CN113985700A - 光波导与显示装置的制作方法及其使用的光罩 - Google Patents
光波导与显示装置的制作方法及其使用的光罩 Download PDFInfo
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- CN113985700A CN113985700A CN202111369726.9A CN202111369726A CN113985700A CN 113985700 A CN113985700 A CN 113985700A CN 202111369726 A CN202111369726 A CN 202111369726A CN 113985700 A CN113985700 A CN 113985700A
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Images
Classifications
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/01—Head-up displays
- G02B27/017—Head mounted
- G02B27/0172—Head mounted characterised by optical features
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12083—Constructional arrangements
- G02B2006/12107—Grating
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/01—Head-up displays
- G02B27/017—Head mounted
- G02B2027/0178—Eyeglass type
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Integrated Circuits (AREA)
Abstract
Description
Claims (47)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202111369726.9A CN113985700B (zh) | 2021-11-18 | 2021-11-18 | 光波导与显示装置的制作方法及其使用的光罩 |
TW110143572A TWI807498B (zh) | 2021-11-18 | 2021-11-23 | 光波導與顯示裝置之製作方法及其使用之光罩 |
US17/569,809 US20230152690A1 (en) | 2021-11-18 | 2022-01-06 | Methods for fabricating an optical waveguide and a display device and photomask used therein |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202111369726.9A CN113985700B (zh) | 2021-11-18 | 2021-11-18 | 光波导与显示装置的制作方法及其使用的光罩 |
Publications (2)
Publication Number | Publication Date |
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CN113985700A true CN113985700A (zh) | 2022-01-28 |
CN113985700B CN113985700B (zh) | 2023-08-29 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN202111369726.9A Active CN113985700B (zh) | 2021-11-18 | 2021-11-18 | 光波导与显示装置的制作方法及其使用的光罩 |
Country Status (3)
Country | Link |
---|---|
US (1) | US20230152690A1 (zh) |
CN (1) | CN113985700B (zh) |
TW (1) | TWI807498B (zh) |
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- 2021-11-18 CN CN202111369726.9A patent/CN113985700B/zh active Active
- 2021-11-23 TW TW110143572A patent/TWI807498B/zh active
-
2022
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EP0065465A1 (fr) * | 1981-05-19 | 1982-11-24 | Thomson-Csf | Procédé de réalisation d'un filtre coloré pour photosenseur |
JPH04110380A (ja) * | 1990-08-31 | 1992-04-10 | Sumitomo Cement Co Ltd | 紫外線吸収剤 |
US5230990A (en) * | 1990-10-09 | 1993-07-27 | Brother Kogyo Kabushiki Kaisha | Method for producing an optical waveguide array using a resist master |
JPH0571994A (ja) * | 1991-09-10 | 1993-03-23 | Sekisui Chem Co Ltd | 立体画像表示盤の製造方法 |
JPH05171130A (ja) * | 1991-10-17 | 1993-07-09 | Sekisui Jushi Co Ltd | 紫外線遮断性透明樹脂成形体 |
JPH06258537A (ja) * | 1993-03-08 | 1994-09-16 | Mitsubishi Rayon Co Ltd | ドライフィルムレジストおよびそれを用いたプリント配線板 |
JPH09235355A (ja) * | 1996-02-28 | 1997-09-09 | Taiyo Ink Mfg Ltd | 光硬化性・熱硬化性樹脂組成物及びこれを用いた多層プリント配線板の製造方法 |
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JP2002139638A (ja) * | 2000-08-23 | 2002-05-17 | Matsushita Electric Ind Co Ltd | 光学素子及びその製造方法 |
TW200307312A (en) * | 2002-02-25 | 2003-12-01 | Sony Corp | Manufacturing method of mask for exposure and exposure mask |
JP2004151160A (ja) * | 2002-10-28 | 2004-05-27 | Toyota Central Res & Dev Lab Inc | 光導波路の製造方法 |
JP2004354537A (ja) * | 2003-05-27 | 2004-12-16 | Matsushita Electric Works Ltd | 微細構造体製造用マスターモデルの製造法と微細構造体製造用マスターモデル及び微細構造体 |
US20070223867A1 (en) * | 2004-05-31 | 2007-09-27 | Sekonix Co., Ltd. | Optical Device For A Display Having Tapered Waveguide And Process For Making The Same |
CN101374650A (zh) * | 2006-01-30 | 2009-02-25 | 佳能株式会社 | 制备多层光记录介质的方法和压模以及制造该压模的方法 |
CN201060284Y (zh) * | 2007-01-16 | 2008-05-14 | 杭州富通通信技术股份有限公司 | 低弯曲损耗、低非线性效应的单模光纤 |
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