CN113296174B - Collimation film, interference reduction collimation film, full-lamination collimation film and image recognition module - Google Patents

Collimation film, interference reduction collimation film, full-lamination collimation film and image recognition module Download PDF

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CN113296174B
CN113296174B CN202110204803.9A CN202110204803A CN113296174B CN 113296174 B CN113296174 B CN 113296174B CN 202110204803 A CN202110204803 A CN 202110204803A CN 113296174 B CN113296174 B CN 113296174B
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collimating
layer
film
hole
lens
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CN113296174A (en
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李刚
夏寅
付坤
高斌基
王小凯
赵国林
唐海江
张彦
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Ningbo Exciton Technology Co Ltd
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/29Laminated material
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/30Collimators
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0037Arrays characterized by the distribution or form of lenses
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/549Organic PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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Abstract

The invention belongs to the field of image recognition, and particularly relates to a collimating film, an interference reducing collimating film, a full-lamination collimating film and an image recognition module. The invention provides a collimating film, an interference reducing collimating film, a full-lamination collimating film and an image recognition module, aiming at solving the problem that two layers of collimating diaphragms in a traditional rigid collimating sheet are difficult to align. The fully-laminated collimating film sequentially comprises an upper laminating adhesive layer, a low-folding filling layer, a high-folding collimating lens layer, a flexible substrate layer, a collimating hole layer and a lower laminating adhesive layer; the upper surface of the lower adhesive layer protrudes upwards in the collimating hole to form a micro lens in the hole. The fully-laminated collimating film provided by the invention improves the signal-to-noise ratio, is favorable for the design of a high-resolution sensor, and can be applied to fingerprint unlocking and the like of consumer electronic products such as mobile phones (OLED screens).

Description

Collimation film, interference reduction collimation film, full-lamination collimation film and image recognition module
Technical Field
The invention belongs to the field of image recognition, and particularly relates to a collimating film, an interference reducing collimating film, a full-lamination type collimating film, an image recognition module and a preparation method thereof.
Background
In the field of image recognition, a common image sensor such as a CMOS type or a photo-TFT type generally includes a collimator device in a sensor module to enhance a signal-to-noise ratio, improve a recognition rate, and reduce crosstalk. The collimating device (as shown in fig. 1) mainly collimates and filters diffused light at a single-point pixel of an image, so that normal collimated light or nearly collimated light (signal) can be smoothly transmitted to a corresponding photoelectric sensor, while light (noise) with a large angle deviating from the normal direction can only rarely or even cannot enter a non-corresponding photoelectric sensor, and thus, the signal-to-noise ratio is enhanced.
The collimating devices typically have a top collimating structure layer and a bottom collimating structure layer: first, the top and bottom double-layer collimating structures need to be aligned precisely, otherwise the intensity of the signal light is greatly reduced (as shown in fig. 2); secondly, the distance between the top (incident) and bottom (emergent) collimating structures needs to be increased, or the microstructure size needs to be reduced (as shown in fig. 3) to increase the overall aspect ratio, otherwise the transmission of crosstalk light will be increased.
The traditional collimating device is generally a rigid collimating sheet, such as an optical fiber bundle slice, or a Microlens (Microlens), a collimating diaphragm and the like formed on two sides of a glass substrate, and the rigid collimating sheet generally needs to keep higher thickness, on one hand, the rigid collimating sheet is used for keeping the length-diameter ratio, on the other hand, the rigid collimating sheet is used for keeping the mechanical property of the rigid collimating sheet and preventing the rigid collimating sheet from being broken in an application environment. However, even then, such rigid alignment plates are not satisfactory for large-sized image recognition modules. In particular, applications requiring a reduced overall thickness (e.g., ultra-thin, large screen handsets) become more fragile, and have a lower production yield, both performance and cost. It is also apparent that such rigid collimating sheets are less likely to be in a flexible image recognition module.
Except for the optical fiber bundle type collimating sheets (the top layer collimating structure and the bottom layer collimating structure are aligned originally), most of the rigid collimating sheets need to complete the alignment of two layers of collimating structures (collimating diaphragms). However, the two-layer structure prepared in sequence needs to be aligned with high precision, which has considerable difficulty: firstly, very complex and expensive double-shaft positioning equipment is needed, the positioning process is complicated and time-consuming, if the size of a collimation structure is smaller than 50 micrometers (image precision DPI > 508), the lattice scale can reach hundreds of millions of points per square meter, and the production efficiency is extremely low; secondly, the alignment method is not accurate in practice, and especially when the size of the collimating structure is reduced and the number of collimating structures is increased, the accumulated error becomes more obvious, which results in the decrease of signal light intensity, and frequent origin correction becomes more time-consuming.
In conclusion, the traditional rigid collimating sheet has the problems of high thickness, fragility and poor performance under the condition of low thickness, and the problems of difficult alignment, low yield and low productivity of a two-layer collimating structure (collimating diaphragm), and is difficult to apply in the field of large-size, ultrathin and flexible image recognition.
Disclosure of Invention
The invention provides a collimating film, an interference reduction collimating film, a laminating collimating film, an image recognition module and a preparation method thereof, aiming at solving the problem that two layers of collimating diaphragms in a traditional rigid collimating sheet are difficult to align. The collimating film provided by the invention only comprises one collimating aperture layer, so that the problem that two layers of collimating diaphragms are difficult to align is solved. Compared with the ordered collimating film, the interference reducing collimating film provided by the invention can reduce the light interference phenomenon and improve the image recognition accuracy.
In order to solve the technical problem, the invention adopts the following technical scheme:
the invention provides a collimating film, which sequentially comprises a collimating lens layer, a flexible substrate layer and a collimating hole layer.
The collimating aperture layer is a collimating diaphragm.
The collimating film provided by the invention only comprises one layer of collimating diaphragm. The collimating film provided by the invention only comprises one collimating hole layer.
The collimating film sequentially comprises a collimating lens layer, a flexible substrate layer and a collimating hole layer.
The collimating lens layer is arranged on the upper surface of the flexible substrate, and the collimating hole layer is arranged on the lower surface of the flexible substrate.
The collimating lens layer includes a microlens array and a thickness.
The collimating aperture layer comprises an array of collimating apertures.
The collimation hole layer comprises a shading medium layer and a collimation hole array.
The collimation hole layer comprises a shading medium and a collimation hole array formed after the medium is hollowed out.
The distribution of the collimation hole array and the micro-lens array is completely consistent. Each collimating aperture is on the primary optical axis of the corresponding microlens. Furthermore, the center of each collimating hole is on the main optical axis of the corresponding microlens.
The collimating film is punched by adopting a micro-focusing method, the distribution of the collimating hole array is completely consistent with that of the micro-lens array, the circle center of any collimating hole is positioned on the main optical axis of the corresponding micro-lens, one-to-one high-precision alignment is carried out, and the alignment deviation delta is less than 1 mu m. The thickness T of the flexible matrix layer is selected from 10 to 50 μm, preferably 25 to 38 μm.
The micro-lens array of the collimating lens layer is orderly arranged. The foregoing collimating films are referred to as ordered collimating films (also known as ordered collimating structures). The foregoing ordered arrangement is characterized in that the pitch P of the principal optical axes of adjacent microlenses is a constant value.
The micro-lens array of the collimation lens layer and the collimation hole array of the collimation hole layer are arranged in sequence. The foregoing collimating films are referred to as ordered collimating films (also known as ordered collimating structures).
Further, the micro-lens array of the collimating lens layer is arranged in a disordered manner. The collimating film in which the microlens array is arranged in a disordered manner is called a subtractive interference collimating film (also called a disordered collimating structure, or a disordered array collimating film). The foregoing disordered arrangement is characterized in that the pitch P of the principal optical axes of adjacent microlenses is a value that varies within a range. Compared with the ordered collimating film, the interference reducing collimating film can reduce the phenomenon of light interference and improve the accuracy (recognition rate) of image recognition.
Further, the micro-lens array of the collimating lens layer and the collimating hole array of the collimating hole layer are arranged in disorder. The aforementioned collimating film is referred to as a subtractive interference collimating film (also referred to as a disordered collimating structure).
Further, in the interference reducing collimation film, in the microlens array of the collimation lens layer, the coordinates of the main optical axes of the three adjacent microlenses are connected to form a non-regular triangle.
One collimating hole in the collimating hole array corresponds to the position of one micro lens in the micro lens array, and the main optical axis of the micro lens is coincident with the center of the collimating hole or has the deviation smaller than 1 μm. One microlens corresponding to one alignment hole location is referred to as the corresponding microlens for that alignment hole. The coordinates of the main optical axes of three adjacent microlenses are connected to form a regular triangle (formed by connecting the coordinates of the main optical axes of three mutually overlapped microlenses), or the coordinates of the main optical axes of four adjacent microlenses are connected to form a square (formed by connecting the coordinates of the main optical axes of four mutually overlapped microlenses).
The microlenses in the microlens array are closely arranged. I.e. adjacent microlenses are touching or overlapping each other.
The collimating lens array and the collimating hole array of the collimating film are both in regular triangle (formed by connecting the coordinates of the main optical axes of three mutually overlapped micro lenses) close arrangement or in square (formed by connecting the coordinates of the main optical axes of four mutually overlapped micro lenses) close arrangement.
Furthermore, in the collimating lens layer, the distance P between the main optical axes of the adjacent micro lenses is 10-50 μm, the radius R of the micro lenses is 6.1-30.2 μm, the height H of the collimating lens layer is 1.1-27.4 μm, and the refractive index n1 of the material of the collimating lens layer is 1.4-1.6; in the flexible matrix layer, the thickness T of the flexible matrix layer is 10-50 mu m, and the refractive index n2 of the material of the flexible matrix layer is 1.5-1.65; in the collimation hole layer, the thickness t of the collimation hole layer is 0.5-7 μm, and the diameter phi of the collimation holes in the collimation hole array is 1-10 μm.
In the ordered collimating film, the pitch P of the principal optical axes of adjacent microlenses are the same, and P is selected from 10 to 50 μm, preferably 15 to 30 μm, and more preferably 18 to 25 μm.
The micro lens of the collimating film focuses vertically incident light rays and forms a light spot with the diameter D on the lower surface of the flexible substrate layer, wherein D is selected from 0.1-7.8 microns, preferably 0.5-4.9 microns, and more preferably 1-2 microns.
The light spot diameter D is determined by the curvature radius R (spherical radius R) of the micro lens, the refractive index n1, the thickness H (vertical distance from the top of the micro lens to the upper surface of the substrate) of the collimating lens layer, the refractive index n2 of the flexible substrate layer and the thickness T.
The curvature radius R of the micro lens is selected from 6.1-30.2 μm, the thickness H of the collimating lens layer is selected from 1.1-27.4 μm, R and H are not preferred, and the micro lens is adapted according to other parameters.
The refractive index n1 of the collimating lens layer (i.e., the microlens layer) is selected from 1.4 to 1.6, preferably 1.5.
The refractive index n2 of the flexible substrate layer is selected from 1.5-1.65, which is different from material to material, is not preferred, and allows errors caused by different processes of plus or minus 0.02 same material.
The micro-lens array of the collimating film is made of the same material as the thick meat, and the material is transparent polymer.
Further, the transparent polymer of the microlens layer is selected from one of AR (Acrylic Resin, acrylic Resin or modified Acrylic Resin), PC (polycarbonate), PET (polyethylene terephthalate), PEN (polyethylene naphthalate), PI (polyimide), PS (polystyrene), SR (Silicon Resin), FEP (perfluoroethylene propylene copolymer), or EVA (ethylene-vinyl acetate copolymer). Further, it is preferable that the material is one of PMMA (polymethyl methacrylate), PC, or PS.
The flexible matrix layer of the collimating film is a transparent polymer film.
Further, the transparent polymer film is made of one material selected from PET, PEN, PI, PC, PMMA (polymethyl methacrylate), PP (polypropylene), PO (polyolefin), SR, or COP (cyclic olefin copolymer). Further, one of PET, PI, PC, and PMMA is preferable.
The shading medium of the collimation pore layer of the collimation film is one or the combination of at least two of organic paint and inorganic plating.
The organic coating of the opacifying medium is selected from opaque polymeric ink systems.
Further, the opaque polymeric ink system comprises a light absorbing material and a polymeric curing system.
Further, the light absorbing material is selected from one or a combination of at least two of carbon (such as carbon black, carbon fiber, graphite, etc.), carbide (such as chromium carbide, titanium carbide, boron carbide, etc.), carbonitride (such as titanium carbonitride, boron carbonitride, etc.), sulfide (such as ferrous sulfide, molybdenum disulfide, cobalt disulfide, nickel sulfide, etc.).
Further, the polymer curing system may be selected from one or a combination of at least two of acrylic systems (AR), polyurethane systems (PU), silicone Systems (SR), epoxy systems (EP), melamine resin systems (MF), phenolic resin systems (PF), urea resin systems (UF), or thermoplastic elastomeric materials (e.g. ethylene-vinyl acetate copolymers, thermoplastic elastomers TPE, or thermoplastic polyurethane elastomers TPU).
Further, the polymer curing system may be selected from one or a combination of at least two of an acrylic resin system, a polyurethane system, a silicone system, an epoxy resin system, or a thermoplastic elastomer.
The inorganic coating of the shading medium is selected from one or the combination of at least two of simple carbon, carbide, carbonitride and sulfide.
The thickness t of the collimation hole layer of the collimation film is selected from 0.5-7 μm, preferably 1-5 μm, and further preferably 2-3 μm.
The diameter phi of the collimation hole layer of the collimation film is selected from 1-10 mu m, and is further preferably 3-5 mu m.
Further, the flexible matrix layer thickness T may be 10 μm to 50 μm, such as 10 μm,15 μm,20 μm,25 μm,38 μm or 50 μm.
Further, the chief optical axis pitch P of adjacent microlenses of the collimating lens layer may be 10 μm to 15 μm, such as 10 μm,15 μm,18 μm,20 μm,25 μm,30 μm, or 50 μm.
Further, the radius of curvature R of the microlenses of the collimating lens layer can be 6.1 μm to 30.2 μm, such as 6.1 μm,6.9 μm,7.9 μm,9.4 μm,11.2 μm,11.3 μm,12 μm,12.1 μm,12.6 μm,12.8 μm,13.3 μm,13.6 μm,14 μm,14.3 μm,14.3 μm,14.8 μm,15 μm,15.1 μm,15.7 μm,15.9 μm,16 μm,16.1 μm,16.7 μm,17 μm,17.2 μm,17.3 μm,18 μm,18.1 μm,18.3 μm,18.8 μm,19.3 μm,19.4 μm,19.6 μm,19.8 μm, 20.3 μm,20.6 μm,20.5 μm,22.5 μm, or 22.6 μm.
Further, the collimating lens layer thickness H may be 1.1 μm to 27.4 μm, such as 1.1 μm,2.4 μm,2.5 μm,3.0 μm,3.1 μm,3.2 μm,3.5 μm,3.8 μm,4.1 μm,5.0 μm,5.8 μm,6.0 μm,6.2 μm,6.8 μm,7.2 μm,7.8 μm,8.5 μm,8.6 μm,8.7 μm,9.2 μm,10.4 μm,10.7 μm,10.8 μm,11 μm,11.1 μm,11.4 μm,11.5 μm,12.9 μm,13.6 μm,14.1 μm,14.6 μm,15.0 μm,15.4 μm,16.3 μm,17.3 μm,18.1 μm,19.8 μm,20.5 μm,21.3 μm,22.2 μm,22.7 μm,25 μm, or 27.4 μm.
