CN113296282B - Hole sealing attaching type collimating film, preparation method thereof and image recognition module - Google Patents

Hole sealing attaching type collimating film, preparation method thereof and image recognition module Download PDF

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CN113296282B
CN113296282B CN202011530184.4A CN202011530184A CN113296282B CN 113296282 B CN113296282 B CN 113296282B CN 202011530184 A CN202011530184 A CN 202011530184A CN 113296282 B CN113296282 B CN 113296282B
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collimating
layer
hole
film
lens
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CN113296282A (en
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李刚
夏寅
付坤
高斌基
刘建凯
陈建文
唐海江
张彦
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Ningbo Exciton Technology Co Ltd
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Ningbo Exciton Technology Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/20—Adhesives in the form of films or foils characterised by their carriers
    • C09J7/29—Laminated material
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/30—Collimators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

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  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

The invention belongs to the field of image recognition, and particularly relates to a hole sealing attaching type collimating film, a preparation method thereof and an image recognition module. The invention provides a hole-sealing bonding type alignment film, a preparation method thereof and an image recognition module, aiming at solving the problem of bubbles of a bonding type alignment film designed by a thicker shading layer. The hole-sealing joint type alignment film comprises an alignment lens layer, a flexible substrate layer, an alignment hole layer and a hole-sealing joint glue layer; the collimating lens layer comprises a micro-lens array and a thickness; the collimation hole layer comprises a shading medium and a collimation hole array formed after the shading medium is hollowed out; the hole sealing and attaching adhesive layer fully fills the collimating hole array of the collimating hole layer. The hole sealing and attaching type collimation film provided by the invention is applied to an image recognition module, so that the recognition accuracy is high.

Description

Hole sealing attaching type collimating film, preparation method thereof and image recognition module
Technical Field
The invention belongs to the field of image recognition, and particularly relates to a hole sealing attaching type collimating film, a preparation method thereof and an image recognition module.
Background
In the field of image recognition, a common image sensor such as a CMOS type or a photo-TFT type generally includes a collimator device in a sensor module to enhance a signal-to-noise ratio, improve a recognition rate, and reduce crosstalk. The collimating device (as shown in fig. 1) mainly collimates and filters diffused light at a single-point pixel of an image, so that normal collimated light or nearly collimated light (signal) can be smoothly transmitted to a corresponding photoelectric sensor, while light (noise) with a large angle deviating from the normal direction can only rarely or even cannot enter a non-corresponding photoelectric sensor, and thus, the signal-to-noise ratio is enhanced.
The collimating device typically has a top collimating structure layer and a bottom collimating structure layer: first, the top and bottom dual-layer collimating structures need to be aligned precisely, otherwise the intensity of the signal light is greatly reduced (as shown in fig. 2); secondly, the distance between the top (incident) and bottom (emergent) collimating structures needs to be increased, or the microstructure size needs to be reduced (as shown in fig. 3) to increase the overall aspect ratio, otherwise the transmission of crosstalk light will be increased.
The traditional collimating device is generally a rigid collimating sheet, such as an optical fiber bundle slice, or a Microlens (Microlens), a collimating diaphragm and the like formed on two sides of a glass substrate, and the rigid collimating sheet generally needs to keep higher thickness, on one hand, the rigid collimating sheet is used for keeping the length-diameter ratio, on the other hand, the rigid collimating sheet is used for keeping the mechanical property of the rigid collimating sheet and preventing the rigid collimating sheet from being broken in an application environment. However, even then, such rigid alignment plates are not satisfactory for large-sized image recognition modules. Particularly in applications where a reduced overall thickness is desired (e.g., ultra-thin, large screen handsets), it becomes more brittle, more fragile, and less productive, both performance and cost. It is also apparent that such rigid collimating sheets are less likely to be in a flexible image recognition module.
Except for the optical fiber bundle type collimating sheets (the top layer collimating structure and the bottom layer collimating structure are aligned originally), most of the rigid collimating sheets need to complete the alignment of two layers of collimating structures (collimating diaphragms). However, the two-layer structure prepared in sequence needs to be aligned with high precision, which has considerable difficulty: firstly, very complex and expensive double-shaft positioning equipment is needed, the positioning process is complicated and time-consuming, if the collimation structure size is less than 50 micrometers (image precision DPI > 508), the lattice scale can reach hundreds of millions of points per square meter, and the production efficiency is extremely low; secondly, the alignment method is not accurate in practice, and especially when the size of the collimating structure is reduced and the number of collimating structures is increased, the accumulated error becomes more obvious, which results in the decrease of signal light intensity, and frequent origin correction becomes more time-consuming.
In conclusion, the traditional rigid collimating sheet has the problems of high thickness, fragility and poor performance under the condition of low thickness, difficult alignment of two layers of collimating structures (collimating diaphragms), low yield and low productivity, and is difficult to apply to the field of large-size, ultrathin and flexible image recognition.
Disclosure of Invention
The invention provides a collimating film, an interference reduction collimating film, a laminating type collimating film, a hole sealing laminating type collimating film and a preparation method thereof, and an image recognition module and a preparation method thereof, aiming at solving the problem that two layers of collimating diaphragms in a traditional rigid collimating sheet are difficult to align. The collimating film provided by the invention only comprises one collimating aperture layer, and the problem that two layers of collimating diaphragms are difficult to align is solved. Compared with the ordered collimating film, the interference reducing collimating film provided by the invention can reduce the light interference phenomenon and improve the image recognition accuracy.
In order to solve the technical problems, the invention adopts the following technical scheme:
the invention provides a collimating film, which sequentially comprises a collimating lens layer, a flexible substrate layer and a collimating hole layer.
The collimation hole layer is a collimation diaphragm.
The collimating film provided by the invention only comprises one layer of collimating diaphragm. The collimating film provided by the invention only comprises one collimating hole layer.
The collimating film sequentially comprises a collimating lens layer, a flexible substrate layer and a collimating hole layer.
The collimating lens layer is arranged on the upper surface of the flexible substrate, and the collimating hole layer is arranged on the lower surface of the flexible substrate.
The collimating lens layer includes a microlens array and a thickness.
The collimating aperture layer includes an array of collimating apertures.
The collimation hole layer comprises a shading medium layer and a collimation hole array.
The collimation hole layer comprises a shading medium and a collimation hole array formed after the medium is hollowed out.
The distribution of the collimation hole array and the micro-lens array is completely consistent. Each collimating aperture is on the primary optical axis of the corresponding microlens. Furthermore, the center of each collimating hole is on the main optical axis of the corresponding microlens.
The collimating film is punched by adopting a micro-focusing method, the distribution of the collimating hole array is completely consistent with that of the micro-lens array, the circle center of any collimating hole is positioned on the main optical axis of the corresponding micro-lens, one-to-one high-precision alignment is carried out, and the alignment deviation delta is less than 1 mu m. The thickness T of the flexible matrix layer is selected from 10-50 μm, preferably 25-38 μm.
The micro-lens array of the collimating lens layer is orderly arranged. The foregoing collimating films are referred to as ordered collimating films (also known as ordered collimating structures). The foregoing ordered arrangement is characterized in that the pitch P of the principal optical axes of adjacent microlenses is a constant value.
The micro-lens array of the collimating lens layer and the collimating hole array of the collimating hole layer are orderly arranged. The foregoing collimating films are referred to as ordered collimating films (also known as ordered collimating structures).
Further, the micro-lens array of the collimating lens layer is arranged in a disordered manner. The collimating film in which the microlens array is arranged in a disordered manner is called a subtractive interference collimating film (also called a disordered collimating structure, or a disordered array collimating film). The foregoing disordered arrangement is characterized in that the pitch P of the principal optical axes of adjacent microlenses is a value that varies within a range. Compared with the ordered collimating film, the interference reducing collimating film can reduce the phenomenon of light interference and improve the accuracy (recognition rate) of image recognition.
Further, the micro-lens array of the collimating lens layer and the collimating hole array of the collimating hole layer are arranged in disorder. The aforementioned collimating film is referred to as a subtractive interference collimating film (also referred to as a disordered collimating structure).
Further, in the interference reducing collimation film, in the microlens array of the collimation lens layer, the coordinates of the main optical axes of the three adjacent microlenses are connected to form a non-regular triangle.
One collimating hole in the collimating hole array corresponds to the position of one microlens in the microlens array, and the main optical axis of the microlens coincides with the center of the collimating hole or the deviation of the main optical axis and the center of the collimating hole is less than 1 μm. One microlens corresponding to one alignment hole position is referred to as a corresponding microlens of this alignment hole. The coordinates of the main optical axes of three adjacent microlenses are connected to form a regular triangle (formed by connecting the coordinates of the main optical axes of three mutually overlapped microlenses), or the coordinates of the main optical axes of four adjacent microlenses are connected to form a square (formed by connecting the coordinates of the main optical axes of four mutually overlapped microlenses).
The microlenses in the microlens array are closely arranged. I.e. adjacent microlenses are touching or overlapping each other.
The collimating lens array and the collimating hole array of the collimating film are both in regular triangle (formed by connecting the coordinates of the main optical axes of three mutually overlapped micro lenses) close arrangement or square (formed by connecting the coordinates of the main optical axes of four mutually overlapped micro lenses) close arrangement.
Furthermore, in the collimating lens layer, the distance P between the main optical axes of the adjacent micro lenses is 10-50 μm, the radius R of the micro lenses is 6.1-30.2 μm, the height H of the collimating lens layer is 1.1-27.4 μm, and the refractive index n1 of the material of the collimating lens layer is 1.4-1.6; in the flexible matrix layer, the thickness T of the flexible matrix layer is 10-50 mu m, and the refractive index n2 of the material of the flexible matrix layer is 1.5-1.65; in the collimation hole layer, the thickness t of the collimation hole layer is 0.5-7 μm, and the diameter phi of the collimation holes in the collimation hole array is 1-10 μm.
In the ordered collimating film, the pitch P of the principal optical axes of adjacent microlenses are the same, and P is selected from 10 to 50 μm, preferably 15 to 30 μm, and more preferably 18 to 25 μm.
The micro lens of the collimating film focuses vertically incident light rays and forms a light spot with the diameter D on the lower surface of the flexible substrate layer, wherein D is selected from 0.1-7.8 microns, preferably 0.5-4.9 microns, and more preferably 1-2 microns.
The light spot diameter D is determined by the curvature radius R (spherical radius R) of the micro lens, the refractive index n1, the thickness H (vertical distance from the top of the micro lens to the upper surface of the substrate) of the collimating lens layer, the refractive index n2 of the flexible substrate layer and the thickness T.
The curvature radius R of the micro lens is selected from 6.1-30.2 μm, the thickness H of the collimating lens layer is selected from 1.1-27.4 μm, R and H are not preferred, and the micro lens is adapted according to other parameters.
The refractive index n1 of the collimating lens layer (i.e., the microlens layer) is selected from 1.4 to 1.6, preferably 1.5.
The refractive index n2 of the flexible substrate layer is selected from 1.5-1.65, is different according to materials, is not preferred, and allows errors caused by different processes of the same material to be +/-0.02.
The micro-lens array of the collimating film is made of the same material as the thick meat, and the material is transparent polymer.
Further, the transparent polymer of the microlens layer is selected from one of AR (Acrylic Resin, acrylic Resin or modified Acrylic Resin), PC (polycarbonate), PET (polyethylene terephthalate), PEN (polyethylene naphthalate), PI (polyimide), PS (polystyrene), SR (Silicon Resin), FEP (perfluoroethylene propylene copolymer), or EVA (ethylene-vinyl acetate copolymer). Further, it is preferable that the material is one of PMMA (polymethyl methacrylate), PC, or PS.
