CN114993190B - Six-degree-of-freedom displacement measuring system for grating of photoetching machine - Google Patents
Six-degree-of-freedom displacement measuring system for grating of photoetching machine Download PDFInfo
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- CN114993190B CN114993190B CN202210502276.4A CN202210502276A CN114993190B CN 114993190 B CN114993190 B CN 114993190B CN 202210502276 A CN202210502276 A CN 202210502276A CN 114993190 B CN114993190 B CN 114993190B
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- 238000006073 displacement reaction Methods 0.000 title claims abstract description 71
- 238000001259 photo etching Methods 0.000 title claims abstract description 8
- 238000005259 measurement Methods 0.000 claims abstract description 95
- 238000001459 lithography Methods 0.000 claims abstract description 40
- 239000013307 optical fiber Substances 0.000 claims description 31
- 238000007781 pre-processing Methods 0.000 claims description 24
- 239000000758 substrate Substances 0.000 claims description 17
- 238000009434 installation Methods 0.000 claims description 4
- 230000007613 environmental effect Effects 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 10
- 238000005516 engineering process Methods 0.000 description 5
- 238000009826 distribution Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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- 230000000149 penetrating effect Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/03—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness by measuring coordinates of points
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Abstract
The application discloses a six-degree-of-freedom displacement measurement system for a grating of a lithography machine, which is used for measuring the spatial pose of a grating mounting plate relative to a projection objective lens and an alignment sensor of the lithography machine. Through setting up the hole of arranging of pretreatment position grating mounting panel, exposure position grating mounting panel, can be convenient set up two sets of detectors, six degree of freedom displacement can be accurate swift obtained, the difficult problem that the space appearance that causes grating mounting panel relative projection objective and alignment sensor because of factors such as photoetching machine vibration, environmental impact changes can be solved.
Description
Technical Field
The application belongs to the technical field of lithography machines, and particularly relates to a six-degree-of-freedom displacement measurement system for a lithography machine grating.
Background
Ultra-precise displacement measurement technology is the basis of modern ultra-precise machining, determines the machining precision and manufacturing level of products, and plays an important role in many engineering fields, such as the field of IC equipment manufacturing. The grating measurement is a few optical precision displacement measurement methods capable of achieving nano-scale micro displacement measurement, and is also the most widely applied displacement measurement technology in a precision displacement measurement system. In the grating displacement measurement system, the grating with a certain smaller grating pitch can achieve the measurement accuracy of nanometer level, the grating with a certain large size can achieve the measurement range of a large range, and the high-dimensional precise measurement effect can be achieved by mutually matching the gratings with different dimensions. The grating measuring method uses the grating pitch of the grating as a measuring reference, has the advantages of high precision, small volume, lower cost and the like, is not easy to be interfered by environment, and has increasingly outstanding value in the modern precise measuring technology.
In the prior art, a measuring system for measuring relative displacement information of a projection objective/alignment sensor in a photoetching machine by using a laser interferometer is available, but the laser interferometer is sensitive to factors such as ambient temperature and ambient humidity, when the ambient temperature or humidity changes, the wavelength and refractive index of a laser light source can be seriously influenced, and the laser interferometer takes the wavelength of laser as a measuring reference, so that the measuring precision is seriously influenced. Therefore, the laser interferometer is adopted as the measuring instrument, and the required measuring precision requirement cannot be met;
in the prior art, the relative displacement information of the projection objective/alignment sensor of the lithography machine is measured by utilizing a grating interferometer, but only the displacement measurement function of two degrees of freedom of the alignment sensor of the lithography machine and the spatial position measurement function of three degrees of freedom of the projection objective of the lithography machine are realized, along with the development of lithography technology, the requirements on the measurement precision of the lithography machine are higher and higher, and the displacement measurement of the low degree of freedom is difficult to meet the requirements on the measurement technology of the lithography machine.
