CN113399823B - Preparation device and preparation method of lens array mirror surface - Google Patents
Preparation device and preparation method of lens array mirror surface Download PDFInfo
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- CN113399823B CN113399823B CN202110591836.3A CN202110591836A CN113399823B CN 113399823 B CN113399823 B CN 113399823B CN 202110591836 A CN202110591836 A CN 202110591836A CN 113399823 B CN113399823 B CN 113399823B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/073—Shaping the laser spot
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/04—Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
- B23K26/046—Automatically focusing the laser beam
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
Abstract
The application discloses a preparation device and a preparation method of a lens array mirror surface, and belongs to the field of intelligent wearing manufacturing. The optical power regulation and control module of the device is arranged on an emergent light path of the ultrafast laser source and is used for finely regulating and controlling the power of ultrafast laser; the beam shaper module is arranged on an emergent light path of the optical power regulation and control module and is used for performing beam shaping on ultra-fast laser before focusing; the focusing module is arranged on an emergent light path of the beam shaper module and used for converging ultra-fast laser to generate a high depth-to-diameter ratio micro focal field and placing the micro focal field on a lens to be processed; the workbench of the moving module is used for fixing the lens to be processed and enabling the incidence direction of the ultra-fast laser to be at a preset angle with the normal line of the incidence surface of the lens to be processed, and the lens to be processed is positioned on the focal plane of the focusing module and moves according to the preset direction, so that the ultra-fast laser can directly write the array mirror surface on the lens to be processed. The method can simplify the processing of the array mirror surface, reduce the cost and achieve high yield.
Description
Technical Field
The application relates to the technical field of intelligent wearing manufacturing, in particular to a preparation device and a preparation method of a lens array mirror surface.
Background
With the rapid development of augmented reality technology (AR technology), more and more high-tech wearable products are coming into the public's field of view, such as AR glasses. The AR glasses are embedded in the geometric frame of the conventional glasses, and the picture of the micro-display is projected into the human eye through a series of optical imaging elements, and forms a virtual image in front of the field of view, and the virtual image and the real scene are integrated into a whole, so as to complement each other and achieve the function of 'enhancing' each other. Because AR glasses have great application potential in the fields of consumer electronics, aerospace, national defense, military, biomedical treatment and the like, technological enterprises and scientific research teams at home and abroad increasingly pay attention to the technical development related to AR glasses. In AR glasses, the light coupling-out module is used as a core component for optical image transmission, and plays an important role in projecting the picture terminal of the micro display screen. Therefore, the research and development of the processing technology of the component has important significance for large-scale mass production of the AR glasses.
At present, the traditional several optical coupling-out module processing schemes mainly comprise: prism solutions, off-axis solutions, freeform solutions, arrayed mirror waveguide solutions, grating waveguide solutions, and the like. The array mirror waveguide scheme based on the traditional geometrical optics design concept does not involve micro-nano structure processing, can ensure higher quality of color, contrast and the like in the image transmission process, and becomes a common scheme of an optical coupling-out module. However, the array mirror finishing process of the array mirror waveguide scheme is relatively complicated, and it is necessary to plate a spectroscopic film on each mirror surface. In order to ensure uniformity of the amount of light emitted over the entire angle of view, the spectral ratio of the thin film on each mirror surface also needs to be precisely adjusted in accordance with the order. For the transmission of polarized light signals, the number of coating layers on the array mirror surface is even up to tens of layers. This places extremely high demands on the plating process, the array mirror bonding process, etc., resulting in an increase in manufacturing costs. And the disqualification of one manufacturing link can generate iterative effect to influence the final imaging quality, so that the yield is low. Therefore, the current processing method of the array mirror surface is complex, high in cost and extremely low in yield.
Disclosure of Invention
According to the preparation device and the preparation method of the lens array mirror surface, the problems that an existing lens array mirror surface processing method is complex, high in cost and low in yield can be solved.
In a first aspect, an embodiment of the present invention provides a device for manufacturing a lens array mirror, including an ultrafast laser light source, an optical power adjustment module, a beam shaper module, a focusing module, and a moving module; the optical power regulation and control module is arranged on an emergent light path of the ultrafast laser source and used for finely regulating and controlling the power of ultrafast laser; the beam shaper module is arranged on an emergent light path of the optical power regulation and control module and is used for performing beam shaping on the ultrafast laser before focusing; the focusing module is arranged on an emergent light path of the beam shaper module and is used for converging ultra-fast laser to generate a high depth-to-diameter ratio micro focal field and placing the micro focal field on a lens to be processed; the workbench of the moving module is used for fixing the lens to be processed, and can be regulated and controlled, so that the incidence direction of the ultrafast laser is a preset angle with the normal of the incidence surface of the lens to be processed, the lens to be processed is positioned on the focal surface of the focusing module, the lens to be processed moves according to the preset direction, and the ultrafast laser can directly write the array mirror surface on the lens to be processed.
