CN113376718B - Collimation film and preparation method thereof, interference reduction collimation film, laminating type collimation film and image recognition module - Google Patents

Collimation film and preparation method thereof, interference reduction collimation film, laminating type collimation film and image recognition module Download PDF

Info

Publication number
CN113376718B
CN113376718B CN202110203533.XA CN202110203533A CN113376718B CN 113376718 B CN113376718 B CN 113376718B CN 202110203533 A CN202110203533 A CN 202110203533A CN 113376718 B CN113376718 B CN 113376718B
Authority
CN
China
Prior art keywords
collimating
layer
film
light
collimation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202110203533.XA
Other languages
Chinese (zh)
Other versions
CN113376718A (en
Inventor
唐海江
夏寅
高斌基
付坤
刘建凯
王小凯
李刚
张彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ningbo Exciton Technology Co Ltd
Original Assignee
Ningbo Exciton Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ningbo Exciton Technology Co Ltd filed Critical Ningbo Exciton Technology Co Ltd
Publication of CN113376718A publication Critical patent/CN113376718A/en
Application granted granted Critical
Publication of CN113376718B publication Critical patent/CN113376718B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/20—Adhesives in the form of films or foils characterised by their carriers
    • C09J7/29—Laminated material
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/30—Collimators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

The invention belongs to the field of image recognition, and particularly relates to a collimating film and a preparation method thereof, an interference reduction collimating film, a laminated collimating film and an image recognition module. The invention provides a collimating film and a preparation method thereof, an interference reduction collimating film, a laminating collimating film and an image recognition module, aiming at solving the problem that two layers of collimating diaphragms in a traditional collimating film are difficult to align. The collimating film sequentially comprises a collimating lens layer, a flexible substrate layer and a collimating hole layer; the collimation hole layer is a collimation passage layer, the collimation passage layer comprises a collimation passage array and a shading medium, and the collimation passage array comprises a plurality of inverted truncated cone-shaped collimation passages. The collimating film provided by the invention has better collimation property and higher signal-to-noise ratio in application, and can be applied to fingerprint unlocking and the like of consumer electronic products such as mobile phones (OLED screens).