Disclosure of Invention
In order to inhibit or alleviate the influence of the vibration of the lithography machine on the relative pose of the grating mounting plate relative to the projection objective/alignment sensor, the application provides a six-degree-of-freedom displacement measurement system of the lithography machine grating, which comprises the following specific technical scheme:
the six-degree-of-freedom displacement measurement system for the grating of the lithography machine comprises a pretreatment position measurement subsystem and an exposure position measurement subsystem, wherein the pretreatment position measurement subsystem comprises a pretreatment position grating mounting plate, the exposure position measurement subsystem comprises an exposure position grating mounting plate, the pretreatment position grating mounting plate and the exposure position grating mounting plate are arranged below a main substrate at intervals along the direction parallel to the surface of the main substrate, the pretreatment position grating mounting plate and the exposure position grating mounting plate are fixedly connected with a frame of the lithography machine,
the device comprises a preprocessing bit grating mounting plate, an exposure bit grating mounting plate and a plate body, wherein the plate bodies of the preprocessing bit grating mounting plate and the exposure bit grating mounting plate are respectively provided with an arrangement hole, the preprocessing bit measurement subsystem and the exposure bit measurement subsystem comprise at least three detectors, the at least three detectors are arranged at intervals at measurement points in the arrangement holes, and two-degree-of-freedom displacement of each measurement point is obtained through the detectors to construct a six-degree-of-freedom solution equation, so that six-degree-of-freedom displacement of the preprocessing bit grating mounting plate and the exposure bit grating mounting plate is respectively obtained through calculation.
Optionally, the upper surface of the plate body is provided with a groove, the arrangement hole penetrates the plate body in the groove, the arrangement hole is a square hole, each detector comprises a reading head and a scale grating, in the pretreatment position measurement subsystem, the reading head and the scale grating are respectively arranged on the pretreatment position grating mounting plate and the alignment sensor, and all the scale grating planes are arranged along one direction of the diagonal direction and the side length direction of the arrangement hole;
in the exposure position measurement subsystem, the reading head and the scale grating are respectively arranged on the exposure position grating mounting plate and the projection objective, and all the scale grating planes are arranged along one direction of the diagonal direction and the side length direction of the arrangement hole.
Optionally, in the preprocessing position measurement subsystem, the reading head and the scale grating are both installed on the preprocessing position grating mounting plate in a mode of taking the bottom plane of the groove as a mounting reference;
in the exposure position measuring subsystem, the reading head and the scale grating are both arranged on an exposure position grating mounting plate in a mode of taking the bottom plane of the groove as a mounting reference.
Optionally, further comprising; the optical fiber is connected between the laser source and the optical fiber beam splitter, between the optical fiber beam splitter and the detector and between the detector and the electronic counting module, and the laser source is transmitted from the detector to the detector by adopting a single-mode optical fiber, and the detector is transmitted from the detector to the electronic counting module by adopting a multi-mode optical fiber.
Optionally, the laser source is a dual-frequency laser, and is configured to emit two laser beams with a frequency difference, where the two laser beams are decomposed into 6 laser beams by an optical fiber beam splitter, and each two laser beams are transmitted to a detector by an optical fiber.
Optionally, the detector is a grating interferometer or a grating encoder, and the scale grating is a planar reflection/diffraction type two-dimensional grating.
Optionally, the pretreatment bit grating mounting plate and the exposure bit grating mounting plate are respectively connected with the main substrate through flexible blocks.
Optionally, the measuring points are three corner points where the holes are arranged.
Optionally, the laser further transmits a laser signal with the frequency equal to the frequency difference to a phase card component of the electronic counting module to serve as an external reference signal, each two paths of laser light serve as reference light and measuring light to be transmitted to a reading head of one detector, the measuring light is incident on the scale grating to form diffracted light through the measuring path, the diffracted light and the reference light are combined to generate a measuring signal, the measuring signal is transmitted to the phase card component through an optical fiber, the phase card component solves a phase difference between the measuring signal and the external reference signal, and the obtained phase difference information is input to a resolving card to be resolved in a displacement mode to obtain a displacement measured value.