With reference to the first aspect, in one possible implementation manner, the ultrafast laser light source includes an oscillator and a femtosecond laser; the oscillator is electrically connected to the femtosecond laser and is used for providing an electric signal for the femtosecond laser so that the femtosecond laser emits ultrafast laser.
With reference to the first aspect, in one possible implementation manner, the optical power regulation module includes a half-wave plate and a polarizing plate that are disposed between the ultrafast laser light source and the beam shaper module; the half-wave plate is close to the ultrafast laser light source and can receive the ultrafast laser emitted by the ultrafast laser light source, and the polarizing plate is close to the beam shaper module and can emit the ultrafast laser.
With reference to the first aspect, in one possible implementation manner, the preparation device further includes an optical path opening and closing module; the light path opening and closing module is arranged on an emergent light path of the light power regulating and controlling module and is positioned between the light power regulating and controlling module and the beam shaper module.
With reference to the first aspect, in a possible implementation manner, the preparation device further includes a control module; the control module is electrically connected with the ultrafast laser light source, the beam shaper module, the moving module and the light path opening and closing module respectively, and the control module can control the working states of the ultrafast laser light source, the beam shaper module, the moving module and the light path opening and closing module.
With reference to the first aspect, in one possible implementation manner, the preparation device further includes a mirror, where the mirror is disposed between the beam shaper module and the focusing module, and is configured to reflect the ultrafast laser light and then enter the focusing module.
With reference to the first aspect, in one possible implementation manner, the mobile module includes a five-dimensional displacement platform; the workbench of the five-dimensional displacement platform is used for fixing the lens to be processed; when the X-axis moving assembly, the Y-axis moving assembly, the Z-axis moving assembly, the first rotating shaft and the second rotating shaft of the five-dimensional displacement platform are regulated and controlled, the fact that the incidence direction of the ultrafast laser is at a preset angle with the normal line of the incidence surface of the lens to be processed, the lens to be processed is located on the focal plane of the focusing module, and the lens to be processed moves according to the preset direction can be achieved.
With reference to the first aspect, in one possible implementation manner, a repetition frequency of the ultrafast laser emitted by the ultrafast laser light source is adjustable between 1HZ and 1 MHz.
With reference to the first aspect, in one possible implementation manner, the focusing module includes a focusing objective.
In a second aspect, an embodiment of the present invention provides a method for preparing an array mirror using a preparation apparatus for an array mirror of a lens as described above, including the steps of:
cleaning the lens to be processed, and fixing the lens to be processed on a workbench of the mobile module;
orthogonalizing the lens to be processed, and adjusting the moving module to enable the incidence direction of the ultrafast laser to be at a preset angle with the normal line of the incidence surface of the lens to be processed and the lens to be processed to be positioned on the focal surface of the focusing module;
turning on the ultrafast laser source;
and controlling the moving module to move the lens to be processed according to a preset direction, so that the ultra-fast laser can directly write the array mirror surface on the lens to be processed.
One or more technical solutions provided in the embodiments of the present invention at least have the following technical effects or advantages:
the embodiment of the invention provides a preparation device of a lens array mirror surface, wherein an optical power regulation and control module of the preparation device is arranged on an emergent light path of an ultrafast laser source and is used for finely regulating and controlling power of ultrafast laser. The beam shaper module is arranged on an emergent light path of the optical power regulation and control module and is used for carrying out beam shaping on ultra-fast laser before focusing. The focusing module is arranged on an emergent light path of the beam shaper module and used for converging ultra-fast laser to generate a high depth-to-diameter ratio micro focus field and placing the micro focus field on a lens to be processed. The workbench of the moving module is used for fixing the lens to be processed, and can be regulated and controlled to enable the incidence direction of the ultrafast laser to be at a preset angle with the normal line of the incidence surface of the lens to be processed, the lens to be processed is located on the focal plane of the focusing module, and the lens to be processed moves according to the preset direction, so that the ultrafast laser can directly write the array mirror surface on the lens to be processed. Compared with the preparation method of the array mirror surface of the lens in the prior art, the lens array mirror surface can be directly written into by the ultra-fast laser after regulation and control to the lens to be processed through adjusting the position of the lens to be processed, the lens array mirror surface can be processed simply by using the preparation device, the cost is reduced, and meanwhile, the yield is higher.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings that are needed in the embodiments of the present invention or the description of the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
Fig. 1 is a schematic structural diagram of a preparation apparatus for a lens array mirror provided in an embodiment of the present application;
FIG. 2 is a front view of a finished lens provided in an embodiment of the present application;
FIG. 3 is a perspective view of a finished lens provided in an embodiment of the present application;
FIG. 4 is a schematic structural diagram of the working principle of the arrayed mirror waveguide scheme according to the embodiment of the present application;
fig. 5 is a flowchart of a method for manufacturing a lens array mirror according to an embodiment of the present application.