Description

Collimating film and preparation method thereof, interference-reducing collimating film, laminating collimating film and image recognition module
Technical Field
The invention belongs to the field of image recognition, and particularly relates to a collimating film, an interference reducing collimating film and a preparation method thereof, a laminated collimating film and an image recognition module.
Background
In the field of image recognition, a common image sensor such as a CMOS type or a photo-TFT type generally includes a collimator device in a sensor module to enhance a signal-to-noise ratio, improve a recognition rate, and reduce crosstalk. The collimating device (as shown in fig. 1) mainly collimates and filters diffused light at a single-point pixel of an image, so that normal collimated light or nearly collimated light (signal) can be smoothly transmitted to a corresponding photoelectric sensor, while light (noise) with a large angle deviating from the normal direction can only rarely or even cannot enter a non-corresponding photoelectric sensor, and thus, the signal-to-noise ratio is enhanced.
The collimating device typically has a top collimating structure layer and a bottom collimating structure layer: first, the top and bottom double-layer collimating structures need to be aligned precisely, otherwise the intensity of the signal light is greatly reduced (as shown in fig. 2); secondly, the distance between the top (incident) and bottom (emergent) collimating structures needs to be increased, or the microstructure size needs to be reduced (as shown in fig. 3) to increase the overall aspect ratio, otherwise the transmission of crosstalk light will be increased.
The traditional collimating device is generally a rigid collimating sheet, such as an optical fiber bundle slice, or a Microlens (Microlens), a collimating diaphragm and the like formed on two sides of a glass substrate, and the rigid collimating sheet generally needs to keep higher thickness, on one hand, the rigid collimating sheet is used for keeping the length-diameter ratio, on the other hand, the rigid collimating sheet is used for keeping the mechanical property of the rigid collimating sheet and preventing the rigid collimating sheet from being broken in an application environment. However, even then, such rigid collimating sheet still cannot satisfy the application of large-sized image recognition module. Particularly in applications where a reduced overall thickness is desired (e.g., ultra-thin, large screen handsets), it becomes more brittle, more fragile, and less productive, both performance and cost. It is also apparent that such rigid collimating sheets are less likely to be in a flexible image recognition module.
Except for the optical fiber bundle type collimating sheets (the top layer collimating structure and the bottom layer collimating structure are aligned originally), most of the rigid collimating sheets need to complete the alignment of two layers of collimating structures (collimating diaphragms). However, the two-layer structure prepared in sequence needs to be aligned with high precision, which has considerable difficulty: firstly, very complex and expensive double-shaft positioning equipment is needed, the positioning process is complicated and time-consuming, if the collimation structure size is less than 50 micrometers (image precision DPI > 508), the lattice scale can reach hundreds of millions of points per square meter, and the production efficiency is extremely low; secondly, the alignment method is not accurate in practice, and especially when the size of the collimating structure is reduced and the number of collimating structures is increased, the accumulated error becomes more obvious, which results in the decrease of signal light intensity, and frequent origin correction becomes more time-consuming.
In conclusion, the traditional rigid collimating sheet has the problems of high thickness, fragility and poor performance under the condition of low thickness, difficult alignment of two layers of collimating structures (collimating diaphragms), low yield and low productivity, and is difficult to apply to the field of large-size, ultrathin and flexible image recognition.
Disclosure of Invention
The invention provides a collimating film, an interference reducing collimating film and a preparation method thereof, a laminating collimating film and an image recognition module, aiming at solving the problem that two layers of collimating diaphragms in a traditional rigid collimating film are difficult to align. The collimating film provided by the invention only comprises one collimating aperture layer, and the problem that two layers of collimating diaphragms are difficult to align is solved. Compared with the ordered collimating film, the interference reducing collimating film provided by the invention can reduce the light interference phenomenon and improve the image recognition accuracy.
In order to solve the technical problems, the invention adopts the following technical scheme:
the invention provides a collimating film, which sequentially comprises a collimating lens layer, a flexible substrate layer and a collimating pore layer.
The collimation hole layer is a collimation diaphragm.
The collimating film provided by the invention only comprises one layer of collimating diaphragm. The collimating film provided by the invention only comprises one collimating hole layer.
The collimating film sequentially comprises a collimating lens layer, a flexible substrate layer and a collimating hole layer.
The collimating lens layer is arranged on the upper surface of the flexible substrate, and the collimating hole layer is arranged on the lower surface of the flexible substrate.
The collimating lens layer includes a microlens array and a thickness.
The collimating aperture layer includes an array of collimating apertures.
The collimation hole layer comprises a shading medium layer and a collimation hole array.
The collimation hole layer comprises a shading medium and a collimation hole array formed after the medium is hollowed out.
The distribution of the collimation hole array and the micro-lens array is completely consistent. Each collimating aperture is on the primary optical axis of the corresponding microlens. Furthermore, the center of each collimating hole is on the main optical axis of the corresponding microlens.
The collimating film is punched by adopting a micro-focusing method, the distribution of the collimating hole array is completely consistent with that of the micro-lens array, the circle centers of any collimating hole are all positioned on the main optical axis of the corresponding micro-lens, one-to-one high-precision alignment is carried out, and the alignment deviation delta is less than 1 mu m. The thickness T of the flexible matrix layer is selected from 10 to 50 μm, preferably 25 to 38 μm.
The micro-lens array of the collimating lens layer is orderly arranged. The foregoing collimating films are referred to as ordered collimating films (also known as ordered collimating structures). The foregoing ordered arrangement is characterized in that the pitch P of the principal optical axes of adjacent microlenses is a constant value.
The micro-lens array of the collimating lens layer and the collimating hole array of the collimating hole layer are orderly arranged. The foregoing collimating films are referred to as ordered collimating films (also known as ordered collimating structures).
Further, the micro-lens array of the collimating lens layer is arranged in a disordered manner. The collimating film in which the microlens array is arranged in a disordered manner is called a subtractive interference collimating film (also called a disordered collimating structure, or a disordered array collimating film). The foregoing disordered arrangement is characterized in that the pitch P of the principal optical axes of adjacent microlenses is a value that varies within a range. Compared with the ordered collimating film, the interference reducing collimating film can reduce the phenomenon of light interference and improve the accuracy (recognition rate) of image recognition.
Further, the micro-lens array of the collimating lens layer and the collimating hole array of the collimating hole layer are arranged in disorder. The aforementioned collimating film is referred to as a subtractive interference collimating film (also referred to as a disordered collimating structure).
Further, in the interference reduction collimation film, in the microlens array of the collimation lens layer, the coordinates of the main optical axes of the three adjacent microlenses are connected to form a non-regular triangle. The non-regular triangle is also called a normal triangle, and refers to a triangle other than a triangle having three angles of 60 degrees.
One collimating hole in the collimating hole array corresponds to the position of one microlens in the microlens array, and the main optical axis of the microlens coincides with the center of the collimating hole or the deviation of the main optical axis and the center of the collimating hole is less than 1 μm. One microlens corresponding to one alignment hole position is referred to as a corresponding microlens of this alignment hole. The coordinates of the main optical axes of three adjacent microlenses are connected to form a regular triangle (formed by connecting the coordinates of the main optical axes of three mutually overlapped microlenses), or the coordinates of the main optical axes of four adjacent microlenses are connected to form a square (formed by connecting the coordinates of the main optical axes of four mutually overlapped microlenses).
The microlenses in the microlens array are closely arranged. I.e., adjacent microlenses are in contact with each other or overlap each other.
The collimating lens array and the collimating hole array of the collimating film are both in regular triangle (formed by connecting the coordinates of the main optical axes of three mutually overlapped micro lenses) close arrangement or square (formed by connecting the coordinates of the main optical axes of four mutually overlapped micro lenses) close arrangement.
Furthermore, in the collimating lens layer, the distance P between the main optical axes of the adjacent micro lenses is 10-50 μm, the radius R of the micro lenses is 6.1-30.2 μm, the height H of the collimating lens layer is 1.1-27.4 μm, and the refractive index n1 of the material of the collimating lens layer is 1.4-1.6; in the flexible matrix layer, the thickness T of the flexible matrix layer is 10-50 mu m, and the refractive index n2 of the material of the flexible matrix layer is 1.5-1.65; in the collimation hole layer, the thickness t of the collimation hole layer is 0.5-7 μm, and the diameter phi of the collimation holes in the collimation hole array is 1-10 μm.
In the ordered collimating film, the principal optical axis pitches P of adjacent microlenses are the same, and P is selected from 10 to 50 μm, preferably 15 to 30 μm, and more preferably 18 to 25 μm.
The micro lens of the collimating film focuses vertically incident light rays and forms a light spot with the diameter D on the lower surface of the flexible substrate layer, wherein D is selected from 0.1-7.8 microns, preferably 0.5-4.9 microns, and more preferably 1-2 microns.
The light spot diameter D is determined by the curvature radius R (spherical radius R) of the micro lens, the refractive index n1, the thickness H (vertical distance from the vertex of the micro lens to the upper surface of the base) of the collimating lens layer, the refractive index n2 of the flexible base layer and the thickness T of the flexible base layer.
The curvature radius R of the micro lens is selected from 6.1-30.2 μm, the thickness H of the collimating lens layer is selected from 1.1-27.4 μm, R and H are not preferred, and the micro lens is adapted according to other parameters.
The refractive index n1 of the collimating lens layer (i.e., the microlens layer) is selected from 1.4 to 1.6, preferably 1.5.
The refractive index n2 of the flexible substrate layer is selected from 1.5-1.65, which is different from material to material, is not preferred, and allows errors caused by different processes of plus or minus 0.02 same material.
The micro lens array of the collimating film is made of the same material as the thick meat, and the material is transparent polymer.
Further, the transparent polymer of the microlens layer is selected from one of AR (Acrylic Resin, acrylic Resin or modified Acrylic Resin), PC (polycarbonate), PET (polyethylene terephthalate), PEN (polyethylene naphthalate), PI (polyimide), PS (polystyrene), SR (Silicon Resin), FEP (perfluoroethylene propylene copolymer), or EVA (ethylene-vinyl acetate copolymer). Further, it is preferable that the material is one of PMMA (polymethyl methacrylate), PC, or PS.
The flexible matrix layer of the collimating film is a transparent polymer film.
Further, the material of the transparent polymer film is selected from one of PET, PEN, PI, PC, PMMA (polymethyl methacrylate), PP (polypropylene), PO (polyolefin), SR, or COP (cyclic olefin copolymer). Further, one of PET, PI, PC, and PMMA is preferable.
The shading medium of the collimation hole layer of the collimation film is one or the combination of at least two of organic paint and inorganic plating.
The organic coating of the opacifying medium is selected from opaque polymeric ink systems.
Further, the opaque polymeric ink system comprises a light absorbing material and a polymeric curing system.
Further, the light absorbing material is selected from one or a combination of at least two of carbon (such as carbon black, carbon fiber, graphite, etc.), carbide (such as chromium carbide, titanium carbide, boron carbide, etc.), carbonitride (such as titanium carbonitride, boron carbonitride, etc.), sulfide (such as ferrous sulfide, molybdenum disulfide, cobalt disulfide, nickel sulfide, etc.).
Further, the polymer curing system may be selected from one or a combination of at least two of acrylic systems (AR), polyurethane systems (PU), silicone Systems (SR), epoxy systems (EP), melamine resin systems (MF), phenolic resin systems (PF), urea resin systems (UF), or thermoplastic elastomers (e.g. ethylene vinyl acetate copolymers, thermoplastic elastomers TPE, or thermoplastic polyurethane elastomers TPU).
Further, the polymer curing system may be selected from one or a combination of at least two of an acrylic resin system, a polyurethane system, a silicone system, an epoxy resin system, or a thermoplastic elastomer.
The inorganic coating of the shading medium is selected from one or the combination of at least two of simple carbon, carbide, carbonitride and sulfide.
The thickness t of the collimation hole layer of the collimation film is selected from 0.5-7 μm, preferably 1-5 μm, and more preferably 2-3 μm.
The diameter phi of the collimation hole layer of the collimation film is selected from 1-10 mu m, and is further preferably 3-5 mu m.
Further, the flexible matrix layer thickness T may be 10 μm to 50 μm, such as 10 μm,15 μm,20 μm,25 μm,38 μm or 50 μm.
Further, the chief optical axis pitch P of adjacent microlenses of the collimating lens layer may be 10 μm to 15 μm, such as 10 μm,15 μm,18 μm,20 μm,25 μm,30 μm, or 50 μm.
Further, the radius of curvature R of the microlenses of the collimating lens layer can be 6.1 μm to 30.2 μm, such as 6.1 μm,6.9 μm,7.9 μm,9.4 μm,11.2 μm,11.3 μm,12 μm,12.1 μm,12.6 μm,12.8 μm,13.3 μm,13.6 μm,14 μm,14.3 μm,14.3 μm,14.8 μm,15 μm,15.1 μm,15.7 μm,15.9 μm,16 μm,16.1 μm,16.7 μm,17 μm,17.2 μm,17.3 μm,18 μm,18.1 μm,18.3 μm,18.8 μm,19.3 μm,19.4 μm,19.6 μm,19.8 μm, 20.3 μm,20.6 μm,20.5 μm,22.5 μm, or 22.6 μm.
Further, the collimating lens layer thickness H may be 1.1 μm to 27.4 μm, such as 1.1 μm,2.4 μm,2.5 μm,3.0 μm,3.1 μm,3.2 μm,3.5 μm,3.8 μm,4.1 μm,5.0 μm,5.8 μm,6.0 μm,6.2 μm,6.8 μm,7.2 μm,7.8 μm,8.5 μm,8.6 μm,8.7 μm,9.2 μm,10.4 μm,10.7 μm,10.8 μm,11 μm,11.1 μm,11.4 μm,11.5 μm,12.9 μm,13.6 μm,14.1 μm,14.6 μm,15.0 μm,15.4 μm, 16.4 μm,11.5 μm,12.9 μm,13.6 μm,14.1 μm,14.6 μm,15.0 μm,15.4 μm,3.2 μm,22.2 μm,22.5 μm,2 μm, or 22.2 μm.
Further, the microlenses may form a spot diameter D of 0.1 μm to 7.8 μm, such as 0.1 μm,0.3 μm,0.4 μm,0.5 μm,0.6 μm,0.7 μm,0.8 μm,1.0 μm,1.1 μm,1.2 μm,1.4 μm,1.5 μm,1.6 μm,1.7 μm,1.8 μm,2.0 μm,2.2 μm,2.4 μm,2.5 μm,2.6 μm,2.8 μm,3.1 μm,3.4 μm,3.6 μm,3.7 μm,3.9 μm,4.0 μm,4.9 μm, or 7.8 μm, on the lower surface of the flexible substrate layer.
Further, the thickness t of the collimating aperture layer may be 0.5-7 μm, such as 0.5 μm,1 μm,2 μm,3 μm,4 μm,5 μm, or 7 μm.
Further, the collimating aperture diameter φ may be 1-10 μm, such as 1 μm,2 μm,3 μm,4 μm,5 μm,6 μm,8 μm, or 10 μm.
Further, the refractive index n1 of the collimating lens layer may be 1.34-1.7, such as 1.34,1.4,1.47,1.48,1.5,1.59,1.6,1.65,1.66, or 1.7.
Further, the refractive index n2 of the flexible substrate layer may be 1.48 to 1.7, such as 1.48,1.49,1.5,1.6,1.65,1.66 or 1.7.
Further, the collimating film provided by the invention comprises a collimating lens layer (41), a flexible substrate layer (42) (simply referred to as a substrate) and a collimating aperture layer (43), wherein the collimating lens layer is arranged on the upper surface of the substrate, the collimating aperture layer is arranged on the lower surface of the substrate, the collimating lens layer (41) comprises a micro lens array (41A) and a thick meat layer (41B), and the collimating aperture layer (43) comprises a light-shielding medium (43A) and a collimating aperture array (composed of a certain number of collimating apertures (43B)) formed after the medium is hollowed out.
In examples 1 to 24, the collimating lens array and the collimating aperture array in the collimating film are both arranged in a regular triangle, the collimating lens layer (41) is made of PMMA, the flexible substrate layer (42) is made of PET, the light-shielding medium (43A) of the collimating aperture layer (43) is inorganic plated titanium carbide, and the collimating film is perforated with collimating apertures (43B) in a microlens perforation manner. The other parameters are as follows:
p is 10-30 μm, R is 9.4-20.6 μm, H is 3-27.4 μm, n1 is 1.5;
t is 25 μm, n2 is 1.65, D is 0.3-4.0 μm;
t is 2.0 μm and φ is 4.0 μm. Further, the deviation Δ is 0.18 to 0.90 μm.
In embodiments 25 to 30, the collimating lens array and the collimating aperture array in the collimating film are both arranged in a regular triangle, the collimating lens layer (41) is made of PMMA, the flexible substrate layer (42) is made of PET, the light-shielding medium (43A) of the collimating aperture layer (43) is inorganic plated titanium carbide, the collimating film punches the collimating aperture (43B) in a microlens punching manner, and the other parameters are as follows:
p is 10-25 μm, R is 6.1-19.8 μm, H is 2.5-10.7 μm, n1 is 1.5;
t is 10-50 μm, n2 is 1.65, D is 0.6-3.9 μm;
t is 1.0-3.0 μm, and phi is 2.0-5.0 μm. Further, the deviation Δ is 0.26 to 0.49 μm.
In embodiments 31 to 40, the collimating lens array and the collimating aperture array of the collimating film are both arranged in a regular triangle, the collimating lens layer (41) is made of PMMA, the flexible substrate layer (42) is made of PET, the light-shielding medium (43A) of the collimating aperture layer (43) is inorganic plated titanium carbide, the collimating film is perforated with collimating apertures (43B) by using microlenses, and other parameters are as follows:
p is 10-50 μm, R is 16-30.2 μm, H is 1.1-21.3 μm, n1 is 1.5;
t is 50 μm, n2 is 1.65, D is 0.1-7.8 μm;
t is 0.5 μm and phi is 1.0-8.0 μm. Further, the deviation Δ is 0.21 to 0.88 μm.
In embodiments (41) to (47), the collimating lens array and the collimating aperture array of the collimating film are both arranged in a regular triangle, the collimating lens layer (41) is made of PMMA, the flexible substrate layer (42) is made of PET, the light-shielding medium (43A) of the collimating aperture layer (43) is inorganic plated titanium carbide, the collimating film is perforated by using microlenses to form collimating apertures (43B), and other parameters are as follows:
p is 30 μm, R is 19.3 μm, H is 10.8 μm, n1 is 1.5;
t is 38 μm, n2 is 1.65, D is 3.6 μm;
t is 0.5-7 μm and phi is 5.0-10.0 μm. Further, the deviation Δ is 0.46 to 0.99 μm.
In embodiments 48 to 57, the collimating lens array and the collimating aperture array of the collimating film are both regularly triangularly and closely arranged, the collimating lens layer (41) is made of PMMA, and further, is polymerized from a photo-curable acrylic resin, the refractive index n1 is adjustable from 1.4 to 1.6, when n2=1.65, the flexible substrate layer (42) is made of PET, when n2=1.5, the flexible substrate layer (42) is made of COP, the light-shielding medium (43A) of the collimating aperture layer (43) is inorganic-coated titanium carbide, the collimating film is perforated with collimating apertures (43B) by using a microlens perforation method, and other parameters are as follows:
p is 20-25 μm, R is 15.9-22.5 μm, H is 3.2-9.2 μm, n1 is 1.4-1.6;
t is 38-50 μm, n2 is 1.5-1.65, D is 0.5-3.6 μm;
t is 2.0 μm and φ is 4.0 μm. Further, the deviation Δ is 0.25 to 0.66 μm.
In example 58, the collimating lens array and the collimating aperture array of the collimating film are both arranged in a square shape (as shown in fig. 7), the collimating lens layer (41) is made of PMMA, the flexible substrate layer (42) is made of PET, the light-shielding medium (43A) of the collimating aperture layer (43) is inorganic plated titanium carbide, the collimating film is perforated with collimating apertures (43B) by using a microlens perforation method, and other parameters are as follows:
p is 25 μm, R is 19.6 μm, H is 11.1 μm, n1 is 1.5;
t is 38 μm, n2 is 1.65, D is 3.9 μm;
t is 2.0 μm and phi is 4.0 μm. Further, the deviation Δ was 0.69 μm.
The invention also provides a preparation method of the collimating film, and the collimating holes are punched by adopting a micro-focusing method.
Furthermore, in the preparation method, laser is vertically irradiated on the collimating lens layer, the laser is focused through the micro-lens of the collimating lens layer, and a collimating hole is punched on a collimating hole layer by a focused light spot. In the preparation method, the distribution of the collimating aperture array and the micro-lens array is completely consistent, and the circle center of any collimating aperture is on the main optical axis of the corresponding micro-lens.
Further, the preparation method comprises the following steps:
(1) Forming the collimating lens layer on the upper surface of the flexible substrate layer by adopting a lens array (concave) mould (light curing, heat curing, hot press forming and other modes can be adopted) to form a lens array (convex);
(2) Coating/plating a shading medium on the lower surface of the substrate layer by adopting a wet method/dry method coating technology;
(3) The large-area flat-top laser (parallel laser after Gaussian beam shaping) is adopted, a micro-lens array is vertically irradiated with proper low energy, each micro-lens is focused on a shading medium (namely, a micro-focusing method) and corresponding collimating holes are punched, so that collimating hole arrays in the same distribution are generated, and a collimating hole layer is formed.
Further, the micro-focusing method comprises the following features:
(1) Flat-top laser after beam shaping is adopted as a laser source, the irradiation area is enlarged after shaping, and the energy density is reduced;
(2) The front side is irradiated, the energy density is low, and the energy is concentrated through the micro-focusing process of the micro-lens per se, so that the high energy density is realized;
(3) The micro-focused light spot is small enough in a reasonable range, the focal point position needs to be designed on the lower surface of the PET or a deeper position, and energy is concentrated on the shading layer (shading medium);
(4) The micro-lens layer has high universality, and is applicable to irregular micro-lens layers, such as poor lens arrangement precision and shape precision, uneven spacing and even disorder.
Further, the process of the micro-focusing method (as shown in fig. 4) is divided into four basic steps: (a) Flat-top laser (5) is applied to a collimating lens layer (41) of a collimating film semi-finished product with proper energy (too high hole is too large, even the hole is burnt to a substrate, too low, no hole is formed), micro focusing is realized by a micro lens (41A), pre-reduction of the area of a light spot is realized by a thick plate (41B), finally the laser penetrates through the substrate layer (42) and is focused into a very small light spot on a shading medium (43A), and high concentration of energy is realized; (b) Due to the absorption of the light by the shading medium, the energy is instantaneously accumulated to cause the shading medium at the position of the light spot to be instantaneously burnt through and generate some ash, and actually, the process of the first two steps only needs microsecond level and is very quick; (c) After the ash is extracted, the alignment holes (43B) are exposed, and are basically positioned on the main optical axis (40) of the micro lens, so that the alignment holes are highly aligned with the micro lens (41A), and the time-consuming alignment process is avoided, at the moment, the alignment film (4) is a finished product and comprises a complete structure, namely an alignment lens layer (41), a base layer (42) and an alignment hole layer (43); (d) The collimating film (4) meets the normal direction or is high in collimated light passing close to the normal direction at the moment, a testing light source (such as white light, green light and a triple-wave lamp) with common intensity can be used for irradiating from the surface of the micro-lens during online production, light can penetrate through the collimating hole, a light hole array image can be observed on the back surface, the penetrating light intensity can be quantized, the punching quality can be tested, automatic detection can be easily realized on an assembly line in the process, and the map image obtained by sampling and capturing at a specific position can also be subjected to data analysis (the size, the distance, the array form and the like of the hole).
Compared with the micro-focusing method for perforating provided by the invention, the traditional perforating mode has larger limitation (as shown in figure 5): (a) Gaussian laser (7) is focused through a lens group of the laser head and is shot on the shading medium (43A) from the back direction of the semi-finished product; (b) The different positions of the light shielding layer are sequentially burnt through, and some ash is generated; (c) exposing the collimating holes as ash is drawn away. It can be seen that, in the whole alignment process, an original point O (or called Mark point) needs to be located, a CCD (Charge Coupled Device) high-definition camera on the front side aligns to the optical center of a lens, a laser head on the back side can be linked with the CCD camera on the front side, and the position of a corresponding collimation hole is found, so as to calculate the initial displacement (vector or coordinate difference) between the first point and the position, the initial positioning process is time-consuming and complex, and the requirement on equipment is high; then, all the point positions can be calculated and positioned according to the initial displacement and the point displacement, 2-n points are sequentially punched, although the time can be shortened by using a vibrating mirror group in the process, n cannot be set too large, otherwise, the accumulated error inevitably exceeds 1 micrometer and is even larger, especially, the vibrating mirror can cause the angle inclination, the light spot becomes larger and deforms, and the error is accumulated more and more quickly; finally, when the error is unacceptably accumulated, the origin O is returned and the first point is found again, i.e. the initial positioning process is repeated. Throughout the whole process, although the time is shortened by adopting the galvanometer group, the n can not be too large, and the initial positioning process needs to be frequently carried out, so that the method is time-consuming, complex and dependent on equipment, and the punching process is high in cost and low in precision.
Further, the limitations of the conventional punching method are not limited to this: the process of positioning the first point and calculating the 2-n points needs a precondition that the distance between the micro lenses is completely accurate; in fact, on one hand, the mold for the microlens is also prepared by laser drilling, and errors are inevitably generated, so that the alignment error of the traditional mode is further increased, especially when the mold precision is not so high; on the other hand, some special molds produce irregular microlens layers, which have poor arrangement precision and shape precision of the microlenses, or have non-uniform or even disordered designed spacing. Thus, the phase change of the conventional process increases the mold precision and manufacturing cost of the microlens layer, resulting in very high cost of the whole collimating film, not to mention the realization of the alignment punching of the irregular microlens layer (while the micro-focusing method of the present invention can be easily realized).
It should be noted that the microlens array forming method should be selected according to the kind and application of the transparent polymer, and the present invention is not preferred; the coating mode of the shading medium is selected according to the type of the shading medium, the organic coating needs to be selected from a wet coating mode, and the inorganic coating needs to be selected from a dry coating (namely physical vapor deposition) mode.
It should be noted that the method for preparing the collimating film provided by the invention is suitable for producing sheets and is also suitable for producing coiled materials.
The collimating film can be used as a flexible collimating device for an image sensor module. The collimating film can collimate and filter diffused light at a single-point pixel position of an image to a certain degree to form a normal small beam light signal, and transmits the normal small beam light signal to a corresponding photoelectric sensor, and is particularly suitable for large-size, ultrathin and even flexible image identification modules.
Compared with the prior art, the collimating film provided by the invention adopts the polymer film with the thickness of 10-50 μm as the flexible substrate layer, realizes the flexibility, ultrathin and large size of the collimating device, and is particularly suitable for large-size, ultrathin and even flexible image recognition modules.
Compared with the prior art, the collimating film provided by the invention adopts a micro-focusing method to punch, the distribution of the collimating hole array is completely consistent with that of the micro-lens array, the circle center of each collimating hole is positioned on the main optical axis of the corresponding micro-lens, the collimating holes are aligned in a one-to-one high-precision manner, and the alignment deviation is less than 1 mu m, so that the transmission of signal light is greatly improved, the collimating structure is allowed to be further reduced (such as the micro-lens and the collimating holes are synchronously reduced) to reduce crosstalk, the signal-to-noise ratio of the collimating film is improved, the production efficiency is greatly improved, and the cost is reduced.
Compared with the prior art, the collimating film provided by the invention only comprises one collimating aperture layer, the problem that two layers of collimating diaphragms are difficult to align with each other is fundamentally solved, the collimating film is low in thickness, good in toughness and not easy to break, the circle center of the collimating aperture prepared by adopting a micro-focusing method is on the main optical axis of the corresponding micro-lens, and the collimating aperture is accurately aligned with the corresponding micro-lens. The preparation method of the collimating film provided by the invention is easy to operate, can be used for mass production, and improves the production yield. The collimating film provided by the invention has excellent performance, and can filter diffused light through collimated light. The collimating film provided by the invention can be applied to large-size and ultrathin image recognition modules, so that the mass production of the large-size, ultrathin and even flexible image recognition modules is greatly improved, and when the collimating film is applied to a fingerprint unlocking scheme of consumer electronic products such as mobile phones (OLED screens), the collimating film has obvious advantages due to great market demands and higher pursuits on the characteristics of ultrathin, large screens, flexibility and the like.
In addition, the orderly distributed collimating structure (which means that the microlens array of the collimating lens layer is orderly arranged) can meet the basic image recognition requirement in practical application, but there are interference fringes caused by too high regularity, as shown in fig. 11 a. Therefore, it is necessary to optimize the collimating structure to a disordered distribution, destroy regularity, and weaken interference fringes, as shown in fig. 11b, in order to further improve the image recognition accuracy (recognition rate).
The micro-lens array of the collimating lens layer of the interference-reducing collimating film provided by the invention is arranged in disorder, and the micro-focusing punching mode is adopted, so that the collimating hole array of the collimating hole layer is completely consistent with the micro-lens array, the characteristic of disorder distribution is kept, high-precision coaxial alignment is also maintained, and the traditional punching mode can not be realized all the time. The disordered microlens array collimating film can destroy the regularity of the ordered microlens array and weaken interference fringes caused by the regularity (as shown in fig. 11 b) so as to further improve the image recognition accuracy (recognition rate) of the collimating film provided by the invention.
The collimating lens array and the collimating hole array of the disordered array collimating film (interference reducing collimating film) are disordered arrays, and the microlenses are closely arranged and overlapped with each other (as shown in fig. 12, the coordinates of the main optical axes of any three mutually overlapped microlenses are connected into a common triangle (not a regular triangle)). In the interference reducing collimating film (disordered collimating film), the value range of P is 5-55 μm, the distance P between the main optical axes of the two mutually overlapped microlenses changes in a certain value range in a disorder manner, the variation of the distance P between the adjacent main optical axes is A (the difference between the highest value and the lowest value in the value range of P), the median of the distance P between the adjacent main optical axes is Pm (the average value of the highest value and the lowest value in the value range of P), and then Pm-0.5A is not less than Pm and not more than Pm +0.5A; the median value Pm is selected from 10 to 50 μm, preferably 15 to 30 μm, and more preferably 18 to 25 μm, and the variation A of the main optical axis pitch P is selected from 1 to 10 μm, preferably 2 to 6 μm.