Optionally, the main substrate is provided with through holes corresponding to the projection objective and the alignment sensor, the projection objective is fixed above the corresponding through holes, and the alignment sensor is fixed at the center of the corresponding through holes.
According to the six-degree-of-freedom displacement measurement system for the grating of the lithography machine, two groups of detectors can be conveniently arranged by arranging the arrangement holes of the pretreatment position grating mounting plate and the exposure position grating mounting plate, when any tiny space pose change occurs to the grating mounting plate relative to the projection objective/alignment sensor, the displacement measurement system can detect the pose information change, and further, corresponding reactions can be carried out in other subsystems of the lithography machine to carry out position compensation, so that the problem of the space pose change of the projection objective relative to the grating mounting plate caused by factors such as vibration of the lithography machine is effectively restrained or relieved.
Drawings
FIG. 1 is a schematic diagram of an assembly of a six-degree-of-freedom displacement measurement system for a lithography machine grating according to an embodiment of the present application;
FIG. 2 is a schematic diagram of a pretreatment bit grating mounting plate and an exposure bit grating mounting plate of a six-degree-of-freedom displacement measurement system for a lithography machine grating according to an embodiment of the present application;
FIG. 3 is a schematic diagram of the spatial positions of a grating mounting plate and a main substrate of a six-degree-of-freedom displacement measurement system for a lithography machine according to an embodiment of the present application;
fig. 4 is a schematic diagram of spatial positions of a projection objective, an alignment sensor and a main substrate of a six-degree-of-freedom displacement measurement system for a grating of a lithography machine according to an embodiment of the present application.
FIG. 5-1 is a schematic diagram showing the distribution of a preprocessing bit measurement subsystem of a six-degree-of-freedom displacement measurement system for a lithography machine grating in a preprocessing bit grating mounting plate horizontal plane according to an embodiment of the present application;
FIG. 5-2 is a schematic diagram of spatial distribution of a displacement measurement system of a grating mounting plate relative to an alignment sensor of a six-degree-of-freedom displacement measurement system of a lithography machine grating according to an embodiment of the present application;
FIG. 6 is a schematic diagram of the detector assembly and measurement direction of the six-degree-of-freedom displacement measurement system for a lithography machine grating according to an embodiment of the present application;
FIG. 7 is a schematic diagram of a detector with 90 degrees of the plane direction of a scale grating and the x-axis direction of the six-degree-of-freedom displacement measurement system of a lithography machine grating according to an embodiment of the present application;
FIG. 8 is a schematic diagram of a detector with 90 degrees of the plane direction of the scale grating and the y-axis direction of the six-degree-of-freedom displacement measurement system of the lithography machine grating according to the embodiment of the present application;
FIG. 9 is a schematic diagram of spatial distribution of a grating mounting plate of a six-degree-of-freedom displacement measurement system for a lithography machine relative to a projection objective displacement measurement system according to an embodiment of the present application;
icon: 110-preprocessing the bit grating mounting plate; 1101-circular recess; 1102-arranging holes; 120-exposing a bit grating mounting plate; 201-a detector; 300-a main substrate; 410-alignment sensor; 420-projection objective; 500-scale grating; 501-a laser source; 502-a fiber optic splitter; 503-optical fiber; 504-electronic counting module.
Detailed Description
The following description of the embodiments of the present application will be made apparent and fully in view of the accompanying drawings, in which some, but not all embodiments of the application are shown. All other embodiments, which can be made by those skilled in the art based on the embodiments of the application without making any inventive effort, are intended to be within the scope of the application.
According to the six-degree-of-freedom displacement measurement system for the grating of the lithography machine, six groups of displacement parameters of the grating mounting plate of the lithography machine relative to the projection objective lens and the alignment sensor can be measured by using the two groups of detectors, and further the spatial pose of the grating mounting plate relative to the projection objective lens and the alignment sensor can be obtained by six-degree-of-freedom displacement calculation, so that the influence of the vibration of the platform of the lithography machine on the relative pose of the grating mounting plate relative to the projection objective lens and the alignment sensor can be restrained or relieved.
