CN113804112B - Displacement measurement system and lithography equipment - Google Patents
Displacement measurement system and lithography equipment Download PDFInfo
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- CN113804112B CN113804112B CN202110940333.2A CN202110940333A CN113804112B CN 113804112 B CN113804112 B CN 113804112B CN 202110940333 A CN202110940333 A CN 202110940333A CN 113804112 B CN113804112 B CN 113804112B
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- 238000005259 measurement Methods 0.000 title claims abstract description 111
- 238000006073 displacement reaction Methods 0.000 title claims abstract description 105
- 238000001459 lithography Methods 0.000 title description 6
- 230000007246 mechanism Effects 0.000 claims abstract description 22
- 238000001514 detection method Methods 0.000 claims abstract description 18
- 238000004364 calculation method Methods 0.000 claims description 4
- 238000005411 Van der Waals force Methods 0.000 claims description 3
- 238000004026 adhesive bonding Methods 0.000 claims description 2
- 238000002203 pretreatment Methods 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 14
- 230000008569 process Effects 0.000 abstract description 12
- 238000001259 photo etching Methods 0.000 abstract description 2
- 238000007781 pre-processing Methods 0.000 description 33
- 238000010586 diagram Methods 0.000 description 21
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 1
- 238000005305 interferometry Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 238000010183 spectrum analysis Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
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- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention provides a displacement measurement system and photoetching equipment, which relate to the technical field of grating measurement and comprise a grating mounting plate, and an exposure bit grating and a pretreatment bit grating which are sequentially arranged on the grating mounting plate along a first direction, wherein the exposure bit grating and the pretreatment bit grating respectively comprise a rectangular grating; the detection mechanism is matched with the exposure position grating and the pretreatment position grating and is used for providing a measurement reference of the displacement measurement system; the first direction is perpendicular to the second direction, the exposure position grating and the pretreatment position grating respectively comprise a back-shaped grating, when the workpiece table is changed from the pretreatment position to the exposure position along the first direction, the detection mechanism can complete measurement through a relatively simple resolving process only through one slit between the exposure position grating and the pretreatment position grating during switching, and the edge switching of the plane grating measuring system is simplified.
Description
Technical Field
The present invention relates to the field of grating measurement technology, and in particular, to a displacement measurement system and a lithographic apparatus.
Background
The planar grating is used as a common optical device capable of generating diffraction phenomenon, and is mainly applied to spectrum analysis, optical wavelength measurement and the like. The measuring grating in the existing measuring system comprises an exposure bit grating and a pretreatment bit grating which are sequentially arranged, and a specific workpiece stage detector is matched to provide a measuring reference for the grating interferometry system, so that displacement measurement is realized. On the basis of the requirement of measurement precision, on one hand, the switching resolving process is optimized, the resolving efficiency and the resolving precision are improved, and on the other hand, the measuring system can also start from each component, wherein the grating layout form is also one of influencing factors.
In the prior art, two square-shaped gratings formed by splicing eight L-shaped two-dimensional gratings are adopted, one of the two square-shaped gratings forms an exposure bit grating, the other one forms a pretreatment bit grating, a slit is formed between the exposure bit grating and the pretreatment bit grating, and a slit is also formed in each of the exposure bit grating and the pretreatment bit grating.
Disclosure of Invention
The invention aims to provide a displacement measurement system and photoetching equipment, so as to solve the technical problems that the edge switching process of a planar grating is complex and the higher measurement requirement is difficult to meet in the existing grating splicing method.
The invention provides a displacement measurement system, which comprises a grating mounting plate, and an exposure bit grating and a pretreatment bit grating which are sequentially arranged on the grating mounting plate along a first direction, wherein the exposure bit grating and the pretreatment bit grating respectively comprise a rectangular grating;
The displacement measurement system further comprises a workpiece table and detection mechanisms which are arranged on the surface of the workpiece table at intervals, wherein the workpiece table and the grating mounting plate are arranged at intervals along a second direction, and the detection mechanisms are matched with the exposure position grating and the pretreatment position grating and are used for providing a measurement reference of the displacement measurement system;
The first direction is perpendicular to the second direction.
Further, the back-shaped grating comprises two C-shaped plane gratings which are spaced along a third direction and are oppositely arranged;
the first direction, the second direction and the third direction are perpendicular to each other.