Icon: 1-an optical path opening and closing module; 2-an ultrafast laser source; a 21-oscillator; 22-femtosecond laser; 3-an optical power regulation module; 31-half wave plate; 32-polarizer; a 4-beam shaper module; a 5-mirror; a 6-focusing module; 7-a lens to be processed; 71-mirror; beta-preset angle; 8-a mobile module; 81-X axis moving assembly; 82-Y axis movement assembly; 83-Z axis movement assembly; 84-a first rotation axis; 85-a second rotation axis; 86-working table; 9-a control module; 10-finished lens; 11-existing lenses; 111-existing mirror; 12-a micro display; 13-human eye.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and fully with reference to the accompanying drawings, in which it is evident that the embodiments described are some, but not all embodiments of the invention. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
In the description of the embodiments of the present invention, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," "outer," and the like indicate or are based on the orientation or positional relationship shown in the drawings, merely to facilitate description of the embodiments of the present invention and simplify description, and do not indicate or imply that the devices or elements referred to must have a specific orientation, be configured and operated in a specific orientation, and thus should not be construed as limiting the present invention. The terms "first," "second," and "second" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance. Furthermore, the terms "mounted," "connected," "coupled," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements. The specific meaning of the above terms in the embodiments of the present invention will be understood by those of ordinary skill in the art according to specific circumstances.
At present, the array mirror waveguide scheme based on the traditional geometric optical design concept does not relate to micro-nano structure processing, can ensure that colors, contrast and the like have higher quality in the image transmission process, and becomes a common scheme of an optical coupling-out module. The working principle of the arrayed mirror waveguide scheme is shown in fig. 4: light rays emitted by the micro display 12 are collimated by the eyepiece lens system, then are coupled into the waveguide mirror surface of the existing lens 11 by the waveguide reflecting surface, the light rays of each field propagate in the waveguide mirror surface according to the total reflection theorem, and when the light rays are incident on the semi-transparent and semi-transparent reverse surfaces, one part of the light rays are reflected out of the waveguide mirror surface, and the other part of the light rays continue to propagate in a transmission mode. This portion of the advancing light then encounters another waveguide mirror and the above-described "reflection-transmission" process is repeated until the last waveguide mirror in the waveguide array mirror reflects all of the remaining light out of the waveguide into human eye 13.
However, in the conventional array mirror waveguide scheme, the array mirror processing process of the conventional mirror 11 is relatively complicated, and fig. 4 also shows a schematic structural diagram of the conventional mirror 11, and the processing of the waveguide array mirror of the conventional mirror 11 requires that a plurality of conventional mirrors 111 are respectively coated with a light splitting film, and then one sides of the coated films are sequentially bonded to form the array mirror. In order to ensure uniformity of the amount of light emitted over the entire angle of view, the spectral ratio of the thin film on each of the existing mirrors 111 also needs to be precisely adjusted in accordance with the order. For the transmission of polarized light signals, the number of coating layers on the array mirror surface is even up to tens of layers. This places extremely high demands on the plating process, the array mirror bonding process, etc., resulting in an increase in manufacturing costs. And the disqualification of one manufacturing link can generate iterative effect to influence the final imaging quality, so that the yield is low. As is clear from this, the conventional processing method of the array mirror surface of the lens 11 is cumbersome, costly, and has extremely low yield.
Referring to fig. 1, an embodiment of the invention provides a device for preparing a lens array mirror, which includes an ultrafast laser source 2, an optical power adjusting module 3, a beam shaper module 4, a focusing module 6 and a moving module 8. The optical power regulating and controlling module 3 is arranged on the emergent light path of the ultrafast laser source 2 and is used for finely regulating and controlling the power of the ultrafast laser. The beam shaper module 4 is disposed on an outgoing optical path of the optical power adjusting module 3, and is configured to perform beam shaping on the ultrafast laser before focusing. The focusing module 6 is disposed on the outgoing light path of the beam shaper module 4, and is used for converging the ultrafast laser, generating a fine focal field with high depth-to-diameter ratio, and placing the fine focal field on the lens 7 to be processed. The workbench 86 of the moving module 8 is used for fixing the lens 7 to be processed, the workbench 86 can be regulated and controlled to enable the incidence direction of the ultrafast laser to be at a preset angle beta with the normal line of the incidence surface of the lens 7 to be processed, the lens 7 to be processed is located on the focal plane of the focusing module 6, and the lens 7 to be processed moves according to the preset direction, so that the ultrafast laser can directly write the array mirror 71 on the lens 7 to be processed. Compared with the preparation method of the array mirror surface of the lens in the prior art, the preparation device can simplify the processing of the lens array mirror surface 71, reduce the cost and have higher yield simultaneously by directing the ultra-fast laser after regulation to the lens 7 to be processed and adjusting the position of the lens 7 to be processed, and can directly write the array mirror surface 71 to the lens 7 to be processed.
The beam shaper module 4 is a lens most commonly used in diffractive optical elements, and is capable of converting a laser beam into a flat-top light spot with uniformly distributed energy, and the light spot can be in a positive direction, a circular shape or other shapes. The beam shaper module 4 in the embodiment of the present invention can receive the ultrafast laser and spatially light-shape the ultrafast laser, and specifically, the beam shaper module 4 can regulate the amplitude and phase of the ultrafast laser. The beam shaper module 4 and the focusing module 6 cooperate to generate a one-dimensional focused focal spot in the far field, i.e. a fine focal field with a high depth to diameter ratio with a focal depth of up to the order of millimeters. The embedded waveguide mirror 71 can be directly written by making the micro focus field incident on the lens 7 to be processed at a certain angle and a certain speed. The beam splitting ratio of the mirror 71 can be changed by changing the thickness of the mirror 71 by writing a plurality of times, or by changing the amount of change in the refractive index of the area of the mirror 71. The refractive index change amount and the thickness of the waveguide mirror surface 71, which are induced by the movement of the fine focal spot with high depth-to-diameter ratio in the lens, can be regulated and controlled by laser scanning times, scanning reading, power density and the like so as to meet the specific optical image transmission coupling output requirement. The beam shaper module 4 may be a passive device or an active device.
The wavelength of the ultrafast laser emitted by the ultrafast laser source 2 can be in a near infrared band or an ultraviolet visible band, and is specific to the material of the lens 7 to be processed. The material of the lens 7 to be processed may be glass, crystal or high molecular polymer. The geometry of the lens 7 to be processed may be planar, curved or free-form.
Referring to fig. 1, an ultrafast laser light source 2 is capable of emitting ultrafast laser light with adjustable pulse width, and the ultrafast laser light source 2 includes an Oscillator 21 (english: oscillator) and a femtosecond laser 22 (english: fs laser). The oscillator 21 is electrically connected to the femtosecond laser 22 for providing an electrical signal to the femtosecond laser 22 to cause the femtosecond laser 22 to emit ultra-fast laser light.
The oscillator 21 is an electronic device for generating a repetitive electronic signal, and is an energy conversion device capable of converting a direct current into an alternating current signal having a certain frequency, and is an active device.
Femtoseconds are a unit of time, 1 femtosecond being one hundred trillion of 1 second, i.e. 1X 10 -15 Seconds or 0.001 picoseconds, also known as femtoseconds. The resolution of the femtosecond laser 22 with respect to time can be as high as a femtosecond, which is a pulsed laser that uses a mode-locking technique to obtain short pulses on the order of femtoseconds, which refers to the pulse duration. The femtosecond laser is not monochromatic light, but a combination of light with a continuous change of a wavelength with a center wavelength of about 800nm, and the coherence of the light with the continuous wavelength in the range is utilized to obtain extremely large compression in time, so that the pulse output of the femtosecond level is realized. The oscillator 21 and the femtosecond laser 22 are used to emit the ultra-fast laser with the pulse width less than or equal to 10ps, and the quality of the ultra-fast laser is better.
With continued reference to fig. 1, the optical power conditioning module 3 includes a half-wave plate 31 and a polarizing plate 32 disposed between the ultrafast laser source 2 and the beam shaper module 4. The half wave plate 31 is close to the ultrafast laser light source 2 and is capable of receiving the ultrafast laser light emitted from the ultrafast laser light source 2, and the polarizing plate 32 is close to the beam shaper module 4 and is capable of emitting the ultrafast laser light.
Among them, the half wave plate 31 is also called a half wave plate, and when normally incident light passes through, the phase difference between ordinary light (o light) and extraordinary light (e light) is equal to pi or an odd multiple thereof, so that a birefringent crystal having a certain thickness is called a half wave plate 31. In the case shown by elliptical polarized light, when normally incident light is transmitted, the phase difference between ordinary (o) and extraordinary (e) light is pi or an odd multiple thereof, the resultant light emerging from the crystal plate is still plane polarized light, but the plane of vibration of the emerging light is rotated by an angle of 2 theta relative to the plane of vibration of the incident light, which is the angle of vibration of the incident light with respect to the optical axis on the crystal surface, that is, when a certain plane polarized light passes through the half wave plate 31, the emerging light is still plane polarized light, except that the plane of vibration of the polarized light is rotated by an angle of 2 theta, and the magnitude of this rotation angle depends only on the angle of theta between the plane of vibration of the incident light and the crystal light axis. Since the linearly polarized light is vertically incident to the half-wave plate 31, the transmitted light is still linearly polarized light, and if the included angle between the vibration plane and the main cross section of the crystal is θ during incidence, the vibration plane of the projected linearly polarized light is rotated by 2θ from the original orientation, so that the half-wave plate 31 can rotate the polarized light.