As shown in FIG. 1, the six-degree-of-freedom displacement measurement system for the grating of the lithography machine comprises a laser source 501, an optical fiber beam splitter 502, an optical fiber 503, a pretreatment position measurement subsystem, an exposure position measurement subsystem and an electronic counting module 504.
Optical fibers 503 are connected between the laser source 501 and the optical fiber beam splitter 502, between the optical fiber beam splitter 502 and the pretreatment position measurement subsystem, and between the pretreatment position measurement subsystem and the exposure position measurement subsystem and between the optical fiber beam splitter 502 and the electronic counting module 504.
Wherein the laser source 501 is configured to provide input light of a specific power at a specific wavelength.
The optical fiber beam splitter 502 is used for dividing a single-path input light emitted by a laser source into multiple paths of input light, and the multiple paths of input light are input into the preprocessing position measurement subsystem and the exposure position measurement subsystem after being divided into multiple paths of input light by the optical fiber beam splitter. The preprocessing bit measurement subsystem and the exposure bit measurement subsystem each include a plurality of detectors 201.
Wherein optical fiber 503 is used to input multiple inputs to the read heads of each detector 201 and to transmit return signals to electronic counting module 504.
As shown in fig. 2 and 3, the preprocessing bit measurement subsystem includes a preprocessing bit grating mounting plate 110, the exposure bit measurement subsystem includes an exposure bit grating mounting plate 120, and the preprocessing bit grating mounting plate 110 and the exposure bit grating mounting plate 120 are spaced below the main substrate 300 along a first direction (i.e., along a direction parallel to the plate surface of the main substrate 300), where the first direction corresponds to the x-axis in fig. 3. The main substrate 300, the pre-processing bit grating mounting plate 110 and the exposure bit grating mounting plate 120 are all distributed at intervals along a second direction (i.e. a direction perpendicular to the main substrate surface), the second direction corresponds to the z-axis direction in fig. 3, and the first direction and the second direction are perpendicular to each other. The pretreatment bit grating mounting plate 110 and the exposure bit grating mounting plate 120 may be connected to the main substrate 300 by flexible blocks (not shown), respectively.
As shown in fig. 4, a projection objective 420 of the lithography machine is fixed directly above the exposure bit grating mounting plate 120, spaced apart from the exposure bit grating mounting plate 120 along the second direction, and an alignment sensor 410 of the lithography machine is fixed at the center position of the pre-processing bit grating mounting plate 110. The main substrate 300 has a through hole for the projection objective 420, through which the alignment sensor 410 emits a signal. The pretreatment position grating mounting plate 110 and the exposure position grating mounting plate 120 are mounted on a frame of the photoetching machine. The application measures the displacement of the pre-processing bit grating mounting plate 110 relative to the alignment sensor 410 and the displacement of the exposure bit grating mounting plate 120 relative to the projection objective 420 under the influence of vibration during the operation of the lithography machine.
The pretreatment position measurement subsystem and the exposure position measurement subsystem are respectively and correspondingly arranged on the exposure position grating mounting plate and the pretreatment position grating mounting plate, each measurement subsystem comprises three detectors 201, each detector has a measurement function with two degrees of freedom, and the measurement subsystem is respectively plane displacement parallel to the upper surface of the grating mounting plate and displacement perpendicular to the upper surface direction of the grating mounting plate, and of course, the measurement subsystem is not perpendicular.
The pretreatment position grating mounting plate 110 and the exposure position grating mounting plate 12 have the same structure, and only the pretreatment position grating mounting plate 110 is used for illustration, as shown in fig. 2, the pretreatment position grating mounting plate 110 is a plate body, a circular groove 1101 is formed in the center of the pretreatment position grating mounting plate 110 on the plate surface facing the alignment sensor 410, an arrangement hole 1102 penetrating the plate surface is formed in the circular groove 1101, the space structure is favorable for arrangement of the detector, and the bottom plane of the circular groove can provide an installation reference for the detector.
