CN113718237A - 一种疏水镀层及包含该疏水镀层的空调接水盘 - Google Patents
一种疏水镀层及包含该疏水镀层的空调接水盘 Download PDFInfo
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- CN113718237A CN113718237A CN202010449391.0A CN202010449391A CN113718237A CN 113718237 A CN113718237 A CN 113718237A CN 202010449391 A CN202010449391 A CN 202010449391A CN 113718237 A CN113718237 A CN 113718237A
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- hydrophobic coating
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Images
Classifications
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1655—Process features
- C23C18/1662—Use of incorporated material in the solution or dispersion, e.g. particles, whiskers, wires
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/22—Roughening, e.g. by etching
- C23C18/24—Roughening, e.g. by etching using acid aqueous solutions
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
- C23C18/285—Sensitising or activating with tin based compound or composition
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
- C23C18/30—Activating or accelerating or sensitising with palladium or other noble metal
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Abstract
本发明提出一种疏水镀层及包含该镀层的空调接水盘。能够解决现有空调接水盘无法实现自清洁和防霉的技术问题。该疏水镀层以质量百分比计，包括疏水颗粒1‑30、纯金属或合金70‑99，其中所述疏水颗粒选自石墨、硅酮粉、疏水二氧化硅、聚四氟乙烯、氟化石墨和经阳离子表面活性剂处理的石墨、硅酮粉、疏水二氧化硅、聚四氟乙烯、氟化石墨中的至少一种，所述纯金属或合金选自Ni、Cu和Co中的至少一种。本发明提供的疏水镀层能够应用于空调接水盘的疏水镀层制备中，可在保证镀层基础性能的基础下，大幅提升镀层的自清洁能力。
Description
技术领域
本发明涉及一种疏水镀层，尤其涉及一种能实现自清洁和抗菌防霉双重功效的疏水镀层，以及包含该镀层的空调接水盘。
背景技术
在空调组件中，接水盘用于承接换热器器落下的冷凝水，并将冷凝水排出空调。行业内现用的接水盘无法将冷凝水及时排出空调外，极易造成灰尘的积累，导致微生物的富集，进而影响生活环境质量，损害人体健康。如果空调接水盘能具有自清洁功能，就能够解决灰尘堆积和微生物富集的问题，生活环境也能得到保障。