Further, the diameter D of the light spot formed by the micro-lenses on the lower surface of the flexible substrate layer may be 0.1 μm to 7.8 μm, such as 0.1 μm,0.3 μm,0.4 μm,0.5 μm,0.6 μm,0.7 μm,0.8 μm,1.0 μm,1.1 μm,1.2 μm,1.4 μm,1.5 μm,1.6 μm,1.7 μm,1.8 μm,2.0 μm,2.2 μm,2.4 μm,2.5 μm,2.6 μm,2.8 μm,3.1 μm,3.4 μm,3.6 μm,3.7 μm,3.9 μm,4.0 μm,4.9 μm, or 7.8 μm.
Further, the thickness t of the collimating aperture layer may be 0.5-7 μm, such as 0.5 μm,1 μm,2 μm,3 μm,4 μm,5 μm, or 7 μm.
Further, the diameter φ of the collimating holes may be 1-10 μm, such as 1 μm,2 μm,3 μm,4 μm,5 μm,6 μm,8 μm, or 10 μm.
Further, the refractive index n1 of the collimating lens layer may be 1.34-1.7, such as 1.34,1.4,1.47,1.48,1.5,1.59,1.6,1.65,1.66, or 1.7.
Further, the refractive index n2 of the flexible substrate layer may be 1.48 to 1.7, such as 1.48,1.49,1.5,1.6,1.65,1.66 or 1.7.
Further, the collimating film provided by the invention comprises a collimating lens layer (41), a flexible substrate layer (42) (simply referred to as a substrate) and a collimating hole layer (43), wherein the collimating lens layer is arranged on the upper surface of the substrate, the collimating hole layer is arranged on the lower surface of the substrate, the collimating lens layer (41) comprises a micro-lens array (41A) and a thick-flesh layer (41B), and the collimating hole layer (43) comprises a light-shielding medium (43A) and a collimating hole array (formed by a certain number of collimating holes (43B)) formed after the medium is hollowed out.
In examples 1 to 24, the collimating lens array and the collimating aperture array in the collimating film are both arranged in a regular triangle, the collimating lens layer (41) is made of PMMA, the flexible substrate layer (42) is made of PET, the light-shielding medium (43A) of the collimating aperture layer (43) is inorganic plated titanium carbide, and the collimating film is perforated with collimating apertures (43B) in a microlens perforation manner. The other parameters are as follows:
p is 10-30 μm, R is 9.4-20.6 μm, H is 3-27.4 μm, n1 is 1.5;
t is 25 μm, n2 is 1.65, D is 0.3-4.0 μm;
t is 2.0 μm and φ is 4.0 μm. Further, the deviation Δ is 0.18 to 0.90 μm.
In embodiments 25 to 30, the collimating lens array and the collimating aperture array in the collimating film are both arranged in a regular triangle, the collimating lens layer (41) is made of PMMA, the flexible substrate layer (42) is made of PET, the light-shielding medium (43A) of the collimating aperture layer (43) is inorganic plated titanium carbide, the collimating film is perforated with collimating apertures (43B) in a microlens perforation manner, and the other parameters are as follows:
p is 10-25 μm, R is 6.1-19.8 μm, H is 2.5-10.7 μm, n1 is 1.5;
t is 10-50 μm, n2 is 1.65, D is 0.6-3.9 μm;
t is 1.0-3.0 μm, and phi is 2.0-5.0 μm. Further, the deviation Δ is 0.26 to 0.49 μm.
In embodiments 31 to 40, the collimating lens array and the collimating aperture array of the collimating film are both arranged in a regular triangle, the collimating lens layer (41) is made of PMMA, the flexible substrate layer (42) is made of PET, the light-shielding medium (43A) of the collimating aperture layer (43) is inorganic plated titanium carbide, the collimating film is perforated by using a microlens to form collimating apertures (43B), and other parameters are as follows:
p is 10-50 μm, R is 16-30.2 μm, H is 1.1-21.3 μm, n1 is 1.5;
t is 50 μm, n2 is 1.65, D is 0.1-7.8 μm;
t is 0.5 μm and phi is 1.0-8.0 μm. Further, the deviation Δ is 0.21 to 0.88 μm.
In embodiments (41) to (47), the collimating lens array and the collimating aperture array of the collimating film are both arranged in a regular triangle, the collimating lens layer (41) is made of PMMA, the flexible substrate layer (42) is made of PET, the light-shielding medium (43A) of the collimating aperture layer (43) is inorganic plated titanium carbide, the collimating film is perforated by using microlenses to form collimating apertures (43B), and other parameters are as follows:
p is 30 μm, R is 19.3 μm, H is 10.8 μm, n1 is 1.5;
t is 38 μm, n2 is 1.65, D is 3.6 μm;
t is 0.5-7 μm, and phi is 5.0-10.0 μm. Further, the deviation Δ is 0.46 to 0.99 μm.
In embodiments 48 to 57, the collimating lens array and the collimating aperture array of the collimating film are both regularly triangularly and closely arranged, the collimating lens layer (41) is made of PMMA, and further, is polymerized from a photo-curable acrylic resin, the refractive index n1 is adjustable from 1.4 to 1.6, when n2=1.65, the flexible substrate layer (42) is made of PET, when n2=1.5, the flexible substrate layer (42) is made of COP, the light-shielding medium (43A) of the collimating aperture layer (43) is inorganic-coated titanium carbide, the collimating film is perforated with collimating apertures (43B) by using a microlens perforation method, and other parameters are as follows:
p is 20-25 μm, R is 15.9-22.5 μm, H is 3.2-9.2 μm, n1 is 1.4-1.6;
t is 38-50 μm, n2 is 1.5-1.65, D is 0.5-3.6 μm;
t is 2.0 μm and phi is 4.0 μm. Further, the deviation Δ is 0.25 to 0.66 μm.
In example 58, the collimating lens array and the collimating aperture array of the collimating film are both arranged in a square shape (as shown in fig. 7), the collimating lens layer (41) is made of PMMA, the flexible substrate layer (42) is made of PET, the light-shielding medium (43A) of the collimating aperture layer (43) is inorganic plated titanium carbide, the collimating film is perforated with collimating apertures (43B) by using a microlens perforation method, and other parameters are as follows:
p is 25 μm, R is 19.6 μm, H is 11.1 μm, n1 is 1.5;
t is 38 μm, n2 is 1.65, D is 3.9 μm;
t is 2.0 μm and phi is 4.0 μm. Further, the deviation Δ was 0.69 μm.
The invention also provides a preparation method of the collimating film, and the collimating holes are punched by adopting a micro-focusing method.
Furthermore, in the preparation method, laser is vertically irradiated on the collimating lens layer, the laser is focused through the micro-lens of the collimating lens layer, and a collimating hole is punched on a collimating hole layer by a focused light spot. In the preparation method, the distribution of the collimation hole array and the micro-lens array is completely consistent, and the circle center of any collimation hole is on the main optical axis of the corresponding micro-lens.
Further, the preparation method comprises the following steps:
(1) Forming the collimating lens layer on the upper surface of the flexible substrate layer by adopting a lens array (concave) mould (light curing, heat curing, hot press forming and other modes can be adopted) to form a lens array (convex);
(2) Coating/plating a shading medium on the lower surface of the substrate layer by adopting a wet method/dry method coating technology;
(3) The large-area flat-top laser (parallel laser after Gaussian beam shaping) is adopted, a micro-lens array is vertically irradiated with proper low energy, each micro-lens is focused on a shading medium (namely, a micro-focusing method) and corresponding collimating holes are punched, so that collimating hole arrays in the same distribution are generated, and a collimating hole layer is formed.
Further, the micro-focusing method comprises the following features:
(1) Flat-top laser after beam shaping is adopted as a laser source, the irradiation area is enlarged after shaping, and the energy density is reduced;
(2) The front side is irradiated, the energy density is low, and the energy is concentrated through the micro-focusing process of the micro-lens per se, so that the high energy density is realized;
(3) The micro-focused light spot needs to be small enough in a reasonable range, the focal point position needs to be designed on the lower surface or deeper part of the PET, and energy is concentrated on the shading layer (shading medium);
(4) The micro-lens layer has high universality, and is applicable to irregular micro-lens layers, such as poor lens arrangement precision and shape precision, uneven spacing and even disorder.
Further, the process of the micro-focusing method (as shown in fig. 4) is divided into four basic steps: (a) Flat-top laser (5) is applied to a collimating lens layer (41) of a collimating film semi-finished product with proper energy (too high hole is too large, even the hole is burnt to a substrate, too low, no hole is formed), micro focusing is realized by a micro lens (41A), pre-reduction of the area of a light spot is realized by a thick plate (41B), finally the laser penetrates through the substrate layer (42) and is focused into a very small light spot on a shading medium (43A), and high concentration of energy is realized; (b) Due to the absorption of the light by the shading medium, the energy is instantaneously accumulated to cause the shading medium at the position of the light spot to be instantaneously burnt through and generate some ash, and actually, the process of the first two steps only needs microsecond level and is very quick; (c) After the ash is pumped away, the alignment holes (43B) are exposed, and are basically positioned on the main optical axis (40) of the micro lens and are highly aligned with the micro lens (41A), so that the time-consuming alignment process is avoided, and at the moment, the alignment film (4) is a finished product and comprises a complete structure, namely an alignment lens layer (41), a base layer (42) and an alignment hole layer (43); (d) The collimating film (4) meets the normal direction or is high in collimated light passing close to the normal direction at the moment, a testing light source (such as white light, green light and a triple-wave lamp) with common intensity can be used for irradiating from the surface of the micro-lens during online production, light can penetrate through the collimating hole, a light hole array image can be observed on the back surface, the penetrating light intensity can be quantized, the punching quality can be tested, automatic detection can be easily realized on an assembly line in the process, and the map image obtained by sampling and capturing at a specific position can also be subjected to data analysis (the size, the distance, the array form and the like of the hole).
Compared with the micro-focusing method for perforating provided by the invention, the traditional perforating mode has larger limitation (as shown in figure 5): (a) The Gaussian laser (7) is focused through a lens group of the laser head and is shot on the shading medium (43A) from the back direction of the semi-finished product; (b) The different positions of the light shielding layer are sequentially burnt through, and some ash is generated; and (c) when ash is pumped away, the collimating holes are exposed. It can be seen that, in the whole alignment process, an original point O (or called Mark point) needs to be located, a CCD (Charge Coupled Device) high-definition camera on the front side aligns to the optical center of a lens, a laser head on the back side can be linked with the CCD camera on the front side, and the position of a corresponding collimation hole is found, so as to calculate the initial displacement (vector or coordinate difference) between the first point and the position, the initial positioning process is time-consuming and complex, and the requirement on equipment is high; then, all the point positions can be calculated and positioned according to the initial displacement and the point displacement, 2-n points are sequentially punched, although the time can be shortened by using a vibrating mirror group in the process, n cannot be set too large, otherwise, the accumulated error inevitably exceeds 1 micrometer and is even larger, especially, the vibrating mirror can cause the angle inclination, the light spot becomes larger and deforms, and the error is accumulated more and more quickly; finally, when the error is accumulated to be unacceptable, the original point O is required to be retreated, and the first point is searched again, namely, the initial positioning process is repeated. Throughout the whole process, although the time is shortened by adopting the galvanometer group, the n can not be too large, and the initial positioning process needs to be frequently carried out, so that the method is time-consuming, complex and dependent on equipment, and the punching process is high in cost and low in precision.
Further, the limitations of the conventional punching method are not limited to this: the process of locating the first point and calculating the 2-n points requires a precondition that the pitch of the microlenses is completely accurate; in fact, on one hand, the mold for the microlens is also prepared by laser drilling, and errors are inevitably generated, so that the alignment error of the traditional mode is further increased, especially when the mold precision is not so high; on the other hand, some special molds produce irregular microlens layers, which have poor arrangement precision and shape precision of the microlenses, or have non-uniform or even disordered designed spacing. Thus, the phase change of the conventional process increases the mold precision and manufacturing cost of the microlens layer, resulting in very high cost of the whole collimating film, not to mention the realization of the alignment punching of the irregular microlens layer (while the micro-focusing method of the present invention can be easily realized).
It should be noted that the microlens array forming method should be selected according to the kind and application of the transparent polymer, and the present invention is not preferred; the coating mode of the light-shielding medium is selected according to the type of the light-shielding medium, the organic coating needs to be selected from a wet coating mode, and the inorganic coating needs to be selected from a dry coating (namely physical vapor deposition) mode.
It should be noted that the method for preparing the collimating film provided by the invention is suitable for producing sheets and is also suitable for producing coiled materials.
The collimating film can be used as a flexible collimating device for an image sensor module. The collimating film can collimate and filter diffused light at a single-point pixel position of an image to a certain degree to form a normal small beam light signal, and transmits the normal small beam light signal to a corresponding photoelectric sensor, and is particularly suitable for large-size, ultrathin and even flexible image identification modules.
Compared with the prior art, the collimating film provided by the invention adopts the polymer film with the thickness of 10-50 μm as the flexible substrate layer, realizes the flexibility, ultrathin and large size of the collimating device, and is particularly suitable for large-size, ultrathin and even flexible image recognition modules.
Compared with the prior art, the collimating film provided by the invention adopts a micro-focusing method to punch, the distribution of the collimating hole array and the distribution of the micro-lens array are completely consistent, the circle center of each collimating hole is positioned on the main optical axis of the corresponding micro-lens, the collimating holes are aligned in a one-to-one high-precision mode, the alignment deviation is less than 1 mu m, the transmission of signal light is greatly improved, the collimating structure is allowed to be further reduced (such as the micro-lens and the collimating holes are synchronously reduced) to reduce crosstalk, the signal-to-noise ratio of the collimating film is improved, the production efficiency is greatly improved, and the cost is reduced.
Compared with the prior art, the collimating film provided by the invention only comprises one collimating aperture layer, the problem that two layers of collimating diaphragms are difficult to align with each other is fundamentally solved, the collimating film is low in thickness, good in toughness and not easy to break, the circle center of a collimating aperture prepared by adopting a micro-focusing method is positioned on the main optical axis of a corresponding micro-lens, and the collimating aperture is accurately aligned with the corresponding micro-lens. The preparation method of the collimating film provided by the invention is easy to operate, can be used for mass production, and improves the production yield. The collimating film provided by the invention has excellent performance, and can filter diffused light by collimated light. The collimating film provided by the invention can be applied to large-size and ultrathin image identification modules, so that the mass production of the large-size, ultrathin and even flexible image identification modules is greatly improved, and when the collimating film is applied to a fingerprint unlocking scheme of consumer electronic products such as mobile phones (OLED screens), the collimating film has obvious advantages due to great market demands and higher pursuit on the characteristics such as ultrathin, large screens and flexibility.
In addition, the orderly distributed collimating structure (which means that the microlens array of the collimating lens layer is orderly arranged) can meet the basic image recognition requirement in practical application, but there are interference fringes caused by too high regularity, as shown in fig. 11 a. Therefore, it is necessary to optimize the collimating structure to a disordered distribution, destroy the regularity, and weaken the interference fringes, as shown in fig. 11b, in order to further improve the image recognition accuracy (recognition rate).
The micro-lens array of the collimating lens layer of the interference-reducing collimating film provided by the invention is arranged in disorder, and the micro-focusing punching mode is adopted, so that the collimating hole array of the collimating hole layer is completely consistent with the micro-lens array, the characteristic of disorder distribution is kept, high-precision coaxial alignment is also maintained, and the traditional punching mode can not be realized all the time. The disordered micro-lens array collimating film can destroy the regularity of the ordered micro-lens array and weaken interference fringes caused by the regularity (as shown in fig. 11 b) so as to further improve the image recognition accuracy (recognition rate) of the collimating film provided by the invention.