As shown in fig. 5-1 and 5-2, the six-degree-of-freedom displacement measurement system of the pre-processing bit grating mounting plate 110 relative to the alignment sensor 410 in this embodiment includes three detectors, where the three detectors are disposed at intervals at three opposite corners of the arrangement hole of the pre-processing bit grating mounting plate 110 (but not limited to, at opposite corners of the arrangement hole, and the detectors may be disposed at any positions within the arrangement hole as required by space).
In the embodiment of the application, any detector can be a grating interferometer or a grating encoder, and comprises a reading head and a scale grating, wherein the reading head and the scale grating are respectively arranged on a pretreatment position grating mounting plate and an alignment sensor, and the reading head and the scale grating are respectively arranged on an exposure position grating mounting plate and a projection objective. The pretreatment bit grating mounting plates are used as examples, and the meaning of the respective mounting means that the reading heads are mounted on the pretreatment bit grating mounting plates, the scale grating is mounted on the alignment sensor, and the reading heads are mounted on the alignment sensor, and the scale grating is mounted on the pretreatment bit grating mounting plates.
As shown in fig. 5-1 and 5-2, the reading head of the detector is fixed on the pretreatment position grating mounting plate 110 through a reading head mounting seat, the circular groove bottom plane of the pretreatment position grating mounting plate 110 is used as a mounting reference, the scale grating of the detector is fixedly connected with the alignment sensor through the scale grating mounting seat, the scale grating plane is vertical to the circular groove bottom plane, and forms an included angle of 45 degrees with the first direction (namely the x-axis direction), and the scale grating plane is matched with the reading head of the detector to provide a measuring reference. Specifically, the scale grating plane of one detector and the scale grating planes of the other two detectors form an included angle of plus or minus 45 degrees with the first direction respectively. Or, the scale grating plane of one detector and the scale grating planes of the other two detectors are respectively along different diagonal directions of the arrangement holes. This is merely exemplary and the scale grating plane may be at other angles to the first direction as well as allowing for degrees of freedom measurements.
The mounting positions of the scale grating and the reading head of the detector can be exchanged, namely, the scale grating of the detector is fixed on the pretreatment position grating mounting plate 110 through the scale mounting seat, the circular groove bottom plane of the pretreatment position grating mounting plate 110 is taken as a mounting reference, the scale grating plane is vertical to the groove bottom plane, the scale grating plane forms an included angle of 45 degrees with the first direction (namely, the x-axis direction), and the reading head of the detector is fixedly connected with the alignment sensor through the reading head mounting seat and is matched with the scale grating of the detector to provide a measuring reference.
At such an installation angle, as shown in fig. 6, the plane displacement of the upper surface of the grating mounting plate refers to the displacement measurement perpendicular to the plane of the scale grating, that is, the measurement direction 1 forming a 45-degree angle with the positive x-axis coordinate; the displacement perpendicular to the upper surface of the grating mounting plate refers to displacement measurement parallel to the grating plane and perpendicular to the grating line, namely, measurement direction 2 coinciding with the z-axis coordinate.
However, in addition to the above-mentioned spatial distribution scheme of the detectors on the grating mounting plate, as shown in fig. 7 and 8, the scale grating plane (thick line in the drawing) of the detectors may form an included angle of 90 degrees or an included angle of 0 degrees (i.e. parallel) with the first direction (x-axis direction), each group of detectors may obtain six displacement measurements, and may construct a solution equation with six degrees of freedom, so as to calculate the displacement with six degrees of freedom, so as to obtain the spatial pose of the projection objective or the alignment sensor relative to the grating mounting plate. Similarly, any other angle between the grating plane of the detector scale and the first direction (x-axis direction) may also be used to implement the measuring function, which is not limited to the embodiment of the present application.
