CN113804112A - Displacement measurement system and lithographic apparatus - Google Patents
Displacement measurement system and lithographic apparatus Download PDFInfo
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- CN113804112A CN113804112A CN202110940333.2A CN202110940333A CN113804112A CN 113804112 A CN113804112 A CN 113804112A CN 202110940333 A CN202110940333 A CN 202110940333A CN 113804112 A CN113804112 A CN 113804112A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
Abstract
The invention provides a displacement measurement system and a photoetching device, which relate to the technical field of grating measurement and comprise a grating mounting plate, an exposure bit grating and a preprocessing bit grating, wherein the exposure bit grating and the preprocessing bit grating are sequentially arranged on the grating mounting plate along a first direction; the grating positioning device comprises a grating mounting plate, a workpiece table and a detection mechanism, wherein the grating mounting plate is arranged on the workpiece table; the first direction is perpendicular to the second direction, the exposure bit grating and the preprocessing bit grating respectively comprise a rectangular-shaped grating, when the workpiece table is replaced from the preprocessing bit to the exposure bit along the first direction, the detection mechanism only needs to pass through a slit between the exposure bit grating and the preprocessing bit grating, measurement can be completed through a relatively simple resolving process during switching, and edge switching of the plane grating measurement system is simplified.
Description
Technical Field
The invention relates to the technical field of grating measurement, in particular to a displacement measurement system and photoetching equipment.
Background
The planar grating is used as a common optical device capable of generating diffraction phenomenon, and is mainly applied to spectral analysis, optical wavelength measurement and the like. The measurement grating in the existing measurement system comprises an exposure position grating and a preprocessing position grating which are sequentially arranged, and a specific workpiece table detector is matched to provide a measurement reference for the grating interference measurement system, so that displacement measurement is realized. Based on the requirement of measurement accuracy, on one hand, the calculation process of switching is optimized, and the calculation efficiency and accuracy are improved, and on the other hand, the method can start from all components of the measurement system, wherein the grating layout form is also one of the influencing factors.
Two square-shaped gratings formed by splicing eight L-shaped two-dimensional gratings in the prior art, wherein one grating forms an exposure bit grating, the other grating forms a preprocessing bit grating, a slit is arranged between the exposure bit grating and the preprocessing bit grating, and a slit is respectively arranged in the exposure bit grating and the preprocessing bit grating.
Disclosure of Invention
The invention aims to provide a displacement measurement system and a photoetching device, so as to solve the technical problems that the edge switching process of a plane grating is complex and higher measurement requirements are difficult to meet in the existing grating splicing method.
The invention provides a displacement measurement system, which comprises a grating mounting plate, an exposure bit grating and a preprocessing bit grating, wherein the exposure bit grating and the preprocessing bit grating are sequentially arranged on the grating mounting plate along a first direction;
the displacement measurement system further comprises a workpiece table and a detection mechanism arranged on the surface of the workpiece table at intervals, the workpiece table and the grating mounting plate are arranged at intervals along a second direction, and the detection mechanism is matched with the exposure position grating and the preprocessing position grating and is used for providing a measurement reference of the displacement measurement system;
the first direction is perpendicular to the second direction.
Furthermore, the square-shaped grating comprises two C-shaped plane gratings which are spaced along a third direction and are oppositely arranged;
the first direction, the second direction and the third direction are perpendicular to each other.
Furthermore, the square-shaped grating is a plane reflection type two-dimensional grating, and the lower surface of the square-shaped grating is parallel to the surface of the workpiece table.
Furthermore, the zigzag grating is connected to the lower surface of the grating mounting plate by van der waals force or gluing.
Furthermore, the detection mechanism comprises four detectors, the workpiece table is of a rectangular structure, one detector is arranged at each corner of the rectangular structure, and the projections of the four detectors in the first direction are not coincident;
when one detector is in the invalid area, the diffracted return light of the plane grating cannot be received, the six-degree-of-freedom displacement can be resolved only by means of displacement measurement values of other detectors, and different detectors need to be switched continuously to resolve required measurement values when passing through the invalid area.
Furthermore, the detector is a grating interferometer or a grating encoder with a two-degree-of-freedom measurement function.
