CN111922512B - Industrialized Bessel pulse laser system and manufacturing method thereof - Google Patents

Industrialized Bessel pulse laser system and manufacturing method thereof Download PDF

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CN111922512B
CN111922512B CN202010537913.2A CN202010537913A CN111922512B CN 111922512 B CN111922512 B CN 111922512B CN 202010537913 A CN202010537913 A CN 202010537913A CN 111922512 B CN111922512 B CN 111922512B
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laser
output
bessel
laser beam
pulse laser
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CN111922512A (en
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李东娟
杨直
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Hangzhou Aochuang Photonics Technology Co ltd
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Hangzhou Aochuang Photonics Technology Co ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0622Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
    • B23K26/0624Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1ns or less
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/04Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
    • B23K26/046Automatically focusing the laser beam
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/0643Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising mirrors
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/70Auxiliary operations or equipment
    • B23K26/702Auxiliary equipment

Abstract

The invention provides an industrialized Bessel pulse laser system, which comprises: the system comprises a femtosecond laser, a laser beam expanding unit, a control device, a laser transmission unit, a writing unit, an observation unit and a computer. The Bessel pulse laser system comprises an ultrashort pulse laser and a Bessel output terminal. According to the invention, the quartz block is etched by the femtosecond laser, the miniature axicon is used as a part of an industrialized Bessel beam ultrashort pulse laser system and is glued to a conventional all-fiber ultrashort pulse laser, and finally output of the Bessel beam ultrashort pulse laser is realized, so that the method is applied to processing and new application development in an industrialized environment. Meanwhile, the invention also provides a manufacturing method of the industrialized Bessel pulse laser system.

Description

Industrialized Bessel pulse laser system and manufacturing method thereof
Technical Field
The invention relates to the technical field of optical fiber laser processing, in particular to an industrialized Bessel pulse laser system and a manufacturing method thereof.
Background
The bessel beam is a field of electromagnetic and acoustic attractive radiation of which the amplitude is described by a first class of bessel functions, is a non-diffraction beam, and cannot be diffracted and diffused when being transmitted, so that a plurality of optical devices are required to be applied to the bessel beam, the existing method for generating the bessel beam is limited in the space field, extremely strict on the environment requirement, and the whole system is very expensive.
Disclosure of Invention
Therefore, the invention provides an industrialized Bessel pulse laser system and a manufacturing method thereof, and aims to solve the problem that the laser system in the prior art cannot generate an ultrashort pulse Bessel beam in an industrialized environment.
In order to achieve the above purpose, the invention provides the following technical scheme:
the invention provides an industrialized Bessel pulse laser system, comprising:
a writing axicon system. It includes:
a femtosecond laser having a laser output end capable of outputting femtosecond laser pulses. And
a laser beam expands the unit, and it has a beam input end and a beam output end, and the laser beam expands the unit and passes through the light path with femto second laser instrument and correspond the setting, and the beam input end can receive the femto second laser pulse of laser output, and the laser beam expands the unit and can expand the laser beam, and the beam output end can output the laser beam after expanding. And
the control device is provided with a control input end and a control output end, the control device and the laser beam expanding unit are arranged correspondingly through a light path, the control input end can receive the laser beams output by the beam output end, the control device can adjust the power of the laser beams, and the control output end can output the laser beams after the power is adjusted. And
and the laser transmission unit and the laser beam expanding unit are arranged correspondingly through a light path, and the laser transmission unit can reflect the laser beams output by the beam output end and then focus the laser beams.
And the engraving unit comprises a quartz block and a displacement platform, the quartz block is arranged on the displacement platform, the engraving unit and the laser transmission unit are correspondingly arranged through a light path, and the quartz block can be engraved into the axicon by the laser beam of the laser transmission unit. And
and the observation unit comprises a light source and a charge coupled device, the charge coupled device is provided with a first input end and a first output end, the light source and the writing unit are arranged correspondingly through a light path, the charge coupled device and the writing unit are arranged correspondingly through the light path, the light source can emit an observation light beam, the observation light beam flows through the writing unit through the light path, the first input end can receive the observation light beam, and the first output end can output the observation light beam received by the first input end. And
and the computer is provided with a controller, the controller is provided with a plurality of second input ends and a plurality of second output ends, the second input ends are electrically or wirelessly connected with the charge coupling elements, and the second output ends are electrically or wirelessly connected with the control device.