More specifically, as shown in FIG. 6, the read head may include a mirror set to generate an interference signal and an in/return signal receiver. The optical lens group is used for generating laser interference signals, and the light-in/light-back signal receiver is used for providing input signals and receiving output interference signals. The scale grating is a planar reflection/diffraction type two-dimensional grating and is a measuring reference of a grating interferometer or a grating encoder. The reading head receives the light-in signal transmitted by the optical fiber 503 through the light-in signal receiver, the light-in signal generates a light-back signal containing displacement information through the lens group of the reading head and the scale grating 500, and the light-back signal is transmitted to the electronic counting module 504 by the optical fiber 503. The electronic counting module 504 is used for processing the return light signal containing the displacement information. Similarly, as shown in fig. 8-9, in a six degree of freedom displacement measurement system of the exposure bit grating mounting plate 120 relative to the projection objective 420, three detectors are also included, the three detectors being spaced at three opposite corners of the placement aperture of the exposure bit grating mounting plate 120. As shown in fig. 9, the reading head of the detector is fixed on the exposure position grating mounting plate 120 through a reading head mounting seat, the bottom plane of the circular groove of the exposure position grating mounting plate 120 is used as a mounting reference, the scale grating of the detector is fixedly connected with the projection objective 420 through the scale grating mounting seat, the scale grating plane is kept perpendicular to the bottom plane of the circular groove, and forms an included angle of 45 degrees with the first direction, namely the x-axis direction, and the scale grating plane is matched with the reading head of the detector to provide a measuring reference. The mounting positions of the scale grating and the reading head of the detector can be exchanged, namely, the scale grating of the detector is fixed on the exposure position grating mounting plate 120 through the scale mounting seat, the bottom plane of the circular groove of the exposure position grating mounting plate 120 is taken as a mounting reference, the scale grating plane is vertical to the bottom plane of the groove, and forms an included angle of 45 degrees with the first direction, namely the x-axis direction, the reading head of the detector is fixedly connected with the projection objective 420 through the reading head mounting seat, and is matched with the scale grating of the detector to provide a measuring reference.
The laser source can be a dual-frequency laser, provides two laser beams with stable frequency difference for the measurement subsystem,
the two laser beams are respectively and averagely divided into 6 laser beams through an optical fiber 503 and an optical fiber beam splitter 502, each two laser beams are used as reference light and measuring light to be transmitted to a reading head of a detector, the measuring light is incident into a grating through a measuring path to form diffraction light, and the diffraction light and the reference light are combined to generate a measuring signal. Because of the relative displacement between the grating and the detector reading head, the grating Doppler effect can be generated, and the frequency and the phase of the measuring signal can be correspondingly changed. The light of the reference path does not pass through the grating, and the phase and frequency are not changed. In addition, the laser also transmits an optical signal with the frequency equal to the frequency difference to the phase card component of the electronic counting module to be used as an external reference signal. The measuring signal from the detector reading head is transmitted to the phase card component through the multimode optical fiber, the phase card component solves the phase difference between the measuring signal and the reference signal, and the obtained phase difference information is input to the resolving card for displacement resolving and is converted into a displacement measuring value.
And after six groups of displacement information are extracted, a six-degree-of-freedom resolving equation is constructed, and six-degree-of-freedom displacement resolving is carried out, so that the spatial pose of the grating mounting plate relative to the projection objective lens/alignment sensor is finally obtained. When any tiny space pose change occurs to the grating mounting plate relative to the projection objective/alignment sensor, the displacement measurement system can detect the pose information change, and then corresponding reaction can be carried out in other subsystems of the photoetching machine to carry out position compensation, so that the difficult problem of the space pose change of the projection objective relative to the grating mounting plate caused by factors such as vibration of the photoetching machine is effectively restrained or relieved.
Of course, the present application is capable of other various embodiments and its several details are capable of modification in accordance with the present application by one skilled in the art without departing from the spirit and scope of the application as defined in the appended claims.