专利申请CN201710107943B提出一种金属材料表面超疏水膜的制备方法，该疏水膜是以除杂后的金属基体为阴极，以惰性电极材料、纯镍电极或铅锡合金电极作为阳极，通过在长链脂肪酸的乙醇溶液中浸泡2min以上，对镀层进行改性，得到金属材料表面超疏水镀层；专利申请CN109112589A公开了一种在金属表面制备Co-TiO2超疏水纳米复合电镀层及其制备方法，该方通过金属钴盐、长支链烷酸、TiO2、络合剂、表面活性剂的乙醇溶夜，搅拌并超声震荡均匀作为电镀液。上述方案制得的疏水镀层仅能应用在金属表面。因此，目前未见关于有效的可用于空调接水盘的同时满足自清洁和防霉功效的镀层的报道。
发明内容
本发明针对现有技术中存在的空调接水盘无法实现自清洁，进而造成的灰尘堆积和微生物富集的技术问题，提出一种兼具自清洁和除静电能力的疏水镀层及包含该镀层的空调接水盘。
为了达到上述目的，本发明采用的技术方案为：
一种疏水镀层，以质量百分比计，所述疏水镀层包括疏水颗粒1-30、纯金属或合金70-99。
作为优选，以质量百分比计，所述疏水镀层中疏水颗粒为5-10，所述疏水颗粒的粒径为0.1-10μm。
作为优选，所述疏水颗粒选自石墨、硅酮粉、疏水二氧化硅、聚四氟乙烯、氟化石墨和经阳离子表面活性剂处理的石墨、硅酮粉、疏水二氧化硅、聚四氟乙烯、氟化石墨中的至少一种，所述纯金属或合金选自Ni、Cu和Co中的至少一种；
所述阳离子表面活性剂选自胺盐型、季铵盐型、杂环型或啰盐型。
本发明提供了一种利用上述任一项技术方案所述的疏水镀层的制备方法，所述制备方法包括：基材预处理和化学镀，所述基材预处理包括基材粗化、基材敏化、胶体钯活化和解胶。
作为优选，所述化学镀步骤具体为：
以水为溶剂，利用主盐、还原剂、配位剂、缓冲剂和促进剂制得水溶液；
于40-100℃条件下，向所述水溶液中加入非金属颗粒、纯金属或合金，并调节pH至4-6，搅拌均匀后，制得化学镀镀液；
于经预处理后的塑料基材表面施镀所述化学镀镀液，固化干燥后，得到疏水镀层。
作为优选，所述水溶液中主盐的质量浓度为15-35g/L、还原剂的质量浓度为25-40g/L、配位剂的质量浓度为10-40g/L，缓冲剂的质量浓度为10-20g/L，促进剂的质量浓度＜1g/L，疏水颗粒的质量浓度为3-15g/L。
作为优选，所述主盐选自NiSO4·6H2O、NiCl2·6H2O、CuSO4·5H2O、CuCl2·2H2O、氨基磺酸钴、氯化钴和硫酸钴中的至少一种；
所述还原剂选自次磷酸钠、二甲基氨基硼烷、联氨、硼氢化钾和甲醛中的至少一种，优选次磷酸钠；
所述配位剂选自乙醇酸、柠檬酸、乳酸、苹果酸、丙酸、水杨酸、甘氨酸、琥珀酸、氨基醋酸、EDTA、酒石酸、乙二胺、氨、氰化钠和硫氢化钾中的至少一种，优选乙醇酸、柠檬酸、乳酸、苹果酸、丙酸、水杨酸、甘氨酸、琥珀酸、氨基醋酸和酒石酸中的至少一种；
所述缓冲剂选自单基羧酸型、二元羧酸型、羟基羧酸型、硼酸、碳酸和亚硫酸中的至少一种；
所述促进剂选自氨基乙酸、氨基丙酸、氨基丁酸和天冬氨酸中的至少一种。
作为优选，所述化学镀镀液的施镀时间为10-40min，所述疏水镀层的厚度为0.02-15μm。
作为优选，所述搅拌方式为机械搅拌、空气搅拌、平板泵搅拌或空气循环。
本发明提供了一种空调接水盘，包含上述根据任一项技术方案所述的疏水镀层。
与现有技术相比，本发明的优点和积极效果在于：
本发明提供了一种疏水镀层及包含该镀层的空调接水盘，该疏水镀层通过加入非金属颗粒与Ni、Co、Cu等纯金属或合金共同沉积制得的复合镀层。在该镀层表面形成微观的表面疏水镀层，能够起到良好的自清洁效果，此外，由于该镀层的导电性还能起到防静电的效果。
附图说明
图1为本发明实施例所提供的疏水镀层截面示意图。
具体实施方式
下面将对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
本发明实施例提供了一种疏水镀层，以质量百分比计，所述疏水镀层包括疏水颗粒1-30、纯金属或合金70-99。