Furthermore, in the interference reducing collimation film (disordered collimation film), the radius R of the micro lens is 6.1-30.2 μm, the height H of the collimation lens layer is 1.1-27.4 μm, and the refractive index n1 of the collimation lens layer material is 1.34-1.7; in the flexible matrix layer, the thickness T of the flexible matrix layer is 10-50 mu m, and the refractive index n2 of the material of the flexible matrix layer is 1.48-1.7; in the collimation hole layer, the thickness t of the collimation hole layer is 0.5-7 μm, and the diameter phi of the collimation holes in the collimation hole array is 1-10 μm.
In embodiments 81 to 86, the collimating lens array and the collimating aperture array in the collimating film are both disordered arrays, and the microlenses are closely arranged and overlapped with each other (as shown in fig. 12, the primary optical axis coordinates of any three microlenses overlapped with each other are connected into a common triangle (not a regular triangle), the distance P between the primary optical axes of the two microlenses overlapped with each other changes in a disordered manner within a certain value range (Pm ± 0.5A), the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating aperture layer 43 is inorganic plated titanium carbide, the collimating film punches collimating apertures 43B in a microlens punching manner, and other parameters are as follows:
p is Pm +/-0.5A, pm is 30 μm, A is 1-10 μm, R is 20.6 μm, H is 27.4 μm, and n1 is 1.5;
t is 25 μm, n2 is 1.65, D is 3.1 μm;
t is 2.0 μm and phi is 4.0 μm. Further, the deviation Δ was 0.81 μm.
Compared with the prior art, the interference-reducing collimating film provided by the invention only comprises one collimating aperture layer, the problem that two collimating diaphragms are difficult to align with each other is fundamentally solved, the thickness is low, the toughness is good, the collimating diaphragm is not easy to break, the circle center of the collimating aperture prepared by adopting a micro-focusing method is positioned on the main optical axis of the corresponding micro-lens, and the collimating aperture is accurately aligned with the corresponding micro-lens. The preparation method of the interference-reducing collimating film provided by the invention is easy to operate, can be used for mass production, and improves the production yield. The interference reduction collimation film provided by the invention has excellent performance, can filter diffused light by collimated light, and reduces the light interference phenomenon. The interference reduction collimation film provided by the invention can be applied to large-size and ultrathin image identification modules, so that the mass production of the large-size, ultrathin and even flexible image identification modules is greatly improved, and when the interference reduction collimation film is applied to a fingerprint unlocking scheme of consumer electronic products such as mobile phones (OLED screens), the market demand is extremely high, and the pursuit for the characteristics such as ultrathin, large screens and flexibility is higher, so that the interference reduction collimation film has obvious advantages.
On the other hand, the invention provides a laminated collimating film, which comprises a laminated adhesive layer and the interference reducing collimating film; and the bonding glue layer is bonded with the collimation hole layer in the interference reduction collimation film.
Further, the adhesive layer is selected from one of a solid optical transparent adhesive, a high-transmittance pressure-sensitive adhesive or a transparent hot melt adhesive.
Furthermore, the thickness of the adhesive layer is 5-35 μm.
On the other hand, the invention also provides an image identification module which sequentially comprises a collimation layer, a filter layer and a photoelectric sensing layer; the collimation layer is selected from the laminated collimation film or the interference reduction collimation film.
Fig. 14 is a schematic diagram of a trend of screen enlargement of an image recognition module (taking an OLED mobile phone fingerprint recognition module as an example), which shows top views of four types of OLED mobile phones (01), wherein a fingerprint recognition module (03) is arranged below an OLED screen (02), and a finger (04) needs to be placed in a specific area to be recognized and unlocked: the fingerprint identification module is small, so that an icon is often displayed in the area when the screen is activated so as to indicate the accurate placement position of a finger; (b) The coverage area of the fingerprint identification module reaches about 1/4 screen, and the problem of expanding from single-finger identification unlocking to double-finger identification unlocking is solved; (c) And (d) the design is designed to realize half screen and even full screen, and higher requirements are provided for the large screen of the fingerprint identification module.
Fig. 15 is a schematic diagram of an image recognition module (taking an OLED mobile phone fingerprint recognition module as an example), in the complete fingerprint module, an interference reduction collimation film layer (05) is located at the middle layer, an OLED screen (02) is arranged above the collimation film, and an optical filter layer (06) and a photoelectric sensing layer (07) are arranged below the collimation film. When the collimating film is a soft base component, its dimensional stability (thermal shrinkage, thermal expansion, wrinkles, etc.) is a weak point, and thus it needs to be bound with an underlying component to increase the overall stiffness and thickness when used in a large area, the underlying component may be a hard base component (e.g., a filter layer), or may be a soft base component (e.g., a filter layer may be made of a soft base, and the photo-sensor chip may be made of a TFT (thin film transistor).
The attaching type alignment film provided by the invention is provided with the attaching glue layer (44), and can attach the alignment film of a soft base (namely a flexible base layer) and a lower component of an image recognition module, so that the dimensional stability of the alignment film is improved, as shown in figure 16. Obviously, the flatness of the alignment film after lamination is higher, optical distortion caused by film material waves (wave) can be reduced, and the accuracy of image recognition is enhanced.
The laminated alignment film has four main structures from top to bottom, namely a disordered array alignment lens layer (41), a flexible substrate layer (42), an alignment hole layer (43) and an adhesive layer (44), as shown in fig. 17. Wherein, the design parameters of the disordered array collimating lens layer (41), the flexible base layer (42) and the collimating hole layer (43) are completely the same as those of the interference reducing collimating film, and the thickness of the bonding glue layer (44) is T 2 Selected from 5 to 50 μm, preferably 10 to 25 μm, too thin a glue layer may result in poor adhesion (either before or after reliability) and too thick a glue layer may result in loss of signal light or crosstalk. As shown in fig. 18: (a) Under normal conditions, if signal light is focused on the collimating aperture layer and then is scattered on the photoelectric sensor, light spots which are larger than the small apertures but smaller than the photoelectric sensor are generated, and the signal is completely received at the moment; (b) However, if the thickness of the glue layer becomes thicker, the distance between the photo-sensors becomes longer and the light spot becomes larger, damage will occurLosing; (c) When the glue layer is too thick, the distance between the photoelectric sensors is too far, the light spots are too large, and even the mutual crosstalk phenomenon of overlapping of adjacent light spots can be generated.
Further, the adhesive layer can be selected from solid OCA (optically clear adhesive), high-transmittance PSA (pressure sensitive adhesive) or transparent hot melt adhesive, and the like, and is preferably OCA and PSA with high light transmittance and reworkability. Furthermore, the materials of the OCA and the PSA are respectively selected from a thermosetting polyacrylate system or a light-curing polyacrylate system.
Further, in the conformable collimating film, the collimating lens array and the collimating aperture array are disordered arrays, and the microlenses are closely arranged and overlapped with each other (as shown in fig. 12, the primary optical axis coordinates of any three mutually overlapped microlenses are connected into a common triangle (not a regular triangle), in the interference reducing collimating film (disordered collimating film), the value range of P is 5 to 55 μm, the primary optical axis distance P of the two mutually overlapped microlenses varies disorderly within a certain value range, the variation amount of the adjacent primary optical axis distance P is a (difference between the highest value and the lowest value in the value range of P), the median value of the adjacent primary optical axis distance P is Pm (average value of the highest value and the lowest value in the value range of P), pm-0.5A is equal to or less than Pm +0.5A, pm is selected from 10 to 50 μm, preferably 15 to 30 μm, further preferably 18 to 25 μm, and the variation amount of the primary optical axis distance P is selected from 1 to 10 μm, preferably 2 to 6 μm.
Furthermore, the radius R of the micro lens is 6.1-30.2 μm, the height H of the collimating lens layer is 1.1-27.4 μm, and the refractive index n1 of the collimating lens layer material is 1.34-1.7; in the flexible matrix layer, the thickness T of the flexible matrix layer is 10-50 mu m, and the refractive index n2 of the material of the flexible matrix layer is 1.48-1.7; in the collimation hole layer, the thickness t of the collimation hole layer is 0.5-7 μm, and the diameter phi of the collimation holes in the collimation hole array is 1-10 μm.
The invention also provides a preparation method of the bonded collimating film, and the collimating holes are punched by adopting a micro-focusing method.
Furthermore, in the preparation method, laser is made to vertically irradiate the collimating lens layer, the laser is focused through the micro lens of the collimating lens layer, and a light spot formed by focusing falls on the collimating lens layer to form a collimating hole. In the laminated collimating film prepared by the method, the distribution of the collimating hole array and the micro-lens array is completely consistent, and the circle center of any collimating hole is on the main optical axis of the corresponding micro-lens.
The invention also provides a preparation method of the laminated collimating film, which comprises the following steps:
(1) Preparing a reduced interference collimation film;
(2) And tearing off the light release film from the OCA/PSA adhesive tape, and attaching the adhesive layer to the alignment hole layer.
Further, the preparation method comprises the following steps:
(1) Preparing the interference reducing collimation film provided by the invention;
(2) Tearing the light release film from the OCA/PSA adhesive tape, attaching the adhesive layer to the back surface (collimation hole layer) of the collimation film, and performing pressurization, temperature rise and vacuum pumping to perform air exhaust and bubble removal;
(3) Before use, the heavy release film is torn off, so that the laminating type collimating film can be obtained, and the OCA/PSA adhesive layer is used for laminating the lower layer part.
In examples 93 to 102, the collimating lens array and the collimating aperture array in the collimating film are disordered arrays, and the microlenses are closely arranged and overlapped with each other (as shown in fig. 12, the principal axes of any three mutually overlapped microlenses are connected to form a common triangle, the distance P between the principal axes of the two mutually overlapped microlenses varies disorderly within a certain range (Pm ± 0.5A), wherein the median Pm is 18 μm or 15 μm, the variation a is 4 μm, i.e., the range of P is 18 ± 2 μm or 15 ± 2 μm, and other parameters are listed in table 10, the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating aperture layer 43 is inorganic plating titanium carbide, the collimating film is formed by perforating the microlenses to form the collimating apertures 43B, the other parameters are listed in table 10, the bonding adhesive layers 44 of examples 93 to 99 are solid OCAs, the material is a thermosetting polyacrylate system, the adhesive layer 44 of example 100 is a high-pressure sensitive adhesive layer, and the curing adhesive layer 44 is a high-pressure sensitive adhesive layer 102, and the curing adhesive layer is a high-pressure sensitive adhesive layer comprising the following curing optical acrylate material, and the curing adhesive layer is a high-pressure sensitive adhesive layer 102, and the curing adhesive layer is a high-pressure sensitive adhesive layer comprising the following curing example:
p is Pm +/-0.5A, pm is 18 μm, A is 4 μm, R is 14.8 μm, H is 16.3 μm, and n1 is 1.5;
t is 25 μm, n2 is 1.65, D is 1.1 μm;
t is 2 μm and φ is 4 μm. Further, the deviation Δ was 0.41 μm.
Or P is Pm +/-0.5A, pm is 15 μm, A is 4 μm, R is 17 μm, H is 2.4 μm, and n1 is 1.5;
t is 50 μm, n2 is 1.65, D is 0.5 μm;
t is 0.5 μm and φ is 5.0 μm. Further, the deviation Δ was 0.25 μm.
Compared with the prior art, the laminated collimating film provided by the invention only comprises one collimating aperture layer, the problem that two layers of collimating diaphragms are difficult to align with each other is fundamentally solved, the thickness is low, the toughness is good, the collimating film is not easy to break, the circle center of the collimating aperture prepared by adopting a micro-focusing method is positioned on the main optical axis of the corresponding micro-lens, and the collimating aperture is accurately aligned with the corresponding micro-lens. The preparation method of the laminated collimating film provided by the invention is easy to operate, can be used for mass production, and improves the production yield. The laminated collimating film provided by the invention has excellent performance, can filter diffused light by collimated light, and reduces the light interference phenomenon. The laminated alignment film provided by the invention has the laminated adhesive layer, can be laminated with a lower component, improves the dimensional stability of the flexible alignment film and reduces optical distortion. The laminated collimating film provided by the invention can be applied to large-size and ultrathin image identification modules, so that the mass production of the large-size, ultrathin and even flexible image identification modules is greatly improved, and when the laminated collimating film is applied to a fingerprint unlocking scheme of consumer electronic products such as mobile phones (OLED screens), the laminated collimating film has obvious advantages due to great market demands and higher pursuit on the characteristics such as ultrathin, large screens and flexibility. The image identification module provided by the invention has high identification accuracy, and can be applied to fingerprint unlocking and the like of consumer electronic products such as mobile phones (OLED screens).
It should be noted that, in the collimating film of the present invention, the light-shielding medium of the collimating aperture layer has a light-shielding function, and can shield light, that is, the transmittance of light in a specific wavelength band is less than a certain value. In general, for optical sensor use, the transmittance of the light-shielding medium should be at least <1%, i.e. the cut-off depth (cut-off level) OD 2. The light-shading medium adopts an opaque organic coating and an inorganic coating, and key substances contained in the medium are light-absorbing substances selected from carbon, carbide, carbonitride, sulfide and the like. In fact, the light-shielding medium of the present invention can also adopt a metal coating, and besides the above-mentioned opaque black light-absorbing substance, the metal coating can also realize the light-shielding function, and when the transmittance is less than 1%. The metal coating can be made very dense, with the same thickness, having advantages both in terms of cut-off depth (deeper, lower transmittance, less noise) and cut-off range (wavelength range cut off) (as shown in fig. 20 a). Therefore, a three-layer shading design of a black light absorption material layer, a metal coating and a black light absorption material layer can be adopted, and a better shading effect is achieved.
In the image identification module, the photosensitive wave bands of different photoelectric sensors are different, and light rays of corresponding wave bands must be blocked by the shading layer, otherwise, the light rays are received by the photoelectric sensors, and noise is generated. In a common photoelectric sensor, the photosensitive waveband of a CMOS is 400-1100nm, and the photosensitive waveband of a TFT is 400-850nm. Therefore, the metal coating in the three-layer shading design has a depth cut-off characteristic aiming at the near infrared region, so that the metal coating has certain advantages when being used in an image recognition module with a photoelectric sensor being a CMOS, and if a light absorbing substance is simply adopted as a shading layer (the shading medium of the collimation hole layer forms the shading layer), the thickness needs to be increased for compensation.
The metal coating in the three-layer shading design also has the following advantages: 1. compared with metal carbides, metals have lower general melting points (most metals have melting points less than 2000 ℃, but carbides are often higher than 3000 ℃, for example, titanium/zirconium has a melting point of 1675 ℃/1852 ℃, but titanium/zirconium carbide has a melting point of 3160 ℃/3540 ℃ respectively), and when the metal is subjected to laser drilling, the metal forms a circular boundary (a crater, as shown in 43B2 in fig. 22) of a molten recasting region (also called a recasting layer), so that the shape of the hole is better controlled, the roundness is higher (of course, the recasting region is not necessarily round, but does not influence light transmission), and special-shaped holes are not easy to generate; 2. the metal has ductility, the thin metal coating has certain flexibility, the problems of crack, pulverization and the like are not easy to generate in the punching process (the metal carbide is brittle and is easy to generate crack and pulverization), and the reliability is higher, as shown in a comparison graph 21.
It should be noted that the three-layer light-shielding design also has certain advantages over the single-layer metal plating or the two-layer (upper black light-absorbing material layer + lower metal plating) design: fig. 20b illustrates a disadvantage of the metal coating, i.e. the reflectivity is much higher than that of the black light absorbing material, the high reflectivity of the front side can result in more energy being required for laser drilling (much energy is reflected off), or the appropriate laser needs to be selected, the metal layer absorbs a stronger wavelength band for drilling, which reduces the versatility of the device, while the high reflectivity of the back side can result in cross-talk light 082 capable of being incident at a large angle and passing through the aperture, and when the cross-talk light is reflected back to the back side of the metal coating by the interface below the aperture (e.g. the interface of the backsize layer and the filter layer), the re-reflection can result in 0822, i.e. the cross-talk light is reflected multiple times below the aperture, as shown in fig. 25.
As shown in fig. 23, if the black light absorbing material 43A1 is disposed on the upper and lower sides of the metal plating layer 43A2, the energy of the laser is absorbed by the upper layer 43A1 (fig. 24, reflectivity <4%, transmittance <1%, and absorption > 95%), and the converted heat is also rapidly transferred to the metal plating layer through the upper layer to be heated, melted, and evaporated, thereby forming a collimating hole, and the melting and evaporation of the metal are a rapid heat dissipation process, so that the black light absorbing material is not easy to accumulate heat to crack and pulverize; while lower layer 43A1 helps absorb multiple reflections of crosstalk light 0822 below the aperture, as shown in fig. 26. Therefore, the three-layer shading design is not only beneficial to improving the roundness of the collimation hole, ensuring that the whole shading layer is not easy to crack and has higher reliability, but also beneficial to improving the utilization of laser energy, further reducing noise and improving the signal-to-noise ratio.
Compared with a single-layer shading design, the manufacturing process of the three-layer shading design needs two more steps on the manufacturing process of the back, namely, firstly manufacturing the black light absorbing material layer on the upper layer (close to the inner layer), then manufacturing the metal coating on the middle layer, and finally manufacturing the black light absorbing material layer on the lower layer (close to the outer layer). If the black light-absorbing substances of the upper layer and the lower layer are the same, reciprocating winding coating equipment can be adopted, and at least two chambers can complete three-layer processing.
Furthermore, in the collimating film provided by the invention, the collimating film sequentially comprises a collimating lens layer, a flexible substrate layer and a collimating hole layer; the collimating lens layer comprises a micro-lens array and a thickness; the collimation hole layer comprises a shading medium and a collimation hole array formed after the shading medium is hollowed out.
The collimation hole layer comprises a shading dielectric layer (shading layer for short) and a collimation hole array.
Further, the shading medium sequentially comprises an upper black light absorption material layer, a metal coating and a lower black light absorption material layer.
Furthermore, the shading medium sequentially comprises an upper black light absorption substance layer, a metal coating and a lower black light absorption substance layer, the upper black light absorption substance layer is arranged between the flexible substrate layer and the metal coating, and the metal coating is arranged between the upper black light absorption substance layer and the lower black light absorption substance layer.
The shading medium is of a three-layer structure, the upper layer is a black light absorption material layer, the middle layer is a metal coating, and the lower layer is a black light absorption material layer.
The ratio of the thickness of the middle layer metal coating in the total thickness of the three-layer structure of the shading medium is 10-90%, and preferably 30-70%. The ratio of the thicknesses of the upper black light absorbing material layer and the lower black light absorbing material layer is 0.1 to 10, preferably 0.5.
Further, the black light absorbing substance is selected from one of simple carbon, carbide, carbonitride and sulfide. Further, the metal coating is selected from one of indium, tin, zinc, antimony, magnesium, aluminum, strontium, cerium, germanium, lanthanum, silver, gold, copper, manganese, gadolinium, nickel, cobalt, yttrium, iron, titanium, platinum, zirconium, chromium, hafnium, niobium, or molybdenum suitable for magnetron sputtering.
The black light absorbing material of the upper black light absorbing material layer and the lower black light absorbing material layer may be the same or different, and is preferably the same for convenience of the process.
Further, the metal plating layer is preferably one of tin, zinc, aluminum, germanium, silver, copper, manganese, nickel, cobalt, iron, titanium, chromium, niobium, or molybdenum. The metal coating raw materials are more common and have low cost.
The coating method of the light-shielding medium is selected according to the type of the light-shielding medium, the black light-absorbing substance can be selected from a wet coating method, a dry coating method can also be selected, the dry coating method is preferred, and the metal coating layer needs to be selected from a dry coating method (such as physical vapor deposition).
Furthermore, in the interference reduction collimation film provided by the invention, the shading medium is designed into three layers, the upper layer is a black light absorption material layer, the middle layer is a metal coating, and the lower layer is a black light absorption material layer.
Furthermore, in the laminated collimating film provided by the invention, the shading medium is designed into three layers, the upper layer is a black light absorption substance layer, the middle layer is a metal coating, and the lower layer is a black light absorption substance layer.
In embodiments 103 to 112, the collimating lens array and the collimating aperture array in the collimating film are both disordered arrays, and the microlenses are closely arranged and overlapped with each other (as shown in fig. 12, the primary optical axis coordinates of any three microlenses overlapped with each other are connected into a common triangle, the distance P between the primary optical axes of the two microlenses overlapped with each other changes in a disordered manner within a certain value range (Pm ± 0.5A), wherein the median Pm is 18 μm, the variation a is 4 μm, that is, the value range of P is 18 ± 2 μm, and other parameters are listed in table 11, the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating aperture layer 43 is designed as a light-shielding three layer, the upper and lower layers are both black light-absorbing substances 43A1, and the middle layer is a metal plating layer 43A2, the collimating film is punched with the microlenses to form collimating apertures 43B, the laminating adhesive layer 44 of embodiments 103 to 112 is a solid OCA, and the material is a thermosetting polyacrylate system; examples 103 to 112 are each a simple substance of carbon, chromium carbide, titanium carbide, boron carbide, titanium carbonitride, boron carbonitride, ferrous sulfide, molybdenum disulfide, cobalt disulfide, and nickel sulfide, the metal plating layers are each aluminum, germanium, silver, copper, manganese, nickel, cobalt, iron, titanium, and chromium, the ratio of the thickness of the middle layer metal plating layer to the total thickness of the three-layer structure of the light-shielding medium is 10%, 30%, 50%, 70%, 90%, and the ratio of the thicknesses of the upper layer black light-absorbing substance layer and the lower layer black light-absorbing substance layer is 0.1, in the cutoff performance for near infrared, the transmittance of the whole full band is less than 5%, the reflectance is less than 4%, the absorption rate is greater than 90%, and the utilization rate for laser energy is high, the front and back surfaces of the light-shielding media (having a three-layer structure) of examples 103 to 112 have excellent cutoff performance for visible light, and good cutoff performance for near infrared, and the transmittance of the whole full band is less than 1%, the reflectance is less than 4%, the absorption rate is greater than 95%, and the utilization rate for laser energy is extremely high.
After the shading medium (shading layer) in the technical scheme provided by the invention adopts a three-layer structure design (the upper layer is a black light-absorbing material layer, the middle layer is a metal coating, and the lower layer is a black light-absorbing material layer), the light-blocking performance and the light-transmitting performance of the collimating film are basically not influenced. But the light ray cut-off performance is better, especially the cut-off depth of infrared light can reach OD2 level, simultaneously the circularity of collimation hole is better, the shading layer is difficult to be cracked, the reliability is higher, in addition, compared with the collimation film with the shading medium being the single-layer metal coating, the technical scheme has the advantages that the utilization rate of laser energy is higher, the noise is further reduced, and the signal to noise ratio is further improved.
It should be noted that the three layer design suffers from the following problems: three-layer shading design procedures are more, process management and control are more complex, and when the collimation performance is expected to be adjusted through the increase of the thickness of the shading layer, the deposition time of an inorganic coating (such as a metal coating) is greatly increased, and great influence is generated on the cost. Therefore, in the iterative development process of the present invention, a better way needs to be found: both can realize the shading function with single-layer structure, can avoid the relatively poor problem of hole form on single-layer extinction material layer when laser drilling again.
In fact, it is a better solution to use a black positive photoresist for the light-shielding layer. Although the exposure light source still needs to focus on the shading layer through the micro-lens layer, the whole exposure process is a moderate slow process, and adverse phenomena such as high temperature, burst and the like do not occur. The holes of the light shielding layer are exposed after exposure of the positive photoresist and washing by the developing solution, and the holes are high in roundness and good in shape (cannot generate crater shapes). Meanwhile, the photoresist can be attached to the lower surface of the base layer in a coating mode, and the thickness of the photoresist can be easily adjusted through viscosity, so that the thickness of the light shielding layer can be easily controlled.
Furthermore, in the collimating film provided by the invention, the collimating film sequentially comprises a collimating lens layer, a flexible substrate layer and a collimating aperture layer; the collimating lens layer comprises a micro-lens array and a thickness; the collimation hole layer comprises a shading medium and a collimation hole array formed after the shading medium is hollowed out; the distribution of the collimation hole array is completely consistent with that of the micro-lens array, and each collimation hole is arranged on the main optical axis of the corresponding micro-lens.
The collimation hole layer comprises a shading dielectric layer (shading layer for short) and a collimation hole array.
Further, the light-shielding medium is a black positive photoresist. The black positive photoresist has a single-layer (i.e., one-layer) structure.
Further, the light-shielding medium is a single-layer black positive photoresist.
Further, the black positive photoresist comprises a black light absorbing material and a transparent positive photoresist.
The black light absorbing substance is selected from one of simple carbon, carbide, carbonitride and sulfide.
The transparent positive photoresist is preferably a phenolic resin/diazonaphthoquinone (Novolak/DNQ) system, and because the system is exposed by adopting G line (with the wavelength of 436 nm), H line (with the wavelength of 405 nm) or I line (with the wavelength of 365 nm), the light rays are all in near ultraviolet region (UVA-blue light band), compared with a positive photoresist system adopting deep ultraviolet region (DUV), the light ray wavelength is closer to visible light, the influence of dispersion is relatively smaller, and the lens can be controlled after being focused.
Further, the light-shielding dielectric layer is formed by attaching a black positive photoresist layer 43A3 to the lower surface of the substrate layer by wet coating (a). The thickness of the black positive photoresist is adjusted by viscosity and coating process. The black positive photoresist is finally transformed into a collimation hole layer 43 (as shown in fig. 27) with stable performance through the processes of soft baking (B), exposure by a micro-focusing method (c), post-exposure baking (d), development (e), hard baking (f) and the like, and includes a black positive photoresist layer 43A3 and a micro-focusing collimation hole 43B3 thereof. And (g) finally carrying out optical inspection on the finished collimating film to prove that the collimating film has collimating performance.
Furthermore, the thickness t of the collimation hole layer is 3-7 μm.
Furthermore, the cut-off performance of the black positive photoresist layer to visible light and infrared light at least reaches an OD2 level, that is, the transmittance is less than or equal to 1%.
Further, the preparation method of the collimation film provided by the invention is characterized in that the collimation holes of the collimation film are punched by adopting a micro-focusing method; in the preparation method, the shading layer adopts black positive photoresist, matched near ultraviolet light (G line, H line or I line) vertically irradiates the collimating lens layer, the near ultraviolet light is focused through the micro-lens of the collimating lens layer, and a light spot formed by focusing falls on the collimating lens layer to form a collimating hole.
Further, in the interference reduction collimation film provided by the invention, the light-shielding medium is a single-layer black positive photoresist (also called a single-layer black positive photoresist layer).
Further, in the laminated alignment film according to the present invention, the light-shielding medium is a single-layer black positive photoresist (also referred to as a single-layer black positive photoresist).
Embodiments 113-120 provide a collimating film, including a collimating lens layer, a flexible substrate layer, and a collimating aperture layer, the collimating lens layer being disposed on an upper surface of the substrate layer, the collimating aperture layer being disposed on a lower surface of the substrate layer, the collimating lens layer including a micro-lens array and a thickness, the collimating aperture layer including a light blocking medium and a collimating aperture array formed after the medium is hollowed out, the collimating aperture array including a number of collimating apertures. The collimating lens array and the collimating hole array of the collimating film are both in regular triangle tight arrangement. The collimating lens layer is made of PMMA (polymethyl methacrylate), the flexible substrate layer is made of PET (polyethylene terephthalate), the light shading medium of the collimating hole layer is a single-layer black positive photoresist, and the black positive photoresist comprises a black light absorption substance and a transparent positive photoresist. The collimating film is punched by adopting a micro-focusing method, collimating holes are generated by exposure and development of a black positive photoresist layer, the distribution of a collimating hole array is completely consistent with that of a micro-lens array, the circle centers of any collimating hole are all on the main optical axis of the corresponding micro-lens, and the collimating holes are aligned in a one-to-one high-precision manner. The black light absorption substance layer is carbon black, chromium carbide, titanium carbide or titanium carbonitride, and the transparent positive photoresist is a phenolic resin/diazonaphthoquinone system.
Wherein P is the minimum distance of the main optical axis of the micro lens and is 30 mu m; r is the curvature radius of the micro lens and is 19.3 mu m; h is the thickness of the collimating lens layer and is 10.8 mu m; n1 is the refractive index of the collimating lens layer, is dimensionless, and is 1.5; t is the thickness of the flexible substrate layer and is 38 mu m; n2 is the refractive index of the flexible matrix layer, is dimensionless and is 1.65; d is the diameter of a light spot formed on the lower surface of the flexible substrate layer after being focused by the micro lens, and is 3.6 mu m; t is the thickness of the collimating aperture layer and is 3-7 μm, such as 3 μm,4 μm,5 μm, or 7 μm; phi is the diameter of the collimating aperture and is 3.5-5.5 μm, such as 3.5 μm,4.0 μm,4.5 μm,5.0 μm, or 5.5 μm; θ is the minimum angle of skew light that can be filtered by the collimating film to measure the collimating and filtering effect, and is 3.5 ° -5.5 °, such as 3.5 °,4 °,4.5 °,5 °, or 5.5 °; k is the ratio of the actual transmittance to the maximum transmittance of the collimating film, and is 0.81-0.91, such as 0.81,0.85,0.87,0.89, or 0.91.Δ is 0.45,0.57 or 0.69.