The flexible matrix layer of the collimating film is a transparent polymer film.
Further, the transparent polymer film is made of one material selected from PET, PEN, PI, PC, PMMA (polymethyl methacrylate), PP (polypropylene), PO (polyolefin), SR, or COP (cyclic olefin copolymer). Further, it is preferably one of PET, PI, PC, or PMMA.
The shading medium of the collimation hole layer of the collimation film is one or the combination of at least two of organic paint and inorganic plating.
The organic coating of the opacifying medium is selected from opaque polymeric ink systems.
Further, the opaque polymeric ink system comprises a light absorbing material and a polymeric curing system.
Further, the light absorbing material is selected from one or a combination of at least two of carbon (such as carbon black, carbon fiber, graphite, etc.), carbide (such as chromium carbide, titanium carbide, boron carbide, etc.), carbonitride (such as titanium carbonitride, boron carbonitride, etc.), sulfide (such as ferrous sulfide, molybdenum disulfide, cobalt disulfide, nickel sulfide, etc.).
Further, the polymer curing system may be selected from one or a combination of at least two of acrylic systems (AR), polyurethane systems (PU), silicone Systems (SR), epoxy systems (EP), melamine resin systems (MF), phenolic resin systems (PF), urea resin systems (UF), or thermoplastic elastomeric materials (e.g. ethylene-vinyl acetate copolymers, thermoplastic elastomers TPE, or thermoplastic polyurethane elastomers TPU).
Further, the polymer curing system may be selected from one or a combination of at least two of an acrylic resin system, a polyurethane system, a silicone system, an epoxy resin system, or a thermoplastic elastomer.
The inorganic coating of the shading medium is selected from one or the combination of at least two of simple carbon, carbide, carbonitride and sulfide.
The thickness t of the collimation hole layer of the collimation film is selected from 0.5-7 μm, preferably 1-5 μm, and more preferably 2-3 μm.
The diameter phi of the collimating hole layer of the collimating film is selected from 1-10 μm, and is further preferably 3-5 μm.
Further, the flexible matrix layer thickness T may be 10 μm to 50 μm, such as 10 μm,15 μm,20 μm,25 μm,38 μm or 50 μm.
Further, the chief optical axis pitch P of adjacent microlenses of the collimating lens layer may be 10 μm to 15 μm, such as 10 μm,15 μm,18 μm,20 μm,25 μm,30 μm, or 50 μm.
Further, the microlens radius of curvature R of the collimating lens layer can be 6.1 μm to 30.2 μm, such as 6.1 μm,6.9 μm,7.9 μm,9.4 μm,11.2 μm,11.3 μm,12 μm,12.1 μm,12.6 μm,12.8 μm,13.3 μm,13.6 μm,14 μm,14.3 μm,14.3 μm,14.8 μm,15 μm,15.1 μm,15.7 μm,15.9 μm,16 μm,16.1 μm,16.7 μm,17 μm,17.2 μm,17.3 μm,18 μm,18.1 μm,18.3 μm,18.8 μm,19.3 μm,19.4 μm,19.6 μm,19.8 μm, 20.3 μm,20 μm,20.6 μm,20.5 μm,20.6 μm,20 μm, 22.6 μm,2 μm,20.6 μm,20 μm, or 25.6 μm.
Further, the collimating lens layer thickness H may be 1.1 μm to 27.4 μm, such as 1.1 μm,2.4 μm,2.5 μm,3.0 μm,3.1 μm,3.2 μm,3.5 μm,3.8 μm,4.1 μm,5.0 μm,5.8 μm,6.0 μm,6.2 μm,6.8 μm,7.2 μm,7.8 μm,8.5 μm,8.6 μm,8.7 μm,9.2 μm,10.4 μm,10.7 μm,10.8 μm,11 μm,11.1 μm,11.4 μm,11.5 μm,12.9 μm,13.6 μm,14.1 μm,14.6 μm,15.0 μm,15.4 μm, 16.4 μm,11.5 μm,12.9 μm,13.6 μm,14.1 μm,14.6 μm,15.0 μm,15.4 μm,3.2 μm,22.2 μm,22.5 μm,2 μm, or 22.2 μm.
Further, the microlenses may form a spot diameter D of 0.1 μm to 7.8 μm, such as 0.1 μm,0.3 μm,0.4 μm,0.5 μm,0.6 μm,0.7 μm,0.8 μm,1.0 μm,1.1 μm,1.2 μm,1.4 μm,1.5 μm,1.6 μm,1.7 μm,1.8 μm,2.0 μm,2.2 μm,2.4 μm,2.5 μm,2.6 μm,2.8 μm,3.1 μm,3.4 μm,3.6 μm,3.7 μm,3.9 μm,4.0 μm,4.9 μm, or 7.8 μm, on the lower surface of the flexible substrate layer.
Further, the thickness t of the collimating aperture layer may be 0.5-7 μm, such as 0.5 μm,1 μm,2 μm,3 μm,4 μm,5 μm, or 7 μm.
Further, the collimating aperture diameter Φ can be 1-10 μm, e.g., 1 μm,2 μm,3 μm,4 μm,5 μm,6 μm,8 μm, or 10 μm.
Further, the refractive index n1 of the collimating lens layer may be 1.34-1.7, such as 1.34,1.4,1.47,1.48,1.5,1.59,1.6,1.65,1.66, or 1.7.
Further, the refractive index n2 of the flexible substrate layer may be 1.48 to 1.7, such as 1.48,1.49,1.5,1.6,1.65,1.66 or 1.7.
Further, the collimating film provided by the invention comprises a collimating lens layer (41), a flexible substrate layer (42) (simply referred to as a substrate) and a collimating aperture layer (43), wherein the collimating lens layer is arranged on the upper surface of the substrate, the collimating aperture layer is arranged on the lower surface of the substrate, the collimating lens layer (41) comprises a micro lens array (41A) and a thick meat layer (41B), and the collimating aperture layer (43) comprises a light-shielding medium (43A) and a collimating aperture array (composed of a certain number of collimating apertures (43B)) formed after the medium is hollowed out.
In examples 1 to 24, the collimating lens array and the collimating aperture array in the collimating film are both arranged in a regular triangle, the collimating lens layer (41) is made of PMMA, the flexible substrate layer (42) is made of PET, the light-shielding medium (43A) of the collimating aperture layer (43) is inorganic plated titanium carbide, and the collimating film is perforated with collimating apertures (43B) in a microlens perforation manner. The other parameters are as follows:
p is 10-30 μm, R is 9.4-20.6 μm, H is 3-27.4 μm, n1 is 1.5;
t is 25 μm, n2 is 1.65, D is 0.3-4.0 μm;
t is 2.0 μm and Φ is 4.0. Mu.m. Further, the deviation Δ is 0.18 to 0.90 μm.
In embodiments 25 to 30, the collimating lens array and the collimating aperture array in the collimating film are both arranged in a regular triangle, the collimating lens layer (41) is made of PMMA, the flexible substrate layer (42) is made of PET, the light-shielding medium (43A) of the collimating aperture layer (43) is inorganic plated titanium carbide, the collimating film punches the collimating aperture (43B) in a microlens punching manner, and the other parameters are as follows:
p is 10-25 μm, R is 6.1-19.8 μm, H is 2.5-10.7 μm, n1 is 1.5;
t is 10-50 μm, n2 is 1.65, D is 0.6-3.9 μm;
t is 1.0-3.0 μm, and phi is 2.0-5.0 μm. Further, the deviation Δ is 0.26 to 0.49 μm.
In embodiments 31 to 40, the collimating lens array and the collimating aperture array of the collimating film are both arranged in a regular triangle, the collimating lens layer (41) is made of PMMA, the flexible substrate layer (42) is made of PET, the light-shielding medium (43A) of the collimating aperture layer (43) is inorganic plated titanium carbide, the collimating film is perforated with collimating apertures (43B) by using microlenses, and other parameters are as follows:
p is 10-50 μm, R is 16-30.2 μm, H is 1.1-21.3 μm, n1 is 1.5;
t is 50 μm, n2 is 1.65, D is 0.1-7.8 μm;
t is 0.5 μm and phi is 1.0-8.0 μm. Further, the deviation Δ is 0.21 to 0.88 μm.
In embodiments (41) to (47), the collimating lens array and the collimating aperture array of the collimating film are both arranged in a regular triangle, the collimating lens layer (41) is made of PMMA, the flexible substrate layer (42) is made of PET, the light-shielding medium (43A) of the collimating aperture layer (43) is inorganic plated titanium carbide, the collimating film is perforated by using microlenses to form collimating apertures (43B), and other parameters are as follows:
p is 30 μm, R is 19.3 μm, H is 10.8 μm, n1 is 1.5;
t is 38 μm, n2 is 1.65, D is 3.6 μm;
t is 0.5-7 μm, and phi is 5.0-10.0 μm. Further, the deviation Δ is 0.46 to 0.99 μm.
In embodiments 48 to 57, the collimating lens array and the collimating aperture array of the collimating film are both regularly triangularly and closely arranged, the collimating lens layer (41) is made of PMMA, and further, is polymerized from a photo-curable acrylic resin, the refractive index n1 is adjustable from 1.4 to 1.6, when n2=1.65, the flexible substrate layer (42) is made of PET, when n2=1.5, the flexible substrate layer (42) is made of COP, the light-shielding medium (43A) of the collimating aperture layer (43) is inorganic-coated titanium carbide, the collimating film is perforated with collimating apertures (43B) by using a microlens perforation method, and other parameters are as follows:
p is 20-25 μm, R is 15.9-22.5 μm, H is 3.2-9.2 μm, n1 is 1.4-1.6;
t is 38-50 μm, n2 is 1.5-1.65, D is 0.5-3.6 μm;
t is 2.0 μm and Φ is 4.0. Mu.m. Further, the deviation Δ is 0.25 to 0.66 μm.
In example 58, the collimating lens array and the collimating aperture array of the collimating film are both arranged in a square shape (as shown in fig. 7), the collimating lens layer (41) is made of PMMA, the flexible substrate layer (42) is made of PET, the light-shielding medium (43A) of the collimating aperture layer (43) is inorganic plated titanium carbide, the collimating film is perforated with collimating apertures (43B) by using a microlens perforation method, and other parameters are as follows:
p is 25 μm, R is 19.6 μm, H is 11.1 μm, n1 is 1.5;
t is 38 μm, n2 is 1.65, D is 3.9 μm;
t is 2.0 μm and Φ is 4.0. Mu.m. Further, the deviation Δ was 0.69 μm.
The invention also provides a preparation method of the collimating film, and the collimating holes are punched by adopting a micro-focusing method.
Furthermore, in the preparation method, laser is made to vertically irradiate the collimating lens layer, the laser is focused through the micro lens of the collimating lens layer, and a light spot formed by focusing falls on the collimating lens layer to form a collimating hole. In the preparation method, the distribution of the collimation hole array and the micro-lens array is completely consistent, and the circle center of any collimation hole is on the main optical axis of the corresponding micro-lens.
Further, the preparation method comprises the following steps:
(1) Forming the collimating lens layer on the upper surface of the flexible substrate layer by adopting a lens array (concave) mould (light curing, heat curing, hot press forming and other modes can be adopted) to form a lens array (convex);
(2) Coating/plating a shading medium on the lower surface of the substrate layer by adopting a wet method/dry method coating technology;
(3) The large-area flat-top laser (parallel laser after Gaussian beam shaping) is adopted, a micro-lens array is vertically irradiated with proper low energy, each micro-lens is focused on a shading medium (namely, a micro-focusing method) and corresponding collimating holes are punched, so that collimating hole arrays in the same distribution are generated, and a collimating hole layer is formed.