Further, the back-shaped grating is a planar reflection type two-dimensional grating, and the lower surface of the back-shaped grating is parallel to the surface of the workpiece table.
Furthermore, the back-shaped grating is connected to the lower surface of the grating mounting plate in a van der Waals force or gluing mode.
Further, the detection mechanism comprises four detectors, the workpiece table is of a rectangular structure, each corner of the rectangular structure is provided with one detector, and projections of the four detectors in the first direction are not coincident;
When one detector is in an invalid region, diffraction return light of the plane grating cannot be received, six-degree-of-freedom displacement can be calculated only by means of displacement measurement values of other detectors, and the measurement values required by the solution are required to be continuously switched by different detectors when the different detectors pass through the invalid region.
Further, the detector is a grating interferometer or a grating encoder with a two-degree-of-freedom measurement function.
Further, the detector comprises a detector lens group, an incident light/return light signal receiver and a mounting seat assembly; the detector lens group and the light-in/light-back signal receiver are fixed on the surface of the workpiece table through the mounting seat assembly;
The detector lens group is used for generating laser interference signals, and the light-in/light-back signal receiver is used for providing input signals and receiving output interference signals.
Further, the displacement measurement system further comprises a driving mechanism, wherein the driving mechanism is connected with the workpiece table and used for driving the workpiece table and the detection mechanism to move in the first direction, the second direction and the third direction, and the third direction is a direction perpendicular to the first direction and the second direction respectively.
Further, the displacement measurement system further comprises an extended bit grating, and the extended bit grating is connected to one side of the exposure bit grating far away from the preprocessing bit grating.
The lithographic apparatus provided by the invention comprises the displacement measurement system.
The invention provides a displacement measurement system, which comprises a grating mounting plate, and an exposure bit grating and a pretreatment bit grating which are sequentially arranged on the grating mounting plate along a first direction, wherein the exposure bit grating and the pretreatment bit grating respectively comprise a rectangular grating; the displacement measurement system further comprises a workpiece table and detection mechanisms which are arranged on the surface of the workpiece table at intervals, wherein the workpiece table and the grating mounting plate are arranged at intervals along a second direction, and the detection mechanisms are matched with the exposure position grating and the pretreatment position grating and are used for providing a measurement reference of the displacement measurement system; the first direction is perpendicular to the second direction.
Compared with the prior art, in the displacement measurement system provided by the invention, the exposure bit grating and the pretreatment bit grating respectively comprise the one-back type grating, and when the workpiece table is operated from the pretreatment bit to the exposure bit in the first direction, the detection mechanism only needs to pass through one slit between the exposure bit grating and the pretreatment bit grating, so that the measurement can be completed through a relatively simple resolving process during the switching, the edge switching of the planar grating measurement system is simplified, and the higher measurement requirement can be met.
The lithographic apparatus provided by the invention comprises the displacement measurement system, so that the lithographic apparatus also has the advantages of the displacement measurement system.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings that are needed in the description of the embodiments or the prior art will be briefly described, and it is obvious that the drawings in the description below are some embodiments of the present invention, and other drawings can be obtained according to the drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic diagram showing the splicing of an exposure bit grating and a pre-processing bit grating of a displacement measurement system according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of connection between an exposure bit grating and a pretreatment bit grating of a displacement measurement system according to an embodiment of the present invention and a grating mounting board;
FIG. 3 is a schematic diagram of the positions of the C-shaped grating and the workpiece stage of the displacement measurement system according to the embodiment of the present invention;
FIG. 4 is a schematic diagram of the position of a workpiece stage and a pre-processing grating of the displacement measurement system according to the embodiment of the present invention;
FIG. 5 is a schematic diagram of the position of a workpiece stage and a pre-processing grating of the displacement measurement system according to the embodiment of the present invention;
FIG. 6 is a schematic diagram of a slit between a pre-processing bit grating and an exposure bit grating of a first detector of a displacement measurement system according to an embodiment of the present invention;
FIG. 7 is a schematic diagram of a slit between a pre-processing bit grating and an exposure bit grating of a second detector of the displacement measurement system according to an embodiment of the present invention;
FIG. 8 is a schematic diagram of a third detector of the displacement measurement system according to an embodiment of the present invention in a slit between a pre-processing bit grating and an exposure bit grating;
FIG. 9 is a schematic diagram of a fourth detector of the displacement measurement system according to an embodiment of the present invention in a slit between a pre-processing bit grating and an exposure bit grating;
FIG. 10 is a schematic diagram of a failure area of a second detector of the displacement measurement system according to the embodiment of the present invention when the first detector is in an extended bit grating;
FIG. 11 is a schematic diagram illustrating two degrees of freedom measurement performed by a detector of a displacement measurement system according to an embodiment of the present invention;
FIG. 12 is a schematic diagram of a layout of a back-shaped grating of a displacement measurement system according to an embodiment of the present invention;
fig. 13 is a schematic diagram of another layout of a return-type grating of the displacement measurement system according to the embodiment of the present invention.