The single-layer black positive photoresist in the collimating film provided by the invention can realize the shading function, the hole roundness of the hole formed by perforating by adopting a micro-focusing method is higher, the hole shape is good, and the problems that the production process is complex when a shading layer adopts a three-layer structure, and the hole shape is poor after laser perforating when a single-layer structure is adopted are solved. Furthermore, the single-layer black positive photoresist in the alignment film provided by the invention is easy to control the thickness, and the problem that the thickness is difficult to control when the light shielding layer adopts a three-layer structure is solved.
In subsequent studies, it was found that in addition to the above-mentioned roundness of the planar shape of the hole, there is another advantage in opening the hole by using the photoresist: based on the three-dimensional shape of the hole and the matching property of the collimation light path, the signal to noise ratio can be further improved by regulating and controlling the three-dimensional shape of the hole. For example, when the exposure focus is moved from the center of the light-shielding layer to the position below the light-shielding layer (namely when the focus is farther), the apertures on the two sides of the hole are asymmetric and have a difference of small bottom and large top, and at the moment, the three-dimensional shape of the hole is changed into an inverted circular truncated cone from an approximate cylinder; the hole gradually converging in the depth direction has little influence on signal light, but obviously shields stray light with a slightly large angle, and is favorable for further improvement of the signal-to-noise ratio.
As shown in comparative diagram 29 (illustrated with rays falling at the optical axis): when the three-dimensional shape of the hole is an approximate cylinder (called a quasi-focus collimation hole herein), the thick light shielding layer side wall can only shield stray light of more than 15 degrees, the common situation is acceptable, and when the fingerprint is fine and smooth (such as children and female fingers) and needs higher resolution analysis and identification, the collimation performance requirement of the collimation film is higher, at the moment, light of 10 degrees is easily confused with signal light within 7.5 degrees, and influence is generated; when the three-dimensional shape of the hole is an inverted circular truncated cone (called as far-focus collimating hole herein), the aperture of the lower surface is smaller than that of the upper surface, so that light of 10 degrees is also shielded on the side wall of the light shielding layer, the collimation performance of the collimating film is better, and the signal-to-noise ratio is higher; of course, the aperture of the collimating aperture may be designed to be consistent with the lower surface of the far-focus collimating aperture to seek shielding of stray light, but the signal light is also shielded by the smaller aperture of the upper surface, and the loss is serious.
In order to improve the reliability of the alignment film (e.g., the hollow hole deforms after reliability), and to retain the shape advantage of the opening of the photoresist, it is more advantageous to use the negative transparent photoresist to expose and cure to prepare the far-focus alignment via with the solid body than the far-focus alignment hole prepared by the positive black photoresist.
The collimation hole layer is a collimation passage layer, and the collimation passage layer comprises a collimation passage array and a shading medium.
The collimation passage array comprises a plurality of inverted round table-shaped collimation passages.
The collimation hole layer is a collimation passage layer, and the collimation passage layer comprises an inverted truncated cone-shaped collimation passage array and a shading medium.
The collimation passage is an inverted round table-shaped transparent negative photoresist. The shading medium is black negative photoresist. The collimation passage layer is of a one-layer structure (single layer).
Furthermore, in the far focus exposure alignment film provided by the invention, the alignment film sequentially comprises an alignment lens layer, a flexible substrate layer and an alignment hole layer; the collimating lens layer comprises a micro-lens array and a thickness; the collimation hole layer is a collimation passage layer, and the collimation passage layer comprises an inverted truncated cone-shaped collimation passage array and a shading medium. The collimating passages are distributed in a light shielding medium; the shading medium is distributed in the collimating passage gap and is complementary with the collimating passage array. The distribution of the collimation passage array is completely consistent with that of the micro lens array, and each collimation hole is arranged on the main optical axis of the corresponding micro lens.
The collimation passage layer comprises a shading medium layer (shading layer for short) and an inverted circular truncated cone-shaped collimation passage array.
The inverted circular truncated cone-shaped collimation passage is called as a far-focus collimation passage. The radius of the upper surface circle of the inverted round table is r 1 Radius of the lower surface circle is r 2 ，1.5μm≤r 2 <r 1 ≤3.5μm；
Furthermore, the thickness t of the collimation passage layer is 3-6 μm.
Further, the taper V of the far-focus collimation passage is 0.15-0.5, V = (r) 1 -r 2 )/t。
Further, the light-shielding medium is a black negative photoresist. The black negative photoresist is a single-layer (i.e., one-layer) structure.
Further, the light-shielding medium is a single-layer black negative photoresist.
Further, the black negative photoresist comprises a black light absorbing material and a transparent negative photoresist.
The black light absorbing substance is selected from one of simple carbon, carbide, carbonitride and sulfide.
Furthermore, the inverted circular truncated cone-shaped collimation passage array is a single-layer transparent negative photoresist layer.
The transparent negative photoresist is selected from polyvinyl alcohol cinnamate or a cyclized rubber-bis-azide system.
The transparent negative photoresist is preferably one of polyvinyl alcohol cinnamate and cyclized rubber-bis-azide system. The two systems can be exposed by adopting ultraviolet full spectrum and cured by adopting a high-pressure mercury lamp, and are as convenient as the traditional UV curing resin.
Furthermore, the light-shielding medium and the transparent negative photoresist of the inverted circular truncated cone-shaped collimation passage array are preferably the same system, so that the compatibility and the bonding force of the light-shielding medium and the transparent negative photoresist of the inverted circular truncated cone-shaped collimation passage array are improved.
Furthermore, the cut-off performance of the light-shielding medium (black negative photoresist) of the collimation passage layer on visible light and infrared light at least reaches OD2 level, namely the transmittance is less than or equal to 1%.
Further, the collimating passage layer is prepared by the process shown in fig. 30, the inverted truncated cone-shaped collimating passage array is prepared by using a transparent negative photoresist, the unexposed area is washed away by the processes of coating (a), soft baking (b), exposure (c) by a micro-focusing method, post-exposure baking (d), development (e), hard baking (f) and the like, and the exposed transparent solid array with stable performance is reserved as the collimating passage of the signal light during imaging; the shading medium is prepared by adopting a black negative photoresist, and is finally converted into a black shading layer with stable performance through the technical processes of coating (g), soft baking (h), exposure (i), hard baking (j) and the like; and finally, carrying out optical inspection (k) on the finished collimating film to prove that the collimating film has collimating performance. Wherein, the step (c) of the focusing method exposure in the preparation process of the transparent negative photoresist adopts a flat-top beam ultraviolet light source 8, and the step (i) of the exposure in the preparation process of the black negative photoresist adopts a common ultraviolet light source 9.
The collimating film with the inverted circular truncated cone-shaped collimating passage array is also called as an afocal exposure collimating film.
Furthermore, in the far-focus exposure alignment film provided by the invention, the alignment hole layer is an alignment passage layer and comprises an alignment passage array and a shading medium, the alignment passage is an inverted round table-shaped transparent negative photoresist, and the shading medium is a black negative photoresist and is designed in a single layer.
Furthermore, in the interference reduction collimation film provided by the invention, the collimation hole layer is a collimation passage layer and comprises a collimation passage array and a shading medium, the collimation passage is an inverted round table-shaped transparent negative photoresist, and the shading medium is a black negative photoresist and is designed in a single layer.
Furthermore, in the laminated alignment film provided by the invention, the alignment hole layer is an alignment passage layer and comprises an alignment passage array and a shading medium, the alignment passage is an inverted truncated cone-shaped transparent negative photoresist, and the shading medium is a black negative photoresist and is designed in a single layer. Embodiments 121-133 provide a afocal exposure collimating film comprising a collimating lens layer disposed on an upper surface of a substrate layer, a flexible substrate layer, and a collimating aperture layer disposed on a lower surface of the substrate layer, the collimating lens layer comprising a microlens array and a thickness, the collimating aperture layer being a collimating via layer comprising a light blocking medium and an inverted truncated cone-shaped collimating via array; the collimating lens array and the collimating passage array of the collimating film are both in regular triangle tight arrangement. The collimating lens layer is made of PMMA, the flexible base layer is made of PET, the shading medium of the collimating hole layer is a single-layer black negative photoresist, and the black negative photoresist comprises a black light absorption substance and a transparent negative photoresist. The collimating film is punched by adopting a micro-focusing method, a focused focus falls below the light shielding layer (called far focus for short), a collimating passage is generated by exposing and curing the far focus of the transparent negative photoresist, the collimating passages are all far focus collimating passages, the distribution of the collimating passage array and the micro-lens array is completely consistent, the circle centers of any collimating holes are all on the main optical axis of the corresponding micro-lens, and the collimating holes are aligned in a one-to-one high-precision manner. The black light absorption substance layer is carbon black, chromium carbide, titanium carbide or titanium carbonitride, and the transparent negative photoresist is a cyclized rubber-double-azide system or a polyvinyl alcohol cinnamate system.
Wherein, P is the minimum distance of the main optical axis of the micro lens and is 30-40 μm; r is the radius of curvature of the microlens and is 19.3 μm to 30.0 μm, such as 19.3 μm,21.2 μm,23.8 μm,24.6 μm, or 30.0 μm; h is the thickness of the collimating lens layer and is 8.7 μm to 21.1 μm, such as 8.7 μm,12.7 μm,14.2 μm,15.2 μm,15.7 μm,16.0 μm,16.7 μm,19.1 μm,20.2 μm, or 21.1 μm; n1 is the refractive index of the collimating lens layer, dimensionless, and is 1.38 to 1.65, e.g., 1.38,1.47,1.5,1.6,1.65; t is the thickness of the flexible matrix layer and is from 25 μm to 75 μm, such as 25 μm,38 μm,50 μm, or 75 μm; n2 is the refractive index of the flexible matrix layer, is dimensionless and is 1.65; t is the thickness of the collimating aperture layer and is 3-6 μm, for example 3 μm,4 μm,5 μm, or 6 μm; r is 1 The radius of the circle on the upper surface of the inverted circular truncated cone-shaped quasi-straight-through road is 2.7-3.5 μm, such as 2.7 μm,2.9 μm,3.0 μm,3.1 μm,3.2 μm, or 3.5 μm; r is 2 The radius of the circle on the lower surface of the collimating passage in the shape of an inverted truncated cone is 1.5-2.9 μm, such as 1.5 μm,1.8 μm,2.0 μm,2.3 μm,2.5 μm,2.7 μm, or 2.9 μm; v is the taper of the inverted truncated cone-shaped collimation passage, and is 0.15-0.5, such as 0.15,0.2,0.25,0.3,0.35,0.4, or 0.5; θ is the minimum angle of oblique light that the collimating film can filter out to measure the collimating filter effect, 3.0 ° -4.5 °, such as 3.0 °,3.5 °,4 °, or 4.5 °; k is the ratio of the actual transmittance to the maximum transmittance of the collimating film, and is 0.86-0.94, such as 0.86,0.87,0.88,0.89,0.91,0.93, or 0.94.Δ is 0.42 to 0.48, such as 0.42,0.43,0.44,0.45,0.46,0.47, or 0.48.
The single-layer black negative photoresist in the far-focus exposure alignment film provided by the invention can realize the shading function, and the transparent alignment passage formed by exposing and curing the transparent negative photoresist by adopting the micro-focusing method has higher roundness and good shape, thereby solving the problems of complex production process when the shading layer adopts a three-layer structure and poor hole shape after laser drilling when the single-layer structure is adopted. Furthermore, the single-layer black/transparent negative photoresist in the far-focus exposure alignment film provided by the invention is easy to control the thickness, and the problem that the thickness is difficult to control when the light shielding layer adopts a three-layer structure is solved. Furthermore, the collimation hole layer of the far-focus exposure collimation film provided by the invention is a collimation passage layer and comprises a collimation passage array and a shading medium, the collimation passage is in an inverted round table shape and is called as a far-focus collimation passage, and compared with a columnar collimation passage, the far-focus exposure collimation film is easier to shade stray light, so that the far-focus exposure collimation film has better collimation performance and higher signal-to-noise ratio in application.
Drawings
FIG. 1 is a schematic diagram of the basic principle of a collimating device;
FIG. 2 is a graph illustrating the effect of alignment accuracy of a collimated structure on signal strength; the higher the alignment precision is, the higher the signal intensity is;
FIG. 3 is a graph of the effect of the aspect ratio of the collimating structure on the crosstalk strength; the higher the length-diameter ratio, the smaller the crosstalk strength;
FIG. 4 illustrates a micro-focusing method of drilling;
FIG. 5 illustrates a conventional drilling alignment error accumulation process;
FIG. 6 is a schematic cross-sectional view of a collimating film provided by the present invention;
FIG. 7 is a schematic perspective view of a collimating film provided by the present invention (square arrangement);
FIG. 8 is a schematic perspective view of a collimating film provided by the present invention (regular triangle arrangement);
FIG. 9 is a schematic cross-sectional view of a collimating film (collimating sheet) provided in a comparative example;
FIG. 10 is a process of testing light blocking performance (minimum light blocking angle) of the collimating film provided by the present invention;
FIG. 11a shows interference fringes produced by an ordered collimating structure;
FIG. 11b shows interference fringes produced by a disordered collimating structure;
FIG. 12 is a top view of a collimating lens layer in a disordered distribution (to illustrate the meaning of the disordered distribution);
FIG. 13 is a schematic perspective view of an interference reducing collimating film provided by the present invention (the microlens array is in disordered distribution);
FIG. 14 is a diagram illustrating a trend of a large screen of an image recognition module (taking an OLED mobile phone fingerprint recognition module as an example);
FIG. 15 is a schematic diagram of an image recognition module (taking an OLED mobile phone fingerprint recognition module as an example);
FIG. 16 is a schematic view of a bonded alignment film bonded to a lower member (taking an OLED mobile phone fingerprint recognition module as an example);
FIG. 17 is a four layer basic structure of a conformable collimating film;
FIG. 18 shows the effect of the thickness of the adhesive layer on the signal reception of the photosensor;
FIG. 19 is a schematic view of a laminated collimating film structure;
FIG. 20a is a schematic diagram showing the transmittance comparison between the black light absorbing material layer (43A 1) and the metal plating layer (43A 2);
FIG. 20b is a graph showing the reflectance comparison between the black light absorbing material layer (43A 1) and the metal plating layer (43A 2);
FIG. 21 is a graph showing the effect of micro-focus via holes (43B 1) of a black light-absorbing material layer and micro-focus via holes (43B 2) of a metal plating layer;
FIG. 22 shows a crater shape (001 is a plan view/002 is a sectional view) formed by laser drilling of a metal plating layer;
FIG. 23 is a schematic structural view of a light-shielding medium with a three-layer structure;
FIG. 24 is a schematic diagram of the transmission and reflection rates of a light-blocking medium for a three-layer light-blocking design;
fig. 25 is a schematic diagram of a structure of a light-shielding medium having a two-layer structure and crosstalk optical lines;
fig. 26 is a schematic diagram of a structure of a light-shielding medium having a three-layer structure and crosstalk optical lines;
FIG. 27 is a schematic view of an exposure development process for opening a black positive photoresist layer;
FIG. 28 is a schematic structural view of a collimating film provided by the present invention;
FIG. 29 is a comparison of the shading performance of collimating holes of an approximate cylinder and an inverted circular truncated cone;
FIG. 30 is a schematic diagram of a process for preparing an afocal collimating tunnel array;
fig. 31 is a schematic structural diagram of an afocal exposure alignment film provided by the present invention.
Wherein:
1: target image, 11 to 17: 7 continuous pixel points of the target image; 2: collimator, 21: top (entrance) collimating structure layer, 22: a bottom (light-emitting) collimating structure layer; 3: photoelectric sensing chip, 31-37: 7 photoelectric sensors corresponding to the continuous pixel points; 4: the collimating film provided by the invention, 4': comparative example provided collimating film, 40: central axis of collimating structure (microlens principal axis), 41: collimating lens layer, 41A: microlens array, 41B: thickness of meat, 41C: microlens apex, 42: flexible substrate layer, 43: collimation aperture layer, 43A: light-shielding medium, 43B: a collimating aperture; 43C: transparent negative resist, 43D: transparent inverted truncated cone-shaped collimation passage array, 43E: a black negative photoresist; 5: flat-top beam laser; 6: inspecting the light source; 7: gaussian beam laser; 8: a flat-topped beam ultraviolet light source; 9: a common ultraviolet light source; o: laser positioning origin; 01: OLED cell phone, 02: OLED screen, 03: fingerprint identification module, 04: finger, 05: interference reducing collimation film layer, 06: infrared filter layer, 07: photoelectric sensing layer (including photoelectric sensing chip, flexible circuit board and reinforcement base plate), 44: adhesive layer, 43A1: black light-absorbing material layer, 43A2: metal plating layer, 43A3: black positive resist layer, 43B1: micro-focus perforation of the black light-absorbing substance layer, 43B2: micro-focus drilling of metal plating, 43B3: micro-focusing collimation holes (small holes generated by exposure and development) of a black positive photoresist layer; 081: crosstalk light that does not pass through the aperture; 082: crosstalk light passing through the aperture; 0821: directly incident crosstalk light below the small hole; 0822: the crosstalk light is reflected multiple times below the aperture.
Detailed Description
In order to make the structure and features of the invention easier to understand, preferred embodiments of the invention will be described in detail below with reference to the drawings.
Comparative example 1
Fig. 9 shows a collimating film for contrast, which includes a collimating lens layer 41, a flexible substrate layer (substrate for short) 42 and a collimating hole layer 43, the collimating lens layer is disposed on the upper surface of the substrate, the collimating hole layer is disposed on the lower surface of the substrate, the collimating lens layer 41 includes micro-transparent materialA mirror array 41A and a thick layer 41B, wherein the collimation hole layer 43 comprises a shading medium 43A and a collimation hole array (composed of a certain number of collimation holes 43B) formed by hollowing out the medium; the thickness T of the flexible substrate layer is 25 mu m. The collimating lens array and the collimating hole array of the collimating film are both in regular triangle close arrangement (as shown in fig. 8). The minimum distance P of the main optical axis of the micro lens is 18 mu m, the curvature radius R is 12.6 mu m, the thickness H of the collimating lens layer (the vertical distance from the top point of the micro lens to the upper surface of the substrate) is 8.5 mu m, the thickness t of the collimating hole layer is 2 mu m, and the diameter phi of the collimating hole is 4 mu m. The micro-lens array and the thick material of the collimating lens layer are both transparent polymer PMMA, the refractive index n1 is 1.5, the flexible substrate layer is made of transparent polymer film PET, the refractive index n2 is 1.65, and the shading medium 43A of the collimating hole layer 43 is inorganic coating titanium carbide. The collimating film is punched with collimating holes 43B by conventional laser punching (as shown in FIG. 5), the central positions of the main optical axis 40 and the collimating holes 43B have alignment deviation, and holes are punched one by one from the laser positioning origin O, and the alignment deviation of the first hole is Δ 1 The misalignment of the nth hole is Δ n ，Δ n-1 <Δ n (n is a natural number greater than 2), the presence of n makes the misalignment Δ exceed 1 μm or even greater. The light transmission coefficient k is easily reduced, even to less than 0.6, and reaches the evaluation level of "poor".
Example 1
As shown in fig. 6, the collimating film provided by the present invention includes a collimating lens layer 41, a flexible substrate layer 42 and a collimating aperture layer 43, the collimating lens layer is disposed on the upper surface of the substrate, the collimating aperture layer is disposed on the lower surface of the substrate, the collimating lens layer 41 includes a micro lens array 41A and a thick flesh 41B, the collimating aperture layer 43 includes a light-shielding medium 43A and a collimating aperture array (composed of a certain number of collimating apertures 43B) formed after the medium is hollowed out; the thickness T of the flexible substrate layer is 25 mu m. The collimating lens array and the collimating aperture array of the collimating film are both in regular triangle close arrangement (as shown in fig. 8). The minimum distance P of the main optical axis of the micro lens is 18 mu m, the curvature radius R is 12.6 mu m, the thickness H of the collimating lens layer is 8.5 mu m, the thickness t of the collimating hole layer is 2 mu m, and the diameter phi of the collimating hole is 4 mu m. The micro-lens array and the thick material of the collimating lens layer are both transparent polymer PMMA, the refractive index n1 is 1.5, the flexible substrate layer is made of transparent polymer film PET, the refractive index n2 is 1.65, and the shading medium 43A of the collimating hole layer is inorganic coating titanium carbide. The collimating film adopts a micro-focusing method to punch holes (as shown in fig. 4) to punch collimating holes 43B, the distribution of the collimating hole arrays is completely consistent with that of the micro-lens arrays, the circle centers of any collimating hole are all on the main optical axis 40 of the corresponding micro-lens, the collimating holes are aligned in a one-to-one high-precision manner, and the alignment deviation delta between the circle center of the collimating hole and the main optical axis of the corresponding micro-lens is 0.47 μm and less than 1 μm. When the hole is punched, laser is just focused on the lower surface of PET in a micro-focusing mode, the diameter D of a light spot is 1.7 mu m, the minimum light blocking angle theta is 7.5 degrees, the light transmission coefficient k is 0.98, and the integral performance advantage is obvious compared with that of the comparative example 1.
In fact, the combination of the structural parameters of the collimating lens is not limited to the above embodiments: aiming at the same collimation filtering effect, various changes can be made according to the material and the refractive index of the collimation lens layer, the material and the refractive index of the flexible matrix layer, such as correspondingly changing P, R, H, phi, t and the like; aiming at the light shielding effect of the collimating holes with the same thickness t, various changes can be made to the light shielding medium, such as changes of the types, combinations and even proportions of organic coatings and inorganic coatings.
The properties of the collimating films provided by the present invention were evaluated in the following manner.
(A) Light-blocking Property
The final important performance index of a collimating film is the ability to block stray light, and is generally evaluated by the minimum angle at which oblique light can be blocked. When various parameters of the collimating film are determined, the minimum angle θ capable of completely blocking oblique Light can be obtained through conventional optical simulation software (Light tools, zeMax, tracepro, etc.) or theoretical calculation. As shown in fig. 10, in the process of testing the minimum angle of the collimating film, the light blocking performance is classified into 5 levels according to the size of θ (accurate to 0.5 °), and the corresponding relationship in sequence is as follows: excellent: theta is more than or equal to 0 degree and less than 5 degrees, preferably: theta is more than or equal to 5 degrees and less than 7.5 degrees, good: theta is more than or equal to 7.5 degrees and less than 10 degrees, wherein: theta is more than or equal to 10 degrees and less than 15 degrees, difference: theta is more than or equal to 15 degrees.
(B) Light transmission performance
Another important performance criterion of collimating films is the ability to transmit signal light. The alignment precision between the collimating hole and the micro-lens can be checked by using a vertical collimating light source for incidence: when the alignment degree is high enough, the light spot is always in the diameter range of the collimation hole, the light transmittance is the best, and the transmittance is the maximum (obtained by optical simulation or standard sample test of a laser head under the high-precision condition, generally about 90 percent); when the alignment error increases, the transmittance will continuously attenuate; since the number of collimating holes is very large, the transmittance change can be tested under macroscopic conditions in this way, and the alignment degree can be compared. The ratio of the transmittance obtained by the test to the highest transmittance (the highest transmittance refers to the transmittance measured under the condition that the main optical axis of the micro lens is completely coincided with the central line of the corresponding collimating hole) is defined as a transmittance k, and the transmittance k is 1 when the alignment degree is high enough. The invention divides the light transmission performance into 5 grades according to the size of k, and the corresponding relations are as follows: excellent: k is more than or equal to 1 and more than 0.95, preferably: 0.95 is more than or equal to k and is more than 0.9, good: 0.9 is more than or equal to k is more than 0.8, wherein: 0.8 is more than or equal to k is more than 0.6, the difference is: k is less than or equal to 0.6.
Obviously, both of the above properties are crucial for the collimating film: the larger k is, the stronger the signal is; the smaller θ, the less noise; both parameters are of great help to enhance the image recognition signal-to-noise ratio (SNR).
(C) Spectral characteristics
In designing and optimizing the collimating film, specific spectral characteristics requirements are set for important components, including Transmittance (abbreviated as T%) and Reflectance (abbreviated as R%) for specific wavelength bands (generally divided into visible and near-infrared bands). Meanwhile, the absorption rate (Absorbance, abbreviated as A%) can be calculated by using the transmittance and the reflectance, and the sum of the Absorbance and the reflectance is 100%. The evaluation of the spectral characteristics is detected by using an ultraviolet-visible light-near infrared spectrophotometer, and equipment of models such as Cary5000/7000 of Agilent company can meet the requirements.
Regarding the shading medium, the meaning of T% is the light ray cut-off performance, the invention divides the cut-off performance into 5 grades according to T%, and the corresponding relation is as follows: excellent: t% <0.01%, excellent: t% <0.1%, good: t% <1%, medium: t% <10%, difference: t% is more than or equal to 10%; i.e., OD4, OD3, OD2, OD1, and no cutoff, respectively. The meaning of A% is the light absorption performance, the invention divides the utilization rate of the laser energy into 7 grades according to A%, and the corresponding relations are as follows: extremely high: a% >95%, high: 95% or more than A% and more than 90%, higher: 90% or more A% or more and 65% or less, medium: 65% or more than A% and 35%, lower: 35% or more than A% and 10%, low: 10% ≧ A% >5%, very low: a% is less than or equal to 5%;
examples 2 to 24
In the collimating film provided in embodiment 1, the collimating lens arrays and the collimating hole arrays in the collimating film are both arranged in a regular triangle, the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating hole layer 43 is inorganic plated titanium carbide, the collimating film is perforated with the collimating holes 43B by using a microlens perforation method, and the other parameters are listed in table 1.
TABLE 1 design parameters and optical Properties of examples 1-24
Figure BDA0002948870900000261
Note 1: p is the minimum distance of the main optical axis of the micro lens and is in the unit of mum; r is the curvature radius of the micro lens and the unit is mum; h is the thickness of the collimating lens layer in μm; n1 is the refractive index of the collimating lens layer, and is free of dimensional units; t is the thickness of the flexible substrate layer and the unit of micrometer; n2 is the refractive index of the flexible matrix layer and is free of dimensional units; d is the diameter of a light spot formed on the lower surface of the flexible substrate layer after being focused by the micro lens, and the unit is micrometer; t is the thickness of the collimation bore layer, unit μm; phi is the diameter of the collimating hole and the unit is mum; theta is the minimum oblique light angle which can be filtered by the collimating film and is used for measuring the collimating and filtering effect in unit degree; k is the ratio of the actual transmittance to the highest transmittance of the collimating film, and is used for measuring the alignment precision of the collimating holes and the micro lenses.
As shown in table 1, relatively good examples were designed for different P values on a flexible substrate layer of 25 μm thickness. When the P values are 10, 15, 18, 20, 25 and 30 μm, respectively, four examples are provided. It can be found that when the P value and other conditions are unchanged, and the R value is increased, the lens becomes shallow (the height of the thick lens layer is increased; the height of the lens arch, that is, the height from the top point of the lens to the upper surface of the thick lens layer is decreased), the focal length becomes far, and the light spot of the micro-focus on the light shielding layer becomes large, so that the focal point returns to the light shielding layer by matching with the increase of H, the light spot is reduced, the diameter D of the micro-focus light spot can be continuously reduced by matching the change of R and H, the minimum light blocking angle theta is gradually reduced, and the light blocking performance is improved. For the light transmission performance, the more the spot diameter D is close to the opening (collimating hole) diameter phi, the more the alignment deviation Δ has an influence on the light transmission, and a slight deviation, the loss of the signal light is generated, while the smaller D is, the less the influence on the alignment deviation is, and the light is still in the hole regardless of the direction of movement. In the examples 1 to 24 provided by the invention, the diameter phi of the opening is fixed to be 4 μm, except that D and phi in the examples 21 to 23 are relatively close, other examples maintain certain difference, and the light transmission coefficient k is larger than 0.9. In general, most of examples 1 to 24 can achieve the level of more than two excellent light blocking performance and light transmission performance, and are based on the excellent implementation effect of a flexible substrate with the thickness of 25 μm.
Examples 25 to 30
The collimating film provided in embodiment 1, in which the collimating lens arrays and the collimating aperture arrays are both arranged in a regular triangle, the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating aperture layer 43 is inorganic plated titanium carbide, the collimating film is perforated with micro-lenses to form collimating apertures 43B, and the other parameters are listed in table 2.
TABLE 2 design parameters and optical Properties of examples 25 to 30
Figure BDA0002948870900000271
Figure BDA0002948870900000281
Note 1 is as in Table 1.