Furthermore, the detector comprises a detector mirror group, an incident/return light signal receiver and a mounting seat assembly; the detector mirror group and the light incoming/returning signal receiver are fixed on the surface of the workpiece table through the mounting seat assembly;
the detector mirror group is used for generating laser interference signals, and the light entrance/return signal receiver is used for providing input signals and receiving output interference signals.
Furthermore, the displacement measurement system further comprises a driving mechanism, wherein the driving mechanism is connected with the workpiece table and used for driving the workpiece table and the detection mechanism to move in the first direction, the second direction and a third direction, and the third direction is a direction perpendicular to the first direction and the second direction respectively.
Furthermore, the displacement measurement system also comprises an extension bit grating which is connected to one side of the exposure bit grating, which is far away from the preprocessing bit grating.
The invention provides a lithographic apparatus comprising the displacement measurement system.
The invention provides a displacement measurement system, which comprises a grating mounting plate, an exposure bit grating and a preprocessing bit grating, wherein the exposure bit grating and the preprocessing bit grating are sequentially arranged on the grating mounting plate along a first direction; the displacement measurement system further comprises a workpiece table and a detection mechanism arranged on the surface of the workpiece table at intervals, the workpiece table and the grating mounting plate are arranged at intervals along a second direction, and the detection mechanism is matched with the exposure position grating and the preprocessing position grating and is used for providing a measurement reference of the displacement measurement system; the first direction is perpendicular to the second direction.
Compared with the prior art, in the displacement measurement system provided by the invention, the exposure bit grating and the preprocessing bit grating respectively comprise a rectangular-shaped grating, and when the workpiece stage is replaced from the preprocessing bit to the exposure bit along the first direction, the detection mechanism only needs to pass through a slit between the exposure bit grating and the preprocessing bit grating, so that the measurement can be completed through a relatively simple resolving process during switching, the edge switching of the plane grating measurement system is simplified, and higher measurement requirements can be met.
The lithographic apparatus provided by the invention comprises the displacement measurement system, so that the lithographic apparatus also has the advantages of the displacement measurement system.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and other drawings can be obtained by those skilled in the art without creative efforts.
Fig. 1 is a schematic diagram illustrating splicing of an exposure bit grating and a preprocessing bit grating of a displacement measurement system according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of the connection between the exposure bit grating and the pre-processing bit grating of the displacement measurement system and the grating mounting plate according to the embodiment of the present invention;
fig. 3 is a schematic position diagram of a C-shaped grating and a workpiece stage of the displacement measurement system according to the embodiment of the present invention;
fig. 4 is a schematic diagram of the position of the workpiece stage and the pre-processing grating when the workpiece stage of the displacement measurement system is in the pre-processing position according to the embodiment of the present invention;
fig. 5 is a schematic diagram of the position of the workpiece stage and the pre-processing grating when the workpiece stage of the displacement measurement system is in the pre-processing position according to the embodiment of the present invention;
FIG. 6 is a schematic diagram of a displacement measurement system according to an embodiment of the present invention with a first detector in a slit between a pre-processing bit grating and an exposure bit grating;
FIG. 7 is a schematic diagram of a displacement measurement system according to an embodiment of the present invention with a second detector in a slit between a pre-processing bit grating and an exposure bit grating;
FIG. 8 is a schematic diagram of a displacement measurement system according to an embodiment of the present invention with a third detector in a slit between a pre-processing bit grating and an exposure bit grating;
FIG. 9 is a diagram illustrating a fourth detector of the displacement measurement system in a slit between the pre-processing bit grating and the exposure bit grating according to the embodiment of the present invention;
FIG. 10 is a schematic diagram of a failure region of a second detector of the displacement measurement system according to an embodiment of the present invention when the first detector is in an extended position grating;
fig. 11 is a schematic diagram of a two-degree-of-freedom measurement performed by a detector of the displacement measurement system according to the embodiment of the present invention;
FIG. 12 is a schematic diagram of a layout of a square-shaped grating of the displacement measurement system according to the embodiment of the present invention;
fig. 13 is another layout diagram of a square-shaped grating of the displacement measurement system according to the embodiment of the present invention.