The collimating lens array and the collimating hole array of the disordered array collimating film (interference reducing collimating film) are disordered arrays, and the microlenses are closely arranged and overlapped with each other (as shown in fig. 12, the coordinates of the main optical axes of any three mutually overlapped microlenses are connected into a common triangle (not a regular triangle)). In the interference reducing collimating film (disordered collimating film), the value range of P is 5-55 μm, the distance P between the principal optical axes of the two mutually overlapped microlenses changes in a certain value range in a disordered manner, the variation of the distance P between the adjacent principal optical axes is A (the difference between the highest value and the lowest value in the value range of P), the median value of the distance P between the adjacent principal optical axes is Pm (the average value between the highest value and the lowest value in the value range of P), and then Pm-0.5A is not less than P and not more than Pm +0.5A; the median value Pm is selected from 10 to 50 μm, preferably 15 to 30 μm, and more preferably 18 to 25 μm, and the variation A of the main optical axis pitch P is selected from 1 to 10um, preferably 2 to 6um.
Furthermore, in the interference reducing collimation film (disordered collimation film), the radius R of the micro lens is 6.1-30.2 μm, the height H of the collimation lens layer is 1.1-27.4 μm, and the refractive index n1 of the collimation lens layer material is 1.34-1.7; in the flexible matrix layer, the thickness T of the flexible matrix layer is 10-50 mu m, and the refractive index n2 of the material of the flexible matrix layer is 1.48-1.7; in the collimation hole layer, the thickness t of the collimation hole layer is 0.5-7 μm, and the diameter phi of the collimation holes in the collimation hole array is 1-10 μm.
In embodiments 81 to 86, the collimating lens array and the collimating aperture array in the collimating film are both disordered arrays, and the microlenses are closely arranged and overlapped with each other (as shown in fig. 12, the primary optical axis coordinates of any three microlenses overlapped with each other are connected into a common triangle (not a regular triangle), the distance P between the primary optical axes of the two microlenses overlapped with each other changes in a disordered manner within a certain value range (Pm ± 0.5A), the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating aperture layer 43 is inorganic plated titanium carbide, the collimating film punches collimating apertures 43B in a microlens punching manner, and other parameters are as follows:
p is Pm +/-0.5A, pm is 30 μm, A is 1-10 μm, R is 20.6 μm, H is 27.4 μm, and n1 is 1.5;
t is 25 μm, n2 is 1.65, D is 3.1 μm;
t is 2.0 μm and phi is 4.0 μm. Further, the deviation Δ was 0.81 μm.
Compared with the prior art, the interference reduction collimation film provided by the invention only comprises one collimation aperture layer, the problem that two collimation diaphragms are difficult to align with each other is fundamentally solved, the thickness is low, the toughness is good, the breakage is not easy, the center of a collimation hole prepared by adopting a micro-focusing method is positioned on the main optical axis of a corresponding micro lens, and the alignment between the collimation hole and the corresponding micro lens is accurate. The preparation method of the interference reduction collimation film provided by the invention is easy to operate, can realize mass production, and improves the production yield. The interference reduction collimation film provided by the invention has excellent performance, can filter diffused light through collimated light, and reduces the light interference phenomenon. The interference reduction collimation film provided by the invention can be applied to large-size and ultrathin image identification modules, so that the mass production of the large-size, ultrathin and even flexible image identification modules is greatly improved, and when the interference reduction collimation film is applied to a fingerprint unlocking scheme of consumer electronic products such as mobile phones (OLED screens), the market demand is extremely high, and the pursuit for the characteristics such as ultrathin, large screens and flexibility is higher, so that the interference reduction collimation film has obvious advantages.
On the other hand, the invention provides a bonded collimation film, which comprises a bonded adhesive layer and the interference reduction collimation film; the adhesive layer is adhered to the collimation hole layer in the interference reduction collimation film.
Further, the adhesive layer is selected from one of a solid optical transparent adhesive, a high-transmittance pressure-sensitive adhesive or a transparent hot melt adhesive.
Furthermore, the thickness of the adhesive layer is 5-35 μm.
On the other hand, the invention also provides an image recognition module, which sequentially comprises a collimation layer, a filter layer and a photoelectric sensing layer; the collimation layer is selected from the laminated collimation film or the interference reduction collimation film.
Fig. 14 is a schematic diagram of a trend of screen enlargement of an image recognition module (taking an OLED mobile phone fingerprint recognition module as an example), which shows top views of four types of OLED mobile phones (01), where there is a fingerprint recognition module (03) below an OLED screen (02), and a finger (04) needs to be placed in these specific areas to be able to recognize and unlock: the fingerprint identification module is small, so that an icon is often displayed in the area when the screen is activated so as to indicate the accurate placement position of a finger; (b) The coverage area of the fingerprint identification module reaches about 1/4 screen, and the problem of expanding from single-finger identification unlocking to double-finger identification unlocking does not exist; (c) And (d) the design is designed to realize half screen and even full screen, and higher requirements are provided for the large screen of the fingerprint identification module.
Fig. 15 is a schematic diagram of an image recognition module (taking an OLED mobile phone fingerprint recognition module as an example), in the complete fingerprint module, an interference-reducing collimating film layer (05) is located at the middle layer, an OLED screen (02) is arranged above the collimating film, and an optical filter layer (06) and a photoelectric sensing layer (07) are arranged below the collimating film. When the collimating film is a soft base component, its dimensional stability (thermal shrinkage, thermal expansion, wrinkles, etc.) is a weak point, and therefore, in large-area use, it is necessary to bind with an underlying component to increase the stiffness and thickness of the whole, the underlying component may be a hard base component (e.g., a filter layer) or a soft base component (e.g., a filter layer may also be made of a soft base, and the photo-sensor chip may also be made of a TFT (thin film transistor).
The attaching type alignment film provided by the invention is provided with the attaching glue layer (44), and can attach the alignment film of a soft base (namely a flexible base layer) and a lower component of an image recognition module, so that the dimensional stability of the alignment film is improved, as shown in figure 16. Obviously, the flatness of the alignment film after lamination is higher, optical distortion caused by film material waves (wave) can be reduced, and the accuracy of image recognition is enhanced.
The laminated alignment film has four main structures from top to bottom, namely a disordered array alignment lens layer (41), a flexible substrate layer (42), an alignment hole layer (43) and an adhesive layer (44), as shown in fig. 17. Wherein, the design parameters of the disordered array collimating lens layer (41), the flexible base layer (42) and the collimating hole layer (43) are completely the same as those of the interference reducing collimating film, and the thickness of the bonding glue layer (44) is T 2 Preferably, the thickness is selected from 5 to 50 μm, more preferably 10 to 25 μm, and too thin a layer of adhesive may result in poor adhesion (before and after reliability), and too thick a layer may result in loss of signal light or crosstalk. As shown in fig. 18: (a) Under normal conditions, if signal light is focused on the collimating aperture layer and then is scattered on the photoelectric sensor, light spots which are larger than the small apertures and smaller than the photoelectric sensor are generated, and the signal is completely received; (b) However, if the glue layer becomes thick, the distance between the photoelectric sensors becomes long and the light spot becomes large, loss is generated; (c) When the glue layer is too thick, the distance between the photoelectric sensors is too far, the light spots are too large, and even the mutual crosstalk phenomenon of overlapping of adjacent light spots can be generated.
Further, the adhesive layer can be selected from solid OCA (optically clear adhesive), high-transmittance PSA (pressure sensitive adhesive) or transparent hot melt adhesive, and the like, and is preferably OCA and PSA with high light transmittance and reworkability. Furthermore, the materials of the OCA and the PSA are respectively selected from a thermosetting polyacrylate system or a light-curing polyacrylate system.
Further, in the conformable collimating film, the collimating lens array and the collimating aperture array are disordered arrays, and the microlenses are closely arranged and overlapped with each other (as shown in fig. 12, the coordinates of the principal optical axes of any three mutually overlapped microlenses are connected into a common triangle (not a regular triangle), in the interference reducing collimating film (disordered collimating film), the value range of P is 5 to 55 μm, the distance P between the principal optical axes of the two mutually overlapped microlenses changes disorderly within a certain value range, the variation amount of the distance P between adjacent principal optical axes is a (the difference between the highest value and the lowest value in the value range of P), the median value of the distance P between adjacent principal optical axes is Pm (the average value of the highest value and the lowest value in the value range of P), pm-0.5A is not more than P and not more than Pm +0.5A, the median Pm is selected from 10 to 50 μm, preferably from 15 to 30 μm, further preferably from 18 to 25 μm, and the variation amount of the distance P between the principal optical axes is selected from 1 to 10 μm, preferably from 2 to 6 μm.
Furthermore, the radius R of the micro lens is 6.1-30.2 μm, the height H of the collimating lens layer is 1.1-27.4 μm, and the refractive index n1 of the collimating lens layer material is 1.34-1.7; in the flexible matrix layer, the thickness T of the flexible matrix layer is 10-50 mu m, and the refractive index n2 of the material of the flexible matrix layer is 1.48-1.7; in the collimation hole layer, the thickness t of the collimation hole layer is 0.5-7 μm, and the diameter phi of the collimation holes in the collimation hole array is 1-10 μm.
The invention also provides a preparation method of the bonded collimating film, and the collimating holes are punched by adopting a micro-focusing method.
Furthermore, in the preparation method, laser is made to vertically irradiate the collimating lens layer, the laser is focused through the micro lens of the collimating lens layer, and a light spot formed by focusing falls on the collimating lens layer to form a collimating hole. In the laminated collimating film prepared by the method, the distribution of the collimating hole array and the micro-lens array is completely consistent, and the circle center of any collimating hole is on the main optical axis of the corresponding micro-lens.
The invention also provides a preparation method of the laminated collimating film, which comprises the following steps:
(1) Preparing a reduced interference collimation film;
(2) Tearing the light release film from the OCA/PSA adhesive tape, and attaching the adhesive layer to the alignment hole layer.
Further, the preparation method comprises the following steps:
(1) Preparing the interference reduction collimation film provided by the invention;
(2) Tearing off the light release film from the OCA/PSA adhesive tape, attaching the adhesive layer to the back surface (collimation hole layer) of the collimation film, and performing pressurization, temperature rise and vacuum pumping to perform air exhaust and bubble removal;
(3) Before use, the heavy release film is torn off, so that the laminating type alignment film can be obtained, and the OCA/PSA glue layer is used for laminating the lower layer part.
In examples 93 to 102, the collimating lens array and the collimating aperture array in the collimating film are disordered arrays, and the microlenses are closely arranged and overlapped with each other (as shown in fig. 12, the primary optical axis coordinates of any three microlenses overlapped with each other are connected into a common triangle, the primary optical axis distance P of the two microlenses overlapped with each other varies in a disordered manner within a certain range (Pm ± 0.5A), wherein the median Pm is 18 μm or 15 μm, the variation a is 4 μm, that is, the range of P is 18 ± 2 μm or 15 ± 2 μm, and other parameters are listed in table 10. The collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating aperture layer 43 is inorganic plating titanium carbide, the collimating film adopts a microlens perforation method to punch the collimating aperture 43B, and the other parameters are listed in table 10. The bonding adhesive layer 44 in examples 93 to 99 is a solid state OCA, the adhesive layer 44 is made of a thermosetting polyacrylate system, the adhesive layer 44 in example 100 is a high-transmittance optical film, the curing adhesive layer 44 is made of a thermosetting polyacrylate system, and the curing adhesive layer 44 is made of the PSA layer 102, and the curing optical polyacrylate layer is made of the following PSA system, and the curing parameters are as follows:
p is Pm +/-0.5A, pm is 18 μm, A is 4 μm, R is 14.8 μm, H is 16.3 μm, and n1 is 1.5;
t is 25 μm, n2 is 1.65, D is 1.1 μm;
t is 2 μm and φ is 4 μm. Further, the deviation Δ was 0.41 μm.
Or P is Pm +/-0.5A, pm is 15 μm, A is 4 μm, R is 17 μm, H is 2.4 μm, and n1 is 1.5;
t is 50 μm, n2 is 1.65, D is 0.5 μm;
t is 0.5 μm and φ is 5.0 μm. Further, the deviation Δ was 0.25 μm.
Compared with the prior art, the laminated collimating film provided by the invention only comprises one collimating aperture layer, the problem that two layers of collimating diaphragms are difficult to align with each other is fundamentally solved, the thickness is low, the toughness is good, the collimating film is not easy to break, the center of a collimating aperture prepared by adopting a micro-focusing method is on the main optical axis of a corresponding micro-lens, and the collimating aperture is accurately aligned with the corresponding micro-lens. The preparation method of the laminated collimating film provided by the invention is easy to operate, can be used for mass production, and improves the production yield. The laminated collimating film provided by the invention has excellent performance, can filter diffused light by collimated light, and reduces the light interference phenomenon. The laminated alignment film provided by the invention has the laminated adhesive layer, can be laminated with a lower component, improves the dimensional stability of the flexible alignment film and reduces optical distortion. The laminated collimating film provided by the invention can be applied to large-size and ultrathin image recognition modules, so that the mass production of the large-size, ultrathin and even flexible image recognition modules is greatly improved, and when the laminated collimating film is applied to a fingerprint unlocking scheme of consumer electronic products such as mobile phones (OLED screens), the laminated collimating film has obvious advantages due to great market demands and higher pursuits on the characteristics of ultrathin, large screens, flexibility and the like. The image identification module provided by the invention has high identification accuracy, and can be applied to fingerprint unlocking and the like of consumer electronic products such as mobile phones (OLED screens).
It is worth noting that an air interface still exists between the collimation film and the OLED screen in the current technical scheme, so that chromatic aberration (air and lens interface reflection) is easily generated between the fingerprint module and the screen when the screen is turned off, and the reliability of the fingerprint module after the fingerprint module is assembled with the OLED screen is also reduced. Therefore, it is an urgent need to solve the problem of eliminating the air interface of the upper microlens structure of the collimating film to make it fully adhere to the OLED screen.
Because the invention adopts the micro-focusing method to open the holes, the filling (the refractive index difference delta n after the filling) can not be carried out after the holes are opened 2 Well below an angle of Δ n between air and lens before filling 1 ) Therefore, when the common collimating film is optimized to be the full-lamination collimating film, the lens layer design of the collimating film, such as the structure, refractive index, thickness and the like of the lens, needs to be modified again.
As shown in fig. 20, the left side is a semi-finished product of a common collimating film (including the collimating lens layer 41 and the flexible substrate layer 42), and the right side is a semi-finished product of a fully-laminated collimating film (including the high-folding collimating lens layer 41', the flexible substrate layer 42, and the low-folding filling layer 47), so as to ensure that the final light-gathering effect and the size of the opening are consistent, it is necessary to ensure that the spot diameter D2 falling on the upper surface of the substrate layer when the opening is formed and the beam angle γ of the opening beam formed by the opening beam incident on the substrate layer are completely equal. Through accurate calculation, it is found that a higher refractive index can be set for the filled fully-laminated collimating lens layer 41', a lower refractive index can be set for the low refractive filler layer 47, the curvature radius R' of the microlens 41A 'is reduced (when the section chord length W is maintained unchanged, i.e., the lens becomes more convex) to compensate for the problem of insufficient refractive index difference, and finally the thickness is finely adjusted (i.e., the height H' of the collimating lens layer is increased) to match the size of the light spot (specific numerical values are not described herein, see the embodiment for details). High refractive index is called high refractive index for short. Low refractive index is abbreviated as low refractive index.