Claims (8)
1. The six-degree-of-freedom displacement measurement system for the lithography machine grating is characterized by comprising a pretreatment bit measurement subsystem and an exposure bit measurement subsystem, wherein the pretreatment bit measurement subsystem comprises a pretreatment bit grating mounting plate, the exposure bit measurement subsystem comprises an exposure bit grating mounting plate, the pretreatment bit grating mounting plate and the exposure bit grating mounting plate are arranged below a main substrate at intervals along the direction parallel to the surface of the main substrate, the pretreatment bit grating mounting plate and the exposure bit grating mounting plate are fixedly connected with a lithography machine frame,
the board bodies of the pretreatment bit grating mounting board and the exposure bit grating mounting board are provided with arrangement holes, the pretreatment bit measurement subsystem and the exposure bit measurement subsystem comprise at least three detectors, the at least three detectors are arranged at intervals at measurement points in the arrangement holes, two-degree-of-freedom displacement of each measurement point is obtained through the detectors to construct a six-degree-of-freedom solving equation, thereby respectively solving and obtaining six-degree-of-freedom displacement of the pretreatment bit grating mounting board and the exposure bit grating mounting board,
the upper surface of the plate body is provided with a groove, an arrangement hole penetrates through the plate body in the groove, each detector comprises a reading head and a scale grating, the plane of the scale grating is vertical to the bottom plane of the groove,
the arrangement holes are square holes, the measurement points are at three corner points of the arrangement holes,
in the preprocessing bit measurement subsystem, the reading head and the scale grating are respectively arranged on the preprocessing bit grating mounting plate and the alignment sensor, and all the scale grating planes are arranged along one direction of the diagonal direction and the side length direction of the arrangement hole;
in the exposure position measurement subsystem, the reading head and the scale grating are respectively arranged on the exposure position grating mounting plate and the projection objective, and all the scale grating planes are arranged along one direction of the diagonal direction and the side length direction of the arrangement hole.
2. The six-degree-of-freedom displacement measurement system of the lithography machine grating according to claim 1, wherein in the preprocessing bit measurement subsystem, the reading head and the scale grating are both installed on the preprocessing bit grating installation plate in a mode of taking a groove bottom plane as an installation reference;
in the exposure position measuring subsystem, the reading head and the scale grating are both arranged on an exposure position grating mounting plate in a mode of taking the bottom plane of the groove as a mounting reference.
3. The lithography machine grating six degree-of-freedom displacement measurement system of claim 1, further comprising; the optical fiber is connected between the laser source and the optical fiber beam splitter, between the optical fiber beam splitter and the detector and between the detector and the electronic counting module, and the laser source is transmitted from the detector to the detector by adopting a single-mode optical fiber, and the detector is transmitted from the detector to the electronic counting module by adopting a multi-mode optical fiber.
4. The six-degree-of-freedom displacement measurement system of the grating of the lithography machine according to claim 3, wherein the laser source is a dual-frequency laser for emitting two laser beams with frequency differences, the two laser beams are decomposed into 6 laser beams through the optical fiber beam splitter, and each two laser beams are transmitted to a detector through the optical fiber.
5. The six degree-of-freedom displacement measurement system of claim 1, wherein the detector is a grating interferometer or a grating encoder, and the scale grating is a planar reflection/diffraction two-dimensional grating.
6. The six degree-of-freedom displacement measurement system of claim 1, wherein the pre-processing bit grating mounting plate and the exposure bit grating mounting plate are respectively connected to the main substrate by flexible blocks.
7. The six-degree-of-freedom displacement measurement system of the photoetching machine grating according to claim 3, wherein the laser further transmits a laser signal with the same frequency as the frequency difference to a phase card component of the electronic counting module to serve as an external reference signal, each two paths of laser light serve as reference light and measuring light to be transmitted to a reading head of one detector, the measuring light enters the scale grating through the measuring path to form diffracted light, the diffracted light and the reference light are combined to generate a measuring signal, the measuring signal is transmitted to the phase card component through an optical fiber, the phase card component solves the phase difference between the measuring signal and the external reference signal, and the obtained phase difference information is input to a resolving card to be subjected to displacement resolving, so that a displacement measurement value is obtained.
8. The six degree-of-freedom displacement measurement system of a lithography machine grating as recited in claim 1, wherein,
the main substrate is provided with through holes corresponding to the projection objective and the alignment sensor, the projection objective is fixed above the corresponding through holes, and the alignment sensor is fixed at the center of the corresponding through holes.