As shown in Table 2, examples 25 to 30 are examples of different flexible substrate thicknesses. Examples 25 to 27 are P =10 μm for one set of collimating films with T =10, 15, 20 μm, respectively, and examples 28 to 30 are P =25 μm for another set of collimating films with T =25, 38, 50 μm, respectively, with other parameters being constant. When T is increased continuously, in order to maintain the micro-focusing effect (the focus is always located near the lower surface of the substrate and the light-shielding layer and the light spot is minimized), the micro-lens structure obviously needs to be shallow, i.e. in the case of fixing P value and matching refractive index, R value is increased and H is lowered (compared with the difference of the embodiment in table 1, the focal length design is adapted along with the increase of T, so H does not need to be increased, but is lowered). It can be found that, when other conditions are unchanged, the thickness T is increased, which is beneficial to the structure becoming shallow, the light spot D is reduced, the minimum light-blocking angle θ is reduced, the light-blocking performance is improved, and the light-transmitting coefficient is further improved. Therefore, in the range of thickness allowed (ultra-thin applications are more and more common, and too thick is not allowed), the performance improvement of the alignment film is helpful by using a relatively thick substrate, and the principle that the alignment film with a large length-diameter ratio has better performance (such as the principle shown in fig. 3) is met. In the present invention, T is selected from 10 to 50 μm, and more preferably 25 to 38 μm.
Examples 31 to 40
As in the collimating film provided in embodiment 1, the collimating lens array and the collimating aperture array of the collimating film are both arranged in a regular triangle, the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating aperture layer 43 is inorganic plated titanium carbide, the collimating film is perforated with the collimating apertures 43B by using a microlens perforation method, and the other parameters are listed in table 3.
TABLE 3 design parameters and optical Properties of examples 31 to 40
Figure BDA0002948870900000282
Note 1 is as in Table 1.
As shown in Table 3, it can be seen from comparative examples 31 to 36 that the R value becomes large as the P value increases without changing other conditions, and the focal length becomes far and H becomes large according to a similar principle if the original aspect ratio is maintained. Even if the focal length can be controlled, the spot radii D and θ cannot be prevented from increasing, and k is therefore decreased for the same aperture diameter. Therefore, in general, the larger P value is not favorable for the performance of the collimating film, which also conforms to the principle that the collimating film with a large length-diameter ratio has better performance (as shown in FIG. 3). In addition, in comparative examples 37 and 33, 38 and 34, 39 and 35, when the spot D is sufficiently small, the diameter of the hole Φ can be reduced by adjusting the laser energy, and is not necessarily limited to a fixed value, and it can be found that the light blocking performance can be further improved after the diameter of the hole is reduced, but the light transmission effect is reduced. Example 40 has a P value of 50 μm and a corresponding R and H are both large, and overall for the collimating film of the present invention, the microlens size has reached the upper design limit, including the spot diameter D is also large (D is particularly small, and particularly not well below 0.5 μm, which tends to cause the single point energy to be too high and burn the substrate), resulting in an opening diameter Φ up to the upper limit of 8 μm, while the minimum light-blocking angle θ is also large at 12 degrees, and the light-blocking performance is not very good. In the present invention, P is selected from 10 to 50 μm, preferably 15 to 30 μm, and more preferably 18 to 25 μm. φ is selected from 1 to 10 μm (10 μm from example 47), and more preferably from 3 to 5 μm. D is selected from 0.1 to 7.8. Mu.m, preferably 0.5 to 4.9. Mu.m, and more preferably 1 to 2 μm.
Examples 41 to 47
As in the collimating film provided in embodiment 1, the collimating lens array and the collimating aperture array of the collimating film are both arranged in a regular triangle, the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating aperture layer 43 is inorganic plated titanium carbide, the collimating film is perforated with the collimating apertures 43B by using a microlens perforation method, and the other parameters are listed in table 4.
TABLE 4 design parameters and optical Properties of examples 41 to 47
Figure BDA0002948870900000291
Note 1 is as in Table 1.
As shown in Table 4, examples 41 to 47 have different thicknesses t of the collimating hole layer. As can be seen from comparison of the first group of examples 41 to 44 or comparison of the second group of examples 45 to 47, when other conditions are not changed, increasing t contributes to improvement of light blocking performance, and t is too thin and is not a preferable value. Since laser drilling typically forms holes with smaller aspect ratios, the hole diameter tends to be larger than t, and thus when t is too thick, the hole diameter becomes too large (as in the second set of embodiments), which in fact gradually degrades the light blocking performance. In the present invention, t is selected from 0.5 to 7 μm, preferably 1 to 5 μm, and more preferably 2 to 3 μm.
Examples 48 to 57
The collimating film provided in embodiment 1, wherein the collimating lens array and the collimating hole array of the collimating film are both arranged in a regular triangle, the collimating lens layer 41 is made of PMMA, and further, the collimating lens layer is formed by polymerizing a photo-curable acrylic resin, the refractive index n1 is adjustable from 1.4 to 1.6, when n2=1.65, the flexible substrate layer 42 is made of PET, when n2=1.5, the flexible substrate layer 42 is made of COP, the light-shielding medium 43A of the collimating hole layer 43 is inorganic plated titanium carbide, the collimating film punches the collimating holes 43B in a microlens punching manner, and the other parameters are listed in table 5.
TABLE 5 design parameters and optical Properties of examples 48 to 57
Figure BDA0002948870900000301
Note 1 is as in Table 1.
As shown in Table 5, examples 48 to 57 with different refractive index combinations are shown. As can be seen by comparing the first set of examples 48 to 52, with other conditions unchanged: 1. increasing n1 (comparative examples 50, 48, 49 or comparative examples 51, 52) helps to reduce the speckle D, lower θ and improve light blocking performance, with n1=1.6 being the best and n1=1.4 being the worst; 2. the reduction in n2 (comparison of examples 51, 52 with examples 48, 49) is equally effective. The law of influence of the refractive index remains the same in comparison with the second group of examples 53 to 57, but the influence is not so great since the second group has a shallower structure and the properties are inherently sufficiently excellent. For n1, the selection surface of the molding material with too high or too low refractive index is narrow, while for n2, the physical properties and light transmittance of the flexible substrate are considered, and the refractive index is used only for designing the structure accurately. Thus, in the present invention n1 is selected from 1.4 to 1.6, preferably 1.5. n2 is selected from 1.5 to 1.65, which is not preferred depending on the material difference.
Example 58
As in the collimating film provided in embodiment 48, the collimating lens array and the collimating aperture array of the collimating film are both arranged in a square shape (as shown in fig. 7), the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating aperture layer 43 is inorganic plated titanium carbide, the collimating film is perforated with the collimating apertures 43B by using a microlens perforation method, and the other parameters are listed in table 6.
TABLE 6 design parameters and optical Properties of examples 48, 58
Figure BDA0002948870900000311
Note 1 is as in Table 1.
As can be seen from table 6, when other parameters are not changed, the distribution of the microlenses is changed from regular triangle to square, and a collimating film can still be obtained by matching R and H. But the performance of the collimating film is slightly inferior to the regular triangular distribution. The main reason is that the squares are not dense like regular triangles in distribution, and the squares are larger in ratio between the diagonal lines and P, so that the spherical crowns arranged in the squares are more convex with the same P value, so that light spots are more scattered, D is larger, and theta is increased, the light blocking effect is poor, and the light transmittance is poor due to the fact that D is enlarged. Of course, square arrangement is not undesirable, and a smaller P value needs to be designed to achieve the same effect. The invention does not need to describe more square distribution embodiments, and the square distribution is always within the protection scope of the invention.
Examples 59 to 80
The collimating film as in embodiments 53-57, wherein the collimating lens array and the collimating aperture array of the collimating film are both closely arranged in a regular triangle, the minimum pitch P of the primary optical axes of the microlenses in the collimating lens layer is 20 μm, the radius of curvature R is 18.3 μm, the total thickness of the collimating lens layer is 4.1 μm, the thickness of the flexible substrate layer is 50 μm, the thickness of the collimating aperture layer is 2 μm, and the diameter of the collimating aperture is 4 μm, the collimating film is formed by punching the microlenses to form the collimating apertures 43B, and the alignment errors Δ between the microlenses and the collimating apertures are less than 1 μm. The light blocking angles theta are all smaller than 5 degrees, the light blocking performance is excellent, the light transmission coefficients k are all larger than 0.95, and the light transmission performance is excellent. The material of collimation lens layer, the material of flexible base layer and the material of collimation hole layer shading medium are listed as table 7, and collimation lens layer refracting index n1 and flexible base layer refracting index n2 are according to the material, and vary according to the material, and allow the error that 0.02 is the same with different technology causes of material, no longer list in the table.
TABLE 7 design parameters and optical Properties of examples 59 to 80
Figure BDA0002948870900000321
Note 1 is as in Table 1.
Note 2: for the same material of the collimating lens layer, the molding method is not limited to photocuring, thermocuring, injection molding, hot pressing, etc.
As shown in table 7, it is clear from comparative examples 59 to 80 that the influence of the alignment film performance is not so large when the refractive index of the material is the same or close to that before and after the material is changed.
Examples 81 to 86
A collimating film as provided in example 24, having a cross-section as shown in fig. 6 and a perspective view as shown in fig. 13. The collimating lens array and the collimating hole array in the collimating film are disordered arrays, and the microlenses are closely arranged and overlapped with each other (as shown in fig. 12, the primary optical axis coordinates of any three mutually overlapped microlenses are connected into a common triangle (not a regular triangle), the distance P between the primary optical axes of the two mutually overlapped microlenses changes in a disordered way within a certain value range (Pm ± 0.5A), wherein the median Pm and the variation a are listed in table 8, the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating hole layer 43 is inorganic coating titanium carbide, the collimating film punches the collimating hole 43B by adopting a microlens punching way, and other parameters are listed in table 8.
TABLE 8 design parameters and optical Properties of examples 24 and examples 81-86
Figure BDA0002948870900000331
Note 1: p is the distance between the main optical axes of the two mutually overlapped micro lenses, and the value range of P is Pm +/-0.5A and the unit of mum; pm is the average value of the maximum value and the minimum value in the value range of P, called the median, A is the difference between the maximum value and the minimum value in the value range of P, called the variation, unit mum; r is the curvature radius of the micro lens and the unit is mum; h is the thickness (or called height) of the collimating lens layer in μm; n1 is the refractive index of the collimating lens layer and is free of dimensional units; t is the thickness of the flexible substrate layer and the unit of micrometer; n2 is the refractive index of the flexible matrix layer and is free of dimensional units; d is the diameter of a light spot formed on the lower surface of the flexible substrate layer after being focused by the micro lens, and the unit of the diameter is mum; t is the thickness of the collimation bore layer, unit μm; phi is the diameter of the collimating hole and the unit is mum; theta is the minimum oblique light angle which can be filtered by the collimating film and is used for measuring the collimating and filtering effect in unit degree; k is the ratio of the actual transmittance to the highest transmittance of the collimating film for measuring the alignment accuracy of the collimating holes and the microlenses
Note 2: the collimating lens array and the collimating aperture array of embodiment 24 are both regularly and closely arranged in a triangle; the collimating lens array and the collimating aperture array of examples 81-86 are both disordered arrays, closely arranged;
as can be seen from table 8, when the other parameters were not changed, the alignment film changed from a fixed P value to a P value that varied randomly, and the performance was not substantially affected. The value A is selected from the range of 1 to 10 μm, preferably 2 to 6 μm, as the amount of change. When a is too small, the interference reduction effect is not significant, and when a is too large, the array morphology becomes poorly controlled, reproducibility is poor, and there are many light leakage regions due to too far distance.
Examples 87 to 92
A collimating film as provided in example 4 is shown in fig. 6 in cross-section and in fig. 13 in perspective view. The collimating lens array and the collimating hole array in the collimating film are disordered arrays, and the microlenses are closely arranged and overlapped with each other (as shown in fig. 12, the primary optical axis coordinates of any three mutually overlapped microlenses are connected into a common triangle (not a regular triangle), the distance P between the primary optical axes of the two mutually overlapped microlenses changes in a disordered way within a certain value range (Pm ± 0.5A), wherein the median Pm and the variation a are listed in table 9, the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating hole layer 43 is inorganic coating titanium carbide, the collimating film punches the collimating hole 43B by adopting a microlens punching way, and other parameters are listed in table 9.
TABLE 9 design parameters and optical Properties of example 4 and examples 87-92
Figure BDA0002948870900000341
Note 1 is as in Table 8;
note 2: the collimating lens array and the collimating aperture array of embodiment 4 are both in regular triangle close arrangement; the collimating lens array and the collimating aperture array of examples 87-92 are both disordered arrays, closely arranged;
as can be seen from Table 9, when the other parameters were not changed, the P value of the collimating film changed from a constant P value of 18 μm to a disorder change (a disorder change in the narrowest range of 17.5 to 18.5 μm and the widest range of 13 to 23 μm), and the performance was hardly affected. The value A is a variation selected from 1 to 10 μm, preferably 2 to 6 μm. When a is too small, the interference reduction effect is not significant, and when a is too large, the array morphology becomes poorly controlled, reproducibility is poor, and there are many light leakage regions due to too far distance.
Examples 93 to 102
The cross-section of the collimating film provided in examples 93-102 is shown in FIG. 19. The collimating film comprises a collimating lens array and a collimating hole array, wherein the collimating lens array and the collimating hole array are disordered arrays, microlenses are closely arranged and overlapped with each other (as shown in fig. 12, the primary optical axis coordinates of any three mutually overlapped microlenses are connected into a common triangle, the distance P between the primary optical axes of the two mutually overlapped microlenses is disordered and changed within a certain value range (Pm +/-0.5A), wherein the median Pm is 18 microns or 15 microns, the variation A is 4 microns, namely the value range of P is 18 +/-2 microns or 15 +/-2 microns, other parameters are listed in table 10, the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the shading medium 43A of the collimating hole layer 43 is inorganic coating titanium carbide, the collimating film is punched by the microlenses, the other parameters are listed in table 10, the laminating adhesive layers 44 of the embodiments 93-99 are solid OCA, the material is a thermosetting polyacrylate system, the adhesive layer 44 of the embodiment 100 is a high-pressure sensitive adhesive layer 101, the embodiment 101 is a thermosetting polyacrylate system, and the laminating adhesive layer 44 is a high-pressure sensitive adhesive 102.
TABLE 10 design parameters and optical Properties of examples 93-102
Figure BDA0002948870900000351
Note 1 is as in Table 8;
note 2: the collimating lens array and the collimating aperture array of embodiments 93-102 are disordered arrays and closely arranged;
note 3: t is 2 The thickness of the adhesive layer is expressed in unit of μm;
it can be seen from table 10, examples 93-98 that the thickness of the glue layer (44) does not affect the optical alignment properties (light blocking and light transmission) when the parameters of the three-layer core structure (41, 42, 43) of the interference reduction alignment film are unchanged. But a thickness T 2 Too little can result in poor adhesion (whether before or after reliability), and too much can still result in loss of signal light or crosstalk. In particular, when the thickness T is 2 When the value of (A) is increased to a certain critical value, a collimating film with a shallower microlens structure and a larger length-diameter ratio is needed, such as in example 98 and example 99, a flexible film with a thickness of 50 μm is adoptedA base layer (which is problematic if a 25 μm thickness is still used) and 2.4 μm H. It can be seen from comparison of examples 97 and 100 to 102 that the material of the bonding adhesive layer (44) does not affect the optical alignment performance when the parameters of the three-layer core structure (41, 42, 43) of the interference reduction alignment film are not changed.
It should be understood that in any of the ordered collimating films of the present invention, the P value can be changed to some extent to obtain a new disordered collimating film, and therefore, the Pm value in the disordered collimating film and the P value in the ordered collimating film are both selected from 10 to 50 μm, preferably 15 to 30 μm, and more preferably 18 to 25 μm. The invention only uses the embodiment 24 to carry out disorder optimization, and does not list more embodiments for further description, but does not influence the patent scope of the disorder collimating film provided by the invention.
Examples 103 to 112
A collimating film as provided in example 93, having a cross-section as shown in figure 19. The collimating film is characterized in that a collimating lens array and a collimating hole array are disordered arrays, microlenses are closely arranged and overlapped with each other (as shown in fig. 12, the primary optical axis coordinates of any three mutually overlapped microlenses are connected into a common triangle, the distance P between the primary optical axes of the two mutually overlapped microlenses is disordered and changed within a certain value range (Pm +/-0.5A), wherein the median Pm is 18 mu m, the variation A is 4 mu m, namely the value range of P is 18 +/-2 mu m, other parameters are listed in table 11, the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the shading medium 43A of the collimating hole layer 43 is in three-layer shading design, the upper layer and the lower layer are both black light-absorbing material layers 43A1, the middle layer is a metal plating layer 43A2, the collimating film is punched with the microlenses to form collimating holes 43B, the laminating adhesive layers 44 of the embodiments 103-112 are solid OCA, and the material is a heat-cured polyacrylate system; the black light absorbing material layers of examples 103 to 112 are elemental carbon, chromium carbide, titanium carbide, boron carbide, titanium carbonitride, boron carbonitride, ferrous sulfide, molybdenum disulfide, cobalt disulfide, and nickel sulfide, the metal plating layers are aluminum, germanium, silver, copper, manganese, nickel, cobalt, iron, titanium, and chromium, respectively, the ratio of the thickness of the middle layer to the total thickness of the light-shielding medium three-layer structure is 10%, 30%, 50%, 70%, 90%, and 90%, respectively, the ratio of the thicknesses of the upper layer and the lower layer is 0.1, the light-shielding media of examples 103 to 112 have high utilization rate of laser energy, excellent cut-off performance for visible light on the front and back sides, and good cut-off performance for near infrared, and have transmittance of <1%, reflectance of <4%, and absorption rate of >95% over the entire full band, and extremely high utilization rate of laser energy.
TABLE 11 design parameters and optical Properties for examples 93, 103 to 112
Figure BDA0002948870900000371
Note 1 is as in Table 8;
note 2: the collimating lens array and the collimating aperture array of embodiments 93, 103-112 are disordered arrays, closely arranged;
note 3: t is a unit of 2 The thickness of the adhesive layer is in unit of μm;
as can be seen from a comparison of examples 93 and 103 to 112 in Table 11, the light blocking properties and light transmission properties of the alignment films are not substantially affected when the light blocking medium is changed to a three-layer design (upper layer is a black light absorbing material layer, middle layer is a metal coating, and lower layer is a black light absorbing material layer). However, in the embodiments 103 to 112, the light-blocking performance is better, especially the cut-off depth of the infrared light can reach the level of OD2, and meanwhile, the roundness of the collimating hole is better, the light-shielding layer is not easy to crack, and the reliability is higher, and in addition, compared with the collimating film in which the light-shielding medium is a single-layer metal plating layer, the embodiments 103 to 112 have higher utilization rate of laser energy, further lower noise, and further improve the signal-to-noise ratio.
It should be understood that in any of the above embodiments (1 to 102) of the present invention, the light-shielding medium may be implemented by using a three-layer design of a black light-absorbing material + a metal plating layer + a black light-absorbing material, and further description of the present invention will not be repeated by referring to more embodiments, which does not affect the patent scope of the collimation film provided by the present invention.
Examples 113 to 120
The cross section of the collimating film provided in embodiments 44 to 47 is as shown in fig. 28, and the collimating film includes a collimating lens layer 41, a flexible substrate layer 42, and a collimating aperture layer 43, where the collimating lens layer 41 is disposed on an upper surface of the substrate 42, the collimating aperture layer 43 is disposed on a lower surface of the substrate 42, the collimating lens layer 41 includes a microlens array 41A and a thick microlens 41B, the collimating aperture layer 43 includes a light-shielding medium 43A and a collimating aperture array formed by hollowing out a medium, and the collimating aperture array is formed by a certain number of collimating apertures 43B; the thickness T of the flexible matrix layer 42 is 38 μm. The collimating lens array and the collimating aperture array of the collimating film are both regularly and closely arranged in a triangular shape (as shown in fig. 8), and other parameters and optical properties are listed in table 12. The collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating aperture layer 43 is a black positive photoresist layer 43A3, and the black positive photoresist layer has a single-layer design and includes a black light-absorbing material and a transparent positive photoresist. The collimating film is perforated by adopting a micro-focusing method, and the collimating holes 43B3 (as shown in fig. 27) are generated by exposure and development of a black positive photoresist layer, the distribution of the collimating hole array and the microlens array is completely consistent, the centers of any collimating hole are all on the main optical axis 40 of the corresponding microlens, and the collimating holes are aligned in a one-to-one high-precision manner. The black light absorbing material layers of examples 113 to 117 were carbon black, the transparent positive type resists were of a phenol resin/diazonaphthoquinone system, the black light absorbing material layers of examples 118 to 120 were of chromium carbide, titanium carbide, and titanium carbonitride, respectively, and the transparent positive type resists were of a phenol resin/diazonaphthoquinone system. The front and back surfaces of the light-shielding media of examples 113, 114, and 117 to 120 were excellent in the cutoff performance for visible light and good in the cutoff performance for near infrared, and the front and back surfaces of the light-shielding media of examples 115 and 116 were excellent in the cutoff performance for visible light and good in the cutoff performance for near infrared.
TABLE 12 design parameters and optical Properties of examples 44 to 47 and 113 to 120
Figure BDA0002948870900000381
Note 1: p is the minimum distance of the main optical axis of the micro lens and is in the unit of mum; r is the curvature radius of the micro lens and the unit is mum; h is the thickness of the collimating lens layer in μm; n1 is the refractive index of the collimating lens layer, and is free of dimensional units; t is the thickness of the flexible substrate layer and has a unit of micrometer; n2 is the refractive index of the flexible matrix layer and is free of dimensional units; d is the diameter of a light spot formed on the lower surface of the flexible substrate layer after being focused by the micro lens, and the unit of the diameter is mum; t is the thickness of the collimation bore layer, unit μm; phi is the diameter of the collimating hole and the unit is mum; theta is the minimum oblique light angle which can be filtered by the collimating film and is used for measuring the collimating and filtering effect in unit degree; k is the ratio of the actual transmittance to the highest transmittance of the collimating film, and is used for measuring the alignment precision of the collimating holes and the micro lenses.
As can be seen from the comparison between examples 44 to 47 and 113 to 116 in table 12, after the light-shielding medium is changed to adopt a positive photoresist, the development mode of opening is more related to the focusing of the exposure light source, and the phenomenon of aperture expansion when the energy of the laser opening is too large is not generated, in other words, the aspect ratio of the opening can be made higher, the hole can be made smaller, more circular and more uniform with the same thickness t, and thus the light-shielding performance is significantly improved (represented by θ, the smaller θ is, the better the light-shielding performance is). It can be seen from the comparison of examples 114 and 117 that the same thickness t can still be enlarged as required by the exposure development process (e.g. increasing the aperture by raising the temperature and prolonging the time of the post-exposure bake process), and the appropriate enlargement of the aperture can help to improve the performance due to the reduced light transmittance at higher aspect ratio. From examples 113 to 120, it is understood that even without the dense metal plating layer, the black positive photoresist can completely reach the level of OD2 in the cut-off depth for visible light and infrared light when the thickness t is greater than 3 μm, and can reach the level of OD3 particularly when the thickness t is greater than 5 μm.
It should be understood that any of the above embodiments (1-102) in the present invention can be implemented by using a single layer black positive photoresist as the light-shielding medium, which provides the idea of using the black positive photoresist to form the hole, and the transparent positive photoresist is not limited to the phenolic aldehyde/DNQ system, and further embodiments are not illustrated in the present invention for further description, which does not affect the patent scope of the alignment film provided by the present invention.
Examples 121 to 133
The cross section of the afocal exposure collimating film provided by the invention is shown in fig. 31, and comprises a collimating lens layer 41, a flexible substrate layer 42 and a collimating aperture layer 43, wherein the collimating lens layer 41 is arranged on the upper surface of the substrate 42, the collimating aperture layer 43 is arranged on the lower surface of the substrate 42, the collimating lens layer 41 comprises a micro lens array 41A and a thick meat 41B, and the collimating aperture layer 43 is a collimating passage layer and comprises a light-shielding medium 43E and an inverted truncated cone-shaped collimating passage array 43D; the thickness T of the flexible matrix layer 42 is 38 μm. The collimating lens array and the collimating passage array of the collimating film are both in regular triangle tight arrangement (as shown in fig. 8). The collimating lens layer 41 is made of PMMA (polymethyl methacrylate), the flexible base layer 42 is made of PET (polyethylene terephthalate), the shading medium 43E of the collimating hole layer 43 is a black negative photoresist, the collimating lens is designed in a single-layer mode, and the inverted truncated cone-shaped collimating passage array 43D of the collimating hole layer 43 is a transparent negative photoresist. The collimating film is prepared into an inverted round table-shaped collimating passage array by means of afocal exposure and curing in a micro-lens focusing mode, and other parameters and optical properties are listed in a table 13. The black negative photoresist layer includes a black light absorbing material and a transparent negative photoresist. The collimating film is perforated by adopting a micro-focusing method, the focus falls below the collimating aperture layer and is far away from the collimating aperture layer, a collimating passage array 43D is generated by exposing and developing the transparent negative photoresist, and the collimating passages are all far-focus collimating passages (as shown in fig. 30). The transparent negative resists of examples 121 to 124 were polyvinyl alcohol cinnamate, the black light absorbing substance was a carbon simple substance, the transparent negative resists of examples 125 to 129 were a cyclized rubber-double azide system, the black light absorbing substance was a carbon simple substance, the transparent negative resists of examples 130 to 133 were polyvinyl alcohol cinnamate, and the black light absorbing substances were carbide, carbonitride, and sulfide, respectively. The light-shielding media of examples 121 to 133 were excellent in the visible light-blocking performance on the front and back sides and in the near-infrared light-blocking performance.
TABLE 13 design parameters and optical Properties of examples 117, 121 to 133
Figure BDA0002948870900000391
/>
Figure BDA0002948870900000401
Note 1: p is the minimum distance of the main optical axis of the micro lens and is in the unit of mum; r is the curvature radius of the micro lens and the unit is mum; h is the thickness of the collimating lens layer and the unit is mum; n1 is the refractive index of the collimating lens layer and is free of dimensional units; t is the thickness of the flexible substrate layer and the unit of micrometer; n2 is the refractive index of the flexible matrix layer and is free of dimensional units; t is the thickness of the collimation path layer, and the unit is mum; r1 and r2 are respectively the radius of the upper surface circle and the lower surface circle of the quasi-straight road in the unit of mum; v is the taper of the collimation path, V = (r) 1 -r 2 ) T, dimensionless units; theta is the minimum oblique light angle which can be filtered by the collimating film and is used for measuring the collimating and filtering effect in unit degree; k is the ratio of the actual transmittance to the highest transmittance of the collimating film, and is used for measuring the alignment precision of the collimating passage and the micro lens.
As can be seen from a comparison of examples 117 and 121-133 in Table 13, the radius r of the lower surface of the collimating passage 2 When the collimating structure is reduced and an inverted circular truncated cone-shaped far-focus collimating passage is formed, the light blocking performance can be further improved, but the light transmittance k is slightly reduced under the same collimating layer thickness t. In comparison with examples 121-133, when the taper V is changed in the middle range (e.g. 0.3-0.4), it can be achieved by fine tuning H (only thickness is changed without changing the lens structure) and changing the refractive index of the microlens, and if the taper V is larger (0.4-0.5) or smaller (0.15-0.3), the substrate thickness and the lens structure also need to be changed. When examples 117 and 121 to 123 are compared, it is found that t and r are the same 2 Under the condition of enlarging r 1 Or the taper V is improved, the light transmission performance k is compensated, meanwhile, theta is smaller, and the light blocking performance is better. As is clear from comparison of examples 127 to 133 and examples 121 to 124, respectively, the same r is obtained 1 Or r 2 Next, changing the parameters t and V has a large influence on the final light blocking performance. As can be seen from comparison of examples 117 and 121 to 133, the alignment accuracy was not substantially affected by the afocal exposure curing, and the alignment errors Δ were all equal<1μm。
It should be understood that any of the above embodiments (1-120) of the present invention can use a single black negative photoresist layer as the light-shielding medium and perform the afocal exposure curing with a transparent negative photoresist to realize the afocal alignment path, which provides a concept for preparing the afocal alignment path, and the transparent negative photoresist is not limited to the cyclized rubber-bis-azide system or the polyvinyl alcohol cinnamate system. Meanwhile, the invention does not limit the microlens array of the alignment film layer, the alignment film layer of the above embodiment can be replaced by the interference reduction alignment film layer, and the invention does not show more embodiments for further description, but does not affect the patent scope of the alignment film provided by the invention.
It should be noted that the above-mentioned embodiments are only exemplary embodiments of the present invention, and are not intended to limit the scope of the present invention. All equivalent changes and modifications made according to the disclosure of the present invention are covered by the scope of the claims of the present invention.

Claims (6)

1. The collimating film is characterized by comprising a collimating lens layer, a flexible substrate layer and a collimating hole layer in sequence; the collimating lens layer comprises a micro-lens array and a thickness; the collimation hole layer comprises a shading medium and a collimation hole array formed after the shading medium is hollowed out; the distribution of the collimation hole array is completely consistent with that of the micro-lens array, and each collimation hole is arranged on the main optical axis of the corresponding micro-lens; the collimating hole layer is a collimating passage layer, the collimating passage layer comprises a collimating passage array and a shading medium, the collimating passage is an inverted round table-shaped transparent negative photoresist, and the shading medium is a black negative photoresist;
the collimating lens array and the collimating passage array of the collimating film are both in regular triangle tight arrangement; the collimating lens layer is made of PMMA (polymethyl methacrylate), the flexible substrate layer is made of PET (polyethylene terephthalate), the shading medium of the collimating pore layer is a single-layer black negative photoresist, the black negative photoresist comprises a black light absorption substance and a transparent negative photoresist, the black light absorption substance layer is carbon black, chromium carbide, titanium carbide or titanium carbonitride, and the transparent negative photoresist is a cyclized rubber-double-fold nitrogen system or a polyvinyl alcohol cinnamate system;
wherein P is the minimum distance of the main optical axis of the micro lens and is 30-40 μm; r is the curvature radius of the micro lens and is 19.3-30.0 μm; h is the thickness of the collimating lens layer and is 8.7-21.1 μm; n1 is the refractive index of the collimating lens layer and is 1.38-1.65; t is the thickness of the flexible substrate layer and is 25-75 μm; n2 is the refractive index of the flexible matrix layer and is 1.65; t is the thickness of the collimation hole layer and is 3-6 μm; r is a radical of hydrogen 1 The radius of the circle on the upper surface of the inverted round table-shaped quasi-straight road is 2.7-3.5 mu m, r 2 The radius of the lower surface circle of the collimating passage in the shape of an inverted circular truncated cone is 1.5-2.9 mu m; v is the taper of the inverted round table-shaped collimation passage and is 0.15-0.5.
2. The collimating film of claim 1, wherein the microlens array of the collimating lens layer is in an ordered arrangement.
3. A subtractive interference collimating film according to claim 1 wherein the subtractive interference collimating film comprises a microlens array of the collimating lens layer in a disordered arrangement.
4. A conformable collimating film comprising a layer of conformable glue and the interference reducing collimating film of claim 3 or the collimating film of claim 1 or 2; the adhesive layer is adhered to the collimation hole layer.
5. An image recognition module is characterized by comprising a collimation layer, a filter layer and a photoelectric sensing layer in sequence; the collimating layer is the conformable collimating film of claim 4 or the interference reducing collimating film of claim 3.
6. The method of preparing the alignment film according to claim 1 or 2, wherein the alignment film is perforated by a micro-focusing method, the focused focal point is located under the light-shielding layer, and the alignment path is generated by a telescopic exposure curing of the transparent negative photoresist.
CN202110203533.XA 2020-02-24 2021-02-23 Collimation film and preparation method thereof, interference reduction collimation film, laminating type collimation film and image recognition module Active CN113376718B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN2020101115239 2020-02-24
CN202010111523 2020-02-24