Further, the micro-focusing method comprises the following features:
(1) Flat-top laser after beam shaping is adopted as a laser source, the irradiation area is enlarged after shaping, and the energy density is reduced;
(2) The front side is irradiated, the energy density is low, and the energy is concentrated through the micro-focusing process of the micro-lens per se, so that the high energy density is realized;
(3) The micro-focused light spot is small enough in a reasonable range, the focal point position needs to be designed on the lower surface of the PET or a deeper position, and energy is concentrated on the shading layer (shading medium);
(4) The micro-lens layer has high universality, and is irregular, such as poor lens arrangement precision and shape precision, uneven space and even disorder, and the micro-lens layer is also applicable.
Further, the process of the micro-focusing method (as shown in fig. 4) is divided into four basic steps: (a) Flat-top laser (5) is applied to a collimating lens layer (41) of a collimating film semi-finished product with proper energy (too high hole is too large, even the hole is burnt to a substrate, too low, no hole is formed), micro focusing is realized by a micro lens (41A), pre-reduction of the area of a light spot is realized by a thick plate (41B), finally the laser penetrates through the substrate layer (42) and is focused into a very small light spot on a shading medium (43A), and high concentration of energy is realized; (b) Due to the absorption of the light by the shading medium, the energy is instantaneously accumulated to cause the shading medium at the position of the light spot to be instantaneously burnt through and generate some ash, and actually, the process of the first two steps only needs microsecond level and is very quick; (c) After the ash is pumped away, the alignment holes (43B) are exposed, and are basically positioned on the main optical axis (40) of the micro lens and are highly aligned with the micro lens (41A), so that the time-consuming alignment process is avoided, and at the moment, the alignment film (4) is a finished product and comprises a complete structure, namely an alignment lens layer (41), a base layer (42) and an alignment hole layer (43); (d) The collimating film (4) meets the high transmission of the collimated light of the normal direction or approaches to the normal direction at the moment, a detection light source (such as white light, green light and three-wave lamp) with common intensity can be used for irradiating from the surface of the micro-lens during online production, the light can be transmitted out from the collimating hole, so that the array image of the light transmission hole can be observed on the back surface, the transmitted light intensity can be quantized, the punching quality can be detected, the process can easily realize automatic detection on an assembly line, and the map image obtained by sampling detection at a specific position can also be subjected to data biochemical analysis (the size, the distance, the array form and the like of the hole).
Compared with the micro-focusing method for punching provided by the invention, the traditional punching method has larger limitation (as shown in fig. 5): (a) The Gaussian laser (7) is focused through a lens group of the laser head and is shot on the shading medium (43A) from the back direction of the semi-finished product; (b) The different positions of the shading layer are sequentially burnt through, and some ash is generated; and (c) when ash is pumped away, the collimating holes are exposed. It can be seen that, in the whole alignment process, an original point O (or called Mark point) needs to be located, a CCD (Charge Coupled Device) high-definition camera on the front side aligns to the optical center of a lens, a laser head on the back side can be linked with the CCD camera on the front side, and the position of a corresponding collimation hole is found, so as to calculate the initial displacement (vector or coordinate difference) between the first point and the position, the initial positioning process is time-consuming and complex, and the requirement on equipment is high; then, all the point positions can be calculated and positioned according to the initial displacement and the point displacement, 2-n points are sequentially punched, although the time can be shortened by using a vibrating mirror group in the process, n cannot be set too large, otherwise, the accumulated error inevitably exceeds 1 micrometer and is even larger, especially, the vibrating mirror can cause the angle inclination, the light spot becomes larger and deforms, and the error is accumulated more and more quickly; finally, when the error is accumulated to be unacceptable, the original point O is required to be retreated, and the first point is searched again, namely, the initial positioning process is repeated. Throughout the whole process, although the time is shortened by adopting the galvanometer group, the n can not be too large, and the initial positioning process needs to be frequently carried out, so that the method is time-consuming, complex and dependent on equipment, and the punching process is high in cost and low in precision.
Further, the limitations of the conventional punching method are not limited to this: the process of positioning the first point and calculating the 2-n points needs a precondition that the distance between the micro lenses is completely accurate; in fact, on one hand, the mold for the microlens is also prepared by laser drilling, and errors are inevitably generated, so that the alignment error of the traditional mode is further increased, especially when the mold precision is not so high; on the other hand, some special molds produce irregular microlens layers, which have poor arrangement precision and shape precision of the microlenses, or have uneven or even disordered designed intervals. Thus, the phase change of the conventional process increases the mold precision and manufacturing cost of the microlens layer, resulting in very high cost of the whole collimating film, not to mention the realization of the alignment punching of the irregular microlens layer (while the micro-focusing method of the present invention can be easily realized).
It should be noted that the microlens array forming method should be selected according to the kind and application of the transparent polymer, and the present invention is not preferred; the coating mode of the shading medium is selected according to the type of the shading medium, the organic coating needs to be selected from a wet coating mode, and the inorganic coating needs to be selected from a dry coating (namely physical vapor deposition) mode.
It should be noted that the method for preparing the collimating film provided by the invention is suitable for producing sheets and is also suitable for producing coiled materials.
The collimating film can be used as a flexible collimating device for an image sensor module. The collimating film can collimate and filter diffused light at a single-point pixel position of an image to a certain degree to form a normal small beam light signal, and transmits the normal small beam light signal to a corresponding photoelectric sensor, and is particularly suitable for large-size, ultrathin and even flexible image identification modules.
Compared with the prior art, the collimating film provided by the invention adopts the polymer film with the thickness of 10-50 μm as the flexible substrate layer, realizes the flexibility, the ultrathin and the large size of the collimating device, and is particularly suitable for large-size, ultrathin and even flexible image recognition modules.
Compared with the prior art, the collimating film provided by the invention adopts a micro-focusing method to punch, the distribution of the collimating hole array and the distribution of the micro-lens array are completely consistent, the circle center of each collimating hole is positioned on the main optical axis of the corresponding micro-lens, the collimating holes are aligned in a one-to-one high-precision mode, the alignment deviation is less than 1 mu m, the transmission of signal light is greatly improved, the collimating structure is allowed to be further reduced (such as the micro-lens and the collimating holes are synchronously reduced) to reduce crosstalk, the signal-to-noise ratio of the collimating film is improved, the production efficiency is greatly improved, and the cost is reduced.
Compared with the prior art, the collimating film provided by the invention only comprises one collimating aperture layer, the problem that two layers of collimating diaphragms are difficult to align with each other is fundamentally solved, the collimating film is low in thickness, good in toughness and not easy to break, the circle center of the collimating aperture prepared by adopting a micro-focusing method is on the main optical axis of the corresponding micro-lens, and the collimating aperture is accurately aligned with the corresponding micro-lens. The preparation method of the collimating film provided by the invention is easy to operate, can be used for mass production, and improves the production yield. The collimating film provided by the invention has excellent performance, and can filter diffused light by collimated light. The collimating film provided by the invention can be applied to large-size and ultrathin image identification modules, so that the mass production of the large-size, ultrathin and even flexible image identification modules is greatly improved, and when the collimating film is applied to a fingerprint unlocking scheme of consumer electronic products such as mobile phones (OLED screens), the collimating film has obvious advantages due to great market demands and higher pursuit on the characteristics such as ultrathin, large screens and flexibility.
In addition, the orderly distributed collimating structure (which means that the microlens array of the collimating lens layer is orderly arranged) can meet the basic image recognition requirement in practical application, but there are interference fringes caused by too high regularity, as shown in fig. 11 a. Therefore, it is necessary to optimize the collimating structure to a disordered distribution, destroy the regularity, and weaken the interference fringes, as shown in fig. 11b, in order to further improve the image recognition accuracy (recognition rate).
The micro-lens array of the collimating lens layer of the interference-reducing collimating film provided by the invention is arranged in disorder, and the micro-focusing punching mode is adopted, so that the collimating hole array of the collimating hole layer is completely consistent with the micro-lens array, the characteristic of disorder distribution is kept, high-precision coaxial alignment is also maintained, and the traditional punching mode can not be realized all the time. The disordered microlens array collimating film can destroy the regularity of the ordered microlens array and weaken interference fringes caused by the regularity (as shown in fig. 11 b) so as to further improve the image recognition accuracy (recognition rate) of the collimating film provided by the invention.
The collimating lens array and the collimating hole array of the disordered array collimating film (interference reducing collimating film) are disordered arrays, and the microlenses are closely arranged and overlapped with each other (as shown in fig. 12, the coordinates of the main optical axes of any three mutually overlapped microlenses are connected into a common triangle (not a regular triangle)). In the interference reducing collimating film (disordered collimating film), the value range of P is 5-55 μm, the distance P between the main optical axes of the two mutually overlapped microlenses changes in a certain value range in a disorder manner, the variation of the distance P between the adjacent main optical axes is A (the difference between the highest value and the lowest value in the value range of P), the median of the distance P between the adjacent main optical axes is Pm (the average value of the highest value and the lowest value in the value range of P), and then Pm-0.5A is not less than Pm and not more than Pm +0.5A; the median value Pm is selected from 10 to 50 μm, preferably 15 to 30 μm, and more preferably 18 to 25 μm, and the variation A of the main optical axis pitch P is selected from 1 to 10um, preferably 2 to 6um.
Furthermore, in the interference reducing collimation film (disordered collimation film), the radius R of the micro lens is 6.1-30.2 μm, the height H of the collimation lens layer is 1.1-27.4 μm, and the refractive index n1 of the collimation lens layer material is 1.34-1.7; in the flexible matrix layer, the thickness T of the flexible matrix layer is 10-50 mu m, and the refractive index n2 of the material of the flexible matrix layer is 1.48-1.7; in the collimation hole layer, the thickness t of the collimation hole layer is 0.5-7 μm, and the diameter phi of the collimation holes in the collimation hole array is 1-10 μm.
In embodiments 81 to 86, the collimating lens array and the collimating aperture array in the collimating film are disordered arrays, and the microlenses are closely arranged and overlapped with each other (as shown in fig. 12, the coordinates of the principal optical axes of any three microlenses overlapped with each other are connected to form a common triangle (not a regular triangle), the distance P between the principal optical axes of the two microlenses overlapped with each other changes disorderly within a certain value range (Pm ± 0.5A), the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating aperture layer 43 is inorganic coated titanium carbide, the collimating film punches the collimating aperture 43B in a microlens punching manner, and other parameters are as follows:
p is Pm +/-0.5A, pm is 30 μm, A is 1-10 μm, R is 20.6 μm, H is 27.4 μm, and n1 is 1.5;
t is 25 μm, n2 is 1.65, D is 3.1 μm;
t is 2.0 μm and Φ is 4.0. Mu.m. Further, the deviation Δ was 0.81 μm.
Compared with the prior art, the interference reduction collimation film provided by the invention only comprises one collimation aperture layer, the problem that two collimation diaphragms are difficult to align with each other is fundamentally solved, the thickness is low, the toughness is good, the breakage is not easy, the center of a collimation hole prepared by adopting a micro-focusing method is positioned on the main optical axis of a corresponding micro lens, and the alignment between the collimation hole and the corresponding micro lens is accurate. The preparation method of the interference reduction collimation film provided by the invention is easy to operate, can realize mass production, and improves the production yield. The interference reduction collimation film provided by the invention has excellent performance, can filter diffused light by collimated light, and reduces the light interference phenomenon. The interference reduction collimation film provided by the invention can be applied to large-size and ultrathin image identification modules, so that the mass production of the large-size, ultrathin and even flexible image identification modules is greatly improved, and when the interference reduction collimation film is applied to a fingerprint unlocking scheme of consumer electronic products such as mobile phones (OLED screens), the market demand is extremely high, and the pursuit for the characteristics such as ultrathin, large screens and flexibility is higher, so that the interference reduction collimation film has obvious advantages.