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| CN202210502276.4A CN114993190B (en) | 2022-05-10 | 2022-05-10 | Six-degree-of-freedom displacement measuring system for grating of photoetching machine |
| PCT/CN2022/132836 WO2023216545A1 (en) | 2022-05-10 | 2022-11-18 | Six-degree-of-freedom grating displacement measurement system for lithography machine |
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| CN202210502276.4A CN114993190B (en) | 2022-05-10 | 2022-05-10 | Six-degree-of-freedom displacement measuring system for grating of photoetching machine |
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| CN114993190B (en) * | 2022-05-10 | 2023-11-07 | 清华大学 | Six-degree-of-freedom displacement measuring system for grating of photoetching machine |
| CN117091512B (en) * | 2023-10-19 | 2024-01-02 | 中国科学院长春光学精密机械与物理研究所 | Multi-reading-head cooperative grating measuring device, measuring method, medium and equipment |
| CN117091514B (en) * | 2023-10-19 | 2023-12-19 | 中国科学院长春光学精密机械与物理研究所 | Grating displacement measuring device, method, medium and equipment of double-layer floating reading head |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20100041024A (en) * | 2008-10-13 | 2010-04-22 | 한국표준과학연구원 | Apparatus for six-degree-of-freedom displacement measurement using a two-dimensional grating |
| CN103309177A (en) * | 2013-06-19 | 2013-09-18 | 清华大学 | Workpiece platform system of photoetching machine |
| CN106017308A (en) * | 2016-07-22 | 2016-10-12 | 清华大学 | Six-degree-of-freedom interference measurement system and method |
| CN109238148A (en) * | 2018-09-13 | 2019-01-18 | 清华大学 | A kind of five degree of freedom heterodyne grating interference measuring system |
| CN113758428A (en) * | 2021-09-27 | 2021-12-07 | 清华大学 | Six-degree-of-freedom displacement measurement system for mask table of photoetching machine |
| CN113804112A (en) * | 2021-08-16 | 2021-12-17 | 北京华卓精科科技股份有限公司 | Displacement measurement system and lithographic apparatus |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110096318A1 (en) * | 2009-09-28 | 2011-04-28 | Nikon Corporation | Exposure apparatus and device fabricating method |
| CN105487343A (en) * | 2016-01-14 | 2016-04-13 | 哈尔滨工业大学 | Plane-grating-measurement-based dynamic-magnetic-steel magnetic levitation dual-stage vector arc switching method and device |
| CN114993190B (en) * | 2022-05-10 | 2023-11-07 | 清华大学 | Six-degree-of-freedom displacement measuring system for grating of photoetching machine |
-
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Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20100041024A (en) * | 2008-10-13 | 2010-04-22 | 한국표준과학연구원 | Apparatus for six-degree-of-freedom displacement measurement using a two-dimensional grating |
| CN103309177A (en) * | 2013-06-19 | 2013-09-18 | 清华大学 | Workpiece platform system of photoetching machine |
| CN106017308A (en) * | 2016-07-22 | 2016-10-12 | 清华大学 | Six-degree-of-freedom interference measurement system and method |
| CN109238148A (en) * | 2018-09-13 | 2019-01-18 | 清华大学 | A kind of five degree of freedom heterodyne grating interference measuring system |
| CN113804112A (en) * | 2021-08-16 | 2021-12-17 | 北京华卓精科科技股份有限公司 | Displacement measurement system and lithographic apparatus |
| CN113758428A (en) * | 2021-09-27 | 2021-12-07 | 清华大学 | Six-degree-of-freedom displacement measurement system for mask table of photoetching machine |
Non-Patent Citations (2)
| Title |
|---|
| 光刻机工件台六自由度超精密位移测量研究;胡金春 等;中国基础科学;第15卷(第4期);17-20 * |
| 扫描干涉光刻机的超精密移相锁定系统;王磊杰 等;光学精密工程;第27卷(第8期);1765-1773 * |
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