Polarization refers to the vibration vector of a transverse wave, i.e., a phenomenon in which the direction of propagation of a wave is biased in some direction, and longitudinal waves are not polarized. The asymmetry of the direction of vibration with respect to the direction of propagation is called polarization and is one of the most obvious signs of transverse waves as opposed to other longitudinal waves. The phenomenon in which the spatial distribution of the electric vector vibration of the light waves loses symmetry with respect to the propagation direction of the light is called polarization of the light. The polarizing plate 32 is an optical element that can change natural light into polarized light. The polarizing plate 32 has a function of shielding and transmitting incident light, and transmits either longitudinal light or transverse light, and shields the same. The polarizer 32 is typically a composite material formed by laminating a polarizing film, an inner protective film, a pressure-sensitive adhesive layer, and an outer protective layer.
The optical power regulation and control module 3 provided by the embodiment of the invention comprises the half-wave plate 31 and the polaroid 32, can be matched with the polaroid 32 to realize the regulation and control of optical power by rotating the half-wave plate 31 by an angle, is extremely convenient to operate, and the half-wave plate 31 and the polaroid 32 are easy to obtain in materials, so that the production cost of the whole preparation device can be reduced.
As shown in fig. 1, the preparation apparatus provided in the embodiment of the present invention further includes an optical path opening and closing module 1. The light path opening and closing module 1 is arranged on an emergent light path of the light power regulating and controlling module 3 and is positioned between the light power regulating and controlling module 3 and the beam shaper module 4. The light path opening and closing module 1 can conveniently regulate and control whether the beam shaper module 4 inputs laser or not. In practical applications, the optical path opening and closing module 1 may use an optical shutter. On the one hand, the optical shutter may provide millisecond-level shutter operation, in particular, the optical shutter is in a closed position when operated, and is opened when the external controller applies the pulse control signal; as long as the control voltage of the optical shutter remains high, the optical shutter remains open, and the optical shutter is closed immediately once the voltage drops to a low level. On the other hand, the optical shutter can control the frequency of opening and closing thereof, so that the regulation of whether the laser enters the beam shaper module 4 is more accurate.
With continued reference to fig. 1, the preparation apparatus provided in the embodiment of the present invention further includes a control module 9. The control module 9 is electrically connected with the ultrafast laser light source 2, the beam shaper module 4, the moving module 8 and the optical path opening and closing module 1 respectively, and the control module 9 can control the working states of the ultrafast laser light source 2, the beam shaper module 4, the moving module 8 and the optical path opening and closing module 1. Through regulation and control module 9, can control ultrafast laser source 2, beam shaper module 4, movable module 8 and light path switching module 1 simultaneously, make preparation facilities automatic, it is more convenient to use, has improved work efficiency, has saved the manpower. As shown in fig. 1, the control module 9 may be a computer or other device, and when the computer is electrically connected to the optical path opening/closing module 1, the optical path can be cut off and communicated by controlling the optical path opening/closing module 1 through the computer.
The preparation device provided by the embodiment of the invention further comprises the reflecting mirror 5, wherein the reflecting mirror 5 is arranged between the beam shaper module 4 and the focusing module 6 and is used for reflecting the ultrafast laser and then entering the focusing module 6, so that the light path direction of the ultrafast laser is turned and then is injected into the focusing module 6, the focusing effect is better, the placement of the movable module 8 is facilitated, and the space of the area where the preparation device is placed can be more reasonably utilized. Specifically, as shown in fig. 1, the included angle between the normal line of the reflecting surface of the reflecting mirror 5 and the incident angle of the ultrafast laser is 45 °, so that the installation of the reflecting mirror 5 is facilitated, and the space of the area where the preparation device is placed can be further reasonably utilized.
With continued reference to fig. 1, the mobile module 8 provided by the embodiment of the present invention includes a five-dimensional displacement platform. Wherein the five-dimensional displacement platform comprises an X-axis moving assembly 81, a Y-axis moving assembly 82, a Z-axis moving assembly 83, a first rotating shaft 84 (namely a theta rotating shaft) and a second rotating shaft 85%
A rotation axis). The workbench 86 of the five-dimensional displacement platform is used for fixing the lens 7 to be processed. When the X-axis moving component 81, the Y-axis moving component 82, the Z-axis moving component 83, the first rotating shaft 84 and the second rotating shaft 85 of the five-dimensional displacement platform are regulated, the incident direction of the ultrafast laser can be at a preset angle beta with the normal line of the incident surface of the lens 7 to be processed, the lens 7 to be processed is positioned on the focal plane of the focusing module 6, and the lens 7 to be processed moves according to the preset direction.