On the other hand, the invention provides a bonded collimation film, which comprises a bonded adhesive layer and the interference reduction collimation film; and the bonding glue layer is bonded with the collimation hole layer in the interference reduction collimation film.
Further, the adhesive layer is selected from one of a solid optical transparent adhesive, a high-transmittance pressure-sensitive adhesive or a transparent hot melt adhesive.
Furthermore, the thickness of the adhesive layer is 5-35 μm.
On the other hand, the invention also provides an image recognition module, which sequentially comprises a collimation layer, a filter layer and a photoelectric sensing layer; the collimation layer is selected from the laminated collimation film or the interference reduction collimation film.
Fig. 14 is a schematic diagram of a trend of screen enlargement of an image recognition module (taking an OLED mobile phone fingerprint recognition module as an example), which shows top views of four types of OLED mobile phones (01), wherein a fingerprint recognition module (03) is arranged below an OLED screen (02), and a finger (04) needs to be placed in a specific area to be recognized and unlocked: the fingerprint identification module is small, so that an icon is often displayed in the area when the screen is activated so as to indicate the accurate placement position of a finger; (b) The coverage area of the fingerprint identification module reaches about 1/4 screen, and the problem of expanding from single-finger identification unlocking to double-finger identification unlocking is solved; (c) And (d) the design is intended to realize half screen and even full screen, and higher requirements are put forward for the large screen of the fingerprint identification module.
Fig. 15 is a schematic diagram of an image recognition module (taking an OLED mobile phone fingerprint recognition module as an example), in the complete fingerprint module, a collimating film layer (05) is located at the middle layer, an OLED screen (02) is arranged above the collimating film, and a filter layer (06) and a photoelectric sensing layer (07) are arranged below the collimating film. When the collimating film is a soft base component, its dimensional stability (thermal shrinkage, thermal expansion, wrinkles, etc.) is a weak point, and therefore, in large-area use, it is necessary to bind with an underlying component to increase the stiffness and thickness of the whole, the underlying component may be a hard base component (e.g., a filter layer) or a soft base component (e.g., a filter layer may also be made of a soft base, and the photo-sensor chip may also be made of a TFT (thin film transistor).
The laminated alignment film provided by the invention is provided with the laminating adhesive layer (44), and can be used for laminating the alignment film of a soft base (namely a flexible base layer) and a lower component of an image recognition module, so that the dimensional stability of the alignment film is improved, as shown in figure 16. Obviously, the flatness of the alignment film after the alignment film is attached is higher, so that the optical distortion caused by film material waves (Waving) can be reduced, and the accuracy of image recognition is enhanced.
The laminated alignment film has four main structures from top to bottom, namely a disordered array alignment lens layer (41), a flexible substrate layer (42), an alignment hole layer (43) and an adhesive layer (44), as shown in fig. 17. Wherein, the design parameters of the disordered array collimating lens layer (41), the flexible base layer (42) and the collimating hole layer (43) are completely the same as those of the interference reducing collimating film, and the thickness of the bonding glue layer (44) is T 2 Selected from 5 to 50 μm, preferably 10 to 25 μm, too thin a glue layer may result in poor adhesion (either before or after reliability) and too thick a glue layer may result in loss of signal light or crosstalk. As shown in fig. 18: (a) Under normal conditions, if signal light is focused on the collimating aperture layer and then is scattered on the photoelectric sensor, light spots which are larger than the small apertures and smaller than the photoelectric sensor are generated, and the signal is completely received; (b) However, if the glue layer becomes thick, the distance of the photoelectric sensor becomes long and the light spot becomes large, the loss is generated; (c) When the glue layer is too thick, the distance between the photoelectric sensors is too far, the light spots are too large, and even adjacent light spots are overlappedA crosstalk phenomenon.
Further, the adhesive layer can be selected from solid OCA (optically clear adhesive), high-transmittance PSA (pressure sensitive adhesive) or transparent hot melt adhesive, and the like, and is preferably OCA and PSA with high light transmittance and reworkability. Furthermore, the materials of the OCA and the PSA are respectively selected from a thermosetting polyacrylate system or a light-curing polyacrylate system.
Further, in the conformable collimating film, the collimating lens array and the collimating aperture array are disordered arrays, and the microlenses are closely arranged and overlapped with each other (as shown in fig. 12, the primary optical axis coordinates of any three mutually overlapped microlenses are connected into a common triangle (not a regular triangle), in the interference reducing collimating film (disordered collimating film), the value range of P is 5 to 55 μm, the primary optical axis distance P of the two mutually overlapped microlenses varies disorderly within a certain value range, the variation amount of the adjacent primary optical axis distance P is a (difference between the highest value and the lowest value in the value range of P), the median value of the adjacent primary optical axis distance P is Pm (average value of the highest value and the lowest value in the value range of P), pm-0.5A is equal to or less than Pm +0.5A, pm is selected from 10 to 50 μm, preferably 15 to 30 μm, further preferably 18 to 25 μm, and the variation amount of the primary optical axis distance P is selected from 1 to 10 μm, preferably 2 to 6 μm.
Furthermore, the radius R of the micro lens is 6.1-30.2 μm, the height H of the collimating lens layer is 1.1-27.4 μm, and the refractive index n1 of the collimating lens layer material is 1.34-1.7; in the flexible matrix layer, the thickness T of the flexible matrix layer is 10-50 mu m, and the refractive index n2 of the material of the flexible matrix layer is 1.48-1.7; in the collimation hole layer, the thickness t of the collimation hole layer is 0.5-7 μm, and the diameter phi of the collimation holes in the collimation hole array is 1-10 μm.
The invention also provides a preparation method of the bonded collimating film, and the collimating holes are punched by adopting a micro-focusing method.
Furthermore, in the preparation method, laser is made to vertically irradiate the collimating lens layer, the laser is focused through the micro lens of the collimating lens layer, and a light spot formed by focusing falls on the collimating lens layer to form a collimating hole. In the laminated collimating film prepared by the method, the distribution of the collimating hole array is completely consistent with that of the micro-lens array, and the circle center of any collimating hole is on the main optical axis of the corresponding micro-lens.
The invention also provides a preparation method of the laminated collimating film, which comprises the following steps:
(1) Preparing an interference reducing collimation film;
(2) And tearing off the light release film from the OCA/PSA adhesive tape, and attaching the adhesive layer to the alignment hole layer.
Further, the preparation method comprises the following steps:
(1) Preparing the interference reducing collimation film provided by the invention;
(2) Tearing off the light release film from the OCA/PSA adhesive tape, attaching the adhesive layer to the back surface (collimation hole layer) of the collimation film, and performing pressurization, temperature rise and vacuum pumping to perform air exhaust and bubble removal;
(3) Before use, the heavy release film is torn off, so that the laminating type alignment film can be obtained, and the OCA/PSA glue layer is used for laminating the lower layer part.
In examples 93 to 102, the collimating lens array and the collimating aperture array in the collimating film are disordered arrays, and the microlenses are closely arranged and overlapped with each other (as shown in fig. 12, the primary optical axis coordinates of any three microlenses overlapped with each other are connected into a common triangle, the primary optical axis distance P of the two microlenses overlapped with each other varies in a disordered manner within a certain range (Pm ± 0.5A), wherein the median Pm is 18 μm or 15 μm, the variation a is 4 μm, that is, the range of P is 18 ± 2 μm or 15 ± 2 μm, and other parameters are listed in table 10. The collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating aperture layer 43 is inorganic plating titanium carbide, the collimating film adopts a microlens perforation method to punch the collimating aperture 43B, and the other parameters are listed in table 10. The bonding adhesive layer 44 in examples 93 to 99 is a solid state OCA, the adhesive layer 44 is made of a thermosetting polyacrylate system, the adhesive layer 44 in example 100 is a high-transmittance optical film, the curing adhesive layer 44 is made of a thermosetting polyacrylate system, and the curing adhesive layer 44 is made of the PSA layer 102, and the curing optical polyacrylate layer is made of the following PSA system, and the curing parameters are as follows:
p is Pm +/-0.5A, pm is 18 μm, A is 4 μm, R is 14.8 μm, H is 16.3 μm, and n1 is 1.5;
t is 25 μm, n2 is 1.65, D is 1.1 μm;
t is 2 μm and Φ is 4 μm. Further, the deviation Δ was 0.41 μm.
Or P is Pm +/-0.5A, pm is 15 μm, A is 4 μm, R is 17 μm, H is 2.4 μm, and n1 is 1.5;
t is 50 μm, n2 is 1.65, D is 0.5 μm;
t is 0.5 μm and Φ is 5.0. Mu.m. Further, the deviation Δ was 0.25 μm.
Compared with the prior art, the laminated collimating film provided by the invention only comprises one collimating aperture layer, the problem that two layers of collimating diaphragms are difficult to align with each other is fundamentally solved, the thickness is low, the toughness is good, the collimating film is not easy to break, the center of a collimating aperture prepared by adopting a micro-focusing method is on the main optical axis of a corresponding micro-lens, and the collimating aperture is accurately aligned with the corresponding micro-lens. The preparation method of the laminated collimating film provided by the invention is easy to operate, can be used for mass production, and improves the production yield. The laminated collimating film provided by the invention has excellent performance, can filter diffused light through collimated light, and reduces the light interference phenomenon. The laminated collimating film provided by the invention has the advantages that the laminated adhesive layer is arranged, the laminated collimating film can be laminated with a lower-layer component, the dimensional stability of the flexible collimating film is improved, and the optical distortion is reduced. The laminated collimating film provided by the invention can be applied to large-size and ultrathin image identification modules, so that the mass production of the large-size, ultrathin and even flexible image identification modules is greatly improved, and when the laminated collimating film is applied to a fingerprint unlocking scheme of consumer electronic products such as mobile phones (OLED screens), the laminated collimating film has obvious advantages due to great market demands and higher pursuit on the characteristics such as ultrathin, large screens and flexibility. The image identification module provided by the invention has high identification accuracy, and can be applied to fingerprint unlocking and the like of consumer electronic products such as mobile phones (OLED screens).
We find that above-mentioned laminating type collimation membrane is owing to adopt finished product laminating sticky tape (OCA PSA) laminating at the collimation membrane back, when adopting thicker light shield layer design, the collimation hole is darker, can leave more air between laminating glue film and the collimation hole, form a bubble promptly, bubble and laminating glue film juncture take place deformation after the trust test, the evagination can make light diverge more, the indent can make light converge more, there is the light path that is different from normal region, thereby influence the imaging quality. As shown in fig. 20: when the boundary between the bonding adhesive layer 44 and the bubble 09 is still horizontal, the normal signal light path is as shown in 081, and the propagation direction in the bonding adhesive layer 44 finally depends only on the refractive indexes of the substrate layer 42 and the bonding adhesive layer 44 (the refractive indexes of the intermediate medium air can be mutually cancelled out in two calculations); when the boundary between the adhesive layer 44 and the air bubbles 09 is deformed, the abnormal signal light path is shown as 082, and the propagation direction in the adhesive layer 44 is finally influenced by not only the refractive index difference between the base layer 42 and the adhesive layer 44, but also the refractive index of the intermediate medium air and the normal direction (not vertical or horizontal) of the deformed interface, which is shown as reliability, and the air bubbles 09 protrude outward, so that the light rays are changed and diffused.