Icon: 101-C-shaped planar grating; 110-pre-processing bit raster; 120-exposure bit grating; 130-extended bit grating; 200-a workpiece table; 210-a detector; 211-detector one; 212-detector two; 213-detector three; 214-detector four; 300-a grating mounting plate; 400-light source.
Detailed Description
The technical solutions of the present invention will be described clearly and completely with reference to the following embodiments, and it should be understood that the described embodiments are some, but not all, embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
As shown in fig. 1 to 13, the displacement measurement system provided in this embodiment includes a grating mounting plate 300, and an exposure bit grating 120 and a pre-processing bit grating 110 sequentially disposed on the grating mounting plate 300 along a first direction, wherein the exposure bit grating 120 and the pre-processing bit grating 110 respectively include a rectangular-shaped grating.
The displacement measurement system further comprises a workpiece table 200 and a detection mechanism arranged on the surface of the workpiece table 200 at intervals, wherein the workpiece table 200 and the grating mounting plate 300 are arranged at intervals along the second direction, and the detection mechanism is matched with the exposure bit grating 120 and the preprocessing bit grating 110 and is used for providing a measurement reference of the displacement measurement system; wherein the first direction is perpendicular to the second direction.
Compared with the prior art, in the displacement measurement system that this embodiment provided, exposure bit grating and preliminary treatment bit grating include a return type grating respectively, when the work piece platform was traded the platform operation by the preliminary treatment position to the exposure position along the first direction, detection mechanism only need can accomplish the measurement through a slit between exposure bit grating and the preliminary treatment bit grating to simplified the edge switch of plane grating measurement system, can satisfy the measurement demand of higher accuracy.
Specifically, as shown in fig. 12, a layout diagram of a square-shaped grating is shown, and the structure of the square-shaped grating may be a square notch, and when two square-shaped gratings with the above structures are combined together to form the exposure bit grating and the preprocessing bit grating, the scheme can simplify the problem of the system edge switching process, and the manufacturing process is simpler.
Fig. 13 shows another layout diagram of a square-shaped grating, which is different from the above square-shaped grating in that a circular gap is formed in the middle of the square-shaped grating, and this scheme can also simplify the problem of the system edge switching process.
In general, the overall size requirement of the exposure bit grating and the preprocessing bit grating is relatively large (greater than or equal to 800mm × 800mm), the manufacturing difficulty is increased, and the manufacturing difficulty is reduced and the cost is saved on the premise of not increasing the resolving difficulty in the switching process. Specifically, in another embodiment of the present invention, the square-wave grating may include two C-shaped plane gratings 101 spaced apart and oppositely disposed along the third direction; wherein the first direction, the second direction and the third direction are perpendicular to each other. Specifically, the exposure bit grating 120 and the preprocessing bit grating 110 both include two C-shaped plane gratings 101 spaced and oppositely arranged along the third direction, and it should be noted that, when the square-shaped grating includes two C-shaped plane gratings 101, the square-shaped grating herein may include the following two structural forms, on one hand, the two C-shaped plane gratings 101 forming one square-shaped grating may be mutually attached to be spliced into a complete square shape; on the other hand, two C-shaped planar gratings 101 forming a loop-shaped grating may also be disposed oppositely, and a gap is formed between the two planar gratings to form an approximate loop-shaped structure.
The detection mechanism includes four detectors 210, the workpiece stage 200 is a rectangular structure, each corner of the rectangular structure is provided with one detector 210, projections of the four detectors 210 in the first direction do not coincide, when one detector 210 is located in an invalid region, diffracted return light of a plane grating cannot be received, six-degree-of-freedom displacement can be resolved only by means of displacement measurement values of other detectors 210, and different detectors 210 need to constantly switch and resolve required measurement values when passing through the invalid region.
Note that the above-mentioned invalid region refers to a region where the detector 210 moves out of the plane grating and cannot receive the diffracted return light of the plane grating. In this embodiment, the method may specifically include a slit between the preprocessed bit grating 110 and the exposed bit grating 120, a slit between the exposed bit grating 120 and the extended bit grating 130, and a square or circular gap in the middle of the square-shaped grating.
