
KR102890198B1 (ko) 2025-11-24
US12326666B2 (en) 2025-06-10
KR20220014293A (ko) 2022-02-04
JP2022024792A (ja) 2022-02-09
EP3945368A1 (en) 2022-02-02
EP3945368B1 (en) 2026-04-29
TW202223545A (zh) 2022-06-16

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