Furthermore, in the fully-laminated collimating film provided by the invention, the collimating film sequentially comprises an upper laminating adhesive layer, a low-folding filling layer, a high-folding collimating lens layer, a flexible substrate layer, a collimating hole layer and a lower laminating adhesive layer.
Furthermore, the low-refraction filling layer fully covers the collimating lens layer, and the upper surface of the low-refraction filling layer is a plane; the upper adhesive layer is adhered to the low-folding filling layer. The lower adhesive layer is attached to the collimation hole layer.
The flexible substrate layer and the alignment hole layer are the flexible substrate layer and the alignment hole layer of the alignment film provided by the invention, and the upper bonding adhesive layer and the lower bonding adhesive layer are the bonding adhesive layer of the bonding type alignment film provided by the invention. The high-refraction collimating lens layer has the same design principle and performance parameters as the collimating film provided by the invention, but has different designs of height, curvature radius and refractive index.
Furthermore, the high-refraction collimating lens layer is made of high-refractive-index organic-inorganic hybrid acrylic resin.
Furthermore, the refractive index n of the high refraction collimating lens layer 1 ' is 1.6 to 1.7, the curvature radius R ' is 9.2 to 21.6 μm, the height H ' is 2.5 to 28.8 μm,
further, the low refractive index filling layer is selected from fluororesin or fluorine modified acrylic resin.
Further, the refractive index n of the low refractive index filling layer 3 1.35 to 1.45; thickness T 3 2.5 to 18.8 mu m
Further, the adhesive layer is selected from one of a solid optical transparent adhesive, a high-transmittance pressure-sensitive adhesive or a transparent hot melt adhesive.
Furthermore, the upper bonding adhesive layer and the lower bonding adhesive layer have the same thickness, and the thickness T is 2 5 to 35 μm.
In embodiments 103-116, the present disclosure provides a fully-laminated collimating film, including an upper laminating adhesive layer, a low-fold filling layer, a high-fold collimating lens layer, a flexible substrate layer, a collimating aperture layer, and a lower laminating adhesive layer; the upper surface of base member is arranged in to high collimation lens layer of rolling over, and the lower surface of base member is arranged in to collimation hole layer, the collimation lens layer contains microlens array and meat thickness, and the low filling layer that rolls over fully covers (covers flat) collimation lens layer, makes the lens structure can not expose, goes up laminating glue film and low filling layer laminating together, and lower laminating glue film is in the same place with the laminating of collimation hole layer. The collimation hole layer comprises a shading medium and a collimation hole array, and the collimation lens array and the collimation hole array of the full-lamination collimation film are both in regular-triangle tight arrangement (as shown in figure 8). The high-refraction collimating lens layer is made of high-refractive-index organic-inorganic hybrid acrylic resin, the flexible substrate layer is made of PET (polyethylene terephthalate), the shading medium of the collimating pore layer is inorganic plating titanium carbide, and the low-refraction filling layer is made of fluorine modified acrylic resin.
Wherein P is the primary optical axis minimum pitch of the microlenses, from 16 μm to 40 μm, such as 16 μm,20 μm,25 μm, or 40 μm; r' is the radius of curvature of the microlens and is 9.2 μm to 21.6 μm, such as 9.2 μm,10.5 μm,11.8 μm,12.8 μm,13.6 μm,13.7 μm,13.9 μm,14.1 μm,15.1 μm,20.6 μm, or 21.6 μm; h' is the thickness of the collimating lens layer and is in the range of 2.5 μm to 28.8 μm, such as 2.5 μm,3.3 μm,4.6 μm,9.6 μm,9.9 μm,10.3 μm,11.8 μm,13.1 μm,15.1 μm,24.2 μm,26.2 μm, or 28.8 μm; n1' is the refractive index of the collimating lens layer, dimensionless, and is 1.6 to 1.7, e.g., 1.6,1.65,1.68, or 1.7; t is 3 A thickness (or height) of the low refractive index filler layer of 2.5-18.8 μm, such as 2.5 μm,3.3 μm,4.4 μm,4.6 μm,5.5 μm,6.6 μm,7.6 μm,7.8 μm,8.1 μm,10.2 μm,13.4 μm,15.8 μm, or 18.8 μm; n is 3 Is the refractive index, in dimensionless units, of the low refractive index filler layer and is 1.35 to 1.45, e.g., 1.35,1.38,1.4, or 1.45; t is the thickness of the flexible substrate layer and is 38 mu m; n2 is the refractive index of the flexible matrix layer, is dimensionless and is 1.65; the spot diameter D is 1.0 μm to 5.0 μm, for example 1.0 μm,1.3 μm,1.7 μm,2.0 μm,2.4 μm, or 5.0 μm; d 2 The diameter of a light spot formed on the upper surface of the flexible substrate layer after being focused by the micro lens is unit of mum and D 2 17.9 μm to 32.0 μm, such as 17.9 μm,22.3 μm,23.5 μm,23.8 μm,16.0 μm, or 32.0 μm; γ is the beam angle of the light beam formed in the flexible substrate layer after being focused by the microlenses, and has a unit ° of 16.0 ° to 42.0 °, for example, 16.0 °,16.1 °,24.0 °,30.4 °,32.0 °,33.2 °, or 42.0 °; t is the thickness of the collimation hole layer and is 2 μm; phi is the diameter of the collimating aperture and is 3.0-7.0, such as 3.0,3.5,4.0,5.0 or 7.0; θ is the minimum angle of oblique light that can be filtered by the collimating film to measure the collimating and filtering effect (light blocking performance), and is 4.0 ° -9.0 °, such as 4.0 °,4.5 °,5.5 °,6.0 °,6.5 °, or 9.0 °; k is the ratio of the actual transmittance to the maximum transmittance (light transmission property) of the collimating film, and is 0.85 to 0.99, such as 0.85,0.9,0.95,0.98, or 0.99.
The invention also provides a preparation method of the collimating film, which comprises the following steps:
(1) Forming the collimating lens layer on the upper surface of the flexible substrate layer by adopting a lens array (concave) mould (light curing, heat curing, hot press forming and other modes can be adopted) to form a lens array (convex);
(2) Coating/plating a shading medium on the lower surface of the substrate layer by adopting a wet method/dry method coating technology;
(3) The large-area flat-top laser (parallel laser after Gaussian beam shaping) is adopted, the micro-lens array is vertically irradiated with proper low energy, and is focused on a light-shielding medium (namely, a micro-focusing method) after passing through each micro-lens, and corresponding collimating holes are punched to generate collimating hole arrays with the same distribution to form a collimating hole layer.
The invention also provides a preparation method of the full-lamination collimating film, which comprises the following steps:
(1) Forming high-refractive-index resin on the upper surface of the flexible substrate layer by using a lens array (concave) mould (photo-curing, thermo-curing, hot-press forming and other modes can be adopted) to form a high-refractive-index lens layer (convex);
(2) Filling low-refractive-index resin between the high-refractive-index collimating lens layer and the release film (or the mirror roller), and curing (demolding or tearing the release film) to obtain a low-refractive-index filling layer;
(3) Coating/plating a shading medium on the lower surface of the substrate layer by adopting a wet method/dry method coating technology;
(4) The large-area flat-top laser (parallel laser after Gaussian beam shaping) is adopted, the low-refractive filling layer is vertically irradiated by proper low energy and penetrates through the micro-lens array, and is focused on a shading medium (namely, a micro-focusing method) after passing through each micro-lens, and corresponding collimation holes are punched to generate a collimation hole array with the same distribution to form the collimation hole layer.
(5) Tearing open light release type membrane simultaneously or respectively with two rolls of OCA PSA sticky tape, wherein the bonding glue film of a roll is laminated with low back of a book filling layer, forms and laminates the glue film, and the bonding glue film and the collimation porose layer of another roll are laminated, form and laminate the glue film down.
(6) Tearing off the heavy release film of sticky tape before using, can obtain full laminating collimation membrane, go up the laminating glue film and be used for the laminating of upper OLED screen, lower laminating glue film is used for the laminating of lower floor's part.
On the other hand, the invention also provides an image recognition module, which sequentially comprises a collimation layer, a filter layer and a photoelectric sensing layer; the collimation layer is selected from the full-lamination collimation film.
Fig. 22 is a schematic structural view of an image recognition module (taking an OLED mobile phone fingerprint recognition module as an example), in a complete fingerprint module, a full-lamination collimation film layer (05) is located at an intermediate layer, an OLED screen (02) is arranged above the collimation film, and an optical filter layer (06) and a photoelectric sensing layer (07) are arranged below the collimation film. When the collimating film is used in a large area, the collimating film is bound with the main components to increase the integral stiffness and thickness, the fully-laminated collimating film is easily laminated with an OLED (organic light emitting diode) screen, the problem is well solved, and particularly, when the lower-layer components are also soft substrates, the fully-laminated collimating film is more dependent on the lamination with the screen. The full-lamination collimating film is more beneficial to realizing flexible full-screen fingerprint identification.
In order to solve the problem of signal light loss caused by too long distance between the collimating film and the sensor as shown in fig. 18, and to increase the flexibility of the design of the whole fingerprint identification module (mainly, the sensor, the design distance and the size, the smaller the size, the higher the resolution), the main signal light 8 which is vertically incident needs to be collimated into a vertical exit, as shown in fig. 23, taking the main signal light 81 with the largest deviation angle on the left side as an example, and through the secondary focusing effect of the micro-lens 49 in the hole, the main signal light can be easily collimated into the vertical exit, so that even if the sensor distance is further far and the size is smaller, the signal light can not hit between the sensors to cause loss, thereby further improving the signal-to-noise ratio, and being beneficial to the design of the sensor with high resolution.
In order to improve the signal-to-noise ratio, the invention provides a full-lamination collimating film.
Furthermore, in the fully-laminated collimating film provided by the invention, the collimating film sequentially comprises an upper laminating adhesive layer, a low-folding filling layer, a high-folding collimating lens layer, a flexible substrate layer, a collimating hole layer and a lower laminating adhesive layer.
Furthermore, the upper surface of the lower adhesive layer protrudes upwards in the collimating hole to form a micro lens in the hole.
Furthermore, the lower adhesive layer is partially protruded in the collimation hole to form a micro lens in the hole.
The fully-laminated collimating film improves the signal-to-noise ratio and is beneficial to the design of a high-resolution sensor.
Further, the chord length of the cross section of the micro lens in the hole is the same as the diameter phi of the collimation hole; height H of cross section of micro lens in the hole 2 . Height H of cross section of micro lens in hole 2 Ratio X to depth t of collimation hole (X = H) 2 The t) is 0.10-0.80.
Furthermore, the low-folding filling layer fully covers the collimating lens layer, and the upper surface of the low-folding filling layer is a plane; the upper adhesive layer is adhered to the low-folding filling layer. The lower adhesive layer is adhered to the collimation hole layer.
The flexible substrate layer and the alignment hole layer are the flexible substrate layer and the alignment hole layer of the alignment film provided by the invention, and the upper bonding adhesive layer and the lower bonding adhesive layer are the bonding adhesive layer of the bonding type alignment film provided by the invention. The high-refraction collimating lens layer has the same design principle and performance parameters as the collimating film provided by the invention, but has different designs of height, curvature radius and refractive index.
Furthermore, the high refraction collimating lens layer is made of high refractive index organic-inorganic hybrid acrylic resin.
Further, the refractive index n of the high-refraction collimating lens layer 1 ' is 1.6 to 1.7, the radius of curvature R ' is 9.2 to 21.6 μm, for example 12.8 μm, and the height H ' is 2.5 to 28.8 μm, for example 15.1. Mu.m.
Further, the low refractive index filling layer is selected from fluororesin or fluorine modified acrylic resin.
Further, the refractive index n of the low refractive index filling layer 3 1.35 to 1.45; thickness T 3 2.5 to 18.8. Mu.m, for example 10.2. Mu.m.
Further, the adhesive layer is selected from one of a solid optical transparent adhesive, a high-transmittance pressure-sensitive adhesive or a transparent hot melt adhesive.
Furthermore, the upper adhesive layer and the lower adhesive layer are attachedThe thickness of the adhesive layer is the same, and the thickness T 2 5 to 35 μm.
Furthermore, the lower adhesive layer is softer, and the elastic modulus of the lower adhesive layer is 100-600 MPa.
In embodiments 117 to 126, the present invention provides a full-lamination alignment film, the cross section of which is shown in fig. 24, including an upper lamination adhesive layer 45, a low-folding filling layer 47, a high-folding alignment lens layer 41', a flexible substrate layer 42, an alignment hole layer 43, and a lower lamination adhesive layer 46; the lower adhesive layer has a local protrusion in the collimating hole to form a micro lens 49 in the hole; the high-folding collimating lens layer 41' is arranged on the upper surface of the substrate 42, the collimating aperture layer 43 is arranged on the lower surface of the substrate 42, the collimating lens layer 41' comprises a micro-lens array 41A ' and a thick layer 41B ', the low-folding filling layer 47 fully covers (covers) the collimating lens layer 41', so that a lens structure cannot be exposed, the upper bonding adhesive layer 45 and the low-folding filling layer 47 are bonded together, and the lower bonding adhesive layer 46 and the collimating aperture layer 43 are bonded together. The collimation hole layer 43 comprises a shading medium 43A and a collimation hole array 43B, and the collimation lens array and the collimation hole array of the full-lamination collimation film are both in regular triangle tight arrangement (as shown in fig. 8). The high-refraction collimating lens layer 41' is made of high-refractive-index organic-inorganic hybrid acrylic resin, the flexible substrate layer 42 is made of PET, the shading medium 43A of the collimating pore layer 43 is inorganic coating titanium carbide, and the low-refraction filling layer is made of fluorine modified acrylic resin. The full-lamination collimating film is used for preparing a collimating hole array in a micro-lens focusing mode.
Wherein P is the minimum distance of the main optical axis of the micro lens and is 25 μm; r' is the curvature radius of the micro lens and is 12.8 mu m; h' is the thickness of the high-refraction collimating lens layer and is 15.1 mu m; n is 1 ' is the refractive index of the high-refraction collimating lens layer, which is 1.6 without dimensional unit; t is 3 The thickness (or height) of the low-refractive-index filling layer is 10.2 μm; n is 3 The refractive index of the low refractive index filling layer is 1.45 without dimensional unit; t is the thickness of the flexible substrate layer and is 38 mu m; n is 2 Is the refractive index of the flexible matrix layer, dimensionless unit, 1.65; y is the elastic modulus of the lower adhesive layer, in MPa, 100 to 600MPa, for example 100MPa,150MPa,200MPa,400MPaOr 600MPa; h 2 The thickness (or height) of the micro-lenses in the holes is 0.4-2 μm, such as 0.4 μm,0.7 μm,0.8 μm,1 μm,1.2 μm,1.3 μm,1.6 μm, or 2 μm; x is the ratio H of the thickness of the micro-lens in the hole to the depth of the collimation hole (or called the thickness of the collimation hole) 2 T, dimensionless units, is from 0.10 to 0.80, e.g., 0.10,0.20,0.30,0.35,0.40,0.50,0.65, or 0.80; t is the thickness of the collimation hole layer and is 2-4 μm; phi is the diameter of the collimating hole and is 3 mu m; theta is the minimum angle of oblique light which can be filtered by the collimating film and is used for measuring the collimating and filtering effect (light blocking performance), and the angle is 3.0-4.0 degrees; the signal-to-noise ratio (SNR) is 12-16.5, such as 12, 12.5, 13.5, 14, 14.5, 15, 16, or 16.5.