上述实施例中提到的疏水镀层是通过在基础化学镀镀液中加入非金属颗粒与纯金属或合金共同沉积，进而制得的一种微观粗糙的复合镀层，该镀层不仅能够实现自清洁的效果，防止灰尘堆积和微生物富集，还由于出色的导电性能起到了除静电的效果。
在一优选实施例中，以质量百分比计，所述疏水镀层中疏水颗粒为5-10，所述疏水颗粒的粒径为0.1-10μm。
在上述优选实施例中，所述疏水颗粒可选取1、2、3、4、5、6、7、8、9、10、11、12、13、14、15、16、17、18、19、20、21、22、23、24、25、26、27、28、29、30％或上述限定范围内的任一数值均落在本发明的保护范围之内；所述疏水颗粒的粒径可选取0.1、0.5、1.0、2.0、4.0、8.0、10.0μm或上述限定范围内的任一数值均落在本发明的保护范围之内。
此外，将疏水颗粒的含量及粒径限定在上述范围的原因在于：当疏水颗粒物在镀层中含量少于1％时，镀层性能疏液性能提升不明显；当疏水颗粒含量高于30％时，继续增加疏水颗粒，镀层性能提升不明显且镀层稳定性下降。当疏水颗粒小于0.1μm时，颗粒易于在镀液中发生团聚，分散性差；当疏水颗粒大于10μm时，由于其粒径大，沉积效率低与镀层的结合力差。
在一优选实施例中，所述疏水颗粒选自石墨、硅酮粉、疏水二氧化硅、聚四氟乙烯、氟化石墨和经阳离子表面活性剂处理的石墨、硅酮粉、疏水二氧化硅、聚四氟乙烯、氟化石墨中的至少一种，所述纯金属或合金选自Ni、Cu和Co中的至少一种；
所述阳离子表面活性剂选自胺盐型、季铵盐型、杂环型或啰盐型。
在上述优选实施例中，疏水颗粒优选经经阳离子表面活性剂处理后带有正电荷的石墨、硅酮粉、疏水二氧化硅、聚四氟乙烯、氟化石墨中的至少一种。
本发明实施例提供了一种根据上述任一实施例所述的疏水镀层的制备方法，所述制备方法包括：基材预处理和化学镀，所述基材预处理包括基材粗化、基材敏化、胶体钯活化和解胶。
在上述优选实施例中，基材可选取ABS塑料、PPO改性聚苯氧树脂、PA聚酰胺、POM聚缩醛树脂、PBT聚丁烯对苯二甲酸脂等多种塑料；基材粗化处理可选用高铬酐溶液、硫酸；基材敏化处理可选用氯化亚锡溶液、盐酸溶液、稀硫酸溶液；胶体钯活化可选用氯化钯、硝酸钯、硫酸钯、磷酸钯；解胶可选用盐酸溶液、磷酸、硫酸、硝酸均可。
在一优选实施例中，所述化学镀步骤具体为：
以水为溶剂，利用主盐、还原剂、配位剂、缓冲剂和促进剂制得水溶液；
于40-100℃条件下，向所述水溶液中加入所述疏水颗粒、纯金属或合金，并调节pH至4-6，搅拌均匀后，制得化学镀镀液；
于经预处理后的塑料基材表面施镀所述化学镀镀液，固化干燥后，得到疏水镀层。
在上述制备方法中，在40-100℃条件下，非金属颗粒等主要成分可均匀地分散或溶解于水溶液中，可在一定时间内形成均一的溶液体系。
还需补充的是，在上述制备方法中，主盐就是含有沉积前金属的物质，经置换反应后，主盐中的金属沉积在阴极表面。
在一优选实施例中，所述水溶液中主盐的质量浓度为15-35g/L、还原剂的质量浓度为25-40g/L、配位剂的质量浓度为10-40g/L，缓冲剂的质量浓度为10-20g/L，促进剂的质量浓度＜1g/L，疏水颗粒的质量浓度为3-15g/L。
在上述优选实施例中，水溶液中主盐的质量浓度可选取15、20、25、30、35g/L或上述限定范围内的任一数值均落在本发明的保护范围之内；还原剂的质量浓度可选取25、30、35、40g/L或上述限定范围内的任一数值均落在本发明的保护范围之内；配位剂的质量浓度可选取10、20、30、40g/L或上述限定范围内的任一数值均落在本发明的保护范围之内；缓冲剂的质量浓度可选取10、15、20g/L或上述限定范围内的任一数值均落在本发明的保护范围之内；疏水颗粒的质量浓度可选取3、4、5、6、7、8、9、10、11、12、13、14、15g/L或上述限定范围内的任一数值均落在本发明的保护范围之内。