As shown in fig. 1, the adjusting and controlling X-axis moving assembly 81 can realize the front-back movement of the workbench 86, the adjusting and controlling Y-axis moving assembly 82 can realize the left-right movement of the workbench 86, the adjusting and controlling Z-axis moving assembly 83 can realize the up-down movement of the workbench 86, and the adjusting and controlling first rotating shaft 84 and the second rotating shaft 85 can realize the horizontal rotation and the left-right front-back overturning of the workbench 86. An actual adjusting and controlling process is illustrated, when the lens is required to write directly to the array mirror 71, the lens is fixed on the workbench 86 of the five-dimensional displacement platform, then the first rotation shaft 84 and the second rotation shaft 85 are adjusted to enable the incident direction of the ultrafast laser to be a preset angle beta with the normal line of the incident surface of the lens 7 to be processed, the Z-axis moving assembly 83 is adjusted to enable the lens 7 to be processed to be located on the focal plane of the focusing module 6, the ultrafast laser source 2 and the optical path opening and closing module 1 are opened, the adjusted ultrafast laser is directed to the lens, the X-axis moving assembly 81 is adjusted to enable the workbench 86 to move back and forth, and the ultrafast laser is directly written to the mirror 71 on the lens. When the direct writing of one mirror 71 is completed, the optical path opening and closing module 1 is closed, the Y-axis moving component 82 is regulated to enable the workbench 86 to move leftwards to a preset position, the optical path opening and closing module 1 is opened, the ultrafast laser beam is regulated to direct towards the next direct writing point, the X-axis moving component 81 is regulated to continuously enable the workbench 86 to move forwards and backwards, the ultrafast laser beam is enabled to directly write out the next mirror 71 on the lens, and the working mode is analogized until the array mirror 71 is directly written out on the lens.
Alternatively, the repetition frequency of the ultrafast laser emitted by the ultrafast laser source 2 is adjustable between 1HZ and 1 MHz. Where the repetition frequency refers to the number of trigger pulses generated per second, which is the inverse of the pulse repetition interval, which is the time interval between one pulse and the next. The repetition frequency of the ultrafast laser is adjustable between 1HZ and 1MHz, so that the preparation device can be adjusted according to the ultrafast laser required by practice when in actual use, and the preparation device provided by the embodiment of the invention has wider application range and is more convenient.
In practice, the focusing module 6 comprises a focusing objective. The adoption of the focusing objective lens has better focusing effect, so that the quality of the array mirror surface 71 obtained after direct writing of the lens is better.
As shown in fig. 5, the embodiment of the present invention further provides a method for preparing an array mirror by using the preparation device for a lens array mirror, which includes steps S501 to S504, and the specific implementation process is as follows.
S501: the lens 7 to be processed is cleaned and the lens 7 to be processed is fixed on the workbench 86 of the mobile module 8.
Specifically, when the moving module 8 is a five-axis displacement platform, the lens 7 to be processed is fixed on a workbench 86 of the five-axis displacement platform, and the workbench 86 is disposed on the second rotating shaft 85.
S502: orthogonalizing correction is carried out on the lens 7 to be processed, and the moving module 8 is adjusted so that the incidence direction of the ultrafast laser and the normal line of the incidence surface of the lens 7 to be processed form a preset angle beta, and the lens 7 to be processed is positioned on the focal surface of the focusing module 6.
Specifically, when the focusing module 6 is a focusing objective lens, after orthogonalizing the lens 7 to be processed, the second rotation axis 85 is adjusted, so that the focal spot generated by the focusing objective lens converges on the point to be processed of the lens 7 to be processed at the preset angle β.
S503: the ultrafast laser source 2 is turned on. At this time, the ultrafast laser light source 2 generates an ultrashort pulse laser light.
After the ultrafast laser light source 2 is turned on, the half wave plate 31 and the polarizing plate 32 are adjusted according to actual requirements to obtain the required proper ultrashort pulse laser energy.
When the control module 9 is a computer, the computer is operated to control the femtosecond laser 22 so as to generate the required ultra-short pulse laser with proper pulse width. The working mode of the beam shaper module 4 is checked through computer debugging so as to meet the required beam shaping requirement, and finally the beam shaper module is matched with a focusing objective lens to generate a high depth-to-diameter ratio micro laser focal field.