Specifically, the displacement measurement system comprises a workpiece table 200 and four detectors 210 arranged on the surface of the workpiece table 200 at intervals, the projections of the four detectors 210 in the first direction are not coincident, the workpiece table 200 and the grating mounting plate 300 are arranged at intervals in the second direction, and the four detectors 210 are matched with the exposure bit grating 120 and the preprocessing bit grating 110 and used for providing a measurement reference of the displacement measurement system.
Compared with the prior art, in the displacement measurement system provided by this embodiment, the exposure bit grating 120 and the preprocessing bit grating 110 are spliced by two "C" -shaped planar gratings 101 arranged oppositely to form a square grating, when the workpiece stage 200 is replaced from the preprocessing bit to the exposure bit along the first direction, it can be ensured that three detectors 210 work at any time, so as to perform six-degree-of-freedom displacement calculation, the detectors 210 only need to pass through a slit between the exposure bit grating 120 and the preprocessing bit grating 110, and can complete measurement through four times of conversion, thereby simplifying edge switching of the planar grating measurement system.
It should be noted that, when the tiled grating in the prior art is used, when the first detector 211, the second detector 212 overexpose the slit between the bit grating 120 and the pre-processing bit grating 110, the third detector 213, and the fourth detector 214 may overexpose the slit between the pre-processing bit grating 110, and at this time, four times of continuous switching is required.
When the workpiece stage 200 operating in the exposure position and the preprocessing position moves relative to the exposure position grating 120 and the preprocessing position grating 110, respectively, the signal receiving and processing unit outputs four sets of measured displacements parallel to the moving direction of the workpiece stage 200 and perpendicular to the moving direction of the workpiece stage 200, and the eight sets of measured values are used to calculate the spatial six-degree-of-freedom displacement of the workpiece stage 200 operating in the exposure position and the preprocessing position, respectively. The single detector 210 can detect two sets of displacement information, in-plane and out-of-plane, where four sets of parallel or perpendicular refer to x/y axis displacement information parallel to the grating and z axis displacement information perpendicular to the grating, where six degrees of freedom refer to six degrees of freedom displacement system information of the center of mass of the workpiece stage 200. As shown in fig. 3, the x-axis in the figure represents a third direction; the y-axis represents a first direction; the z-axis represents the second direction.
The stage 200 with four detectors 210 is located below the grating mounting plate 300, the C-shaped plane grating 101 forming the pre-processing bit grating 110 and the exposure bit grating 120 is disposed below the grating mounting plate 300 and opposite to the detectors 210, and the light source 400 is disposed above the grating mounting plate 300.
The displacement measurement system further comprises an extended bit grating 130, the extended bit grating 130 being connected to a side of the exposure bit grating 120 remote from the pre-processing bit grating 110. The extension grating 130 is a rectangular two-dimensional grating and is located on the fixed frame in the stage changing area. Wherein, a square-shaped grating is mounted on the flat grating mounting plate 300 above the exposure stage 200 to form the exposure stage grating 120; the other optical grating is arranged on the plane grating mounting plate 300 above the preprocessing position workpiece table 200 to form the preprocessing position grating 110; the extension bit grating 130 is located on the fixed frame in the stage changing area, and the exposure bit grating 120, the preprocessing bit grating 110 and the extension bit grating 130 in the displacement measurement system cooperate with the detector 210 on the workpiece stage 200 to provide a measurement reference for the measurement system, which simplifies the problem of complex edge switching process of the displacement measurement system.
In this embodiment, the workpiece stage 200 has a rectangular structure, and one detector 210 is disposed at each corner of the rectangular structure. As shown in fig. 3, the first detector 211, the second detector 212, the third detector 213, and the fourth detector 214 are provided, and projections of the four detectors 210 in the first direction, that is, the y-axis are not coincident, so that when the workpiece stage 200 moves from the preprocessing bit grating 110 to the extension bit grating 130, the workpiece stage can pass through the slits between the two adjacent gratings, thereby ensuring that all three detectors 210 are located in the effective area.
The two C-shaped plane gratings 101 forming the square-shaped grating are planar reflection type two-dimensional gratings, a two-dimensional reflection type grating groove line is engraved on one side of the planar reflection type two-dimensional grating, which is far away from the grating mounting plate 300, and the lower surface of the C-shaped plane grating 101 is parallel to the surface of the workpiece table 200.