In order to improve or solve the problem of bubbles of a laminating type collimating film designed by a thicker shading layer (collimating aperture layer), after the collimating film is prepared, a transparent medium is used for fully filling the collimating aperture, and the collimating aperture is completely sealed, so that a better method is provided;
the invention provides a hole sealing joint type collimation film, which comprises a collimation lens layer, a flexible substrate layer, a collimation hole layer and a hole sealing joint glue layer, wherein the collimation lens layer is arranged on the flexible substrate layer; the collimating lens layer comprises a micro-lens array and a thickness; the collimation hole layer comprises a shading medium and a collimation hole array formed after the shading medium is hollowed out; the hole sealing and attaching adhesive layer fully fills the collimating hole array of the collimating hole layer.
The collimation hole array comprises a plurality of collimation holes, and the hole sealing adhesive layer fully fills the collimation holes in the collimation hole layer.
The hole sealing bonding type alignment film has four main structures from top to bottom, namely an alignment lens layer (41), a flexible substrate layer (42), an alignment hole layer (43) and a hole sealing bonding adhesive layer (46), as shown in fig. 22. Wherein the collimating lens layer (41), the flexible substrate layer (42) and the collimating aperture layer (43) have the same design parameters as the collimating film.
Furthermore, the thickness t of the collimation hole layer is 3-7 μm.
Furthermore, the cutoff performance of the light-shielding medium of the collimation hole layer on visible light and infrared light at least reaches OD2 level, namely the transmittance is less than or equal to 1%.
Furthermore, the thickness T of the hole sealing adhesive layer 2 5 to 50 μm, preferably 10 to 25 μm.
Further, the hole sealing adhesive layer is selected from one of solid optical transparent adhesive, high-transmittance pressure-sensitive adhesive or transparent hot melt adhesive.
Further, the hole sealing adhesive layer can be selected from a solid state OCA (optically clear adhesive), a high-transmittance PSA (pressure sensitive adhesive), a transparent hot melt adhesive, and the like, and is preferably an OCA and a PSA having high light transmittance and reworkability. Furthermore, the materials of the OCA and the PSA are respectively selected from a thermosetting polyacrylate system or a photocuring polyacrylate system.
Further, the hole sealing adhesive layer of the hole sealing adhesive type collimating film is prepared by the process shown in fig. 21 (a) coating the hole sealing adhesive layer 46 on the back surface of the collimating film, and coating a release film 47 to form a sandwich structure; (b) Curing under the conditions required by the resin (thermal curing is adopted in a thermal curing type, and light curing is adopted in a light curing type); (c) Before use, the release film 47 is torn, and then the hole sealing adhesive type alignment film is generated;
embodiments 103 to 111 provide a hole sealing bonded type alignment film, a cross section of which is shown in fig. 23, and the hole sealing bonded type alignment film includes an alignment lens layer (41), a flexible substrate layer (42), an alignment hole layer (43), and a hole sealing bonded adhesive layer (46), the alignment lens layer (41) is disposed on an upper surface of the substrate (42), the alignment hole layer (43) is disposed on a lower surface of the substrate (42), the alignment lens layer (41) includes a microlens array (41A) and a thickness (41B), the alignment hole layer (43) includes a light-shielding medium (43A) and an alignment hole array formed after a medium is hollowed out, the alignment hole array is composed of a certain number of alignment holes (43B), and the aligned holes (43B) of the alignment hole layer (43) are fully filled by the bonded adhesive layer (46); the collimating lens array and the collimating aperture array of the collimating film are both arranged in order and are closely arranged in a regular triangle (as shown in fig. 8).
Further, the thickness T of the flexible matrix layer (42) is 38 μm. The collimating lens layer (41) is made of PMMA (polymethyl methacrylate), the flexible base layer (42) is made of PET (polyethylene terephthalate), and the shading medium (43A) of the collimating pore layer (43) is organic coating black ink. The collimating film adopts a micro-lens punching mode to punch a collimating hole (43B). The hole sealing adhesive layer (46) of the embodiments 103 to 108 is solid OCA, and the material is a thermosetting polyacrylate system; the hole sealing adhesive layer (46) of example 109 is a high-transmittance PSA made of a thermosetting polyacrylate system; the hole sealing adhesive layer (46) of the embodiment 110 is a solid state OCA made of a photo-curable polyacrylate system; the hole sealing adhesive layer (46) of example 111 is a high-transmittance PSA made of a photocurable polyacrylate system.
Wherein P is the minimum distance of the main optical axis of the micro lens and is 30 mu m; r is the curvature radius of the micro lens and is 19.3 mu m; h is the thickness of the collimating lens layer and is 10.8 mu m; n1 is the refractive index of the collimating lens layer, is dimensionless, and is 1.5; t is the thickness of the flexible substrate layer and is 38 mu m; n is 2 Is the refractive index of the flexible matrix layer, dimensionless, 1.65; d is the diameter of a light spot formed on the lower surface of the flexible substrate layer after being focused by the micro lens, and is 3.6 mu m; t is the thickness of the collimating aperture layer, from 5 to 7 μm, for example 5 μm, or 7 μm; Φ is the diameter of the collimating aperture and is 3.0-5.0 μm, e.g., 3.0 μm, or 5.0 μm; Δ is 0.19 to 0.33, e.g., Δ is 0.19,0.20,0.22, or 0.33.T is a unit of 2 Thickness of the adhesive layer, unit μm, thickness T 2 From 5 to 50 μm, for example, 5 μm,10 μm,25 μm,35 μm or 50 μm; Δ SNR is a change before and after the reliability of the signal-to-noise ratio, and a decrease in SNR, that is, a negative Δ SNR, means that the imaging performance is deteriorated, and Δ SNR is-1.0 to-2.3, for example, Δ SNR is-1.0, -2.0, -2.1, -2.2, or 2.3.
Furthermore, in the preparation method, laser is made to vertically irradiate the collimating lens layer, the laser is focused through the micro lens of the collimating lens layer, and a light spot formed by focusing falls on the collimating lens layer to form a collimating hole. In the hole-sealing bonded collimating film prepared by the method, the distribution of the collimating hole array and the micro-lens array is completely consistent, and the circle center of any collimating hole is on the main optical axis of the corresponding micro-lens.
The invention also provides a preparation method of the hole sealing adhesive type collimation film, which comprises the following steps:
(1) Preparing a collimating film;
(2) Preparing a hole sealing adhesive layer, namely coating hole sealing adhesive on the back surface of the collimating film, fully filling the collimating holes with the adhesive to form the hole sealing adhesive layer, covering a release film and curing;
(3) And tearing the release film before use to form the hole sealing attaching type alignment film.
Further, the preparation method comprises the following steps:
(1) Preparing the collimating film provided by the invention;
(2) Preparing a hole sealing adhesive layer, namely coating the hole sealing adhesive layer on the back surface of the collimating film, covering a release film and curing;
(3) The hole sealing laminating type alignment film can be obtained by tearing off the release film before use, and the laminating adhesive layer is used for laminating the lower-layer component.
The invention provides an image recognition module, which sequentially comprises a collimation layer, a filter layer and a photoelectric sensing layer; the collimation layer is selected from the hole sealing and attaching type collimation film.
Compared with the prior art, the hole sealing laminating type collimation film provided by the invention only comprises one collimation hole layer, the problem that two layers of collimation diaphragms are difficult to align with each other is fundamentally solved, the thickness is low, the toughness is good, the breakage is not easy, the center of a collimation hole prepared by adopting a micro-focusing method is positioned on the main optical axis of a corresponding micro lens, and the alignment between the collimation hole and the corresponding micro lens is accurate. The preparation method of the hole-sealing bonded type collimating film provided by the invention is easy to operate, can be used for mass production, and improves the production yield. The hole sealing and attaching type collimation film provided by the invention has excellent performance, can filter diffused light by collimated light, and reduces the light interference phenomenon. The hole-sealing bonded alignment film provided by the invention has a bonding adhesive layer, can be bonded with a lower-layer component, improves the dimensional stability of the flexible alignment film, and reduces optical distortion. The bonding glue layer of the hole sealing bonding type alignment film can fully fill the alignment holes, and the problem that bubbles in the holes influence the imaging quality when a thicker shading layer is designed is solved to a greater extent. The hole sealing laminating type collimating film provided by the invention can be applied to a large-size and ultrathin image identification module, so that the mass production of the large-size, ultrathin and even flexible image identification module is greatly improved, and when the hole sealing laminating type collimating film is applied to a fingerprint unlocking scheme of consumer electronic products such as mobile phones (OLED screens), the hole sealing laminating type collimating film has obvious advantages due to great market demands and higher pursuit for the characteristics of ultrathin, large screens, flexibility and the like. The hole sealing and attaching type collimation film provided by the invention is applied to an image recognition module, so that the recognition accuracy is high. The image identification module provided by the invention has high identification accuracy, and can be applied to fingerprint unlocking and the like of consumer electronic products such as mobile phones (OLED screens).
Drawings
FIG. 1 is a schematic diagram of the basic principle of a collimating device;
FIG. 2 is a graph illustrating the effect of alignment accuracy of a collimated structure on signal strength; the higher the alignment precision is, the higher the signal intensity is;
FIG. 3 is a graph of the effect of the aspect ratio of the collimating structure on the crosstalk strength; the higher the length-diameter ratio, the smaller the crosstalk strength;
FIG. 4 illustrates a micro-focusing method of drilling;
FIG. 5 illustrates a conventional drilling alignment error accumulation process;
FIG. 6 is a schematic cross-sectional view of a collimating film provided by the present invention;
FIG. 7 is a schematic perspective view of a collimating film provided by the present invention (square arrangement);
FIG. 8 is a schematic perspective view of a collimating film provided by the present invention (regular triangle arrangement);
FIG. 9 is a schematic cross-sectional view of a collimating film (collimating sheet) provided in a comparative example;
FIG. 10 is a process of testing light blocking performance (minimum light blocking angle) of the collimating film provided by the present invention;
FIG. 11a shows interference fringes produced by an ordered collimating structure;
FIG. 11b shows interference fringes produced by a disordered collimating structure;
FIG. 12 is a top view of a collimating lens layer in a disordered distribution (to illustrate the meaning of the disordered distribution);
FIG. 13 is a schematic perspective view of an interference reducing collimating film provided by the present invention (the microlens array is in disordered distribution);
FIG. 14 is a schematic diagram of a large screen trend of an image recognition module (taking an OLED mobile phone fingerprint recognition module as an example);
FIG. 15 is a schematic diagram of an image recognition module (taking an OLED mobile phone fingerprint recognition module as an example);
FIG. 16 is a schematic view of a bonded alignment film bonded to a lower member (taking an OLED mobile phone fingerprint recognition module as an example);
FIG. 17 is a four layer basic structure of a conformable collimating film;
FIG. 18 shows the effect of the thickness of the adhesive layer on the signal reception of the photosensor;
FIG. 19 is a schematic view of a laminated collimating film structure;
FIG. 20 illustrates the bubble problem of a conformable collimating film designed with thick shading layers;
FIG. 21 is a schematic view of a process for preparing a hole sealing adhesive layer;
FIG. 22 is a four-layer basic structure of a hole sealing conformable collimating film;
FIG. 23 is a schematic view of a hole sealing and pasting type alignment film.