S504: the moving module 8 is controlled to move the lens 7 to be processed in a preset direction, so that the ultra-fast laser can write the array mirror 71 on the lens 7 to be processed.
Specifically, by cooperatively controlling the five-axis displacement platform and the optical path opening and closing module 1 through a computer, when the X-axis moving assembly 81 moves at a proper speed, the ultra-fast laser can directly write out the embedded waveguide mirror 71 inside the lens.
Changing the coordinates of the Y-axis moving assembly 82 and continuing to move the X-axis moving assembly 81 at a suitable speed, the selective processing of the embedded waveguide array mirror 71 is achieved.
In the preparation of the actual array mirror 71, the thickness of the waveguide array mirror 71 and the refractive index change of the area can be changed by adjusting and controlling the laser parameters, the movement speed and the writing times, so that the adjustment and control of the beam splitting ratio of the waveguide mirror 71 can be realized.
As in fig. 2, which shows a front view of the finished lens 10 with the array mirror 71 finished, fig. 3 shows a perspective view of the finished lens 10 with the array mirror 71 finished.
Compared with the preparation method of the array mirror surface 71 of the lens in the prior art, the preparation method of the array mirror surface 71 of the lens can lead the lens array mirror surface 71 to be processed to be simplified by directing the regulated and controlled ultrafast laser to the lens 7 to be processed and adjusting the position of the lens 7 to be processed, thereby greatly reducing the cost and simultaneously having higher yield.
The preparation device and the preparation method provided by the invention are simple and easy to implement, the focal field orientation is regulated and controlled in the whole transparent lens by combining the high depth-to-diameter ratio micro focal field produced by laser space-time shaping in a nonlinear laser energy deposition mode, and the focal position is moved, so that the change of the refractive index of a local material is induced, the waveguide array mirror 71 can be directly inscribed in the transparent lens, the selective processing of the array mirror 71 in the lens and the regulation and control of the characteristics of the mirror 71 are realized, and the series of complicated processes of cutting, polishing, coating, bonding and the like which are unavoidable in the traditional process are omitted, so that the defects of complex process, low yield, poor mechanical strength and the like in the processing of the traditional array waveguide mirror 71 are thoroughly solved.
The preparation device and the preparation method provided by the embodiment of the invention have the advantages of high processing efficiency, high precision and flexible process. Specifically, the preparation method provided by the invention only needs one minute to process ten waveguide array mirrors 71, so that the processing time is greatly shortened. The writing of the waveguide array mirror 71 has a selective function, and only needs to be controlled by a computer to move the position of the workbench 86 where the lens 7 to be processed is placed. The angle of the waveguide mirror 71 can be adjusted by controlling the second rotation shaft 85 by a computer. The angular error of the waveguide array mirror 71 can be controlled to be less than 0.01 °. The preparation device and the preparation method provided by the embodiment of the invention have multiple repair and debugging functions, and particularly, the preparation device and the preparation method can be realized by secondary repair means such as increasing the writing times and expanding the thickness of the reflecting surface for the condition that the reflectivity of the partial waveguide mirror surface 71 is insufficient. In addition, the preparation device and the preparation method provided by the embodiment of the invention have wide application range, specifically, the nonlinear energy deposition is used for inducing the waveguide mirror surface 71, and the preparation device and the preparation method are almost applicable to lenses made of all materials based on an ultrafast laser direct writing mode, so that the selection range of the lens materials is greatly expanded. Finally, the mechanical strength of the array mirror 71 of the lens manufactured by the manufacturing device and the manufacturing method provided by the embodiment of the invention is high, and particularly, because the embodiment of the invention is based on the embedded processing mode of the ultrafast laser 1 direct writing, the traditional adhesive bonding process is abandoned, so that the materials of the array mirror 71 and the lens body are the same, and the mechanical strength of the whole lens and the array mirror 71 is high.
The following provides a process for preparing an array mirror 71 of a planar fused silica lens: the beam shaper module 4 shapes the femtosecond pulse beam with the center wavelength of 1030nm and the repetition frequency of 10kHz and Gaussian distribution, namely the ultrafast laser into Bessel beams, and the ultrafast laser focused into a fine focal spot by the focusing objective lens is focused and projected into the lens. The second rotation axis 85 is regulated to change the included angle between the micro focus field and the lens surface, i.e. the preset angle beta, and the X-axis moving component 81 and the Y-axis moving component 82 of the five-dimensional displacement platform are controlled, so that the embedded array waveguide mirror 71 with the preset angle can be directly written in the lens. Regulating and controlling the laser irradiation power density to 10 13 W/cm 2 The thickness of the mirror 71 and the refractive index change at the mirror 71 can be controlled by adopting a mode of scanning the laser focus for multiple times and variable speed scanning.