The grating mounting board 300 provides a stable and reliable mounting interface for the "C" -shaped planar grating 101 as a reference member, and the "C" -shaped planar grating 101 is mounted on the reference member and arranged such that the target surface of each target is substantially parallel to the reference surface; meanwhile, the "C" -shaped plane grating 101 is attached to the lower surface of the grating mounting plate 300 by van der waals force or gluing.
The detector 210 is capable of detecting laser, and the detector 210 has a function of measuring various indexes of the two-degree-of-freedom motion of the workpiece stage 200, and may be a grating interferometer or a grating encoder.
The detector 210 specifically includes a detector mirror assembly, an incident/return light signal receiver, and a mounting base assembly; the detector mirror group and the light incoming/returning signal receiver are fixed on the surface of the workpiece table 200 through the mounting seat assembly; the detector mirror group is used for generating laser interference signals, the light incident/return signal receiver is used for providing input signals and receiving output interference signals, when one detector 210 passes through the slit, diffracted return light of the plane grating cannot be received, only displacement measurement values of other detectors 210 can be used for calculating displacement with six degrees of freedom, and different detectors 210 pass through the slit successively and need to be switched and calculate required measurement values continuously.
Specifically, the plane grating is disposed above the detector 210 in parallel, laser light emitted from the laser device is emitted to the C-shaped plane grating 101 at a littrow angle after being acted by the detector 210, diffracted light generated by the C-shaped plane grating 101 returns to the detector 210 along the original path, and the C-shaped plane grating 101 provides an important component of a measurement reference for the displacement measurement system.
The exposure bit grating 120 and the preprocessing bit grating 110 provide a measurement reference for the displacement measurement system, and cooperate with the four detectors 210 on the workpiece stage 200 to complete the spatial six-degree-of-freedom displacement measurement of the target workpiece stage 200. Each detector 210 can detect the in-plane and vertical two-degree-of-freedom displacement of the planar grating, and the four detectors 210 detect four groups of in-plane and vertical displacements of the planar grating, and finally solve the six-degree-of-freedom displacement in the space of the target workpiece stage 200.
The mounting seat assembly can be fixed on the surface of the workpiece table 200 through bolts, and the detector mirror group is bonded on the mounting seat assembly.
It should be noted that, in this embodiment, the detector mirror group and the incident/return light signal receiver may adopt components that can implement corresponding functions in the prior art, and details are not described here.
In this embodiment, the displacement measuring system further includes a driving mechanism, which is connected to the workpiece stage 200 and is configured to drive the workpiece stage 200 and the detector 210 to move in the first direction, the second direction, and the third direction.
Specifically, the exposure bit grating 120 and the pre-processing bit grating 110 are fixed on the grating mounting plate 300; the driving mechanism is connected with the workpiece table 200, and the four detectors 210 are fixed on the workpiece table 200 and move together with the workpiece table 200, so that the detectors 210 and the C-shaped plane grating 101 move relatively.
As shown in fig. 4 to 9, the movement manner of the displacement measurement system provided in the present embodiment is described in detail.
The motion of the four detectors 210 relative to the grating is divided into the following stages: the four detectors 210 are detector one 211, detector two 212, detector three 213, and detector four 214, respectively.
First, when the first detector 211, the second detector 212, the third detector 213, and the fourth detector 214 move at the middle position of the pre-processing bit grating 110 or the exposure bit grating 120, the four detectors 210 are all in an active state, and the movement at the pre-processing bit is as shown in fig. 4, so that eight sets of displacement measurement values can be obtained, and the six-degree-of-freedom displacement can be calculated. Taking fig. 5 as an example, when the workpiece stage 200 moves in the X direction of the preprocessing position, when the second detector 212 and the third detector 213 move to the lower boundary of the lower "C" -shaped planar grating 101, and when the second detector 212 is in the lower left corner, the first detector 211 also moves to the lower boundary of the upper "C" -shaped planar grating 101, and the planes are both in an active state, and the fourth detector 214 is in the gap between the two "C" -shaped planar gratings 101, and is in an inactive state, that is, the detectors 210 on the workpiece stage 200 can keep three in an active state, obtain six sets of measurement values, calculate six degrees of freedom displacement, and as well as processing, when the first detector 211 is in the upper left corner, the third detector 213 is in the lower right corner, or the fourth detector is in the upper right corner, three of the states are also guaranteed to be active. It is understood that when the workpiece stage 200 is in the exposure position, the working principle is the same as that in the pre-processing position, and the detailed description is omitted here.
As shown in fig. 6, it should be noted that when the stage 200 is shifted, i.e., switched from the preprocessing position to the exposure position, it passes only through the middle position where the slits where the two plane gratings meet.
Secondly, when the first detector 211, the second detector 212, the third detector 213 and the fourth detector 214 move to the limit state on the pre-processing bit grating 110 or the exposure bit grating 120, namely, one detector 210 moves to the invalid region, and the rest three detectors are all in the valid state, six groups of displacement measurement values can be obtained, and six-degree-of-freedom displacement can be calculated.
Specifically, the detector 210 moves from the pre-processing bit grating 110 to the exposure bit grating 120, when the detector 210 moves from the pre-processing bit grating 110 to the exposure bit grating 120, the first detector 211 moves out of the pre-processing bit first and is located in an invalid measurement area between the exposure bit and the pre-processing bit, only the second detector 212, the third detector 213 and the fourth detector 214 are in a working state at this time, six groups of corresponding measurement values can be output for resolving, and six-degree-of-freedom displacement of the workpiece stage 20012 is obtained, wherein a movement schematic diagram is shown in fig. 6; subsequently, the second detector 212 moves out of the preprocessing position and is located in an invalid measurement area between the exposure position and the preprocessing position, only the first detector 211, the third detector 213 and the fourth detector 214 are in a working state at this time, six groups of corresponding measurement values can be output for resolving, and six-degree-of-freedom displacement of the workpiece table 20012 is obtained, wherein a motion schematic diagram is shown in fig. 7; the third detector 213 is moved out of the preprocessing position and is located in an invalid measurement area between the exposure position and the preprocessing position, only the first detector 211, the second detector 212 and the fourth detector 214 are in a working state at this time, six groups of corresponding measurement values can be output for resolving, and six-degree-of-freedom displacement of the workpiece table 200 is obtained, wherein a motion schematic diagram is shown in fig. 8; the fourth detector 214 moves out of the preprocessing position and is located in the invalid measurement region between the exposure position and the preprocessing position, only the first detector 211, the second detector 212 and the third detector 213 are in the working state at this time, six groups of corresponding measurement values can be output for calculation, and six-degree-of-freedom displacement of the workpiece table 200 is obtained, and a motion schematic diagram is shown in fig. 9.
Again, the detector 210 moves from the exposure bit grating 120 to the extension bit grating 130, and the schematic diagram of the movement is shown in FIG. 10: when the detector 210 moves out of the exposure position, the second detector 212 is in a failure state, and the first detector 211, the third detector 213 and the fourth detector 214 can obtain six sets of displacement measurement values, so that six-degree-of-freedom displacement can be calculated.
In summary, in the embodiment, a slit is formed between the pre-processing bit grating 110 and the exposure bit grating 120; a slit is formed between the exposure bit grating 120 and the extension bit grating 130, which is a problem in the present embodiment that the "C" -shaped plane grating 101 passes through the slit. Fig. 5 and 6 show the first pass of the first detector 211 and the second detector 212 through the slit, fig. 7 and 8 show the first pass of the third detector 213 and the fourth detector 214 through the slit, and fig. 9 shows the second pass of the second detector 212 through the slit. (the four detectors should adopt an arrangement mode that the projections of the four detectors are not overlapped in the y-axis direction, and the arrangement is characterized in that when the platform is changed, the first detector 211, the second detector 212, the third detector 213 and the fourth detector 214 do not pass through the slit at the same time, so that at least three detectors 210 work at any time, and six-degree-of-freedom displacement calculation can be always carried out).
As shown in fig. 10, when moving to the extended bit grating, the first detector 211 passes through the primary slit, the second detector 212 moves to the inactive area, and the third controller 213 and the fourth detector 214 remain in the exposed bit grating, which needs 2 conversions to complete the measurement. In the prior art, the third controller 213 and the fourth detector 214 need to respectively perform slit splicing by L-shaped gratings once, and the measurement can be completed only by 4 times of conversion, so that the problem of complex edge switching process of the displacement measurement system is simplified in the embodiment, and the splicing and the use of the gratings are simpler and more convenient.