The invention also provides a preparation method of the collimating film, which comprises the following steps:
(1) Forming the collimating lens layer on the upper surface of the flexible substrate layer by adopting a lens array (concave) mould (light curing, heat curing, hot press forming and other modes can be adopted) to form a lens array (convex);
(2) Coating/plating a shading medium on the lower surface of the substrate layer by adopting a wet method/dry method coating technology;
(3) The large-area flat-top laser (parallel laser after Gaussian beam shaping) is adopted, the micro-lens array is vertically irradiated with proper low energy, and is focused on a light-shielding medium (namely, a micro-focusing method) after passing through each micro-lens, and corresponding collimating holes are punched to generate collimating hole arrays with the same distribution to form a collimating hole layer.
The invention also provides a preparation method of the full-lamination collimating film, which comprises the following steps:
(1) Forming high-refractive-index resin on the upper surface of the flexible substrate layer by using a lens array (concave) mould (photo-curing, thermo-curing, hot-press forming and other modes can be adopted) to form a high-refractive-index lens layer (convex);
(2) Filling low-refractive-index resin between the high-refractive-index collimating lens layer and the release film (or the mirror roller), and curing (demolding or tearing the release film) to obtain a low-refractive-index filling layer;
(3) Coating/plating a shading medium on the lower surface of the substrate layer by adopting a wet method/dry method coating technology;
(4) The large-area flat-top laser (parallel laser after Gaussian beam shaping) is adopted, the low-refractive filling layer is vertically irradiated by proper low energy and penetrates through the micro-lens array, and is focused on a shading medium (namely, a micro-focusing method) after passing through each micro-lens, and corresponding collimation holes are punched to generate a collimation hole array with the same distribution to form the collimation hole layer.
(5) And tearing off the light release film from the two rolls of OCA/PSA tapes simultaneously or respectively, wherein the bonding adhesive layer of one roll is bonded with the low-folding filling layer to form an upper bonding adhesive layer, and the bonding adhesive layer of the other roll is bonded with the alignment hole layer to form a lower bonding adhesive layer.
(6) And (3) cutting the prepared alignment film coiled material in the step (5) into sheets, defoaming the obtained sheets under high negative pressure, enabling the softer lower-layer laminating adhesive to generate creep deformation, and extruding the lower-layer laminating adhesive into the alignment holes to form the micro-lens layers in the holes.
(7) Before use, the adhesive tape is torn off from the type film, so that the full-lamination alignment film can be obtained, the upper lamination adhesive layer is used for laminating the upper OLED screen, and the lower lamination adhesive layer is used for laminating the lower component.
Drawings
FIG. 1 is a schematic diagram of the basic principle of a collimating device;
FIG. 2 illustrates the effect of alignment accuracy of a collimating structure on signal strength; the higher the alignment precision is, the higher the signal intensity is;
FIG. 3 is a graph of the effect of the aspect ratio of the collimating structure on the crosstalk strength; the higher the length-diameter ratio, the smaller the crosstalk strength;
FIG. 4 illustrates a micro-focusing method of drilling;
FIG. 5 illustrates a conventional drilling alignment error accumulation process;
FIG. 6 is a schematic cross-sectional view of a collimating film provided by the present invention;
FIG. 7 is a schematic perspective view of a collimating film provided by the present invention (square arrangement);
FIG. 8 is a schematic perspective view of a collimating film provided by the present invention (regular triangle arrangement);
FIG. 9 is a schematic cross-sectional view of a collimating film (collimating sheet) provided in a comparative example;
FIG. 10 is a process of testing light blocking performance (minimum light blocking angle) of the collimating film provided by the present invention;
FIG. 11a shows interference fringes produced by an ordered collimating structure;
FIG. 11b shows interference fringes produced by a disordered collimating structure;
FIG. 12 is a top view of a collimating lens layer in a disordered distribution (to illustrate the meaning of the disordered distribution);
FIG. 13 is a schematic perspective view of an interference reducing collimating film provided by the present invention (the microlens array is in disordered distribution);
FIG. 14 is a diagram illustrating a trend of a large screen of an image recognition module (taking an OLED mobile phone fingerprint recognition module as an example);
FIG. 15 is a schematic diagram of an image recognition module (taking an OLED mobile phone fingerprint recognition module as an example);
FIG. 16 is a schematic view of a bonded alignment film bonded to a lower member (taking an OLED mobile phone fingerprint recognition module as an example);
FIG. 17 is a four layer basic structure of a conformable collimating film;
FIG. 18 shows the effect of the thickness of the adhesive layer on the signal reception of the photosensor;
FIG. 19 is a schematic view of a structure of a bonded collimating film;
FIG. 20 is a schematic diagram comparing the design differences of a collimating film and a fully conformable collimating film;
FIG. 21 is a schematic view of a fully laminated collimating film structure;
FIG. 22 is a schematic view of a fully-laminated collimating film bonded to upper and lower members (taking an OLED mobile phone fingerprint identification module as an example)
FIG. 23 is a graph of the effect of in-hole microlenses on the main signal light;
FIG. 24 is a schematic view of a fully laminated collimating film with in-hole microlenses.
Wherein:
1: target image, 11 to 17: 7 continuous pixel points of the target image; 2: collimator, 21: top (incident) collimating structure layer, 22: a bottom (light-emitting) collimating structure layer; 3: photoelectric sensing chip, 31-37: 7 photoelectric sensors corresponding to the continuous pixel points; 4: the collimation film provided by the invention, 4': comparative example provided collimating film, 40: central axis of collimating structure (microlens principal axis), 41: collimating lens layer, 41A: microlens array, 41B: thickness of meat, 41C: microlens apex, 42: flexible substrate layer, 43: alignment aperture layer, 43A: light-shielding medium, 43B: a collimating aperture; 5: flat-top beam laser; 6: inspecting the light source; 7: gaussian beam laser; 8: main signal light of vertical incidence, 81: a main signal light of a maximum off-angle; o: laser positioning origin; 01: OLED cell phone, 02: OLED screen, 03: fingerprint identification module, 04: finger, 05: interference reducing collimation film layer, 06: infrared filter layer, 07: photoelectric sensing layer (including photoelectric sensing chip, flexible circuit board and reinforcement base plate), 05': full-lamination alignment film layer, 44: laminating glue film, 45: upper adhesive layer, 46: lower adhesive layer, 47: low-fold filling layer, 49: in-hole microlens layer, 41': high-refractive collimating lens layer, 41A': microlens array of high-refractive collimating lens layer, 41B': thickness of high-refraction collimating lens layer
Detailed Description
In order to make the structure and functional features and advantages of the present invention more comprehensible, preferred embodiments accompanied with figures are described in detail below.
Comparative example 1
Fig. 9 shows a collimating film for contrast, which includes a collimating lens layer 41, a flexible substrate layer (substrate for short) 42, and a collimating aperture layer 43, where the collimating lens layer is disposed on the upper surface of the substrate, the collimating aperture layer is disposed on the lower surface of the substrate, the collimating lens layer 41 includes a microlens array 41A and a thickness 41B, the collimating aperture layer 43 includes a light-shielding medium 43A and a collimating aperture array (composed of a certain number of collimating apertures 43B) formed by hollowing out the medium; the thickness T of the flexible substrate layer is 25 mu m. The collimating lens array and the collimating hole array of the collimating film are both in regular triangle close arrangement (as shown in fig. 8). The minimum distance P of the main optical axis of the micro lens is 18 mu m, the curvature radius R is 12.6 mu m, the thickness H of the collimating lens layer (the vertical distance from the top point of the micro lens to the upper surface of the substrate) is 8.5 mu m, the thickness t of the collimating hole layer is 2 mu m, and the diameter phi of the collimating hole is 4 mu m. The micro-lens array of the collimating lens layer is thickThe material is transparent polymer PMMA, the refractive index n1 is 1.5, the material of the flexible matrix layer is transparent polymer film PET, the refractive index n2 is 1.65, and the shading medium 43A of the collimation hole layer 43 is inorganic plating titanium carbide. The collimating film is punched with collimating holes 43B by conventional laser punching (as shown in FIG. 5), the central positions of the main optical axis 40 and the collimating holes 43B have alignment deviation, and holes are punched one by one from the laser positioning origin O, and the alignment deviation of the first hole is Δ 1 The misalignment of the nth hole is Δ n ,Δ n-1n (n is a natural number greater than 2), and the presence of n causes the misalignment Δ to exceed 1 μm or even more. The light transmission coefficient k is easily reduced, even to be lower than 0.6, and reaches the evaluation level of 'poor'.
Example 1
As shown in fig. 6, the collimating film provided by the present invention includes a collimating lens layer 41, a flexible substrate layer 42 and a collimating aperture layer 43, the collimating lens layer is disposed on the upper surface of the substrate, the collimating aperture layer is disposed on the lower surface of the substrate, the collimating lens layer 41 includes a micro lens array 41A and a thick flesh 41B, the collimating aperture layer 43 includes a light-shielding medium 43A and a collimating aperture array (composed of a certain number of collimating apertures 43B) formed after the medium is hollowed out; the thickness T of the flexible substrate layer is 25 mu m. The collimating lens array and the collimating hole array of the collimating film are both in regular triangle close arrangement (as shown in fig. 8). The micro-lens has a minimum distance P of a main optical axis of 18 μm, a curvature radius R of 12.6 μm, a thickness H of a collimating lens layer of 8.5 μm, a thickness t of a collimating hole layer of 2 μm, and a diameter phi of a collimating hole of 4 μm. The micro-lens array and the thick material of the collimating lens layer are both transparent polymer PMMA, the refractive index n1 is 1.5, the flexible substrate layer is made of transparent polymer film PET, the refractive index n2 is 1.65, and the shading medium 43A of the collimating hole layer is inorganic coating titanium carbide. The collimating film adopts a micro-focusing method to punch holes (as shown in fig. 4) to punch collimating holes 43B, the distribution of the collimating hole arrays is completely consistent with that of the micro-lens arrays, the circle centers of any collimating hole are all on the main optical axis 40 of the corresponding micro-lens, the collimating holes are aligned in a one-to-one high-precision manner, and the alignment deviation delta between the circle center of the collimating hole and the main optical axis of the corresponding micro-lens is 0.47 μm and less than 1 μm. When punching, the laser is just slightly focused on the lower surface of PET, the diameter D of a light spot is 1.7 mu m, the minimum light blocking angle theta is 7.5 degrees, the light transmission coefficient k is 0.98, and the performance advantage of the laser is obvious compared with that of comparative example 1 on the whole.
In fact, the combination of the structural parameters of the collimating lens is not limited to the above embodiments: aiming at the same collimation filtering effect, various changes can be made according to the material and the refractive index of the collimation lens layer, the material and the refractive index of the flexible matrix layer, such as correspondingly changing P, R, H, phi, t and the like; aiming at the light shielding effect of the collimating holes with the same thickness t, various changes can be made to the light shielding medium, such as changes of the types, combinations and even proportions of organic coatings and inorganic coatings.
The properties of the collimating film provided by the present invention were evaluated in the following manner.
(A) Light blocking Property
The final important performance index of a collimating film is the ability to block stray light, and is generally evaluated by the minimum angle at which oblique light can be blocked. When various parameters of the collimating film are determined, the minimum angle θ capable of completely shielding oblique Light can be obtained through conventional optical simulation software (Light tools, zeMax, tracepro, and the like) or theoretical calculation. As shown in fig. 10, in the process of testing the minimum angle of the collimating film, the light blocking performance is classified into 5 levels according to the size of θ (accurate to 0.5 °), and the corresponding relationship in sequence is as follows: excellent: theta is more than or equal to 0 degree and less than 5 degrees, preferably: theta is more than or equal to 5 degrees and less than 7.5 degrees, good: theta is more than or equal to 7.5 degrees and less than 10 degrees, wherein: theta is more than or equal to 10 degrees and less than 15 degrees, difference: theta is more than or equal to 15 degrees.
(B) Light transmission performance
Another important performance criterion of collimating films is the ability to transmit signal light. The alignment precision between the collimating hole and the micro-lens can be checked by using a vertical collimating light source for incidence: when the alignment degree is high enough, the light spot is always in the diameter range of the collimation hole, the light transmittance is the best, and the transmittance is the maximum (obtained by optical simulation or standard sample test of a laser head under the high-precision condition, generally about 90 percent); when the alignment error increases, the transmittance will be attenuated continuously; since the number of collimating holes is very large, the degree of alignment can be compared by measuring the transmittance change under macroscopic conditions in this manner. The ratio of the transmittance obtained by the test to the highest transmittance (the highest transmittance refers to the transmittance measured under the condition that the main optical axis of the micro lens is completely overlapped with the central line of the corresponding collimating aperture) is defined as a transmittance k, and the transmittance is 1 when the alignment degree is high enough. The invention divides the light transmission performance into 5 grades according to the size of k, and the corresponding relations are as follows: excellent: k is more than or equal to 1 and more than 0.95, preferably: 0.95 is more than or equal to k is more than 0.9, good: 0.9 is more than or equal to k is more than 0.8, wherein: 0.8 is more than or equal to k is more than 0.6, the difference is: k is less than or equal to 0.6.
Obviously, both of the above properties are crucial for the collimating film: the larger k, the stronger the signal; the smaller θ, the less noise; both parameters are of great help to enhance the image recognition signal-to-noise ratio (SNR).
Examples 2 to 24
In the collimating film provided in embodiment 1, the collimating lens arrays and the collimating hole arrays in the collimating film are both arranged in a regular triangle, the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating hole layer 43 is inorganic plated titanium carbide, the collimating film is perforated with the collimating holes 43B by using a microlens perforation method, and the other parameters are listed in table 1.
TABLE 1 design parameters and optical Properties of examples 1-24
Figure BDA0002949411920000221
Figure BDA0002949411920000231
Note 1: p is the minimum distance of the main optical axis of the micro lens and is in the unit of mum; r is the curvature radius of the micro lens and the unit is mum; h is the thickness of the collimating lens layer in μm; n1 is the refractive index of the collimating lens layer, and is free of dimensional units; t is the thickness of the flexible substrate layer and the unit of micrometer; n2 is the refractive index of the flexible matrix layer and is free of dimensional units; d is the diameter of a light spot formed on the lower surface of the flexible substrate layer after being focused by the micro lens, and the unit of the diameter is mum; t is the thickness of the collimating aperture layer in μm; phi is the diameter of the collimating hole and the unit is mum; theta is the minimum oblique light angle which can be filtered by the collimating film and is used for measuring the collimating and filtering effect in unit degree; k is the ratio of the actual transmittance to the highest transmittance of the collimating film, and is used for measuring the alignment precision of the collimating holes and the micro lenses.
As shown in table 1, relatively good examples were designed for different P values on a flexible substrate layer of 25 μm thickness. When the P values are 10, 15, 18, 20, 25 and 30 μm, respectively, four examples correspond to each other. It can be found that when the P value and other conditions are unchanged, and the R value is increased, the lens becomes shallow (the height of the thick lens layer is increased; the height of the lens arch, that is, the height from the top point of the lens to the upper surface of the thick lens layer is decreased), the focal length becomes far, and the light spot of the micro-focus on the light shielding layer becomes large, so that the focal point returns to the light shielding layer by matching with the increase of H, the light spot is reduced, the diameter D of the micro-focus light spot can be continuously reduced by matching the change of R and H, the minimum light blocking angle theta is gradually reduced, and the light blocking performance is improved. For the light transmission performance, the closer the spot diameter D is to the opening (collimating aperture) diameter phi, the greater the influence of the alignment deviation Δ on the light transmission rate, and a slight deviation, the loss of the signal light will occur, while the smaller D is, the smaller D, the smaller the influence on the alignment deviation, and the light will remain in the aperture regardless of the direction of movement. In the examples 1-24 provided by the invention, the diameter phi of the opening is fixed to be 4 μm, except that D and phi in the examples 21-23 are relatively close, other examples maintain a certain difference, and the light transmission coefficient k is larger than 0.9. In general, most of examples 1 to 24 can achieve the level of more than two excellent light blocking performance and light transmission performance, and are based on the excellent implementation effect of a flexible substrate with the thickness of 25 μm.
Examples 25 to 30
In the collimating film provided in embodiment 1, the collimating lens arrays and the collimating hole arrays in the collimating film are both arranged in a regular triangle, the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating hole layer 43 is inorganic plated titanium carbide, the collimating film is perforated with the collimating holes 43B by using a microlens perforation method, and the other parameters are listed in table 2.
TABLE 2 design parameters and optical Properties of examples 25 to 30
Figure BDA0002949411920000241
Note 1 is as in Table 1.
As shown in Table 2, examples 25 to 30 are examples of different flexible substrate thicknesses. Examples 25 to 27 are P =10 μm for one set of collimating films with T =10, 15, 20 μm, respectively, and examples 28 to 30 are P =25 μm for another set of collimating films with T =25, 38, 50 μm, respectively, with other parameters being constant. When T is continuously increased, in order to maintain the micro-focusing effect (the focus is always located near the lower surface of the substrate and the light shielding layer and the light spot is minimized), the micro-lens structure obviously needs to be shallow, i.e. the R value is increased and H is lowered under the condition of fixing the P value and the refractive index collocation (compared with the difference of the embodiment in table 1, the focal length design is adapted along with the increase of T, so H does not need to be increased but is lowered). It can be found that, when other conditions are unchanged, the thickness T is increased, which is beneficial to the structure becoming shallow, the light spot D is reduced, the minimum light-blocking angle θ is reduced, the light-blocking performance is improved, and the light-transmitting coefficient is further improved. Therefore, in the allowable range of thickness (ultra-thin application is more and more common, and too thick application is not allowed), the performance improvement of the alignment film is helpful by using a relatively thick substrate, and the principle (such as the principle shown in fig. 3) that the performance of the alignment film with a large length-diameter ratio is better is met. In the present invention, T is selected from 10 to 50 μm, and more preferably 25 to 38 μm.
Examples 31 to 40
As in the collimating film provided in embodiment 1, the collimating lens array and the collimating aperture array of the collimating film are both arranged in a regular triangle, the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating aperture layer 43 is inorganic plated titanium carbide, the collimating film is perforated with the collimating apertures 43B by using a microlens perforation method, and the other parameters are listed in table 3.
TABLE 3 design parameters and optical Properties of examples 31-40
Figure BDA0002949411920000251
Note 1 from Table 1.
As shown in Table 3, it can be seen from comparative examples 31 to 36 that, when the other conditions are not changed and the P value is increased, the R value becomes large, and if the original aspect ratio is maintained, the focal length becomes far according to the similar principle, and thus H becomes large. Even if the focal length can be controlled, the spot radii D and θ cannot be prevented from increasing, and k is therefore decreased for the same aperture diameter. Therefore, in general, the larger P value is not favorable for the performance of the collimating film, which also conforms to the principle that the collimating film with a large length-diameter ratio has better performance (as shown in FIG. 3). In addition, in comparative examples 37 and 33, 38 and 34, 39 and 35, when the spot D is sufficiently small, the diameter of the hole Φ can be reduced by adjusting the laser energy, and is not necessarily limited to a fixed value, and it can be found that the light blocking performance can be further improved after the diameter of the hole is reduced, but the light transmission effect is reduced. Example 40 has a P value of 50 μm and a corresponding large R and H, and overall for the collimating film of the present invention, the microlens size has reached the upper design limit, including the fact that the spot diameter D is also large (D is particularly small, and particularly not good less than 0.5 μm, which tends to cause a single point energy too high to burn the substrate), resulting in an opening diameter phi of up to 8 μm, while the minimum light-blocking angle theta is also large at 12 degrees, and the light-blocking performance is not very good. In the present invention, in combination, P is selected from 10 to 50 μm, preferably 15 to 30 μm, and more preferably 18 to 25 μm. φ is selected from 1 to 10 μm (10 μm from example 47), and more preferably from 3 to 5 μm. D is selected from 0.1 to 7.8. Mu.m, preferably 0.5 to 4.9. Mu.m, and more preferably 1 to 2 μm.
Examples 41 to 47
As in the collimating film provided in embodiment 1, the collimating lens array and the collimating aperture array of the collimating film are both arranged in a regular triangle, the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating aperture layer 43 is inorganic plated titanium carbide, the collimating film is perforated with the collimating apertures 43B by using a microlens perforation method, and the other parameters are listed in table 4.
TABLE 4 design parameters and optical Properties of examples 41 to 47
Figure BDA0002949411920000261
Note 1 from Table 1.
As shown in Table 4, examples 41 to 47 are examples with different thicknesses t of the collimation holes. As can be seen from comparison of the first group of examples 41 to 44 or comparison of the second group of examples 45 to 47, when other conditions are not changed, increasing t contributes to improvement of light blocking performance, and t is too thin and is not a preferable value. Since laser drilling typically forms holes with smaller aspect ratios, the hole diameter tends to be larger than t, and thus when t is too thick, the hole diameter is actually too large (as in the second group of embodiments), which in turn gradually reduces the light blocking performance. In the present invention, t is selected from 0.5 to 7 μm, preferably 1 to 5 μm, and more preferably 2 to 3 μm.
Examples 48 to 57
The collimating film provided in embodiment 1, wherein the collimating lens array and the collimating hole array of the collimating film are both arranged in a regular triangle, the collimating lens layer 41 is made of PMMA, and further, the collimating lens layer is formed by polymerizing a photo-curable acrylic resin, the refractive index n1 is adjustable from 1.4 to 1.6, when n2=1.65, the flexible substrate layer 42 is made of PET, when n2=1.5, the flexible substrate layer 42 is made of COP, the light-shielding medium 43A of the collimating hole layer 43 is inorganic plated titanium carbide, the collimating film punches the collimating holes 43B in a microlens punching manner, and the other parameters are listed in table 5.
TABLE 5 design parameters and optical Properties of examples 48 to 57
Figure BDA0002949411920000262
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Figure BDA0002949411920000271
Note 1 is as in Table 1.
As shown in Table 5, examples 48 to 57 with different refractive index combinations are shown. As can be seen by comparing the first set of examples 48 to 52, with other conditions unchanged: 1. increasing n1 (comparative examples 50, 48, 49 or comparative examples 51, 52) helps to reduce the spot D, lower θ and improve the light blocking performance, with n1=1.6 being the best and n1=1.4 being the worst; 2. the reduction in n2 (comparison of examples 51, 52 with examples 48, 49) is equally effective. The law of the influence of the refractive index remains the same in comparison with the second group of examples 53 to 57, but the influence is not so great since the second group has a shallow structure and the properties are inherently sufficiently excellent. For n1, the selection surface of the molding material with too high or too low refractive index is narrow, while for n2, the physical properties and light transmittance of the flexible substrate are considered, and the refractive index is used only for designing the structure accurately. Thus, in the present invention n1 is selected from 1.4 to 1.6, preferably 1.5. n2 is selected from 1.5 to 1.65, which is not preferred depending on the material difference.
Example 58
As in the collimating film provided in embodiment 48, the collimating lens array and the collimating aperture array of the collimating film are both arranged in a square shape (as shown in fig. 7), the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating aperture layer 43 is inorganic plated titanium carbide, the collimating film is perforated with the collimating apertures 43B by using a microlens perforation method, and the other parameters are listed in table 6.
TABLE 6 design parameters and optical Properties of examples 48, 58
Figure BDA0002949411920000272
Note 1 is as in Table 1.
As can be seen from table 6, when other parameters are not changed, the distribution of the microlenses is changed from regular triangle to square, and a collimating film can still be obtained by matching R and H. But the performance of the collimating film is slightly inferior to the regular triangular distribution. The main reason is that the squares are not dense like regular triangles in distribution, and the squares are larger in ratio between the diagonal lines and P, so that the spherical crowns arranged in the squares are more convex with the same P value, so that light spots are more scattered, D is larger, and theta is increased, the light blocking effect is poor, and the light transmittance is poor due to the fact that D is enlarged. Of course, square arrangement is not undesirable, and a smaller P value needs to be designed to achieve the same effect. The present invention does not describe any more embodiments of square distribution, and the square distribution is always within the protection scope of the present invention.
Examples 59 to 80
The collimating film provided in embodiments 53 to 57, wherein the collimating lens array and the collimating aperture array of the collimating film are both closely arranged in a regular triangle, the minimum pitch P of the main optical axes of the microlenses of the collimating lens layer is 20 μm, the radius of curvature R is 18.3 μm, the total thickness of the collimating lens layer is 4.1 μm, the thickness of the flexible substrate layer is 50 μm, the thickness of the collimating aperture layer is 2 μm, the diameter of the collimating aperture is 4 μm, the collimating film is formed by punching the microlenses to form the collimating apertures 43B, and the alignment errors Δ between the microlenses and the collimating apertures are less than 1 μm. The light blocking angles theta are all smaller than 5 degrees, the light blocking performance is excellent, the light transmission coefficients k are all larger than 0.95, and the light transmission performance is excellent. The material of the collimating lens layer, the material of the flexible base layer and the material of the collimating hole layer shading medium are listed in table 7, the refractive index n1 of the collimating lens layer and the refractive index n2 of the flexible base layer are different according to the materials and allow errors caused by different processes of +/-0.02 same materials, and the errors are not listed in the table.
TABLE 7 design parameters and optical Properties of examples 59 to 80
Figure BDA0002949411920000281
Figure BDA0002949411920000291
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Note 1 is as in Table 1.
Note 2: for the same material of the collimating lens layer, the molding method is not limited to photocuring, thermocuring, injection molding, hot pressing, etc.
As shown in table 7, it is clear from comparative examples 59 to 80 that the influence of the alignment film performance is not so large when the refractive index of the material is the same or close to that before and after the material is changed.
Examples 81 to 86
A collimating film as provided in example 24, having a cross-section as shown in fig. 6 and a perspective view as shown in fig. 13. The collimating lens array and the collimating hole array in the collimating film are disordered arrays, and the microlenses are closely arranged and overlapped with each other (as shown in fig. 12, the primary optical axis coordinates of any three mutually overlapped microlenses are connected into a common triangle (not a regular triangle), the distance P between the primary optical axes of the two mutually overlapped microlenses changes in a disordered way within a certain value range (Pm ± 0.5A), wherein the median Pm and the variation a are listed in table 8, the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating hole layer 43 is inorganic coating titanium carbide, the collimating film punches the collimating hole 43B by adopting a microlens punching way, and other parameters are listed in table 8.
TABLE 8 design parameters and optical Properties of examples 24 and examples 81-86
Figure BDA0002949411920000292
Figure BDA0002949411920000301
Note 1: p is the distance between the main optical axes of the two mutually overlapped micro lenses, and the value range of P is Pm +/-0.5A and the unit of mum; pm is the average value of the maximum value and the minimum value in the value range of P, called the median, A is the difference between the maximum value and the minimum value in the value range of P, called the variation, and the unit of μm; r is the curvature radius of the micro lens and the unit is mum; h is the thickness (or called height) of the collimating lens layer in μm; n1 is the refractive index of the collimating lens layer, and is free of dimensional units; t is the thickness of the flexible substrate layer and the unit of micrometer; n2 is the refractive index of the flexible matrix layer and is free of dimensional units; d is the diameter of a light spot formed on the lower surface of the flexible substrate layer after being focused by the micro lens, and the unit of the diameter is mum; t is the thickness of the collimation bore layer, unit μm; phi is the diameter of the collimating hole and the unit is mum; theta is the minimum oblique light angle which can be filtered by the collimating film and is used for measuring the collimating and filtering effect in unit degree; k is the ratio of the actual transmittance to the highest transmittance of the collimating film for measuring the alignment accuracy of the collimating holes and the microlenses
Note 2: the collimating lens array and the collimating aperture array of example 24 are both in regular triangular close arrangement; the collimating lens array and the collimating aperture array of examples 81-86 are both disordered arrays, closely arranged;
as can be seen from table 8, when the other parameters were not changed, the alignment film changed from a fixed P value to a P value that varied randomly, and the performance was not substantially affected. The value A is selected from the range of 1 to 10 μm, preferably 2 to 6 μm, as the amount of change. When a is too small, the interference reduction effect is not significant, and when a is too large, the array morphology becomes poorly controlled, reproducibility is poor, and there are many light leakage regions that occur due to too far a distance.
Examples 87 to 92
A collimating film as provided in example 4 is shown in fig. 6 in cross-section and in fig. 13 in perspective view. The collimating lens array and the collimating hole array in the collimating film are disordered arrays, and the microlenses are closely arranged and overlapped with each other (as shown in fig. 12, the primary optical axis coordinates of any three mutually overlapped microlenses are connected into a common triangle (not a regular triangle), the distance P between the primary optical axes of the two mutually overlapped microlenses changes in a disordered way within a certain value range (Pm ± 0.5A), wherein the median Pm and the variation a are listed in table 9, the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the light-shielding medium 43A of the collimating hole layer 43 is inorganic coating titanium carbide, the collimating film punches the collimating hole 43B by adopting a microlens punching way, and other parameters are listed in table 9.
TABLE 9 design parameters and optical Properties of example 4 and examples 87-92
Figure BDA0002949411920000302
Figure BDA0002949411920000311
Note 1 is as in Table 8;
note 2: the collimating lens array and the collimating aperture array of embodiment 4 are both in regular triangle close arrangement; the collimating lens array and the collimating aperture array of examples 87-92 are both disordered arrays, closely arranged;
as can be seen from Table 9, when the other parameters were not changed, the P value of the collimating film changed from a constant P value of 18 μm to a disorder change (a disorder change in the narrowest range of 17.5 to 18.5 μm and the widest range of 13 to 23 μm), and the performance was hardly affected. The value A is a variation selected from 1 to 10 μm, preferably 2 to 6 μm. When a is too small, the interference reduction effect is not significant, and when a is too large, the array morphology becomes poorly controlled, reproducibility is poor, and there are many light leakage regions that occur due to too far a distance.
Examples 93 to 102
The cross-section of the collimating film provided in examples 93-102 is shown in FIG. 19. The collimating film comprises a collimating lens array and a collimating hole array, wherein the collimating lens array and the collimating hole array are disordered arrays, the microlenses are closely arranged and overlapped with each other (as shown in figure 12, the primary optical axis coordinates of any three overlapped microlenses are connected into a common triangle, the distance P between the primary optical axes of the two overlapped microlenses is disordered and changes within a certain value range (Pm +/-0.5A), wherein the median Pm is 18 micrometers or 15 micrometers, the variation A is 4 micrometers, namely the value range of P is 18 +/-2 micrometers or 15 +/-2 micrometers, other parameters are listed in table 10, the collimating lens layer 41 is made of PMMA, the flexible substrate layer 42 is made of PET, the shading medium 43A of the collimating hole layer 43 is inorganic coating titanium carbide, the collimating film is provided with collimating holes 43B formed by perforating the microlenses, other parameters are listed in table 10, the laminating adhesive layers 44 of embodiments 93-99 are solid OCA, the thermosetting polyacrylate system, the adhesive layer 44 of the embodiment 100 is a high-transmittance PSA system, the thermosetting polyacrylate system is adopted as the collimating film, the embodiment 101, the laminating adhesive layer 44 of the PSA system is a thermosetting polyacrylate system, and the curing adhesive layer 102 is made of the PSA system.