在一优选实施例中，所述主盐选自NiSO4·6H2O、NiCl2·6H2O、CuSO4·5H2O、CuCl2·2H2O、氨基磺酸钴、氯化钴和硫酸钴中的至少一种；
所述还原剂选自次磷酸钠、二甲基氨基硼烷、联氨、硼氢化钾和甲醛中的至少一种，优选次磷酸钠；
所述配位剂选自乙醇酸、柠檬酸、乳酸、苹果酸、丙酸、水杨酸、甘氨酸、琥珀酸、氨基醋酸、EDTA、酒石酸、乙二胺、氨、氰化钠和硫氢化钾中的至少一种，优选乙醇酸、柠檬酸、乳酸、苹果酸、丙酸、水杨酸、甘氨酸、琥珀酸、氨基醋酸和酒石酸中的至少一种；
所述缓冲剂选自单基羧酸型、二元羧酸型、羟基羧酸型、硼酸、碳酸和亚硫酸中的至少一种；
所述促进剂选自氨基乙酸、氨基丙酸、氨基丁酸和天冬氨酸中的至少一种。
在一优选实施例中，所述化学镀镀液的施镀时间为10-40min，所述疏水镀层的厚度为0.02-15μm。
在上述优选实施例中，疏水镀层的厚度可选取0.02、1.0、2.0、3.0、4.0、5.0、6.0、7.0、8.0、9.0、10.0、11.0、12.0、13.0、14.0、15.0μm或上述限定范围内的任一数值均落在本发明的保护范围之内；此外，将疏水镀层的厚度限定为0.02-15μm的原因是：考虑到如果镀层的厚度过高，会导致镀层制造成本的明显增加，性能增加不大但稳定性出现下降；而镀层厚度过低，则易导致镀层自清洁效果差等的问题。
本发明又提供了一种空调接水盘，包含上述根据任一实施例所述的疏水镀层，该疏水镀层的疏水效果佳，其水接触角约为117～132°，水滴滚动角约为10°～15°。
为了更清楚详细地介绍本发明实施例所提供的一种疏水镀层及包含该镀层的空调接水盘，下面将结合具体实施例进行描述。
实施例1
本实施例提供了一种疏水镀层，其制备方法具体为：
(1)基材预处理：
选用ABS塑料作为基材，使用高铬酐溶液粗化，在通过氯化亚锡40g/L和盐酸100ml/L的溶液敏化，使用氯化钯活化，再随后使用100ml/L盐酸溶液在45℃条件下处理30s解胶，制得具有可镀性的塑料基材；
(2)化学镀：
按照下述配方进行化学镀镀液的配制，具体配方为：
NiSO4·6H2O，20g/L、NaH2PO2·6H2O，35g/L、经阳离子表面活性剂处理的疏水二氧化硅(2μm)，5g/L、氨基乙酸，适量、乳酸，15ml/L、丙酸，10ml/L；
按照上述配方于90℃条件下进行化学镀镀液的配制，并调节pH至4.5；
在可镀性的塑料基材表面施镀所述化学镀镀液，固化干燥后，得到疏水镀层(疏水镀层的截面示意图如图1所示)。
·疏水测定结果：所得疏水镀层的水接触角可达123°，水滴滚动角为11°，且由于金属镀层提升了材料导电性能，进而提升了材料抗静电能力。
实施例2
本实施例提供了一种疏水镀层，其制备方法具体为：
(1)基材预处理：
选用ABS塑料作为基材，使用高铬酐溶液粗化，在通过氯化亚锡40g/L和盐酸100ml/L的溶液敏化，使用氯化钯活化，再随后使用50ml/L硫酸溶液在45℃条件下处理30s解胶，制得具有可镀性的塑料基材；
(2)化学镀：
按照下述配方进行化学镀镀液的配制，具体配方为：
NiSO4·6H2O，15g/L、NaH2PO2·6H2O，35g/L、经阳离子表面活性剂处理的硅酮粉(1μm)，4g/L、氨基乙酸，适量、乳酸，15ml/L、丙酸，10ml/L；
按照上述配方于90℃条件下进行化学镀镀液的配制，并调节pH至4.5；
在可镀性的塑料基材表面施镀所述化学镀镀液，固化干燥后，得到疏水镀层。
·疏水测定结果：所得疏水镀层的水接触角可达132°，水滴滚动角为10°，且由于金属镀层提升了材料导电性能，进而提升了材料抗静电能力。
实施例3
本实施例提供了一种疏水镀层，其制备方法具体为：
(1)基材预处理：
选用PBT塑料作为基材，使用高铬酐和浓硫酸溶液粗化，在通过氯化亚锡40g/L和盐酸100ml/L的溶液敏化，使用氯化钯活化，再随后使用100ml/L盐酸溶液在45℃条件下处理30s解胶，制得具有可镀性的塑料基材；