Icon: 101- "C" shape plane grating; 110-preprocessing the bit grating; 120-exposing a bit grating; 130-an extended bit grating; 200-a workpiece table; 210-a detector; 211-detector one; 212-a detector II; 213-detector three; 214-detector four; 300-grating mounting plate; 400-light source.
Detailed Description
The technical solutions of the present invention will be clearly and completely described in connection with the embodiments, and it is apparent that the described embodiments are some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
As shown in fig. 1 to 13, the displacement measurement system provided in this embodiment includes a grating mounting plate 300, and an exposure bit grating 120 and a pretreatment bit grating 110 sequentially disposed on the grating mounting plate 300 along a first direction, where the exposure bit grating 120 and the pretreatment bit grating 110 respectively include a rectangular grating.
The displacement measurement system further comprises a workpiece table 200 and detection mechanisms which are arranged on the surface of the workpiece table 200 at intervals, wherein the workpiece table 200 and the grating mounting plate 300 are arranged at intervals along the second direction, and the detection mechanisms are matched with the exposure position grating 120 and the pretreatment position grating 110 and are used for providing a measurement reference of the displacement measurement system; wherein the first direction is perpendicular to the second direction.
Compared with the prior art, in the displacement measurement system provided by the embodiment, the exposure bit grating and the pretreatment bit grating respectively comprise a back-shaped grating, when the workpiece table is operated from the pretreatment bit to the exposure bit in the first direction, the detection mechanism can finish measurement only through one slit between the exposure bit grating and the pretreatment bit grating, so that the edge switching of the plane grating measurement system is simplified, and the measurement requirement of higher precision can be met.
Specifically, as shown in fig. 12, a layout schematic diagram of the return-type grating is shown, the structure of the layout schematic diagram may be a square gap in the square grating, when the two return-type gratings with the above structures are combined together to form the exposure bit grating and the pretreatment bit grating, the scheme can achieve simplification of the problem of the system edge switching process, and the manufacturing process is simpler.
Fig. 13 is a schematic diagram of another layout of the rectangular grating, which is different from the rectangular grating in that a circular notch is formed in the middle of the rectangular grating, and the scheme can also simplify the problem of the system edge switching process.
Under the general condition, the overall size requirements of the exposure bit grating and the pretreatment bit grating are relatively larger (more than or equal to 800mm multiplied by 800 mm), the manufacturing difficulty is increased, and the manufacturing difficulty is reduced and the cost is saved on the premise of not increasing the resolving difficulty in the switching process. Specifically, in another embodiment of the present invention, the back-shaped grating may include two opposite C-shaped planar gratings 101 spaced along the third direction; wherein the first direction, the second direction and the third direction are perpendicular to each other. Specifically, the exposure bit grating 120 and the pretreatment bit grating 110 each include two "C" shaped plane gratings 101 spaced along the third direction and disposed opposite to each other, it should be noted that, when the back-shaped grating includes two "C" shaped plane gratings 101, the back-shaped grating may include two structural forms, on one hand, the two "C" shaped plane gratings 101 forming one back-shaped grating may be mutually attached, and spliced into a complete back-shaped; on the other hand, two "C" shaped planar gratings 101 forming one zigzag grating may be disposed opposite to each other with a gap therebetween, and spliced into an approximately zigzag structure.
The detection mechanism comprises four detectors 210, the workpiece table 200 is of a rectangular structure, each corner of the rectangular structure is provided with one detector 210, projections of the four detectors 210 in the first direction are not coincident, when one detector 210 is in an invalid region, diffraction return light of the plane grating cannot be received, displacement of six degrees of freedom can be calculated only by means of displacement measured values of other detectors 210, and different detectors 210 sequentially pass through the invalid region and are required to be continuously switched to calculate the measured values.
The above-mentioned ineffective area refers to an area where the detector 210 moves out of the plane grating and cannot receive the diffracted return light of the plane grating. In this embodiment, the slit between the pre-processing bit grating 110 and the exposure bit grating 120, and between the exposure bit grating 120 and the extension bit grating 130, and the square or circular notch in the middle of the back-shaped grating may be included.
Specifically, the displacement measurement system includes a workpiece stage 200 and four detectors 210 disposed on a surface of the workpiece stage 200 at intervals, wherein projections of the four detectors 210 in a first direction are misaligned, the workpiece stage 200 and the grating mounting plate 300 are disposed at intervals along a second direction, and the four detectors 210 cooperate with the exposure bit grating 120 and the pretreatment bit grating 110 to provide measurement references of the displacement measurement system.
Compared with the prior art, in the displacement measurement system provided in this embodiment, the exposure bit grating 120 and the pretreatment bit grating 110 are spliced by two opposite C-shaped plane gratings 101 to form a square grating, when the workpiece table 200 is operated from the pretreatment bit to the exposure bit along the first direction, three detectors 210 can be ensured to work at any moment, so that six-degree-of-freedom displacement calculation is performed, and the detectors 210 can complete measurement only through one slit between the exposure bit grating 120 and the pretreatment bit grating 110 and four conversions, thereby simplifying the edge switching of the plane grating measurement system.
It should be noted that when the spliced gratings in the prior art are adopted, when the slit between the first detector 211, the second detector 212 and the pre-processing bit grating 120 passes through the slit in the middle of the pre-processing bit grating 110, the third detector 213 and the fourth detector 214 pass through the slit in the middle of the pre-processing bit grating 110, and four continuous switches are required at this time, but in the embodiment, no slit exists in the pre-processing bit grating 110 and the exposure bit grating 120, so that the switching process is reduced, the data processing process is reduced, the operation is simplified, and the measurement precision is improved.
When the workpiece stage 200 operating in the exposure position and the pretreatment position moves relative to the exposure position grating 120 and the pretreatment position grating 110, respectively, the signal receiving and processing unit outputs four sets of measured displacements parallel to the movement direction of the workpiece stage 200 and perpendicular to the movement direction of the workpiece stage 200, and the eight sets of measured values are used to calculate the spatial six-degree-of-freedom displacements of the workpiece stage 200 operating in the exposure position and the pretreatment position, respectively. A single detector 210 may detect two sets of in-plane and out-of-plane displacement information, four sets of parallel or perpendicular referring to x/y axis displacement information parallel to the grating and z axis displacement information perpendicular to the grating, where six degrees of freedom refer to six degrees of freedom displacement system information of the centroid of the workpiece table 200. As shown in fig. 3, the x-axis of the figure represents a third direction; the y-axis represents a first direction; the z-axis represents the second direction.
The work stage 200 with four detectors 210 is below the grating mounting plate 300, the "C" shaped planar grating 101 forming the pretreatment bit grating 110 and the exposure bit grating 120 is disposed below the grating mounting plate 300 opposite to the detectors 210, and the light source 400 is disposed above the grating mounting plate 300.
The displacement measurement system further includes an extended bit grating 130, the extended bit grating 130 being connected to a side of the exposure bit grating 120 remote from the pre-processing bit grating 110. The extended bit grating 130 is a rectangular two-dimensional grating, and is located on a fixed frame of the channel changing area. Wherein, a back-shaped grating is arranged on the plane grating mounting plate 300 above the exposure position workpiece table 200 to form the exposure position grating 120; the other back-shaped grating is arranged on a plane grating mounting plate 300 above the pretreatment position workpiece table 200 to form the pretreatment position grating 110; the extended bit grating 130 is located on a fixed frame of the stage changing area, and the exposure bit grating 120, the pre-processing bit grating 110 and the extended bit grating 130 in the displacement measuring system cooperate with the detector 210 on the workpiece stage 200 to provide a measuring reference for the measuring system, and the displacement measuring system simplifies the problem of complex edge switching process of the displacement measuring system.
In this embodiment, the workpiece table 200 has a rectangular structure, and each corner of the rectangular structure is provided with a detector 210. As shown in fig. 3, the first detector 211, the second detector 212, the third detector 213, and the fourth detector 214 are respectively, and the projections of the four detectors 210 in the first direction, that is, the y-axis are not coincident, when the workpiece stage 200 moves from the preprocessing bit grating 110 to the extension bit grating 130, the workpiece stage can pass through the slit between two adjacent gratings successively, so as to ensure that three detectors 210 are always in an effective area.
The two "C" shaped planar gratings 101 forming the back-shaped grating are planar reflective two-dimensional gratings, one side of the planar reflective two-dimensional gratings, which is far away from the grating mounting plate 300, is engraved with two-dimensional reflective grating groove lines, and the lower surface of the "C" shaped planar grating 101 is parallel to the surface of the workpiece stage 200.
The grating mounting plate 300 provides a stable and reliable mounting interface for the "C" shaped planar grating 101 as a reference component, and the "C" shaped planar grating 101 is mounted to the reference component and arranged such that the target surface of each target is substantially parallel to the reference plane; meanwhile, the "C" shaped planar grating 101 is attached to the lower surface of the grating mounting plate 300 by van der waals force or bonding.
The detector 210 can perform laser detection, and the detector 210 has a function of measuring various indexes of the two-degree-of-freedom motion of the workpiece stage 200, and may be a grating interferometer or a grating encoder.
The detector 210 specifically includes a detector lens group, an in-light/return-light signal receiver, and a mount assembly; the detector lens group and the light-in/light-back signal receiver are fixed on the surface of the workpiece table 200 through the mounting seat assembly; the detector lens group is used for generating laser interference signals, the light-in/light-back signal receiver is used for providing input signals and receiving output interference signals, when one detector 210 passes through the slit, diffraction light back of the plane grating cannot be received, only displacement measurement values of other detectors 210 can be used for calculating six degrees of freedom displacement, and the measurement values required by the solution are required to be continuously switched and calculated when different detectors 210 pass through the slit.
Specifically, the plane grating is disposed in parallel above the detector 210, the laser emitted by the laser is emitted to the "C" shaped plane grating 101 at a littrow angle after being acted by the detector 210, the diffracted light generated by the "C" shaped plane grating 101 returns to the detector 210 along the original path, and the "C" shaped plane grating 101 provides an important component of the measurement reference for the displacement measurement system.
The exposure bit grating 120 and the preprocessing bit grating 110 provide measurement references for the displacement measurement system, and complete the spatial six-degree-of-freedom displacement measurement of the target workpiece stage 200 in cooperation with the four detectors 210 on the workpiece stage 200. Each detector 210 can detect the in-plane and vertical two-degree-of-freedom displacement of the planar grating, and the four detectors 210 can detect the in-plane displacement of the four groups of planar gratings and the vertical displacement of the four groups of planar gratings, so that the spatial six-degree-of-freedom displacement of the target workpiece stage 200 can be finally calculated.
The mount assembly may be bolted to the surface of the workpiece stage 200 and the detector lens assembly bonded to the mount assembly.
In this embodiment, the detector lens set and the light-in/light-back signal receiver may be components capable of implementing corresponding functions in the prior art, which is not described herein.
In this embodiment, the displacement measurement system further includes a driving mechanism connected to the workpiece stage 200 for driving the workpiece stage 200 and the probe 210 to move in the first direction, the second direction, and the third direction.
Specifically, the exposure bit grating 120 and the pretreatment bit grating 110 are fixed on the grating mounting plate 300; the drive mechanism is coupled to the workpiece stage 200, and four detectors 210 are fixed to the workpiece stage 200 and move with the workpiece stage 200, thereby producing relative movement of the detectors 210 and the "C" shaped planar grating 101.
As shown in fig. 4 to 9, the movement pattern of the displacement measurement system provided in the present embodiment will be described in detail.
The motion of the four detectors 210 relative to the grating is divided into the following phases: the four detectors 210 are a first detector 211, a second detector 212, a third detector 213, and a fourth detector 214, respectively.
First, when the first detector 211, the second detector 212, the third detector 213 and the fourth detector 214 move in the middle position of the pre-processing bit grating 110 or the exposure bit grating 120, the four detectors 210 are all in an effective state, and the movement on the pre-processing bit is as shown in fig. 4, eight sets of displacement measurement values can be obtained, and the six-degree-of-freedom displacement can be calculated. The dimensions of the workpiece stage 200 should be adapted to the dimensions of the two "C" shaped planar gratings 101 and their spacing in the X-direction, as illustrated in fig. 5, when the workpiece stage 200 is moved in the X-direction of the pretreatment position, the second and third detectors 212, 213 move to the lower boundary of the lower "C" shaped planar grating 101, and when the second detector 212 is in the lower left corner, the first detector 211 also moves to the lower boundary of the upper "C" shaped planar grating 101 and is in an active state, and the fourth detector 214 is in a gap between the two "C" shaped planar gratings 101, which is in an inactive state, i.e., the third detector 210 on the workpiece stage 200 can remain in an active state, resulting in six sets of measurement values, resolving out six degrees of freedom displacements, and similarly, when the first detector 211 is in the upper left corner, the third detector 213 is in the lower right corner, or the fourth detector is in the upper right corner, three being able to be guaranteed to be in an active state. It is understood that when the workpiece stage 200 is in the exposure position, the working principle is the same as that of the workpiece stage in the preprocessing position, and will not be described herein.
As shown in fig. 6, when the stage 200 is changed, that is, when the pretreatment position is changed to the exposure position, the slit passes through only the intermediate position where the two planar gratings meet.
Secondly, when the first detector 211, the second detector 212, the third detector 213 and the fourth detector 214 move to a limit state on the preprocessing bit grating 110 or the exposure bit grating 120, that is, one detector 210 moves to an invalid region, and the other three detectors are in an effective state, six groups of displacement measurement values can be obtained, and six-degree-of-freedom displacement can be calculated.
Specifically, when the detector 210 moves from the preprocessing bit grating 110 to the exposure bit grating 120, the first detector 211 moves out of the preprocessing bit first, and is in an invalid measurement area between the exposure bit and the preprocessing bit, and only the second detector 212, the third detector 213 and the fourth detector 214 are in a working state at this time, six groups of corresponding measurement values can be output for resolving, and six degrees of freedom displacement of the workpiece stage 20012 can be obtained, and a motion schematic diagram is shown in fig. 6; then, the second detector 212 moves out of the preprocessing position and is located in an invalid measurement area between the exposure position and the preprocessing position, only the first detector 211, the third detector 213 and the fourth detector 214 are in a working state at this time, six groups of corresponding measurement values can be output for resolving, and six-degree-of-freedom displacement of the workpiece stage 20012 is obtained, and a motion schematic diagram is shown in fig. 7; the third detector 213 is moved out of the preprocessing position and is located in an invalid measurement area between the exposure position and the preprocessing position, only the first detector 211, the second detector 212 and the fourth detector 214 are in a working state at this time, six groups of corresponding measured values can be output for resolving, six-degree-of-freedom displacement of the workpiece table 200 is obtained, and a motion schematic diagram is shown in fig. 8; the fourth detector 214 is moved out of the preprocessing position and is located in an invalid measurement area between the exposure position and the preprocessing position, only the first detector 211, the second detector 212 and the third detector 213 are in a working state at this time, and six groups of corresponding measurement values can be output for resolving, so that six-degree-of-freedom displacement of the workpiece table 200 is obtained, and a motion schematic diagram is shown in fig. 9.
Again, the detector 210 is moved from the exposure bit grating 120 onto the extended bit grating 130, the motion diagram is shown in fig. 10: when the detector 210 is moved out to the exposure position, the detector two 212 is in a failure state, the detector one 211, the detector three 213 and the detector four 214 can obtain six groups of displacement measurement values, and the six-degree-of-freedom displacement can be calculated.
To sum up, in the present embodiment, a slit is formed between the pre-processing bit grating 110 and the exposure bit grating 120; a slit is formed between the exposure bit grating 120 and the extended bit grating 130, and the problem of the slit is related to the exchange of the C-shaped plane grating 101 in this embodiment. Fig. 5 and 6 show the first pass through the slit 211 and the second pass through the slit 212, fig. 7 and 8 show the first pass through the slit 213 and the fourth pass through the slit 214, and fig. 9 shows the second pass through the slit 212. (the four detectors should adopt an arrangement mode that projections in the y-axis direction are not coincident, and the arrangement is characterized in that during the channel changing operation, the first detector 211, the second detector 212, the third detector 213 and the fourth detector 214 do not pass through slits at the same time, so that at least three detectors 210 can work at any moment, and therefore six-freedom displacement calculation can be always performed).
As shown in fig. 10, when continuing to move toward the extended bit grating, the first detector 211 passes through the slit once, the second detector 212 moves to the inactive area, the third controller 213 and the fourth detector 214 remain in the exposed bit grating, and the measurement can be completed by 2 conversions. In the prior art, the third controller 213 and the fourth detector 214 also need to pass through the slit spliced by the L-shaped grating once, and the measurement can be completed after 4 times of conversion, so that the problem of complex edge switching process of the displacement measurement system is simplified, and the splicing and the use of the grating are simpler and more convenient.
It should be noted that, all four detectors 210 are in the grating plane, eight displacement information can be obtained, where four sets of displacement information include in-plane x/y axes, and the other four sets include out-of-plane z axes, and eight sets of data can be used to redundantly calculate six degrees of freedom of the centroid of the workpiece table 200; when the workpiece stage 200 moves, one of the detectors 210 of the workpiece stage 200 moves out of the plane grating, and the remaining three detectors 210 are in the plane grating range, three sets of in-plane displacement information x/y axes and three sets of out-of-plane z axes can be obtained, and six degrees of freedom of the centroid of the workpiece stage 200 can be calculated by using the six sets of displacement information.
The lithography equipment provided by the embodiment comprises the displacement measurement system, the grating simplifies the problem that the edge switching process of the displacement measurement system is complex, and the manufacturing method, the splicing and the using method of the grating are simpler, so that the lithography equipment also has the advantages of the displacement measurement system.
In summary, the displacement measurement system provided by the present invention includes a grating mounting plate 300, and an exposure bit grating 120 and a pretreatment bit grating 110 sequentially disposed on the grating mounting plate 300 along a first direction; the exposure bit grating 120 and the pre-processing bit grating 110 each include two "C" shaped planar gratings 101 spaced apart and disposed opposite each other along the third direction. The displacement measuring system further comprises a workpiece table 200 and four detectors 210 which are arranged on the surface of the workpiece table 200 at intervals, wherein projections of the four detectors 210 in the first direction are not coincident, the workpiece table 200 and the grating mounting plate 300 are arranged at intervals along the second direction, and the four detectors 210 are matched with the exposure position grating 120 and the pretreatment position grating 110 and are used for providing a measuring reference of the displacement measuring system. The first direction, the second direction and the third direction are perpendicular to each other. Compared with the prior art, in the displacement measurement system provided by the invention, the exposure bit grating 120 and the pretreatment bit grating 110 are spliced by the two opposite C-shaped plane gratings 101 to form the back-shaped grating, when the workpiece table 200 is operated from the pretreatment bit to the exposure bit along the first direction, three detectors 210 can be ensured to work at any moment, so that six-degree-of-freedom displacement calculation is performed, and the detectors 210 can finish measurement only through one slit between the exposure bit grating 120 and the pretreatment bit grating 110 and four conversions, thereby simplifying the edge switching of the plane grating measurement system.
The lithography apparatus provided by the invention comprises the displacement measurement system, so that the lithography apparatus also has the advantages of the displacement measurement system, and the description is omitted here.
Finally, it should be noted that: the above embodiments are only for illustrating the technical solution of the present invention, and not for limiting the same; although the invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some or all of the technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit of the invention.
Claims (9)
1. The displacement measurement system is characterized by comprising a grating mounting plate (300), and an exposure bit grating (120) and a pretreatment bit grating (110) which are sequentially arranged on the grating mounting plate (300) along a first direction, wherein the exposure bit grating (120) and the pretreatment bit grating (110) respectively comprise a back-shaped grating;
The displacement measurement system further comprises a workpiece table (200) and detection mechanisms which are arranged on the surface of the workpiece table (200) at intervals, wherein the workpiece table (200) and the grating mounting plate (300) are arranged at intervals along a second direction, and the detection mechanisms are matched with the exposure position grating (120) and the pretreatment position grating (110) and are used for providing a measurement reference of the displacement measurement system;
The first direction is perpendicular to the second direction;
The detection mechanism comprises four detectors (210), the workpiece table (200) is of a rectangular structure, each corner of the rectangular structure is provided with one detector (210), and projections of the four detectors (210) in the first direction are not coincident; when one detector (210) is in an invalid region, diffraction return light of the plane grating cannot be received, six-degree-of-freedom displacement can be calculated only by means of displacement measurement values of other detectors (210), and the measurement values required by continuous switching and calculation are required by different detectors (210) which sequentially pass through the invalid region.
2. The displacement measurement system of claim 1, wherein the back-shaped grating comprises two oppositely disposed "C" shaped planar gratings (101) spaced apart along a third direction;
the first direction, the second direction and the third direction are perpendicular to each other.
3. The displacement measurement system of claim 1, wherein the back-shaped grating is a planar reflective two-dimensional grating, and a lower surface of the back-shaped grating is parallel to a surface of the workpiece stage (200).
4. The displacement measurement system according to claim 1, wherein the return-type grating is attached to the lower surface of the grating mounting plate (300) by van der waals force or gluing.
5. The displacement measurement system according to claim 1, wherein the detector (210) is a grating interferometer or a grating encoder with two degrees of freedom measurement.
6. The displacement measurement system of claim 1, wherein the detector (210) comprises a detector lens set, an in/return signal receiver, and a mount assembly; the detector lens group and the light-in/light-back signal receiver are fixed on the surface of the workpiece table (200) through the mounting seat assembly;
The detector lens group is used for generating laser interference signals, and the light-in/light-back signal receiver is used for providing input signals and receiving output interference signals.
7. The displacement measurement system of claim 1, further comprising a drive mechanism coupled to the workpiece stage (200) for driving the workpiece stage (200) and the detection mechanism to move in the first, second, and third directions, wherein the third direction is a direction perpendicular to the first and second directions, respectively.
8. The displacement measurement system of any one of claims 1-7, further comprising an extended bit grating (130), the extended bit grating (130) being connected to a side of the exposure bit grating (120) remote from the pre-treatment bit grating (110).
9. A lithographic apparatus comprising a displacement measurement system according to any one of claims 1 to 8.
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| CN202110940333.2A CN113804112B (en) | 2021-08-16 | 2021-08-16 | Displacement measurement system and lithography equipment |
| PCT/CN2022/096183 WO2023020068A1 (en) | 2021-08-16 | 2022-05-31 | Displacement measurement system and photolithography device |
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| CN114993190B (en) * | 2022-05-10 | 2023-11-07 | 清华大学 | Six-degree-of-freedom displacement measuring system for grating of photoetching machine |
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| CN103309177A (en) * | 2013-06-19 | 2013-09-18 | 清华大学 | Workpiece platform system of photoetching machine |
| CN106526746A (en) * | 2016-11-14 | 2017-03-22 | 天津理工大学 | Large period Prague waveguide grating structure and preparation method thereof |
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| JPS596327A (en) * | 1982-07-01 | 1984-01-13 | Nippon Steel Corp | Detecting method of strip catenary |
| CN100504614C (en) * | 2006-04-14 | 2009-06-24 | 上海微电子装备有限公司 | Stepping scan photo-etching machine double-platform exchanging and positioning system |
| CN2938172Y (en) * | 2006-07-18 | 2007-08-22 | 上海微电子装备有限公司 | Exposure precision positioning system of changed by two-device |
| CN100470379C (en) * | 2007-07-19 | 2009-03-18 | 清华大学 | Photo-etching machine silicon chip platform double-platform switching system |
| US20100302523A1 (en) * | 2009-05-18 | 2010-12-02 | Nikon Corporation | Method and apparatus for measuring wavefront, and exposure method and apparatus |
| CN102122120A (en) * | 2011-03-22 | 2011-07-13 | 哈尔滨工业大学 | Two-table switching system of stepping and scanning lithography machine |
| CN105509644B (en) * | 2016-01-14 | 2018-01-12 | 哈尔滨工业大学 | Air floating table Three Degree Of Freedom displacement measurement system based on two plane gratings |
| CN112835271B (en) * | 2021-01-19 | 2024-04-26 | 上海集成电路装备材料产业创新中心有限公司 | Exposure method for lithographic apparatus with rotary exchange double workpiece stage |
| CN112859545A (en) * | 2021-02-14 | 2021-05-28 | 源能智创(江苏)半导体有限公司 | Position calibration device and method for exposure lens |
| CN113804112B (en) * | 2021-08-16 | 2024-09-06 | 北京华卓精科科技股份有限公司 | Displacement measurement system and lithography equipment |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103309177A (en) * | 2013-06-19 | 2013-09-18 | 清华大学 | Workpiece platform system of photoetching machine |
| CN106526746A (en) * | 2016-11-14 | 2017-03-22 | 天津理工大学 | Large period Prague waveguide grating structure and preparation method thereof |
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| WO2023020068A1 (en) | 2023-02-23 |
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