In this specification, each embodiment is described in a progressive manner, and the same or similar parts of each embodiment are referred to each other, and each embodiment is mainly described as a difference from other embodiments.
The above embodiments are only for illustrating the technical solution of the present application, and not for limiting the present application; although the present application has been described in detail with reference to the foregoing embodiments, it should be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some or all of the technical features thereof can be replaced with equivalents; such modifications and substitutions do not depart from the spirit of the corresponding technical solutions.
Claims (10)
1. The preparation device of the lens array mirror surface is characterized by comprising an ultrafast laser light source, an optical power regulation and control module, a beam shaper module, a focusing module and a moving module;
the optical power regulation and control module is arranged on an emergent light path of the ultrafast laser source and used for finely regulating and controlling the power of ultrafast laser;
the beam shaper module is arranged on an emergent light path of the optical power regulation and control module and is used for regulating and controlling the amplitude or the phase of the ultrafast laser before focusing so as to realize beam shaping;
the focusing module is arranged on an emergent light path of the beam shaper module and is used for converging ultra-fast laser, generating a high depth-to-diameter ratio micro focal field with focal depth of up to millimeter magnitude, and placing the micro focal field on a lens to be processed;
the workbench of the moving module is used for fixing the lens to be processed, the workbench can be regulated and controlled, so that the incident direction of the ultrafast laser and the normal of the incident surface of the lens to be processed are in a preset angle beta, the lens to be processed is positioned on the focal plane of the focusing module, and the lens to be processed moves according to the preset direction, so that a focal spot generated by the focusing objective lens is converged on a point to be processed of the lens to be processed at the preset angle beta, the beam splitting ratio of the mirror surface can be realized by changing the refractive index variation amplitude of the mirror surface area, and the ultrafast laser can directly write an array mirror surface with the refractive index variation on the lens to be processed.
2. The manufacturing apparatus of claim 1, wherein the ultrafast laser light source comprises an oscillator and a femtosecond laser;
the oscillator is electrically connected to the femtosecond laser and is used for providing an electric signal for the femtosecond laser so that the femtosecond laser emits ultrafast laser.
3. The manufacturing apparatus of claim 1, wherein the optical power conditioning module comprises a half-wave plate and a polarizing plate disposed between the ultrafast laser light source and the beam shaper module;
the half-wave plate is close to the ultrafast laser light source and can receive the ultrafast laser emitted by the ultrafast laser light source, and the polarizing plate is close to the beam shaper module and can emit the ultrafast laser.
4. The manufacturing apparatus according to claim 1, further comprising an optical path opening and closing module;
the light path opening and closing module is arranged on an emergent light path of the light power regulating and controlling module and is positioned between the light power regulating and controlling module and the beam shaper module.
5. The manufacturing apparatus of claim 4, further comprising a control module;
the control module is electrically connected with the ultrafast laser light source, the beam shaper module, the moving module and the light path opening and closing module respectively, and the control module can control the working states of the ultrafast laser light source, the beam shaper module, the moving module and the light path opening and closing module.
6. The apparatus of claim 1, further comprising a mirror disposed between the beam shaper module and the focusing module for reflecting the ultrafast laser light before entering the focusing module.
7. The manufacturing apparatus of claim 1, wherein the mobile module comprises a five-dimensional displacement platform;
the workbench of the five-dimensional displacement platform is used for fixing the lens to be processed;
when the X-axis moving assembly, the Y-axis moving assembly, the Z-axis moving assembly, the first rotating shaft and the second rotating shaft of the five-dimensional displacement platform are regulated and controlled, the fact that the incidence direction of the ultrafast laser is at a preset angle with the normal line of the incidence surface of the lens to be processed, the lens to be processed is located on the focal plane of the focusing module, and the lens to be processed moves according to the preset direction can be achieved.
8. The apparatus of claim 1, wherein the repetition rate of the ultrafast laser emitted by the ultrafast laser source is adjustable between 1HZ and 1 MHz.
9. The manufacturing apparatus of claim 1 wherein the focusing module comprises a focusing objective.
10. A method for preparing an array mirror surface using the apparatus for preparing an array mirror surface of a lens according to any one of claims 1 to 9, comprising the steps of:
cleaning the lens to be processed, and fixing the lens to be processed on a workbench of the mobile module;
orthogonalizing the lens to be processed, and adjusting the moving module to enable the incidence direction of the ultrafast laser to be at a preset angle with the normal line of the incidence surface of the lens to be processed and the lens to be processed to be positioned on the focal surface of the focusing module;
turning on the ultrafast laser source;
and controlling the moving module to move the lens to be processed according to a preset direction, so that the ultra-fast laser can directly write the array mirror surface on the lens to be processed.
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