CN113894017A - Method for improving flatness by sectional waxing rotation speed - Google Patents
Method for improving flatness by sectional waxing rotation speed Download PDFInfo
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- CN113894017A CN113894017A CN202111019766.0A CN202111019766A CN113894017A CN 113894017 A CN113894017 A CN 113894017A CN 202111019766 A CN202111019766 A CN 202111019766A CN 113894017 A CN113894017 A CN 113894017A
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- speed
- wax
- silicon wafer
- waxing
- rotation speed
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/002—Processes for applying liquids or other fluent materials the substrate being rotated
- B05D1/005—Spin coating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The invention provides a method for improving flatness by a sectional wax coating rotating speed, which comprises the following steps: after wax is dropped, the silicon wafer rotates at a low speed, and the low-speed rotation speed is 1000-1500 rpm; step two, the silicon wafer rotates at medium speed, and the speed of the medium speed rotation is 2000-2500 rpm; and thirdly, the silicon wafer rotates at a high speed, wherein the high-speed rotating speed is 3000-3500 rpm. This patent will be scribbled the wax rotation and divide into 3 steps, has realized the uniformity of wax matrix thickness, and wax matrix thickness control is in the required scope, and the thick wax matrix causes corrugated bad easily.
Description
Technical Field
The invention relates to the technical field of silicon wafer processing, in particular to a method for improving flatness by sectional wax coating rotating speed.
Background
In recent years, the design line width of integrated circuits is developing towards nanometer scale, and more rigorous requirements are put on the surface performance of semiconductor silicon materials. However, after the characteristic size of the device is gradually reduced, the yield of the device is directly related to the flatness of the silicon wafer. The SFQR (the variation range from the highest point and the lowest point of the local range of the silicon wafer to the reference surface) is a main parameter of the flatness of the silicon wafer, and factors influencing the SFQR are many, including ripples, the morphology of the ceramic plate, the uniformity of a wax film and the like. In the single-side polishing process, wax coating and pasting of the silicon wafer are indispensable procedures, and parameter control of wax dropping and rotary coating in the process is particularly important for uniformity of a wax film on the back side of the silicon wafer and has great influence on flatness of the silicon wafer after final polishing.
It has been found that the wax film spreads from the inside to the outside along with the centrifugal force during the spin coating of the wax, the wax film is deposited on the edge of the silicon wafer to form a crown shape (see fig. 1), the edge is protruded after the wax film is attached to the ceramic plate, and the edge of the silicon wafer is collapsed after the polishing process is completed (see fig. 2).
Disclosure of Invention
The invention provides a method for improving flatness by a sectional wax coating rotating speed, which solves at least one technical problem.
In order to achieve the purpose, the technical scheme adopted by the invention is as follows:
the invention provides a method for improving flatness by a sectional wax coating rotating speed, which is characterized by comprising the following steps:
after wax is dropped, the silicon wafer rotates at a low speed, and the low-speed rotation speed is 1000-1500 rpm;
step two, the silicon wafer rotates at medium speed, and the speed of the medium speed rotation is 2000-2500 rpm;
and thirdly, the silicon wafer rotates at a high speed, wherein the high-speed rotating speed is 3000-3500 rpm.
This patent will scribble the wax rotation and divide into 3 steps, has realized the uniformity of wax membrane thickness. The thickness of the wax film is controlled within a required range, and the thick wax film easily causes the poor corrugation.
Firstly, after wax is dropped, the wax coating rotation initial speed is set to be 1000-1500rpm, and the rotating motor is protected to be normally started at a lower rotating speed; rotating at the medium speed of 2000-2500rpm to enable the wax film to cover the whole surface of the silicon wafer; and thirdly, rotating at a high speed of 3000-3500 rpm to accelerate the wax accumulated on the edge of the silicon wafer to be thrown out, so that better wax film uniformity is obtained.
Further preferably, in the step one, the time is 1-2 s.
Further preferably, in the second step, the time is 2-3 s.
Further preferably, in the third step, the time is 2-3 s.
Further preferably, the time for dropping the wax is 1 s.
Further preferably, in the step one, the speed of the low-speed rotation is 1500rpm, and the time is 1 s;
step two, the speed of medium-speed rotation is 2500rpm, and the time is 2 s;
and step three, the high-speed rotation speed is 3500rpm, and the time is 3 s.