Wherein:
1: target image, 11 to 17: 7 continuous pixel points of the target image; 2: collimator, 21: top (entrance) collimating structure layer, 22: a bottom (light-emitting) collimating structure layer; 3: photoelectric sensing chip, 31-37: 7 photoelectric sensors corresponding to the continuous pixel points; 4: the collimation film provided by the invention, 4': comparative example provided collimating film, 40: central axis of collimating structure (microlens principal axis), 41: collimating lens layer, 41A: microlens array, 41B: thickness of meat, 41C: microlens apex, 42: flexible substrate layer, 43: collimation aperture layer, 43A: light-shielding medium, 43B: a collimating aperture; 5: flat-top beam laser; 6: inspecting the light source; 7: gaussian beam laser; o: laser positioning origin; 01: OLED cell phone, 02: OLED screen, 03: fingerprint identification module, 04: finger, 05: collimation film layer, 06: infrared filter layer, 07: photoelectric sensing layer (including photoelectric sensing chip, flexible circuit board and reinforcement base plate), 44: adhesive layer, 46: hole sealing adhesive layer, 47: a release film; 081: normal signal light path, 082: abnormal signal optical path (signal optical path after OCA deformation), 09: air bubbles.
Detailed Description
In order to make the structure and features of the invention easier to understand, preferred embodiments of the invention will be described in detail below with reference to the drawings.
Comparative example 1
Fig. 9 shows a collimating film for contrast, which includes a collimating lens layer 41, a flexible substrate layer (substrate for short) 42, and a collimating aperture layer 43, where the collimating lens layer is disposed on the upper surface of the substrate, the collimating aperture layer is disposed on the lower surface of the substrate, the collimating lens layer 41 includes a microlens array 41A and a thickness 41B, the collimating aperture layer 43 includes a light-shielding medium 43A and a collimating aperture array (composed of a certain number of collimating apertures 43B) formed by hollowing out the medium; the thickness T of the flexible substrate layer is 25 mu m. The collimating lens array and the collimating hole array of the collimating film are both in regular triangle close arrangement (as shown in fig. 8). The minimum distance P of the main optical axis of the micro lens is 18 mu m, the curvature radius R is 12.6 mu m, the thickness H of the collimating lens layer (the vertical distance from the top point of the micro lens to the upper surface of the substrate) is 8.5 mu m, the thickness t of the collimating hole layer is 2 mu m, and the diameter phi of the collimating hole is 4 mu m. The micro-lens array and the thick material of the collimating lens layer are both transparent polymer PMMA, the refractive index n1 is 1.5, the flexible substrate layer is made of transparent polymer film PET, the refractive index n2 is 1.65, and the shading medium 43A of the collimating hole layer 43 is inorganic coating titanium carbide. The collimating film is formed by punching a collimating hole 43B by a conventional laser punching method (as shown in fig. 5), the central positions of the main optical axis 40 of the microlens and the collimating hole 43B have an alignment deviation, and holes are punched one by one from the laser positioning origin O in one direction, wherein the alignment deviation of the first hole is Δ 1 The misalignment of the nth hole is Δ n ，Δ n-1 <Δ n (n is a natural number greater than 2), the presence of n makes the misalignment Δ exceed 1 μm or even greater. The light transmission coefficient k is very highEasily decreased, even below 0.6, to a "poor" rating.
Example 1
As shown in fig. 6, the collimating film provided by the present invention includes a collimating lens layer 41, a flexible substrate layer 42, and a collimating aperture layer 43, the collimating lens layer is disposed on the upper surface of the substrate, the collimating aperture layer is disposed on the lower surface of the substrate, the collimating lens layer 41 includes a micro lens array 41A and a thick flesh 41B, the collimating aperture layer 43 includes a light-shielding medium 43A and a collimating aperture array (composed of a certain number of collimating apertures 43B) formed after the medium is hollowed out; the thickness T of the flexible substrate layer is 25 mu m. The collimating lens array and the collimating hole array of the collimating film are both in regular triangle close arrangement (as shown in fig. 8). The micro-lens has a minimum distance P of a main optical axis of 18 μm, a curvature radius R of 12.6 μm, a collimating lens layer thickness H of 8.5 μm, a collimating hole layer thickness t of 2 μm, and a collimating hole diameter phi of 4 μm. The micro-lens array and the thick material of the collimating lens layer are both transparent polymer PMMA, the refractive index n1 is 1.5, the flexible substrate layer is made of transparent polymer film PET, the refractive index n2 is 1.65, and the shading medium 43A of the collimating hole layer is inorganic coating titanium carbide. The collimating film adopts a micro-focusing method punching mode (as shown in fig. 4) to punch a collimating hole 43B, the collimating hole array is completely consistent with the distribution of the micro-lens array, the circle centers of any collimating hole are all on the main optical axis 40 of the corresponding micro-lens, the collimating hole array and the micro-lens array are aligned in a one-to-one high-precision mode, and the alignment deviation delta between the circle centers of the collimating holes and the main optical axis of the corresponding micro-lens is 0.47 mu m and less than 1 mu m. When the hole is punched, laser is just focused on the lower surface of PET in a micro-focusing mode, the diameter D of a light spot is 1.7 mu m, the minimum light blocking angle theta is 7.5 degrees, the light transmission coefficient k is 0.98, and the integral performance advantage is obvious compared with that of the comparative example 1.
In fact, the combination of the structural parameters of the collimating lens is not limited to the above embodiments: aiming at the same collimation filtering effect, various changes can be made according to the material and the refractive index of the collimation lens layer, the material and the refractive index of the flexible matrix layer, such as correspondingly changing P, R, H, phi, t and the like; aiming at the light shielding effect of the collimating holes with the same thickness t, various changes can be made to the light shielding medium, such as changes of the types, combinations and even proportions of organic coatings and inorganic coatings.
The properties of the collimating films provided by the present invention were evaluated in the following manner.
(A) Light blocking Property
The final important performance index of a collimating film is the ability to block stray light, and is generally evaluated by the minimum angle at which oblique light can be blocked. When various parameters of the collimating film are determined, the minimum angle θ capable of completely shielding oblique Light can be obtained through conventional optical simulation software (Light tools, zeMax, tracepro, and the like) or theoretical calculation. As shown in FIG. 10, the minimum angle test process of the collimating film, the present invention depends on the size of theta (to the nearest 0.5) ° ) The light blocking performance is divided into 5 grades, and the corresponding relations are as follows: excellent: theta is more than or equal to 0 degree<5 DEG, excellent: theta is more than or equal to 5 degrees<7.5 °, good: theta is not less than 7.5 degrees<10 °, middle: theta is more than or equal to 10 degrees<15 °), difference: theta is more than or equal to 15 degrees.
(B) Light transmission performance
Another important performance criterion of collimating films is the ability to transmit signal light. The alignment precision between the collimating hole and the micro-lens can be checked by using a vertical collimating light source for incidence: when the alignment degree is high enough, the light spot is always in the diameter range of the collimation hole, the light transmittance is the best, and the transmittance is the maximum (obtained by optical simulation or standard sample test of a laser head under the high-precision condition, generally about 90 percent); when the alignment error increases, the transmittance will be attenuated continuously; since the number of collimating holes is very large, the degree of alignment can be compared by measuring the transmittance change under macroscopic conditions in this manner. The ratio of the transmittance obtained by the test to the highest transmittance (the highest transmittance refers to the transmittance measured under the condition that the main optical axis of the micro lens is completely coincided with the central line of the corresponding collimating hole) is defined as a transmittance k, and the transmittance k is 1 when the alignment degree is high enough. The invention divides the light transmission performance into 5 grades according to the size of k, and the corresponding relations are as follows: excellent: k is more than or equal to 1 and more than 0.95, preferably: 0.95 is more than or equal to k is more than 0.9, good: 0.9 is more than or equal to k is more than 0.8, wherein: 0.8 is more than or equal to k and is more than 0.6, difference: k is less than or equal to 0.6.
Obviously, both of the above properties are crucial for the collimating film: the larger k, the stronger the signal; the smaller θ, the less noise; both parameters are of great help to enhance the image recognition signal-to-noise ratio (SNR).
Examples 2 to 24
In the collimating film provided in embodiment 1, the collimating lens arrays and the collimating hole arrays in the collimating film are both arranged in a regular triangle, the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating hole layer 43 is inorganic plated titanium carbide, the collimating film is perforated with the collimating holes 43B by using a microlens perforation method, and the other parameters are listed in table 1.
TABLE 1 design parameters and optical Properties of examples 1-24
Figure GDA0003600620920000191
Figure GDA0003600620920000201
Note 1: p is the minimum distance of the main optical axis of the micro lens and is in the unit of mum; r is the curvature radius of the micro lens and has a unit of mum; h is the thickness of the collimating lens layer in μm; n1 is the refractive index of the collimating lens layer, and is free of dimensional units; t is the thickness of the flexible substrate layer and the unit of micrometer; n2 is the refractive index of the flexible matrix layer and is free of dimensional units; d is the diameter of a light spot formed on the lower surface of the flexible substrate layer after being focused by the micro lens, and the unit of the diameter is mum; t is the thickness of the collimation bore layer, unit μm; phi is the diameter of the collimating hole and the unit is mum; theta is the minimum angle of oblique light that can be filtered by the collimating film, and is used for measuring the collimating and filtering effect in unit ° (ii) a k is the ratio of the actual transmittance to the highest transmittance of the collimating film, and is used for measuring the alignment precision of the collimating holes and the micro lenses.
As shown in table 1, relatively good examples were designed for different P values on a flexible substrate layer of 25 μm thickness. When the P values are 10, 15, 18, 20, 25 and 30 μm, respectively, four examples correspond to each other. It can be found that when the P value and other conditions are unchanged, and the R value is increased, the lens becomes shallow (the height of the thick lens layer is increased; the height of the lens arch, that is, the height from the top point of the lens to the upper surface of the thick lens layer is decreased), the focal length becomes far, and the light spot of the micro-focus on the light shielding layer becomes large, so that the focal point returns to the light shielding layer by matching with the increase of H, the light spot is reduced, the diameter D of the micro-focus light spot can be continuously reduced by matching the change of R and H, the minimum light blocking angle theta is gradually reduced, and the light blocking performance is improved. For the light transmission performance, the closer the spot diameter D is to the opening (collimating hole) diameter Φ, the greater the influence of the misalignment Δ on the light transmission ratio, and a slight deviation, the loss of the signal light will occur, while the smaller the D is relative to Φ, the smaller the influence on the misalignment, and the light will remain in the hole regardless of the direction of movement. In the examples 1 to 24 provided by the invention, the diameter phi of the opening is fixed to be 4 μm, except that D and phi are relatively close in the examples 21 to 23, other examples maintain certain difference, and the light transmission coefficient k is larger than 0.9. In general, most of examples 1 to 24 can achieve the level of more than two excellent light blocking performance and light transmission performance, and are based on the excellent implementation effect of a flexible substrate with the thickness of 25 μm.
Examples 25 to 30
In the collimating film provided in embodiment 1, the collimating lens arrays and the collimating hole arrays in the collimating film are both arranged in a regular triangle, the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating hole layer 43 is inorganic plated titanium carbide, the collimating film is perforated with the collimating holes 43B by using a microlens perforation method, and the other parameters are listed in table 2.
TABLE 2 design parameters and optical Properties of examples 25 to 30
Figure GDA0003600620920000211
Note 1 is as in Table 1.
As shown in Table 2, examples 25 to 30 are examples of different flexible substrate thicknesses. Examples 25 to 27 are P =10 μm for one set of collimating films with T =10, 15, 20 μm, respectively, and examples 28 to 30 are P =25 μm for another set of collimating films with T =25, 38, 50 μm, respectively, with other parameters being constant. When T is increased continuously, in order to maintain the micro-focusing effect (the focus is always located near the lower surface of the substrate and the light-shielding layer and the light spot is minimized), the micro-lens structure obviously needs to be shallow, i.e. in the case of fixing P value and matching refractive index, R value is increased and H is lowered (compared with the difference of the embodiment in table 1, the focal length design is adapted along with the increase of T, so H does not need to be increased, but is lowered). It can be found that, when other conditions are unchanged, the thickness T is increased, which is beneficial to the structure becoming shallow, the light spot D is reduced, the minimum light-blocking angle θ is reduced, the light-blocking performance is improved, and the light-transmitting coefficient is further improved. Therefore, in the range of thickness allowed (ultra-thin applications are more and more common, and too thick is not allowed), the performance improvement of the alignment film is helpful by using a relatively thick substrate, and the principle that the alignment film with a large length-diameter ratio has better performance (such as the principle shown in fig. 3) is met. In the present invention, T is selected from 10 to 50 μm, and more preferably 25 to 38 μm.
Examples 31 to 40
In the collimating film provided in embodiment 1, the collimating lens array and the collimating aperture array of the collimating film are both arranged in a regular triangle, the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating aperture layer 43 is inorganic plated titanium carbide, the collimating film is perforated by using microlenses to form collimating apertures 43B, and the other parameters are listed in table 3.
TABLE 3 design parameters and optical Properties of examples 31-40
Figure GDA0003600620920000221
Note 1 is as in Table 1.
As shown in Table 3, it can be seen from comparative examples 31 to 36 that the R value becomes large as the P value increases without changing other conditions, and the focal length becomes far and H becomes large according to a similar principle if the original aspect ratio is maintained. Even if the focal length can be controlled, the spot radii D and θ cannot be prevented from increasing, and k is therefore decreased for the same aperture diameter. Therefore, in general, the larger P value is not favorable for the performance of the collimating film, which also conforms to the principle that the collimating film with a large length-diameter ratio has better performance (as shown in FIG. 3). In addition, in the comparative examples 37 and 33, 38 and 34, 39 and 35, when the spot D is sufficiently small, the diameter Φ of the opening can be reduced by adjusting the laser energy, and is not necessarily limited to a fixed value, and it can be found that the light blocking performance can be further improved after the diameter of the opening is reduced, but the light transmitting effect is reduced. Example 40 has a P value of 50 μm and a corresponding large R and H, and overall for the collimating film of the present invention, the microlens size has reached the upper design limit, including the fact that the spot diameter D is also large (D is particularly small, and particularly not good less than 0.5 μm, which tends to cause a single point energy too high to burn the substrate), resulting in an aperture diameter Φ reaching the upper limit of 8 μm, while the minimum light-blocking angle θ is also large at 12 degrees, and the light-blocking performance is not very good. In the present invention, in combination, P is selected from 10 to 50 μm, preferably 15 to 30 μm, and more preferably 18 to 25 μm. Φ is selected from 1 to 10 μm (10 μm from example 47), and more preferably 3 to 5 μm. D is selected from 0.1 to 7.8. Mu.m, preferably 0.5 to 4.9. Mu.m, and more preferably 1 to 2 μm.
Examples 41 to 47
As in the collimating film provided in embodiment 1, the collimating lens array and the collimating aperture array of the collimating film are both arranged in a regular triangle, the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating aperture layer 43 is inorganic plated titanium carbide, the collimating film is perforated with the collimating apertures 43B by using a microlens perforation method, and the other parameters are listed in table 4.
TABLE 4 design parameters and optical Properties of examples 41 to 47
Figure GDA0003600620920000231
Note 1 is as in Table 1.
As shown in Table 4, examples 41 to 47 have different thicknesses t of the collimating hole layer. As can be seen from comparison of the first group of examples 41 to 44 or comparison of the second group of examples 45 to 47, when other conditions are not changed, increasing t contributes to improvement of light blocking performance, and t is too thin and is not a preferable value. Since laser drilling typically forms holes with smaller aspect ratios, the hole diameter tends to be larger than t, and thus when t is too thick, the hole diameter is actually too large (as in the second group of embodiments), which in turn gradually reduces the light blocking performance. In the present invention, t is selected from 0.5 to 7 μm, preferably 1 to 5 μm, and more preferably 2 to 3 μm.
Examples 48 to 57
The collimating film provided in embodiment 1, wherein the collimating lens array and the collimating hole array of the collimating film are both arranged in a regular triangle, the collimating lens layer 41 is made of PMMA, and further, the collimating lens layer is formed by polymerizing a photo-curable acrylic resin, the refractive index n1 is adjustable from 1.4 to 1.6, when n2=1.65, the flexible substrate layer 42 is made of PET, when n2=1.5, the flexible substrate layer 42 is made of COP, the light-shielding medium 43A of the collimating hole layer 43 is inorganic plated titanium carbide, the collimating film punches the collimating holes 43B in a microlens punching manner, and the other parameters are listed in table 5.
TABLE 5 design parameters and optical Properties of examples 48 to 57
Figure GDA0003600620920000241
Note 1 is as in Table 1.
As shown in Table 5, examples 48 to 57 with different refractive index combinations are shown. As can be seen by comparing the first set of examples 48 to 52, under otherwise unchanged conditions: 1. increasing n1 (comparative examples 50, 48, 49 or comparative examples 51, 52) helps to reduce the spot D, lower θ and improve the light blocking performance, with n1=1.6 being the best and n1=1.4 being the worst; 2. the reduction in n2 (comparison of examples 51, 52 with examples 48, 49) is equally effective. The law of the influence of the refractive index remains the same in comparison with the second group of examples 53 to 57, but the influence is not so great since the second group has a shallow structure and the properties are inherently sufficiently excellent. For n1, the selection surface of the molding material with too high or too low refractive index is narrow, while for n2, the physical properties and light transmittance of the flexible substrate are considered, and the refractive index is used only for designing the structure accurately. Thus, in the present invention n1 is selected from 1.4 to 1.6, preferably 1.5. n2 is selected from 1.5 to 1.65, which is not preferred depending on the material difference.
Example 58
As in the collimating film provided in embodiment 48, the collimating lens array and the collimating aperture array of the collimating film are both arranged in a square shape (as shown in fig. 7), the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating aperture layer 43 is inorganic plated titanium carbide, the collimating film is perforated by microlenses to form collimating apertures 43B, and the other parameters are listed in table 6.
TABLE 6 design parameters and optical Properties of examples 48, 58
Figure GDA0003600620920000251
Note 1 is as in Table 1.
As can be seen from table 6, when other parameters are not changed, the distribution of the microlenses is changed from regular triangle to square, and a collimating film can still be obtained by matching R and H. But the performance of the collimating film is slightly inferior to the regular triangular distribution. The main reason is that the squares are not dense like regular triangles in distribution, and the squares are larger in ratio between the diagonal lines and P, so that the spherical crowns arranged in the squares are more convex with the same P value, so that light spots are more scattered, D is larger, and theta is increased, the light blocking effect is poor, and the light transmittance is poor due to the fact that D is enlarged. Of course, square arrangement is not undesirable, and a smaller P value needs to be designed to achieve the same effect. The invention does not need to describe more square distribution embodiments, and the square distribution is always within the protection scope of the invention.
Examples 59 to 80
The collimating film as in embodiments 53-57, wherein the collimating lens array and the collimating aperture array of the collimating film are both closely arranged in a regular triangle, the minimum pitch P of the primary optical axes of the microlenses of the collimating lens layer is 20 μm, the radius of curvature R is 18.3 μm, the total thickness of the collimating lens layer is 4.1 μm, the thickness of the flexible substrate layer is 50 μm, the thickness of the collimating aperture layer is 2 μm, and the diameter Φ of the collimating aperture is 4 μm, the collimating film is formed by punching the microlenses to form the collimating apertures 43B, and the alignment errors Δ between the microlenses and the collimating apertures are all less than 1 μm. The light blocking angles theta are all smaller than 5 degrees, the light blocking performance is excellent, the light transmission coefficients k are all larger than 0.95, and the light transmission performance is excellent. The material of the collimating lens layer, the material of the flexible base layer and the material of the collimating hole layer shading medium are listed in table 7, the refractive index n1 of the collimating lens layer and the refractive index n2 of the flexible base layer are different according to the materials and allow errors caused by different processes of +/-0.02 same materials, and the errors are not listed in the table.
TABLE 7 design parameters and optical Properties of examples 59 to 80
Figure GDA0003600620920000252
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Figure GDA0003600620920000261
Note 1 is as in Table 1.
Note 2: for the same material of the collimating lens layer, the molding method is not limited to photocuring, thermocuring, injection molding, hot pressing, etc.
As shown in Table 7, it is understood from comparative examples 59 to 80 that the effect of the alignment film performance is not so much affected when the refractive index of the material is the same or close to that before and after the material is changed.
Examples 81 to 86
A collimating film as provided in example 24, having a cross-section as shown in fig. 6 and a perspective view as shown in fig. 13. The collimating lens array and the collimating hole array in the collimating film are disordered arrays, and the microlenses are closely arranged and overlapped with each other (as shown in fig. 12, the primary optical axis coordinates of any three mutually overlapped microlenses are connected into a common triangle (not a regular triangle), the distance P between the primary optical axes of the two mutually overlapped microlenses is disordered and changes within a certain value range (Pm +/-0.5A), wherein the median Pm and the variation A are listed in table 8, the collimating lens layer 41 is made of PMMA (polymethyl methacrylate), the flexible substrate layer 42 is made of PET (polyethylene terephthalate), the shading medium 43A of the collimating hole layer 43 is inorganic plating titanium carbide, the collimating film is provided with collimating holes 43B by adopting a microlens punching mode, and other parameters are listed in table 8.
TABLE 8 design parameters and optical Properties of examples 24 and 81-86
Figure GDA0003600620920000271
Note 1: p is the distance between the main optical axes of the two mutually overlapped micro lenses, and the value range of P is Pm +/-0.5A and the unit of mum; pm is the average value of the maximum value and the minimum value in the value range of P, called the median, A is the difference between the maximum value and the minimum value in the value range of P, called the variation, unit mum; r is the curvature radius of the micro lens and the unit is mum; h is the thickness (or called height) of the collimating lens layer in μm; n1 is the refractive index of the collimating lens layer, and is free of dimensional units; t is the thickness of the flexible substrate layer and has a unit of micrometer; n2 is the refractive index of the flexible matrix layer and is free of dimensional units; d is the diameter of a light spot formed on the lower surface of the flexible substrate layer after being focused by the micro lens, and the unit of the diameter is mum; t is the thickness of the collimation bore layer, unit μm; phi is the diameter of the collimating hole and the unit is mum; theta is the minimum angle of oblique light that can be filtered by the collimating film to measure the collimating and filtering effect in unit ° (ii) a k is the ratio of the actual transmittance to the highest transmittance of the collimating film for measuring the alignment accuracy of the collimating holes and the microlenses
Note 2: the collimating lens array and the collimating aperture array of example 24 are both in regular triangular close arrangement; the collimating lens arrays and collimating aperture arrays of embodiments 81-86 are both disordered arrays, closely arranged;
as can be seen from table 8, when the other parameters were not changed, the alignment film changed from a fixed P value to a P value that varied randomly, and the performance was not substantially affected. The value A is selected from the range of 1 to 10 μm, preferably 2 to 6 μm, as the amount of change. When a is too small, the interference reduction effect is not significant, and when a is too large, the array morphology becomes poorly controlled, reproducibility is poor, and there are many light leakage regions due to too far distance.