TABLE 10 design parameters and optical Properties of examples 93 to 102
Figure BDA0002949411920000312
Figure BDA0002949411920000321
Note 1 as in table 8;
note 2: the collimating lens array and the collimating aperture array of embodiments 93-102 are disordered arrays and closely arranged;
note 3: t is a unit of 2 The thickness of the adhesive layer is in unit of μm;
it can be seen from table 10, examples 93-98 that the thickness of the glue layer (44) does not affect the optical alignment properties (light blocking and light transmission) when the parameters of the three-layer core structure (41, 42, 43) of the interference reduction alignment film are unchanged. But a thickness T 2 Too little can result in poor adhesion (whether before or after reliability), and too much can still result in loss of signal light or crosstalk. In particular, when the thickness T is 2 Increasing the value of (a) to a critical value requires the use of a shallower microlens structure and a collimating film with a larger aspect ratio, such as in examples 98 and 99, with a 50 μm thick flexible matrix layer (which would be problematic if a 25 μm thick layer were still used) and 2.4 μm H. It can be seen from comparison of examples 97 and 100 to 102 that the material of the bonding adhesive layer (44) does not affect the optical alignment performance when the parameters of the three-layer core structure (41, 42, 43) of the interference reduction alignment film are not changed.
It should be understood that, in any of the ordered alignment films of the present invention, the P value can be changed to a certain degree to obtain a new disordered alignment film, and therefore, the Pm value in the disordered alignment film and the P value in the ordered alignment film are both selected from 10 to 50 μm, preferably 15 to 30 μm, and more preferably 18 to 25 μm. The invention only uses the embodiment 24 to carry out disorder optimization, and does not need to list more embodiments for further description, but the patent scope of the disorder collimating film provided by the invention is not influenced.
Examples 103 to 116
The cross section of the full-lamination collimation film provided by the invention is shown in fig. 21, and the full-lamination collimation film comprises an upper lamination adhesive layer 45, a low-folding filling layer 47 and a high-folding collimation transparent layerA mirror layer 41', a flexible substrate layer 42, a collimating aperture layer 43, and a lower adhesive layer 46; the high-folding collimating lens layer 41' is arranged on the upper surface of the substrate 42, the collimating aperture layer 43 is arranged on the lower surface of the substrate 42, the collimating lens layer 41' comprises a micro-lens array 41A ' and a thick layer 41B ', the low-folding filling layer 47 fully covers (covers) the collimating lens layer 41', so that a lens structure cannot be exposed, the upper bonding adhesive layer 45 and the low-folding filling layer 47 are bonded together, and the lower bonding adhesive layer 46 and the collimating aperture layer 43 are bonded together. The collimation hole layer 43 comprises a light-shielding medium 43A and a collimation hole array 43B, and the collimation lens array and the collimation hole array of the full-lamination collimation film are both in regular triangle tight arrangement (as shown in fig. 8). The high-refraction collimating lens layer 41' is made of high-refractive-index organic-inorganic hybrid acrylic resin, the flexible substrate layer 42 is made of PET, the shading medium 43A of the collimating pore layer 43 is inorganic coating titanium carbide, and the low-refraction filling layer is made of fluorine modified acrylic resin. The upper and lower adhesive layers 45 and 46 of examples 103 to 107 were high-permeability PSAs with a thickness T 2 And 25 μm. The upper and lower adhesive layers 45 and 46 of examples 108 to 113 were OCA and had a thickness T 2 Is 5 μm. The upper and lower adhesive layers 45 and 46 of examples 114-116 were OCA with a thickness T 2 And 35 μm. The fully-laminated collimating film was used to prepare a collimating aperture array by means of microlens focusing, and the other parameters and optical properties were as listed in table 11.
TABLE 11 design parameters and optical Properties for examples 48, 49 and 103-116
Figure BDA0002949411920000331
Note 1 is as in Table 1.
Note 2: r' is the curvature radius of the micro lens of the high-refraction collimating lens layer, and the unit is mum; h' is the thickness (or called height) of the high-refraction collimating lens layer and has a unit of μm; n1' is the refractive index of the high-refraction collimating lens layer and has no dimensional unit; t is 3 The thickness (or called height) of the low-refractive-index filling layer is unit of μm; n is 3 The refractive index of the low refractive index filling layer is free of dimensional units; d 2 For focusing on soft lensThe diameter of a light spot formed on the upper surface of the sexual matrix layer is unit micron; gamma is the beam angle of the light beam formed in the flexible substrate layer after being focused by the micro lens, and is unit degree;
table 11 comparing examples 48 and 103 and 49 and 104, it can be seen that the light-focusing performance can be substantially consistent on the upper surface of the flexible substrate by matching the refractive indexes of the low-refractive filling layer and the high-refractive lens layer, and by reducing the radius of curvature and making the shape of the high-refractive lens layer convex, no matter the spot size D 2 Also the beam angle gamma and thus the final aperture effect and the optical properties (light blocking and light transmission) are substantially identical. Embodiments 103-116 show several exemplary embodiments of the fully-laminated collimating film of the present invention, and it can be seen that each group of 3-105 films is matched with the maximum, centered and minimum refractive indexes, and the aperture opening effect and the optical performance can be substantially consistent through different designs of the lens structure.
Examples 117 to 126
The cross section of the fully-laminated collimating film provided by the invention is shown in fig. 24, and the fully-laminated collimating film comprises an upper laminating adhesive layer 45, a low-folding filling layer 47, a high-folding collimating lens layer 41', a flexible substrate layer 42, a collimating hole layer 43 and a lower laminating adhesive layer 46; the lower adhesive layer has a local bulge in the collimation hole to form a micro lens 49 in the hole; the high-folding collimating lens layer 41' is arranged on the upper surface of the substrate 42, the collimating aperture layer 43 is arranged on the lower surface of the substrate 42, the collimating lens layer 41' comprises a micro-lens array 41A ' and a thick layer 41B ', the low-folding filling layer 47 fully covers (covers) the collimating lens layer 41', so that a lens structure cannot be exposed, the upper bonding adhesive layer 45 and the low-folding filling layer 47 are bonded together, and the lower bonding adhesive layer 46 and the collimating aperture layer 43 are bonded together. The collimation hole layer 43 comprises a shading medium 43A and a collimation hole array 43B, and the collimation lens array and the collimation hole array of the full-lamination collimation film are both in regular triangle tight arrangement (as shown in fig. 8). The high-refraction collimating lens layer 41' is made of high-refractive-index organic-inorganic hybrid acrylic resin, the flexible substrate layer 42 is made of PET (polyethylene terephthalate), the shading medium 43A of the collimating aperture layer 43 is inorganic coating titanium carbide, and the low-refraction filling layer is made of fluorine modified acrylic resin. Top application of examples 117 to 120The adhesive layer 45 and the lower adhesive layer 46 are highly transparent PSA with a thickness T 2 And 25 μm. The upper and lower adhesive layers 45 and 46 of the embodiments 121-123 are OCA with a thickness T 2 Is 5 μm. The upper and lower adhesive layers 45 and 46 of the embodiments 124 to 126 are OCA with a thickness T 2 And 35 μm. The fully laminated collimating film is used for preparing a collimating aperture array in a micro-lens focusing manner, and the other parameters and optical properties are listed in table 12.
TABLE 12 design parameters and optical Properties of examples 107 and 117 to 126
Figure BDA0002949411920000341
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Figure BDA0002949411920000351
Note 1 is as in Table 1.
Note 2: r' is the curvature radius of the micro lens of the high-refraction collimating lens layer, and the unit is mum; h' is the thickness (or called height) of the high-refraction collimating lens layer, and the unit is mum; n1' is the refractive index of the high-refraction collimating lens layer and has no dimensional unit; t is 3 The thickness (or called height) of the low-refractive-index filling layer is unit of μm; n is a radical of an alkyl radical 3 The refractive index of the low refractive index filling layer is free of dimensional units; y is the elastic modulus of the lower adhesive layer and has unit MPa; h 2 The thickness (or height) of the micro lens in the hole is unit of μm; x is the ratio H of the thickness of the micro-lens in the hole to the depth of the collimation hole (or called the thickness of the collimation hole) 2 T, dimensionless units.
Table 12 comparing examples 107 and 117 to 121, it can be seen that the height H of the microlens in the hole is increased and the height H is increased in the process of gradually softening the lower adhesive layer (gradually decreasing the elastic modulus) 2 The ratio of the thickness t of the collimating aperture or the collimating aperture layer is also increased, and the change has no influence on the light blocking angle of the final collimating film, but improves the SNR (signal to noise ratio). Also, as can be seen from comparative examples 117 to 121 and 122 to 126, the degree of protrusion of the lens in the hole has a preferable value, where the SNR is highest, and both the shallow and convex phases are opposite to each otherThe pair is poor. The optimum protrusion and the SNR improvement are different when the collimating holes are different in depth. It should be understood that any one of the bonded collimating films or fully bonded collimating films of the present invention can generate the micro-lenses in the holes and increase the SNR by optimizing the hardness of the lower bonding layer, which is not described herein again, but does not affect the protection scope of the present invention.
It should be noted that the above-mentioned embodiments are only exemplary embodiments of the present invention, and are not intended to limit the scope of the present invention. All equivalent changes and modifications made according to the disclosure of the present invention are covered by the scope of the claims of the present invention.

Claims (2)

1. The fully-laminated collimating film is characterized by sequentially comprising an upper laminating adhesive layer, a low-folding filling layer, a high-folding collimating lens layer, a flexible substrate layer, a collimating hole layer and a lower laminating adhesive layer; the low-folding filling layer fully covers the collimating lens layer, and the upper surface of the low-folding filling layer is a plane; the upper bonding adhesive layer is bonded with the low-folding filling layer; the lower adhesive layer is adhered to the collimating aperture layer; the upper surface of the lower adhesive layer protrudes upwards in the collimating hole to form a micro lens in the hole; the chord length of the cross section of the micro lens in the hole is the same as the diameter phi of the collimating hole;
the collimation hole layer comprises a shading medium and a collimation hole array, and the collimation lens array and the collimation hole array of the full-lamination collimation film are both in regular triangle tight arrangement; the high-refraction collimating lens layer is made of high-refractive-index organic-inorganic hybrid acrylic resin, the flexible substrate layer is made of PET (polyethylene terephthalate), the shading medium of the collimating hole layer is inorganic plating titanium carbide, and the low-refraction filling layer is made of fluorine modified acrylic resin;
wherein, P is the minimum distance of the main optical axis of the micro lens and is 25 μm; r' is the curvature radius of the micro lens and is 12.8 mu m; h' is the thickness of the high-refraction collimating lens layer and is 15.1 mu m; n is 1 ' the refractive index of the high-refraction collimating lens layer is 1.6; t is 3 The thickness of the low-refractive index filling layer is 10.2 mu m; n is a radical of an alkyl radical 3 The refractive index of the low refractive index filling layer is 1.45; t is a flexible groupThe thickness of the bulk layer was 38 μm; n is 2 The refractive index of the flexible matrix layer is 1.65; h 2 The thickness of the micro lens in the hole is 0.4-2 μm; x is the ratio H of the thickness of the micro lens in the hole to the depth of the collimating hole 2 T, is 0.10 to 0.80; t is the thickness of the collimation hole layer and is 2-4 μm; phi is the diameter of the collimating hole and is 3 μm.
2. An image recognition module is characterized by comprising a collimation layer, a filter layer and a photoelectric sensing layer in sequence; the collimating layer is selected from the fully conformable collimating film of claim 1.
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Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021169725A1 (en) * 2020-02-24 2021-09-02 宁波激智科技股份有限公司 Collimating film, interference-reducing collimating film and preparation method therefor, laminated collimating film, and image recognition module
CN211857087U (en) * 2020-02-24 2020-11-03 宁波激智科技股份有限公司 Interference reducing collimation film
US11875596B2 (en) 2021-03-12 2024-01-16 Boe Technology Group Co., Ltd. Display panel and display apparatus
CN114002769A (en) * 2021-10-20 2022-02-01 武汉华星光电技术有限公司 Light filtering collimation composite film, manufacturing method thereof and display device
WO2023111738A1 (en) * 2021-12-14 2023-06-22 3M Innovative Properties Company Optical construction including lens film and mask layer
WO2023214197A1 (en) * 2022-05-02 2023-11-09 刘正锋 Method and device for increasing resolving power of optical instrument by applying new theory of optics

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107346075A (en) * 2017-07-31 2017-11-14 京东方科技集团股份有限公司 One kind collimation membrane structure and display device

Family Cites Families (133)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3704949A (en) * 1970-06-22 1972-12-05 Rms Ind Inc Method and apparatus for personal identification
CA2056842A1 (en) * 1991-02-07 1992-08-08 Jay M. Eastman System for scanning and reading symbols, such as bar codes, which is adapted to be configured in a hand held unit and can automatically read symbols on objects which are placed inthe detection zone of the unit
CA2083969A1 (en) * 1991-12-31 1993-07-01 Leslie James Button Measurement of fiber diameters and detection of defects
US5479275A (en) * 1993-12-03 1995-12-26 Ois Optical Imaging Systems, Inc. Backlit liquid crystal display with integral collimating, refracting, and reflecting means which refracts and collimates light from a first light source and reflects light from a second light source
JP3239314B2 (en) * 1994-09-16 2001-12-17 日本板硝子株式会社 Flat lens array and liquid crystal display device using the same
JPH1039108A (en) * 1996-07-19 1998-02-13 Toray Ind Inc Manufacture of microlens array sheet
US5822125A (en) * 1996-12-20 1998-10-13 Eastman Kodak Company Lenslet array system
AU1357102A (en) * 1998-03-23 2002-03-14 Cepheid Multi-site reactor system with dynamic independent control of indvidual reaction sites
US6487017B1 (en) * 1999-07-23 2002-11-26 Bae Systems Information And Electronic Systems Integration, Inc Trimodal microlens
US6168319B1 (en) * 1999-08-05 2001-01-02 Corning Incorporated System and method for aligning optical fiber collimators
US6847491B1 (en) * 1999-09-27 2005-01-25 Arrayed Fiberoptics Corporation Hybrid microlens array
JP2001201611A (en) * 2000-01-21 2001-07-27 Hitachi Ltd Optically functional sheet and surface light source using the same as well as image display device
US6876408B2 (en) * 2000-02-14 2005-04-05 Fuji Photo Film Co., Ltd. Collimating plate, lighting apparatus and liquid crystal display apparatus
GB0030410D0 (en) * 2000-12-13 2001-01-24 Screen Technology Ltd Collimator
JP2002313121A (en) * 2001-04-16 2002-10-25 Nitto Denko Corp Luminaire with touch panel and reflective liquid crystal display device
CN100470364C (en) * 2001-12-03 2009-03-18 凸版印刷株式会社 Lens array sheet and transmission screen and rear projection type display
US6939014B1 (en) * 2001-12-31 2005-09-06 Jenmar Visual Systems, Inc. Liquid transmissive filter having anisotropic properties and method of fabrication
JP3900982B2 (en) * 2002-03-25 2007-04-04 凸版印刷株式会社 Transmission screen
CA2485602C (en) * 2002-05-14 2013-10-01 Amersham Biosciences Niagara, Inc. System and methods for rapid and automated screening of cells
AU2002341789A1 (en) * 2002-09-19 2004-04-08 Rainbow Displays, Inc. Backlight assembly for collimated illumination
US6859326B2 (en) * 2002-09-20 2005-02-22 Corning Incorporated Random microlens array for optical beam shaping and homogenization
AU2003902319A0 (en) * 2003-05-14 2003-05-29 Garrett Thermal Systems Limited Laser video detector
DE102004020250A1 (en) * 2004-04-26 2005-11-10 Hentze-Lissotschenko Patentverwaltungs Gmbh & Co. Kg Apparatus and method for optical beam homogenization
JP4513653B2 (en) * 2004-12-27 2010-07-28 日本ビクター株式会社 Manufacturing method of microlens array sheet
US7706073B2 (en) * 2005-06-29 2010-04-27 Reflexite Corporation Collimating microlens array
GB0601287D0 (en) * 2006-01-23 2006-03-01 Ocuity Ltd Printed image display apparatus
TW200809327A (en) * 2006-04-19 2008-02-16 3M Innovative Properties Co Transflective LC display having narrow band backlight and spectrally notched transflector
JP4863112B2 (en) * 2006-09-15 2012-01-25 Nltテクノロジー株式会社 Optical element array, display device, and manufacturing method of display device
US20080191604A1 (en) * 2006-09-27 2008-08-14 Evident Technologies Retro-emission systems comprising microlens arrays and luminescent emitters
JP4384214B2 (en) * 2007-09-27 2009-12-16 株式会社 日立ディスプレイズ Surface light emitting device, image display device, and image display device using the same
CN101544468B (en) * 2008-03-28 2013-05-01 Hoya株式会社 Fluorophosphate glass, precision press molding preform, optical element blank, optical element and method of manufacturing the same
JP5405763B2 (en) * 2008-03-28 2014-02-05 日東電工株式会社 Directional diffusion film, polarizing plate, liquid crystal display device, and method of manufacturing directional diffusion film
JP5610254B2 (en) * 2008-06-18 2014-10-22 株式会社リコー Imaging apparatus and road surface state determination method
JP5298695B2 (en) * 2008-08-06 2013-09-25 コニカミノルタ株式会社 Optical glass and optical element
JP5114348B2 (en) * 2008-09-08 2013-01-09 日東電工株式会社 Manufacturing method of light diffusion film
JP5509566B2 (en) * 2008-10-01 2014-06-04 凸版印刷株式会社 Optical component and liquid crystal display unit
EP2237079B1 (en) * 2009-04-03 2013-05-29 Innovavent GmbH Device for homogenising coherent radiation
WO2010124028A2 (en) * 2009-04-21 2010-10-28 Vasylyev Sergiy V Light collection and illumination systems employing planar waveguide
KR101116140B1 (en) * 2009-07-16 2012-03-06 엘지이노텍 주식회사 Regular pattern optical sheet
CN102026478A (en) * 2009-09-21 2011-04-20 欣兴电子股份有限公司 Substrate of circuit board and drilling method thereof
CN101674517B (en) * 2009-09-25 2012-08-29 广东长虹电子有限公司 Acoustic generating device
JP4968965B2 (en) * 2009-11-18 2012-07-04 キヤノン株式会社 Refractive index distribution measuring method and measuring apparatus
CN101794962B (en) * 2010-03-10 2013-08-28 中国科学院光电技术研究所 Coherent combining device of self-adaption high-order transverse mode lasers
CN101866029B (en) * 2010-06-09 2011-09-21 宁波激智新材料科技有限公司 Deformation-resistant optics reflecting film, liquid crystal display device and LED lighting equipment
KR20120007944A (en) * 2010-07-15 2012-01-25 주식회사 엘지화학 Optical film having enhanced optical performance and back light unit comprising the same
KR101211723B1 (en) * 2010-09-20 2012-12-12 엘지이노텍 주식회사 Optical sheet, optical unit and lighting device using the same
CN201876568U (en) * 2010-09-25 2011-06-22 福州高意通讯有限公司 Array collimator
WO2012083042A1 (en) * 2010-12-16 2012-06-21 Lockheed Martin Corporation Collimating display with pixel lenses
KR101265312B1 (en) * 2011-03-15 2013-05-16 주식회사 엘지화학 Micro-lens array sheet and backlight unit comprising the same
GB201113324D0 (en) * 2011-08-02 2011-09-14 Cambridge Entpr Ltd Laser system and method for operating laser system
JP5310810B2 (en) * 2011-08-27 2013-10-09 株式会社デンソー Head-up display device
JP5966405B2 (en) * 2012-02-14 2016-08-10 セイコーエプソン株式会社 Optical filter device and method of manufacturing optical filter device
US9179982B2 (en) * 2012-03-20 2015-11-10 Varian Medical Systems, Inc. Method and system for automatic patient identification
WO2013146353A1 (en) * 2012-03-28 2013-10-03 シャープ株式会社 Light control film, display device, and method for manufacturing light control film
JP2014207253A (en) * 2012-04-17 2014-10-30 キヤノン株式会社 Image sensor and imaging apparatus
JP5673607B2 (en) * 2012-05-30 2015-02-18 株式会社デンソー Screen member and head-up display device
CN104981356B (en) * 2012-08-03 2017-04-12 苏州苏大维格光电科技股份有限公司 Colored, dynamic, and amplified safety film
AU2013101454B4 (en) * 2013-05-16 2014-05-22 Lumenco Llc Improved printing of security devices
CA2890405C (en) * 2013-10-20 2022-04-26 Mtt Innovation Incorporated Light field projectors and methods
US9651718B2 (en) * 2014-01-27 2017-05-16 Forelux Inc. Photonic apparatus with periodic structures
JP6300029B2 (en) * 2014-01-27 2018-03-28 ソニー株式会社 Image sensor, manufacturing apparatus, and manufacturing method
ES2671553T3 (en) * 2014-05-13 2018-06-07 Coelux S.R.L. Light source and lighting system that mimics sunlight
JP2015227999A (en) * 2014-06-02 2015-12-17 リコー光学株式会社 Microlens array substrate and method for manufacturing the same
CN105445833A (en) * 2014-08-21 2016-03-30 万维云视(上海)数码科技有限公司 3D imaging grating assembly and 3D display device
US9534156B2 (en) * 2014-09-17 2017-01-03 Appvion, Inc. Linerless record material
CN104457600B (en) * 2014-11-20 2017-02-22 华中科技大学 Testing device of optical fiber collimator array
JP6697849B2 (en) * 2015-01-21 2020-05-27 ソニー株式会社 Wearable display device and image display method
US10147757B2 (en) * 2015-02-02 2018-12-04 Synaptics Incorporated Image sensor structures for fingerprint sensing
US10181070B2 (en) * 2015-02-02 2019-01-15 Synaptics Incorporated Low profile illumination in an optical fingerprint sensor
US9829614B2 (en) * 2015-02-02 2017-11-28 Synaptics Incorporated Optical sensor using collimator
CN104570369B (en) * 2015-02-05 2017-03-15 合肥京东方光电科技有限公司 3D shows glasses
US9851577B2 (en) * 2015-07-17 2017-12-26 Dicon Fiberoptics, Inc. Nano-structured lens for collimating light from surface emitters
CN105092117B (en) * 2015-08-19 2017-06-09 东南大学 A kind of piezoresistive pressure sensor and preparation method thereof
CN105137644B (en) * 2015-09-23 2018-08-10 宁波激智科技股份有限公司 One kind subtracting interferometric optical brightness enhancement film
AT517885B1 (en) * 2015-10-23 2018-08-15 Zkw Group Gmbh Microprojection light module for a motor vehicle headlight for generating aberration-free light distributions
CN105372726A (en) * 2015-12-14 2016-03-02 中山大学 Diamond micro lens array and preparation method thereof
CN106199788A (en) * 2016-01-12 2016-12-07 宁波激智科技股份有限公司 A kind of optical brightening membrane and preparation method thereof
CN106199790A (en) * 2016-01-12 2016-12-07 宁波激智科技股份有限公司 A kind of complex optics brightness enhancement film
US10268884B2 (en) * 2016-01-29 2019-04-23 Synaptics Incorporated Optical fingerprint sensor under a display
CN105809115B (en) * 2016-03-02 2019-07-30 上海师范大学 A kind of more fingerprint optical encryption methods of binary channels
US10108841B2 (en) * 2016-03-31 2018-10-23 Synaptics Incorporated Biometric sensor with diverging optical element
AU2016100401B4 (en) * 2016-04-13 2017-02-09 Ccl Secure Pty Ltd Micro-optic device with double sided optical effect
AU2016100402B4 (en) * 2016-04-13 2017-08-17 Ccl Secure Pty Ltd Micro-optic device with integrated focusing element and image element structure
EP3465291A4 (en) * 2016-05-25 2019-06-12 Heptagon Micro Optics Pte. Ltd. Microlens array diffusers
CN105868742B (en) * 2016-05-26 2020-07-03 京东方科技集团股份有限公司 Display module and display device
CN106019613B (en) * 2016-07-27 2019-03-26 广州弥德科技有限公司 A kind of directive property backlight 3 d display device
JP6818468B2 (en) * 2016-08-25 2021-01-20 キヤノン株式会社 Photoelectric converter and camera
US10203431B2 (en) * 2016-09-28 2019-02-12 Ricoh Company, Ltd. Microlens array, image display apparatus, object apparatus, and mold
US20180120580A1 (en) * 2016-10-28 2018-05-03 3M Innovative Properties Company Light control film with varied viewing angle
CN108174059B (en) * 2016-12-08 2021-04-13 松下知识产权经营株式会社 Image pickup apparatus
CN106815554B (en) * 2016-12-19 2024-03-12 王金玉 Internal fingerprint rapid imaging and biological recognition system and method
EP3343619A1 (en) * 2016-12-29 2018-07-04 Thomson Licensing An image sensor comprising at least one sensing unit with light guiding means
CN106773550B (en) * 2017-01-20 2018-12-14 苏州亿拓光电科技有限公司 Optical machining system and method
CN108399352A (en) * 2017-02-04 2018-08-14 上海箩箕技术有限公司 Fingerprint imaging module and electronic equipment
CN106842398A (en) * 2017-02-23 2017-06-13 宁波视睿迪光电有限公司 Grating Film, 3 d display device and alignment method
CN106886767B (en) * 2017-02-23 2019-07-05 京东方科技集团股份有限公司 A kind of optical fingerprint identification device and display panel
CN107065307B (en) * 2017-06-05 2019-12-27 京东方科技集团股份有限公司 Light collimation structure, substrate, backlight module and display device
CN109037248A (en) * 2017-06-08 2018-12-18 上海箩箕技术有限公司 Imaging sensor and forming method thereof, fingerprint imaging mould group
CN107563318B (en) * 2017-08-23 2020-09-08 上海天马微电子有限公司 Display device and electronic equipment
CN107516089A (en) * 2017-09-08 2017-12-26 北京眼神科技有限公司 A kind of fingerprint acquisition device
TW201915818A (en) * 2017-10-05 2019-04-16 香港商印芯科技股份有限公司 Optical identification module
US10809853B2 (en) * 2017-12-11 2020-10-20 Will Semiconductor (Shanghai) Co. Ltd. Optical sensor having apertures
CN109343161A (en) * 2017-12-12 2019-02-15 宁波激智科技股份有限公司 A kind of encapsulation type reflective membrane and preparation method thereof
SE1751613A1 (en) * 2017-12-21 2019-06-22 Fingerprint Cards Ab Biometric imaging device and method for manufacturing the biometric imaging device
DE212018000123U1 (en) * 2018-02-06 2019-08-20 Shenzhen GOODIX Technology Co., Ltd. Under the screen to be arranged biometric identification device, biometric identification component and terminal device
EP3766003A4 (en) * 2018-03-15 2021-05-12 Fingerprint Cards AB Biometric imaging device and method for manufacturing a biometric imaging device
CN108647558B (en) * 2018-03-21 2021-01-08 京东方科技集团股份有限公司 Fingerprint identification display device
CN110502955A (en) * 2018-05-17 2019-11-26 京东方科技集团股份有限公司 Fingerprint recognition panel, fingerprint identification method and display device
CN110502960B (en) * 2018-05-17 2022-04-08 京东方科技集团股份有限公司 Display substrate, fingerprint identification panel, fingerprint identification method and display device
JP2019211530A (en) * 2018-05-31 2019-12-12 ウシオ電機株式会社 Light source device and projector
US10867198B2 (en) * 2018-07-03 2020-12-15 Gingy Technology Inc. Image capturing device and image capturing module
CN108897081A (en) * 2018-07-23 2018-11-27 宁波激智科技股份有限公司 A kind of optical thin film and preparation method thereof
CN112585506A (en) * 2018-08-15 2021-03-30 3M创新有限公司 Optical element comprising a microlens array
CN109196522B (en) * 2018-08-24 2022-07-19 深圳市汇顶科技股份有限公司 Backlight module, method and device for identifying fingerprints under screen and electronic equipment
CN209492257U (en) * 2018-09-13 2019-10-15 东莞市赛越新材料科技有限公司 Unlocked by fingerprint mobile phone protects photocuring film
WO2020132974A1 (en) * 2018-12-26 2020-07-02 深圳市汇顶科技股份有限公司 Fingerprint recognition apparatus and electronic device
CN110337655B (en) * 2018-12-26 2023-05-05 深圳市汇顶科技股份有限公司 Fingerprint identification device and electronic equipment
CN109683377B (en) * 2018-12-26 2021-10-26 宁波激智科技股份有限公司 High-haze adhesive layer composition and high-haze high-brightness composite brightness enhancement film
CN109471267A (en) * 2019-01-11 2019-03-15 珠海迈时光电科技有限公司 A kind of laser homogenizing device
CN211349383U (en) * 2019-01-22 2020-08-25 深圳市汇顶科技股份有限公司 Fingerprint identification device and electronic equipment
CN209357076U (en) * 2019-01-23 2019-09-06 南昌欧菲生物识别技术有限公司 Flexible collimator, fingerprint recognition mould group and electronic equipment
CN110088768B (en) * 2019-03-12 2022-03-01 深圳市汇顶科技股份有限公司 Fingerprint recognition device and electronic equipment under screen
CN109829452B (en) * 2019-03-26 2024-02-27 上海箩箕技术有限公司 Optical fingerprint sensor module and forming method thereof
CN209640880U (en) * 2019-04-10 2019-11-15 深圳市汇顶科技股份有限公司 Optical fingerprint identification device and electronic equipment
CN109901341B (en) * 2019-04-10 2022-02-11 曲阜师范大学 Broadband optical fiber collimator-based pre-splitting Mach-Zehnder interferometer and method
WO2020220304A1 (en) * 2019-04-30 2020-11-05 深圳市汇顶科技股份有限公司 Device for fingerprint recognition and electronic device
CN209746551U (en) * 2019-05-17 2019-12-06 上海思立微电子科技有限公司 biological characteristic identification module and electronic equipment
CN110277430A (en) * 2019-06-26 2019-09-24 上海天马有机发光显示技术有限公司 A kind of display panel, preparation method and display device
CN209373637U (en) * 2019-07-30 2019-09-10 上海菲戈恩微电子科技有限公司 Information in fingerprint acquisition device and electronic equipment under a kind of screen
CN110580473A (en) * 2019-09-23 2019-12-17 上海思立微电子科技有限公司 Fingerprint identification subassembly, display module and electronic equipment
CN211857087U (en) * 2020-02-24 2020-11-03 宁波激智科技股份有限公司 Interference reducing collimation film
CN113296276A (en) * 2020-02-24 2021-08-24 宁波激智科技股份有限公司 Collimating film and preparation method thereof
CN211857086U (en) * 2020-02-24 2020-11-03 宁波激智科技股份有限公司 Collimating film

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107346075A (en) * 2017-07-31 2017-11-14 京东方科技集团股份有限公司 One kind collimation membrane structure and display device

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