A bessel pulsed laser system comprising:
an ultrashort pulse laser having a pulse output capable of outputting ultrashort pulse laser.
The Bessel output end comprises an axicon and a collimator, the axicon is fixedly connected with the collimator and is made by engraving an axicon system, the collimator is provided with a third input end and a third output end, the third input end can receive the ultrashort pulse laser output by the pulse output end, the third input end of the collimator is connected with the ultrashort pulse laser through an optical fiber, the collimator can convert the ultrashort pulse laser entering the collimator into collimated pulse laser, the third output end can output the collimated pulse laser converted into collimated pulse laser through the collimator, the collimated pulse laser at the output end of the third output end flows into the axicon, and the axicon can provide the longest non-diffraction distance for the collimated pulse laser.
On the basis of the technical scheme, the invention can be further improved as follows:
furthermore, the writing axicon system also comprises an electro-optical shutter, and the electro-optical shutter is arranged on a light path between the laser beam expanding unit and the control device.
Further, the electro-optical shutter is electrically or wirelessly connected to the second output terminal.
The second input terminal can receive the writing result information output by the first output terminal of the charge coupled device.
Furthermore, the displacement platform is provided with a displacement input end, the displacement output end is in electrical or wireless connection with a second output end of the computer, the computer controller can control displacement of the displacement platform, the second output end can output displacement information sent by the controller, and the displacement input end can receive the displacement information output by the second output end.
Furthermore, the center of the displacement platform is provided with a through hole, and the through hole is convenient for observing the light circulation condition.
Furthermore, the laser transmission unit comprises a first reflector and an objective lens, the first reflector and the objective lens are arranged correspondingly through an optical path, the first reflector is connected with the control device through the optical path, and the objective lens is connected with the quartz block through the optical path.
Furthermore, the writing axicon system also comprises a power tester, the power tester and the laser transmission unit are correspondingly arranged through a light path, the power tester is provided with a power input end and a power output end, the power input end can receive the intensity of the laser beam in the writing unit, the power output end can output the intensity of the laser beam received by the power input end, and the second input end of the controller can receive the intensity of the laser beam output by the power output end.
Further, the observation unit further includes a second reflecting mirror disposed in the optical path between the light source and the charge-coupled device, the second reflecting mirror being disposed in correspondence with the writing unit.
A method for manufacturing an industrial Bessel pulsed laser system, comprising: s1, S2, S3, S4, S5, S6, S7, and S8.
S1: and turning on the femtosecond laser, and outputting femtosecond laser pulses by the femtosecond laser. The femtosecond laser and the laser beam expanding unit are connected through a light path, femtosecond laser pulses output by the femtosecond laser enter the laser beam expanding unit through the light path, and the femtosecond laser pulses complete beam expansion in the laser beam expanding unit.
S2: the laser beam expanding unit is connected with the electro-optical shutter through a light path, and the expanded laser beam enters the electro-optical shutter through the light path. The electro-optical shutter is connected to a computer which is capable of controlling the electro-optical shutter for opening and closing of the machining instructions. The control device is connected with the electro-optical shutter through a light path, and provides a precise and controllable laser power value for the system.
S3: the first reflecting mirror is connected with the control device through a light path, the reflectivity of the first reflecting mirror to the laser beam is 99%, and the transmission angle of the laser beam passing through the first reflecting mirror can be changed. The first reflector is connected with the objective lens through a light path, the first reflector can reflect the laser beam subjected to beam expanding power adjustment to the objective lens, and the objective lens can focus the laser beam.
And S4, connecting the first objective lens with the writing unit through an optical path, wherein the writing unit comprises a quartz block and a displacement platform, the quartz block is arranged on the displacement platform, and the focused laser beam emitted by the objective lens writes the quartz block arranged on the displacement platform.
S5: the second reflector and the displacement platform are arranged through a light path, the light source and the displacement platform are arranged through the light path, the light source emits observation light beams, the observation light beams enter the second reflector through the light path, and the second reflector reflects the entering observation light beams to the displacement platform.
And S6, arranging the charge coupling element and the second reflecting mirror through an optical path, and reflecting the observation light beam into the charge coupling element through the second reflecting mirror. And connecting a power tester with the first reflecting mirror through an optical path, wherein the power tester can receive the intensity of the laser beam in the writing unit.