Further preferably, in the step one, when the wax is dripped, the distance between the dripping point and the center of the silicon wafer is 5-7 mm.
When wax is coated, the wax is firstly dripped on the silicon wafer to deviate from the center by 5-7mm, and the wax is uniformly distributed on the whole silicon wafer surface through rotation, so that preparation is made for attaching the subsequent silicon wafer on a ceramic plate. If the liquid drops on the center of the silicon wafer, the thickness of the wax film at the center part is too thick due to lack of centrifugal force during rotation, and center depression occurs after polishing. The uniformity of the thickness of the wax film is controlled by adjusting the coating rotation speed, so that the flatness of the silicon wafer is ensured.
Further preferably, in the step one, when the wax is dripped, the wax is stored in a needle cylinder, and the needle cylinder is detachably arranged above the grinding disc;
the outer circumference of the wax outlet of the needle cylinder is provided with a central infrared laser emitting head, the central infrared laser emitting head is used for rightly facing to the center of the silicon wafer, and the distance between the central infrared laser emitting head and the wax outlet of the needle cylinder is 5-7 mm.
The accurate guarantee of wax dropping position is convenient to realize.
Further preferably, the syringe is mounted on a support;
the support comprises an upright column which is rotatably connected with a frame of the grinding disc in the vertical direction, the upright column is fixedly connected with a support frame, and the support frame is provided with a mounting groove for detachably connecting the needle cylinder;
the rack and the upright posts are provided with mutually matched positioning structures for marking the upright posts to rotate in place;
when the needle cylinder rotates to the position, the distance between the wax outlet of the needle cylinder and the center of the silicon wafer is 5-7 mm.
Facilitating the rotational movement of the needle cylinder out from above the abrasive disc.
Further preferably, the support frame is further provided with a silicon wafer positioning structure, the silicon wafer positioning structure comprises a central block, the central infrared laser emitting head is located in the center of the central block, the central block is eccentrically provided with the mounting groove, and the periphery of the central block is hinged to a swing arm on the periphery of the mounting groove;
the laser emitting head is installed to the tip that the center block was kept away from to the swing arm, the central authorities of swing arm are articulated with pneumatic telescopic link's one end, pneumatic telescopic link's the other end with the center block is articulated.
The extension amount of all the pneumatic telescopic rods is unified, so that the distance between the laser emitting head and the center can be adjusted, and the positioning of silicon wafers with different outer diameters can be realized.
Or, the support frame is also provided with a silicon wafer positioning structure, the silicon wafer positioning structure comprises a positioning disc, the positioning disc is fixed on the periphery of a central block, the central infrared laser emission head is positioned in the center of the central block, and the central block is eccentrically provided with the mounting groove;
the silicon wafer positioning structure further comprises a rotating disc, and the rotating disc is rotatably connected with the central block through a bearing;
the positioning disc is provided with three line-shaped grooves which are circumferentially distributed, and infrared laser emission heads are connected in the line-shaped grooves in a sliding mode;
the rotating disc is provided with an arc-shaped guide groove for slidably connecting the infrared laser emitting head;
the outer wall of the rotating disc is provided with a handle for driving the rotating disc to rotate;
the infrared laser emission head comprises an outer shell, an upper pressing ring and a lower pressing ring are connected to the outer shell in a threaded mode, and the upper pressing ring and the lower pressing ring are clamped between the rotating disk and the positioning disk.
The rotation of the rotating disk is convenient, so that the distance between the laser emitting head and the center can be adjusted, and the positioning of silicon wafers with different outer diameters can be realized.
More preferably, in the step one, the wax dropping amount is 1.0-2.0 ml.
Due to the action of centrifugal force in the wax coating rotation process, the wax film coating covers the surface of the silicon wafer from inside to outside, and in order to ensure that the whole silicon wafer surface can be covered with the wax film, the using amount of the wax must meet the requirement that the wax film is uniformly coated on the whole silicon wafer surface and cannot be covered, and the using amount is the lower limit of the using amount.
Drawings
FIG. 1 is a schematic structural diagram of a prior art silicon wafer coated with a pull film;
FIG. 2 is a schematic view showing a silicon wafer coated with wax oil and placed on a ceramic plate according to the prior art;
FIG. 3 is a flow chart of the present invention;
FIG. 4 is a partial schematic view of the present invention;
FIG. 5 is a bottom view of the silicon wafer positioning structure of the present invention
FIG. 6 is a top view of another configuration of the wafer positioning structure of the present invention;
FIG. 7 is a bottom view of the structure of FIG. 5 of the silicon wafer positioning structure of the present invention;
FIG. 8 is a schematic layout of wax thickness measurement points according to the present invention.
The grinding disc comprises a grinding disc body 1, a needle cylinder body 2, a stand column 3, a support frame 4, a laser emission head 5, a telescopic rod 6, an extension part 7, a swing arm 8, a mounting groove 9 and a central infrared laser emission head 10. 11 is a rotating disk, 12 is an arc-shaped guide groove, 13 is a positioning disk, and 14 is a straight groove.
Detailed Description
The following embodiments are implemented on the premise of the technical scheme of the present invention, and give detailed implementation modes and specific operation procedures, but the protection scope of the present invention is not limited to the following embodiments.
Referring to fig. 3 to 7, a method for improving flatness by using a segmented waxing rotation speed includes the following steps:
dropping wax, wherein the distance between the wax dropping point and the center of the silicon wafer deviates 5-7mm during wax dropping. The time for dropping wax was 1 s.
After the wax is dropped, the silicon wafer rotates at a low speed, the speed of the low-speed rotation is 1000-1500rpm, and the time is 1-2 s.
And step two, the silicon wafer rotates at medium speed, the speed of the medium speed rotation is 2000-2500rpm, and the time is 2-3 s.
And thirdly, the silicon wafer rotates at a high speed, the speed of the high-speed rotation is 3000-3500 rpm, and the time is 2-3 s.
This patent will scribble the wax rotation and divide into 3 steps, has realized the uniformity of wax membrane thickness.
Firstly, after wax is dropped, the wax coating rotation initial speed is set to be 1000-1500rpm, and the rotating motor is protected to be normally started at a lower rotating speed; rotating at the medium speed of 2000-2500rpm to enable the wax film to cover the whole surface of the silicon wafer; and thirdly, rotating at a high speed of 3000-3500 rpm to accelerate the wax accumulated on the edge of the silicon wafer to be thrown out, so that better wax film uniformity is obtained.
Step one, the speed of low-speed rotation is 1500rpm, and the time is 1 s;
step two, the speed of medium-speed rotation is 2500rpm, and the time is 2 s;
and step three, the high-speed rotation speed is 3500rpm, and the time is 3 s.
Step one, when wax is dripped, the wax is stored in a needle cylinder, and the needle cylinder is detachably arranged above a grinding disc; and a central infrared laser emitting head is arranged on the outer circumference of the wax outlet of the needle cylinder and is used for facing the center of the silicon wafer, and the distance between the central infrared laser emitting head and the wax outlet of the needle cylinder is 5-7 mm. The accurate guarantee of wax dropping position is convenient to realize.
The needle cylinder 2 is arranged on a bracket; the support comprises an upright post 3 which is rotatably connected with the frame of the grinding disc 1 in the vertical direction, the upright post 3 is fixedly connected with a support frame, and the support frame is provided with a mounting groove for detachably connecting the needle cylinder 2; the frame and the upright post 3 are provided with mutually matched positioning structures for marking the rotation arrival position of the upright post 3; when the needle cylinder 2 rotates to the position, the distance between the wax outlet of the needle cylinder 2 and the center of the silicon wafer is 5-7 mm. Facilitating the rotational movement of the needle cylinder 2 out from above the abrasive disc 1.
The supporting frame 4 is also provided with a silicon wafer positioning structure, the silicon wafer positioning structure comprises a central block, a central infrared laser emitting head 10 is positioned in the center of the central block, a mounting groove 9 is eccentrically arranged on the central block, and the periphery of the central block is hinged to a swing arm 8 at the periphery of the mounting groove 9; the end part of the swing arm 8 far away from the central block is provided with a laser emitting head 5, the center of the swing arm 8 is hinged with one end of a pneumatic telescopic rod, and the other end of the pneumatic telescopic rod 6 is hinged with the central block. The extension amount of all the pneumatic telescopic rods 6 is unified, so that the distance between the laser emitting head 5 and the center can be adjusted, and the positioning of silicon wafers with different outer diameters can be realized. The central block is provided with an extension part 7 extending outwards, and the end part of the pneumatic telescopic rod is hinged with the extension part. Or the center block is provided with an inner concave part, and the end part of the pneumatic telescopic rod is hinged with the inner concave part.
Or, the support frame 4 is also provided with a silicon wafer positioning structure, the silicon wafer positioning structure comprises a positioning disc, the positioning disc is fixed on the periphery of a central block, the central infrared laser emission head 5 is positioned in the center of the central block, and the central block is eccentrically provided with a mounting groove; the silicon wafer positioning structure further comprises a rotating disk 11, and the rotating disk 11 is rotatably connected with the central block through a bearing; three line-shaped grooves 14 which are circumferentially distributed are formed in the positioning disc 13, and the infrared laser emission heads 5 are connected in the line-shaped grooves 14 in a sliding mode; the rotating disc is provided with an arc-shaped guide groove 12 which is used for being connected with the infrared laser emitting head 5 in a sliding manner; the outer wall of the rotating disc is provided with a handle for driving the rotating disc to rotate; the infrared laser emitting head 5 comprises a shell, an upper pressing ring and a lower pressing ring are connected to the shell in a threaded mode, and the upper pressing ring and the lower pressing ring are clamped between the rotating disc and the positioning disc 13. The rotation of the rotating disk is convenient, so that the distance between the laser emitting head 5 and the center can be adjusted, and the positioning of silicon wafers with different outer diameters can be realized. The positioning disc is positioned above the rotating disc. And a scale mark is arranged beside a sub-groove 14 of the positioning plate 13, and the length direction of the scale mark is parallel to the length direction of the linear groove.
Step one, the wax dropping amount is 1.0-2.0 ml.
Through cross validation of the waxing rotation speed, the segmented waxing rotation can obtain better wax film uniformity and control the wax film thickness within an ideal range (1.3 +/-0.1 um). The 9 thickness measurement points are shown in fig. 8.
The numbers 1-3 are the results of measurement using the conventional uniform rotation speed, and the numbers 4-8 are the results of measurement using the alternate rotation speed of this patent.
The numbers 1 to 3 are the results of measurement using the conventional uniform rotation speed, wherein although the uniformity of a part of the wax film is better than the numbers 4 to 8, the results of measurement using the alternate rotation speed, the wax film thickness measured by the numbers 1 to 3 is higher than the results of measurement of the numbers 4 to 8, the deviation of the wax film thickness measured by the numbers 1 to 3 from the reasonable wax film thickness is large, the ideal wax film thickness is 1.3 +/-0.1 um, and the thick wax film easily causes the defect of waviness.
Therefore, the performance of the wax film adopting the alternate rotating speed mode is superior to that of the wax film with the traditional uniform rotating speed.
The sequence number 4 can be obtained through different experiments, and in the step I, the speed of low-speed rotation is 1500rpm, and the time is 1 s; step two, the speed of medium-speed rotation is 2500rpm, and the time is 2 s; and step three, the high-speed rotation speed is 3000rpm, and the time is 3 s. The uniformity and wax film thickness after spin coating are optimal.
While the preferred embodiments of the present invention have been described in detail, it will be understood by those skilled in the art that the invention is not limited thereto, and that various changes and modifications may be made without departing from the spirit of the invention, and the scope of the appended claims is to be accorded the full scope of the invention.
Claims (10)
1. A method for improving flatness by segmented waxing rotation speed is characterized by comprising the following steps:
after wax is dropped, the silicon wafer rotates at a low speed, and the low-speed rotation speed is 1000-1500 rpm;
step two, the silicon wafer rotates at medium speed, and the speed of the medium speed rotation is 2000-2500 rpm;
and thirdly, the silicon wafer rotates at a high speed, wherein the high-speed rotating speed is 3000-3500 rpm.
2. The method for improving flatness by segmented waxing rotation speed according to claim 1, characterized in that: step one, the time is 1-2 s.
3. The method for improving flatness by segmented waxing rotation speed according to claim 1, characterized in that: and step two, the time is 2-3 s.
4. The method for improving flatness by segmented waxing rotation speed according to claim 1, characterized in that: and step three, the time is 2-3 s.
5. The method for improving flatness by segmented waxing rotation speed according to claim 1, characterized in that: the time for dropping wax was 1 s.
6. The method for improving flatness by segmented waxing rotation speed according to claim 1, characterized in that: step one, the speed of low-speed rotation is 1500rpm, and the time is 1 s;
step two, the speed of medium-speed rotation is 2500rpm, and the time is 2 s;
and step three, the high-speed rotation speed is 3500rpm, and the time is 3 s.
7. The method for improving flatness by segmented waxing rotation speed according to claim 1, characterized in that: step one, when the wax is dripped, the distance between the wax and the center of the silicon wafer is 5-7 mm.
8. The method for improving flatness by segmented waxing rotation speed according to claim 1, characterized in that: step one, when wax is dripped, the wax is stored in a needle cylinder, and the needle cylinder is detachably arranged above a grinding disc;
the outer circumference of the wax outlet of the needle cylinder is provided with a central infrared laser emitting head, the central infrared laser emitting head is used for rightly facing to the center of the silicon wafer, and the distance between the central infrared laser emitting head and the wax outlet of the needle cylinder is 5-7 mm.
9. The method for improving flatness by segmented waxing rotation speed according to claim 8, characterized in that: the needle cylinder is arranged on a bracket;
the support comprises an upright column which is rotatably connected with a frame of the grinding disc in the vertical direction, the upright column is fixedly connected with a support frame, and the support frame is provided with a mounting groove for detachably connecting the needle cylinder;
the rack and the upright posts are provided with mutually matched positioning structures for marking the upright posts to rotate in place;
when the needle cylinder rotates to the position, the distance between the wax outlet of the needle cylinder and the center of the silicon wafer is 5-7 mm.
10. The method for improving flatness by segmented waxing rotation speed according to claim 10, wherein: the supporting frame is also provided with a silicon wafer positioning structure, the silicon wafer positioning structure comprises a central block, the central infrared laser emitting head is positioned in the center of the central block, the central block is eccentrically provided with the mounting groove, and the periphery of the central block is hinged to a swing arm at the periphery of the mounting groove;
the laser emitting head is installed to the tip that the center block was kept away from to the swing arm, the central authorities of swing arm are articulated with pneumatic telescopic link's one end, pneumatic telescopic link's the other end with the center block is articulated.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202111019766.0A CN113894017B (en) | 2021-09-01 | 2021-09-01 | Method for improving flatness by sectional waxing rotation speed |
| CN202211555604.3A CN115770709B (en) | 2021-09-01 | 2021-09-01 | Method for improving flatness by silicon wafer positioning sectional type waxing rotating speed |
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| CN202111019766.0A CN113894017B (en) | 2021-09-01 | 2021-09-01 | Method for improving flatness by sectional waxing rotation speed |
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| CN202211555604.3A Division CN115770709B (en) | 2021-09-01 | 2021-09-01 | Method for improving flatness by silicon wafer positioning sectional type waxing rotating speed |
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| US4851263A (en) * | 1986-10-23 | 1989-07-25 | Mitsubishi Kinzoku Kabushiki Kaisha | Method and apparatus for application of wax on wafers |
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| CN108315720A (en) * | 2018-01-31 | 2018-07-24 | 上海集成电路研发中心有限公司 | A kind of device and method improving film thickness uniformity |
| CN113894017B (en) * | 2021-09-01 | 2023-02-10 | 上海中欣晶圆半导体科技有限公司 | Method for improving flatness by sectional waxing rotation speed |
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| US4851263A (en) * | 1986-10-23 | 1989-07-25 | Mitsubishi Kinzoku Kabushiki Kaisha | Method and apparatus for application of wax on wafers |
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| CN102490439A (en) * | 2011-12-15 | 2012-06-13 | 天津中环领先材料技术有限公司 | Waxy surface mount device process adopting zone-melt single crystal silicon double-side polished chip for IGBT (insulated gate bipolar transistor) |
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| CN115770709A (en) | 2023-03-10 |
| CN115770709B (en) | 2023-08-08 |
| CN113894017B (en) | 2023-02-10 |
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