(2)化学镀：
按照下述配方进行化学镀镀液的配制，具体配方为：
CuSO4·5H2O，20g/L、NaH2PO2·6H2O，38g/L、经阳离子表面活性剂处理的疏水二氧化硅(2μm)，5g/L、氨基乙酸，适量、乳酸，15ml/L、丙酸，10ml/L；
按照上述配方于90℃条件下进行化学镀镀液的配制，并调节pH至4.5；
在可镀性的塑料基材表面施镀所述化学镀镀液，固化干燥后，得到疏水镀层。
·疏水测定结果：所得疏水镀层的水接触角可达117°，水滴滚动角为15°，且由于金属镀层提升了材料导电性能，进而提升了材料抗静电能力。
对比例1
本对比例提供了一种疏水镀层，其制备方法具体为：
(1)基材预处理：
选用PBT塑料作为基材，使用高铬酐和浓硫酸溶液粗化，在通过氯化亚锡40g/L和盐酸100ml/L的溶液敏化，使用氯化钯活化，再随后使用100ml/L盐酸溶液在45℃条件下处理30s解胶，制得具有可镀性的塑料基材；
(2)化学镀：
按照下述配方进行化学镀镀液的配制，具体配方为：
CuSO4·5H2O，20g/L、NaH2PO2·6H2O，38g/L、氨基乙酸，适量、乳酸，15ml/L、丙酸，10ml/L；
按照上述配方于90℃条件下进行化学镀镀液的配制，并调节pH至4.5；
在可镀性的塑料基材表面施镀所述化学镀镀液，固化干燥后，得到镀层。
·疏水测定结果：所得疏水镀层的水接触角可达82°，水滴滚动角为32°。
对比例2
本对比例提供了一种疏水镀层，其制备方法具体为：
(1)基材预处理：
选用ABS塑料作为基材，使用高铬酐溶液粗化，在通过氯化亚锡40g/L和盐酸100ml/L的溶液敏化，使用氯化钯活化，再随后使用100ml/L盐酸溶液在45℃条件下处理30s解胶，制得具有可镀性的塑料基材；
(2)化学镀：
按照下述配方进行化学镀镀液的配制，具体配方为：
NiSO4·6H2O，20g/L、NaH2PO2·6H2O，35g/L、氨基乙酸，适量、乳酸，15ml/L、丙酸，10ml/L；
按照上述配方于90℃条件下进行化学镀镀液的配制，并调节pH至4.5；
·疏水测定结果：在可镀性的塑料基材表面施镀所述化学镀镀液，固化干燥后，得到疏水镀层。所得疏水镀层的水接触角可达76°，水滴滚动角为34°。
对比例3
本对比例提供了一种疏水镀层，其制备方法具体为：
(1)基材预处理：
选用ABS塑料作为基材，使用高铬酐溶液粗化，在通过氯化亚锡40g/L和盐酸100ml/L的溶液敏化，使用氯化钯活化，再随后使用100ml/L盐酸溶液在45℃条件下处理30s解胶，制得具有可镀性的塑料基材；
(2)化学镀：
按照下述配方进行化学镀镀液的配制，具体配方为：
NiSO4·6H2O，20g/L、NaH2PO2·6H2O，35g/L、经阳离子表面活性剂处理的疏水二氧化硅(2μm)，1g/L、氨基乙酸，适量、乳酸，15ml/L、丙酸，10ml/L；
按照上述配方于90℃条件下进行化学镀镀液的配制，并调节pH至4.5；
在可镀性的塑料基材表面施镀所述化学镀镀液，固化干燥后，得到镀层。
·疏水测定结果：所得疏水镀层的水接触角可达77°，水滴滚动角为34°
对比例4
本对比例提供了一种疏水镀层，其制备方法具体为：
(1)基材预处理：
选用PBT塑料作为基材，使用高铬酐和浓硫酸溶液粗化，在通过氯化亚锡40g/L和盐酸100ml/L的溶液敏化，使用氯化钯活化，再随后使用100ml/L盐酸溶液在45℃条件下处理30s解胶，制得具有可镀性的塑料基材；
(2)化学镀：
按照下述配方进行化学镀镀液的配制，具体配方为：
CuSO4·5H2O，20g/L、NaH2PO2·6H2O，38g/L、经阳离子表面活性剂处理的疏水二氧化硅(2μm)，24g/L、氨基乙酸，适量、乳酸，15ml/L、丙酸，10ml/L；
按照上述配方于90℃条件下进行化学镀镀液的配制，并调节pH至4.5；
在可镀性的塑料基材表面施镀所述化学镀镀液，固化干燥后，得到镀层。
由于疏水颗粒添加量过高，得到的复合镀层附着性能差，易从基材表面剥离、脱落。
疏水性能测试
将上述实施例与对比例所得疏水镀层的性能测试结果进行统计，如下表所示：
表1实施例与对比例疏水镀层的疏水效果统计
由上述实施例与对比例所示的疏水性能测试结果可知，对比例1-2提供了一种未添加疏水颗粒的疏水镀层的制备方法，所得镀层的疏水效果差(水接触角分别为82°、76°，水滴滚动角分别为32°、34°)，对比例3-4提供了一种添加疏水颗粒的疏水镀层的制备方法(疏水颗粒含量分别为1g/L、24g/L)，所得镀层的疏水效果差；
而实施例1-4均提供了一种疏水镀层的制备方法，其中疏水颗粒等组分的添加量均在本发明所限定的保护范围之内，且所得镀层的疏水效果佳，其水接触角约为117～132°，水滴滚动角约为10°～15°。由此可见，利用本发明所提供的方法制得的疏水镀层具有良好的疏水性能，同时能够很好的应用在空调接水盘上，以实现自清洁的目的。
Claims (10)
1.一种疏水镀层，其特征在于，以质量百分比计，所述疏水镀层包括疏水颗粒1-30、纯金属或合金70-99。
2.根据权利要求1所述的疏水镀层，其特征在于，以质量百分比计，所述疏水镀层中疏水颗粒为5-10，所述疏水颗粒的粒径为0.1-10μm。
3.根据权利要求2所述的疏水镀层，其特征在于，所述疏水颗粒选自石墨、硅酮粉、疏水二氧化硅、聚四氟乙烯、氟化石墨和经阳离子表面活性剂处理的石墨、硅酮粉、疏水二氧化硅、聚四氟乙烯、氟化石墨中的至少一种，所述纯金属或合金选自Ni、Cu和Co中的至少一种；
所述阳离子表面活性剂选自胺盐型、季铵盐型、杂环型或啰盐型。
4.根据权利要求1-3中任一项所述的疏水镀层的制备方法，其特征在于，所述制备方法包括：基材预处理和化学镀，所述基材预处理包括基材粗化、基材敏化、胶体钯活化和解胶。
5.根据权利要求4所述的制备方法，其特征在于，所述化学镀步骤具体为：
以水为溶剂，利用主盐、还原剂、配位剂、缓冲剂和促进剂制得水溶液；
于40-100℃条件下，向所述水溶液中加入所述疏水颗粒、纯金属或合金，并调节pH至4-6，搅拌均匀后，制得化学镀镀液；
于经预处理后的塑料基材表面施镀所述化学镀镀液，固化干燥后，得到疏水镀层。
6.根据权利要求5所述的制备方法，其特征在于，所述水溶液中主盐的质量浓度为15-35g/L、还原剂的质量浓度为25-40g/L、配位剂的质量浓度为10-40g/L，缓冲剂的质量浓度为10-20g/L，促进剂的质量浓度＜1g/L，疏水颗粒的质量浓度为3-15g/L。
7.根据权利要求6所述的制备方法，其特征在于，所述主盐选自NiSO4·6H2O、NiCl2·6H2O、CuSO4·5H2O、CuCl2·2H2O、氨基磺酸钴、氯化钴和硫酸钴中的至少一种；
所述还原剂选自次磷酸钠、二甲基氨基硼烷、联氨、硼氢化钾和甲醛中的至少一种，优选次磷酸钠；
所述配位剂选自乙醇酸、柠檬酸、乳酸、苹果酸、丙酸、水杨酸、甘氨酸、琥珀酸、氨基醋酸、EDTA、酒石酸、乙二胺、氨、氰化钠和硫氢化钾中的至少一种，优选乙醇酸、柠檬酸、乳酸、苹果酸、丙酸、水杨酸、甘氨酸、琥珀酸、氨基醋酸和酒石酸中的至少一种；
所述缓冲剂选自单基羧酸型、二元羧酸型、羟基羧酸型、硼酸、碳酸和亚硫酸中的至少一种；
所述促进剂选自氨基乙酸、氨基丙酸、氨基丁酸和天冬氨酸中的至少一种。
8.根据权利要求6所述的制备方法，其特征在于，所述化学镀镀液的施镀时间为10-40min，所述疏水镀层的厚度为0.02-15μm。
9.根据权利要求7所述的制备方法，其特征在于，所述搅拌方式为机械搅拌、空气搅拌、平板泵搅拌或空气循环。
10.空调接水盘，其特征在于，包含上述根据权利要求1-3任一项所述的疏水镀层。
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