S7: the computer is connected to the control device, the charge-coupled device, the displacement platform, the power tester and the electro-optical shutter. The computer can receive the information sent by the power tester and the charge-coupled element, and the computer can output the information to control the electro-optical shutter, the control device and the displacement platform.
S8: the ultra-short pulse laser and the collimator are connected through an optical fiber, the axicon is fixedly connected with the collimator, the third input end of the collimator is connected with the ultra-short pulse laser through the optical fiber, the collimator can convert the ultra-short pulse laser entering the collimator into the collimated pulse laser, and the axicon can provide the longest non-diffraction distance for the collimated pulse laser.
The invention has the following advantages:
according to the industrial Bessel pulse laser system, the femtosecond laser is used for writing the quartz block, so that the quartz block forms a micro axicon with a bottom angle smaller than 0.3 degrees and a refractive index close to 1, the micro axicon is used as one part of the industrial Bessel beam ultrashort pulse laser system and is glued to a conventional all-fiber ultrashort pulse laser, and finally output of the Bessel beam ultrashort pulse laser is realized.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the description of the embodiments are briefly introduced below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on the drawings without creative efforts.
Fig. 1 is a schematic overall flow chart of an embodiment of the present invention.
Fig. 2 is a schematic overall structure diagram of the embodiment of the present invention.
Fig. 3 is a flowchart of the overall structure of the bessel pulsed laser system according to the embodiment of the present invention.
Description of the reference symbols
The device comprises a femtosecond laser 1, a laser beam expanding unit 2, a laser transmission unit 3, a first reflector 31, an objective lens 32, a writing unit 4, a quartz block 41, a displacement platform 42, an observation unit 5, a light source 51, a second reflector 52, a charge-coupled device 53, a computer 6, an electro-optical shutter 61, a power tester 62, a control device 63, an ultra-short pulse laser 7, a Bessel output end 8, an axicon 81 and a collimator 82.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
As shown in fig. 1, the present invention provides an industrial bessel pulse laser system and a method for manufacturing the same, wherein a femtosecond laser 1, a laser beam expanding unit 2, a laser transmission unit 3, a writing unit 4, an observation unit 5, a computer 6, an electro-optical shutter 61 and a control device 63 are arranged on one operation table.
As shown in fig. 1, the present invention provides an industrial bessel pulse laser system, the type of the femtosecond laser 1 includes but is not limited to PHAROS 20W version Base Unit (20W), the femtosecond laser 1 has a laser output end, and the laser output end can output femtosecond laser pulses. For outputting femtosecond laser pulses by the femtosecond laser 1.
As shown in fig. 1, the present invention provides an industrial bessel pulse laser system, wherein the laser beam expanding unit 2 includes two beam expanding mirrors, the types of the two beam expanding mirrors include but are not limited to BEST-10.6-2Z, and the two beam expanding mirrors have a beam input end and a beam output end, the laser beam expanding unit 2 and the femtosecond laser 1 are arranged corresponding to each other through a light path, the beam input end can receive femtosecond laser pulses output by the laser output end, the laser beam expanding unit 2 can expand laser beams, and the beam output end can output expanded laser beams. Used for expanding the femtosecond laser through the beam expander.
As shown in fig. 1, the present invention provides an industrial bessel pulse laser system, wherein the type of the control device 63 includes, but is not limited to, LK3, which has a control input end and a control output end, the control device 63 is disposed corresponding to the laser beam expanding unit 2 through the optical path, the control input end can receive the laser beam output by the beam output end, the control device 63 can perform power adjustment on the laser beam, and the control output end can output the laser beam after power adjustment. For power adjustment of the laser beam by the control device 63.
As shown in FIG. 1, the present invention provides an industrial Bessel pulsed laser system, the type of the first mirror 31 includes, but is not limited to, LLM0050-45-850-915, and the first mirror 31 is optically connected to the control device 63. The reflectivity of the first reflecting mirror 31 to the femtosecond laser light is 99%, and the transmissivity of 1% to reflect the laser beam passing through the first reflecting mirror 31 by the first reflecting mirror 31.
As shown in FIG. 1, the present invention provides an industrial Bessel pulsed laser system, the type of the objective lens 32 includes but is not limited to CXW-5X, the first reflector 31 is arranged corresponding to the objective lens 32 through the optical path, and the objective lens 32 is connected with the quartz block 41 through the optical path. The objective lens 32 focuses the laser beam. For focusing the passing laser beam by the objective lens 32.
As shown in fig. 1, the present invention provides an industrial bessel pulse laser system, wherein the writing unit 4 includes a quartz block 41 and a displacement platform 42, the quartz block 41 is disposed on the displacement platform 42, the writing unit 4 is disposed corresponding to the laser transmission unit 3 through an optical path, and a laser beam passing through the laser transmission unit 3 can write the quartz block 41 into an axicon 81. For manipulating the position of the quartz block 41 by the displacement table 42, the quartz block 41 is inscribed into the axicon 81 by the laser beam.
As shown in fig. 1, the present invention provides an industrial bessel pulse laser system, wherein the displacement platform 42 has a displacement input end, the displacement output end is electrically or wirelessly connected with the second output end of the computer 6, the controller of the computer 6 can control the displacement of the displacement platform 42, the second output end can output the displacement information sent by the controller, and the displacement input end can receive the displacement information output by the second output end. The center of the displacement platform 42 is provided with a through hole for conveniently observing the light circulation condition through the through hole.
As shown in fig. 1-2, the present invention provides an industrial bessel pulse laser system, wherein the power tester 62 is disposed corresponding to the laser transmission unit 3 through an optical path, the power tester 62 has a power input terminal and a power output terminal, the power input terminal can receive the intensity of the laser beam in the writing unit 4, the power output terminal can output the intensity of the laser beam received by the power input terminal, and a second input terminal of the controller can receive the intensity of the laser beam output by the power output terminal. For real-time monitoring of the beam intensity variations in the writing system by the power tester 62 and feeding back to the computer 6.
As shown in fig. 1, the present invention provides an industrial bessel pulse laser system, wherein the observation unit 5 comprises a light source 51 and a charge coupled device 53, the charge coupled device 53 has a first input end and a first output end, the light source 51 is arranged corresponding to the writing unit 4 through an optical path, the charge coupled device 53 is arranged corresponding to the writing unit 4 through an optical path, the light source 51 can emit an observation beam, the observation beam flows through the writing unit 4 through the optical path, the first input end can receive the observation beam, and the first output end can output the observation beam received by the first input end. For observing the real-time inscription result of the quartz block 41 by the observation unit 5 and making corresponding adjustments.
As shown in fig. 1, the present invention provides an industrial bessel pulse laser system, wherein the observation unit 5 further comprises a second reflecting mirror 52, the second reflecting mirror 52 is disposed in the optical path between the light source 51 and the charge coupled device 53, and the second reflecting mirror 52 is disposed corresponding to the writing unit 4. For reflecting the viewing beam to the translation stage 42 via the second mirror 52.
As shown in fig. 1, the present invention provides an industrial bessel pulse laser system, the model of the electro-optical shutter 61 includes but is not limited to AR-11, the electro-optical shutter 61 is arranged on the optical path between the laser beam expanding unit 2 and the control device 63. The electro-optical shutter 61 is electrically or wirelessly connected to the second output terminal. The second input terminal is capable of receiving the writing result information outputted from the first output terminal of the charge coupled device 53. To control the switching of the entire system by means of an electro-optical shutter 61.
As shown in fig. 1, the present invention provides an industrial bessel pulsed laser system, the computer 6, which has a controller having a plurality of second input terminals and a plurality of second output terminals, the second input terminals are electrically or wirelessly connected with the charge coupled device 53, and the second output terminals are electrically or wirelessly connected with the control device 63. To receive information via computer 6 and to control displacement stage 42 and electro-optic shutter 61 to make appropriate adjustments based on the information received from power tester 62 and charge-coupled device 53.
The concrete theoretical basis is as follows:
first, it is known from the bessel beam transmission theory that the base angle γ of the axicon 81 is a very important parameter, which determines the maximum diffraction-free distance of the bessel beam, and the refractive index n of the axicon 81 is another important parameter affecting the maximum diffraction-free distance.
Figure BDA0002537696090000071
Wherein R refers to the beam radius of the incident beam, theta refers to the convergence angle of the emergent Bessel beam after passing through the axicon 81,
θ=(n-1)γ (2)
secondly, after the femtosecond laser pulse is accurately attenuated and enters the microscope objective lens 32 by the damage threshold energy of the quartz glass, the size of a focus can be focused to lambda/2, the refractive index of the quartz glass etched by the femtosecond laser changes relative to the part not etched, and the increment is 10-3 orders of magnitude.
Thirdly, according to the geometric trigonometric relation and the structural characteristics of the axicon 81, the height h of the micro axicon 81 is as follows:
Figure BDA0002537696090000081
for a given laser wavelength λ, the number of layers N to be written can be calculated
Figure BDA0002537696090000082
And the length L of each layer will be a variable value:
Figure BDA0002537696090000083
as shown in FIG. 1, the present invention provides an industrial Bessel pulsed laser system, in the present invention, the number of layers to be inscribed is about 9 layers by calculation with a relatively common green wavelength of 515nm, the length of each layer to be inscribed in a quartz material is calculated, and a axicon 81 structure inscribed in a quartz sample is finally obtained by strictly and precisely controlling.
As shown in fig. 1, the present invention provides an industrial bessel pulse laser system, and the ultrashort pulse laser 7 is of a type including but not limited to LS-2136LP, and has a pulse output end capable of outputting ultrashort pulse laser. For outputting pulsed laser light by means of an ultrashort pulsed laser 7.
As shown in fig. 3, the present invention provides an industrial bessel pulse laser system, wherein the bessel output end 8 includes an axicon 81 and a collimator 82, the type of the collimator 82 includes, but is not limited to, 50-630, the axicon 81 is fixedly connected to the collimator 82, the axicon 81 is made by engraving the axicon 81, the collimator 82 has a third input end and a third output end, the third input end can receive the ultrashort pulse laser output by the pulse output end, and the third input end of the collimator 82 is connected to the ultrashort pulse laser 7 through an optical fiber.
As shown in fig. 3, the invention provides an industrial bessel pulse laser system, the collimator 82 can convert the ultrashort pulse laser entering the collimator 82 into a collimated pulse laser, the third output end can output the collimated pulse laser converted into a collimated pulse laser by the collimator 82, the collimated pulse laser at the output end of the third output end flows into the axicon 81, and the axicon 81 can provide the longest non-diffraction distance for the collimated pulse laser. To convert the laser pulses into a bessel beam by axicon 81.
As shown in fig. 1, the present invention provides an industrial bessel pulse laser system, wherein the displacement platform 42 has a displacement input end, the displacement output end is electrically or wirelessly connected with the second output end of the computer 6, the controller of the computer 6 can control the displacement of the displacement platform 42, the second output end can output the displacement information sent by the controller, and the displacement input end can receive the displacement information output by the second output end. The center of displacement platform 42 is equipped with the through-hole, and the circulation condition of light is conveniently observed to the through-hole.
As shown in fig. 1, the present invention provides an industrial bessel pulse laser system, wherein the writing axicon 81 system further includes a power tester 62, the power tester 62 is disposed corresponding to the laser transmission unit 3 through an optical path, the power tester 62 has a power input end and a power output end, the power input end can receive the intensity of the laser beam in the writing unit 4, the power output end can output the intensity of the laser beam received by the power input end, and a second input end of the controller can receive the intensity of the laser beam output by the power output end.
As shown in fig. 1, the present invention provides an industrial bessel pulse laser system, wherein the observation unit 5 further comprises a second reflecting mirror 52, the second reflecting mirror 52 is disposed in the optical path between the light source 51 and the charge coupled device 53, and the second reflecting mirror 52 is disposed corresponding to the writing unit 4.
As shown in fig. 1 to 3, the present invention provides an industrial bessel pulse laser system and a method for manufacturing the industrial bessel pulse laser system, including: s1, S2, S3, S4, S5, S6, S7, and S8.
S1: the femtosecond laser 1 is turned on, and the femtosecond laser 1 outputs femtosecond laser pulses. The femtosecond laser 1 is connected with the laser beam expanding unit 2 through a light path, femtosecond laser pulses output by the femtosecond laser 1 enter the laser beam expanding unit 2 through the light path, and the femtosecond laser pulses complete beam expansion in the laser beam expanding unit 2.
S2: the laser beam expanding unit 2 is connected with the electro-optical shutter 61 through an optical path, and the expanded laser beam enters the electro-optical shutter 61 through the optical path. The electro-optical shutter 61 is connected to the computer 6, and the computer 6 can control the electro-optical shutter 61 for switching of the machining instruction. The control device 63 is optically connected to the electro-optical shutter 61, and the control device 63 provides a precisely controllable laser power value to the system.
S3: the first reflecting mirror 31 is optically connected to the control device 63, the reflectivity of the first reflecting mirror 31 to the laser beam is 99%, and the transmission angle of the laser beam passing through the first reflecting mirror 31 is changed. The first reflector 31 is connected to the objective lens 32 through an optical path, the first reflector 31 can reflect the laser beam adjusted by the expanded beam power to the objective lens 32, and the objective lens 32 can focus the laser beam.
And S4, connecting the first objective lens 32 with the writing unit 4 through an optical path, wherein the writing unit 4 comprises a quartz block 41 and a displacement platform 42, the quartz block 41 is arranged on the displacement platform 42, and the focused laser beam emitted by the objective lens 32 writes the quartz block 41 arranged on the displacement platform 42.
S5: the second reflecting mirror 52 is arranged with the displacement platform 42 through an optical path, the light source 51 emits an observation light beam, the observation light beam enters the second reflecting mirror 52 through the optical path, and the second reflecting mirror 52 reflects the entering observation light beam to the displacement platform 42.
S6, the ccd 53 and the second reflecting mirror 52 are optically disposed, and the observation beam is reflected by the second reflecting mirror 52 and enters the ccd 53. The power tester 62 is optically connected to the first reflecting mirror 31, and the power tester 62 can receive the intensity of the laser beam in the writing unit 4.
S7: the computer 6 is connected to a control device 63, a charge-coupled element 53, a displacement stage 42, a power tester 62 and an electro-optical shutter 61. The computer 6 can receive the information sent by the power tester 62 and the charge-coupled device 53, and the computer 6 can output the information to control the electro-optical shutter 61, the control device 63 and the displacement platform 42.
S8: the ultrashort pulse laser 7 is connected with the collimator 82 through an optical fiber, the axicon 81 is fixedly connected with the collimator 82, the third input end of the collimator 82 is connected with the ultrashort pulse laser 7 through the optical fiber, the collimator 82 can convert ultrashort pulse laser entering the collimator 82 into collimated pulse laser, and the axicon 81 can provide the longest non-diffraction distance for the collimated pulse laser.
The industrial Bessel pulsed laser system is used as follows:
during the use, operating personnel opens femtosecond pulse laser 1, and femtosecond laser pulse is output to femtosecond laser 1, and laser pulse passes through electro-optic shutter 61 by computer 6 control after expanding the beam through laser beam expanding unit 2, and controlling means 63 provides accurate controllable laser power value for entire system, and first speculum 31 will pass through laser beam reflection behind laser beam expanding unit 2 to objective lens 32, and objective lens 32 will pass through the laser beam focusing.
The focused laser beam writes the quartz block 41 on the displacement platform 42, the light source 51 can be used as an observation light source 51, the laser emitted by the light source 51 is reflected by the second reflector 52 and passes through the displacement platform 42, so that the charge-coupled device 53 can observe the real-time writing result of the quartz block 41 and make corresponding adjustment according to the real-time writing result, the power tester 62 can measure the intensity change of the light beam in the writing system in real time and feed back the light beam to the computer 6, the computer 6 can send an instruction to the electro-optical shutter 61 according to the received information, and the computer 6 can control the movement of the displacement platform 42.
The ultrashort pulse laser 7 is connected with the collimator 82 through an optical fiber, the axicon 81 is fixedly connected with the collimator 82, the third input end of the collimator 82 is connected with the ultrashort pulse laser 7 through the optical fiber, the collimator 82 can convert ultrashort pulse laser entering the collimator 82 into collimated pulse laser, and the axicon 81 can provide the longest non-diffraction distance for the collimated pulse laser.
Finally, it should be noted that: the above examples are only for illustrating the technical solutions of the present invention, and are not limited thereto. Although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: modifications of the technical solutions described in the embodiments or equivalent replacements of some technical features may still be made. And such modifications or substitutions do not depart from the spirit and scope of the corresponding technical solutions of the embodiments of the present invention.

Claims (9)

1. An industrial bessel pulsed laser system, comprising:
a system of inscribed axicons; it includes:
a femtosecond laser having a laser output end capable of outputting femtosecond laser pulses; and
the laser beam expanding unit is provided with a beam input end and a beam output end, the laser beam expanding unit and the femtosecond laser are arranged correspondingly through an optical path, the beam input end can receive femtosecond laser pulses output by the laser output end, the laser beam expanding unit can expand a laser beam, and the beam output end can output the expanded laser beam; and
the control device is provided with a control input end and a control output end, the control device and the laser beam expanding unit are arranged correspondingly through an optical path, the control input end can receive the laser beams output by the beam output end, the control device can adjust the power of the laser beams, and the control output end can output the laser beams after power adjustment; and
the laser transmission unit is arranged corresponding to the laser beam expanding unit through a light path and can reflect the laser beam output by the beam output end and then focus the laser beam;
the quartz block is arranged on the displacement platform, the writing unit and the laser transmission unit are arranged correspondingly through a light path, and the quartz block can be written into an axicon by a laser beam of the laser transmission unit; forming the quartz block into an axicon with a base angle of less than 0.3 DEG and a refractive index close to 1; and
an observation unit, including a light source and a charge-coupled device, the charge-coupled device having a first input end and a first output end, the light source and the writing unit being arranged corresponding to each other via an optical path, the charge-coupled device and the writing unit being arranged corresponding to each other via an optical path, the light source being capable of emitting an observation beam, the observation beam flowing through the writing unit via the optical path, the first input end being capable of receiving the observation beam, the first output end being capable of outputting the observation beam received by the first input end; and
a computer having a controller, said controller having a plurality of second inputs and a plurality of second outputs, said second inputs being electrically or wirelessly connected to said charge-coupled devices, said second outputs being electrically or wirelessly connected to said control device;
a bessel pulsed laser system comprising:
an ultrashort pulse laser having a pulse output end capable of outputting ultrashort pulse laser light;
the Bessel output end comprises an axicon and a collimator, the axicon is fixedly connected with the collimator, the axicon is formed by manufacturing the engraving axicon system, the collimator is provided with a third input end and a third output end, the third input end can receive ultrashort pulse laser output by the pulse output end, the third input end of the collimator is connected with the ultrashort pulse laser through an optical fiber, the collimator can convert the ultrashort pulse laser entering the collimator into collimated pulse laser, the third output end can output the collimated pulse laser converted into collimated pulse laser through the collimator, the collimated pulse laser at the output end of the third output end flows into the axicon, and the axicon can provide the longest non-diffraction distance for the collimated pulse laser.
2. The industrial bessel pulsed laser system as claimed in claim 1, wherein the inscribing axicon system further comprises an electro-optical shutter, and the electro-optical shutter is disposed in an optical path between the laser beam expanding unit and the control device.
3. The industrialized bessel pulsed laser system as claimed in claim 2, characterized in that the electro-optical shutter is electrically or wirelessly connected to the second output;
the second input terminal can receive the writing result information output by the first output terminal of the charge coupled device.
4. The industrial bessel pulse laser system as claimed in claim 1, wherein the displacement platform has a displacement input terminal, the displacement input terminal is electrically or wirelessly connected with a second output terminal of the computer, the controller of the computer can control the displacement of the displacement platform, the second output terminal can output displacement information sent by the controller, and the displacement input terminal can receive the displacement information output by the second output terminal.
5. The industrial bessel pulse laser system as claimed in claim 4, wherein a through hole is provided at the center of the displacement platform, and the through hole facilitates observation of light circulation.
6. The industrial bessel pulse laser system as claimed in claim 1, wherein the laser transmission unit includes a first reflecting mirror and an objective lens, the first reflecting mirror is disposed corresponding to the objective lens through an optical path, the first reflecting mirror is connected to the control device through an optical path, and the objective lens is connected to the quartz block through an optical path.
7. The industrialized bessel pulsed laser system as claimed in claim 1, wherein the inscription axicon system further comprises a power tester disposed in optical communication with the laser delivery unit, the power tester having a power input and a power output, the power input being capable of receiving the laser beam intensity from the inscription unit, the power output being capable of outputting the laser beam intensity received at the power input, and a second input of the controller being capable of receiving the laser beam intensity output at the power output.
8. The industrial bessel pulsed laser system as claimed in claim 1, wherein the observation unit further comprises a second mirror disposed in the optical path between the light source and the charge-coupled device, the second mirror being disposed in correspondence with the writing unit.
9. The method of manufacturing an industrial bessel pulsed laser system as claimed in any one of claims 1 to 8, characterized by comprising the steps of: s1, S2, S3, S4, S5, S6, S7, and S8;
s1: turning on the femtosecond laser, and outputting femtosecond laser pulses by the femtosecond laser; connecting a femtosecond laser with a laser beam expanding unit through a light path, wherein femtosecond laser pulses output by the femtosecond laser enter the laser beam expanding unit through the light path, and the femtosecond laser pulses finish beam expansion in the laser beam expanding unit;
s2: connecting the laser beam expanding unit with the electro-optical shutter through a light path, and enabling the expanded laser beam to enter the electro-optical shutter through the light path; the electro-optical shutter is connected with a computer, and the computer can control the electro-optical shutter to be used for switching a processing instruction; connecting a control device with an electro-optical shutter through a light path, wherein the control device provides a precise and controllable laser power value for the system;
s3: the first reflector is connected with the control device through a light path, the reflectivity of the first reflector to the laser beam is 99%, and the transmission angle of the laser beam passing through the first reflector can be changed; the first reflector is connected with the objective lens through a light path, the first reflector can reflect the laser beam subjected to beam expanding power adjustment to the objective lens, and the objective lens can focus the laser beam;
s4, connecting the first objective lens with the writing unit through the light path, wherein the writing unit comprises a quartz block and a displacement platform, the quartz block is arranged on the displacement platform, and the focused laser beam emitted by the objective lens writes the quartz block arranged on the displacement platform;
s5: arranging a second reflector and the displacement platform through an optical path, arranging a light source and the displacement platform through the optical path, wherein the light source emits an observation light beam, the observation light beam enters the second reflector through the optical path, and the second reflector reflects the entering observation light beam to the displacement platform;
s6, arranging the charge coupling element and the second reflector through an optical path, and enabling the observation light beam to enter the charge coupling element after being reflected by the second reflector; connecting a power tester with the first reflector through a light path, wherein the power tester can receive the intensity of the laser beam in the writing unit;
s7: connecting a computer with a control device, a charge coupling element, a displacement platform, a power tester and an electro-optical shutter; the computer can receive the information sent by the power tester and the charge-coupled element, and can output the information to control the electro-optical shutter, the control device and the displacement platform;
s8: the ultra-short pulse laser and the collimator are connected through an optical fiber, the axicon is fixedly connected with the collimator, the third input end of the collimator is connected with the ultra-short pulse laser through the optical fiber, the collimator can convert the ultra-short pulse laser entering the collimator into the collimated pulse laser, and the axicon can provide the longest diffraction-free distance for the collimated pulse laser.
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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1365500A (en) * 1999-07-29 2002-08-21 康宁股份有限公司 Direct writing of optical device in silica-based glass using femtosecond pulse lasers
JP2009082958A (en) * 2007-09-28 2009-04-23 Sunx Ltd Laser beam machining apparatus and axicon lens
KR20170019855A (en) * 2015-08-13 2017-02-22 한국기계연구원 Multi-Angle Axicon Lens for Increased Laser Processing Efficiency of Bessel Beam
CN108422111A (en) * 2018-05-02 2018-08-21 中国科学院上海光学精密机械研究所 The processing unit (plant) and processing method of big depth structure are carried out inside transparent material using femtosecond laser
CN108723586A (en) * 2018-06-14 2018-11-02 清华大学 A kind of polymer microchannel processing method based on space-time shaping femtosecond laser
CN110227884A (en) * 2019-05-08 2019-09-13 桂林电子科技大学 Water Jet Guided Laser system of processing and method based on salt free ligands light path design
CN110640338A (en) * 2019-08-21 2020-01-03 江苏大学 Composite pulse laser deep hole processing device based on Bessel light beam

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1365500A (en) * 1999-07-29 2002-08-21 康宁股份有限公司 Direct writing of optical device in silica-based glass using femtosecond pulse lasers
JP2009082958A (en) * 2007-09-28 2009-04-23 Sunx Ltd Laser beam machining apparatus and axicon lens
KR20170019855A (en) * 2015-08-13 2017-02-22 한국기계연구원 Multi-Angle Axicon Lens for Increased Laser Processing Efficiency of Bessel Beam
CN108422111A (en) * 2018-05-02 2018-08-21 中国科学院上海光学精密机械研究所 The processing unit (plant) and processing method of big depth structure are carried out inside transparent material using femtosecond laser
CN108723586A (en) * 2018-06-14 2018-11-02 清华大学 A kind of polymer microchannel processing method based on space-time shaping femtosecond laser
CN110227884A (en) * 2019-05-08 2019-09-13 桂林电子科技大学 Water Jet Guided Laser system of processing and method based on salt free ligands light path design
CN110640338A (en) * 2019-08-21 2020-01-03 江苏大学 Composite pulse laser deep hole processing device based on Bessel light beam

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