Publications (2)

Publication Number Publication Date
CN113376718A CN113376718A (en) 2021-09-10
CN113376718B true CN113376718B (en) 2023-04-18

Family

ID=73248380

Family Applications (19)

Application Number Title Priority Date Filing Date
CN202020206263.9U Active CN211857087U (en) 2020-02-24 2020-02-25 Interference reducing collimation film
CN202010116381.5A Pending CN113296277A (en) 2020-02-24 2020-02-25 Collimation film, interference reduction collimation film and preparation method thereof
CN202010123030.7A Active CN113296278B (en) 2020-02-24 2020-02-27 Interference reduction collimation film, laminating type collimation film, image identification module and preparation method
CN202010179964.2A Active CN113296279B (en) 2020-02-24 2020-03-16 Interference reduction collimation film, preparation method, laminating type collimation film and image recognition module
CN202010210996.4A Active CN113296280B (en) 2020-02-24 2020-03-24 Interference reduction collimation film, preparation method, laminating type collimation film and image recognition module
CN202010222563.0A Pending CN113296281A (en) 2020-02-24 2020-03-26 Alignment film, interference reduction alignment film and preparation method thereof, laminating alignment film and image recognition module
CN202010977879.0A Active CN113296169B (en) 2020-02-24 2020-09-17 Alignment film, interference reduction alignment film and preparation method thereof, laminating alignment film and image recognition module
CN202011530184.4A Active CN113296282B (en) 2020-02-24 2020-12-22 Hole sealing attaching type collimating film, preparation method thereof and image recognition module
CN202011529343.9A Active CN113376849B (en) 2020-02-24 2020-12-22 Alignment film, interference reduction alignment film, laminating alignment film and hole sealing laminating alignment film
CN202011527309.8A Active CN113376847B (en) 2020-02-24 2020-12-22 Alignment film, interference reduction alignment film and preparation method thereof, laminating alignment film and image recognition module
CN202011528176.6A Active CN113376848B (en) 2020-02-24 2020-12-22 Alignment film, interference reduction alignment film and preparation method thereof, laminating alignment film and image recognition module
CN202011529692.0A Active CN113376850B (en) 2020-02-24 2020-12-22 Alignment film, interference reduction alignment film, laminating alignment film and hole sealing laminating alignment film
CN202011529920.4A Active CN113376851B (en) 2020-02-24 2020-12-22 Alignment film, interference reduction alignment film, laminating alignment film, hole sealing laminating alignment film and preparation method thereof
CN202110204803.9A Active CN113296174B (en) 2020-02-24 2021-02-23 Collimation film, interference reduction collimation film, full-lamination collimation film and image recognition module
CN202110203646.XA Active CN113296171B (en) 2020-02-24 2021-02-23 Collimation film, sunlight-proof collimation film, interference-reducing collimation film and image recognition module
CN202110204285.0A Active CN113296172B (en) 2020-02-24 2021-02-23 Full-lamination collimating film and image recognition module
CN202110203533.XA Active CN113376718B (en) 2020-02-24 2021-02-23 Collimation film and preparation method thereof, interference reduction collimation film, laminating type collimation film and image recognition module
CN202110203642.1A Active CN113296170B (en) 2020-02-24 2021-02-23 Sunlight-proof collimating film and image recognition module
CN202110204323.2A Active CN113296173B (en) 2020-02-24 2021-02-23 Alignment film, interference reduction alignment film and preparation method thereof, laminating alignment film and image recognition module

Family Applications Before (16)

Application Number Title Priority Date Filing Date
CN202020206263.9U Active CN211857087U (en) 2020-02-24 2020-02-25 Interference reducing collimation film
CN202010116381.5A Pending CN113296277A (en) 2020-02-24 2020-02-25 Collimation film, interference reduction collimation film and preparation method thereof
CN202010123030.7A Active CN113296278B (en) 2020-02-24 2020-02-27 Interference reduction collimation film, laminating type collimation film, image identification module and preparation method
CN202010179964.2A Active CN113296279B (en) 2020-02-24 2020-03-16 Interference reduction collimation film, preparation method, laminating type collimation film and image recognition module
CN202010210996.4A Active CN113296280B (en) 2020-02-24 2020-03-24 Interference reduction collimation film, preparation method, laminating type collimation film and image recognition module
CN202010222563.0A Pending CN113296281A (en) 2020-02-24 2020-03-26 Alignment film, interference reduction alignment film and preparation method thereof, laminating alignment film and image recognition module
CN202010977879.0A Active CN113296169B (en) 2020-02-24 2020-09-17 Alignment film, interference reduction alignment film and preparation method thereof, laminating alignment film and image recognition module
CN202011530184.4A Active CN113296282B (en) 2020-02-24 2020-12-22 Hole sealing attaching type collimating film, preparation method thereof and image recognition module
CN202011529343.9A Active CN113376849B (en) 2020-02-24 2020-12-22 Alignment film, interference reduction alignment film, laminating alignment film and hole sealing laminating alignment film
CN202011527309.8A Active CN113376847B (en) 2020-02-24 2020-12-22 Alignment film, interference reduction alignment film and preparation method thereof, laminating alignment film and image recognition module
CN202011528176.6A Active CN113376848B (en) 2020-02-24 2020-12-22 Alignment film, interference reduction alignment film and preparation method thereof, laminating alignment film and image recognition module
CN202011529692.0A Active CN113376850B (en) 2020-02-24 2020-12-22 Alignment film, interference reduction alignment film, laminating alignment film and hole sealing laminating alignment film
CN202011529920.4A Active CN113376851B (en) 2020-02-24 2020-12-22 Alignment film, interference reduction alignment film, laminating alignment film, hole sealing laminating alignment film and preparation method thereof
CN202110204803.9A Active CN113296174B (en) 2020-02-24 2021-02-23 Collimation film, interference reduction collimation film, full-lamination collimation film and image recognition module
CN202110203646.XA Active CN113296171B (en) 2020-02-24 2021-02-23 Collimation film, sunlight-proof collimation film, interference-reducing collimation film and image recognition module
CN202110204285.0A Active CN113296172B (en) 2020-02-24 2021-02-23 Full-lamination collimating film and image recognition module

Family Applications After (2)

Application Number Title Priority Date Filing Date
CN202110203642.1A Active CN113296170B (en) 2020-02-24 2021-02-23 Sunlight-proof collimating film and image recognition module
CN202110204323.2A Active CN113296173B (en) 2020-02-24 2021-02-23 Alignment film, interference reduction alignment film and preparation method thereof, laminating alignment film and image recognition module

Country Status (2)

Country Link
CN (19) CN211857087U (en)
WO (1) WO2021169726A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021169725A1 (en) * 2020-02-24 2021-09-02 宁波激智科技股份有限公司 Collimating film, interference-reducing collimating film and preparation method therefor, laminated collimating film, and image recognition module
CN211857087U (en) * 2020-02-24 2020-11-03 宁波激智科技股份有限公司 Interference reducing collimation film
WO2022188161A1 (en) * 2021-03-12 2022-09-15 京东方科技集团股份有限公司 Display panel and display device
CN114002769A (en) * 2021-10-20 2022-02-01 武汉华星光电技术有限公司 Light filtering collimation composite film, manufacturing method thereof and display device
WO2023111738A1 (en) * 2021-12-14 2023-06-22 3M Innovative Properties Company Optical construction including lens film and mask layer
WO2023214197A1 (en) * 2022-05-02 2023-11-09 刘正锋 Method and device for increasing resolving power of optical instrument by applying new theory of optics

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107563318A (en) * 2017-08-23 2018-01-09 上海天马微电子有限公司 A kind of display device and electronic equipment