Examples 87 to 92
A collimating film as provided in example 4 has a cross-section as shown in fig. 6 and a perspective view as shown in fig. 13. The collimating lens array and the collimating hole array in the collimating film are disordered arrays, and the microlenses are closely arranged and overlapped with each other (as shown in fig. 12, the primary optical axis coordinates of any three mutually overlapped microlenses are connected into a common triangle (not a regular triangle), the distance P between the primary optical axes of the two mutually overlapped microlenses changes in a disordered way within a certain value range (Pm ± 0.5A), wherein the median Pm and the variation a are listed in table 9, the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating hole layer 43 is inorganic coating titanium carbide, the collimating film punches the collimating hole 43B by adopting a microlens punching way, and other parameters are listed in table 9.
TABLE 9 design parameters and optical Properties of examples 4 and 87-92
Figure GDA0003600620920000281
Note 1 is as in Table 8;
note 2: the collimating lens array and the collimating aperture array of embodiment 4 are both in regular triangle close arrangement; the collimating lens array and the collimating aperture array of examples 87-92 are both disordered arrays, closely arranged;
as is clear from Table 9, when the other parameters were not changed, the P value of the collimating film changed from a constant P value of 18 μm to a disordered P value (disordered change in the narrowest range of 17.5 to 18.5 μm and the widest range of 13 to 23 μm), and the performance was hardly affected. The value A is a variation selected from 1 to 10 μm, preferably 2 to 6 μm. When a is too small, the interference reduction effect is not significant, and when a is too large, the array morphology becomes poorly controlled, reproducibility is poor, and there are many light leakage regions that occur due to too far a distance.
Examples 93 to 102
The cross-section of the collimating film provided in examples 93-102 is shown in FIG. 19. The collimating film comprises a collimating lens array and a collimating hole array, wherein the collimating lens array and the collimating hole array are disordered arrays, the microlenses are closely arranged and overlapped with each other (as shown in figure 12, the primary optical axis coordinates of any three overlapped microlenses are connected into a common triangle, the distance P between the primary optical axes of the two overlapped microlenses is disordered and changes within a certain value range (Pm +/-0.5A), wherein the median Pm is 18 micrometers or 15 micrometers, the variation A is 4 micrometers, namely the value range of P is 18 +/-2 micrometers or 15 +/-2 micrometers, other parameters are listed in table 10, the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the shading medium 43A of the collimating hole layer 43 is inorganic coating titanium carbide, the collimating film is provided with collimating holes 43B formed by perforating the microlenses, other parameters are listed in table 10, the laminating adhesive layers 44 of embodiments 93-99 are solid OCA, the thermosetting polyacrylate system, the adhesive layer 44 of the embodiment 100 is a high-transmittance PSA system, the thermosetting polyacrylate system is adopted as the collimating film, the embodiment 101, the laminating adhesive layer 44 of the PSA system is a thermosetting polyacrylate system, and the curing adhesive layer 102 is made of the PSA system.
TABLE 10 design parameters and optical Properties of examples 93-102
Figure GDA0003600620920000291
Note 1 is as in Table 8;
note 2: the collimating lens array and the collimating aperture array of embodiments 93-102 are disordered arrays and closely arranged;
note 3: t is 2 The thickness of the adhesive layer is expressed in unit of μm;
it can be seen from table 10, examples 93-98 that the thickness of the glue layer (44) does not affect the optical alignment properties (light blocking and light transmission) when the parameters of the three-layer core structure (41, 42, 43) of the interference reduction alignment film are unchanged. But a thickness T 2 Too little can result in poor adhesion (whether before or after reliability), and too much can still result in loss of signal light or crosstalk. In particular, when the thickness T is 2 Increasing the value of (a) to a critical value requires the use of a shallower microlens structure and a collimating film with a larger aspect ratio, such as in examples 98 and 99, with a 50 μm thick flexible matrix layer (which would be problematic if a 25 μm thick layer were still used) and 2.4 μm H. It can be seen from comparison of examples 97 and 100 to 102 that the material of the bonding adhesive layer (44) does not affect the optical alignment performance when the parameters of the three-layer core structure (41, 42, 43) of the interference reduction alignment film are not changed.
It should be understood that, in any of the ordered alignment films of the present invention, the P value can be changed to a certain degree to obtain a new disordered alignment film, and therefore, the Pm value in the disordered alignment film and the P value in the ordered alignment film are both selected from 10 to 50 μm, preferably 15 to 30 μm, and more preferably 18 to 25 μm. The invention only uses the embodiment 24 to carry out disorder optimization, and does not need to list more embodiments for further description, but the patent scope of the disorder collimating film provided by the invention is not influenced.
Comparative examples 2 to 3
The cross section of the attached collimating film provided in embodiment 93 is as shown in fig. 19, and the attached collimating film includes a collimating lens layer 41, a flexible substrate layer 42, a collimating aperture layer 43, and an attachment adhesive layer 44, where the collimating lens layer 41 is disposed on the upper surface of the substrate 42, the collimating aperture layer 43 is disposed on the lower surface of the substrate 42, the collimating lens layer 41 includes a microlens array 41A and a thick-flesh layer 41B, the collimating aperture layer 43 includes a light-shielding medium 43A and a collimating aperture array formed by hollowing out the medium, the collimating aperture array is composed of a certain number of collimating apertures 43B, and the lower surface of the collimating aperture layer is attached to the attachment adhesive layer 44; the thickness T of the flexible matrix layer 42 is 38 μm. The collimating lens array and the collimating hole array of the collimating film are both in regular triangle close arrangement (as shown in fig. 8). The collimating lens layer 41 is made of PMMA (polymethyl methacrylate), the flexible substrate layer 42 is made of PET (polyethylene terephthalate), the shading medium 43A of the collimating pore layer 43 is organic coating black ink, the bonding adhesive layer 44 is solid OCA (optically clear adhesive), and the material is a thermosetting polyacrylate system. The collimating film was perforated with micro-lenses to form collimating holes 43B, and the other parameters and optical properties are listed in table 11.
Examples 103 to 111
Embodiments 103 to 111 provide a hole sealing bonded alignment film, a cross section of which is as shown in fig. 23, including a collimating lens layer 41, a flexible substrate layer 42, a collimating hole layer 43, and a hole sealing bonding adhesive layer 46, where the collimating lens layer 41 is disposed on an upper surface of the substrate 42, the collimating hole layer 43 is disposed on a lower surface of the substrate 42, the collimating lens layer 41 includes a microlens array 41A and a thick-of-flesh 41B, the collimating hole layer 43 includes a light-shielding medium 43A and a collimating hole array formed after hollowing out of the medium, the collimating hole array is composed of a certain number of collimating holes 43B, and the collimating holes 43B of the collimating hole layer 43 are fully filled by the bonding adhesive layer 46; the thickness T of the flexible matrix layer 42 is 38 μm. The collimating lens array and the collimating aperture array of the collimating film are both in regular triangle close arrangement (as shown in fig. 8). The collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, and the shading medium 43A of the collimating aperture layer 43 is organic coating black ink. The collimating film was perforated with micro-lenses to form collimating holes 43B, and the other parameters and optical properties are listed in table 11. The hole sealing adhesive layer 46 of the embodiments 103 to 108 is a solid OCA, and the material is a thermosetting polyacrylate system; the hole sealing adhesive layer 46 of example 109 is a high-transmittance PSA made of a thermosetting polyacrylate system; the hole sealing adhesive layer 46 of the embodiment 110 is a solid OCA made of a photo-curable polyacrylate system; the hole sealing adhesive layer 46 of the embodiment 111 is a high-transmittance PSA, and is made of a photocurable polyacrylate system.
TABLE 11 design parameters and optical Properties of comparative examples 2 to 3 and examples 103 to 118
Figure GDA0003600620920000311
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Note 1 is as in Table 8;
note 2: the collimating lens array and the collimating aperture array of embodiments 103-111 are ordered arrays, closely arranged in regular triangles;
note 3: t is 2 The thickness of the adhesive layer is in unit of μm; Δ SNR is the change before and after the reliability of the signal-to-noise ratio (the initial value is generally corrected to about 10, namely the signal is 10 times of crosstalk), the SNR is reduced, namely the Δ SNR is negative, which means that the imaging performance is poor, and vice versa;
note 4: the reliability conditions are generally 85% bis (85 ℃) &85% RH) for 500 hours;
as can be seen from table 11 comparing examples 2 and 3 with examples 103 and 104, when the alignment holes are hollow holes, the SNR degradation after reliability is large, and the degradation after filling the alignment holes is significantly reduced, and the imaging performance degradation is significantly alleviated. It is clear from comparative examples 104 to 108 that the thickness of the adhesive layer has little influence on the image forming effect after reliability. It can be seen from comparison of examples 104 and 109 to 111 that the material of the adhesive layer is not greatly affected. It should be understood that the invention is not limited to the microlens array of the collimating film layer, and the collimating film layer of the above embodiment can be replaced with the interference reducing collimating film layer.
It should be noted that the above-mentioned embodiments are only exemplary embodiments of the present invention, and are not intended to limit the scope of the present invention. All equivalent changes and modifications made according to the disclosure of the present invention are covered by the scope of the claims of the present invention.

Claims (6)

1. A hole sealing joint type alignment film is characterized in that the hole sealing joint type alignment film is provided with four main structures from top to bottom, namely an alignment lens layer, a flexible substrate layer, an alignment hole layer and a hole sealing joint glue layer; the collimating lens layer comprises a micro-lens array and a thickness; the collimation hole layer comprises a shading medium and a collimation hole array formed after the shading medium is hollowed out; the distribution of the collimation hole array is completely consistent with that of the micro lens array, and each collimation hole is arranged on the main optical axis of the corresponding micro lens; the main optical axis coordinates of the adjacent three micro lenses are connected to form a regular triangle; the hole sealing and attaching adhesive layer fully fills the collimating hole array of the collimating hole layer; the shading medium of the collimation hole layer is an opaque polymer ink system; p is the minimum distance of the main optical axis of the micro lens and is 30 mu m; r is the curvature radius of the micro lens and is 19.3 mu m; h is the thickness of the collimating lens layer and is 10.8 mu m; n1 is the refractive index of the collimating lens layer and is 1.5; t is the thickness of the flexible substrate layer and is 38 mu m; n is a radical of an alkyl radical 2 The refractive index of the flexible matrix layer is 1.65; d is the diameter of a light spot formed on the lower surface of the flexible substrate layer after being focused by the micro lens, and is 3.6 mu m; t is the thickness of the collimation hole layer and is 5-7 μm; phi is the diameter of the collimation hole and is 3.0-5.0 mu m; delta is the alignment deviation between the center of the collimating hole and the main optical axis of the corresponding micro lens, the unit is micrometer, and Delta is 0.19-0.33; t is 2 The thickness of the adhesive layer is 5-50 μm; the collimating lens layer is made of PMMA, and the flexible base layer is made of PET.
2. The hole sealing conformable collimating film of claim 1, wherein the hole sealing conformable adhesive layer is a solid optical clear adhesive.
3. The hole sealing adhesive collimating film of claim 1, wherein the hole sealing adhesive layer is a high transmittance pressure sensitive adhesive.
4. The hole sealing adhesive collimating film of claim 1, wherein the hole sealing adhesive layer is a transparent hot melt adhesive.
5. The preparation method of the hole sealing attaching type collimating film according to any one of claims 1 to 4, characterized by comprising the following steps:
(1) Preparing a collimating film;
(2) Preparing a hole sealing adhesive layer, namely coating hole sealing adhesive on the back surface of the collimating film, fully filling the collimating holes with the adhesive to form the hole sealing adhesive layer, covering a release film and curing;
(3) And tearing the release film before use to form the hole sealing attaching type alignment film.
6. An image recognition module is characterized by sequentially comprising a collimation layer, a filter layer and a photoelectric sensing layer; the alignment layer is selected from the hole sealing conformable alignment film of any of claims 1-4.
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