It should be noted that the four detectors 210 are all in the grating plane, and eight pieces of displacement information can be obtained, wherein four sets of displacement information include an in-plane x/y axis, the other four sets include an out-of-plane z axis, and eight sets of data can be used to solve the six degrees of freedom of the center of mass of the workpiece stage 200 in a redundant manner; when the workpiece table 200 moves, one of the detectors 210 of the workpiece table 200 moves out of the plane grating, and the remaining three detectors 210 are located in the range of the plane grating, so that six degrees of freedom of the centroid of the workpiece table 200 can be solved by using six sets of displacement information of three sets of in-plane displacement information x/y axes and three sets of out-of-plane z axes.
The lithographic apparatus provided by this embodiment, including the above-mentioned displacement measurement system, the grating simplifies the problem that the edge switching process of the displacement measurement system is complicated, and the manufacturing method, splicing and using method of the grating are all simpler, so the lithographic apparatus also has the advantages of the displacement measurement system.
In summary, the displacement measurement system provided by the present invention includes a grating mounting plate 300, and an exposure bit grating 120 and a preprocessing bit grating 110 sequentially disposed on the grating mounting plate 300 along a first direction; the exposure bit grating 120 and the pre-processing bit grating 110 each include two "C" -shaped plane gratings 101 spaced apart and oppositely disposed in the third direction. The displacement measurement system further comprises a workpiece table 200 and four detectors 210 arranged on the surface of the workpiece table 200 at intervals, the projections of the four detectors 210 in the first direction are not coincident, the workpiece table 200 and the grating mounting plate 300 are arranged at intervals in the second direction, and the four detectors 210 are matched with the exposure bit grating 120 and the preprocessing bit grating 110 and used for providing a measurement reference of the displacement measurement system. The first direction, the second direction and the third direction are perpendicular to each other. Compared with the prior art, in the displacement measurement system provided by the invention, the exposure bit grating 120 and the preprocessing bit grating 110 are spliced by two C-shaped plane gratings 101 which are oppositely arranged to form a square-shaped grating, when the workpiece stage 200 is replaced from the preprocessing bit to the exposure bit along the first direction, three detectors 210 can be guaranteed to work at any time, so that six-degree-of-freedom displacement calculation is carried out, the detectors 210 only need to pass through a slit between the exposure bit grating 120 and the preprocessing bit grating 110 and can complete measurement through four times of conversion, and thus the edge switching of the plane grating measurement system is simplified.
The lithographic apparatus provided by the present invention includes the above-mentioned displacement measurement system, and therefore, the lithographic apparatus also has the advantages of the displacement measurement system, which is not described herein again.
Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; while the invention has been described in detail and with reference to the foregoing embodiments, it will be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; and the modifications or the substitutions do not make the essence of the corresponding technical solutions depart from the scope of the technical solutions of the embodiments of the present invention.
Claims (10)
1. A displacement measurement system is characterized by comprising a grating mounting plate (300), and an exposure bit grating (120) and a preprocessing bit grating (110) which are sequentially arranged on the grating mounting plate (300) along a first direction, wherein the exposure bit grating (120) and the preprocessing bit grating (110) respectively comprise a rectangular-shaped grating;
the displacement measurement system further comprises a workpiece table (200) and a detection mechanism arranged on the surface of the workpiece table (200) at intervals, the workpiece table (200) and the grating mounting plate (300) are arranged at intervals along a second direction, and the detection mechanism is matched with the exposure position grating (120) and the preprocessing position grating (110) and is used for providing a measurement reference of the displacement measurement system;
the first direction is perpendicular to the second direction.
2. A displacement measuring system according to claim 1, wherein the zigzag grating comprises two oppositely arranged C-shaped plane gratings (101) spaced along a third direction;
the first direction, the second direction and the third direction are perpendicular to each other.
3. The displacement measurement system of claim 1, wherein the chevron grating is a planar reflective two-dimensional grating and a lower surface of the chevron grating is parallel to a surface of the workpiece stage (200).
4. The displacement measurement system according to claim 1, wherein the zigzag-shaped grating is attached to the lower surface of the grating mounting plate (300) by van der waals force or by gluing.
5. The displacement measuring system according to claim 1, wherein the detecting mechanism comprises four detectors (210), the workpiece stage (200) is a rectangular structure, one detector (210) is arranged at each corner of the rectangular structure, and the projections of the four detectors (210) in the first direction are not coincident;
when one detector (210) is in the invalid region, the diffracted return light of the plane grating cannot be received, the six-degree-of-freedom displacement can be resolved only by means of displacement measurement values of other detectors (210), and different detectors (210) pass through the invalid region successively and need to constantly switch and resolve required measurement values.
6. A displacement measuring system according to claim 5, characterized in that the detector (210) is a grating interferometer or a grating encoder with two degrees of freedom measurement functionality.
7. The displacement measuring system of claim 5, wherein the detector (210) comprises a detector mirror assembly, an in/out light signal receiver, and a mount assembly; the detector mirror group and the light incoming/returning signal receiver are fixed on the surface of the workpiece table (200) through the mounting seat assembly;
the detector mirror group is used for generating laser interference signals, and the light entrance/return signal receiver is used for providing input signals and receiving output interference signals.
8. The displacement measuring system according to claim 1, further comprising a driving mechanism coupled to the workpiece stage (200) for driving the workpiece stage (200) and the detecting mechanism to move in the first direction, the second direction, and a third direction, wherein the third direction is perpendicular to the first direction and the second direction, respectively.
9. Displacement measurement system according to any one of claims 1 to 8, characterised in that it further comprises an extended bit grating (130), said extended bit grating (130) being connected on the side of said exposure bit grating (120) remote from said preprocessed bit grating (110).
10. A lithographic apparatus comprising a displacement measurement system according to any one of claims 1 to 9.
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| CN202110940333.2A CN113804112A (en) | 2021-08-16 | 2021-08-16 | Displacement measurement system and lithographic apparatus |
| PCT/CN2022/096183 WO2023020068A1 (en) | 2021-08-16 | 2022-05-31 | Displacement measurement system and photolithography device |
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| CN114993190A (en) * | 2022-05-10 | 2022-09-02 | 清华大学 | Six-degree-of-freedom displacement measurement system for grating of photoetching machine |
| WO2023020068A1 (en) * | 2021-08-16 | 2023-02-23 | 北京华卓精科科技股份有限公司 | Displacement measurement system and photolithography device |
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| CN100470379C (en) * | 2007-07-19 | 2009-03-18 | 清华大学 | Photo-etching machine silicon chip platform double-platform switching system |
| CN102122120A (en) * | 2011-03-22 | 2011-07-13 | 哈尔滨工业大学 | Two-table switching system of stepping and scanning lithography machine |
| CN105509644B (en) * | 2016-01-14 | 2018-01-12 | 哈尔滨工业大学 | Air floating table Three Degree Of Freedom displacement measurement system based on two plane gratings |
| CN113804112A (en) * | 2021-08-16 | 2021-12-17 | 北京华卓精科科技股份有限公司 | Displacement measurement system and lithographic apparatus |
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| CN103309177A (en) * | 2013-06-19 | 2013-09-18 | 清华大学 | Workpiece platform system of photoetching machine |
| CN106526746A (en) * | 2016-11-14 | 2017-03-22 | 天津理工大学 | Large period Prague waveguide grating structure and preparation method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2023020068A1 (en) * | 2021-08-16 | 2023-02-23 | 北京华卓精科科技股份有限公司 | Displacement measurement system and photolithography device |
| CN114993190A (en) * | 2022-05-10 | 2022-09-02 | 清华大学 | Six-degree-of-freedom displacement measurement system for grating of photoetching machine |
| CN114993190B (en) * | 2022-05-10 | 2023-11-07 | 清华大学 | Six-degree-of-freedom displacement measuring system for grating of photoetching machine |
| WO2023216545A1 (en) * | 2022-05-10 | 2023-11-16 | 清华大学 | Six-degree-of-freedom grating displacement measurement system for lithography machine |
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