Family Cites Families (133)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3704949A (en) * 1970-06-22 1972-12-05 Rms Ind Inc Method and apparatus for personal identification
CA2056842A1 (en) * 1991-02-07 1992-08-08 Jay M. Eastman System for scanning and reading symbols, such as bar codes, which is adapted to be configured in a hand held unit and can automatically read symbols on objects which are placed inthe detection zone of the unit
CA2083969A1 (en) * 1991-12-31 1993-07-01 Leslie James Button Measurement of fiber diameters and detection of defects
US5479275A (en) * 1993-12-03 1995-12-26 Ois Optical Imaging Systems, Inc. Backlit liquid crystal display with integral collimating, refracting, and reflecting means which refracts and collimates light from a first light source and reflects light from a second light source
JP3239314B2 (en) * 1994-09-16 2001-12-17 日本板硝子株式会社 Flat lens array and liquid crystal display device using the same
JPH1039108A (en) * 1996-07-19 1998-02-13 Toray Ind Inc Manufacture of microlens array sheet
US5822125A (en) * 1996-12-20 1998-10-13 Eastman Kodak Company Lenslet array system
AU1357102A (en) * 1998-03-23 2002-03-14 Cepheid Multi-site reactor system with dynamic independent control of indvidual reaction sites
US6487017B1 (en) * 1999-07-23 2002-11-26 Bae Systems Information And Electronic Systems Integration, Inc Trimodal microlens
US6168319B1 (en) * 1999-08-05 2001-01-02 Corning Incorporated System and method for aligning optical fiber collimators
US6847491B1 (en) * 1999-09-27 2005-01-25 Arrayed Fiberoptics Corporation Hybrid microlens array
JP2001201611A (en) * 2000-01-21 2001-07-27 Hitachi Ltd Optically functional sheet and surface light source using the same as well as image display device
US6876408B2 (en) * 2000-02-14 2005-04-05 Fuji Photo Film Co., Ltd. Collimating plate, lighting apparatus and liquid crystal display apparatus
GB0030410D0 (en) * 2000-12-13 2001-01-24 Screen Technology Ltd Collimator
JP2002313121A (en) * 2001-04-16 2002-10-25 Nitto Denko Corp Luminaire with touch panel and reflective liquid crystal display device
KR100909715B1 (en) * 2001-12-03 2009-07-29 도판 인사츠 가부시키가이샤 Lens array sheet and transmissive screen and rear projection display
US6939014B1 (en) * 2001-12-31 2005-09-06 Jenmar Visual Systems, Inc. Liquid transmissive filter having anisotropic properties and method of fabrication
JP3900982B2 (en) * 2002-03-25 2007-04-04 凸版印刷株式会社 Transmission screen
US7469056B2 (en) * 2002-05-14 2008-12-23 Ge Healthcare Niagara Inc. System and methods for rapid and automated screening of cells
AU2002341789A1 (en) * 2002-09-19 2004-04-08 Rainbow Displays, Inc. Backlight assembly for collimated illumination
US6859326B2 (en) * 2002-09-20 2005-02-22 Corning Incorporated Random microlens array for optical beam shaping and homogenization
AU2003902319A0 (en) * 2003-05-14 2003-05-29 Garrett Thermal Systems Limited Laser video detector
DE102004020250A1 (en) * 2004-04-26 2005-11-10 Hentze-Lissotschenko Patentverwaltungs Gmbh & Co. Kg Apparatus and method for optical beam homogenization
JP4513653B2 (en) * 2004-12-27 2010-07-28 日本ビクター株式会社 Manufacturing method of microlens array sheet
WO2007002797A2 (en) * 2005-06-29 2007-01-04 Reflexite Corporation Method and apparatus for aperture sculpting in a microlens array film
GB0601287D0 (en) * 2006-01-23 2006-03-01 Ocuity Ltd Printed image display apparatus
US20070247573A1 (en) * 2006-04-19 2007-10-25 3M Innovative Properties Company Transflective LC Display Having Narrow Band Backlight and Spectrally Notched Transflector
JP4863112B2 (en) * 2006-09-15 2012-01-25 Ｎｌｔテクノロジー株式会社 Optical element array, display device, and manufacturing method of display device
US20080191604A1 (en) * 2006-09-27 2008-08-14 Evident Technologies Retro-emission systems comprising microlens arrays and luminescent emitters
JP4384214B2 (en) * 2007-09-27 2009-12-16 株式会社 日立ディスプレイズ Surface light emitting device, image display device, and image display device using the same
JP5405763B2 (en) * 2008-03-28 2014-02-05 日東電工株式会社 Directional diffusion film, polarizing plate, liquid crystal display device, and method of manufacturing directional diffusion film
CN101544468B (en) * 2008-03-28 2013-05-01 Hoya株式会社 Fluorophosphate glass, precision press molding preform, optical element blank, optical element and method of manufacturing the same
JP5610254B2 (en) * 2008-06-18 2014-10-22 株式会社リコー Imaging apparatus and road surface state determination method
JP5298695B2 (en) * 2008-08-06 2013-09-25 コニカミノルタ株式会社 Optical glass and optical element
JP5114348B2 (en) * 2008-09-08 2013-01-09 日東電工株式会社 Manufacturing method of light diffusion film
JP5509566B2 (en) * 2008-10-01 2014-06-04 凸版印刷株式会社 Optical component and liquid crystal display unit
EP2237079B1 (en) * 2009-04-03 2013-05-29 Innovavent GmbH Device for homogenising coherent radiation
WO2010124028A2 (en) * 2009-04-21 2010-10-28 Vasylyev Sergiy V Light collection and illumination systems employing planar waveguide
KR101116140B1 (en) * 2009-07-16 2012-03-06 엘지이노텍 주식회사 Regular pattern optical sheet
CN102026478A (en) * 2009-09-21 2011-04-20 欣兴电子股份有限公司 Substrate of circuit board and drilling method thereof
CN101674517B (en) * 2009-09-25 2012-08-29 广东长虹电子有限公司 Acoustic generating device
JP4968965B2 (en) * 2009-11-18 2012-07-04 キヤノン株式会社 Refractive index distribution measuring method and measuring apparatus
CN101794962B (en) * 2010-03-10 2013-08-28 中国科学院光电技术研究所 Coherent combining device of self-adaption high-order transverse mode lasers
CN101866029B (en) * 2010-06-09 2011-09-21 宁波激智新材料科技有限公司 Deformation-resistant optics reflecting film, liquid crystal display device and LED lighting equipment
KR20120007944A (en) * 2010-07-15 2012-01-25 주식회사 엘지화학 Optical film having enhanced optical performance and back light unit comprising the same
KR101211723B1 (en) * 2010-09-20 2012-12-12 엘지이노텍 주식회사 Optical sheet, optical unit and lighting device using the same
CN201876568U (en) * 2010-09-25 2011-06-22 福州高意通讯有限公司 Array collimator
US9720228B2 (en) * 2010-12-16 2017-08-01 Lockheed Martin Corporation Collimating display with pixel lenses
KR101265312B1 (en) * 2011-03-15 2013-05-16 주식회사 엘지화학 Micro-lens array sheet and backlight unit comprising the same
GB201113324D0 (en) * 2011-08-02 2011-09-14 Cambridge Entpr Ltd Laser system and method for operating laser system
JP5310810B2 (en) * 2011-08-27 2013-10-09 株式会社デンソー Head-up display device
JP5966405B2 (en) * 2012-02-14 2016-08-10 セイコーエプソン株式会社 Optical filter device and method of manufacturing optical filter device
US9179982B2 (en) * 2012-03-20 2015-11-10 Varian Medical Systems, Inc. Method and system for automatic patient identification
WO2013146353A1 (en) * 2012-03-28 2013-10-03 シャープ株式会社 Light control film, display device, and method for manufacturing light control film
JP2014207253A (en) * 2012-04-17 2014-10-30 キヤノン株式会社 Image sensor and imaging apparatus
JP5673607B2 (en) * 2012-05-30 2015-02-18 株式会社デンソー Screen member and head-up display device
WO2014019238A1 (en) * 2012-08-03 2014-02-06 苏州苏大维格光电科技股份有限公司 Colored, dynamic, and amplified safety film
AU2013101454B4 (en) * 2013-05-16 2014-05-22 Lumenco Llc Improved printing of security devices
EP3058722B1 (en) * 2013-10-20 2021-12-15 Mtt Innovation Incorporated Light field projectors and methods
JP6300029B2 (en) * 2014-01-27 2018-03-28 ソニー株式会社 Image sensor, manufacturing apparatus, and manufacturing method
US9651718B2 (en) * 2014-01-27 2017-05-16 Forelux Inc. Photonic apparatus with periodic structures
US10174890B2 (en) * 2014-05-13 2019-01-08 Coelux S.R.L. Light source and sunlight imitating lighting system
JP2015227999A (en) * 2014-06-02 2015-12-17 リコー光学株式会社 Microlens array substrate and method for manufacturing the same
CN105445833A (en) * 2014-08-21 2016-03-30 万维云视（上海）数码科技有限公司 3D imaging grating assembly and 3D display device
US9534156B2 (en) * 2014-09-17 2017-01-03 Appvion, Inc. Linerless record material
CN104457600B (en) * 2014-11-20 2017-02-22 华中科技大学 Testing device of optical fiber collimator array
JP6697849B2 (en) * 2015-01-21 2020-05-27 ソニー株式会社 Wearable display device and image display method
US10181070B2 (en) * 2015-02-02 2019-01-15 Synaptics Incorporated Low profile illumination in an optical fingerprint sensor
US9829614B2 (en) * 2015-02-02 2017-11-28 Synaptics Incorporated Optical sensor using collimator
US10147757B2 (en) * 2015-02-02 2018-12-04 Synaptics Incorporated Image sensor structures for fingerprint sensing
CN104570369B (en) * 2015-02-05 2017-03-15 合肥京东方光电科技有限公司 3D shows glasses
US9851577B2 (en) * 2015-07-17 2017-12-26 Dicon Fiberoptics, Inc. Nano-structured lens for collimating light from surface emitters
CN105092117B (en) * 2015-08-19 2017-06-09 东南大学 A kind of piezoresistive pressure sensor and preparation method thereof
CN105137644B (en) * 2015-09-23 2018-08-10 宁波激智科技股份有限公司 One kind subtracting interferometric optical brightness enhancement film
AT517885B1 (en) * 2015-10-23 2018-08-15 Zkw Group Gmbh Microprojection light module for a motor vehicle headlight for generating aberration-free light distributions
CN105372726A (en) * 2015-12-14 2016-03-02 中山大学 Diamond micro lens array and preparation method thereof
CN106199790A (en) * 2016-01-12 2016-12-07 宁波激智科技股份有限公司 A kind of complex optics brightness enhancement film
CN106199788A (en) * 2016-01-12 2016-12-07 宁波激智科技股份有限公司 A kind of optical brightening membrane and preparation method thereof
US10268884B2 (en) * 2016-01-29 2019-04-23 Synaptics Incorporated Optical fingerprint sensor under a display
CN105809115B (en) * 2016-03-02 2019-07-30 上海师范大学 A kind of more fingerprint optical encryption methods of binary channels
US10108841B2 (en) * 2016-03-31 2018-10-23 Synaptics Incorporated Biometric sensor with diverging optical element
AU2016100401B4 (en) * 2016-04-13 2017-02-09 Ccl Secure Pty Ltd Micro-optic device with double sided optical effect
AU2016100402B4 (en) * 2016-04-13 2017-08-17 Ccl Secure Pty Ltd Micro-optic device with integrated focusing element and image element structure
KR102471578B1 (en) * 2016-05-25 2022-11-25 에이엠에스 센서스 싱가포르 피티이. 리미티드. Microlens Array Diffusers
CN105868742B (en) * 2016-05-26 2020-07-03 京东方科技集团股份有限公司 Display module and display device
CN106019613B (en) * 2016-07-27 2019-03-26 广州弥德科技有限公司 A kind of directive property backlight 3 d display device
JP6818468B2 (en) * 2016-08-25 2021-01-20 キヤノン株式会社 Photoelectric converter and camera
US10203431B2 (en) * 2016-09-28 2019-02-12 Ricoh Company, Ltd. Microlens array, image display apparatus, object apparatus, and mold
US10948734B2 (en) * 2016-10-28 2021-03-16 3M Innovative Properties Company Light control film with varied viewing angle
CN108174059B (en) * 2016-12-08 2021-04-13 松下知识产权经营株式会社 Image pickup apparatus
CN106815554B (en) * 2016-12-19 2024-03-12 王金玉 Internal fingerprint rapid imaging and biological recognition system and method
EP3343619A1 (en) * 2016-12-29 2018-07-04 Thomson Licensing An image sensor comprising at least one sensing unit with light guiding means
CN106773550B (en) * 2017-01-20 2018-12-14 苏州亿拓光电科技有限公司 Optical machining system and method
CN108399352A (en) * 2017-02-04 2018-08-14 上海箩箕技术有限公司 Fingerprint imaging module and electronic equipment
CN106842398A (en) * 2017-02-23 2017-06-13 宁波视睿迪光电有限公司 Grating Film, 3 d display device and alignment method
CN106886767B (en) * 2017-02-23 2019-07-05 京东方科技集团股份有限公司 A kind of optical fingerprint identification device and display panel
CN107065307B (en) * 2017-06-05 2019-12-27 京东方科技集团股份有限公司 Light collimation structure, substrate, backlight module and display device
CN109037248A (en) * 2017-06-08 2018-12-18 上海箩箕技术有限公司 Imaging sensor and forming method thereof, fingerprint imaging mould group
CN107346075A (en) * 2017-07-31 2017-11-14 京东方科技集团股份有限公司 One kind collimation membrane structure and display device
CN107516089A (en) * 2017-09-08 2017-12-26 北京眼神科技有限公司 A kind of fingerprint acquisition device
TW201915818A (en) * 2017-10-05 2019-04-16 香港商印芯科技股份有限公司 Optical identification module
US10809853B2 (en) * 2017-12-11 2020-10-20 Will Semiconductor (Shanghai) Co. Ltd. Optical sensor having apertures
CN109375303A (en) * 2017-12-12 2019-02-22 宁波激智科技股份有限公司 A kind of external fit type reflective membrane and preparation method thereof
SE1751613A1 (en) * 2017-12-21 2019-06-22 Fingerprint Cards Ab Biometric imaging device and method for manufacturing the biometric imaging device
DE212018000123U1 (en) * 2018-02-06 2019-08-20 Shenzhen GOODIX Technology Co., Ltd. Under the screen to be arranged biometric identification device, biometric identification component and terminal device
CN111819575A (en) * 2018-03-15 2020-10-23 指纹卡有限公司 Biometric imaging device and method for manufacturing biometric imaging device
CN108647558B (en) * 2018-03-21 2021-01-08 京东方科技集团股份有限公司 Fingerprint identification display device
CN110502955A (en) * 2018-05-17 2019-11-26 京东方科技集团股份有限公司 Fingerprint recognition panel, fingerprint identification method and display device
CN110502960B (en) * 2018-05-17 2022-04-08 京东方科技集团股份有限公司 Display substrate, fingerprint identification panel, fingerprint identification method and display device
JP2019211530A (en) * 2018-05-31 2019-12-12 ウシオ電機株式会社 Light source device and projector
US10867198B2 (en) * 2018-07-03 2020-12-15 Gingy Technology Inc. Image capturing device and image capturing module
CN108897081A (en) * 2018-07-23 2018-11-27 宁波激智科技股份有限公司 A kind of optical thin film and preparation method thereof
WO2020037683A1 (en) * 2018-08-24 2020-02-27 深圳市汇顶科技股份有限公司 Backlight module, below-screen fingerprint recognition method and apparatus, and electronic device
JP2021534451A (en) * 2018-08-15 2021-12-09 スリーエム イノベイティブ プロパティズ カンパニー Optical elements including microlens arrays
CN209492257U (en) * 2018-09-13 2019-10-15 东莞市赛越新材料科技有限公司 Unlocked by fingerprint mobile phone protects photocuring film
CN109683377B (en) * 2018-12-26 2021-10-26 宁波激智科技股份有限公司 High-haze adhesive layer composition and high-haze high-brightness composite brightness enhancement film
WO2020132974A1 (en) * 2018-12-26 2020-07-02 深圳市汇顶科技股份有限公司 Fingerprint recognition apparatus and electronic device
CN110337655B (en) * 2018-12-26 2023-05-05 深圳市汇顶科技股份有限公司 Fingerprint identification device and electronic equipment
CN109471267A (en) * 2019-01-11 2019-03-15 珠海迈时光电科技有限公司 A kind of laser homogenizing device
CN211349383U (en) * 2019-01-22 2020-08-25 深圳市汇顶科技股份有限公司 Fingerprint identification device and electronic equipment
CN209357076U (en) * 2019-01-23 2019-09-06 南昌欧菲生物识别技术有限公司 Flexible collimator, fingerprint recognition mould group and electronic equipment
EP3731133B8 (en) * 2019-03-12 2022-04-20 Shenzhen Goodix Technology Co., Ltd. Under-screen fingerprint recognition apparatus and electronic device
CN109829452B (en) * 2019-03-26 2024-02-27 上海箩箕技术有限公司 Optical fingerprint sensor module and forming method thereof
CN208848221U (en) * 2019-04-10 2019-05-10 深圳市汇顶科技股份有限公司 Optical fingerprint identification device and electronic equipment
CN109901341B (en) * 2019-04-10 2022-02-11 曲阜师范大学 Broadband optical fiber collimator-based pre-splitting Mach-Zehnder interferometer and method
WO2020220304A1 (en) * 2019-04-30 2020-11-05 深圳市汇顶科技股份有限公司 Device for fingerprint recognition and electronic device
CN209746551U (en) * 2019-05-17 2019-12-06 上海思立微电子科技有限公司 biological characteristic identification module and electronic equipment
CN110277430A (en) * 2019-06-26 2019-09-24 上海天马有机发光显示技术有限公司 A kind of display panel, preparation method and display device
CN209373637U (en) * 2019-07-30 2019-09-10 上海菲戈恩微电子科技有限公司 Information in fingerprint acquisition device and electronic equipment under a kind of screen
CN110580473A (en) * 2019-09-23 2019-12-17 上海思立微电子科技有限公司 Fingerprint identification subassembly, display module and electronic equipment
CN211857087U (en) * 2020-02-24 2020-11-03 宁波激智科技股份有限公司 Interference reducing collimation film
CN211857086U (en) * 2020-02-24 2020-11-03 宁波激智科技股份有限公司 Collimating film
CN113296276A (en) * 2020-02-24 2021-08-24 宁波激智科技股份有限公司 Collimating film and preparation method thereof

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107563318A (en) * 2017-08-23 2018-01-09 上海天马微电子有限公司 A kind of display device and electronic equipment

Also Published As

Publication number Publication date
WO2021169726A1 (en) 2021-09-02
CN113376718A (en) 2021-09-10
CN113376848B (en) 2023-04-07
CN113376849A (en) 2021-09-10
CN113296170A (en) 2021-08-24
CN113296279A (en) 2021-08-24
CN211857087U (en) 2020-11-03
CN113296173B (en) 2023-04-18
CN113296174A (en) 2021-08-24
CN113296171A (en) 2021-08-24
CN113376848A (en) 2021-09-10
CN113296172A (en) 2021-08-24
CN113376847B (en) 2023-03-21
CN113296282A (en) 2021-08-24
CN113296280A (en) 2021-08-24
CN113376851B (en) 2023-04-07
CN113296169B (en) 2023-04-11
CN113376850A (en) 2021-09-10
CN113376850B (en) 2023-04-07
CN113296171B (en) 2023-04-18
CN113296279B (en) 2023-04-18
CN113376847A (en) 2021-09-10
CN113296170B (en) 2023-04-18
CN113296280B (en) 2023-04-18
CN113296281A (en) 2021-08-24
CN113296174B (en) 2023-04-18
CN113296278B (en) 2023-04-18
CN113376851A (en) 2021-09-10
CN113376849B (en) 2023-03-21
CN113296278A (en) 2021-08-24
CN113296282B (en) 2023-04-11
CN113296173A (en) 2021-08-24
CN113296169A (en) 2021-08-24
CN113296277A (en) 2021-08-24
CN113296172B (en) 2023-04-18

Similar Documents

Publication Publication Date Title
CN113376718B (en) Collimation film and preparation method thereof, interference reduction collimation film, laminating type collimation film and image recognition module
JP2022536426A (en) Optical system and method of manufacturing optical system
US20150085369A1 (en) Laminated body, imaging element package, imaging apparatus, and electronic apparatus
JP2008508545A (en) Camera module, array based on the same, and manufacturing method thereof
JP2011203792A (en) Imaging device
US9121994B2 (en) Method of fabricating a wafer level optical lens assembly
CN211857086U (en) Collimating film
CN112327391A (en) Preparation method of micro-lens array, micro-lens array and under-screen fingerprint module
CN112084996A (en) Fingerprint recognition device under screen and electronic equipment
CN113296276A (en) Collimating film and preparation method thereof
WO2021169725A1 (en) Collimating film, interference-reducing collimating film and preparation method therefor, laminated collimating film, and image recognition module
CN210348085U (en) Collimating structure

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant