CN113399823A - Preparation device and preparation method of lens array mirror surface - Google Patents

Preparation device and preparation method of lens array mirror surface Download PDF

Info

Publication number
CN113399823A
CN113399823A CN202110591836.3A CN202110591836A CN113399823A CN 113399823 A CN113399823 A CN 113399823A CN 202110591836 A CN202110591836 A CN 202110591836A CN 113399823 A CN113399823 A CN 113399823A
Authority
CN
China
Prior art keywords
module
lens
ultrafast laser
processed
focusing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN202110591836.3A
Other languages
Chinese (zh)
Other versions
CN113399823B (en
Inventor
张国栋
程光华
王江
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Northwestern Polytechnical University
Original Assignee
Northwestern Polytechnical University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Northwestern Polytechnical University filed Critical Northwestern Polytechnical University
Priority to CN202110591836.3A priority Critical patent/CN113399823B/en
Publication of CN113399823A publication Critical patent/CN113399823A/en
Application granted granted Critical
Publication of CN113399823B publication Critical patent/CN113399823B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/073Shaping the laser spot
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/04Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
    • B23K26/046Automatically focusing the laser beam
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Laser Beam Processing (AREA)

Abstract

The application discloses a preparation device and a preparation method of a lens array mirror surface, and belongs to the field of intelligent wearing and manufacturing. The optical power regulating module of the device is arranged on an emergent light path of the ultrafast laser light source and is used for finely regulating and controlling the power of ultrafast laser; the beam shaper module is arranged on an emergent light path of the optical power regulating and controlling module and is used for carrying out beam shaping on the ultrafast laser before focusing; the focusing module is arranged on an emergent light path of the beam shaper module and used for converging ultrafast laser to generate a high depth-diameter ratio micro-fine focal field and placing the micro-fine focal field on a lens to be processed; the worktable of the moving module fixes the lens to be processed and enables the ultrafast laser incidence direction and the normal line of the incidence surface of the lens to be processed to be at a preset angle, the lens to be processed is positioned on the focal plane of the focusing module and moves according to the preset direction, and then the ultrafast laser can directly write the array mirror surface on the lens to be processed. The method and the device can simplify the processing of the array mirror surface, reduce the cost and have high yield.

Description

Preparation device and preparation method of lens array mirror surface
Technical Field
The application relates to the technical field of intelligent wearing and manufacturing, in particular to a device and a method for manufacturing a lens array mirror surface.
Background
With the rapid development of augmented reality technology (AR technology), more and more high-tech wearable products are walking into the field of vision of the public, such as AR glasses. The AR glasses are so-called AR glasses, that is, a near-eye display system is embedded in a geometric frame of conventional glasses, and a picture of a microdisplay is projected into human eyes through a series of optical imaging elements, and a virtual image is formed in front of a visual field, so that the AR glasses and a real scene are integrated, and the AR glasses complement each other and mutually enhance each other. Since the AR glasses have great application potential in the fields of consumer electronics, aerospace, national defense and military, biomedical and the like, scientific and technological enterprises and research teams at home and abroad increasingly pay more attention to the research and development of technologies related to the AR glasses. In AR glasses, the optical coupling-out module serves as a core component for optical image transmission, and plays an important role in projecting a micro display screen terminal. Therefore, the development of the processing technology of the part has important significance for the large-scale mass production of the AR glasses.
At present, several conventional optical coupling-out module processing schemes mainly include: prism schemes, off-axis schemes, free-form surface schemes, array mirror waveguide schemes, and grating waveguide schemes, etc. The array mirror waveguide scheme based on the traditional geometric optical design concept has the advantages that the manufacturing process does not involve the processing of micro-nano structures, the high quality of color, contrast and the like in the image transmission process can be guaranteed, and the scheme becomes a common scheme of an optical coupling output module. However, the array mirror processing process flow of the array mirror waveguide scheme is relatively complicated, and light splitting films need to be plated on the mirror surfaces respectively. In order to ensure the uniformity of the light output quantity in the whole field angle, the light splitting ratio of the film on each mirror surface needs to be accurately adjusted according to the sequence. For the transmission of polarized light signals, the number of coating layers on the array mirror surface is even dozens of layers. This puts extremely high demands on the plating process, the array mirror bonding process, and the like, resulting in an increase in manufacturing cost. And the unqualified product in one manufacturing link can generate an iterative effect, influence the final imaging quality and cause low yield. Therefore, the processing method of the array mirror surface is complex, high in cost and extremely low in yield.
Disclosure of Invention
The embodiment of the application provides a device and a method for manufacturing a lens array mirror surface, and can solve the problems of complex processing method, high cost and low yield of the existing lens array mirror surface.
In a first aspect, an embodiment of the present invention provides a device for manufacturing a mirror surface of a lens array, including an ultrafast laser light source, an optical power adjusting and controlling module, a beam shaper module, a focusing module, and a moving module; the optical power regulating and controlling module is arranged on an emergent light path of the ultrafast laser light source and is used for finely regulating and controlling the power of ultrafast laser; the beam shaper module is arranged on an emergent light path of the optical power regulating and controlling module and is used for carrying out beam shaping on the ultrafast laser before focusing; the focusing module is arranged on an emergent light path of the beam shaper module and is used for converging ultrafast laser to generate a high depth-diameter ratio micro-fine focal field and placing the micro-fine focal field on a lens to be processed; the workbench of the moving module is used for fixing the lens to be processed, and can be regulated and controlled, so that the incidence direction of the ultrafast laser and the normal of the incidence surface of the lens to be processed form a preset angle, the lens to be processed is positioned on the focal plane of the focusing module, the lens to be processed moves according to the preset direction, and the ultrafast laser can directly write the array mirror surface on the lens to be processed.
With reference to the first aspect, in one possible implementation manner, the ultrafast laser light source includes an oscillator and a femtosecond laser; the oscillator is electrically connected to the femtosecond laser and used for providing an electric signal to the femtosecond laser so as to enable the femtosecond laser to emit ultrafast laser.
With reference to the first aspect, in one possible implementation manner, the optical power adjusting module includes a half-wave plate and a polarizer, which are disposed between the ultrafast laser light source and the beam shaper module; the half-wave plate is close to the ultrafast laser light source and can receive the ultrafast laser emitted by the ultrafast laser light source, and the polaroid is close to the beam shaper module and can emit the ultrafast laser.
With reference to the first aspect, in a possible implementation manner, the manufacturing apparatus further includes an optical path opening and closing module; the light path opening and closing module is arranged on an emergent light path of the optical power regulating and controlling module and is positioned between the optical power regulating and controlling module and the beam shaper module.
With reference to the first aspect, in one possible implementation manner, the preparation apparatus further includes a control module; the control module is electrically connected with the ultrafast laser light source, the beam shaper module, the moving module and the light path opening and closing module respectively, and can control the working states of the ultrafast laser light source, the beam shaper module, the moving module and the light path opening and closing module.
With reference to the first aspect, in a possible implementation manner, the manufacturing apparatus further includes a mirror, which is disposed between the beam shaper module and the focusing module, and is configured to reflect the ultrafast laser light to enter the focusing module.
With reference to the first aspect, in one possible implementation manner, the moving module includes a five-dimensional displacement platform; the workbench of the five-dimensional displacement platform is used for fixing the lens to be processed; when the X-axis moving assembly, the Y-axis moving assembly, the Z-axis moving assembly, the first rotating shaft and the second rotating shaft of the five-dimensional displacement platform are regulated and controlled, the condition that the incident direction of the ultrafast laser and the normal of the incident surface of the lens to be processed are at a preset angle, the lens to be processed is located on the focal plane of the focusing module, and the lens to be processed moves according to the preset direction can be realized.
With reference to the first aspect, in a possible implementation manner, the repetition frequency of the ultrafast laser emitted by the ultrafast laser light source is adjustable between 1HZ and 1 MHz.
With reference to the first aspect, in one possible implementation manner, the focusing module includes a focusing objective lens.
In a second aspect, embodiments of the present invention provide a method for preparing an array mirror surface by using the apparatus for preparing a lens array mirror surface as described above, including the following steps:
cleaning the lens to be processed, and fixing the lens to be processed on a workbench of the mobile module;
performing orthogonal correction on the lens to be processed, and adjusting the moving module to enable the incident direction of the ultrafast laser and the normal of the incident surface of the lens to be processed to form a preset angle, wherein the lens to be processed is positioned on the focal plane of the focusing module;
turning on the ultrafast laser light source;
and controlling the moving module to enable the lens to be processed to move according to a preset direction, so that the ultrafast laser can directly write the array mirror surface on the lens to be processed.
One or more technical solutions provided in the embodiments of the present invention have at least the following technical effects or advantages:
the embodiment of the invention provides a device for preparing a lens array mirror surface, wherein an optical power regulation and control module of the device is arranged on an emergent light path of an ultrafast laser light source and is used for finely regulating and controlling the power of ultrafast laser. The beam shaper module is arranged on an emergent light path of the optical power regulating and controlling module and is used for carrying out beam shaping on the ultrafast laser before focusing. The focusing module is arranged on an emergent light path of the beam shaper module and used for converging ultrafast laser to generate a high depth-diameter ratio micro-fine focal field and placing the micro-fine focal field on a lens to be processed. The workstation of removal module is used for fixed treating the processing lens, and the workstation can be regulated and control to the incident direction that makes ultrafast laser and the normal line of the incident surface of treating the processing lens are preset angle, treat that the processing lens is located the focal plane of focus module, and treat that the processing lens moves according to presetting the direction, and then make ultrafast laser can directly write the array mirror surface on treating the processing lens. Compared with the preparation method of the array mirror surface of the lens in the prior art, the ultrafast laser after regulation and control is emitted to the lens to be processed, the position of the lens to be processed is adjusted, the array mirror surface can be directly written on the lens to be processed, the preparation device can simplify the processing of the lens array mirror surface, the cost is reduced, and meanwhile, the yield is high.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed to be used in the description of the embodiments of the present invention or the prior art will be briefly introduced below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.
Fig. 1 is a schematic structural diagram of an apparatus for manufacturing a mirror surface of a lens array according to an embodiment of the present disclosure;
FIG. 2 is a front view of a finished lens provided by an embodiment of the present application;
fig. 3 is a perspective view of a finished lens provided in an embodiment of the present application;
FIG. 4 is a schematic structural diagram of an operating principle of an arrayed mirror waveguide scheme according to an embodiment of the present disclosure;
fig. 5 is a flowchart of a method for manufacturing a mirror surface of a lens array according to an embodiment of the present disclosure.
Icon: 1-an optical path opening and closing module; 2-ultrafast laser light source; 21-an oscillator; 22-femtosecond laser; 3-an optical power regulating module; 31-a half-wave plate; 32-polarizer; 4-a beam shaper module; 5-a reflector; 6-a focusing module; 7-a lens to be processed; 71-mirror surface; beta-a preset angle; 8-a mobile module; 81-X axis moving assembly; 82-Y axis moving assembly; 83-Z axis moving component; 84-a first axis of rotation; 85-a second axis of rotation; 86-a workbench; 9-a control module; 10-finished lens; 11-existing lens; 111-existing mirror; 12-a micro display; 13-human eye.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, not all, embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the description of the embodiments of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience in describing the embodiments of the present invention and simplifying the description, but do not indicate or imply that the referred devices or elements must have specific orientations, be configured in specific orientations, and operate, and thus, should not be construed as limiting the present invention. The terms "first" and "second" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance. Furthermore, the terms "mounted," "connected," and "connected" are to be construed broadly and may, for example, be fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. Specific meanings of the above terms in the embodiments of the present invention can be understood by those of ordinary skill in the art according to specific situations.
At present, the manufacturing process of the array mirror waveguide scheme based on the traditional geometric optical design concept does not involve the processing of micro-nano structure, and can ensure that the color, contrast and the like have higher quality in the image transmission process, thereby becoming a common scheme of the optical coupling output module. The working principle of the arrayed mirror waveguide scheme is shown in fig. 4: after being collimated by an ocular system, light rays emitted by the micro display 12 are coupled into the waveguide mirror surface of the existing lens 11 by the waveguide reflecting surface, the light rays of each field of view are transmitted in the waveguide mirror surface according to the law of total reflection, when the light rays are incident on the semi-transparent semi-reflecting surface, one part of the light rays are reflected out of the waveguide mirror surface, and the other part of the light rays are transmitted and continuously transmitted. This portion of the advancing light then encounters another waveguide mirror and the "reflection-transmission" process described above is repeated until the last waveguide mirror in the waveguide array mirror reflects all of the remaining light out of the waveguide into the human eye 13.
However, the processing process flow of the array mirror surface of the existing lens 11 in the existing array mirror surface waveguide scheme is relatively complicated, fig. 4 also shows a schematic structural diagram of the existing lens 11, and the processing of the waveguide array mirror surface of the existing lens 11 requires that a plurality of existing mirror surfaces 111 are respectively plated with light splitting films, and then one side of each plated film is sequentially and respectively bonded to form the array mirror surface. In order to ensure uniformity of the light output amount in the entire field angle, the splitting ratio of the thin film on each conventional mirror surface 111 needs to be precisely adjusted according to the sequence. For the transmission of polarized light signals, the number of coating layers on the array mirror surface is even dozens of layers. This puts extremely high demands on the plating process, the array mirror bonding process, and the like, resulting in an increase in manufacturing cost. And the disqualification of one of the manufacturing links can generate an iterative effect, influence the final imaging quality and cause low yield. Therefore, the conventional method for processing the array mirror surface of the lens 11 is not only complicated and costly, but also has a very low yield.
Referring to fig. 1, an embodiment of the present invention provides a device for manufacturing a mirror surface of a lens array, including an ultrafast laser source 2, an optical power adjusting module 3, a beam shaper module 4, a focusing module 6, and a moving module 8. The optical power regulating module 3 is arranged on an emergent light path of the ultrafast laser light source 2 and is used for finely regulating and controlling the power of the ultrafast laser. The beam shaper module 4 is disposed on an emergent light path of the optical power adjusting module 3, and is configured to shape a beam of the ultrafast laser before focusing. The focusing module 6 is arranged on an emergent light path of the beam shaper module 4 and used for converging ultrafast laser to generate a fine focal field with high depth-diameter ratio and placing the fine focal field on the lens 7 to be processed. The workbench 86 of the moving module 8 is used for fixing the lens 7 to be processed, the workbench 86 can be regulated and controlled, so that the incident direction of the ultrafast laser and the normal of the incident surface of the lens 7 to be processed are at a preset angle β, the lens 7 to be processed is located on the focal plane of the focusing module 6, and the lens 7 to be processed moves according to the preset direction, and the ultrafast laser can directly write the array mirror surface 71 on the lens 7 to be processed. Compared with the preparation method of the array mirror surface of the lens in the prior art, the method has the advantages that the regulated ultrafast laser is emitted to the lens 7 to be processed, the position of the lens 7 to be processed is adjusted, the array mirror surface 71 can be directly written on the lens 7 to be processed, the processing of the lens array mirror surface 71 can be simplified by using the preparation device, the cost is reduced, and meanwhile, the yield is high.
The beam shaper 4 is a lens most commonly used in a diffractive optical element, and can convert a laser beam into a flat-top spot with uniformly distributed energy, wherein the spot can be in a positive direction, a round shape or other shapes. The beam shaper module 4 in the embodiment of the present invention can receive the ultrafast laser and shape the spatial light of the ultrafast laser, and specifically, the beam shaper module 4 can regulate and control the amplitude and phase of the ultrafast laser. The beam shaper module 4 and the focusing module 6 are matched to generate a one-dimensional focusing focal spot of a far field, namely a high depth-diameter ratio micro focal field with a focal depth up to millimeter magnitude. The embedded waveguide mirror 71 can be directly written by making the micro focus field enter the lens 7 to be processed at a certain angle and moving at a certain speed. The splitting ratio of the mirror 71 can be changed by changing the thickness of the mirror 71 through multiple writing or by changing the refractive index change amplitude of the area of the mirror 71. The waveguide mirror 71 induced by the movement of the high depth-diameter ratio fine focal spot in the lens has refractive index change and the thickness of the mirror 71 which can be regulated and controlled by laser scanning times, scanning reading, power density and the like so as to meet the specific optical image transfer coupling output requirement. The beam shaper module 4 may be a passive device or an active device.
The wavelength of the ultrafast laser emitted by the ultrafast laser source 2 may be a near-infrared band or an ultraviolet-visible band, which is specifically determined according to the material of the lens 7 to be processed. The material of the lens 7 to be processed may be glass, crystalline or high molecular polymer. The geometry of the lens 7 to be machined can be flat, curved or free-form.
Referring to fig. 1, an ultrafast laser light source 2 capable of emitting ultrafast laser light having a pulse width adjustable, the ultrafast laser light source 2 including an Oscillator 21 (english: Oscillator) and a femtosecond laser 22 (Fs laser). The oscillator 21 is electrically connected to the femtosecond laser 22 for supplying an electrical signal to the femtosecond laser 22 to cause the femtosecond laser 22 to emit ultrafast laser light.
The oscillator 21 is an electronic component for generating repetitive electronic signals, and is an energy conversion device capable of converting a direct current into an alternating current signal having a certain frequency, and is an active device.
Femtosecond is a unit of time, 1 femtosecond being 1 part per trillion of secondsOne, i.e. 1X 10-15Seconds or 0.001 picoseconds, also known as femtoseconds. The femtosecond laser 22 can achieve a femtosecond resolution, which is a pulse laser that uses mode locking technology to obtain femtosecond-level short pulses, where femtosecond refers to a pulse duration. The femtosecond laser is not monochromatic light, but is a combination of a section of wavelength continuously-changed light with the central wavelength of about 800nm, and the coherence of the continuous wavelength light in the section of wavelength is utilized to obtain the time-wise great compression, thereby realizing the femtosecond-magnitude pulse output. The use of the oscillator 21 and the femtosecond laser 22 enables the emission of ultrafast laser light having a pulse width of 10ps or less, which is superior in quality.
Continuing to refer to fig. 1, the optical power adjustment module 3 includes a half-wave plate 31 and a polarizer 32 disposed between the ultrafast laser source 2 and the beam shaper module 4. The half-wave plate 31 is close to the ultrafast laser source 2 and can receive ultrafast laser emitted by the ultrafast laser source 2, and the polaroid 32 is close to the beam shaper module 4 and can emit the ultrafast laser.
The half-wave plate 31 is also called a half-wave plate, and when the normally incident light is transmitted, the phase difference between the ordinary light (o light) and the extraordinary light (e light) is equal to pi or an odd multiple thereof, so that the birefringent crystal with a certain thickness is called the half-wave plate 31. In the case of elliptically polarized light, when the normally incident light is transmitted, the phase difference between the ordinary light (o light) and the extraordinary light (e light) is pi or an odd multiple thereof, the composite light coming out of the crystal plate remains plane-polarized light, but the vibration plane of the outgoing light is rotated by an angle of 2 theta with respect to the vibration plane of the incident light, the angle of theta being the angle between the vibration plane of the incident light and the optical axis on the crystal surface, that is, when a plane-polarized light passes through the half-wave plate 31, the outgoing light remains plane-polarized light, the vibration plane of the polarized light is merely rotated by an angle of 2 theta, and the magnitude of the rotation angle depends only on the angle theta between the vibration plane of the incident light and the optical axis of the crystal. Because the linearly polarized light vertically enters the half-wave plate 31, the transmitted light is still linearly polarized light, and if the included angle between the vibration plane and the main cross section of the crystal is theta during incidence, the vibration plane of the projected linearly polarized light is rotated by an angle of 2 theta from the original direction, so that the half-wave plate 31 can rotate the polarized light.
Polarization refers to the vibration vector of transverse waves, i.e. the phenomenon that the direction perpendicular to the propagation direction of the waves deviates from certain directions, and longitudinal waves are not polarized. The asymmetry of the vibration direction with respect to the propagation direction is called polarization, which is one of the most obvious signs of a transverse wave being distinguished from other longitudinal waves. The phenomenon that the spatial distribution of the light wave electric vector vibration loses symmetry with respect to the propagation direction of light is called polarization of light. The polarizing plate 32 is an optical element that can polarize natural light. The polarizing plate 32 has a function of shielding and transmitting incident light, and transmits either longitudinal light or transverse light, or shields it. The polarizing plate 32 is generally a composite material formed by laminating a polarizing film, an inner protective film, a pressure-sensitive adhesive layer and an outer protective layer.
The optical power regulating and controlling module 3 provided by the embodiment of the invention comprises the half-wave plate 31 and the polaroid 32, can be matched with the polaroid 32 to realize the regulation and control of the optical power by rotating the angle of the half-wave plate 31, is extremely convenient to operate, and can reduce the production cost of the whole preparation device because the materials of the half-wave plate 31 and the polaroid 32 are easy to obtain.
As shown in fig. 1, the manufacturing apparatus provided in the embodiment of the present invention further includes an optical path opening and closing module 1. The optical path switching module 1 is disposed on an emergent optical path of the optical power adjusting module 3 and located between the optical power adjusting module 3 and the beam shaper module 4. The light path opening and closing module 1 can conveniently regulate and control whether the beam shaper module 4 inputs laser. In practical applications, the optical path opening and closing module 1 may use an optical shutter. In one aspect, the optical shutter may provide millisecond shutter operation, in particular, the optical shutter is in a closed position when operated, and the optical shutter is open when a pulsed control signal is applied by an external controller; the optical shutter remains open as long as its control voltage remains high, and closes as soon as the voltage drops to a low level. On the other hand, the optical shutter can control the opening and closing frequency thereof, so that the regulation and control on whether the laser enters the beam shaper module 4 is more precise.
With continued reference to fig. 1, the preparation apparatus provided in the embodiment of the present invention further includes a control module 9. The control module 9 is electrically connected with the ultrafast laser source 2, the beam shaper module 4, the moving module 8 and the light path opening and closing module 1 respectively, and the control module 9 can control the working states of the ultrafast laser source 2, the beam shaper module 4, the moving module 8 and the light path opening and closing module 1. Through regulation and control module 9, can control ultrafast laser light source 2, beam shaper module 4, removal module 8 and light path switching module 1 simultaneously, make the preparation facilities automatic, it is more convenient to use, has improved work efficiency, has saved the manpower. As shown in fig. 1, the control module 9 may be a computer or other device, and when the computer is electrically connected to the optical path opening/closing module 1, the optical path opening/closing module 1 is controlled by the computer, so as to cut off and communicate the optical path.
The preparation device provided by the embodiment of the invention further comprises a reflector 5, wherein the reflector 5 is arranged between the beam shaper module 4 and the focusing module 6 and is used for reflecting the ultrafast laser and then entering the focusing module 6, so that the light path direction of the ultrafast laser can be bent and then enters the focusing module 6, the focusing effect is better, the placement of the movable module 8 can be facilitated, and the space of a region where the preparation device is placed can be more reasonably utilized. Specifically, as shown in fig. 1, an included angle between a normal line of a reflection surface of the reflector 5 and an incident angle of the ultrafast laser is 45 °, so that the installation of the reflector 5 is facilitated, and a space of an area where the preparation apparatus is placed can be further reasonably utilized.
With continued reference to fig. 1, the moving module 8 provided by the embodiment of the present invention includes a five-dimensional displacement platform. Wherein, the five-dimensional displacement platform comprises an X-axis moving component 81, a Y-axis moving component 82, a Z-axis moving component 83, a first rotation axis 84 (i.e. a theta rotation axis) and a second rotation axis 85 (b
Figure BDA0003089548850000101
A rotating shaft). The working table 86 of the five-dimensional displacement platform is used for fixing the lens 7 to be processed. When the X-axis moving assembly 81, the Y-axis moving assembly 82, the Z-axis moving assembly 83, the first rotating shaft 84 and the second rotating shaft 85 of the five-dimensional displacement platform are regulated, the condition that the incident direction of the ultrafast laser and the normal of the incident surface of the lens 7 to be processed form a preset angle β, the lens 7 to be processed is located on the focal plane of the focusing module 6, and the lens 7 to be processed moves according to the preset direction can be realized.
As shown in fig. 1, the adjusting and controlling X-axis moving assembly 81 can realize the front-back movement of the worktable 86, the adjusting and controlling Y-axis moving assembly 82 can realize the left-right movement of the worktable 86, the adjusting and controlling Z-axis moving assembly 83 can realize the up-down movement of the worktable 86, and the adjusting and controlling first rotating shaft 84 and the second rotating shaft 85 can realize the horizontal rotation and the left-right front-back overturning of the worktable 86. An actual regulating process is exemplified, when the lens direct writing array mirror 71 is required, the lens is fixed on a workbench 86 of a five-dimensional displacement platform, then a first rotating shaft 84 and a second rotating shaft 85 are regulated to enable the incidence direction of ultrafast laser to form a preset angle beta with the normal of the incidence surface of the lens 7 to be processed, the lens 7 to be processed can be located on the focal plane of a focusing module 6 by regulating a Z-axis moving assembly 83, an ultrafast laser light source 2 and a light path opening and closing module 1 are opened, the regulated ultrafast laser is emitted to the lens, and the workbench 86 moves back and forth by regulating an X-axis moving assembly 81 to enable the ultrafast laser to directly write the mirror 71 on the lens. When the direct writing of one mirror face 71 is finished, the light path opening and closing module 1 is closed, the Y-axis moving assembly 82 is regulated and controlled to enable the workbench 86 to move to the left to a preset position, the light path opening and closing module 1 is opened, the ultrafast laser is emitted to the next direct writing point, the X-axis moving assembly 81 is regulated and controlled to enable the workbench 86 to move back and forth continuously, the ultrafast laser is enabled to directly write the next mirror face 71 on the mirror face, and the operation mode is analogized until the array mirror face 71 is directly written on the mirror face.
Optionally, the repetition frequency of the ultrafast laser emitted by the ultrafast laser source 2 is adjustable between 1HZ and 1 MHz. The repetition frequency is the number of trigger pulses generated per second, and is the reciprocal of the pulse repetition interval, which is the time interval between one pulse and the next. The repetition frequency of the ultrafast laser is adjustable between 1HZ and 1MHz, so that the preparation device can be adjusted according to the actually required ultrafast laser when in actual use, and the preparation device provided by the embodiment of the invention has wider application range and is more convenient.
In practical applications, the focusing module 6 comprises a focusing objective. The focusing objective lens has better focusing effect, so that the quality of the array mirror surface 71 obtained after the lens direct writing is better.
As shown in fig. 5, an embodiment of the present invention further provides a method for preparing an array mirror surface by using the above apparatus for preparing a lens array mirror surface, which includes steps S501 to S504, and the specific implementation process is as follows.
S501: the lens 7 to be processed is cleaned and the lens 7 to be processed is fixed on the table 86 of the moving module 8.
Specifically, when the moving module 8 is a five-axis displacement stage, the lens 7 to be processed is fixed on a table 86 of the five-axis displacement stage, and the table 86 is disposed on the second rotating shaft 85.
S502: and performing orthogonal correction on the lens 7 to be processed, and adjusting the moving module 8 to enable the incident direction of the ultrafast laser and the normal of the incident surface of the lens 7 to be processed to form a preset angle beta, wherein the lens 7 to be processed is positioned on the focal plane of the focusing module 6.
Specifically, when the focusing module 6 is a focusing objective lens, after the orthogonal correction is performed on the to-be-processed lens 7, the second rotating shaft 85 is adjusted, so that the focal spot generated by the focusing objective lens is converged on the to-be-processed point of the to-be-processed lens 7 at the preset angle β.
S503: the ultrafast laser light source 2 is turned on. At this time, the ultrafast laser light source 2 generates an ultrafast pulse laser.
After the ultrafast laser source 2 is turned on, the half-wave plate 31 and the polarizer 32 are adjusted according to actual requirements to obtain the desired suitable ultrashort pulse laser energy.
When the control module 9 is a computer, the computer is operated to regulate the femtosecond laser 22, so as to generate the required ultrashort pulse laser with appropriate pulse width. The working mode of the beam shaper module 4 is debugged and checked by a computer to meet the required beam shaping requirement, and finally the beam shaper module is matched with a focusing objective to generate a high depth-diameter ratio micro laser focal field.
S504: the moving module 8 is controlled to move the lens 7 to be processed according to a preset direction, so that the ultrafast laser can directly write the array mirror 71 on the lens 7 to be processed.
Specifically, the five-axis displacement platform and the optical path opening and closing module 1 are cooperatively controlled by a computer, and when the X-axis moving component 81 moves at a proper speed, the ultrafast laser can directly write the embedded waveguide mirror 71 inside the lens.
And the selected area processing of the embedded waveguide array mirror 71 can be realized by changing the coordinates of the Y-axis moving component 82 and continuously moving the X-axis moving component 81 at a proper speed.
In the preparation of the actual array mirror 71, the thickness of the waveguide array mirror 71 and the refractive index change amount of the region can be changed by regulating and controlling laser parameters, the movement speed and the writing times, so that the beam splitting ratio of the waveguide mirror 71 is regulated and controlled.
Fig. 2 shows a front view of the finished lens 10 with the finished array mirror surface 71, and fig. 3 shows a perspective view of the finished lens 10 with the finished array mirror surface 71.
Compared with the preparation method of the array mirror surface 71 of the lens in the prior art, the method has the advantages that the regulated and controlled ultrafast laser is emitted to the lens 7 to be processed, the position of the lens 7 to be processed is adjusted, the array mirror surface 71 can be directly written on the lens 7 to be processed, the processing of the lens array mirror surface 71 can be simplified by using the preparation method, the cost is greatly reduced, and meanwhile, the yield is high.
The preparation device and the preparation method provided by the invention are simple and easy to implement, the high depth-diameter ratio micro focal field generated by laser space-time shaping is combined in a nonlinear laser energy deposition mode, the change of the refractive index of a local material is induced by regulating the position of the focal field and moving the position of a focal point in a whole transparent lens, the waveguide array mirror face 71 can be directly engraved in the transparent lens, the area selection processing of the array mirror face 71 in the lens and the regulation and control of the characteristics of the mirror face 71 are realized, and series of complicated processes such as inevitable cutting, polishing, film coating, adhesion and the like in the traditional process are omitted, so that the defects of complex process, low yield, poor mechanical strength and the like existing in the traditional array waveguide mirror face 71 processing are thoroughly solved.
The preparation device and the preparation method provided by the embodiment of the invention have the advantages of high processing efficiency, high precision and flexible process. Specifically, the manufacturing method provided by the invention only needs one minute for processing ten waveguide array mirrors 71, thereby greatly shortening the processing time. The inscription of the waveguide array mirror 71 has a region selection function, and only the position of the workbench 86 on which the lens 7 to be processed is placed needs to be moved by computer control. The adjustment of the angle of the waveguide mirror 71 only requires a computer to control the second rotation axis 85. The angle error of the waveguide array mirror 71 can be controlled to be below 0.01 °. The preparation device and the preparation method provided by the embodiment of the invention have multiple repairing and debugging functions, and particularly, under the condition that the reflectivity of the partial waveguide mirror 71 is insufficient, the preparation device and the preparation method can be realized by secondary repairing means such as increasing the number of times of writing, expanding the thickness of a reflecting surface and the like. In addition, the preparation device and the preparation method provided by the embodiment of the invention have wide application range, and particularly, the waveguide mirror 71 is induced by nonlinear energy deposition and is almost suitable for lenses made of all materials based on an ultrafast laser direct writing mode, so that the selection range of the lens materials is greatly expanded. Finally, the array mirror face 71 of the lens prepared by the preparation device and the preparation method provided by the embodiment of the invention has high mechanical strength, and specifically, because the embodiment of the invention is based on the embedded processing mode of the ultrafast laser 1 direct writing, the traditional adhesive bonding process is abandoned, so that the material of the array mirror face 71 is the same as that of the lens body, and further, the mechanical strength of the whole lens and the array mirror face 71 is higher.
The following provides a process for preparing an array mirror 71 of a flat fused silica lens: the femtosecond pulse beam with the central wavelength of 1030nm and the repetition frequency of 10kHz and the Gaussian distribution, namely the ultrafast laser, is shaped into a Bessel beam by the beam shaper module 4, and then the ultrafast laser focused into a fine focal spot by the focusing objective is converged and projected into the lens. The second rotation axis 85 is regulated to change the included angle between the fine focal field and the lens surface, i.e. the preset angle β, and the X-axis moving component 81 and the Y-axis moving component 82 of the five-dimensional displacement platform are controlled, so that the embedded array waveguide mirror 71 with a predetermined angle can be directly written in the lens. Regulating and controlling the laser irradiation power density to 1013W/cm2On the left and right sides, the regulation and control of the thickness of the mirror surface 71 and the refractive index change quantity at the mirror surface 71 can be realized by adopting a mode of multiple times of laser focus scanning and variable speed scanning.
The embodiments in the present specification are described in a progressive manner, and the same or similar parts among the embodiments may be referred to each other, and each embodiment focuses on the differences from the other embodiments.
The above embodiments are only used to illustrate the technical solutions of the present application, and not to limit the present application; although the present application has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; such modifications or substitutions do not depart from the spirit and scope of the present disclosure.

Claims (10)

1. The preparation device of the lens array mirror surface is characterized by comprising an ultrafast laser light source, an optical power regulating module, a beam shaper module, a focusing module and a moving module;
the optical power regulating and controlling module is arranged on an emergent light path of the ultrafast laser light source and is used for finely regulating and controlling the power of ultrafast laser;
the beam shaper module is arranged on an emergent light path of the optical power regulating and controlling module and is used for carrying out beam shaping on the ultrafast laser before focusing;
the focusing module is arranged on an emergent light path of the beam shaper module and is used for converging ultrafast laser to generate a high depth-diameter ratio micro-fine focal field and placing the micro-fine focal field on a lens to be processed;
the workbench of the moving module is used for fixing the lens to be processed, and can be regulated and controlled, so that the incidence direction of the ultrafast laser and the normal of the incidence surface of the lens to be processed form a preset angle, the lens to be processed is positioned on the focal plane of the focusing module, the lens to be processed moves according to the preset direction, and the ultrafast laser can directly write the array mirror surface on the lens to be processed.
2. The manufacturing apparatus according to claim 1, wherein the ultrafast laser light source includes an oscillator and a femtosecond laser;
the oscillator is electrically connected to the femtosecond laser and used for providing an electric signal to the femtosecond laser so as to enable the femtosecond laser to emit ultrafast laser.
3. The manufacturing apparatus of claim 1, wherein the optical power conditioning module comprises a half-wave plate and a polarizer disposed between the ultrafast laser light source and the beam shaper module;
the half-wave plate is close to the ultrafast laser light source and can receive the ultrafast laser emitted by the ultrafast laser light source, and the polaroid is close to the beam shaper module and can emit the ultrafast laser.
4. The manufacturing apparatus according to claim 1, further comprising an optical path opening and closing module;
the light path opening and closing module is arranged on an emergent light path of the optical power regulating and controlling module and is positioned between the optical power regulating and controlling module and the beam shaper module.
5. The manufacturing apparatus of claim 4, further comprising a control module;
the control module is electrically connected with the ultrafast laser light source, the beam shaper module, the moving module and the light path opening and closing module respectively, and can control the working states of the ultrafast laser light source, the beam shaper module, the moving module and the light path opening and closing module.
6. The manufacturing apparatus of claim 1, further comprising a mirror disposed between the beam shaper module and the focusing module for reflecting the ultrafast laser light before entering the focusing module.
7. The manufacturing apparatus of claim 1, wherein the movement module comprises a five-dimensional displacement platform;
the workbench of the five-dimensional displacement platform is used for fixing the lens to be processed;
when the X-axis moving assembly, the Y-axis moving assembly, the Z-axis moving assembly, the first rotating shaft and the second rotating shaft of the five-dimensional displacement platform are regulated and controlled, the condition that the incident direction of the ultrafast laser and the normal of the incident surface of the lens to be processed are at a preset angle, the lens to be processed is located on the focal plane of the focusing module, and the lens to be processed moves according to the preset direction can be realized.
8. The manufacturing apparatus according to claim 1, wherein the repetition frequency of the ultrafast laser emitted from the ultrafast laser light source is adjustable between 1HZ and 1 MHz.
9. The manufacturing apparatus of claim 1, wherein the focusing module comprises a focusing objective lens.
10. A method for manufacturing an array mirror using the apparatus for manufacturing a lens array mirror according to any one of claims 1 to 9, comprising the steps of:
cleaning the lens to be processed, and fixing the lens to be processed on a workbench of the mobile module;
performing orthogonal correction on the lens to be processed, and adjusting the moving module to enable the incident direction of the ultrafast laser and the normal of the incident surface of the lens to be processed to form a preset angle, wherein the lens to be processed is positioned on the focal plane of the focusing module;
turning on the ultrafast laser light source;
and controlling the moving module to enable the lens to be processed to move according to a preset direction, so that the ultrafast laser can directly write the array mirror surface on the lens to be processed.
CN202110591836.3A 2021-05-28 2021-05-28 Preparation device and preparation method of lens array mirror surface Active CN113399823B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202110591836.3A CN113399823B (en) 2021-05-28 2021-05-28 Preparation device and preparation method of lens array mirror surface

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202110591836.3A CN113399823B (en) 2021-05-28 2021-05-28 Preparation device and preparation method of lens array mirror surface

Publications (2)

Publication Number Publication Date
CN113399823A true CN113399823A (en) 2021-09-17
CN113399823B CN113399823B (en) 2023-05-16

Family

ID=77674994

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202110591836.3A Active CN113399823B (en) 2021-05-28 2021-05-28 Preparation device and preparation method of lens array mirror surface

Country Status (1)

Country Link
CN (1) CN113399823B (en)

Citations (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003011116A (en) * 2001-07-05 2003-01-15 Canon Inc Method and apparatus for cutting column-shaped base material using light, method and apparatus for cutting ingot, and method for producing wafer
US20030012540A1 (en) * 2001-06-13 2003-01-16 Ngk Insulators, Ltd. Method for producing optical waveguides, optical waveguides and frequency converting devices
CN102736176A (en) * 2012-05-11 2012-10-17 中国科学院西安光学精密机械研究所 Method for making waveguide by using laser
CN103345018A (en) * 2013-06-28 2013-10-09 武汉光迅科技股份有限公司 Cutting method of curve-type array waveguide optical grating chip and clamp for cutting same
CN103427323A (en) * 2013-08-22 2013-12-04 中国科学院上海光学精密机械研究所 Single higher-harmonic ultraviolet monochromatic light source
CN103658993A (en) * 2013-12-11 2014-03-26 北京理工大学 Crystal silicon surface femtosecond laser selective ablation method based on electron dynamic control
CN103706947A (en) * 2013-11-14 2014-04-09 中国科学技术大学 Large-area manufacturing method and processing system for surfaces of micrometer and nanometer structures with tunable periods and tunable morphologies
CN203541848U (en) * 2013-11-13 2014-04-16 苏州德龙激光股份有限公司 Laser cutting device
CN104625422A (en) * 2014-12-29 2015-05-20 北京理工大学 Method for assisting metal processing based on electronic dynamic control of ethanol solution
CN105458529A (en) * 2016-01-21 2016-04-06 北京理工大学 Method for efficiently making large-depth-diameter-ratio micropore arrays
CN106956084A (en) * 2017-05-19 2017-07-18 苏州镭明激光科技有限公司 Low k material lasers remove technique and its equipment
CN107971628A (en) * 2017-11-22 2018-05-01 北京工业大学 Method based on femtosecond laser dynamic control customization copper surface periodic structure
CN108873184A (en) * 2018-07-17 2018-11-23 武汉恩达通科技有限公司 A kind of laser writing optical fiber connector with lateral V-shaped groove
CN108941925A (en) * 2018-07-27 2018-12-07 湖北工业大学 Femtosecond laser processing device and its 1x8 ridge optical splitter of processing
CN109079318A (en) * 2018-08-22 2018-12-25 湖北工业大学 A kind of the femtosecond laser preparation system and method for silicon photonic crystal waveguide device
CN109759722A (en) * 2019-02-27 2019-05-17 大族激光科技产业集团股份有限公司 A kind of the LED chip system of processing and method of double process combinations
CN110026678A (en) * 2019-04-30 2019-07-19 深圳信息职业技术学院 A kind of ultrafast laser multi-beam parallel processing unit (plant) and method
CN111168232A (en) * 2020-02-07 2020-05-19 吉林大学 Method for preparing nanometer precision by femtosecond laser
TW202030782A (en) * 2019-01-31 2020-08-16 大陸商大族激光科技產業集團股份有限公司 Laser pre-dividing method and device for LED wafer sheet
CN111856643A (en) * 2020-07-28 2020-10-30 中国人民解放军国防科技大学 Ultra-wideband chirped inclined fiber grating writing device, writing method and laser system
CN112142315A (en) * 2020-09-22 2020-12-29 东莞市盛雄激光先进装备股份有限公司 Ultrafast laser processing system and method for thick glass
CN212872967U (en) * 2020-07-28 2021-04-02 中国人民解放军国防科技大学 Apodization long period optical fiber grating inscribing device
CN112792451A (en) * 2020-12-31 2021-05-14 吉林大学 Method for preparing geometric phase optical element in sapphire by using femtosecond laser

Patent Citations (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030012540A1 (en) * 2001-06-13 2003-01-16 Ngk Insulators, Ltd. Method for producing optical waveguides, optical waveguides and frequency converting devices
JP2003011116A (en) * 2001-07-05 2003-01-15 Canon Inc Method and apparatus for cutting column-shaped base material using light, method and apparatus for cutting ingot, and method for producing wafer
CN102736176A (en) * 2012-05-11 2012-10-17 中国科学院西安光学精密机械研究所 Method for making waveguide by using laser
CN103345018A (en) * 2013-06-28 2013-10-09 武汉光迅科技股份有限公司 Cutting method of curve-type array waveguide optical grating chip and clamp for cutting same
CN103427323A (en) * 2013-08-22 2013-12-04 中国科学院上海光学精密机械研究所 Single higher-harmonic ultraviolet monochromatic light source
CN203541848U (en) * 2013-11-13 2014-04-16 苏州德龙激光股份有限公司 Laser cutting device
CN103706947A (en) * 2013-11-14 2014-04-09 中国科学技术大学 Large-area manufacturing method and processing system for surfaces of micrometer and nanometer structures with tunable periods and tunable morphologies
CN103658993A (en) * 2013-12-11 2014-03-26 北京理工大学 Crystal silicon surface femtosecond laser selective ablation method based on electron dynamic control
CN104625422A (en) * 2014-12-29 2015-05-20 北京理工大学 Method for assisting metal processing based on electronic dynamic control of ethanol solution
CN105458529A (en) * 2016-01-21 2016-04-06 北京理工大学 Method for efficiently making large-depth-diameter-ratio micropore arrays
CN106956084A (en) * 2017-05-19 2017-07-18 苏州镭明激光科技有限公司 Low k material lasers remove technique and its equipment
CN107971628A (en) * 2017-11-22 2018-05-01 北京工业大学 Method based on femtosecond laser dynamic control customization copper surface periodic structure
CN108873184A (en) * 2018-07-17 2018-11-23 武汉恩达通科技有限公司 A kind of laser writing optical fiber connector with lateral V-shaped groove
CN108941925A (en) * 2018-07-27 2018-12-07 湖北工业大学 Femtosecond laser processing device and its 1x8 ridge optical splitter of processing
CN109079318A (en) * 2018-08-22 2018-12-25 湖北工业大学 A kind of the femtosecond laser preparation system and method for silicon photonic crystal waveguide device
TW202030782A (en) * 2019-01-31 2020-08-16 大陸商大族激光科技產業集團股份有限公司 Laser pre-dividing method and device for LED wafer sheet
CN109759722A (en) * 2019-02-27 2019-05-17 大族激光科技产业集团股份有限公司 A kind of the LED chip system of processing and method of double process combinations
CN110026678A (en) * 2019-04-30 2019-07-19 深圳信息职业技术学院 A kind of ultrafast laser multi-beam parallel processing unit (plant) and method
CN111168232A (en) * 2020-02-07 2020-05-19 吉林大学 Method for preparing nanometer precision by femtosecond laser
CN111856643A (en) * 2020-07-28 2020-10-30 中国人民解放军国防科技大学 Ultra-wideband chirped inclined fiber grating writing device, writing method and laser system
CN212872967U (en) * 2020-07-28 2021-04-02 中国人民解放军国防科技大学 Apodization long period optical fiber grating inscribing device
CN112142315A (en) * 2020-09-22 2020-12-29 东莞市盛雄激光先进装备股份有限公司 Ultrafast laser processing system and method for thick glass
CN112792451A (en) * 2020-12-31 2021-05-14 吉林大学 Method for preparing geometric phase optical element in sapphire by using femtosecond laser

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
XU WANG: "Effects of CeO2 and Sb2O3 on the Nonlinear Photochemical", 《MICROMACHINES》 *
XU WANG: "Effects of CeO2 and Sb2O3 on the Nonlinear Photochemical", 《MICROMACHINES》, 26 May 2021 (2021-05-26), pages 1 - 10 *

Also Published As

Publication number Publication date
CN113399823B (en) 2023-05-16

Similar Documents

Publication Publication Date Title
CN102227286B (en) Laser processing device
CN110238546A (en) A kind of system of the femtosecond laser processing array micropore based on spatial beam shaping
EP2987011B1 (en) Method for realizing an optical waveguide in a substrate by means of a femtosecond laser
JPS61503066A (en) optical transmission filter
KR20050032528A (en) Beam formation unit comprising two axicon lenses, and device comprising one such beam formation unit for introducing radiation energy into a workpiece consisting of a weakly-absorbent material
JP2010533316A (en) Substrate guide relay for use with a scanning beam image source
CN110456509A (en) Show Optical devices and helmet
CN107357034A (en) A kind of light-induction dielectrophoresis device of laser interference pattern light field as light source
CN114667484A (en) Frequency conversion device for optimizing harmonic characteristics of laser
CN215986726U (en) Augmented reality display system
CN113399823B (en) Preparation device and preparation method of lens array mirror surface
EP2525939A1 (en) A method of laser processing
CN110064839A (en) A kind of laser anneal device
CN113311518A (en) Single-chip type ultrashort-focus imaging lens, preparation method and near-to-eye wearable system
CN217618371U (en) Laser annealing device with adjustable effect and productivity
CN108838515A (en) A kind of method and device of excimer laser process tapered micro holes
CN207096592U (en) Using polarizing CO2The device of laser interference machining lens antifog structure
CN111338152B (en) Device for homogenizing frequency-doubled light field distribution
CN111061060B (en) Compact time shaping system
CN210703082U (en) Double-laser beam combining device and double-laser composite processing beam system
CN114204389A (en) Fiber grating string structure and preparation method thereof
KR20140096219A (en) Apparatus for glass cutting
CN108873194B (en) Optical assembly and manufacturing method thereof
CN106918920B (en) Using polarized CO 2 Device and method for processing antifogging structure of lens by laser interference
CN205254331U (en) CO2 laser instrument and outer light path transmission system thereof

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant